CN110418486A - A kind of double plasma resonator - Google Patents
A kind of double plasma resonator Download PDFInfo
- Publication number
- CN110418486A CN110418486A CN201910655980.1A CN201910655980A CN110418486A CN 110418486 A CN110418486 A CN 110418486A CN 201910655980 A CN201910655980 A CN 201910655980A CN 110418486 A CN110418486 A CN 110418486A
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- resonant cavity
- cooled jacket
- resonator
- external water
- waveguide
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- 238000010276 construction Methods 0.000 claims abstract description 4
- 239000000498 cooling water Substances 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 210000002381 plasma Anatomy 0.000 abstract description 41
- 239000010453 quartz Substances 0.000 abstract description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 6
- 230000006378 damage Effects 0.000 abstract description 5
- 239000003708 ampul Substances 0.000 abstract description 3
- 239000002994 raw material Substances 0.000 abstract description 3
- 239000000376 reactant Substances 0.000 abstract description 3
- 230000036632 reaction speed Effects 0.000 abstract description 3
- 238000000151 deposition Methods 0.000 description 17
- 230000008021 deposition Effects 0.000 description 17
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000005137 deposition process Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000001808 coupling effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000005491 wire drawing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/28—Cooling arrangements
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- Plasma Technology (AREA)
Abstract
The invention discloses a kind of double plasma resonators, including external water-cooled jacket, it is placed in external water-cooled jacket and the resonant cavity of cylindrical thin-wall construction, the waveguide that is connected with resonant cavity and supports resonant cavity and the lower part water-cooled jacket for being set in outside waveguide and supporting external water-cooled jacket, the both ends of the resonant cavity and external water-cooled jacket are respectively equipped with the step-like circular open of reduced diameter, and the end of the resonant cavity and the end of outside water-cooled jacket are equipped with certain gap.Double plasma resonator of the present invention, using Cylindrical resonant cavity, pass through theoretical calculation, design, it is then two plasmaspheres of generation in resonant cavity, the reaction speed of gas raw material can be improved in this way, optimized the uniformity of reactant by the microwave energy of the relative position pro rate of waveguide and resonant cavity input for two plasmas, it avoids generating the plasma that energy is excessively concentrated when high microwave energy inputs simultaneously, causes the destruction of resonant cavity, quartz ampoule.
Description
Technical field
The present invention relates to technical fields more particularly to a kind of double plasma resonators such as preform processing.
Background technique
Plasma Enhanced Chemical Vapor Deposition (PECVD) (PCVD) is one of the main technique of preform processing, which has heavy
Accurate, the careful feature of product process control, and plasmon resonances are the cores of the process equipment.Plasma resonance
Device system includes plasma resonant, waveguide two parts composition, the microwave transmission that waveguide generates microwave generator
It is coupled to plasma resonant, emits high frequency microwave energy into quartz liner by plasma resonant to complete to deposit
Process.The matching of plasma and microwave is particularly significant in resonant cavity during this, otherwise, mismatch between the two
It not only will affect coupling effect, cause the loss of energy, but also system device easy to damage, and influence the uniformity and essence of deposition
Degree.
Be currently used for preform manufacture plasma resonant be divided into it is two different with cylindrical type for coaxial type
Structure type.Wherein cylindrical type is more easily implemented the PCVD processing of major diameter prefabricated rods.The cavity structure letter of cylindrical type resonant cavity
It is single, it is easily worked manufacture, deposition properties are excellent.But existing various resonator is single plasma form, i.e. microwave-excitation is humorous
After vibration, a plasma ball is formed in reaction bushing pipe.Will lead to three problems in this way: 1) energy is excessively concentrated, in high energy
When amount application (microwave energy > 10kW), it is easily damaged resonant cavity；2) high-energy is realized in the short region of a plasma
Coupling, can lead to the problem of deposition it is non-uniform；3) coupling that high-energy is realized in the short region of a plasma, is not achieved
The linear scale of deposition rate increases, i.e., in high power area, deposition rate can be lower than expected linearly increasing value.
