CN110273127A - 一种刀具涂层及其生产设备 - Google Patents

一种刀具涂层及其生产设备 Download PDF

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CN110273127A
CN110273127A CN201910658848.6A CN201910658848A CN110273127A CN 110273127 A CN110273127 A CN 110273127A CN 201910658848 A CN201910658848 A CN 201910658848A CN 110273127 A CN110273127 A CN 110273127A
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layer
vacuum chamber
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cutter coat
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黄仕江
蒋源
袁明
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Shanghai Miao Ke Novel Material Science And Technology Ltd
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    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
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    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate

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Abstract

本发明公开了一种刀具涂层，由内到外依次设置金属层、连接层、纳米多层耐磨层和自润滑层，所述金属层为Ti，连接层为TiN或TiAlN，纳米多层耐磨层为TiAlN或AlCrWSiCN，自润滑层为AlCrWSiCN。与真空腔连接的通入氮气的进气口以及设置在真空腔体上的抽气口，所述真空腔的中部设置有可以旋转的盛放工件的旋转台，所述真空腔内沿着逆时针方向依次设置有离化源、以Ti作为材料的A靶、以TiAl为材料的B靶以及以AlCrWSi为材料的C靶，且A靶、B靶和C靶均连接有偏压电源，所述A靶和离化源位于抽气口的两侧。以Ti作为基础层，结合能力更强，连接层为TiN或TiAlN，具有低应力，以TiAlN或AlCrWSiCN为纳米多层耐磨层，耐磨性好，强度更高，以AlCrWSiCN为自润滑层，减小摩擦，特别形成了含AlCrWSi的DLC层。

