CN102791073A - Beam transmission system and transmission method thereof - Google Patents
Beam transmission system and transmission method thereof Download PDFInfo
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- CN102791073A CN102791073A CN2011101278612A CN201110127861A CN102791073A CN 102791073 A CN102791073 A CN 102791073A CN 2011101278612 A CN2011101278612 A CN 2011101278612A CN 201110127861 A CN201110127861 A CN 201110127861A CN 102791073 A CN102791073 A CN 102791073A
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Abstract
The invention discloses a beam transmission system and a transmission method thereof. The beam transmission system comprises a beam emerging device, a target workpiece, a first rodlike quadrupole magnet and a second rodlike quadrupole magnet, wherein the first rodlike quadrupole magnet and the second rodlike quadrupole magnet are arranged in parallel at both sides of a beam transmission path; the first rodlike quadrupole magnet and the second rodlike quadrupole magnet are respectively provided with iron cores; one or a plurality of independent coils; one or a plurality of independent coils are respectively arranged outside a projection region of the beam on the iron cores along the direction of the connecting line of the centers of the iron cores and along the extension directions of the iron cores; the coils which are respectively arranged at the same positions of the iron cores of the first rodlike quadrupole magnet and the second rodlike quadrupole magnet correspond to each other; and a current value of each coil of the first rodlike quadrupole magnet and the second rodlike quadrupole magnet is adjustable. The beam transmission system and the transmission method thereof which are disclosed by the invention are used for carrying out integral deflection on the beam, and thus, the beam transmission system and the transmission method thereof are suitable for different target workpiece positions, so that the working and production efficiency are improved.
Description
Technical field
The present invention relates to a kind of beam transport system and transmission method thereof, particularly relate to a kind of beam transport system and transmission method thereof of regulating the whole deflection angle of line.
Background technology
It is to be used for a standard technique of the impurity that changes conductance introducing semiconductor wafer that ion injects.Needed impurity material is ionized in ion source, and ion is accelerated into the ion beam with predetermined energy, and the surface of ion beam alignment wafer.Energetic ion in the beam gos deep into the main body of semi-conducting material and the lattice of embedding semi-conducting material forms the zone that conductance suits the requirements.
And use ion implantation in monocrystalline or polysilicon, to mix, be to make a kind of common process process of using in the modern integrated circuits.
But current in solar wafer doping field, use maximum methods to remain thermal diffusion and mix, though this method production efficiency is higher, need some follow-up technologies, for example trimming etc. as replenishing.Thereby processing step is more, and the procuring equipment cost is high.In addition because thermal diffusion process, dosage and uniformity that can not very accurate controlled doping ion be so the solar wafer that can cause producing loses a part of solar conversion efficiency.So from the developing history of semiconductor technology, use ion to inject substituting thermal diffusion in solar wafer doping field also is inexorable trend.
In the existing ion beam injected system; Ion beam input position and distribution all be predefined; So when the position change of the target workpiece that gets into the ion beam injected system; The injection of carrying out ion beam that just can not be correct, the position of ion beam injection requires a great deal of time again with distribution and energy is debugged again if regulate again simultaneously, thereby has significantly reduced the efficient of work and production.
Summary of the invention
The technical problem that the present invention will solve is when overcoming in the prior art target workpiece change in location; Position that the ion beam of ion beam injected system injects and the defective that distributes and be difficult to regulate; A kind of beam transport system and transmission method thereof are provided; Carry out whole deflection through halved tie stream, just can be thereby only need do fine setting so that the position that ion beam injects is applicable to different target workpiece positions with distribution.