Summary of the invention
Technical problem to be solved by the present invention lies in view of the deficiency of the prior art, provide a kind of energy raising
The double plasma resonator of stick quality and efficiency processed.
The technical scheme adopted by the invention is as follows: double plasma resonator, it is characterised in that: including external water-cooled jacket,
It is placed in external water-cooled jacket and the resonant cavity of cylindrical thin-wall construction, the waveguide that is connected with resonant cavity and supports resonant cavity
And it is set in outside waveguide and supports the lower part water-cooled jacket of external water-cooled jacket, the both ends point of the resonant cavity and external water-cooled jacket
Not She You reduced diameter step-like circular open, the end of the end of the resonant cavity and external water-cooled jacket be equipped with it is certain between
Gap.
According to the above technical scheme, the condition of double plasma is formed are as follows:
The diameter d of resonant cavity cavityr=110 ± 10mm mm
By calculating and emulating, for the effect for guaranteeing double plasma, double plasma central point spacing lp≥0.4lr；Then
It is required that the long l in double plasma resonant cavity inner cavityr>=100mm, meanwhile, to guarantee the use of equipment and the matching of deposition space, lr≤
200mm
In the above conditions, 90% energy peak width of plasma
lpw=0.15lr
According to the above technical scheme, the parameter of the resonant cavity is defined below:
lr=100mm~200mm, dr=110 ± 10mm, ds=30mm~60mm,
ls=45mm~60mm
Wherein lrFor the length of resonant cavity cavity, drFor the diameter of resonator cavity, dsFor resonant cavity both ends circle
The diameter of opening, lsFor the length of both ends circular open, lpwFor energy of plasma peak width.
According to the above technical scheme, the opening diameter of resonant cavity is not greater than 75mm, and length cannot be less than 45mm.
According to the above technical scheme, the resonance cavity outer wall is close to the inner wall of external water-cooled jacket, the outer end and outside of opening
The opening of water-cooled jacket is close to.
According to the above technical scheme, the external water-cooled jacket, resonator, waveguide and lower part water-cooled jacket are detachable knot
Structure.
According to the above technical scheme, external water-cooled jacket, resonator, waveguide and lower part water-cooled jacket be can along centerline direction
The detachable structure of separation and symmetrical arrangement.
According to the above technical scheme, the external water-cooled jacket and lower part water-cooled jacket are respectively provided with independent cooling water disengaging and connect
Mouthful.
According to the above technical scheme, the waveguide and lower part water-cooled jacket are rectangular configuration, and the waveguide can be set
The position among off-resonance chamber axial direction also can be set in resonant cavity axial direction middle position.
It is obtained by the present invention to have the beneficial effect that
1, double plasma resonator of the present invention by theoretical calculation, is designed using Cylindrical resonant cavity,
It is then two plasmaspheres of generation in resonant cavity, two plasmas are in the relative position ratio of waveguide and resonant cavity point
The reaction speed of gas raw material can be improved in microwave energy with input in this way, optimizes the uniformity of reactant, while avoiding
The plasma that energy is excessively concentrated is generated when high microwave energy inputs, and causes the destruction of resonant cavity, quartz ampoule.
2, the present invention uses Cylindrical resonant cavity and rectangular waveguide, can split from centre, thus in deposition process
After, quickly and easily disassembled from deposition lathe.Thus can deposition with melt contracting function be integrated in it is same
On lathe.After the completion of deposition, bushing pipe is still mounted on lathe, keeps the stabilization and cleaning of internal atmosphere.Resonator is dismantled, together
Shi Qidong melts contracting blowtorch and heats to bushing pipe, keeps liner temperature, can reach completely to avoid two problems being analyzed above in this way
The rod effect processed of high efficiency, high quality.
Detailed description of the invention
Fig. 1 is structure chart of the invention.
Fig. 2 is the scale diagrams of resonant cavity.
Fig. 3 is the status diagram to form plasma.
Specific embodiment
The present invention will be further explained below with reference to the attached drawings.
