CN211240240U - Double-plasma resonator - Google Patents
Double-plasma resonator Download PDFInfo
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- CN211240240U CN211240240U CN201921140930.1U CN201921140930U CN211240240U CN 211240240 U CN211240240 U CN 211240240U CN 201921140930 U CN201921140930 U CN 201921140930U CN 211240240 U CN211240240 U CN 211240240U
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Abstract
The utility model discloses a two plasma syntonizers, including outside water-cooling jacket, arrange in outside water-cooling jacket and be cylindric thin wall structure's resonant cavity, be linked together and support the wave guide of resonant cavity and the cover is established outside the wave guide and is supported the lower part water-cooling jacket of outside water-cooling jacket with the resonant cavity, the both ends of resonant cavity and outside water-cooling jacket are equipped with the circular opening of step form that the external diameter dwindled respectively, the tip of resonant cavity and the tip of outside water-cooling jacket are equipped with certain clearance. Two plasma syntonizers, adopt cylindrical resonant cavity, through theoretical calculation, design, then produce two plasma balls in resonant cavity, two plasmas are according to the microwave energy of the relative position proportion distribution input of wave guide and resonant cavity, can improve the reaction rate of gaseous raw materials like this, optimize the homogeneity of reactant, avoid producing the too concentrated plasma of energy when high microwave energy input simultaneously, cause the destruction of resonant cavity, quartz capsule.
Description
Technical Field
The utility model relates to a technical field such as optical fiber perform processing especially relates to a two plasma syntonizers.
Background
Plasma Chemical Vapor Deposition (PCVD) is one of the main processes for optical fiber preform fabrication, which has the characteristics of precise and delicate control of the deposition process, and the plasma resonator is the core part of the fabrication apparatus. The plasma resonator system comprises a plasma resonant cavity and a waveguide tube, wherein the waveguide tube couples microwave transmission generated by a microwave generator to the plasma resonant cavity, and high-frequency microwave energy is emitted into the quartz lining tube through the plasma resonant cavity to complete the deposition processing process. In the process, the matching of the plasma and the microwave in the resonant cavity is very important, otherwise, the mismatching between the plasma and the microwave not only influences the coupling effect and causes energy loss, but also easily damages system devices and influences the uniformity and precision of deposition.
The existing plasma resonant cavities for manufacturing optical fiber preforms are divided into two different structural types, namely a coaxial type and a cylindrical type. Wherein the cylindrical shape is easier to realize the PCVD processing of the large-diameter prefabricated rod. The cavity of the cylindrical resonant cavity has simple structure, easy processing and manufacture and excellent deposition performance. However, the existing resonators are in the form of single plasma, i.e. after microwave excitation resonance, a plasma ball is formed in the reaction liner tube. This leads to three problems: 1) the energy is too concentrated, and the resonant cavity is easily damaged when the high-energy application (microwave energy is more than 10 kW); 2) the high energy coupling realized in a short area of the plasma can cause the problem of uneven deposition; 3) high energy coupling is achieved in a short region of the plasma without achieving a linear proportional increase in deposition rate, i.e., in the high power region, the deposition rate may be below the expected linear increase.
SUMMERY OF THE UTILITY MODEL
The utility model aims to solve the technical problem that to the not enough of above-mentioned prior art existence, provide a two plasma syntonizers that can improve system stick quality and efficiency.
The utility model discloses the technical scheme who adopts does: a dual plasma resonator, characterized by: the water cooling device comprises an external water cooling sleeve, a resonant cavity which is arranged in the external water cooling sleeve and is in a cylindrical thin-wall structure, a waveguide tube which is communicated with the resonant cavity and supports the resonant cavity, and a lower water cooling sleeve which is sleeved outside the waveguide tube and supports the external water cooling sleeve, wherein step-shaped round openings with reduced outer diameters are respectively arranged at two ends of the resonant cavity and the external water cooling sleeve, and a certain gap is arranged between the end part of the resonant cavity and the end part of the external water cooling sleeve.
