CN110361936B - Mask thickness detection device, storage mechanism, transmission mechanism and photoetching system - Google Patents

Mask thickness detection device, storage mechanism, transmission mechanism and photoetching system Download PDF

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Publication number
CN110361936B
CN110361936B CN201810251811.7A CN201810251811A CN110361936B CN 110361936 B CN110361936 B CN 110361936B CN 201810251811 A CN201810251811 A CN 201810251811A CN 110361936 B CN110361936 B CN 110361936B
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mask
mask plate
thickness
laser
plate
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CN110361936A (en
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牛增欣
郑教增
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Shanghai Micro Electronics Equipment Co Ltd
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Shanghai Micro Electronics Equipment Co Ltd
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Priority to CN201810251811.7A priority Critical patent/CN110361936B/en
Priority to TW108110540A priority patent/TWI696900B/en
Priority to PCT/CN2019/079742 priority patent/WO2019184921A1/en
Publication of CN110361936A publication Critical patent/CN110361936A/en
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0691—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of objects while moving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Abstract

The invention discloses a mask thickness detection device, a storage mechanism, a transmission mechanism and a photoetching system. Wherein, mask version thickness detection device includes: the thickness detection sensor comprises a laser emitting and receiving end, the laser emitting and receiving end is positioned at one side of the mask plate, emits laser along the horizontal direction of the mask plate to irradiate the mask plate, and receives the reflected laser; the driving component is used for driving the mask plate or the thickness detection sensor to move so as to enable the mask plate or the thickness detection sensor to move relatively in the thickness direction of the mask plate; and the thickness calculation unit calculates the thickness information of the mask. According to the mask thickness detection device provided by the embodiment of the invention, the thickness of the mask is detected through the thickness detection sensor, and the station connection distance of the mask is adjusted in real time according to the thickness information, so that the damage to the mask or a mask transmission mechanism caused by collision between adjacent masks is avoided.

Description

Mask thickness detection device, storage mechanism, transmission mechanism and photoetching system
Technical Field
The embodiment of the invention relates to the field of semiconductor manufacturing, in particular to a mask thickness detection device, a storage mechanism, a transmission mechanism and a photoetching system.
Background
The mask plate transmission device is used for transmitting the mask plate of the external world to the internal world of the photoetching equipment with certain precision, so that the exposure device can expose the pattern on the mask plate. FIG. 1 is a schematic view of a reticle distribution on a mask holder, and FIG. 2 is a partial enlarged view of the interior of the mask holder of FIG. 1. Referring to fig. 1 and 2, wherein 1 denotes a mask holder, 2 denotes a reticle placed in a first reticle pocket of the mask holder, and a plurality of reticle pockets for placing the reticles 2 are provided on the mask holder 1. In the transmission process of the mask 2, a plate fork of the mask transmission mechanism needs to extend into a gap between plate grooves, and the mask 2 is taken out or put in.
According to the SEMI P1-1101 Specification for Hard Surface Photomask Substrates standard, the same size of the mask has a certain tolerance on the outline dimension, and the following description is given by taking the physical outline dimension of the 6' mask as an example:
TABLE 16 reticle outline dimension Specification
Figure BDA0001607981350000011
It can be seen from table 1 that there is a wide range of difference in the dimensions of the profiles for the same type of reticle in terms of thickness.
In the chip manufacturing process, in order to improve the exposure process, a protective film (Pellicle) is often added on a common mask for protecting a graphic area, the physical dimensions of the protective film have different specifications, the maximum thickness of the quartz surface protective film of the mask is generally 4.5mm, the maximum thickness of the chromium surface protective film is generally 5mm, and the specific dimension is determined by plate making specifications. Meanwhile, the protective film can be distributed on one side of a quartz surface and one side of a chromium surface of the mask plate or both sides of the quartz surface and the chromium surface of the mask plate according to the requirements of a specific exposure process, so that the thickness of the whole mask plate is increased.
The current mask transmission scheme issues the size information of the mask through a control program or divides the size of the mask into two types according to theory, for example, the mask is divided into 6.35mm thick masks or 3.85mm thick masks during production, and the actual size of the mask is not considered.
According to the SEMI standard, the space between the grooves of each plate groove of the mask frame of the mask storage mechanism is 19.05mm, so if 6' masks with the thickness of 6.35mm are placed in each plate groove of the mask storage mechanism, and simultaneously protective films are uniformly distributed on the quartz surface and the chromium surface of each mask, when the masks are lifted upwards or descended in the taking and placing action of the masks, the masks in adjacent grooves collide, so that the masks or the mask transmission mechanism are damaged, the photoetching quality is further influenced, even mechanical faults occur, and the production efficiency is influenced.
Disclosure of Invention
The invention provides a mask thickness detection device, a storage mechanism, a transmission mechanism and a photoetching system, which can avoid the damage of the mask or the mask transmission mechanism caused by collision between adjacent masks.
In a first aspect, an embodiment of the present invention provides a reticle thickness detection apparatus, including:
the thickness detection sensor comprises a laser emitting and receiving end, the laser emitting and receiving end is positioned at one side of the mask plate, emits laser along the horizontal direction of the mask plate to irradiate the mask plate, and receives the reflected laser;
the driving component is used for driving the mask plate or the thickness detection sensor to move so that the mask plate and the thickness detection sensor relatively move in the thickness direction of the mask plate, wherein the horizontal direction of the mask plate is vertical to the thickness direction of the mask plate;
and the thickness calculation unit is used for calculating the thickness information of the mask plate according to the energy of the laser received by the laser emitting and receiving end and the movement position of the mask plate or the thickness detection sensor.
