CN110075995A - A kind of magnetic filter - Google Patents
A kind of magnetic filter Download PDFInfo
- Publication number
- CN110075995A CN110075995A CN201910326052.0A CN201910326052A CN110075995A CN 110075995 A CN110075995 A CN 110075995A CN 201910326052 A CN201910326052 A CN 201910326052A CN 110075995 A CN110075995 A CN 110075995A
- Authority
- CN
- China
- Prior art keywords
- beam current
- magnetic filter
- flange
- current tube
- outlet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C1/00—Magnetic separation
- B03C1/02—Magnetic separation acting directly on the substance being separated
- B03C1/023—Separation using Lorentz force, i.e. deflection of electrically charged particles in a magnetic field
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The present invention discloses a kind of magnetic filter, including beam current tube, field coil, quadrupole lense device；The field coil is sheathed on the beam current tube, and the quadrupole lense device is correspondingly arranged in the port position of the beam current tube, and is set to the outside of the beam current tube, and ion beam current is flowed by the end of the beam current tube and flowed out from the other end；Magnetic filter of the present invention can produce magnetic deflection field, achieve the purpose that separate required charged particle with bulky grain during Particle Delivery.
Description
Technical field
The present invention relates to field of surface engineering technique, and in particular to a kind of magnetic filter.
Background technique
What the bulky grain in cathodic arc ion plating was generated from cathodic arc spot when target material surface constantly moves burning
Neutral particle cluster, these neutral particle clusters erupt together with plasma, fly the film layer just in deposition growing
Surface forms surface particulate contamination.
Mainly due to excessively high power density at cathode protection, the electric discharge of cathode arc spot is concentrated for the formation of bulky grain,
Non-static, the quite high current density in part is formd (up to 105~108A/cm in target material surface2) and very high office
Portion's power density is (up to 109W/cm2), for target provide one from the complete ionization of solid-state be plasma local phase transformation item
Part, while some drops are ejected from surface, form bulky grain pollution.
In view of the above drawbacks, creator of the present invention obtains the present invention by prolonged research and practice finally.
Summary of the invention
To solve above-mentioned technological deficiency, the technical solution adopted by the present invention is, provides a kind of magnetic filter, including beam
Flow tube road, field coil, quadrupole lense device；The field coil is sheathed on the beam current tube, the quadrupole lense dress
The port position for being correspondingly arranged in the beam current tube is set, and is set to the outside of the beam current tube, ion beam current passes through institute
The end for stating beam current tube flows into and flows out from the other end.
Preferably, the magnetic filter further includes inlet flange and outlet(discharge) flange, the inlet flange and the outlet
Flange is respectively arranged at the both ends of the beam current tube, and the inlet flange is that ion beam current enters entering for the magnetic filter
Mouthful, the outlet(discharge) flange is the outlet of ion beam current, and the inlet flange and the outlet(discharge) flange are used to connect corresponding equipment.
Preferably, the quadrupole lense device corresponds to the outlet(discharge) flange setting.
Preferably, the beam current tube is set as bend pipe or straight tube.
Preferably, the beam current tube uses metal or nonmetallic materials.
Preferably, the field coil is formed by hollow conductor coiling, refrigerant is passed through inside the hollow conductor.
Preferably, the cross sectional shape of the hollow conductor is provided in round, is rectangular or one of oval.
Preferably, the quadrupole lense device is made of four pieces of electromagnetic poles, annular is distributed in the filter pipe outlet end
It is external.
Compared with the prior art the beneficial effects of the present invention are: magnetic filter of the present invention can produce deflection magnetic
, achieve the purpose that separate required charged particle with bulky grain during Particle Delivery.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of magnetron sputtering apparatus of the present invention；
Fig. 2 is the beam current tube Common Shape figure；
Fig. 3 is the lead loop section Common Shape figure.
Digital representation in figure:
1- inlet flange；2- beam current tube；3- field coil；4- quadrupole lense device；5- outlet(discharge) flange.
Specific embodiment
Below in conjunction with attached drawing, the forgoing and additional technical features and advantages are described in more detail.