According to the technical scheme, the conditions for forming the double plasmas are as follows:
diameter d of cavity of resonant cavityr＝110±10mm mm
Through calculation and simulation, in order to ensure the effect of the double plasmas, the distance l between the central points of the double plasmasp≥0.4lr(ii) a The cavity length l of the dual plasma resonator is requiredrNot less than 100mm, and simultaneously, in order to ensure the matching of the use of the equipment and the deposition spacer≤200mm
Under the above conditions, the plasma has 90% energy peak width
lpw＝0.15lr
According to the technical scheme, the parameters of the resonant cavity are defined as follows:
lr＝100mm～200mm，dr＝110±10mm，ds＝30mm～60mm，
ls＝45mm～60mm
wherein lrIs the length of the cavity of the resonant cavity, drIs the diameter of the cavity of the resonant cavity, dsThe diameter of the circular openings at the two ends of the resonant cavity, lsIs the length of the circular openings at both ends, /)pwIs the plasma energy peak width.
According to the technical scheme, the diameter of the opening of the resonant cavity is not more than 75mm, and the length of the opening is not less than 45 mm.
According to the technical scheme, the outer wall of the resonant cavity is tightly attached to the inner wall of the external water cooling jacket, and the outer end of the opening of the resonant cavity is tightly attached to the opening of the external water cooling jacket.
According to the technical scheme, the external water cooling jacket, the resonator, the waveguide tube and the lower water cooling jacket are of detachable structures.
According to the technical scheme, the external water cooling jacket, the resonator, the waveguide tube and the lower water cooling jacket are of detachable structures which can be separated along the direction of a central line and are arranged in bilateral symmetry.
According to the technical scheme, the external water cooling jacket and the lower water cooling jacket are respectively provided with an independent cooling water inlet and outlet interface.
According to the technical scheme, the waveguide tube and the lower water cooling jacket are of rectangular structures, and the waveguide tube can be arranged at the axial middle position of the resonant cavity and also can be arranged at a position deviating from the axial middle position of the resonant cavity.
The utility model discloses the beneficial effect who gains does:
1. two plasma syntonizers, adopt cylindrical resonant cavity, through theoretical calculation, design, then produce two plasma balls in resonant cavity, two plasmas are according to the microwave energy of the relative position proportion distribution input of wave guide and resonant cavity, can improve the reaction rate of gaseous raw materials like this, optimize the homogeneity of reactant, avoid producing the too concentrated plasma of energy when high microwave energy input simultaneously, cause the destruction of resonant cavity, quartz capsule.
2. The utility model discloses a cylindrical resonant cavity and rectangular waveguide can follow middle split to after the deposition process, convenient, swiftly dismantle from the deposition lathe. Thus, the deposition and the melting functions can be integrated on the same machine tool. After the deposition is finished, the liner tube is still arranged on the machine tool, and the internal atmosphere is kept stable and clean. The resonator is disassembled, and the melting blowtorch is started to heat the liner tube at the same time, so that the temperature of the liner tube is kept, the two problems of the above analysis can be completely avoided, and the rod making effect with high efficiency and high quality is achieved.
Drawings
Fig. 1 is a structural diagram of the present invention.
Fig. 2 is a schematic diagram of the dimensions of the resonant cavity.
Fig. 3 is a schematic view of a state where plasma is formed.
Detailed Description
The present invention will be further explained with reference to the accompanying drawings.
As shown in fig. 1, the present embodiment provides a dual plasma resonator, which includes an external water jacket 3, a resonant cavity 1 disposed in the external water jacket 3 and having a cylindrical thin-walled structure, a waveguide 5 communicated with the resonant cavity 2 and supporting the resonant cavity, and a lower water jacket 6 disposed outside the waveguide and supporting the external water jacket, wherein two ends of the resonant cavity 1 and the external water jacket 3 are respectively provided with a stepped circular opening 2 having a reduced outer diameter, an outer wall of the resonant cavity 1 is tightly attached to an inner wall of the external water jacket 3, and an outer end of the opening is tightly attached to an opening of the external water jacket. And a certain gap is formed between the end part of the resonant cavity 1 and the end part of the external water cooling jacket. The external water cooling jacket 3 and the lower water cooling jacket 6 are respectively provided with independent cooling water inlet and outlet interfaces 4 and 7, and the pipe diameter of the interfaces is 1/2 inches.