Optionally, the thickness detection sensor further comprises a laser reflector, the laser reflector and the laser emitting and receiving end are arranged on two sides of the mask plate oppositely, the laser emitting and receiving end emits laser along the horizontal direction of the mask plate, and the laser passing through the mask plate is reflected by the laser reflector and then is received by the laser emitting and receiving end again.
In a second aspect, an embodiment of the present invention provides a reticle storage mechanism, including the reticle thickness detection apparatus according to the first aspect of the present invention, further including:
the mask frame is provided with a mask groove for placing masks, the mask frame is located in the mask box, the mask box is arranged on the mask bearing platform, and the thickness detection sensor is arranged on the frame assembly towards the mask box.
Optionally, the drive member is coupled to the frame assembly for driving the frame assembly to move in a thickness direction of the reticle.
Optionally, the driving component is connected with the plate bearing table and used for driving the plate bearing table to move along the thickness direction of the mask.
In a third aspect, an embodiment of the present invention provides a reticle transmission mechanism, including the reticle thickness detection apparatus according to the first aspect of the present invention, further including:
the thickness detection sensor comprises a laser emitting and receiving end and is positioned at the front end of the first plate bearing fork or/and the second plate bearing fork, the laser emitting and receiving end emits laser along the horizontal direction of the mask plate to irradiate the side wall of the mask plate during detection, and the driving part drives the first plate bearing fork and the second plate bearing fork to move along the thickness direction of the mask plate.
In a fourth aspect, an embodiment of the present invention provides a reticle transfer system, including the reticle storage mechanism according to the second aspect of the present invention, the reticle storage mechanism being an outside world reticle storage mechanism, the reticle transfer system further including:
the mask box is provided with a mask plate, and the mask plate is conveyed to the external world mask plate storage mechanism through the external operating platform; a mask thickness detection device in the mask storage mechanism of the outside world detects the thickness information of the mask, and when the mask carries out station handover in the thickness direction, the actual movement distance in the thickness direction is adjusted in real time according to the thickness information.
Optionally, the reticle transfer system further comprises a first reticle alignment mechanism for eliminating an initial position deviation in a reticle transfer process of the outside world;
the second mask plate transmission mechanism is used for completing mask plate connection with the first mask plate transmission mechanism and mask plate connection with the mask plate table;
the second mask plate alignment mechanism is used for correcting the mask plate position in the process of connecting the second mask plate transmission mechanism and the mask table;
and the mask plate granularity detection mechanism is used for detecting the granularity of the surface of the mask plate before the first mask plate transmission mechanism transmits the mask plate from the external world mask plate storage mechanism to the internal world mask plate storage mechanism.
In a fifth aspect, an embodiment of the present invention provides another reticle transmission system, including the reticle transmission mechanism according to the third aspect of the present invention, and the reticle transmission system further includes:
the mask plate transmission mechanism is used for completing the circulation of mask plates between the external world mask plate storage mechanism and the internal world mask plate storage mechanism, at least before the mask plates are taken from the external world mask plate storage mechanism, the thickness information of the mask plates is detected through a mask plate thickness detection device on the mask plate transmission mechanism, and when the mask plates are subjected to station handover in the thickness direction, the actual movement distance in the thickness direction is adjusted in real time according to the thickness information.
Optionally, the reticle transfer system further comprises an external console, the external world reticle storage mechanism is in butt joint with the external console and stores the reticle-containing reticle pod sent by the external console;
the first mask plate alignment mechanism is used for eliminating initial position deviation in the mask plate transmission process of the outside world;
the second mask plate transmission mechanism is used for completing mask plate connection with the mask plate transmission mechanism and mask plate connection with the mask plate table;
the second mask plate alignment mechanism is used for correcting the mask plate position in the process of connecting the second mask plate transmission mechanism and the mask table;
and the mask plate granularity detection mechanism is used for detecting the granularity of the surface of the mask plate before the mask plate transmission mechanism transmits the mask plate from the external world mask plate storage mechanism to the internal world mask plate storage mechanism.
In a sixth aspect, an embodiment of the present invention provides a reticle transmission method, where the method is based on the reticle transmission system in the fourth aspect of the present invention, and the method includes:
the driving part drives the plate bearing table or the frame assembly to move along the thickness direction of the mask plate so as to enable the mask frame and the thickness detection sensor to move relatively along the thickness direction of the mask plate;
controlling a laser emitting and receiving end of the thickness detection sensor to emit laser along the horizontal direction of the mask plate in the movement process, and receiving the laser by the laser emitting and receiving end after the laser is reflected back;
calculating the thickness information of the mask plates in each plate groove according to the laser signals received by the laser transmitting and receiving ends and the movement position of the driving part in the relative movement process;
and storing the acquired thickness information of the mask plate into a mask plate information database, and adjusting the actual movement distance of the movement in the thickness direction in real time according to the thickness information in the process of station handover in the thickness direction of the mask plate.
In a seventh aspect, an embodiment of the present invention provides another reticle transmission method, where the method is based on the reticle transmission system in the fifth aspect of the present invention, and the method includes:
the mask plate transmission mechanism moves to a station position used for detecting the thickness of the mask plate in the mask plate storage mechanism of the outside world, so that the laser emitting and receiving ends at the front ends of the first and/or second mask bearing forks face the side wall of the mask plate, and the driving part drives the first and second mask bearing forks to move along the thickness direction of the mask plate;
the laser emitting and receiving end of the thickness detection sensor emits laser to the horizontal direction of the mask plate in the movement process and receives the laser reflected by the mask plate;
calculating the thickness information of the mask plates in each plate groove according to the laser signals received by the laser transmitting and receiving ends and the movement position of the driving part in the relative movement process;
and storing the acquired thickness information of the mask plate into a mask plate information database, and adjusting the actual movement distance in the thickness direction in real time according to the thickness information in the process of station handover in the thickness direction of the mask plate.
