CN110429064B - 缓冲结构、显示面板及缓冲结构的制作方法 - Google Patents

缓冲结构、显示面板及缓冲结构的制作方法 Download PDF

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CN110429064B
CN110429064B CN201910705393.9A CN201910705393A CN110429064B CN 110429064 B CN110429064 B CN 110429064B CN 201910705393 A CN201910705393 A CN 201910705393A CN 110429064 B CN110429064 B CN 110429064B
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王坤
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Wuhan China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Abstract

本发明提供一种缓冲结构、显示面板及缓冲结构的制作方法。显示面板包括至少一种缓冲结构，所述缓冲结构包括第一无机层、第二无机层和有机层。在所述第一无机层一侧表面设有间隔设置的梯形沟槽；所述第二无机层设于所述第一无机层设有所述梯形沟槽一侧的表面上，覆盖在所述梯形沟槽内侧表面并在所述槽口位置相连接形成毛细管道；所述有机层填充于所述毛细管道内。缓冲结构的制作方法包括步骤：制作第一无机层、制作第二无机层、制作有机层。本发明实现有机层贯穿到无机层之间，能够有效缓释无机层的弯折应力，并提高了显示面板的可弯折次数，且不影响无机层对水氧的阻隔能力。

Description

缓冲结构、显示面板及缓冲结构的制作方法
技术领域
本发明涉及显示面板加工技术领域，尤其涉及一种缓冲结构、显示面板及缓冲结构的制作方法。
背景技术
有机发光二极管(OLED)器件具有结构简单、响应速度快、主动发光、低功耗等优点，在手机、平板、电视等显示领域已经有了广泛的应用。随着产品差异化的发展，可挠曲、折叠屏已经成为一种趋势。在柔性OLED器件中存在显示部分、驱动IC以及连接两者的金属走线，其中驱动IC分布在面板的下边框。目前越来越多的手机厂商尝试推出可弯折的手机，要求屏幕弯折次数达到可以商用的水平。OLED面板结构中有许多应力较大的无机膜，主要包括阵列基板和薄膜封装的相关膜层，这些膜层的抗弯折性能直接影响了整个面板的弯折次数。
在US8937394上公开了一种如图1所示的封装膜层堆叠结构，其中包括OLED显示基底1200以及交错层叠的有机无机封装层1214。每一层有机无机封装层2102a、1204a、2102b、1204b均包括间隔设置的有机层1208和无机层1206，其中有机层1208的面积大于无机层1206，这样堆叠的有机无机封装层1214可有效减缓面板在弯折过程中的弯折应力，提高屏幕弯折性能。但是如此堆叠的封装层，有机层会连接在一起，形成了完整的水氧通道，降低了封装膜层的抗水氧能力，缩短了屏幕的使用寿命。
因此，有必要提出一种新型缓冲结构、显示面板及缓冲结构的制作方法，以克服现有技术中存在的问题。
发明内容
本发明的目的在于，提供一种缓冲结构、显示面板及缓冲结构的制作方法，通过在显示面板的无机膜上利用刻蚀的方法形成梯形沟槽，在其内部形成毛细管道，使液态的有机物进入毛细管道固化形成有机层，能够有效缓释无机层的弯折应力，并提高了显示面板的可弯折次数，且不影响无机层对水氧的阻隔能力。
为了解决上述问题，本发明一实施例中提供一种缓冲结构，包括第一无机层、第二无机层和有机层。具体地讲，在所述第一无机层一侧表面设有间隔设置的梯形沟槽，所述梯形沟槽的槽口宽度小于其槽底的宽度；所述第二无机层设于所述第一无机层设有所述梯形沟槽一侧表面上，覆盖在所述梯形沟槽内侧表面并在所述槽口位置相连接，覆盖在所述梯形沟槽内侧表面的所述第二无机层呈环形形成毛细管道；所述有机层填充于所述毛细管道内。
进一步地，所述毛细管道呈平行排列的直线形结构或呈回字形排列的环形结构。
进一步地，所述梯形沟槽之间的间隔距离为100nm-500000nm。
进一步地，所述梯形沟槽的槽口宽度为100nm-5000nm。
进一步地，所述第二无机层的厚度为50nm-2500nm。
进一步地，所述第一无机层为：
