JP2022160556A - プラズマ閉じ込めシステムおよび使用方法 - Google Patents
プラズマ閉じ込めシステムおよび使用方法 Download PDFInfo
- Publication number
- JP2022160556A JP2022160556A JP2022123443A JP2022123443A JP2022160556A JP 2022160556 A JP2022160556 A JP 2022160556A JP 2022123443 A JP2022123443 A JP 2022123443A JP 2022123443 A JP2022123443 A JP 2022123443A JP 2022160556 A JP2022160556 A JP 2022160556A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- valves
- voltage
- plasma
- confinement system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 67
- 230000001133 acceleration Effects 0.000 claims abstract description 78
- 239000012212 insulator Substances 0.000 claims description 11
- 229910001220 stainless steel Inorganic materials 0.000 claims description 10
- 239000010935 stainless steel Substances 0.000 claims description 10
- 239000000919 ceramic Substances 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 230000004927 fusion Effects 0.000 abstract description 7
- 239000007789 gas Substances 0.000 description 116
- 239000003990 capacitor Substances 0.000 description 9
- 238000010586 diagram Methods 0.000 description 9
- 150000002500 ions Chemical class 0.000 description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 8
- 229910052739 hydrogen Inorganic materials 0.000 description 8
- 239000001257 hydrogen Substances 0.000 description 8
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 7
- 229910052805 deuterium Inorganic materials 0.000 description 7
- 230000007704 transition Effects 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 230000007423 decrease Effects 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 238000003780 insertion Methods 0.000 description 3
- 230000037431 insertion Effects 0.000 description 3
- 238000002955 isolation Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- YZCKVEUIGOORGS-NJFSPNSNSA-N Tritium Chemical compound [3H] YZCKVEUIGOORGS-NJFSPNSNSA-N 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229910052722 tritium Inorganic materials 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21B—FUSION REACTORS
- G21B1/00—Thermonuclear fusion reactors
- G21B1/05—Thermonuclear fusion reactors with magnetic or electric plasma confinement
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
- H05H1/04—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using magnetic fields substantially generated by the discharge in the plasma
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
- H05H1/04—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using magnetic fields substantially generated by the discharge in the plasma
- H05H1/06—Longitudinal pinch devices
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H5/00—Direct voltage accelerators; Accelerators using single pulses
- H05H5/02—Details
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H3/00—Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
- H05H3/02—Molecular or atomic beam generation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/10—Nuclear fusion reactors
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- High Energy & Nuclear Physics (AREA)
- General Engineering & Computer Science (AREA)
- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Glass Compositions (AREA)
Abstract
Description
本願は、2017年2月23日に出願された米国仮特許出願第62/462,779号の利益を主張するものであり、その内容全体を参照によって本願明細書に引用したものとする。
本発明は、エネルギー省[DOE]によって与えられた認可番号DE-AR0000571、DE-FG02-04ER54756、およびDE-NA0001860の下で政府の支援サポートにより行われた。政府は本発明において一定の権利を有する。
54
155
Claims (14)