In an eighth aspect, an embodiment of the present invention provides a lithography system including the reticle transport system of the fourth or fifth aspect of the present invention.
According to the mask thickness detection device provided by the embodiment of the invention, the thickness of the mask main body and the thickness of the protective film positioned on the mask main body are detected by arranging the thickness detection sensor, so that the actual movement distance of vertical movement is adjusted in real time in the process of vertical station handover of the mask according to the thickness information, and the problem that the mask of adjacent grooves collides when the mask is lifted or lowered vertically in the taking and placing action of the mask, so that the mask or a mask transmission mechanism is damaged is solved.
Drawings
FIG. 1 is a schematic view of a reticle distribution on a mask holder;
FIG. 2 is an enlarged view of a portion of the interior of the mask holder of FIG. 1;
FIG. 3 is a schematic diagram of a reticle inspection device provided in an embodiment of the invention;
FIG. 4 is a schematic diagram of a thickness detection sensor in a reticle inspection device according to an embodiment of the present invention for inspecting a reticle;
FIG. 5 is a schematic view of a reticle storage mechanism provided in a second embodiment of the invention;
FIG. 6 is a schematic view of yet another reticle storage mechanism provided in a second embodiment of the invention;
FIG. 7 is a schematic diagram of a reticle transport mechanism provided in a third embodiment of the invention;
FIG. 8 is a schematic view of a reticle transport system provided in a fourth embodiment of the invention;
FIG. 9 is a flowchart of a reticle transfer method according to a sixth embodiment of the present invention;
FIG. 10 is a flowchart of a reticle transfer method according to a seventh embodiment of the present invention;
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.
Example one
The embodiment of the invention provides a mask thickness detection device, fig. 3 is a schematic view of the mask thickness detection device provided by the embodiment of the invention, and as shown in fig. 3, the mask thickness detection device comprises:
the thickness detection sensor comprises a laser emitting and receiving end 121, the laser emitting and receiving end 121 is positioned at one side of the mask 110, emits laser along the horizontal direction of the mask 110 to irradiate the mask 110, and receives the reflected laser;
a drive component (not shown) for driving the reticle 110 or the thickness detection sensor to move so that the reticle 110 and the thickness detection sensor move relatively in a direction along the thickness of the reticle 110, wherein the horizontal direction of the reticle 110 is perpendicular to the thickness direction of the reticle 110;
and a thickness calculation unit (not shown) for calculating thickness information of the mask 110 according to the laser signal received by the laser emitting and receiving end 121 and the movement position of the mask 110 or the thickness detection sensor.
The reticle 110 includes a reticle body 111 and a protective film 112 on a quartz surface or/and a chromium surface of the reticle body. The mask 110 is positioned on the mask holder 101, and a plate groove for placing the mask 110 is arranged in the mask holder 101. The drive member drives the mask holder 101 or the thickness detection sensor to move so that the reticle 110 and the thickness detection sensor relatively move in the thickness direction of the reticle 110. For example, in one embodiment, the mask holder 101 is fixed, the driving component drives the thickness detection sensor to move at a certain speed along the thickness direction of the mask 110 to be detected, and the laser emitted from the laser emitting and receiving end 121 sequentially scans all the masks 110 on the mask holder 101. The laser emitted by the laser emitting and receiving end 121 passes through the mask 110, is reflected back, and is received by the laser emitting and receiving end 121.
The mask blank body 111 and the protective film 112 are made of different materials, and have different absorptances for laser light. Specifically, the laser emitted by the laser emitting and receiving end 121 is mostly absorbed by the protective film 112, and after the light path passes through the protective film 112 and is reflected, the laser emitted by the laser emitting and receiving end 121 is very weak; the laser emitted by the laser emitting and receiving end 121 can be partially absorbed by the mask main body 111 (quartz), and after the light path passes through the mask main body 111 and is reflected, the laser emitting and receiving end 121 can receive the laser with weakened laser intensity; after the laser emitted by the laser emitting and receiving end 121 passes through the air and is reflected, the intensity of the laser received by the laser emitting and receiving end 121 does not change.
Based on the above principle, the thickness detection sensor converts the received laser intensity signal into an electrical signal, and amplifies the electrical signal by an amplifier. Fig. 4 is a schematic diagram of a thickness detection sensor in a reticle thickness detection apparatus according to an embodiment of the present invention, referring to fig. 4. Two thresholds are set for the strength of the electrical signal, e.g., R1 and R2. When the intensity of the electric signal corresponding to the laser light received by the receiving end 121 is smaller than R1, it may be determined that the detection object is the protective film 112; when the intensity of the electric signal corresponding to the laser light emitted by the laser light emitting and received by the receiving end 121 is in the range of [ R1, R2], it can be determined that the detection object is the reticle body 111; if the intensity of the electrical signal corresponding to the laser light received by the receiving end 121 is greater than R2, it can be determined that there is no object to be detected (i.e., a gap between adjacent reticles).
Further, the thickness calculation unit may calculate a moving distance of the thickness detection sensor during the time, i.e., the thickness of the reticle body 111 or the protective film 112, based on the duration of the electrical signal and the moving speed of the thickness detection sensor, and further obtain the thickness of each reticle 110 on the mask holder 101. The data is stored in a mask plate information database, and when the mask plate 110 is subjected to vertical station handover, the actual movement distance of vertical movement during taking and placing actions can be adjusted in real time according to the data information, so that collision between adjacent groove mask plates is avoided when a mask plate transmission mechanism is lifted or lowered vertically during taking and placing actions of the mask plate.