Description

一种刀具涂层及其生产设备
技术领域
本发明涉及刀具涂层耐磨技术领域，具体为一种刀具涂层及其生产设备。
背景技术
在加工高硬度材料或者是一种复合材料时，例如不锈钢材料和PCB钻孔加工在高镍合金材料加工中，存在加工的温度高，引起表面硬度上升，而且极其容易粘连而形成机器瘤，加速了刀具磨损。PCB刀具在钻孔，成型中，其 PCB含有SIO2AL2O3等填充料，加上温度低的环氧树脂和玻璃纤维，铜等复合材料，要求涂层有高硬度，高的热稳定性能，和低的摩擦系数。其要解决的问题，硬质涂层必须有良好的抗高温和高温的稳定性。表面必须有良好的化学惰性和自润化表面层，而且表面的自润化效果必须优秀，并且在高温下稳定工作。根据上述特点我们采用了多层和复合纳米层，外加自润化层的复杂结构来应对上述复杂工作条件,我们设计了一种刀具涂层及其生产设备。
发明内容
本发明的目的在于提供一种刀具涂层及其生产设备，以解决上述背景技术中提出的问题。
为实现上述目的，本发明提供如下技术方案：一种刀具涂层，由内到外依次设置金属层、连接层、纳米多层耐磨层和自润滑层，所述金属层为Ti，连接层为TiN或TiAlN，纳米多层耐磨层为TiAlN或AlCrWSiCN，自润滑层为 AlCrWSiCN。
优选的，所述纳米多层耐磨层的厚度为5-100纳米。
优选的，所述纳米多层耐磨层的厚度为10-50纳米，气体表征厚度为1-3 微米。
优选的，所述纳米多层耐磨层的非金属中，5％<O<15％，5％<C<20％。
优选的，所述自润滑层的厚度大于0.3微米，且小于1.5微米。
优选的，所述自润滑层包括SiO、WO3和WC，且10％<O<20％，20％<C<60％。
其生产设备，包括真空腔、与真空腔连接的通入氮气的进气口以及设置在真空腔体上的抽气口，所述真空腔的中部设置有可以旋转的盛放工件的旋转台，所述真空腔内沿着逆时针方向依次设置有离化源、以Ti作为材料的A 靶、以TiAl为材料的B靶以及以AlCrWSi为材料的C靶，且A靶、B靶和C 靶均连接有偏压电源，所述A靶和离化源位于抽气口的两侧。
优选的，所述B靶中40％<Ti<60％，其余为Al，C靶中8％<W<20％,5％<Si<15％、15％<W+Si<30％以及30％<Cr<60％，其余为Al。
优选的，所述真空腔内的压强为0.4-1Pa，温度为480℃，时间为5-8min，且A靶、B靶和C靶的偏压为100-200v，电流为100-150A。
与现有技术相比，本发明的有益效果是：
1、以Ti作为基础层，结合能力更强；
2、连接层为TiN或TiAlN，具有低应力；
3、以TiAlN或AlCrWSiCN为纳米多层耐磨层，耐磨性好，强度更高；
4、以AlCrWSiCN为自润滑层，减小摩擦，特别形成了含AlCrWSi的DLC 层。
附图说明
图1为本发明的结构示意图。
图中：1离化源、2真空腔、3旋转台。
具体实施方式
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
请参阅图1，本发明提供如下技术方案：
实施例1
一种刀具涂层，由内到外依次设置金属层、连接层、纳米多层耐磨层和自润滑层，金属层为Ti，连接层为TiN或TiAlN，纳米多层耐磨层为TiAlN或 AlCrWSiCN，自润滑层为AlCrWSiCN，纳米多层耐磨层的厚度为10纳米，这个厚度更好，气体表征厚度为1微米，纳米多层耐磨层的非金属中，O(氧)为 5％，C(碳)为5％，自润滑层的厚度为0.3微米，保证稳定沉积出良好的高C (碳)层，自润滑层包括SiO、WO3和WC，且O(氧)为10％，C(碳)为60％，特别形成了含AlCrWSi的DLC层。
其生产设备，包括真空腔2、与真空腔2连接的通入氮气的进气口以及设置在真空腔体2上的抽气口，真空腔2的中部设置有可以旋转的盛放工件的旋转台3，这个均为现有技术，真空腔2通过真空泵抽真空，真空腔2内沿着逆时针方向依次设置有离化源1、以Ti作为材料的A靶、以TiAl为材料的B 靶以及以AlCrWSi为材料的C靶，这里A靶和离化源1位于抽气口的两侧，B 靶中Ti为40％，其余为Al，C靶中W为8％,Si为5％、W+Si为15％以及Cr为 30％，其余为Al，真空腔内2的压强为0.4Pa，温度为480℃，时间为5min，且A靶、B靶和C靶的偏压为100v，电流为100A，这里镀层，分层开始，一层层镀上。
实施例2
一种刀具涂层，由内到外依次设置金属层、连接层、纳米多层耐磨层和自润滑层，金属层为Ti，连接层为TiN或TiAlN，纳米多层耐磨层为TiAlN或 AlCrWSiCN，自润滑层为AlCrWSiCN，纳米多层耐磨层的厚度为50纳米，这个厚度更好，气体表征厚度为2微米，纳米多层耐磨层的非金属中，O(氧)为 10％，C(碳)为15％，自润滑层的厚度为0.9微米，保证稳定沉积出良好的高 C(碳)层，自润滑层包括SiO、WO3和WC，且O(氧)为15％，C(碳)为40％,特别形成了含AlCrWSi的DLC层。
其生产设备，包括真空腔2、与真空腔2连接的通入氮气的进气口以及设置在真空腔体2上的抽气口，真空腔2的中部设置有可以旋转的盛放工件的旋转台3，这个均为现有技术，真空腔2通过真空泵抽真空，真空腔2内沿着逆时针方向依次设置有离化源1、以Ti作为材料的A靶、以TiAl为材料的B 靶以及以AlCrWSi为材料的C靶，这里A靶和离化源1位于抽气口的两侧，B 靶中Ti为50％，其余为Al，C靶中W为12％,Si为10％、W+Si为22％以及Cr 为45％，其余为Al，真空腔内2的压强为0.7Pa，温度为480℃，时间为7min，且A靶、B靶和C靶的偏压为150v，电流为125A，这里镀层，分层开始，一层层镀上。
实施例3
一种刀具涂层，由内到外依次设置金属层、连接层、纳米多层耐磨层和自润滑层，金属层为Ti，连接层为TiN或TiAlN，纳米多层耐磨层为TiAlN或 AlCrWSiCN，自润滑层为AlCrWSiCN，纳米多层耐磨层的厚度为100纳米，这个厚度更好，气体表征厚度为3微米，纳米多层耐磨层的非金属中，O(氧) 为15％，C(碳)为20％，自润滑层的厚度为1.5微米，保证稳定沉积出良好的高C(碳)层，自润滑层包括SiO、WO3和WC，且O(氧)为20％，C(碳)为 60％,，特别形成了含AlCrWSi的DLC层。
其生产设备，包括真空腔2、与真空腔2连接的通入氮气的进气口以及设置在真空腔体2上的抽气口，真空腔2的中部设置有可以旋转的盛放工件的旋转台3，这个均为现有技术，真空腔2通过真空泵抽真空，真空腔2内沿着逆时针方向依次设置有离化源1、以Ti作为材料的A靶、以TiAl为材料的B 靶以及以AlCrWSi为材料的C靶，这里A靶和离化源1位于抽气口的两侧，B 靶中Ti为60％，其余为Al，C靶中W为20％,Si为15％、W+Si为30％以及Cr 为35％，其余为Al，真空腔内2的压强为1Pa，温度为480℃，时间为8min，且A靶、B靶和C靶的偏压为200v，电流为150A，这里镀层，分层开始，一层层镀上。
试验
1、R2D4的不锈钢球面铣刀WC的硬质合金100只；
2、工业自动清洗除油脂除腊，烘干；
3、如下表的涂层前条件：
温度 真空值 清洗 清洗偏压 清洗时间 热丝偏流
480C° 0.0045 热丝等离子 120V 40min 15A
工作条件和结果如下：
这里底层的厚度为5分钟达到了0.15微米，连接层TiN的厚度为8分钟达到了0.3微米，达到了预期的效果。
尽管已经示出和描述了本发明的实施例，对于本领域的普通技术人员而言，可以理解在不脱离本发明的原理和精神的情况下可以对这些实施例进行多种变化、修改、替换和变型，本发明的范围由所附权利要求及其等同物限定。