- プラズマ閉じ込めシステムであって、
外部電極と、
内部電極であって、前記内部電極の第1の端部は、前記外部電極の第1の端部と前記外部電極の第2の端部との間にあり、前記内部電極および前記外部電極は、同じ軸に関して放射相称を有する、内部電極と、
前記内部電極と前記外部電極の第2の端部との間のセラミック絶縁体と、
前記内部電極および前記外部電極を少なくとも部分的に囲むステンレス鋼真空チャンバと、
前記外部電極の外側からガスを導くように構成される二つ以上の電気的作動型弁と、
せん断された軸流を有するZピンチプラズマを前記内部電極と前記外部電極との間に確立させるように、前記内部電極と前記外部電極との間に電圧を印加するように構成される電源と、
を備える、プラズマ閉じ込めシステム。 - 前記電源は、50μs乃至400μsの範囲内の期間にわたって前記電圧を印加するように構成される、請求項1に記載のプラズマ閉じ込めシステム。
- 前記二つ以上の電気的作動型弁は、前記外部電極の第2の端部に配置される、請求項1または2に記載のプラズマ閉じ込めシステム。
- 前記内部電極および前記外部電極は同心である、請求項1乃至3のいずれか一項に記載のプラズマ閉じ込めシステム。
- 前記外部電極は、前記内部電極によって占有される体積の大半を囲む、請求項1乃至4のいずれか一項に記載のプラズマ閉じ込めシステム。
- 前記外部電極は、前記内部電極を実質的に囲む、請求項1乃至5のいずれか一項に記載のプラズマ閉じ込めシステム。
- 前記内部電極および前記外部電極の各々は、実質的に円筒状の本体を有する、請求項1乃至6のいずれか一項に記載のプラズマ閉じ込めシステム。
- 前記外部電極の第1の端部は、前記外部電極の第2の端部の向かい側にある、請求項1乃至7のいずれか一項に記載のプラズマ閉じ込めシステム。
- 前記せん断された軸流は、前記同じ軸に関して放射状にせん断される、請求項1乃至8のいずれか一項に記載のプラズマ閉じ込めシステム。
- 請求項1乃至9のいずれか一項に記載のプラズマ閉じ込めシステムを操作するための方法であって、前記方法は、
前記外部電極の外側から前記二つ以上の電気的作動型弁を介して導かれるガスを、加速領域内にかつ前記内部電極の第1の端部および前記外部電極の第1の端部の方へ軸方向に流れるプラズマに変換することであって、前記加速領域は、前記外部電極の第2の端部と前記内部電極の第1の端部との間にあることと、
前記電源を介して、前記内部電極と前記外部電極との間に前記Zピンチプラズマを確立するように、前記内部電極と前記外部電極との間に前記電圧を印加することであって、前記確立の際に、前記Zピンチプラズマは、前記外部電極内の集合領域の中で前記内部電極の第1の端部と前記外部電極の第1の端部との間に流れることと、
を備える、方法。 - 前記加速領域は、実質的に環状の断面を有する、請求項10に記載の方法。
- 前記集合領域は、前記外部電極によって囲まれる円筒状の体積である、請求項10または11に記載の方法。
- 前記電源は、50μs乃至400μsの範囲内の期間にわたって前記電圧を印加する、請求項10乃至12のいずれか一項に記載の方法。
- 印加される電圧が、30kV/m乃至500kV/mの範囲内で前記加速領域内に放射電界を生じる、請求項10乃至13のいずれか一項に記載の方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2023187610A JP2024001305A (ja) | 2017-02-23 | 2023-11-01 | プラズマ閉じ込めシステムおよび使用方法 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201762462779P | 2017-02-23 | 2017-02-23 | |
US62/462,779 | 2017-02-23 | ||
JP2019545269A JP7122760B2 (ja) | 2017-02-23 | 2018-02-23 | プラズマ閉じ込めシステムおよび使用方法 |
PCT/US2018/019364 WO2018156860A1 (en) | 2017-02-23 | 2018-02-23 | Plasma confinement system and methods for use |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019545269A Division JP7122760B2 (ja) | 2017-02-23 | 2018-02-23 | プラズマ閉じ込めシステムおよび使用方法 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023187610A Division JP2024001305A (ja) | 2017-02-23 | 2023-11-01 | プラズマ閉じ込めシステムおよび使用方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2022160556A true JP2022160556A (ja) | 2022-10-19 |
JP7384478B2 JP7384478B2 (ja) | 2023-11-21 |
Family
ID=63253078
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019545269A Active JP7122760B2 (ja) | 2017-02-23 | 2018-02-23 | プラズマ閉じ込めシステムおよび使用方法 |
JP2022123443A Active JP7384478B2 (ja) | 2017-02-23 | 2022-08-02 | プラズマ閉じ込めシステムおよび使用方法 |
JP2023187610A Pending JP2024001305A (ja) | 2017-02-23 | 2023-11-01 | プラズマ閉じ込めシステムおよび使用方法 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019545269A Active JP7122760B2 (ja) | 2017-02-23 | 2018-02-23 | プラズマ閉じ込めシステムおよび使用方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023187610A Pending JP2024001305A (ja) | 2017-02-23 | 2023-11-01 | プラズマ閉じ込めシステムおよび使用方法 |
Country Status (16)
Country | Link |
---|---|
US (3) | US11581100B2 (ja) |
EP (2) | EP3586575B1 (ja) |
JP (3) | JP7122760B2 (ja) |
KR (2) | KR102550496B1 (ja) |
CN (2) | CN110326366B (ja) |
AU (1) | AU2018225206A1 (ja) |
BR (1) | BR112019017244A2 (ja) |
CA (1) | CA3053933A1 (ja) |
DK (1) | DK3586575T3 (ja) |
EA (1) | EA201991680A1 (ja) |
ES (1) | ES2953635T3 (ja) |
FI (1) | FI3586575T3 (ja) |
IL (1) | IL268802A (ja) |
PL (1) | PL3586575T3 (ja) |
SG (1) | SG11201907225RA (ja) |