According to the mask thickness detection device provided by the embodiment of the invention, through arranging the thickness detection sensor, different responses of the mask main body and the protective film to laser are utilized to process the received laser signal, so that the thicknesses of the mask main body and the protective film positioned on the mask main body on the mask frame are obtained, and further, according to the thickness information, the actual movement distance of vertical movement is adjusted in real time in the process of vertical station handover of the mask, so that the problem that the adjacent grooves collide when the mask is lifted upwards or descended in the process of taking and placing the mask is avoided, and the mask or the mask transmission mechanism is damaged.
Optionally, in an embodiment of the present invention, the thickness detection sensor further includes a laser reflector 122, the laser reflector 122 and the laser emitting and receiving end 121 are disposed on two sides of the mask 110, the laser emitting and receiving end 121 emits laser along a horizontal direction of the mask 110, and the laser passing through the mask 110 is reflected by the laser reflector 122 and then received by the laser emitting and receiving end 121 again. The laser reflector 122 can prevent the laser from scattering, and thus avoid energy loss of the laser during transmission.
Example two
Fig. 5 is a schematic diagram of a reticle storage mechanism provided in a second embodiment of the present invention, fig. 6 is a schematic diagram of a reticle storage mechanism provided in the second embodiment of the present invention, and referring to fig. 5 and 6, the reticle storage mechanism includes a reticle thickness detecting device described in the first embodiment of the present invention, and further includes:
the mask frame 101 is provided with a mask slot for placing a mask, the mask frame 101 is located in the mask box, the mask box is arranged on the mask bearing platform 202, and the thickness detection sensor is arranged on the frame assembly facing the mask box. In this embodiment, the thickness detection sensor further includes a laser reflection plate 122, and the thickness detection sensor and the laser reflection plate 122 are respectively disposed on opposite sides of the frame assembly 201 facing the pod.
In the embodiment shown in fig. 5 and 6, the driving member is a vertical running mechanism 203, and the vertical running mechanism 203 is used for driving the frame assembly 201 or the plate bearing table 202 to move vertically. In one embodiment, as shown in FIG. 5, the driving unit is connected to the frame assembly 201, i.e., the vertical running mechanism 203 drives the frame assembly 201 and the thickness detecting sensor thereon to move vertically, while the support 202 and the pod thereon are fixed. In another embodiment, as shown in fig. 6, wherein the driving unit is connected to the support 202, that is, the vertical running mechanism 203 drives the support 202 and the pod thereon to move vertically, the frame assembly 201 and the thickness detecting sensor thereon are fixed.
The frame assembly 201 or the reticle carrying table 202 is driven by a driving part (a vertical running mechanism 203) to move vertically, so that the reticles and the thickness detection sensors relatively move in the thickness direction of the reticles, and the thickness of each reticle on the mask frame 101 is detected by the reticle thickness detection device. And the data is stored in a mask plate information database, and when the mask plate is subjected to vertical station handover, the actual movement distance of vertical movement during taking and placing actions can be adjusted in real time according to the data information, so that collision between adjacent groove mask plates is avoided when a mask plate transmission mechanism is lifted or lowered vertically during taking and placing actions of the mask plate.
EXAMPLE III
Fig. 7 is a schematic view of a reticle transmission mechanism provided in a third embodiment of the present invention, and as shown in fig. 7, the reticle thickness detection apparatus including the first embodiment of the present invention further includes:
the first plate bearing fork 301 and the second plate bearing fork 302 are arranged oppositely, and the first plate bearing fork 301 and the second plate bearing fork 302 form a plate bearing fork assembly. The thickness detection sensor comprises a laser emitting and receiving end which is positioned at the front end of the first plate bearing fork 301 or/and the second plate bearing fork 302. Illustratively, as shown in fig. 7, the thickness detection sensor includes a laser emitting and receiving end 131 located at a front end of the first plate receiving fork 301. During detection, the laser emitting and receiving end 131 emits laser along the horizontal direction of the mask to irradiate the side wall of the mask, and the driving part drives the first plate bearing fork 301 and the second plate bearing fork 302 to move along the thickness direction of the mask. The specific working process is as follows:
the mask box with the mask is placed on a mask bearing table of the mask storage mechanism, the mask transmission mechanism needs to move to a station position where the mask storage mechanism is used for detecting the thickness of the mask, the station position is a position where a plate fork assembly of the mask transmission mechanism is about to enter a plate groove gap of a mask frame, then the mask transmission mechanism drives the plate fork assembly and a thickness detection sensor positioned on the plate fork assembly to vertically move from high to low or from low to high at a certain movement speed, and the thickness of the mask is detected.
The specific detection principle is as follows: because the mask plate main body and the protective film are made of different materials and have different reflectivity to laser, the intensity of the laser reflected by the thickness detection sensor is different. When the detection object is air (a gap between adjacent masks), the laser cannot return, and the thickness detection sensor cannot receive a laser signal.
Based on the above principle, the thickness detection sensor converts the received laser intensity signal into an electrical signal, and amplifies the electrical signal by an amplifier. According to the duration of a certain electric signal and the moving speed of the laser sensor, the moving distance of the thickness detection sensor in the time, namely the thickness of the mask plate main body or the protective film, can be calculated, and then the thickness of each mask plate on the mask frame is obtained. The data is stored in a mask plate information database, and when the mask plate is subjected to vertical station handover, the actual movement distance of vertical movement during taking and placing actions can be adjusted in real time according to the data information, so that collision between adjacent groove mask plates is avoided when a mask plate transmission mechanism is lifted or lowered vertically during taking and placing actions of the mask plate.