缓冲层和有源层的层叠结构，其中所述缓冲层为单层结构的氮化硅层、氧化硅层或双层结构的氮化硅层和氧化硅层，所述有源层的材质包括铟镓锌氧化物(IndiumGallium ZincOxide，IGZO)、单晶硅(a-Si)、低温多晶硅(Low Temperature Poly-silicon，LTPS)或低温多晶氧化物(Low Temperature Polycrystalline Oxide，LTPO)中的至少一种；或
栅极绝缘层，所述栅极绝缘层的材质包括SiNx或SiOx中的至少一种；或
层间绝缘层，所述层间绝缘层的材质包括SiNx或SiOx；或
钝化层，所述钝化层的材质包括SiNx或SiOx。
进一步地，所述第二无机层的材质包括SiNx、SiOxNy、SiOx、SiCxNy、ZnO或AlOx中的任一种。
进一步地，所述有机层的材质包括环氧树脂或亚克力。
本发明又一实施例中提供一种缓冲结构的制作方法，包括以下步骤：
制作第一无机层，其为提供一第一无机层并在其一侧表面通过刻蚀制作间隔设置的梯形沟槽，所述梯形沟槽的槽口宽度小于其槽底的宽度；
制作第二无机层，在所述第一无机层设有所述梯形沟槽一侧表面上通过原子层沉积(ALD)工艺、激光脉冲沉积(PLD)工艺、溅射(Sputter)工艺或等离子增强化学气相沉积(PECVD)工艺沉积一层第二无机层，调节所述第二无机层的厚度和成膜参数使得在所述梯形沟槽的槽口位置相连接，覆盖在所述梯形沟槽内侧表面的所述第二无机层呈环形形成毛细管道；以及
制作有机层，利用所述毛细管道的毛细现象，在所述毛细管道末端滴加液态的有机物，由于毛细现象，有机物会填满所述毛细管道，经紫外光(UV)照射固化形成有机层。
本发明再一实施例中提供一种显示面板，包括至少一种以上所述的缓冲结构。
本发明的优点在于，提供一种缓冲结构、显示面板及缓冲结构的制作方法，通过在显示面板的无机膜即第一无机层上利用刻蚀的方法形成梯形沟槽，然后沉积一层无机膜，调节无机膜的厚度使梯形沟槽的槽口处无机膜即第二无机层相连，在其内部形成毛细管道，然后利用毛细现象，使液态的有机物进入毛细管道固化形成有机层，这样有机层贯穿到无机层之间，能够有效缓释无机层的弯折应力，并提高了显示面板的可弯折次数，且不影响无机层对水氧的阻隔能力。
附图说明
为了更清楚地说明本申请实施例中的技术方案，下面将对实施例描述中所需要使用的附图作简单地介绍。显而易见地，下面描述中的附图仅仅是本申请的一些实施例，对于本领域技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为现有的一种显示面板的结构示意图；
图2为本发明实施例中一种显示面板的结构示意图；
图3为本发明实施例中一种缓冲结构的结构示意图；
图4为图3在A-A处截面图，主要显示毛细管道呈平行排列的直线形结构示意图；
图5为图3在A-A处截面图，主要显示毛细管道呈回字形排列的环形结构示意图；
图6为本发明实施例中一种缓冲结构的制作方法的流程图；
图7为本发明实施例中一种缓冲结构的制作过程的结构示意图。
图中部件标识如下：
1、柔性衬底层，2、缓冲层，3、有源层，4、栅极绝缘层，5、栅极层，
6、层间绝缘层，7、源漏极层，8、钝化层，9、阳极层，10、像素定义层，
11、第一无机层，12、第二无机层，13、有机层，14、梯形沟槽，
15、毛细管道，100、显示面板，110、缓冲结构。
具体实施方式
在本发明的描述中，需要理解的是，术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”、“顺时针”、“逆时针”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本发明和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本发明的限制。此外，术语“第一”、“第二”仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个所述特征。在本发明的描述中，“多个”的含义是两个或两个以上，除非另有明确具体的限定。
在附图中，为了清楚，层和区域的厚度被夸大。例如，为了便于描述，附图中的元件的厚度和尺寸被任意地示出，因此，所描述的技术范围不由附图限定。
在本发明中，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”、“固定”等术语应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或成一体；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言，可以根据具体情况理解上述术语在本发明中的具体含义。
请参阅图2所示，本发明其中一实施例中提供一种显示面板100，包括至少一种缓冲结构110。其中所述显示面板100包括从下至上依次层叠设置的柔性衬底层1、缓冲层2、有源层3、栅极绝缘层4、栅极层5、层间绝缘层6、源漏极层7、钝化层8、阳极层9和像素定义层10。