WO (1) | WO2018156860A1 (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BR112019017244A2 (pt) * | 2017-02-23 | 2020-04-14 | Univ Washington | sistema de confinamento de plasma e métodos para uso |
WO2020176348A2 (en) * | 2019-02-21 | 2020-09-03 | FREENT TECHNOLOGIES, Inc. | Improved dense plasma focus devices |
US20240079151A1 (en) * | 2020-12-10 | 2024-03-07 | Fuse Energy Technologies Corp. | Plasma injection and confinement systems and methods |
WO2022220932A2 (en) * | 2021-02-26 | 2022-10-20 | Fuse Energy Technologies Corp. | Plasma generation systems and methods with enhanced electrode configurations |
IL281747B2 (en) | 2021-03-22 | 2024-04-01 | N T Tao Ltd | System and method for creating plasma with high efficiency |
US20220392651A1 (en) * | 2021-05-28 | 2022-12-08 | Zap Energy, Inc. | Electrode configuration for extended plasma confinement |
WO2023245064A1 (en) * | 2022-06-15 | 2023-12-21 | Fuse Energy Technologies Corp. | Plasma generation system and method with magnetic field stabilization |
WO2023245065A1 (en) * | 2022-06-15 | 2023-12-21 | Fuse Energy Technologies Corp. | Dual-mode plasma generation system and method |
WO2024020521A1 (en) * | 2022-07-22 | 2024-01-25 | Academia Sinica | Plasma apparatus and methods for cracking a gas |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005527079A (ja) * | 2002-05-24 | 2005-09-08 | エスアイジー テクノロジー リミテッド | 工作物のプラズマ処理方法および装置 |
Family Cites Families (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3265583A (en) * | 1964-04-14 | 1966-08-09 | William R Baker | Apparatus for producing and purifying plasma |
US3309873A (en) * | 1964-08-31 | 1967-03-21 | Electro Optical Systems Inc | Plasma accelerator using hall currents |
US3370198A (en) * | 1967-06-21 | 1968-02-20 | Kenneth C. Rogers | Plasma accelerator having a cooled preionization chamber |
US4042848A (en) * | 1974-05-17 | 1977-08-16 | Ja Hyun Lee | Hypocycloidal pinch device |
US4129772A (en) | 1976-10-12 | 1978-12-12 | Wisconsin Alumni Research Foundation | Electrode structures for high energy high temperature plasmas |
US4406952A (en) * | 1982-01-07 | 1983-09-27 | Molen George M | Opening switch for interrupting current using a plasma focus device |
JPS58157096A (ja) * | 1982-03-12 | 1983-09-19 | 株式会社東芝 | プラズマ装置 |
JPH0817116B2 (ja) | 1992-12-24 | 1996-02-21 | 核融合科学研究所長 | プラズマ電磁加速器 |
JPH08179066A (ja) | 1994-12-20 | 1996-07-12 | Mitsubishi Heavy Ind Ltd | プラズマ生成加速装置 |
US6744060B2 (en) | 1997-05-12 | 2004-06-01 | Cymer, Inc. | Pulse power system for extreme ultraviolet and x-ray sources |
US5763930A (en) | 1997-05-12 | 1998-06-09 | Cymer, Inc. | Plasma focus high energy photon source |
US7180081B2 (en) | 2000-06-09 | 2007-02-20 | Cymer, Inc. | Discharge produced plasma EUV light source |
RU2206186C2 (ru) * | 2000-07-04 | 2003-06-10 | Государственный научный центр Российской Федерации Троицкий институт инновационных и термоядерных исследований | Способ получения коротковолнового излучения из газоразрядной плазмы и устройство для его реализации |
US6486593B1 (en) * | 2000-09-29 | 2002-11-26 | The United States Of America As Represented By The United States Department Of Energy | Plasma accelerator |
US6804327B2 (en) | 2001-04-03 | 2004-10-12 | Lambda Physik Ag | Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays |
JP2004226244A (ja) | 2003-01-23 | 2004-08-12 | Ushio Inc | 極端紫外光源および半導体露光装置 |
US7679025B1 (en) * | 2005-02-04 | 2010-03-16 | Mahadevan Krishnan | Dense plasma focus apparatus |