The present invention solves above-mentioned technical problem through following technical proposals:
The invention provides a kind of beam transport system; It comprises that a branch of outflow injection device, is as the target workpiece of beam transport terminal point and the one first shaft-like quadrupole magnet and the one second shaft-like quadrupole magnet that are arranged at both sides, beam transport path in parallel to each other; Be characterized in that the said first shaft-like quadrupole magnet and the second shaft-like quadrupole magnet have an iron core respectively; Wherein at line along outside the line direction at the center of the iron core of the iron core of the said first shaft-like quadrupole magnet and the second shaft-like quadrupole magnet view field on the iron core of the iron core of the said first shaft-like quadrupole magnet and the second shaft-like quadrupole magnet; The length direction of the iron core of the said first shaft-like quadrupole magnet in edge and the iron core of the second shaft-like quadrupole magnet also is respectively arranged with one or more separate coils; The coil that wherein is arranged at respectively on the same position of the said first shaft-like quadrupole magnet and the iron core of the said second shaft-like quadrupole magnet is corresponding each other, and the current value of each coil of the said first shaft-like quadrupole magnet and the said second shaft-like quadrupole magnet all is adjustable.
Preferably, the sense of current of each coil of the said first shaft-like quadrupole magnet and the said second shaft-like quadrupole magnet all is adjustable.
Preferably, the core length direction of the said first shaft-like quadrupole magnet and the second shaft-like quadrupole magnet is vertical with the beam transport path direction.
Preferably, said line beam emitter is an ion beam source.
Preferably, said target workpiece is a wafer.
The present invention also provides the beam transport method of a kind of aforesaid beam transport system, is characterized in may further comprise the steps:
S
101, make the said first shaft-like quadrupole magnet identical with the sense of current of the coil of the said second shaft-like quadrupole magnet, said line beam emitter emission line;
S
102, through adjust respectively each to the current value of the coil of the coil that is positioned at the said first shaft-like quadrupole magnet in the mutual corresponding coil and the said second shaft-like quadrupole magnet and regulate line through the said first shaft-like quadrupole magnet and plane, the said second shaft-like quadrupole magnet place; The line direction of the center line of edge said first shaft-like quadrupole magnet and the said second shaft-like quadrupole magnet is with respect to first deflection angle in beam transport path;
S
103, confirm and keep said mutual corresponding coil current value and; Through regulating each respectively the coil that is positioned at the said first shaft-like quadrupole magnet in the mutual corresponding coil and the difference of the current value of the coil that is positioned at the second shaft-like quadrupole magnet are regulated the line through the said first shaft-like quadrupole magnet and plane, the said second shaft-like quadrupole magnet place then, along second deflection angle of the direction of the center line that is parallel to the said first shaft-like quadrupole magnet and the said second shaft-like quadrupole magnet;
S
104, the line that will pass through whole deflection injects target workpiece.
Preferably, said first deflection angle with each to the current value of the coil that is positioned at the said first shaft-like quadrupole magnet in the said mutual corresponding coil and the coil that is positioned at the second shaft-like quadrupole magnet be directly proportional.
Preferably, said second deflection angle is directly proportional to the coil that is positioned at the said first shaft-like quadrupole magnet in the said mutual corresponding coil difference with the current value of the coil that is positioned at the second shaft-like quadrupole magnet with each.
The present invention provides the beam transport method of a kind of aforesaid beam transport system again, is characterized in may further comprise the steps:
S
201, make the current opposite in direction of the coil of the said first shaft-like quadrupole magnet and the said second shaft-like quadrupole magnet, said line beam emitter emission line;
S
202, through adjust respectively each to be positioned at the coil of the said first shaft-like quadrupole magnet in the mutual corresponding coil and be positioned at the second shaft-like quadrupole magnet coil current value and regulate line through the said first shaft-like quadrupole magnet and plane, said second shaft-like quadrupole magnet place, along second deflection angle of the direction of the center line that is parallel to the said first shaft-like quadrupole magnet and the said second shaft-like quadrupole magnet;
S
203, confirm and keep said mutual corresponding coil current value and; Through regulating each respectively the coil that is positioned at the said first shaft-like quadrupole magnet in the mutual corresponding coil is regulated the line through the said first shaft-like quadrupole magnet and plane, the said second shaft-like quadrupole magnet place with the difference of the current value of the coil that is positioned at the second shaft-like quadrupole magnet then; The line direction of the center line of edge said first shaft-like quadrupole magnet and the said second shaft-like quadrupole magnet is with respect to first deflection angle in beam transport path;
S
204, the line that will pass through whole deflection injects target workpiece.