请参阅图3所示，所述缓冲结构110包括第一无机层11、第二无机层12和有机层13。具体地讲，在所述第一无机层11一侧表面设有间隔设置的梯形沟槽14，所述梯形沟槽14的槽口宽度小于其槽底的宽度；所述第二无机层12设于所述第一无机层11设有所述梯形沟槽14一侧表面上，覆盖在所述梯形沟槽14内侧表面并在所述槽口位置相连接，覆盖在所述梯形沟槽14内侧表面的所述第二无机层12呈环形形成毛细管道15；所述有机层13填充于所述毛细管道15内。所述梯形沟槽14的形状能够使得所述第二无机层12在所述槽口位置相连接，以使得覆盖在所述梯形沟槽14内侧表面的所述第二无机层12呈环形形成毛细管道15。
本实施例中，图4和图5为图3在A-A处截面图。请参阅图4所示，所述毛细管道15呈平行排列的直线形结构。或者请参阅图5所示，所述毛细管道15呈回字形排列的环形结构。这两种结构形式均可实现将所述有机层13填充于所述毛细管道15内，从而能够有效缓释所述第一无机层11的弯折应力，并提高了显示面板100的可弯折次数，且不影响所述第一无机层11对水氧的阻隔能力。
本实施例中，所述梯形沟槽14之间的间隔距离为100nm-500000nm。
本实施例中，所述梯形沟槽14的槽口宽度为100nm-5000nm。所述槽口宽度的范围限定可便于实现形成所述毛细管道15。
本实施例中，所述第二无机层12的厚度为50nm-2500nm。通过调节所述第二无机层12的厚度值实现在所述槽口位置相连接，覆盖在所述梯形沟槽14内侧表面的所述第二无机层12呈环形形成毛细管道15。
本实施例中，所述第一无机层11为：
所述缓冲层2和所述有源层3的层叠结构，其中所述缓冲层2为单层结构的氮化硅层、氧化硅层或双层结构的氮化硅层和氧化硅层，所述有源层3的材质包括铟镓锌氧化物(Indium Gallium ZincOxide，IGZO)、单晶硅(a-Si)、低温多晶硅(Low Temperature Poly-silicon，LTPS)或低温多晶氧化物(Low Temperature Polycrystalline Oxide，LTPO)中的至少一种；或
所述栅极绝缘层4，所述栅极绝缘层4的材质包括SiNx或SiOx中的至少一种；或
所述层间绝缘层6，所述层间绝缘层6的材质包括SiNx或SiOx；或
所述钝化层8，所述钝化层8的材质包括SiNx或SiOx。
本实施例中，所述第二无机层12的材质包括SiNx、SiOxNy、SiOx、SiCxNy、ZnO或AlOx中的任一种。
本实施例中，所述有机层13的材质包括环氧树脂或亚克力。
请参阅图6、图7所示，本发明其中一实施例中提供一种缓冲结构110的制作方法，包括以下步骤：
S1、制作第一无机层11，其为提供一第一无机层11并在其一侧表面通过刻蚀制作间隔设置的梯形沟槽14，所述梯形沟槽14的槽口宽度小于其槽底的宽度；
S2、制作第二无机层12，在所述第一无机层11设有所述梯形沟槽14一侧表面上通过原子层沉积(ALD)工艺、激光脉冲沉积(PLD)工艺、溅射(Sputter)工艺或等离子增强化学气相沉积(PECVD)工艺等方式沉积一层无机膜构成第二无机层12，其材质包括SiNx、SiOxNy、SiOx、SiCxNy、ZnO或AlOx中的任一种，厚度为50nm-2500nm，调节所述第二无机层12的厚度和成膜参数，使得所述第二无机层12在所述梯形沟槽14的槽口位置相连接，覆盖在所述梯形沟槽14内侧表面的所述第二无机层12呈环形形成毛细管道15；以及
S3、制作有机层13，利用所述毛细管道15的毛细现象，在所述毛细管道15末端滴加液态的有机物，由于毛细现象，有机物会填满所述毛细管道15，经紫外光(UV)照射固化形成有机层13。其中所述有机物包括环氧树脂或亚克力。
本发明的优点在于，提供一种缓冲结构110、显示面板100及缓冲结构110的制作方法，通过在显示面板100的无机膜即第一无机层11上利用刻蚀的方法形成梯形沟槽14，然后沉积一层无机膜即第二无机层12，调节无机膜的厚度使所述梯形沟槽14的槽口处无机膜即第二无机层12相连，在其内部形成毛细管道15，然后利用毛细现象，使液态的有机物进入毛细管道15固化形成有机层13，这样有机层13贯穿到无机层即第一无机层11之间，能够有效缓释无机层的弯折应力，并提高了显示面板100的可弯折次数，且不影响无机层对水氧的阻隔能力。
以上所述仅是本发明的优选实施方式，应当指出，对于本技术领域的普通技术人员，在不脱离本发明原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也应视为本发明的保护范围。

Claims (10)

1.一种缓冲结构，其特征在于，包括：
第一无机层，在所述第一无机层一侧表面设有间隔设置的梯形沟槽，所述梯形沟槽的槽口宽度小于其槽底的宽度；
第二无机层，设于所述第一无机层设有所述梯形沟槽一侧表面上，覆盖在所述梯形沟槽内侧表面并在所述槽口位置相连接，覆盖在所述梯形沟槽内侧表面的所述第二无机层呈环形形成毛细管道；
有机层，填充于所述毛细管道内。
2.如权利要求1所述的缓冲结构，其特征在于，所述毛细管道呈平行排列的直线形结构或呈回字形排列的环形结构。
3.如权利要求1所述的缓冲结构，其特征在于，所述梯形沟槽之间的间隔距离为100nm-500000nm。
4.如权利要求1所述的缓冲结构，其特征在于，所述梯形沟槽的槽口宽度为100nm-5000nm。
5.如权利要求1所述的缓冲结构，其特征在于，所述第二无机层的厚度为50nm-2500nm。
6.如权利要求1所述的缓冲结构，其特征在于，所述第一无机层为：
缓冲层和有源层的层叠结构，其中所述缓冲层为单层结构的氮化硅层、氧化硅层或双层结构的氮化硅层和氧化硅层，所述有源层的材质包括铟镓锌氧化物、单晶硅、低温多晶硅或低温多晶氧化物中的至少一种；或
栅极绝缘层，所述栅极绝缘层的材质包括SiNx或SiOx中的至少一种；或
层间绝缘层，所述层间绝缘层的材质包括SiNx或SiOx；或
钝化层，所述钝化层的材质包括SiNx或SiOx。
7.如权利要求1所述的缓冲结构，其特征在于，所述第二无机层的材质包括SiNx、SiOxNy、SiOx、SiCxNy、ZnO或AlOx中的任一种。
8.如权利要求1所述的缓冲结构，其特征在于，所述有机层的材质包括环氧树脂或亚克力。
9.一种缓冲结构的制作方法，其特征在于，包括步骤：
制作第一无机层，其为提供第一无机层并在其一侧表面通过刻蚀制作间隔设置的梯形沟槽，所述梯形沟槽的槽口宽度小于其槽底的宽度；
制作第二无机层，在所述第一无机层设有所述梯形沟槽一侧表面上通过原子层沉积工艺、激光脉冲沉积工艺、溅射工艺或等离子增强化学气相沉积工艺沉积第二无机层，调节所述第二无机层的厚度和成膜参数使得在所述梯形沟槽的槽口位置相连接，覆盖在所述梯形沟槽内侧表面的所述第二无机层呈环形形成毛细管道；以及
制作有机层，利用所述毛细管道的毛细现象，在所述毛细管道末端滴加液态的有机物，由于毛细现象，有机物会填满所述毛细管道，经紫外光照射固化形成有机层。
10.一种显示面板，包括至少一种如权利要求1-8中任一项所述的缓冲结构。
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