Example four
The embodiment of the invention provides a mask plate transmission system, which comprises a mask plate storage mechanism in the second embodiment of the invention, wherein the mask plate storage mechanism is used as an external world mask plate storage mechanism. Fig. 8 is a schematic view of a reticle transport system provided in a fourth embodiment of the present invention, and as shown in fig. 8, the reticle transport system further includes:
the system comprises internal world mask storage mechanisms 14 and 15, a first mask transmission mechanism 16, an external operating platform 11 and a control cabinet 21, wherein the external world mask storage mechanisms 12 and 13 are in butt joint with the external operating platform 11 and are used for storing mask boxes filled with masks sent by the external operating platform 11, and the first mask transmission mechanism 16 is used for completing the circulation of the masks between the external world mask storage mechanisms 12 and 13 and the internal world mask storage mechanisms 14 and 15; the mask thickness detection devices in the outside world mask storage mechanisms 12 and 13 detect the thickness information of the masks, and when the masks are subjected to station handover in the thickness direction, the actual movement distance in the thickness direction is adjusted in real time according to the thickness information, so that collision between the masks of adjacent grooves is avoided when the first mask transmission mechanism 16 is vertically lifted or lowered in the mask taking and placing action.
Optionally, the reticle transfer system further comprises a first reticle alignment mechanism 18 for eliminating initial position deviation during reticle transfer in the outside world;
the second mask plate transmission mechanism 19 is used for completing mask plate connection with the first mask plate transmission mechanism 16 and mask plate connection with the mask plate of the mask table;
the second mask plate alignment mechanism 20 is used for correcting the mask plate position in the process of connecting the second mask plate transmission mechanism 19 and the mask table;
and the mask plate granularity detection mechanism 17 is used for detecting the granularity of the surface of the mask plate before the first mask plate transmission mechanism 16 transmits the mask plate from the external world mask plate storage mechanism 12 or 13 to the internal world mask plate storage mechanism 14 or 15.
The specific work flow of the reticle transmission system provided by the embodiment is as follows: after a mask box with a mask is placed into an external world mask storage mechanism 12 or 13 from an external operating platform 11, a mask thickness detection device in the external world mask storage mechanisms 12 and 13 detects the thickness information of the mask; the first mask plate transmission mechanism 16 takes out the mask plate from the external world mask plate storage mechanism 12 or 13, and in the process, the actual movement distance of the first mask plate transmission mechanism 16 in the thickness direction is adjusted in real time according to the thickness information of the mask plate, so that collision between the mask plates of adjacent grooves is avoided when the mask plates are lifted or lowered vertically in the taking and placing actions of the mask plates; after being detected to be qualified by the mask plate granularity detection mechanism 17, the mask plate granularity detection data is sent to the internal world mask plate storage mechanism 14 or 15; the first mask plate transmission mechanism 16 takes out the mask plate from the internal world mask plate storage mechanism 14 or 15, completes the connection with the second mask plate transmission mechanism 19 after the position of the first mask plate alignment mechanism 18 is corrected, and transfers the mask plate to the second mask plate transmission mechanism 19; the second mask plate transmission mechanism 19 is connected with the mask table after being corrected by the position of the second mask plate alignment mechanism 20, and transmits the mask plate to the mask table for the photoetching process.
It should be noted that, during the process of the second mask plate transmission mechanism 19 being handed over to the mask table, the specification of the mask plate can be determined according to the thickness information of the mask plate, so as to automatically adjust the actual movement distance of the vertical movement of the second mask plate transmission mechanism 19, thereby avoiding the collision between the mask plate and the mask table.
EXAMPLE five
The embodiment of the present invention provides another reticle transmission system, including the reticle transmission mechanism according to the third embodiment of the present invention, where the reticle transmission mechanism is used as the first reticle transmission mechanism, and with continuing reference to fig. 8, the reticle transmission system further includes:
the first mask plate transmission mechanism 16 is used for completing the circulation of mask plates between the external world mask plate storage mechanisms 12 and 13 and the internal world mask plate storage mechanisms 14 and 15, at least before the mask plates are taken from the external world mask plate storage mechanisms 12 or 13, the thickness information of the mask plates is detected through a mask plate thickness detection device on the first mask plate transmission mechanism 16, and when the mask plates are subjected to station handover in the thickness direction, the actual movement distance in the thickness direction is adjusted in real time according to the thickness information. Specifically, the first mask plate transmission mechanism 16 moves to a station position of the outside world mask plate storage mechanism 12 or 13 for detecting the thickness of the mask plate, the station position is a position where a plate fork assembly of the first mask plate transmission mechanism 16 is about to enter a plate groove gap of the mask frame, and then the first mask plate transmission mechanism 16 drives the plate fork assembly and a thickness detection sensor positioned on the plate fork assembly to vertically move from high to bottom or from low to high at a certain movement speed so as to detect the thickness of the mask plate. When the mask plates are subjected to vertical station handover, the actual movement distance of vertical movement during taking and placing actions can be adjusted in real time according to the data information, and collision between the mask plates of adjacent grooves is avoided when the first mask plate transmission mechanism 16 is lifted or lowered vertically during taking and placing actions of the mask plates.