Preferably, said second deflection angle with each to the current value of the coil that is positioned at the said first shaft-like quadrupole magnet in the said mutual corresponding coil and the coil that is positioned at the second shaft-like quadrupole magnet be directly proportional.
Preferably, said first deflection angle is directly proportional to the coil that is positioned at the said first shaft-like quadrupole magnet in the said mutual corresponding coil difference with the current value of the coil that is positioned at the second shaft-like quadrupole magnet with each.
Positive progressive effect of the present invention is:
Beam transport system of the present invention and transmission method thereof are passing through to add electromagnet; Thereby realize that halved tie stream carries out whole deflection; Thereby only need adjust the electromagnet of said adding, just can be so that the position that ion beam injects is applicable to different target workpiece positions with distribution.So that the position that ion beam injects is convenient more with the adjusting of distribution, thereby improved the efficient of work and production.
Description of drawings
Fig. 1 is the vertical view of the preferred embodiment of beam transport of the present invention system.
Fig. 2 is the end view of the preferred embodiment of beam transport of the present invention system.
Fig. 3 is the flow chart of coil current beam transport method in the same way in the preferred embodiment of beam transport of the present invention system.
Fig. 4 is the flow chart of the reverse beam transport method of coil current in the preferred embodiment of beam transport of the present invention system.
Embodiment
Provide preferred embodiment of the present invention below in conjunction with accompanying drawing, to specify technical scheme of the present invention.
Comprise a branch of outflow injection device 1, a wafer 2 and two shaft-like quadrupole magnets 3 and 4 in the beam transport system illustrated in figures 1 and 2.
The line of the beam emitter of line described in the present embodiment 1 outgoing through after the transmission, finally requires to arrive wafer 2 places according to preset intensity distributions and angular distribution on the beam transport path, thereby wafer 2 is accomplished procedure for processing.This line beam emitter 1 can be an ion source, and correspondingly, the line of transmission then can be ion beam, and said wafer 2 is as target workpiece, and said target workpiece can also be other parts that receive ion beams.The present invention is provided with a pair of be parallel to each other, the shaft-like quadrupole magnet 3 and 4 that lays respectively at both sides, beam transport path between said line beam emitter 1 and said wafer 2.
Shaft-like quadrupole magnet 3 is vertical with the beam transport path direction with 4 core length direction described in the present embodiment, can make said core length direction and beam transport path direction at angle according to needs of production etc. in addition.
Shaft-like quadrupole magnet 3 and the 4 all cored electromagnet that constitute with coil in the present embodiment; Wherein line is along being respectively arranged with coil 31 and 41 in the view field of the line direction A of the core center of said shaft-like quadrupole magnet 3 and 4; In addition in the present embodiment outside said view field; And the below that is positioned at the iron core of said shaft-like quadrupole magnet 3 and 4 also is respectively equipped with coil 32 and 42; And the said coil that is arranged at respectively on the same position of said shaft-like quadrupole magnet 3 and the iron core of said shaft-like quadrupole magnet 4 is corresponding each other, and promptly coil 31 is corresponding each other with coil 41, and coil 32 and coil 42 be correspondences each other.
But also can outside said view field, be positioned at said shaft-like quadrupole magnet 3 and 4 iron core above coil is set; Perhaps in the above and below of the iron core of said shaft-like quadrupole magnet 3 and 4 coil is set all, the said coil that wherein is arranged on the same position of said shaft-like quadrupole magnet 3 and the iron core of said shaft-like quadrupole magnet 4 is corresponding each other.The number that is arranged at the said coil outside the said view field of iron core of said shaft-like quadrupole magnet 3 and 4 in the present embodiment can also adopt a plurality of coils according to the needs of reality, thereby satisfies the needs of the construction or design of distinct device or device.
Said in addition rod core can be cuboid; The approximate cuboid that perhaps on the length direction of iron core, has certain radian; Perhaps the cross section of iron core also can be approximate rectangular; In rod core is not under the situation of standard cuboid, and the said shaft-like quadrupole magnet 3 and 4 that is arranged at both sides, beam transport path still need keep the shape symmetry.The quadrupole magnet group of above-mentioned various derived types all can realize identical focusing or defocus and deflecting effect.
