CN110224627A - A kind of Multipurpose composite plasma coating grid bias power supply - Google Patents
A kind of Multipurpose composite plasma coating grid bias power supply Download PDFInfo
- Publication number
- CN110224627A CN110224627A CN201910441985.4A CN201910441985A CN110224627A CN 110224627 A CN110224627 A CN 110224627A CN 201910441985 A CN201910441985 A CN 201910441985A CN 110224627 A CN110224627 A CN 110224627A
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- China
- Prior art keywords
- circuit module
- feet
- bridge circuit
- output end
- voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 24
- 239000011248 coating agent Substances 0.000 title claims abstract description 17
- 239000002131 composite material Substances 0.000 title claims abstract description 15
- 238000007723 die pressing method Methods 0.000 claims abstract description 11
- 230000007704 transition Effects 0.000 claims description 23
- 238000002955 isolation Methods 0.000 claims description 16
- 230000003993 interaction Effects 0.000 claims description 11
- 238000001514 detection method Methods 0.000 claims description 9
- 238000001914 filtration Methods 0.000 claims description 6
- 238000011084 recovery Methods 0.000 claims description 4
- 239000003990 capacitor Substances 0.000 claims description 2
- 230000002452 interceptive effect Effects 0.000 claims 1
- 238000003825 pressing Methods 0.000 claims 1
- 238000005516 engineering process Methods 0.000 abstract description 2
- 230000005611 electricity Effects 0.000 description 8
- 210000002381 plasma Anatomy 0.000 description 7
- 238000010586 diagram Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000010891 electric arc Methods 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 1
- 210000001367 artery Anatomy 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 210000003462 vein Anatomy 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
- H02M11/00—Power conversion systems not covered by the preceding groups
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K5/00—Manipulating of pulses not covered by one of the other main groups of this subclass
- H03K5/22—Circuits having more than one input and one output for comparing pulses or pulse trains with each other according to input signal characteristics, e.g. slope, integral
- H03K5/26—Circuits having more than one input and one output for comparing pulses or pulse trains with each other according to input signal characteristics, e.g. slope, integral the characteristic being duration, interval, position, frequency, or sequence
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K7/00—Modulating pulses with a continuously-variable modulating signal
- H03K7/10—Combined modulation, e.g. rate modulation and amplitude modulation
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Inverter Devices (AREA)
Abstract
Description
Claims (8)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201910441985.4A CN110224627A (en) | 2019-05-24 | 2019-05-24 | A kind of Multipurpose composite plasma coating grid bias power supply |
Applications Claiming Priority (1)
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---|---|---|---|
CN201910441985.4A CN110224627A (en) | 2019-05-24 | 2019-05-24 | A kind of Multipurpose composite plasma coating grid bias power supply |
Publications (1)
Publication Number | Publication Date |
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CN110224627A true CN110224627A (en) | 2019-09-10 |
Family
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Family Applications (1)
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CN201910441985.4A Pending CN110224627A (en) | 2019-05-24 | 2019-05-24 | A kind of Multipurpose composite plasma coating grid bias power supply |
Country Status (1)
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CN (1) | CN110224627A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110649809A (en) * | 2019-11-06 | 2020-01-03 | 唐山标先电子有限公司 | High-power asymmetric bipolar pulse bias power supply, method and application thereof |