Optionally, the reticle transfer system further comprises an external operation table 11, and external world reticle storage mechanisms 12 and 13 are interfaced with the external operation table 11 and store the mask box filled with the reticles sent by the external operation table 11;
a first reticle alignment mechanism 18 for eliminating initial position deviation in reticle transmission in the outside world;
the second mask plate transmission mechanism 19 is used for completing mask plate connection with the first mask plate transmission mechanism 16 and mask plate connection with the mask plate of the mask table;
the second mask plate alignment mechanism 20 is used for correcting the mask plate position in the process of connecting the second mask plate transmission mechanism 19 and the mask table;
and the mask plate granularity detection mechanism 17 is used for detecting the granularity of the surface of the mask plate before the first mask plate transmission mechanism 16 transmits the mask plate from the external world mask plate storage mechanism 12 or 13 to the internal world mask plate storage mechanism 14 or 15.
The work flow of the reticle transmission system provided in this embodiment is substantially the same as that of the reticle transmission system in the fourth embodiment, except that the reticle transmission system provided in this embodiment detects the thickness information of the reticle through a reticle thickness detection device on the first reticle transmission mechanism 16.
It should be noted that, during the process of the second mask plate transmission mechanism 19 being handed over to the mask table, the specification of the mask plate can be determined according to the thickness information of the mask plate, so as to automatically adjust the actual movement distance of the vertical movement of the second mask plate transmission mechanism 19, thereby avoiding the collision between the mask plate and the mask table.
EXAMPLE six
The embodiment of the invention provides a mask transmission method, which is based on the mask transmission system described in the fourth embodiment of the invention, and fig. 9 is a flow chart of the mask transmission method provided in the sixth embodiment of the invention, and the method comprises the following steps:
s11: the driving part drives the plate bearing table or the frame assembly to move along the thickness direction of the mask plate, so that the mask frame and the thickness detection sensor relatively move along the thickness direction of the mask plate.
Specifically, as shown in fig. 5 or 6, the mask frame 101 is located in a mask box, the mask box is located on a reticle support 202 of an external world reticle storage mechanism, the thickness detection sensor is located on a frame assembly 201 of the external world reticle storage mechanism, and the driving component drives the frame assembly 201 or the reticle support 202 to move at a certain speed in the thickness direction of the reticle to be detected.
S12: and controlling the laser emitting and receiving end 121 of the thickness detection sensor to emit laser along the horizontal direction of the mask plate in the movement process, and receiving the laser by the laser emitting and receiving end 121 after the laser is reflected.
The mask transmission system controls the laser emitting and receiving end 121 of the thickness detection sensor to emit laser, and the laser is reflected and received by the laser emitting and receiving end 121.
S13: and calculating the thickness information of the mask plate in each plate groove according to the laser signals received by the laser emitting and receiving end 121 and the movement position of the driving part in the relative movement process.
The mask main body and the protective film are made of different materials, so that the absorption rates of the mask main body and the protective film to laser are different. Specifically, the laser emitted by the laser emitting and receiving end 121 is mostly absorbed by the protective film, and after the light path passes through the protective film and is reflected, the laser received by the laser emitting and receiving end 121 is very weak; the laser emitted by the laser emitting and receiving end 121 is partially absorbed by the mask main body (quartz), and after the light path passes through the mask main body and is reflected, the laser emitting and receiving end 121 can receive the laser with weakened laser intensity; after the laser emitted by the laser emitting and receiving end 121 passes through the air and is reflected, the intensity of the laser emitted by the laser emitting and receiving end 121 does not change.
Based on the above principle, the thickness detection sensor converts the received laser intensity into an electrical signal, and amplifies the electrical signal by an amplifier. Fig. 4 is a schematic diagram of a thickness detection sensor in a reticle thickness detection apparatus according to an embodiment of the present invention, referring to fig. 4. Two thresholds are set for the strength of the electrical signal, e.g., R1 and R2. When the intensity of the electric signal corresponding to the laser light emitted by the laser light emitting and received by the receiving end 121 is smaller than R1, it can be determined that the detection object is a protective film; when the intensity of the electric signal corresponding to the laser emitted by the laser and received by the receiving end 121 is in the range of [ R1, R2], the detection object can be judged to be the mask main body; if the intensity of the electrical signal corresponding to the laser light received by the receiving end 121 is greater than R2, it can be determined that there is no object to be detected (i.e., a gap between adjacent reticles).
Further, the thickness calculation unit may calculate a moving distance of the thickness detection sensor within the time, that is, a thickness of the reticle body or the protective film, according to the duration of the electrical signal and the moving speed of the thickness detection sensor, thereby obtaining a thickness of each reticle on the mask frame 101.
S14: and storing the acquired thickness information of the mask plate into a mask plate information database, and adjusting the actual movement distance of the movement in the thickness direction in real time according to the thickness information in the process of station handover in the thickness direction of the mask plate.
The acquired thickness information of the mask is stored in a mask information database, and the actual movement distance of the vertical movement can be adjusted in real time according to the data information in the process of vertical station handover of the mask. For example, in the taking and placing action of the mask, the vertical lifting or lowering distance of the first mask transmission mechanism 16 is adjusted in real time, so that the adjacent slots of the mask are prevented from colliding; for example, in the process of transferring the second reticle transfer mechanism 19 to the mask stage, the vertical movement distance of the second reticle transfer mechanism 19 is automatically adjusted to avoid collision between the reticle and the mask stage.
According to the mask plate transmission method provided by the embodiment of the invention, the thickness detection sensor is arranged in the external world mask plate storage mechanism, the received laser signals are processed by utilizing the difference of the laser absorption rates of the mask plate main body and the protective film on the mask plate main body, so that the thickness of the mask plate main body on the mask plate frame and the thickness of the protective film on the mask plate main body are obtained, the actual movement distance of vertical movement is further adjusted in real time according to the thickness information, and the collision of the mask plates of adjacent grooves when the first mask plate transmission mechanism is lifted or lowered vertically in the taking and placing actions of the mask plates is avoided; and avoiding collision between the mask and the mask table.
EXAMPLE seven
The embodiment of the present invention provides another reticle transmission method, which is based on the reticle transmission system described in the fifth embodiment of the present invention, and fig. 10 is a flowchart of the reticle transmission method provided in the sixth embodiment of the present invention, and includes:
s21: the mask plate transmission mechanism (a first mask plate transmission mechanism 16) moves to a station position for detecting the thickness of the mask plate in the external world mask plate storage mechanism 12 or 13, the station position is a position where a plate fork assembly of the first mask plate transmission mechanism 16 is about to enter a plate groove gap of the mask frame 101, a laser emitting and receiving end at the front end of the first plate bearing fork 301 or/and the second plate bearing fork 302 faces the side wall of the mask plate, and the driving part drives the first plate bearing fork 301 and the second plate bearing fork 302 to move along the thickness direction of the mask plate. Illustratively, as shown in fig. 7, the thickness detection sensor includes a laser emitting and receiving end 131 located at a front end of the first plate receiving fork 301.
S22: the laser emitting and receiving end 131 of the thickness detection sensor emits laser to the horizontal direction of the mask plate in the movement process and receives the laser reflected by the mask plate;
s23: and calculating the thickness information of the mask plate in each plate groove according to the laser signal received by the laser emitting and receiving end 131 and the movement position of the driving part in the relative movement process.
The specific detection principle is as follows: because the mask plate main body and the protective film are made of different materials and have different reflectivity to laser, the intensity of the laser reflected by the thickness detection sensor is different. When the detection object is air (a gap between adjacent masks), the laser cannot return, and the thickness detection sensor cannot receive a laser signal.
Based on the above principle, the thickness detection sensor converts the received laser intensity into an electrical signal, and amplifies the electrical signal by an amplifier. According to the duration of a certain electric signal and the moving speed of the laser sensor, the moving distance of the thickness detection sensor in the time, namely the thickness of the mask plate main body or the protective film, can be calculated, and then the thickness of each mask plate on the mask frame is obtained.
S24: and storing the acquired thickness information of the mask plate into a mask plate information database, and adjusting the actual movement distance of the vertical movement in real time according to the thickness information in the process of station handover of the mask plate in the thickness direction. For example, in the taking and placing actions of the mask plates, the vertical lifting or descending distance of the first mask plate transmission mechanism is adjusted in real time, so that the collision between the mask plates of adjacent grooves is avoided; and for example, in the process of connecting the second mask plate transmission mechanism and the mask table, the vertical movement distance of the second mask plate transmission mechanism is automatically adjusted, so that the collision between the mask plate and the mask table is avoided.
According to the mask plate transmission method provided by the embodiment of the invention, the thickness detection sensor is arranged on the first mask plate transmission mechanism, the received laser signals are processed by utilizing the difference of the reflectivity of the mask plate main body and the reflectivity of the protective film to laser, so that the thicknesses of the mask plate main body on the mask plate frame and the protective film on the mask plate main body are obtained, the actual movement distance of vertical movement is further adjusted in real time according to the thickness information, and the collision of the mask plates of adjacent grooves when the first mask plate transmission mechanism is lifted or lowered vertically in the taking and placing actions of the mask plates is avoided; and avoiding collision between the mask and the mask table.
The embodiment of the invention provides a lithography system, which comprises a mask plate transmission system in the fourth embodiment and the fifth embodiment of the invention.
It is to be noted that the foregoing is only illustrative of the preferred embodiments of the present invention and the technical principles employed. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail by the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the spirit of the present invention, and the scope of the present invention is determined by the scope of the appended claims.

Claims (10)

1. A mask plate transmission system is characterized by comprising a mask plate storage mechanism, wherein the mask plate storage mechanism comprises a mask plate thickness detection device, a frame assembly, a mask frame, a mask box and a mask bearing table, the mask frame is arranged in the frame assembly, a mask groove used for placing the mask plate is arranged in the mask frame, the mask frame is positioned in the mask box, and the mask box is arranged on the mask bearing table;
the mask thickness detection device comprises:
the thickness detection sensor comprises a laser emitting and receiving end, the laser emitting and receiving end is positioned at one side of the mask plate, emits laser along the horizontal direction of the mask plate to irradiate the mask plate, and receives the reflected laser; the thickness detection sensor is arranged on the frame assembly facing the mask box;
the driving component is used for driving the mask plate or the thickness detection sensor to move so that the mask plate and the thickness detection sensor relatively move in the thickness direction of the mask plate, wherein the horizontal direction of the mask plate is vertical to the thickness direction of the mask plate;
the thickness calculation unit is used for calculating the thickness information of the mask plate according to the laser signals received by the laser emitting and receiving end and the movement position of the mask plate or the thickness detection sensor;
the mask plate storage mechanism is used as an external world mask plate storage mechanism, the mask plate transmission system further comprises an internal world mask plate storage mechanism, a first mask plate transmission mechanism, an external operating platform and a control cabinet, the external world mask plate storage mechanism is in butt joint with the external operating platform and used for storing a mask box which is sent by the external operating platform and is provided with mask plates, and the first mask plate transmission mechanism is used for completing the circulation of the mask plates between the external world mask plate storage mechanism and the internal world mask plate storage mechanism; and a mask thickness detection device in the mask storage mechanism of the outside world detects the thickness information of the mask, and the actual movement distance in the thickness direction is adjusted in real time according to the thickness information in the process of station handover in the thickness direction of the mask.