The said coil 31 and 41 on said shaft-like quadrupole magnet 3 and 4 of being arranged at respectively in the present embodiment is used for the focusing that changes line or disperses.Coil described in the present embodiment 31 and 41 is used for a bit to wafer 2 of beam focusing, because said coil 31 and 41 is for the focusing of the change line of beam transport system employing or the quadrupole magnet of dispersing in the prior art, so give unnecessary details no longer in detail here.
The said coil 32 and 42 the current value that are arranged at respectively in the present embodiment on said shaft-like quadrupole magnet 3 and 4 can be regulated; Thereby can integrally change line through the electric current that changes coil 32 and 42 through said shaft-like quadrupole magnet 3 and plane, 4 place; Along the line direction A at said shaft-like quadrupole magnet 3 and 4 center, with respect to the deflection angle θ in beam transport path
1Promptly, regulate the deflection angle θ of line as shown in Figure 1 through the current value of regulating winding 32 and 42
1, and integrally regulate line as shown in Figure 2 through said shaft-like quadrupole magnet 3 and plane, 4 place, along the direction that is parallel to the center line of said shaft-like quadrupole magnet 3 and 4, with respect to the deflection angle θ in beam transport path
2,, regulate the deflection angle θ of line as shown in Figure 2 promptly through the current value of regulating winding 32 and 42
2
Said in addition said coil 32 and 42 the sense of current that is arranged at respectively on said shaft-like quadrupole magnet 3 and 4 also can be regulated; The coil 32 of shaft-like quadrupole magnet 3 as shown in Figure 1 is counterclockwise; The coil 42 of shaft-like quadrupole magnet 4 is a clockwise direction, and the sense of current of said coil 32 and 42 can be arbitrarily.In addition if be respectively arranged with a plurality of coils on the said shaft-like quadrupole magnet 3 and 4, then these a plurality of the direction of the winding current also can be for arbitrarily clockwise or counter clockwise direction, thereby can regulate the deflection angle θ of said line further
1And θ
2
The operation principle of the beam transport system of present embodiment is following:
1, in said beam transport system; Make and to be arranged at said coil 32 on the said shaft-like quadrupole magnet 3 and 4 respectively when identical with 42 the sense of current; For example; The said coil 32 and 42 the sense of current are clockwise direction or counterclockwise, and the beam transport method of said beam transport system is as shown in Figure 3, comprising following steps:
In the present embodiment, when the coil 32 of said shaft-like quadrupole magnet 3 on 4 is identical with 42 the sense of current, said deflection angle θ
1Size and said shaft-like quadrupole magnet 3 and 4 on coil 32 and 42 current value be directly proportional.
In the present embodiment, because the coil 32 on the said shaft-like quadrupole magnet 3 and 4 is identical with 42 the sense of current, said deflection angle θ
2Be directly proportional with the difference of the current value of said coil 32 and 42.
2, in said beam transport system; Make when being arranged at coil 32 and 42 the current opposite in direction on said shaft-like quadrupole magnet 3 and 4 respectively; The sense of current of the coil 32 of for example shaft-like quadrupole magnet 3 is a clockwise direction; The sense of current of the coil 42 of said shaft-like quadrupole magnet 4 is counterclockwise etc., and the beam transport method of said beam transport system is as shown in Figure 4, comprising following steps:
Step 201 makes coil 32 and 42 current opposite in direction on said shaft-like quadrupole magnet 3 and 4, said line beam emitter 1 emission line.
Step 202; Current value through adjusting coil 32 described in said shaft-like quadrupole magnet 3 and 4 and 42 respectively with regulate line through said coil 32 and plane, 42 place, the edge is parallel to the deflection angle θ of direction of the center line of said shaft-like quadrupole magnet 3 and 4
2
In the present embodiment, since coil 32 on the said shaft-like quadrupole magnet 3 and 4 and 42 current opposite in direction, said deflection angle θ
2Be directly proportional with the difference of the current value of said coil 32 and 42.
Step 203; Confirm and keep said coil 32 and 42 current value and; Regulate the line that belongs to the plane through said mutual corresponding coil through regulating the coil be positioned at said shaft-like quadrupole magnet 3 respectively with the coil 32 and the difference of 42 current value that are positioned on the shaft-like quadrupole magnet 4 then; Along the line direction of said shaft-like quadrupole magnet 3 and 4 center line, with respect to the deflection angle θ in beam transport path
1
In the present embodiment, since coil 32 on the said shaft-like quadrupole magnet 3 and 4 and 42 current opposite in direction, said deflection angle θ
1Size and said shaft-like quadrupole magnet 3 and 4 on coil 32 and 42 current value be directly proportional.
Step 204, the line that will pass through whole deflection injects wafer 2.
Beam transport system of the present invention and transmission method thereof realize that halved tie stream carries out whole deflection adding through the line view field at the iron core of shaft-like level Four magnet into coil; Thereby only need adjust the size and Orientation of the electric current on the coil of said adding, just can be so that the position that ion beam injects is applicable to different target workpiece positions with distribution.So that the position that ion beam injects is convenient more with the adjusting of distribution, thereby improved the efficient of work and production.
Though more than described embodiment of the present invention, it will be understood by those of skill in the art that these only illustrate, protection scope of the present invention is limited appended claims.Those skilled in the art can make numerous variations or modification to these execution modes under the prerequisite that does not deviate from principle of the present invention and essence, but these changes and modification all fall into protection scope of the present invention.
Claims (11)
1. beam transport system; It comprises that a branch of outflow injection device, is as the target workpiece of beam transport terminal point and the one first shaft-like quadrupole magnet and the one second shaft-like quadrupole magnet that are arranged at both sides, beam transport path in parallel to each other; It is characterized in that; The said first shaft-like quadrupole magnet and the second shaft-like quadrupole magnet have an iron core respectively; Wherein at line along outside the line direction at the center of the iron core of the iron core of the said first shaft-like quadrupole magnet and the second shaft-like quadrupole magnet view field on the iron core of the iron core of the said first shaft-like quadrupole magnet and the second shaft-like quadrupole magnet; The length direction of the iron core of the said first shaft-like quadrupole magnet in edge and the iron core of the second shaft-like quadrupole magnet also is respectively arranged with one or more separate coils; The coil that wherein is arranged at respectively on the same position of the said first shaft-like quadrupole magnet and the iron core of the said second shaft-like quadrupole magnet is corresponding each other, and the current value of each coil of the said first shaft-like quadrupole magnet and the said second shaft-like quadrupole magnet all is adjustable.
2. beam transport as claimed in claim 1 system is characterized in that the sense of current of each coil of the said first shaft-like quadrupole magnet and the said second shaft-like quadrupole magnet all is adjustable.
3. according to claim 1 or claim 2 beam transport system is characterized in that the core length direction of the said first shaft-like quadrupole magnet and the second shaft-like quadrupole magnet is vertical with the beam transport path direction.
4. beam transport as claimed in claim 1 system is characterized in that said line beam emitter is an ion beam source.
5. beam transport as claimed in claim 4 system is characterized in that said target workpiece is a wafer.
6. the beam transport method of a beam transport as claimed in claim 2 system is characterized in that may further comprise the steps:
S
101, make the said first shaft-like quadrupole magnet identical with the sense of current of the coil of the said second shaft-like quadrupole magnet, said line beam emitter emission line;
S
102, through adjust respectively each to the current value of the coil of the coil that is positioned at the said first shaft-like quadrupole magnet in the mutual corresponding coil and the said second shaft-like quadrupole magnet and regulate line through the said first shaft-like quadrupole magnet and plane, the said second shaft-like quadrupole magnet place; The line direction of the center line of edge said first shaft-like quadrupole magnet and the said second shaft-like quadrupole magnet is with respect to first deflection angle in beam transport path;
S
103, confirm and keep said mutual corresponding coil current value and; Through regulating each respectively the coil that is positioned at the said first shaft-like quadrupole magnet in the mutual corresponding coil and the difference of the current value of the coil that is positioned at the second shaft-like quadrupole magnet are regulated the line through the said first shaft-like quadrupole magnet and plane, the said second shaft-like quadrupole magnet place then, along second deflection angle of the direction of the center line that is parallel to the said first shaft-like quadrupole magnet and the said second shaft-like quadrupole magnet;
S
104, the line that will pass through whole deflection injects target workpiece.
