CN102869182A - Large-volume microwave plasma generating device based on coupling window radiation - Google Patents
Large-volume microwave plasma generating device based on coupling window radiation Download PDFInfo
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- CN102869182A CN102869182A CN2012103371292A CN201210337129A CN102869182A CN 102869182 A CN102869182 A CN 102869182A CN 2012103371292 A CN2012103371292 A CN 2012103371292A CN 201210337129 A CN201210337129 A CN 201210337129A CN 102869182 A CN102869182 A CN 102869182A
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Abstract
The invention relates to a large-volume microwave plasma generating device based on coupling window radiation, which belongs to the technical field of microwave application. The generating device comprises a rectangular waveguide, an inductive coupling window, a resonant cavity shell, a rectangular quartz glass frame, a short circuit piston, an absorbing material and a handle. The rectangular waveguide is communicated with one end of a resonant cavity through the inductive coupling window, and an air pressure measurement port, a working gas inlet and a working gas outlet are formed in the resonant cavity shell. The rectangular quartz glass frame is arranged in the resonant cavity, and the two end parts of the rectangular quartz glass frame are embedded on the side walls of the resonant cavity and form closed spaces with the resonant cavity side walls at the two sides. The short circuit piston is arranged on the other end of the resonant cavity and is in slide fit with the resonant cavity shell. The absorbing material is fixed on the front end part of the short circuit piston, and the handle is fixed on the rear end part of the short circuit piston. The device can generate large-volume microwave plasmas at normal temperature and normal pressure, a nanometer material is efficiently produced, and exhaust gases and tail gases are efficiently treated.
Description
Technical field
The present invention relates to a kind of large volume microwave plasma generation device based on the coupling window radiation, belong to technical field of microwave application.
Background technology
Material science and technology play vital effect as one of the 21 century mankind three large Key Scientific And Technicals in national economy and Defence business, the New Times of material science research has then been started in the appearance of nanometer technology.Different from the material of macro-size, (yardstick is that electronic structure and the crystal structure on 0.1 ~ 100nm) surface changes to nano material, produces skin effect, small-size effect, quantum effect, macro quanta tunnel effect and interfacial effect etc.; And show excellent light, electricity, magnetic and chemical characteristic, thereby have broad application prospects at numerous areas.
The method for preparing at present nano material is a lot, but the whole bag of tricks has himself objective shortcoming.Such as conventional wet, complex technical process, particle surface chemical state are difficult to control, oxygen free condition is difficult to create, can't realize serialization and automatic batch production; The gas-liquid phase method: chemism is low, reaction speed is slow, broad spectrum activity is poor, can only prepare a few nano particle; Direct-current plasma and dielectric barrier discharge plasma method: exist electrode and its electric field to have polarity and inhomogeneities, easily make the magnetic nanoparticle generation concatenation of generation and reunite and both positive and negative polarity is linked to each other and cause occuring between the electrode punch-through; Chemical vapour deposition technique (CVD) and radio frequency plasma method: excess Temperature, need vacuum condition and energy consumption large.
Microwave plasma is owing to having many merits, the nano material narrower, hard aggregation-free that is expected to that synthetic purity is higher, granularity is controlled, particle diameter distributes.Its advantage is: electron temperature is high, and operating air pressure can be lower, degree of ionization is high (approximately high 10 times); Reaction equilibrium constant is high, temperature gradient is large, homogeneous nucleation rate is high, powder is thinner; The convection action that the wave action of electromagnetic field of high frequency and large temperature gradient cause makes grain diameter more even; Do not have internal electrode, plasma is pure; The excited state particle life-span is long, and chemically active species is many; Microwave energy is to evenly promptly heating of reactant molecule, and " the instantaneous heating " by microwave reaches the characteristic of " instantaneous stopped heating " can the manual control crystallization rate; Microwave plasma can be controlled in specific space, and it is convenient to use.