As shown in Figure 1, present embodiments provide a kind of double plasma resonator, including external water-cooled jacket 3, it is placed in outside
In water-cooled jacket 3 and the resonant cavity 1 of cylindrical thin-wall construction, the waveguide 5 that is connected with resonant cavity 2 and supports resonant cavity and
It is set in outside waveguide and supports the lower part water-cooled jacket 6 of external water-cooled jacket, the both ends point of the resonant cavity 1 and external water-cooled jacket 3
Not She You reduced diameter step-like circular open 2,1 outer wall of resonant cavity is close to the inner wall of external water-cooled jacket 3, the outer end of opening
It is close to the opening of external water-cooled jacket.The end of the resonant cavity 1 and the end of external water-cooled jacket are equipped with certain gap.Its
In, the external water-cooled jacket 3 and lower part water-cooled jacket 6 are respectively provided with independent cooling water inlet and outlet connectors 4,7, and interface caliber is 1/2
Inch.
It is the condition of resonance to form double plasma below:
Cylindrical cavity diameter dr=110 ± 10mm mm (this point is the condition to form double plasma indispensability)
By calculate and emulation, for guarantee double plasma effect:
That is double plasma central point spacing lp=0.4lr；
Then require the long l in double plasma resonant cavity inner cavityr>=100mm, meanwhile, for use and the deposition space for guaranteeing equipment
Matching, lr≤200mm
In the above conditions, 90% energy peak width of plasma
lpw=0.15lr
Namely: the parameter of the resonant cavity is defined below:
lr=100mm~200mm, dr=110 ± 10mm, ds=30mm~60mm,
ls=45mm~60mm
Wherein, lrFor the length of resonant cavity cavity, drFor the diameter of resonant cavity cavity, dsFor resonant cavity both ends circular open
Diameter, lsFor the length of both ends circular open, lpDouble plasma central point spacing.In addition, the opening diameter of resonant cavity 1 is not
It obtains and is greater than 75mm, length cannot be less than 45mm, to prevent microwave from leakage.
The course of work of the invention is as follows: in the case where frequency is the microwave-excitation of 2.45GHz, passing through double plasma resonance
Two connected plasmas 9 are generated in the quartz liner 8 of chamber, as shown in Figure 3.Two plasmas press waveguide and resonant cavity
Relative position pro rate input microwave energy, the reaction speed of gas raw material can be improved in this way, optimize reactant
Uniformity, while avoiding generating the plasma that energy is excessively concentrated when high microwave energy inputs, cause resonant cavity, quartz ampoule
Destruction.Wherein, corresponding maximum microwave power 30kW, cooling water condition: inlet pressure 3Bar~4Bar, cooling water always flow
Amount is 15~20L/min, temperature difference t=10~20 DEG C of cooling water inlet and outlet.Such production process, ensure that quartz
8 inner cavity of bushing pipe keeps the cleaning of height in entirely rod motion processed, does not contact outside air, avoids moisture content, dust to inner cavity
Pollution.
In the present embodiment, the waveguide 5 and lower part water-cooled jacket 6 are rectangular configuration, and the lower section of the resonant cavity 1 has
One rectangular aperture, waveguide 5 are welded at rectangular aperture.Wherein, the waveguide 5 can be set in resonant cavity axial direction interposition
Set, also can be set the position among off-resonance chamber axial direction, different positions can generate different-energy rank it is double it is equal from
Daughter.
Due to entire rod motion processed include deposition with melt contracting, be typically divided to two equipment to complete: deposition lathe with
Melt contracting lathe.Bushing pipe completes deposition process on deposition lathe, then unloads from deposition lathe, then be installed to and melt contracting lathe
On.Two can thus be led to the problem of: 1, in the manufacture of many Special Products, due to deposition materials doping, being caused
Post-depositional bushing pipe internal stress is very big, and the liner temperature that just deposition has terminated is very high (about 1000 DEG C), and stress will not at high temperature
It damages, but during dismantling, reinstalling, the time is a little longer, liner temperature decline, bushing pipe will rupture.2,
After bushing pipe is disassembled from deposition lathe, liner inner surface inevitably touches external air, can be by outside
Environmental pollution causes water peak to increase, attenuation increases and the problems such as wire drawing intensity.