US20060198486A1 (en) | 2005-03-04 | 2006-09-07 | Laberge Michel G | Pressure wave generator and controller for generating a pressure wave in a fusion reactor |
US7115887B1 (en) | 2005-03-15 | 2006-10-03 | The United States Of America As Represented By The United States Department Of Energy | Method for generating extreme ultraviolet with mather-type plasma accelerators for use in Extreme Ultraviolet Lithography |
US7372059B2 (en) | 2005-10-17 | 2008-05-13 | The University Of Washington | Plasma-based EUV light source |
RU2503159C2 (ru) | 2009-02-04 | 2013-12-27 | Дженерал Фьюжен, Инк. | Устройство для сжатия плазмы и способ сжатия плазмы |
US9560734B2 (en) | 2009-02-20 | 2017-01-31 | Lawrence Livermore National Security, Llc | Dense plasma focus (DPF) accelerated non radio isotopic radiological source |
BR112012002147B1 (pt) | 2009-07-29 | 2020-12-22 | General Fusion, Inc | sistemas e métodos para compressão de plasma com reciclagem de projéteis |
DE102010023339A1 (de) | 2010-06-10 | 2011-12-15 | Siemens Aktiengesellschaft | Beschleuniger für zwei Teilchenstrahlen zum Erzeugen einer Kollision |
WO2013112221A2 (en) * | 2011-11-07 | 2013-08-01 | Msnw Llc | Apparatus, systems and methods for fusion based power generation and engine thrust generation |
WO2013149345A1 (en) | 2012-04-04 | 2013-10-10 | General Fusion Inc. | Jet control devices and methods |
EP2891389B1 (en) | 2012-08-29 | 2017-08-02 | General Fusion Inc. | Apparatus for accelerating and compressing plasma |
JP6732670B2 (ja) * | 2017-02-01 | 2020-07-29 | 株式会社東芝 | 核融合炉用ブランケット、ブランケット支持構造、筐体壁内冷却水流路の形成方法、ブランケットモジュール組み立て方法およびブランケット支持構造組み立て方法 |
BR112019017244A2 (pt) * | 2017-02-23 | 2020-04-14 | Univ Washington | sistema de confinamento de plasma e métodos para uso |
US10204765B2 (en) * | 2017-05-25 | 2019-02-12 | Pear Labs Llc | Non-thermal plasma gate device |
US10811144B2 (en) | 2017-11-06 | 2020-10-20 | General Fusion Inc. | System and method for plasma generation and compression |
-
2018
- 2018-02-23 BR BR112019017244A patent/BR112019017244A2/pt not_active Application Discontinuation
- 2018-02-23 DK DK18757877.8T patent/DK3586575T3/da active
- 2018-02-23 CA CA3053933A patent/CA3053933A1/en active Pending
- 2018-02-23 JP JP2019545269A patent/JP7122760B2/ja active Active
- 2018-02-23 EP EP18757877.8A patent/EP3586575B1/en active Active
- 2018-02-23 WO PCT/US2018/019364 patent/WO2018156860A1/en unknown
- 2018-02-23 AU AU2018225206A patent/AU2018225206A1/en not_active Abandoned
- 2018-02-23 SG SG11201907225RA patent/SG11201907225RA/en unknown
- 2018-02-23 FI FIEP18757877.8T patent/FI3586575T3/fi active
- 2018-02-23 KR KR1020197027848A patent/KR102550496B1/ko active IP Right Grant
- 2018-02-23 CN CN201880012844.4A patent/CN110326366B/zh active Active
- 2018-02-23 US US16/487,338 patent/US11581100B2/en active Active
- 2018-02-23 EA EA201991680A patent/EA201991680A1/ru unknown
- 2018-02-23 PL PL18757877.8T patent/PL3586575T3/pl unknown
- 2018-02-23 ES ES18757877T patent/ES2953635T3/es active Active
- 2018-02-23 EP EP22206270.5A patent/EP4152896A1/en active Pending
- 2018-02-23 KR KR1020237020976A patent/KR20230093551A/ko not_active Application Discontinuation
- 2018-02-23 CN CN202211175205.4A patent/CN115460756A/zh active Pending
-
2019
- 2019-08-20 IL IL26880219A patent/IL268802A/en unknown
-
2022
- 2022-08-02 JP JP2022123443A patent/JP7384478B2/ja active Active
-
2023
- 2023-01-05 US US18/150,255 patent/US20230223158A1/en active Pending
- 2023-11-01 JP JP2023187610A patent/JP2024001305A/ja active Pending