As shown in FIG. 1, FIG. 1 is the structural schematic diagrams of magnetic filter of the present invention；Magnetic filter of the present invention
Including inlet flange 1, beam current tube 2, field coil 3, quadrupole lense device 4, outlet(discharge) flange 5；The inlet flange 1 and described
Outlet(discharge) flange 5 is respectively arranged at the both ends of the beam current tube 2, and the field coil 3 is sheathed on the beam current tube 2, institute
The position that quadrupole lense device 4 is correspondingly arranged in the outlet(discharge) flange 5 is stated, and is set to the outside of the beam current tube 2.
Installation of the inlet flange 1 between ion source apparatus is fixed, and enters the magnetic mistake as ion beam current
Filter the entrance of device；The beam current tube 2 is the circulation passage of ion beam current；The field coil 3 is wound in the line pipe
Outside road 2, pack magnetic field is provided after galvanization in the beam current tube 2；The quadrupole lense device 4 is set to the line
Outside the pipe in 2 exit of pipeline, ion beam-emergence direction can be controlled；The outlet(discharge) flange 5 is for the installation with subsequent components
It is fixed, the outlet as ion beam current.
Specifically, electrons are acted on by Lorentz force in plasma in the apparatus, rotate around the magnetic line of force,
If electronics has the velocity component along magnetic field axial direction, electronics will axially make precessional motion along magnetic field, in magnetic field knee, electronics
The direction of motion also can be with magnetic field axial deflection.Ion is much larger than electronics due to radius of gyration, it will usually greater than the spy of filter device
Size is levied, magnetic field is smaller on ion influence, but after electronics is focused in plasma, just generates strong negative electric field, attracts
Ion aggregation, while velocity of electrons be higher than ion, can constantly draw ion advance, magnetic field and electric field compound action it is inferior from
Daughter can be transmitted in magnetic field along magnetic line of force direction.For in electroneutral or bulky grain with micro negative electricity, quality compared with from
Son with it is much bigger for electronics, substantially not by electromagnetic field effects, motion profile can be for linear motion along inertia.
The beam current tube 2 in magnetic filter of the present invention may be configured as metal or nonmetallic materials bend pipe or
Straight tube, the common pipe shape in part is as shown in Fig. 2, including but not limited to shapes such as 135 ° of bend pipes, 90 ° of bend pipes, straight tube, twin elbows
Formula.
The field coil 3 is formed by hollow conductor coiling, the common cross sectional shape in hollow conductor part such as Fig. 3 institute
Show, including but not limited to round, rectangular, oval or other similar shape, is passed through water inside the hollow conductor or other are cold
Matchmaker cools down, and can solve the contradiction between filter device high current and device radiation.
The quadrupole lense device 4 is made of four pieces of electromagnetic poles, and annular is distributed in outside the filter pipe outlet end, such as
Shown in Fig. 1.The quadrupole lense device 4 can control magnetic deflection field size direction by controlling each magnetic pole size of current, and
The direction of the launch of ion beam separating device outlet can be freely controlled, ion beam coverage is improved.
The vacuum coating equipment magnetic filter is applied to vacuum coating equipment, can obtain good cathode electricity
Arc ion plating bulky grain filter effect, greatly improves the efficiency of magnetic filter, solves and provides the high current limitation of high-intensity magnetic field,
Its quadrupole lense device can freely control the particle beams and project direction.
The foregoing is merely presently preferred embodiments of the present invention, is merely illustrative for the purpose of the present invention, and not restrictive
's.Those skilled in the art understand that in the spirit and scope defined by the claims in the present invention many changes can be carried out to it,
It modifies or even equivalent, but falls in protection scope of the present invention.
Claims (8)
1. a kind of magnetic filter, which is characterized in that including beam current tube, field coil, quadrupole lense device；The magnetic field line
Snare is set on the beam current tube, and the quadrupole lense device is correspondingly arranged in the port position of the beam current tube, and sets
It is placed in the outside of the beam current tube, ion beam current is flowed by the end of the beam current tube and flowed out from the other end.
