CN110326366B - 等离子体约束系统及使用方法 - Google Patents

等离子体约束系统及使用方法 Download PDF

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Publication number
CN110326366B
CN110326366B CN201880012844.4A CN201880012844A CN110326366B CN 110326366 B CN110326366 B CN 110326366B CN 201880012844 A CN201880012844 A CN 201880012844A CN 110326366 B CN110326366 B CN 110326366B
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electrode
valves
range
inner electrode
outer electrode
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Chinese (zh)
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CN110326366A (zh
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U·舒姆拉克
B·A·尼尔森
R·戈林戈
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University of Washington
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University of Washington
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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21B—FUSION REACTORS
    • G21B1/00—Thermonuclear fusion reactors
    • G21B1/05—Thermonuclear fusion reactors with magnetic or electric plasma confinement
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/04—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using magnetic fields substantially generated by the discharge in the plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/04—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using magnetic fields substantially generated by the discharge in the plasma
    • H05H1/06—Longitudinal pinch devices
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H5/00—Direct voltage accelerators; Accelerators using single pulses
    • H05H5/02—Details
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H3/00—Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
    • H05H3/02—Molecular or atomic-beam generation, e.g. resonant beam generation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Glass Compositions (AREA)
CN201880012844.4A 2017-02-23 2018-02-23 等离子体约束系统及使用方法 Active CN110326366B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202211175205.4A CN115460756A (zh) 2017-02-23 2018-02-23 等离子体约束系统及使用方法

Applications Claiming Priority (3)

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US201762462779P 2017-02-23 2017-02-23
US62/462,779 2017-02-23
PCT/US2018/019364 WO2018156860A1 (en) 2017-02-23 2018-02-23 Plasma confinement system and methods for use

Related Child Applications (1)

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CN110326366A CN110326366A (zh) 2019-10-11
CN110326366B true CN110326366B (zh) 2022-10-18

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CN202211175205.4A Pending CN115460756A (zh) 2017-02-23 2018-02-23 等离子体约束系统及使用方法

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US (3) US11581100B2 (enExample)
EP (2) EP4152896A1 (enExample)
JP (3) JP7122760B2 (enExample)
KR (2) KR102778989B1 (enExample)
CN (2) CN110326366B (enExample)
AU (1) AU2018225206A1 (enExample)
BR (1) BR112019017244A2 (enExample)
CA (1) CA3053933A1 (enExample)
DK (1) DK3586575T3 (enExample)
EA (1) EA201991680A1 (enExample)
ES (1) ES2953635T3 (enExample)
FI (1) FI3586575T3 (enExample)
IL (1) IL268802A (enExample)
PL (1) PL3586575T3 (enExample)
SG (1) SG11201907225RA (enExample)
WO (1) WO2018156860A1 (enExample)

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US20240079151A1 (en) * 2020-12-10 2024-03-07 Fuse Energy Technologies Corp. Plasma injection and confinement systems and methods
WO2022220932A2 (en) * 2021-02-26 2022-10-20 Fuse Energy Technologies Corp. Plasma generation systems and methods with enhanced electrode configurations
JP7555865B2 (ja) * 2021-03-22 2024-09-25 株式会社Ｓｃｒｅｅｎホールディングス 印刷システムおよび印刷方法
IL281747B2 (en) * 2021-03-22 2024-04-01 N T Tao Ltd High efficiency plasma creation system and method
KR20240009476A (ko) 2021-05-28 2024-01-22 잽 에너지, 인크. 연장된 플라즈마 밀폐를 위한 전극 구성
US20230238153A1 (en) * 2022-01-26 2023-07-27 Zap Energy, Inc. Electrode and decomposable electrode material for z-pinch plasma confinement system
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WO2023245064A1 (en) * 2022-06-15 2023-12-21 Fuse Energy Technologies Corp. Plasma generation system and method with magnetic field stabilization
US20250374412A1 (en) * 2022-06-15 2025-12-04 Fuse Energy Technologies Corp. Dual-mode plasma generation system and method
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PL446956A1 (pl) * 2023-12-01 2025-06-02 Uniwersytet Łódzki Przyrząd do badania pinchu
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IL268802A (en) 2019-10-31
DK3586575T3 (da) 2023-09-04
EP3586575A4 (en) 2020-12-02
JP2022160556A (ja) 2022-10-19
FI3586575T3 (fi) 2023-08-23
JP2024001305A (ja) 2024-01-09
EP4152896A1 (en) 2023-03-22
WO2018156860A1 (en) 2018-08-30
CN115460756A (zh) 2022-12-09
US11581100B2 (en) 2023-02-14
JP7384478B2 (ja) 2023-11-21
EP3586575B1 (en) 2023-08-09
BR112019017244A2 (pt) 2020-04-14
US12245351B2 (en) 2025-03-04
CN110326366A (zh) 2019-10-11
ES2953635T3 (es) 2023-11-14
KR20190121814A (ko) 2019-10-28
JP7122760B2 (ja) 2022-08-22
EP3586575A1 (en) 2020-01-01
US20230223158A1 (en) 2023-07-13
KR20230093551A (ko) 2023-06-27
KR102778989B1 (ko) 2025-03-11
CA3053933A1 (en) 2018-08-30
KR102550496B1 (ko) 2023-07-03
US20200058411A1 (en) 2020-02-20
EA201991680A1 (ru) 2020-01-28
SG11201907225RA (en) 2019-09-27
PL3586575T3 (pl) 2023-10-02
JP2020509539A (ja) 2020-03-26
US20240161938A1 (en) 2024-05-16
AU2018225206A1 (en) 2019-09-05

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