The resonance conditions for forming the double plasma are as follows:
diameter d of cylindrical cavityr110 + -10 mm mm (this is the necessary condition for forming double plasma)
Through calculation and simulation, in order to ensure the effect of the double plasmas:
i.e. the distance l between the center points of the two plasmasp＝0.4lr；
The cavity length l of the dual plasma resonator is requiredrNot less than 100mm, and simultaneously, in order to ensure the matching of the use of the equipment and the deposition spacer≤200mm
Under the above conditions, the plasma has 90% energy peak width
lpw＝0.15lr
Namely: the parameters of the resonant cavity are defined as follows:
lr＝100mm～200mm，dr＝110±10mm，ds＝30mm～60mm，
ls＝45mm～60mm
wherein lrIs the length of the cavity of the resonant cavity, drIs the diameter of the cavity of the resonant cavity, dsThe diameter of the circular openings at the two ends of the resonant cavity, lsIs the length of the circular openings at both ends, /)pDouble etcThe distance between the center points of the plasmas. In addition, the opening diameter of the resonant cavity 1 is not more than 75mm, and the length is not less than 45mm, so as to prevent microwave leakage.
The working process of the utility model is as follows: two connected plasmas 9 are generated in the quartz liner tube 8 through the dual plasma cavity under microwave excitation at a frequency of 2.45GHz, as shown in figure 3. The two plasmas distribute the input microwave energy according to the relative position proportion of the waveguide tube and the resonant cavity, so that the reaction speed of gas raw materials can be improved, the uniformity of reactants is optimized, and the damage of the resonant cavity and the quartz tube caused by the generation of plasmas with excessively concentrated energy when high microwave energy is input is avoided. Wherein, corresponding to maximum microwave power 30kW, the cooling water supply condition: the inlet pressure is 3 Bar-4 Bar, the total flow of cooling water is 15-20L/min, and the temperature difference delta t between the inlet and the outlet of the cooling water is 10-20 ℃. The production process ensures that the inner cavity of the quartz liner tube 8 keeps high cleanness and does not contact with the outside air in the whole rod making process, and avoids the pollution of moisture and dust to the inner cavity.
In this embodiment, the waveguide 5 and the lower water cooling jacket 6 are both rectangular structures, a rectangular opening is formed below the resonant cavity 1, and the waveguide 5 is welded at the rectangular opening. The waveguide 5 may be disposed at an axial middle position of the resonant cavity, or may be disposed at a position deviating from the axial middle position of the resonant cavity, and different positions may generate double plasmas of different energy levels.
Since the whole rod-making process includes deposition and melting, the whole rod-making process is generally completed by two devices: deposition machine tools and melt-down machine tools. The liner is removed from the deposition machine and then mounted on the melt-reduction machine. This creates two problems: 1. in the manufacture of many special products, the internal stress of the deposited liner tube is very large due to the doping of the deposition material, the temperature of the liner tube is very high (about 1000 ℃) immediately after the deposition is finished, the stress cannot cause damage at high temperature, but the temperature of the liner tube is reduced a little bit in the process of disassembly and reinstallation, and the liner tube can be cracked. 2. After the liner tube is detached from the deposition machine tool, the inner surface of the liner tube inevitably contacts with external air, and the liner tube is polluted by external environment, so that the problems of large water peak, increased attenuation, wire drawing strength and the like are caused.