Claims (9)

1.一种刀具涂层，其特征在于：由内到外依次设置金属层、连接层、纳米多层耐磨层和自润滑层，所述金属层为Ti，连接层为TiN或TiAlN，纳米多层耐磨层为TiAlN或AlCrWSiCN，自润滑层为AlCrWSiCN。
2.根据权利要求1所述的一种刀具涂层，其特征在于：所述纳米多层耐磨层的厚度为5-100纳米。
3.根据权利要求2所述的一种刀具涂层，其特征在于：所述纳米多层耐磨层的厚度为10-50纳米，气体表征厚度为1-3微米。
4.根据权利要求3所述的一种刀具涂层，其特征在于：所述纳米多层耐磨层的非金属中，5％<O<15％，5％<C<20％。
5.根据权利要求4所述的一种刀具涂层，其特征在于：所述自润滑层的厚度大于0.3微米，且小于1.5微米。
6.根据权利要求5所述的一种刀具涂层，其特征在于：所述自润滑层包括SiO、WO3和WC，且10％<O<20％，20％<C<60％。
7.根据权利要求6所述的一种刀具涂层的生产设备，包括真空腔(2)、与真空腔(2)连接的通入氮气的进气口以及设置在真空腔体(2)上的抽气口，所述真空腔(2)的中部设置有可以旋转的盛放工件的旋转台(3)，其特征在于：所述真空腔(2)内沿着逆时针方向依次设置有离化源(1)、以Ti作为材料的A靶、以TiAl为材料的B靶以及以AlCrWSi为材料的C靶，且A靶、B靶和C靶均连接有偏压电源，所述A靶和离化源(1)位于抽气口的两侧。
8.根据权利要求7所述的一种刀具涂层的生产设备，其特征在于：所述B靶中40％<Ti<60％，其余为Al，C靶中8％<W<20％,5％<Si<15％、15％<W+Si<30％以及30％<Cr<60％，其余为Al。
9.根据权利要求8所述的一种刀具涂层的生产设备，其特征在于：所述真空腔内(2)的压强为0.4-1Pa，温度为480℃，时间为5-8min，且A靶、B靶和C靶的偏压为100-200v，电流为100-150A。
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