2. magnetic filter as described in claim 1, which is characterized in that the magnetic filter further includes inlet flange and goes out
Mouth flange, the inlet flange and the outlet(discharge) flange are respectively arranged at the both ends of the beam current tube, and the inlet flange is
Ion beam current enter the magnetic filter entrance, the outlet(discharge) flange be ion beam current outlet, the inlet flange and
The outlet(discharge) flange is used to connect corresponding equipment.
3. magnetic filter as claimed in claim 2, which is characterized in that the quadrupole lense device corresponds to the outlet(discharge) flange
Setting.
4. magnetic filter as described in claim 1, which is characterized in that the beam current tube is set as bend pipe or straight tube.
5. magnetic filter as described in claim 1, which is characterized in that the beam current tube uses metal or non-metallic material
Material.
6. magnetic filter as described in claim 1, which is characterized in that the field coil is formed by hollow conductor coiling,
Refrigerant is passed through inside the hollow conductor.
7. magnetic filter as claimed in claim 6, which is characterized in that the cross sectional shape of the hollow conductor is set as round
It is shape, rectangular or one of oval.
8. magnetic filter as described in claim 1, which is characterized in that the quadrupole lense device is by four pieces of electromagnetic pole structures
At annular is distributed in outside the filter pipe outlet end.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910326052.0A CN110075995A (en) | 2019-04-22 | 2019-04-22 | A kind of magnetic filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910326052.0A CN110075995A (en) | 2019-04-22 | 2019-04-22 | A kind of magnetic filter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110075995A true CN110075995A (en) | 2019-08-02 |
Family
ID=67416041
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910326052.0A Pending CN110075995A (en) | 2019-04-22 | 2019-04-22 | A kind of magnetic filter |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110075995A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111741582A (en) * | 2020-07-02 | 2020-10-02 | 安徽纯源镀膜科技有限公司 | Transmission channel device for plasma transmission and coating equipment |
Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2251243Y (en) * | 1996-01-30 | 1997-04-02 | 核工业西南物理研究院 | Magnetic declination filtering guide-tube type cathod arc plasma source |
| CN2415436Y (en) * | 2000-04-07 | 2001-01-17 | 中国原子能科学研究院 | Heavy ion irradiation device |
| CN2503687Y (en) * | 2001-09-14 | 2002-07-31 | 陕西百纳科技发展有限责任公司 | Massenfilter for manufacturing superhard film ionization source device |
| CN101016617A (en) * | 2007-03-08 | 2007-08-15 | 上海交通大学 | Multicenter coil filter ion composite film plating device and method |
| CN101764031A (en) * | 2008-12-04 | 2010-06-30 | 北京中科信电子装备有限公司 | Novel magnetic quadrupole lens pipeline |
| CN102791073A (en) * | 2011-05-17 | 2012-11-21 | 上海凯世通半导体有限公司 | Beam transmission system and transmission method thereof |
| CN104851471A (en) * | 2015-05-18 | 2015-08-19 | 北京大学 | Three-unit magnetic quadrupole lens system and manufacturing method thereof |
| CN105088150A (en) * | 2015-09-10 | 2015-11-25 | 魏永强 | Multilevel magnetic field arc ion plating method with adjustable transmission directions |
| CN105229772A (en) * | 2013-05-15 | 2016-01-06 | 学校法人冲绳科学技术大学院大学学园 | The LEED of SEM |
| CN105296938A (en) * | 2014-07-14 | 2016-02-03 | 北京师范大学 | Tree-shaped cathode vacuum arc plasma deposition and magnetic filtration device |
| CN106756815A (en) * | 2015-11-20 | 2017-05-31 | 中国地质大学（北京） | A kind of magnetic filter for cathodic arc ion plating |
-
2019
- 2019-04-22 CN CN201910326052.0A patent/CN110075995A/en active Pending
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2251243Y (en) * | 1996-01-30 | 1997-04-02 | 核工业西南物理研究院 | Magnetic declination filtering guide-tube type cathod arc plasma source |