In urbanization and process of industrialization, World Economics by leaps and bounds develops, and has also brought simultaneously numerous problem of environmental pollutions, has all brought serious harm such as the discharging of industrial waste gas and vehicle exhaust to environment and human physical and mental health.Scientific analysis shows, contains hundreds of different compound in the vehicle exhaust, and pollutant wherein has Solid Suspension particulate, carbon monoxide, carbon dioxide, hydrocarbon, oxynitrides, lead and oxygen sulfur compound etc.Large 3 times than own wt of the harmful exhausts of car discharge in a year.Britain's air cleaning and environmental protection association once delivered research report and claimed, the victim compares with traffic accident, and Britain dies from the air-polluting people every year will have more 10 times.Therefore the processing of these waste gas has become problem demanding prompt solution.Microwave plasma also becomes the primary selection of exhaust-gas treatment mode because its electron temperature is high, degree of ionization is high, the excited state particle life-span is long, chemically active species reaches the plurality of advantages such as microwave technology maturation more.
Summary of the invention
The present invention seeks to propose a kind of large volume microwave plasma generation device based on the coupling window radiation, to be used for the processing of preparations of nanomaterials and industrial waste gas and vehicle exhaust, and can under normal pressure, work long hours, be convenient to large-scale commercial Application.
The large volume microwave plasma generation device based on the coupling window radiation that the present invention proposes comprises rectangular waveguide, inductance type coupling window, resonant cavity shell, rectangle quartz glass frame, short-circuit plunger, absorbing material and handle; Described rectangular waveguide is communicated with an end of resonant cavity by the inductance type coupling window, and the resonant cavity shell is provided with barometric surveying mouth, working gas air inlet and working gas gas outlet; Described rectangle quartz glass frame places in the resonant cavity, and the both ends of rectangle quartz glass frame are embedded on the sidewall of resonant cavity, and the resonant cavity sidewall of rectangle quartz glass frame and both sides forms enclosure space; Described short-circuit plunger places the other end of resonant cavity, and short-circuit plunger becomes to be slidingly matched with the resonant cavity shell; Described absorbing material is fixed on the leading section of short-circuit plunger, and is positioned at resonant cavity, and described handle is fixed on the rearward end of short-circuit plunger, and is positioned at outside the resonant cavity.
The large volume microwave plasma generation device based on the coupling window radiation that the present invention proposes, its advantage is: can produce at normal temperatures and pressures the microwave plasma of large volume, prepare expeditiously nano material and process waste gas tail gas.Plasma mode device of the present invention, with respect to existing other microwave coupling mode, such as hole coupling and slit coupling, the coupling efficiency of the inductance type coupling window that the present invention adopts is high, elimination the loss of microwave transmission and coupling, can in sealed environment, form the large volume microwave plasma, in the nano material preparation, guarantee that material purity is higher on the one hand, can prevent in waste gas vent gas treatment process that on the other hand waste gas tail gas is diffused into other zone.In the plasma producing apparatus of the present invention, be installed in the adjustable sliding short-circuit plunger of rectangular cavity afterbody can the free adjustment cavity length so that microwave reaches optimum resonant state; Rectangular cavity is spliced by the polylith metallic plate, can guarantee that microwave is not revealed to cause hazard to person, makes things convenient for simultaneously dismounting and the installation of device.
Description of drawings
Fig. 1 is the structural representation based on the large volume microwave plasma generation device of coupling window radiation that the present invention proposes.
Fig. 2 is the A-A profile of Fig. 1.
Fig. 3 is the B-B profile of Fig. 2.
Fig. 4 is the distribution map of the electric field with the corresponding section of Fig. 1.
Fig. 5 is the distribution map of the electric field with the corresponding section of Fig. 2.
In Fig. 1 ~ 3, the 1st, adpting flange, the 2nd, rectangular waveguide, the 3rd, inductance type coupling window, the 4th, resonant cavity shell, the 5th, rectangle quartz glass frame, the 6th, barometric surveying mouth, the 7th, working gas air inlet, the 8th, short-circuit plunger, the 9th, absorbing material, the 10th, handle, the 11st, working gas gas outlet.