- 2023-12-21 US US18/391,847 patent/US20240161938A1/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005527079A (ja) * | 2002-05-24 | 2005-09-08 | エスアイジー テクノロジー リミテッド | 工作物のプラズマ処理方法および装置 |
Non-Patent Citations (2)
Title |
---|
MICHAEL PATRICK,ROSS: "Exploring plasma stability and confinement with high resolution density measurements on the Zap-HD F", A DISSERTION SUBMITTED IN PARTIAL FULFILMENT OF THE REQUIREMENT FOR THE DEGREE OF DOCTOR OF PHILOSOP, JPN7022000718, 2016, US, ISSN: 0005083071 * |
U. SHUMLAK, ET AL.: "High Energy Density Z-Pinch Plasmas Using Flow Stabilization", AIP CONFERENCE PROCEEDINGS, vol. 1639, JPN7022000719, 18 May 2016 (2016-05-18), US, pages 76 - 79, ISSN: 0005083072 * |
Also Published As
Publication number | Publication date |
---|---|
KR20230093551A (ko) | 2023-06-27 |
EP3586575B1 (en) | 2023-08-09 |
EP4152896A1 (en) | 2023-03-22 |
JP7384478B2 (ja) | 2023-11-21 |
AU2018225206A1 (en) | 2019-09-05 |
US20200058411A1 (en) | 2020-02-20 |
KR102550496B1 (ko) | 2023-07-03 |
SG11201907225RA (en) | 2019-09-27 |
IL268802A (en) | 2019-10-31 |
KR20190121814A (ko) | 2019-10-28 |
CN110326366B (zh) | 2022-10-18 |
JP7122760B2 (ja) | 2022-08-22 |
US20230223158A1 (en) | 2023-07-13 |
US20240161938A1 (en) | 2024-05-16 |
EA201991680A1 (ru) | 2020-01-28 |
BR112019017244A2 (pt) | 2020-04-14 |
DK3586575T3 (da) | 2023-09-04 |
US11581100B2 (en) | 2023-02-14 |
CN110326366A (zh) | 2019-10-11 |
JP2024001305A (ja) | 2024-01-09 |
CA3053933A1 (en) | 2018-08-30 |
FI3586575T3 (fi) | 2023-08-23 |
JP2020509539A (ja) | 2020-03-26 |
CN115460756A (zh) | 2022-12-09 |
EP3586575A4 (en) | 2020-12-02 |
WO2018156860A1 (en) | 2018-08-30 |
ES2953635T3 (es) | 2023-11-14 |
PL3586575T3 (pl) | 2023-10-02 |
EP3586575A1 (en) | 2020-01-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7122760B2 (ja) | プラズマ閉じ込めシステムおよび使用方法 | |
US11783952B2 (en) | Hohlraum used as a single turn solenoid to generate seed magnetic field for inertial confinement fusion | |
JP7203768B2 (ja) | プラズマ閉込めシステムおよび使用するための方法 | |
US20030223528A1 (en) | Electrostatic accelerated-recirculating-ion fusion neutron/proton source | |
US20020150193A1 (en) | Compact high flux neutron generator | |
Sortais | Recent progress in making highly charged ion beams | |
JPS6037700A (ja) | 陰イオン源 | |
US3361634A (en) | Plasma method and apparatus for generating energy | |
EA044281B1 (ru) | Система удержания плазмы и способы ее использования | |
Okamura | Laser ion source for high brightness heavy ion beam | |
EA041312B1 (ru) | Система удержания плазмы | |
Sinars | Overview of the Magnetized Liner Inertial Fusion Research Program in the United States. | |
US20150270020A1 (en) | Device for creating nuclear fusion | |
Sinars | Computational Science Challenges related to the First to High Yield Fusion Research Challenge. | |
Korobochko et al. | A MODEL OF CYLINDER IRON-FREE BETATRON WITH AXIAL MAGNETIC FOCUSING | |
JPS58117697A (ja) | プラズマ装置 | |
JPH04363898A (ja) | プラズマ生成装置 | |
JPS58157098A (ja) | プラズマ装置 | |
JPS58117696A (ja) | プラズマ装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20220802 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20230524 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20230613 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230912 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20231003 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20231101 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7384478 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |