CN110176389A - 一种制备金-硫化银-磷酸铅异质结纳米薄膜的方法 - Google Patents
一种制备金-硫化银-磷酸铅异质结纳米薄膜的方法 Download PDFInfo
- Publication number
- CN110176389A CN110176389A CN201910431722.5A CN201910431722A CN110176389A CN 110176389 A CN110176389 A CN 110176389A CN 201910431722 A CN201910431722 A CN 201910431722A CN 110176389 A CN110176389 A CN 110176389A
- Authority
- CN
- China
- Prior art keywords
- film
- electrode
- concentration
- solution
- secondary water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 13
- 239000010409 thin film Substances 0.000 title claims abstract description 10
- -1 gold-silver sulfide-lead phosphate Chemical compound 0.000 title claims abstract description 4
- 239000010408 film Substances 0.000 claims abstract description 69
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 33
- 229910000156 lead(II) phosphate Inorganic materials 0.000 claims abstract description 30
- 238000002360 preparation method Methods 0.000 claims abstract description 4
- 238000002484 cyclic voltammetry Methods 0.000 claims abstract 2
- 239000000243 solution Substances 0.000 claims description 39
- 239000007788 liquid Substances 0.000 claims description 18
- 238000004070 electrodeposition Methods 0.000 claims description 17
- 239000011521 glass Substances 0.000 claims description 14
- 238000004458 analytical method Methods 0.000 claims description 11
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 10
- 238000001035 drying Methods 0.000 claims description 10
- 229910019142 PO4 Inorganic materials 0.000 claims description 9
- 239000003643 water by type Substances 0.000 claims description 9
- 101710134784 Agnoprotein Proteins 0.000 claims description 5
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 claims description 5
- SJUCACGNNJFHLB-UHFFFAOYSA-N O=C1N[ClH](=O)NC2=C1NC(=O)N2 Chemical compound O=C1N[ClH](=O)NC2=C1NC(=O)N2 SJUCACGNNJFHLB-UHFFFAOYSA-N 0.000 claims description 5
- 229910021607 Silver chloride Inorganic materials 0.000 claims description 5
- 238000007605 air drying Methods 0.000 claims description 5
- 239000012299 nitrogen atmosphere Substances 0.000 claims description 5
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 claims description 5
- WOWHHFRSBJGXCM-UHFFFAOYSA-M cetyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)C WOWHHFRSBJGXCM-UHFFFAOYSA-M 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 230000005611 electricity Effects 0.000 claims description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 2
- 239000007853 buffer solution Substances 0.000 claims 1
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 claims 1
- 238000002604 ultrasonography Methods 0.000 claims 1
- 238000011953 bioanalysis Methods 0.000 abstract description 4
- 229910004042 HAuCl4 Inorganic materials 0.000 abstract 1
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 239000000463 material Substances 0.000 description 7
- 239000002086 nanomaterial Substances 0.000 description 6
- 230000003139 buffering effect Effects 0.000 description 4
- 125000004122 cyclic group Chemical group 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000004832 voltammetry Methods 0.000 description 4
- 239000007832 Na2SO4 Substances 0.000 description 3
- 229910052938 sodium sulfate Inorganic materials 0.000 description 3
- 229910052946 acanthite Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- FSJWWSXPIWGYKC-UHFFFAOYSA-M silver;silver;sulfanide Chemical compound [SH-].[Ag].[Ag+] FSJWWSXPIWGYKC-UHFFFAOYSA-M 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000010189 synthetic method Methods 0.000 description 2
- WWSNLNXXISONLQ-UHFFFAOYSA-N C(CCCCCCCCCCCCCCC)Cl(C)(C)C Chemical compound C(CCCCCCCCCCCCCCC)Cl(C)(C)C WWSNLNXXISONLQ-UHFFFAOYSA-N 0.000 description 1
- 238000004566 IR spectroscopy Methods 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000002500 effect on skin Effects 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002120 nanofilm Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000005622 photoelectricity Effects 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y15/00—Nanotechnology for interacting, sensing or actuating, e.g. quantum dots as markers in protein assays or molecular motors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02425—Conductive materials, e.g. metallic silicides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02568—Chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02628—Liquid deposition using solutions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/0328—Inorganic materials including, apart from doping materials or other impurities, semiconductor materials provided for in two or more of groups H01L31/0272 - H01L31/032
- H01L31/0336—Inorganic materials including, apart from doping materials or other impurities, semiconductor materials provided for in two or more of groups H01L31/0272 - H01L31/032 in different semiconductor regions, e.g. Cu2X/CdX hetero- junctions, X being an element of Group VI of the Periodic Table
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Electromagnetism (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Composite Materials (AREA)
- Inorganic Chemistry (AREA)
- Photovoltaic Devices (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
本发明公开了一种制备金‑硫化银‑磷酸铅异质结纳米薄膜的方法。其方法步骤:先利用循环伏安法将PbS沉积在电极表面,然后将电极置于Ag2S的生长液中,于于60℃恒温水浴锅中反应24h后,电极表面即可同时生长出Ag2S‑Pb3(PO4)2异质结纳米薄膜。随后将Ag2S‑Pb3(PO4)2异质结纳米薄膜置于置于HAuCl4的溶液中,于60℃恒温水浴锅中反应6h,电极表面即可生成Au‑Ag2S‑Pb3(PO4)2异质结纳米薄膜。本发明方法成本制备过程简单,且制得的Au‑Ag2S‑Pb3(PO4)2异质结纳米薄膜附着力强,薄膜中金具有纳米尺寸,具有一定的生物分析应用价值。
Description
技术领域
本发明纳米薄膜材料领域及电化学领域,特别涉及一种制备Au-Ag2S-Pb3(PO4)2异质结纳米薄膜的方法。
背景技术
“异质结”是指两种或两种以上半导体相接触所形成的界面区域。随着科学技术的发展,半导体材料和纳米技术的结合越来越密切,纳米异质结具有纳米材料的表面效应、量子尺寸效应、宏观量子隧道效应和介电限域效应等性质,与传统固体材料相比具有很多优点。
Ag2S是一种n型质结禁带半导体材料,Ag2S具有良好的光电和热电效应,因而被广泛地应用于发光材料、红外光谱检测器和光纤维通讯等领域。Au纳米材料具有生物亲和性和相容性好的特点,被广泛应用于生物传感领域,然而传统的Au纳米材料制备条件较为苛刻,合成过程繁琐,因而寻找简便快捷的Au纳米材料合成方法有助于生物分析领域的研究进展。同时,将Ag2S和Au纳米材料相结合的复合材料,不仅能保留半导体的优异光电性能,还能提升材料的生物分析性能,扩大异质结材料的应用范围。
发明内容
本发明的目的是提供一种制备Au-Ag2S-Pb3(PO4)2异质结纳米薄膜的方法。
具体步骤为:
(1)将事先裁好的ITO导电玻璃电极,分别经由分析纯丙酮、分析纯乙醇和二次水超声清洗5min,干燥后用万能表测出导电面待用。
(2)依次量取1mL浓度为0.2mol/L Pb(NO3)2、1mL浓度为0.2mol/L EDTA、3.5mL浓度为0.3mol/L Na2S2O3和4mL浓度为1.25mol/L Na2SO4溶液置于20mL烧杯中均匀混合,制得电沉积PbS薄膜的底液。
(3)在步骤(2)中制得的电沉积PbS薄膜的底液中建立三电极体系,其中,工作电极为步骤(1)中制得的导电玻璃电极,对电极为Pt电极,参比电极为Ag/AgCl电极,用循环伏安法进行电沉积,电位扫描范围为-1.0V~0V,扫描速度为0.05V/s,扫描段数为40~120。电沉积结束后,将电极取出并用二次水冲洗干净,空气烘干后即可得到PbS薄膜。
(4)将步骤(3)制得的PbS薄膜置于250℃管式炉,氮气氛围中加热1h,待管式炉等却后将PbS薄膜取出。
(5)于20mL的玻璃瓶中依次加入700μL浓度为0.02mol/L的Na2HPO4溶液,80μL浓度为0.01mol/L的AgNO3溶液,100μL质量分数为1%的十二烷基苯磺酸钠溶液,7mL二次水,制得生长Ag2S-Pb3(PO4)2薄膜的生长液,将步骤(4)中制得的PbS薄膜正面朝上放入生长溶液中,于60℃恒温水浴中反应24h后取出PbS薄膜,以二次水冲洗干净,烘干即可得到Ag2S-Pb3(PO4)2薄膜。
(6)于20mL的玻璃瓶中依次加入300μL浓度为0.2mol/L、pH为6的HAc-NaAc缓冲溶液,15μL~100μL质量分数为1%的氯金酸溶液,80μL浓度为0.2mol/L的十六烷基三甲基氯化铵溶液,7mL二次水,制得生长Au-Ag2S-Pb3(PO4)2薄膜的生长液,将步骤(4)中制得的Ag2S-Pb3(PO4)2薄膜置正面朝上放入该生长液中,于60℃恒温水浴反应0.5h~24h后取出,以二次水冲洗干净,烘干即可得到Au-Ag2S-Pb3(PO4)2纳米异质结薄膜。
所述步骤(1)中的ITO导电玻璃为掺杂氧化铟锡的玻璃电极。
本发明方法的优点如下:
(1)本发明方法制得的Au-Ag2S-Pb3(PO4)2纳米异质结薄膜综合了无机材料、半导体材料和纳米材料的优良特性,在光电化学、生物分析以及环保等领域中展现出广阔的应用前景。
(2)本发明方法制备过程简单,试剂消耗量小,成本低,易于大规模生产。
附图说明
图1是本发明实施例1制备的Au-Ag2S-Pb3(PO4)2纳米异质结薄膜的扫描电子显微镜照片(SEM)。
图2是本发明实施例1制备的Au-Ag2S-Pb3(PO4)2纳米异质结薄膜的X射线衍射图谱。
具体实施方式
实施例1
本实施例用于说明本发明制备的Au-Ag2S-Pb3(PO4)2纳米异质结薄膜的合成方法及形貌、组成分析。
(1)将事先裁好的1cm×3cm的ITO导电玻璃电极,分别经由分析纯丙酮、分析纯乙醇和二次水超声清洗5min,干燥后用万能表测出导电面待用。
(2)依次量取1mL浓度为0.2mol/L Pb(NO3)2溶液、1mL浓度为0.2mol/L EDTA溶液、3.5mL浓度为0.3mol/L Na2S2O3溶液和4mL 1.25mol/L Na2SO4溶液置于20mL烧杯中均匀混合,制得电沉积PbS薄膜的底液。
(3)在步骤(2)中制得的电沉积PbS薄膜的底液中建立三电极体系,其中,工作电极为步骤(1)中制得的导电玻璃电极,对电极为Pt电极,参比电极为Ag/AgCl电极,用循环伏安法进行电沉积,电位扫描范围为-1.0V~0V,扫描速度为0.05V/s,扫描段数为100。电沉积结束后,将电极取出并用二次水冲洗干净,空气烘干后即可得到PbS薄膜。
(4)将步骤(3)制得的PbS薄膜置于250℃管式炉,氮气氛围中加热1h,待管式炉等却后将PbS薄膜取出。
(5)于20mL的玻璃瓶中依次加入700μL浓度为0.02mol/L的Na2HPO4溶液,80μL浓度为0.01mol/L的AgNO3溶液,100μL质量分数为1%的十二烷基苯磺酸钠溶液,7mL二次水,制得生长Ag2S-Pb3(PO4)2薄膜的生长液。将步骤(4)中制得的PbS薄膜正面朝上放入生长溶液中,于60℃恒温水浴中反应24h后取出PbS薄膜,以二次水冲洗干净,烘干即可得到Ag2S-Pb3(PO4)2薄膜。
(6)于20mL的玻璃瓶中依次加入300μL浓度为0.2mol/L、pH为6的HAc-NaAc缓冲溶液,25μL质量分数为1%的氯金酸溶液,80μL浓度为0.2mol/L的十六烷基三甲基氯化铵溶液,7mL二次水,制得生长Au-Ag2S-Pb3(PO4)2薄膜的生长液,将步骤(4)中制得的Ag2S-Pb3(PO4)2薄膜置正面朝上放入该生长液中,于60℃恒温水浴反应3h后取出,以二次水冲洗干净,烘干即可得到Au-Ag2S-Pb3(PO4)2纳米异质结薄膜。
图1为本实施例中所得Au-Ag2Se-Pb3(PO4)2纳米异质结薄膜的扫描电子纤维镜(SEM)照片,由图1可见Au-Ag2S-Pb3(PO4)2纳米异质结薄膜微观上呈现出由粗细均匀的棒状形成的网状结构。
图2为本实施例中所得Au-Ag2Se-Pb3(PO4)2纳米异质结薄膜的X射线衍射(XRD)图谱,由图2可见该薄膜中含有Au、Ag2S和Pb3(PO4)2。
实施例2
(1)将事先裁好的1cm×3cm的ITO导电玻璃电极,分别经由分析纯丙酮、分析纯乙醇和二次水超声清洗5min,干燥后用万能表测出导电面待用。
(2)依次量取1mL浓度为0.2mol/L Pb(NO3)2溶液、1mL浓度为0.2mol/L EDTA溶液、3.5mL浓度为0.3mol/L Na2S2O3溶液和4mL浓度为1.25mol/L Na2SO4溶液置于20mL烧杯中均匀混合,制得电沉积PbS薄膜的底液。
(3)在步骤(2)中制得的电沉积PbS薄膜的底液中建立三电极体系,其中,工作电极为步骤(1)中制得的导电玻璃电极,对电极为Pt电极,参比电极为Ag/AgCl电极,用循环伏安法进行电沉积,电位扫描范围为-1.0V~0V,扫描速度为0.05V/s,扫描段数为40。电沉积结束后,将电极取出并用二次水冲洗干净,空气烘干后即可得到PbS薄膜。
(4)将步骤(3)制得的PbS薄膜置于250℃管式炉,氮气氛围中加热1h,待管式炉等却后将PbS薄膜取出。
(5)于20mL的玻璃瓶中依次加入700μL浓度为0.02mol/L的Na2HPO4溶液,80μL浓度为0.01mol/L的AgNO3溶液,100μL质量分数为1%的十二烷基苯磺酸钠溶液,7mL二次水,制得生长Ag2S-Pb3(PO4)2薄膜的生长液。将步骤(4)中制得的PbS薄膜正面朝上放入生长溶液中,于60℃恒温水浴中反应24h后取出PbS薄膜,以二次水冲洗干净,烘干即可得到Ag2S-Pb3(PO4)2薄膜。
(6)于20mL的玻璃瓶中依次加入300μL浓度为0.2mol/L、pH为6的HAc-NaAc缓冲溶液,25μL质量分数为1%的氯金酸溶液,80μL浓度为0.2mol/L的十六烷基三甲基氯化铵溶液,7mL二次水,制得生长Au-Ag2S-Pb3(PO4)2薄膜的生长液,将步骤(4)中制得的Ag2S-Pb3(PO4)2薄膜置正面朝上放入该生长液中,于60℃恒温水浴反应0.5h后取出,以二次水冲洗干净,烘干即可得到Au-Ag2S-Pb3(PO4)2纳米异质结薄膜。
实施例3
(1)将事先裁好的1cm×3cm的ITO导电玻璃电极,分别经由分析纯丙酮、分析纯乙醇和二次水超声清洗5min,干燥后用万能表测出导电面待用。
(2)依次量取1mL浓度为0.2mol/L Pb(NO3)2溶液、1mL浓度为0.2mol/L EDTA溶液、3.5mL浓度为0.3mol/L Na2S2O3溶液和4mL浓度为1.25mol/L Na2SO4溶液置于20mL烧杯中均匀混合,制得电沉积PbS薄膜的底液。
(3)在步骤(2)中制得的电沉积PbS薄膜的底液中建立三电极体系,其中,工作电极为步骤(1)中制得的导电玻璃电极,对电极为Pt电极,参比电极为Ag/AgCl电极,用循环伏安法进行电沉积,电位扫描范围为-1.0V~0V,扫描速度为0.05V/s,扫描段数为120,电沉积结束后,将电极取出并用二次水冲洗干净,空气烘干后即可得到PbS薄膜。
(4)将步骤(3)制得的PbS薄膜置于250℃管式炉,氮气氛围中加热1h,待管式炉等却后将PbS薄膜取出。
(5)于20mL的玻璃瓶中依次加入700μL浓度为0.02mol/L的Na2HPO4溶液,80μL浓度为0.01mol/L的AgNO3溶液,100μL质量分数为1%的十二烷基苯磺酸钠溶液,7mL二次水,制得生长Ag2S-Pb3(PO4)2薄膜的生长液。将步骤(4)中制得的PbS薄膜正面朝上放入生长溶液中,于60℃恒温水浴中反应24h后取出PbS薄膜,以二次水冲洗干净,烘干即可得到Ag2S-Pb3(PO4)2薄膜。
(6)于20mL的玻璃瓶中依次加入300μL浓度为0.2mol/L、pH为6的HAc-NaAc缓冲溶液,25μL质量分数为1%的氯金酸溶液,80μL浓度为0.2mol/L的十六烷基三甲基氯化铵溶液,7mL二次水,制得生长Au-Ag2S-Pb3(PO4)2薄膜的生长液,将步骤(4)中制得的Ag2S-Pb3(PO4)2薄膜置正面朝上放入该生长液中,于60℃恒温水浴反应24h后取出,以二次水冲洗干净,烘干即可得到Au-Ag2S-Pb3(PO4)2纳米异质结薄膜。
以上仅是本发明的优选实施例,本发明的保护范围并不仅局限于上述实施例。
Claims (2)
1.一种制备金-硫化银-磷酸铅异质结纳米薄膜的方法,其特征在于具体步骤为:
(1)将事先裁好的ITO导电玻璃电极,分别经由分析纯丙酮、分析纯乙醇和二次水超声清洗5min,干燥后用万能表测出导电面待用;
(2)依次量取1mL浓度为0.2mol/L Pb(NO3)2、1mL浓度为0.2mol/L EDTA、3.5mL浓度为0.3mol/L Na2S2O3和4mL浓度为1.25mol/L Na2SO4溶液置于20mL烧杯中均匀混合,制得电沉积PbS薄膜的底液;
(3)在步骤(2)中制得的电沉积PbS薄膜的底液中建立三电极体系,其中,工作电极为步骤(1)中制得的导电玻璃电极,对电极为Pt电极,参比电极为Ag/AgCl电极,用循环伏安法进行电沉积,电位扫描范围为-1.0V~0V,扫描速度为0.05V/s,扫描段数为40~120,电沉积结束后,将电极取出并用二次水冲洗干净,空气烘干后即可得到PbS薄膜;
(4)将步骤(3)制得的PbS薄膜置于250℃管式炉,氮气氛围中加热1h,待管式炉等却后将PbS薄膜取出;
(5)于20mL的玻璃瓶中依次加入700μL浓度为0.02mol/L的Na2HPO4溶液,80μL浓度为0.01mol/L的AgNO3溶液,100μL质量分数为1%的十二烷基苯磺酸钠溶液,7mL二次水,制得生长Ag2S-Pb3(PO4)2薄膜的生长液,将步骤(4)中制得的PbS薄膜正面朝上放入生长溶液中,于60℃恒温水浴中反应24h后取出PbS薄膜,以二次水冲洗干净,烘干即可得到Ag2S-Pb3(PO4)2薄膜;
(6)于20mL的玻璃瓶中依次加入300μL浓度为0.2mol/L、pH为6的HAc-NaAc缓冲溶液,15μL~100μL质量分数为1%的氯金酸溶液,80μL浓度为0.2mol/L的十六烷基三甲基氯化铵溶液,7mL二次水,制得生长Au-Ag2S-Pb3(PO4)2薄膜的生长液,将步骤(4)中制得的Ag2S-Pb3(PO4)2薄膜置正面朝上放入该生长液中,于60℃恒温水浴反应0.5h~24h后取出,以二次水冲洗干净,烘干即可得到Au-Ag2S-Pb3(PO4)2纳米异质结薄膜。
2.根据权利要求1所述的制备方法,其特征在于所述步骤(1)中的ITO导电玻璃为掺杂氧化铟锡的玻璃电极。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910431722.5A CN110176389B (zh) | 2019-05-23 | 2019-05-23 | 一种制备金-硫化银-磷酸铅异质结纳米薄膜的方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910431722.5A CN110176389B (zh) | 2019-05-23 | 2019-05-23 | 一种制备金-硫化银-磷酸铅异质结纳米薄膜的方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN110176389A true CN110176389A (zh) | 2019-08-27 |
CN110176389B CN110176389B (zh) | 2021-01-15 |
Family
ID=67691898
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201910431722.5A Active CN110176389B (zh) | 2019-05-23 | 2019-05-23 | 一种制备金-硫化银-磷酸铅异质结纳米薄膜的方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN110176389B (zh) |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008056511A (ja) * | 2006-08-30 | 2008-03-13 | Nagoya Institute Of Technology | 硫化金属ナノ粒子の製造方法及び光電変換素子 |
US20080305334A1 (en) * | 2007-06-07 | 2008-12-11 | Samsung Electronics Co., Ltd. | Core/shell nanocrystals and method for producing the same |
CN105499596A (zh) * | 2015-12-06 | 2016-04-20 | 桂林理工大学 | 在电沉积CdSe薄膜上自发生长Au纳米微粒的方法 |
CN105861294A (zh) * | 2016-04-07 | 2016-08-17 | 上海工程技术大学 | 一种半导体异质结dna生物传感器及其制备与应用 |
CN106501344A (zh) * | 2016-10-26 | 2017-03-15 | 桂林理工大学 | 一种制备Ag2Se‑Pb3(PO4)2异质结纳米薄膜的方法 |
CN109355673A (zh) * | 2018-10-30 | 2019-02-19 | 华南理工大学 | 一种Au-Ag/Ag2S异质结纳米析氢催化剂及其制备方法 |
-
2019
- 2019-05-23 CN CN201910431722.5A patent/CN110176389B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008056511A (ja) * | 2006-08-30 | 2008-03-13 | Nagoya Institute Of Technology | 硫化金属ナノ粒子の製造方法及び光電変換素子 |
US20080305334A1 (en) * | 2007-06-07 | 2008-12-11 | Samsung Electronics Co., Ltd. | Core/shell nanocrystals and method for producing the same |
CN105499596A (zh) * | 2015-12-06 | 2016-04-20 | 桂林理工大学 | 在电沉积CdSe薄膜上自发生长Au纳米微粒的方法 |
CN105861294A (zh) * | 2016-04-07 | 2016-08-17 | 上海工程技术大学 | 一种半导体异质结dna生物传感器及其制备与应用 |
CN106501344A (zh) * | 2016-10-26 | 2017-03-15 | 桂林理工大学 | 一种制备Ag2Se‑Pb3(PO4)2异质结纳米薄膜的方法 |
CN109355673A (zh) * | 2018-10-30 | 2019-02-19 | 华南理工大学 | 一种Au-Ag/Ag2S异质结纳米析氢催化剂及其制备方法 |
Non-Patent Citations (1)
Title |
---|
韩成等: "纳米异质结光催化材料制取太阳能燃料研究进展", 《无 机 材 料 学 报》 * |
Also Published As
Publication number | Publication date |
---|---|
CN110176389B (zh) | 2021-01-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Ge et al. | Electrochemical biosensor based on graphene oxide–Au nanoclusters composites for l-cysteine analysis | |
Ansari et al. | Effect of nanostructure on the urea sensing properties of sol–gel synthesized ZnO | |
Stiger et al. | Investigations of electrochemical silver nanocrystal growth on hydrogen-terminated silicon (100) | |
GB2451596A (en) | Semiconductor electrochemical sensors | |
CN105499596B (zh) | 在电沉积CdSe薄膜上自发生长Au纳米微粒的方法 | |
Miao et al. | Glucose oxidase immobilization platform based on ZnO nanowires supported by silicon nanowires for glucose biosensing | |
Collinson et al. | Electroactivity of redox probes encapsulated within sol-gel-derived silicate films | |
Liu et al. | Construction of the direct Z-scheme CdTe/APTES-WO3 heterostructure by interface engineering for cathodic “signal-off” photoelectrochemical aptasensing of streptomycin at sub-nanomole level | |
CN101776639A (zh) | ZnO纳米线生物传感器及其制备方法 | |
Marie et al. | Vertically grown zinc oxide nanorods functionalized with ferric oxide for in vivo and non-enzymatic glucose detection | |
Negahdary et al. | A biosensor for determination of H2O2 by use of HRP enzyme and modified CPE with ZnO NPs | |
CN111103340A (zh) | 纳米粒子修饰的玻碳电极的制备方法及其应用 | |
CN103616418A (zh) | 一种dna电化学生物传感器及其制备方法 | |
Fatema et al. | New design of active material based on YInWO4-G-SiO2 for a urea sensor and high performance for nonenzymatic electrical sensitivity | |
CN105004712B (zh) | 一种用于啶虫脒检测的光电化学传感器的构建方法和检测方法 | |
Slewa et al. | Effect of Sn doping and annealing on the morphology, structural, optical, and electrical properties of 3D (micro/nano) V2O5 sphere for high sensitivity pH-EGFET sensor | |
Zhang et al. | On-chip surface modified nanostructured ZnO as functional pH sensors | |
CN107138736B (zh) | 一种聚集态磷光铜纳米簇的制备方法及其应用 | |
Mazurków et al. | Nonenzymatic glucose sensors based on copper sulfides: Effect of binder-particles interactions in drop-casted suspensions on electrodes electrochemical performance | |
CN105241938B (zh) | 一种基于稀磁半导体的钾离子核酸适配体光电化学传感器的构建及检测方法 | |
CN110176389A (zh) | 一种制备金-硫化银-磷酸铅异质结纳米薄膜的方法 | |
Sung et al. | Ion-Pair Ligand-Assisted Surface Stoichiometry Control of Ag2S Nanocrystals | |
CN106501344B (zh) | 一种制备Ag2Se-Pb3(PO4)2异质结纳米薄膜的方法 | |
Pruna et al. | Electrochemical characterization of organosilane-functionalized nanostructured ITO surfaces | |
Razmi et al. | Preparation, electrochemistry, and electrocatalytic activity of lead pentacyanonitrosylferrate film immobilized on carbon ceramic electrode |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
EE01 | Entry into force of recordation of patent licensing contract |
Application publication date: 20190827 Assignee: URIT Medical Electronic Co.,Ltd. Assignor: GUILIN University OF TECHNOLOGY Contract record no.: X2023980044242 Denomination of invention: A Method for Preparing Gold Silver Sulfide Lead Phosphate Heterojunction Nanofilms Granted publication date: 20210115 License type: Common License Record date: 20231024 |
|
EE01 | Entry into force of recordation of patent licensing contract |