In order to solve the above problems, the resonator of the present invention has a detachable structure, that is, the external water cooling jacket 3, the resonator 1, the waveguide 5, and the lower water cooling jacket 6 have a detachable structure. Specifically, as shown in fig. 1 and 2, the outer water jacket 3, the resonator 1, the waveguide 5, and the lower water jacket 6 are separable along the center line direction (axial direction) and have a detachable structure that is arranged in bilateral symmetry. Namely, the external water cooling jacket 3 and the resonator 1 can be divided into a left independent part and a right independent part along the axial direction of the external water cooling jacket and the resonator, and the two independent parts are connected and fixed through bolts.
The utility model discloses two plasma syntonizers can follow the axial from middle split, have greatly made things convenient for the installation and the dismantlement of equipment, accomplish the back at the deposition process, can pull down the syntonizer immediately, give way the space, then adopt the flame mode to melt the bushing pipe and contract after that, avoided the syntonizer to melt the interference in space that contracts.
Claims (9)
1. A dual plasma resonator, characterized by: the water cooling device comprises an external water cooling sleeve, a resonant cavity which is arranged in the external water cooling sleeve and is in a cylindrical thin-wall structure, a waveguide tube which is communicated with the resonant cavity and supports the resonant cavity, and a lower water cooling sleeve which is sleeved outside the waveguide tube and supports the external water cooling sleeve, wherein step-shaped round openings with reduced outer diameters are respectively arranged at two ends of the resonant cavity and the external water cooling sleeve, and a certain gap is arranged between the end part of the resonant cavity and the end part of the external water cooling sleeve.
2. The twin plasma resonator according to claim 1, characterized in that: the conditions for forming the double plasma are as follows: diameter d of cavity of resonant cavityr110 +/-10 mm, length of internal cavity of double plasma resonant cavityrNot less than 100mm, distance between center points of double plasmasp≥0.4lr。
3. The twin plasma resonator according to claim 2, characterized in that: the parameters of the resonator are defined as follows:
lr＝100mm～200mm，ds＝30mm～60mm，
ls＝45mm～60mm；
wherein lrIs the length of the cavity of the resonant cavity, dsThe diameter of the circular openings at the two ends of the resonant cavity, lsThe length of the circular opening at the two ends.
4. The twin plasma resonator according to claim 2, characterized in that: the diameter of the opening of the resonant cavity is not more than 75mm, and the length is not less than 45 mm.
5. The twin plasma resonator according to claim 1 or 2, characterized in that: the outer wall of the resonant cavity is tightly attached to the inner wall of the external water cooling jacket, and the outer end of the opening of the resonant cavity is tightly attached to the opening of the external water cooling jacket.
6. The twin plasma resonator according to claim 1 or 2, characterized in that: the external water cooling jacket, the resonator, the waveguide tube and the lower water cooling jacket are of detachable structures.
7. The twin plasma resonator according to claim 1 or 2, characterized in that: the external water cooling jacket, the resonator, the waveguide tube and the lower water cooling jacket are detachable structures which can be separated along the central line direction and are arranged in bilateral symmetry.
8. The twin plasma resonator according to claim 1 or 2, characterized in that: the external water cooling jacket and the lower water cooling jacket are respectively provided with an independent cooling water inlet and outlet interface.
9. The twin plasma resonator according to claim 1 or 2, characterized in that: the waveguide tube and the lower water cooling jacket are of rectangular structures, and the waveguide tube can be arranged at the axial middle position of the resonant cavity or at a position deviating from the axial middle position of the resonant cavity.
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| CN201921140930.1U CN211240240U (en) | 2019-07-19 | 2019-07-19 | Double-plasma resonator |
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| CN201921140930.1U CN211240240U (en) | 2019-07-19 | 2019-07-19 | Double-plasma resonator |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110418486A (en) * | 2019-07-19 | 2019-11-05 | 武汉光盛通设备咨询有限公司 | A kind of double plasma resonator |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110418486A (en) * | 2019-07-19 | 2019-11-05 | 武汉光盛通设备咨询有限公司 | A kind of double plasma resonator |
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