7. beam transport method as claimed in claim 6; It is characterized in that, said first deflection angle with each to the current value of the coil that is positioned at the said first shaft-like quadrupole magnet in the said mutual corresponding coil and the coil that is positioned at the second shaft-like quadrupole magnet be directly proportional.
8. like claim 6 or 7 described beam transport methods; It is characterized in that said second deflection angle is directly proportional to the coil that is positioned at the said first shaft-like quadrupole magnet in the said mutual corresponding coil difference with the current value of the coil that is positioned at the second shaft-like quadrupole magnet with each.
9. the beam transport method of a beam transport as claimed in claim 2 system is characterized in that may further comprise the steps:
S
201, make the current opposite in direction of the coil of the said first shaft-like quadrupole magnet and the said second shaft-like quadrupole magnet, said line beam emitter emission line;
S
202, through adjust respectively each to be positioned at the coil of the said first shaft-like quadrupole magnet in the mutual corresponding coil and be positioned at the second shaft-like quadrupole magnet coil current value and regulate line through the said first shaft-like quadrupole magnet and plane, said second shaft-like quadrupole magnet place, along second deflection angle of the direction of the center line that is parallel to the said first shaft-like quadrupole magnet and the said second shaft-like quadrupole magnet;
S
203, confirm and keep said mutual corresponding coil current value and; Through regulating each respectively the coil that is positioned at the said first shaft-like quadrupole magnet in the mutual corresponding coil is regulated the line through the said first shaft-like quadrupole magnet and plane, the said second shaft-like quadrupole magnet place with the difference of the current value of the coil that is positioned at the second shaft-like quadrupole magnet then; The line direction of the center line of edge said first shaft-like quadrupole magnet and the said second shaft-like quadrupole magnet is with respect to first deflection angle in beam transport path;
S
204, the line that will pass through whole deflection injects target workpiece.
10. beam transport method as claimed in claim 9; It is characterized in that, said second deflection angle with each to the current value of the coil that is positioned at the said first shaft-like quadrupole magnet in the said mutual corresponding coil and the coil that is positioned at the second shaft-like quadrupole magnet be directly proportional.
11. like claim 9 or 10 described beam transport methods; It is characterized in that said first deflection angle is directly proportional to the coil that is positioned at the said first shaft-like quadrupole magnet in the said mutual corresponding coil difference with the current value of the coil that is positioned at the second shaft-like quadrupole magnet with each.
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|---|---|---|---|
| CN2011101278612A CN102791073A (en) | 2011-05-17 | 2011-05-17 | Beam transmission system and transmission method thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011101278612A CN102791073A (en) | 2011-05-17 | 2011-05-17 | Beam transmission system and transmission method thereof |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN110075995A (en) * | 2019-04-22 | 2019-08-02 | 中国电子科技集团公司第三十八研究所 | A kind of magnetic filter |
| CN110101883A (en) * | 2018-11-02 | 2019-08-09 | 深圳铭杰医疗科技有限公司 | A kind of line needle chlorination equipment based on magnetic field |
| CN110152029A (en) * | 2018-11-02 | 2019-08-23 | 深圳铭杰医疗科技有限公司 | A kind of line needle chlorination equipment based on magnetic field |
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| CN110101883A (en) * | 2018-11-02 | 2019-08-09 | 深圳铭杰医疗科技有限公司 | A kind of line needle chlorination equipment based on magnetic field |
| CN110152029A (en) * | 2018-11-02 | 2019-08-23 | 深圳铭杰医疗科技有限公司 | A kind of line needle chlorination equipment based on magnetic field |
| CN110101883B (en) * | 2018-11-02 | 2024-07-12 | 深圳铭杰医疗科技有限公司 | Beam needle disinfection device based on magnetic field |
| CN110075995A (en) * | 2019-04-22 | 2019-08-02 | 中国电子科技集团公司第三十八研究所 | A kind of magnetic filter |
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Application publication date: 20121121 |