Embodiment
The large volume microwave plasma generation device based on the coupling window radiation that the present invention proposes, its structure comprises rectangular waveguide 2, inductance type coupling window 3, resonant cavity shell 4, rectangle quartz glass frame 5, short-circuit plunger 8, absorbing material 9 and handle 10 as shown in Figure 1.Rectangular waveguide 2 is communicated with an end of resonant cavity by inductance type coupling window 3, and resonant cavity shell 4 is provided with barometric surveying mouth 6, working gas air inlet 7 and working gas gas outlet 11.Rectangle quartz glass frame 5 places in the resonant cavity, and the both ends of rectangle quartz glass frame 5 are embedded on the sidewall of resonant cavity, and rectangle quartz glass frame 5 forms enclosure space with the resonant cavity sidewall of both sides.Short-circuit plunger 8 places the other end of resonant cavity, and short-circuit plunger 8 is slidingly matched with 4 one-tenth on resonant cavity shell.Absorbing material 9 is fixed on the leading section of short-circuit plunger 8, and is positioned at resonant cavity.Handle 10 is fixed on the rearward end of short-circuit plunger 8, and is positioned at outside the resonant cavity.
The plasma producing apparatus that the present invention proposes, the model of rectangular waveguide wherein is BJ22.Microwave coupling device wherein is weldingly connected successively by flange and inductance type coupling window and forms, and link to each other with the external perimysium reference microwave device by flange, this microwave coupling device is based on the inductance type coupling window, this inductance type coupling window can make microwave be enclosed in rectangular cavity inside to the full extent, make microwave freely be fed into without barrier in the rectangular cavity, when microwave during at the rectangular cavity internal resonance, only have the microwave of minute quantity to reflex to microwave source by coupling window, wherein coupling window also can be designed as condenser type or resonant mode coupling window.Rectangular cavity is comprised of three parts, is respectively rectangular cavity shell, round rectangle quartz glass frame and is welded on inlet, outlet and the barometric surveying interface on the copper coin before and after the rectangular cavity.Rectangular cavity is a cuboid in essence, its length, width are with highly all different, it is spliced by six copper coins, design is in order to dismantle easily and to install like this, copper coin is opened a plurality of pores before and after rectangular cavity, is respectively the working gas air inlet, gives vent to anger and the barometric surveying mouth.Round rectangle quartz glass frame is embedded in rectangular cavity inside, round rectangle quartz glass frame only has four faces, two other face is the front and back copper coin of rectangular cavity, such design can guarantee to form the working gas space of a sealing, this seal operation space is extremely important to the microwave plasma that produces different air pressure or different operating gas, can make things convenient for again the turnover of working gas and measure the interior working gas air pressure of round rectangle quartz glass frame, the seal cavity that round rectangle quartz glass frame provides is vital in preparation nano material and waste gas vent gas treatment.Rectangular cavity links to each other with the form that the microwave coupling device is fixed with welding or screw, and microwave is fed into the inner round rectangle quartz glass frame inside that also further is radiated of rectangular cavity by the inductance type coupling window.Resonant cavity also can be designed as cylindrical cavity.The adjustable sliding short-circuit plunger directly inserts on the rearward end copper coin of rectangular cavity in the mode that is slidingly matched, it can be free to slide to regulate the length of rectangular cavity in certain distance, make microwave produce good resonance in rectangular cavity inside, produce the forceful electric power place of large volume, and then produce the microwave plasma of large volume in round rectangle quartz glass frame the inside, improve the efficient of nano material preparation and waste gas vent gas treatment.
Below in conjunction with accompanying drawing, introduce in detail the operation principle of apparatus of the present invention:
The microwave plasma generation device for the preparation of nano material and processing industrial waste gas and vehicle exhaust that the present invention relates to comprises microwave coupling device, rectangular cavity and adjustable sliding short-circuit plunger.Flange 1, BJ22 rectangular waveguide 2 weld together successively with inductance type coupling window 3, then the left side copper coin of inductance type coupling window and rectangular cavity 4 welds together, six copper coins form rectangular cavity 4 by fastened by screw, the adjustable sliding short-circuit plunger directly inserts the middle of the right copper coin of rectangular cavity 4, round rectangle quartz glass frame is embedded in the front-back copper coin of rectangular cavity 4 to form enclosure space, and the air inlet 7 of barometric surveying interface 6, working gas, the gas outlet 11 of working gas are welded on respectively on the front and back copper coin of rectangular cavity 4.Whole microwave plasma generation device links to each other with screw with the external perimysium reference microwave device by flange 1.