2. The reticle transport system of claim 1, further comprising a first reticle alignment mechanism to eliminate initial position deviations during reticle transport in the outside world;
the second mask plate transmission mechanism is used for completing mask plate connection with the first mask plate transmission mechanism and mask plate connection with the mask plate table;
the second mask plate alignment mechanism is used for correcting the mask plate position in the process of connecting the second mask plate transmission mechanism and the mask table;
and the mask plate granularity detection mechanism is used for detecting the granularity of the surface of the mask plate before the first mask plate transmission mechanism transmits the mask plate from the external world mask plate storage mechanism to the internal world mask plate storage mechanism.
3. The reticle transport system of claim 1, wherein the drive member is coupled to the frame assembly for driving the frame assembly to move in a thickness direction of the reticle.
4. The reticle transport system of claim 1, wherein the drive member is coupled to the stage for driving the stage to move in a thickness direction of the reticle.
5. The mask transmission system according to claim 1, wherein the thickness detection sensor further comprises a laser reflector, the laser reflector and the laser emitting and receiving end are arranged on two sides of the mask opposite to each other, the laser emitting and receiving end emits laser along the horizontal direction of the mask, and the laser passing through the mask is reflected by the laser reflector and then received by the laser emitting and receiving end again.
6. A mask plate transmission system is characterized by comprising a mask plate transmission mechanism, wherein the mask plate transmission mechanism comprises a mask plate thickness detection device, a first mask plate bearing fork and a second mask plate bearing fork which are arranged oppositely;
the mask thickness detection device comprises:
the thickness detection sensor comprises a laser emitting and receiving end which is positioned at the front end of the first plate bearing fork or/and the second plate bearing fork, and the laser emitting and receiving end emits laser along the horizontal direction of the mask plate to irradiate the side wall of the mask plate during detection;
the driving component drives the first plate bearing fork and the second plate bearing fork to move along the thickness direction of the mask plate;
the thickness calculation unit is used for calculating the thickness information of the mask plate according to the laser signals received by the laser emitting and receiving end and the movement position of the mask plate or the thickness detection sensor;
the mask plate transmission system further comprises an external world mask plate storage mechanism, an internal world mask plate storage mechanism and a control cabinet, wherein the mask plate transmission mechanism is used for completing the circulation of mask plates between the external world mask plate storage mechanism and the internal world mask plate storage mechanism, at least before the mask plates are taken from the external world mask plate storage mechanism, the thickness information of the mask plates is detected through a mask plate thickness detection device on the mask plate transmission mechanism, and when the mask plates are subjected to station handover in the thickness direction, the actual movement distance in the thickness direction is adjusted in real time according to the thickness information.
7. The reticle transport system of claim 6, further comprising an external operator station, the outside world reticle storage mechanism interfacing with the external operator station to store a reticle-containing mask cassette presented thereto by the external operator station;
the first mask plate alignment mechanism is used for eliminating initial position deviation in the mask plate transmission process of the outside world;
the second mask plate transmission mechanism is used for completing mask plate connection with the mask plate transmission mechanism and mask plate connection with the mask plate table;
the second mask plate alignment mechanism is used for correcting the mask plate position in the process of connecting the second mask plate transmission mechanism and the mask table;
and the mask plate granularity detection mechanism is used for detecting the granularity of the surface of the mask plate before the mask plate transmission mechanism transmits the mask plate from the external world mask plate storage mechanism to the internal world mask plate storage mechanism.
8. A reticle transfer method based on the reticle transfer system of claim 1, comprising:
the driving part drives the plate bearing table or the frame assembly to move along the thickness direction of the mask plate so as to enable the mask frame and the thickness detection sensor to move relatively along the thickness direction of the mask plate;
controlling a laser emitting and receiving end of the thickness detection sensor to emit laser along the horizontal direction of the mask plate in the movement process, and receiving the laser by the laser emitting and receiving end after the laser is reflected;
calculating the thickness information of the mask plate in each plate groove according to the laser signals received by a laser transmitting and receiving end and the movement position of a driving part in the relative movement process;
and storing the acquired thickness information of the mask plate into a mask plate information database, and adjusting the actual movement distance of the movement in the thickness direction in real time according to the thickness information in the process of station handover in the thickness direction of the mask plate.
9. A reticle transfer method based on the reticle transfer system of claim 6, comprising:
the mask plate transmission mechanism moves to a station position used for detecting the thickness of a mask plate in a mask plate storage mechanism of the external world, so that a laser emitting and receiving end at the front end of the first or/and second mask plate fork faces the side wall of the mask plate, and the driving part drives the first and second mask plate forks to move along the thickness direction of the mask plate;
the laser emitting and receiving end of the thickness detection sensor emits laser to the horizontal direction of the mask plate in the movement process and receives the laser reflected by the mask plate;
calculating the thickness information of the mask plates in each plate groove according to the laser signals received by the laser transmitting and receiving ends and the movement position of the driving part in the relative movement process;
and storing the acquired thickness information of the mask plate into a mask plate information database, and adjusting the actual movement distance in the thickness direction in real time according to the thickness information in the process of station handover in the thickness direction of the mask plate.
10. A lithography system, comprising the reticle transport system of any one of claims 1-7.
CN201810251811.7A 2018-03-26 2018-03-26 Mask thickness detection device, storage mechanism, transmission mechanism and photoetching system Active CN110361936B (en)

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CN201810251811.7A CN110361936B (en) 2018-03-26 2018-03-26 Mask thickness detection device, storage mechanism, transmission mechanism and photoetching system
TW108110540A TWI696900B (en) 2018-03-26 2019-03-26 Photomask thickness detection device, storage mechanism, transmission mechanism and lithography system
PCT/CN2019/079742 WO2019184921A1 (en) 2018-03-26 2019-03-26 Mask thickness measurement device, storage mechanism, transmission mechanism, and photolithography system

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