| CN2415436Y (en) * | 2000-04-07 | 2001-01-17 | 中国原子能科学研究院 | Heavy ion irradiation device |
| CN2503687Y (en) * | 2001-09-14 | 2002-07-31 | 陕西百纳科技发展有限责任公司 | Massenfilter for manufacturing superhard film ionization source device |
| CN101016617A (en) * | 2007-03-08 | 2007-08-15 | 上海交通大学 | Multicenter coil filter ion composite film plating device and method |
| CN101764031A (en) * | 2008-12-04 | 2010-06-30 | 北京中科信电子装备有限公司 | Novel magnetic quadrupole lens pipeline |
| CN102791073A (en) * | 2011-05-17 | 2012-11-21 | 上海凯世通半导体有限公司 | Beam transmission system and transmission method thereof |
| CN105229772A (en) * | 2013-05-15 | 2016-01-06 | 学校法人冲绳科学技术大学院大学学园 | The LEED of SEM |
| CN105296938A (en) * | 2014-07-14 | 2016-02-03 | 北京师范大学 | Tree-shaped cathode vacuum arc plasma deposition and magnetic filtration device |
| CN104851471A (en) * | 2015-05-18 | 2015-08-19 | 北京大学 | Three-unit magnetic quadrupole lens system and manufacturing method thereof |
| CN105088150A (en) * | 2015-09-10 | 2015-11-25 | 魏永强 | Multilevel magnetic field arc ion plating method with adjustable transmission directions |
| CN106756815A (en) * | 2015-11-20 | 2017-05-31 | 中国地质大学（北京） | A kind of magnetic filter for cathodic arc ion plating |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111741582A (en) * | 2020-07-02 | 2020-10-02 | 安徽纯源镀膜科技有限公司 | Transmission channel device for plasma transmission and coating equipment |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101575145B1 (en) | Method and device for transporting vacuum arc plasma | |
| TWI287048B (en) | Equipment for cathode-sputtering | |
| JPH09129173A (en) | Method and apparatus for filtering particle of beam for ion beam formation | |
| CN102634761B (en) | Method for magnetic filtration of strip-sectional vacuum cathodic arc plasma | |
| CN106868463B (en) | Deposited By Vacuum Cathodic Arc device and the method for controlling arc spot etch areas | |
| US20120181171A1 (en) | Nanoparticle Deposition Systems | |
| JP6233617B2 (en) | Arc plasma deposition system | |
| CN105296938A (en) | Tree-shaped cathode vacuum arc plasma deposition and magnetic filtration device | |
| US20020070647A1 (en) | Nanostructure plasma source | |
| CN110075995A (en) | A kind of magnetic filter | |
| JP4385360B2 (en) | Plasma vacuum pump cell | |
| CN102260850A (en) | Few-droplet arc target and plasma coating system comprising same | |
| CN105887035B (en) | Circular cathodic vacuum arc source plasma Magnetic filter rectangle ejector | |
| US4542321A (en) | Inverted magnetron ion source | |
| US5461282A (en) | Advanced center post electron gun | |
| CN114318246A (en) | Magnetic filtration vacuum deposition coating equipment and method for scanning magnetic field oriented deposition coating | |
| CN108441826B (en) | Enhanced arc source, and arc current excited gas ion source, metal ion source and electron source | |
| CN100591797C (en) | Device for promoting deposit film quality of arc ion plating | |
| CN114540783A (en) | Ion implantation method for efficient ionization | |
| CN204509452U (en) | Circular cathodic vacuum arc source plasma body Magnetic filter rectangle caterpillar | |
| CN216585180U (en) | Vacuum arc magnetic filtering device for scanning magnetic field guiding deposition coating | |
| CN216838157U (en) | Magnetic field oriented vacuum arc magnetic filtering device | |
| KR20060008318A (en) | Method and apparatus for producing gas atom containing fullerene, and gas atom containing fullerene | |
| CN216891173U (en) | Vacuum arc magnetic filtering device for guiding deposition coating by rotating magnetic field | |
| WO2023169135A1 (en) | Ion generation device for straight tube square electromagnetic ion implantation equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190802 |
|
| RJ01 | Rejection of invention patent application after publication |