CN110965049A (en) * | 2019-12-04 | 2020-04-07 | 江苏菲沃泰纳米科技有限公司 | Electrode holder and method for operating an electrode holder |
CN111020534A (en) * | 2019-12-04 | 2020-04-17 | 江苏菲沃泰纳米科技有限公司 | Film coating equipment |
CN111041457A (en) * | 2019-12-04 | 2020-04-21 | 江苏菲沃泰纳米科技有限公司 | Coating equipment and working method thereof |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5630952A (en) * | 1994-12-27 | 1997-05-20 | Sansha Electric Manufacturing Company, Limited | Plasma-arc power supply apparatus |
JP2001329364A (en) * | 2000-05-17 | 2001-11-27 | Ken Yukimura | Method and apparatus for plasma ion implantation |
CN102357730A (en) * | 2011-09-15 | 2012-02-22 | 北京航空航天大学 | Bias power supply device suitable for pulse electronic beam welding |
CN103036469A (en) * | 2012-12-07 | 2013-04-10 | 浙江大学 | High-voltage pulse power supply |
CN103151950A (en) * | 2013-03-18 | 2013-06-12 | 桂林狮达机电技术工程有限公司 | Grid bias power supply of electron beam machining equipment and application structure and application operation method of grid bias power supply |
CN203151396U (en) * | 2013-02-05 | 2013-08-21 | 新疆大学 | Multifunctional numerical-control pulse power supply |
CN209913732U (en) * | 2019-05-24 | 2020-01-07 | 核工业西南物理研究院 | Multipurpose combined type bias power supply for plasma coating |
-
2019
- 2019-05-24 CN CN201910441985.4A patent/CN110224627A/en active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5630952A (en) * | 1994-12-27 | 1997-05-20 | Sansha Electric Manufacturing Company, Limited | Plasma-arc power supply apparatus |
JP2001329364A (en) * | 2000-05-17 | 2001-11-27 | Ken Yukimura | Method and apparatus for plasma ion implantation |
CN102357730A (en) * | 2011-09-15 | 2012-02-22 | 北京航空航天大学 | Bias power supply device suitable for pulse electronic beam welding |
CN103036469A (en) * | 2012-12-07 | 2013-04-10 | 浙江大学 | High-voltage pulse power supply |
CN203151396U (en) * | 2013-02-05 | 2013-08-21 | 新疆大学 | Multifunctional numerical-control pulse power supply |
CN103151950A (en) * | 2013-03-18 | 2013-06-12 | 桂林狮达机电技术工程有限公司 | Grid bias power supply of electron beam machining equipment and application structure and application operation method of grid bias power supply |
CN209913732U (en) * | 2019-05-24 | 2020-01-07 | 核工业西南物理研究院 | Multipurpose combined type bias power supply for plasma coating |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110649809A (en) * | 2019-11-06 | 2020-01-03 | 唐山标先电子有限公司 | High-power asymmetric bipolar pulse bias power supply, method and application thereof |
CN110649809B (en) * | 2019-11-06 | 2020-09-08 | 唐山标先电子有限公司 | High-power asymmetric bipolar pulse bias power supply, method and application thereof |
CN110965049A (en) * | 2019-12-04 | 2020-04-07 | 江苏菲沃泰纳米科技有限公司 | Electrode holder and method for operating an electrode holder |
CN111020534A (en) * | 2019-12-04 | 2020-04-17 | 江苏菲沃泰纳米科技有限公司 | Film coating equipment |
CN111041457A (en) * | 2019-12-04 | 2020-04-21 | 江苏菲沃泰纳米科技有限公司 | Coating equipment and working method thereof |
CN111020534B (en) * | 2019-12-04 | 2023-03-10 | 江苏菲沃泰纳米科技股份有限公司 | Film coating equipment |
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Address after: No.5, Huangjing Road, Southwest Airport, Shuangliu, Chengdu, Sichuan 610041 Applicant after: SOUTHWESTERN INSTITUTE OF PHYSICS Applicant after: Zhonghe Tongchuang (Chengdu) Technology Co.,Ltd. Address before: No.5, Huangjing Road, Southwest Airport, Shuangliu, Chengdu, Sichuan 610041 Applicant before: SOUTHWESTERN INSTITUTE OF PHYSICS Applicant before: CHENGDU TONGCHUANG MATERIAL SURFACE TECHNOLOGY CO.,LTD. |
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TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20220808 Address after: No. 219, section 4, xihanggang Avenue, Shuangliu Southwest Airport Economic Development Zone, Chengdu, Sichuan 610207 Applicant after: Zhonghe Tongchuang (Chengdu) Technology Co.,Ltd. Address before: No.5, Huangjing Road, Southwest Airport, Shuangliu, Chengdu, Sichuan 610041 Applicant before: SOUTHWESTERN INSTITUTE OF PHYSICS Applicant before: Zhonghe Tongchuang (Chengdu) Technology Co.,Ltd. |