Microwave is by 2 transmission of BJ22 rectangular waveguide, be coupled to rectangular cavity 4 inside through inductance type coupling window 3, because round rectangle quartz glass frame 5 does not have impact substantially on the transmission of microwave, microwave can be fed into round rectangle quartz glass frame 5 inside, can change the length of rectangular cavity 4 by the position of regulating the adjustable sliding short-circuit plunger, make microwave at rectangular cavity 4 internal resonances, and in the round rectangle quartz glass frame 5 inner strong microwave electric field that form large volume, section Electric Field Distribution such as Fig. 4 of plasma producing apparatus, shown in 5, the microwave highfield makes the working gas ionization of round rectangle quartz glass frame 5 inside produce the large volume microwave plasma.
For the preparation nano material, air inlet 7 passes into the reaction mixture gas body, the material gatherer that gas outlet 11 access users are made by oneself, barometric surveying interface 6 access air gauges to be measuring the working gas air pressure of round rectangle quartz glass frame inside, and the nano material that the reaction mixture gas body forms after by microwave plasma can enter gatherer by gas outlet 11 by air-flow.By regulating air pressure size and the microwave power of working gas, can be used for preparing the different nano material of characteristic.For processing industrial waste gas and vehicle exhaust, air inlet 7 passes into waste gas or tail gas, gas outlet 11 is accessed the device of next step handling procedures or is directly linked to each other with atmosphere, waste gas or tail gas are entered handling procedure of lower step or are directly passed in the atmosphere by gas outlet 11 after by Microwave plasma treatment, and different waste gas or the air pressure of tail gas different waste gas or the treatment effeciency of tail gas with the microwave power correspondence.
Claims (1)
1. the large volume microwave plasma generation device based on the coupling window radiation is characterized in that this plasma generating means comprises rectangular waveguide, inductance type coupling window, resonant cavity shell, rectangle quartz glass frame, short-circuit plunger, absorbing material and handle; Described rectangular waveguide is communicated with an end of resonant cavity by the inductance type coupling window, and the resonant cavity shell is provided with barometric surveying mouth, working gas air inlet and working gas gas outlet; Described rectangle quartz glass frame places in the resonant cavity, and the both ends of rectangle quartz glass frame are embedded on the sidewall of resonant cavity, and the resonant cavity sidewall of rectangle quartz glass frame and both sides forms enclosure space; Described short-circuit plunger places the other end of resonant cavity, and short-circuit plunger becomes to be slidingly matched with the resonant cavity shell; Described absorbing material is fixed on the leading section of short-circuit plunger, and is positioned at resonant cavity, and described handle is fixed on the rearward end of short-circuit plunger, and is positioned at outside the resonant cavity.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110418486A (en) * | 2019-07-19 | 2019-11-05 | 武汉光盛通设备咨询有限公司 | A kind of double plasma resonator |
| CN114736029A (en) * | 2022-04-09 | 2022-07-12 | 上海财盈半导体股份有限公司 | Microwave focusing method ceramic welding device and method |
| CN115821222A (en) * | 2022-09-27 | 2023-03-21 | 南通派锐泰特精密科技有限公司 | Microwave plasma generator and magnetron sputtering film forming apparatus using the same |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110418486A (en) * | 2019-07-19 | 2019-11-05 | 武汉光盛通设备咨询有限公司 | A kind of double plasma resonator |
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| CN114736029B (en) * | 2022-04-09 | 2024-04-12 | 上海财盈半导体股份有限公司 | Ceramic welding device and method by microwave focusing method |
| CN115821222A (en) * | 2022-09-27 | 2023-03-21 | 南通派锐泰特精密科技有限公司 | Microwave plasma generator and magnetron sputtering film forming apparatus using the same |
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Application publication date: 20130109 |