To solve the above problems, resonator of the invention uses detachable structure, i.e., described external water-cooled jacket 3, resonance
Device 1, waveguide 5 and lower part water-cooled jacket 6 are detachable structure.Specifically, its structure is as shown in Figure 1, 2, external water-cooled jacket
3, resonator 1, waveguide 5 and lower part water-cooled jacket 6 are separable and symmetrical arrangement along centerline direction (axial direction)
Detachable structure.I.e. external water-cooled jacket 3, resonator 1 can be divided axially into the two independent parts in left and right, two independences along it
Part be connected and fix by bolt.
Double plasma resonator of the present invention can be split along axial direction from centre, greatly facilitate the installation and removal of equipment,
After the completion of deposition process, resonator can be removed immediately, concedes space, be then followed by and bushing pipe is melted using flaming mode
Contracting, avoids interference of the resonator to contracting space is melted.
Claims (9)
1. a kind of double plasma resonator, it is characterised in that: including external water-cooled jacket, be placed in external water-cooled jacket and in cylinder
The resonant cavity of shape thin-wall construction, the waveguide for being connected with resonant cavity and supporting resonant cavity and to be set in waveguide outer and support
The both ends of the lower part water-cooled jacket of external water-cooled jacket, the resonant cavity and external water-cooled jacket are respectively equipped with the step-like circle of reduced diameter
The end of shape opening, the end of the resonant cavity and external water-cooled jacket is equipped with certain gap.
2. double plasma resonator according to claim 1, it is characterised in that: form the condition of double plasma are as follows:
The diameter d of resonant cavity cavityr=110 ± 10mm mm, the long l in double plasma resonant cavity inner cavityr>=100mm, in double plasma
Heart point spacing lp≥0.4lr。
3. double plasma resonator according to claim 2, it is characterised in that: the parameter of resonant cavity is defined below:
lr=100mm~200mm, ds=30mm~60mm,
ls=45mm~60mm；
Wherein lrFor the length of resonant cavity cavity, dsFor the diameter of resonant cavity both ends circular open, lsFor the length of both ends circular open
Degree.
4. double plasma resonator according to claim 2, it is characterised in that: the opening diameter of resonant cavity is not greater than
75mm, length cannot be less than 45mm.
5. double plasma resonator according to claim 1 or 2, it is characterised in that: the resonance cavity outer wall is close to outer
The inner wall of portion's water-cooled jacket, the outer end of opening are close to the opening of external water-cooled jacket.
6. the resonator of detachable double plasma according to claim 1 or 2, it is characterised in that: the external water
Cold set, resonator, waveguide and lower part water-cooled jacket are detachable structure.
7. the resonator of detachable double plasma according to claim 1 or 2, it is characterised in that: external water-cooled jacket,
Resonator, waveguide and lower part water-cooled jacket are the detachable knot of the separable and symmetrical arrangement along centerline direction
Structure.
8. the resonator of detachable double plasma according to claim 1 or 2, it is characterised in that: the external water
Cold set and lower part water-cooled jacket are respectively provided with independent cooling water inlet and outlet connectors.
9. the resonator of detachable double plasma according to claim 1 or 2, it is characterised in that: the waveguide
It is rectangular configuration with lower part water-cooled jacket, the waveguide can be set in resonant cavity axial direction middle position, also can be set inclined
From the axial intermediate position of resonant cavity.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910655980.1A CN110418486A (en) | 2019-07-19 | 2019-07-19 | A kind of double plasma resonator |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910655980.1A CN110418486A (en) | 2019-07-19 | 2019-07-19 | A kind of double plasma resonator |
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| CN110418486A true CN110418486A (en) | 2019-11-05 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114189973A (en) * | 2021-12-09 | 2022-03-15 | 浙江大学湖州研究院 | Microwave plasma torch device with double microwave resonant cavities and using method thereof |
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