CN102110568B - Beam transmission system and method - Google Patents
Beam transmission system and method Download PDFInfo
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- CN102110568B CN102110568B CN200910200780.3A CN200910200780A CN102110568B CN 102110568 B CN102110568 B CN 102110568B CN 200910200780 A CN200910200780 A CN 200910200780A CN 102110568 B CN102110568 B CN 102110568B
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Abstract
The invention discloses a beam transmission system, which comprises a beam jetting device and a target workpiece as a beam transmission terminal. A pair of parallel first rod-shaped quadrupole magnets positioned on the two sides of a beam path respectively is arranged between the beam jetting device and the target workpiece, the sum of the current values in the coils of the two first rod-shaped quadrupole magnets is kept at a first preset value, and the current value in the coil of each first rod-shaped quadrupole magnet constantly changes between a preset upper limit and a preset lower limit. The invention also discloses a beam transmission method realized by utilizing the beam transmission system. According to the invention, the intensity distribution and the angle distribution of the beam can be controlled by controlling the current values of one or two pairs of rod-shaped quadrupole magnets, so as to improve the beam utilization efficiency and further facilitate the optimization of the dose uniformity and the angle uniformity of the beam. Meanwhile, because of the focusing effect of the rod-shaped quadrupole magnets, the beam transmission efficiency is improved, and the beam intensity when the beam is transmitted to the workpiece is increased.
Description
Technical field
The present invention relates to field of semiconductor manufacture, particularly relate to a kind of Beam Transport Systems and method.
Background technology
In many manufactures field, all need ion beam or electron beam to transmit control.For example, ion injection method is used for the atom or the molecule that are conventionally referred to as impurity to introduce target substrate, thereby changes the performance of substrate material, as metal bearing is introduced other materials by Implantation, can improve its resistance to wear, increases the service life; Ion film-plating method is that ionic material is deposited in to surface of the work, thereby change the physics and chemistry performance of surface of the work, as the manufacture of optics or display device, just need to adopt the technique of the thin film deposition that thickness is controlled, surface property is predetermined, to improve its optical property.
Especially interestingly, adulterating in monocrystalline or polysilicon by ion implantation, is to manufacture a kind of common process process using in modern integrated circuits.Because the production of semiconductor product tends to the technique of larger wafer (from 8 inches to 12 inches, and now to 18 inches of development) gradually, single-wafer technique (single treatment one wafer) is adopted recently widely.Wafer workpiece is larger, injects the required time just longer, and the implantation dose uniformity and the implant angle uniformity that therefore want to reach certain also become more and more difficult.
In Ion beam application field, ion beam generally has two kinds of modes: electric scanning and magnetic scanning.For the beam transmission of high perveance, generally can not use any electric scanner, but use magnetic scanning or non-ion beam.What magnetic scanning was generally used is dipolar magnet, it can be in moment deflected ion beam, but the focusing effect of dipolar magnet is very weak on this yawing moment, and with the perpendicular another one dimension of this deflection dimension on also show as defocusing effect, so if make line keep certain dispersion angle and efficiency of transmission, set up again in addition other beam optics devices with regard to needs it is focused on, will cause like this beam transport path elongated, unfavorable to the efficiency of transmission of line.
Well-knownly be, in the time that ion beam passes through quadrupole magnet, the focusing effect in some dimensions is stronger to ion beam for quadrupole magnet, with perpendicular another dimension of this focusing dimension on show as and defocus, thereby can consider to arrange continuously two groups of beam optics focusing units that formed by quadrupole magnet, make thus the ion beam passing through in two orthogonal dimensions, all produce stronger focusing effect.
Therefore, as shown in the above, realize scanning and the focusing to line if wish simultaneously, must need in conjunction with adopting two groups of beam optics devices even more than two, this will cause beam transport path further elongated, more unfavorable to the efficiency of transmission of line.
Summary of the invention
The technical problem to be solved in the present invention is the defect that cannot simultaneously realize by single beam optics device scanning and the focusing of line in prior art in order to overcome, and provides a kind of and utilizes shaft-like quadrupole magnet to realize the scanning of line and the Beam Transport Systems of focusing and method simultaneously.
The present invention solves above-mentioned technical problem by following technical proposals: a kind of Beam Transport Systems, it comprises a branch of outflow injection device and a target workpiece as beam transport terminal, its feature is, between this line beam emitter and this target workpiece, be provided with a pair of being parallel to each other, lay respectively at the first shaft-like quadrupole magnet of both sides, line path, current value sum in the coil of these two the first shaft-like quadrupole magnets remains one first preset value, and the current value in the coil of these two the first shaft-like quadrupole magnets all constantly changes between a preset upper limit and a default lower limit.
Preferably, between this is to the first shaft-like quadrupole magnet and this target workpiece, be provided with a pair of the second shaft-like quadrupole magnet that be parallel to each other, that lay respectively at both sides, line path, this is to the setting party of the second shaft-like quadrupole magnet to perpendicular to the first shaft-like quadrupole magnet with this, and current value in the coil of these two the second shaft-like quadrupole magnets equates and sum remains one second preset value.
Preferably, this is positioned at this focus place to the second shaft-like quadrupole magnet to the first shaft-like quadrupole magnet.
Wherein, this line beam emitter is an ion source or an electron source.
Preferably, this is parallel with a direction that need to focus on or defocus on line cross section to the core length direction of the first shaft-like quadrupole magnet.
Preferably, this Beam Transport Systems also comprises a line diagnostic device of being located at this target workpiece place, for measuring intensity distributions and the angular distribution of line, and data measured is fed back to for controlling this computer to the first shaft-like quadrupole magnet.
Preferably, this Beam Transport Systems also comprises a line diagnostic device of being located at this target workpiece place, for measuring intensity distributions and the angular distribution of line, and data measured is fed back to for controlling this to the first shaft-like quadrupole magnet and this computer to the second shaft-like quadrupole magnet.
Another technical scheme of the present invention is: a kind of beam transport method of utilizing above-mentioned Beam Transport Systems to realize, its feature is, make the current value sum in the coil of these two the first shaft-like quadrupole magnets remain this first preset value, and the current value in the coil of these two the first shaft-like quadrupole magnets is all constantly changed between this preset upper limit and this default lower limit, in the method, line by this line beam emitter outgoing after, this makes beam focusing or defocuses the first shaft-like quadrupole magnet, and make line with this focusing or the perpendicular dimension of the dimension that defocuses in continuous shuttle-scanning, then inject this target workpiece.
Preferably, this makes the dimension inner focusing that line need to focus on or defocus at it or defocuses the first shaft-like quadrupole magnet.
Preferably, at this target workpiece place, one line diagnostic device is set, utilize intensity distributions and the angular distribution of this beam diagnostics device measuring line, and adjust this to the current value in the coil of the first shaft-like quadrupole magnet based on this data measured, so that intensity distributions and the angular distribution of line while arriving this target workpiece meets preset requirement.
Another technical scheme of the present invention is: a kind of beam transport method of utilizing above-mentioned Beam Transport Systems to realize, its feature is, make the current value sum in the coil of these two the first shaft-like quadrupole magnets remain this first preset value, and the current value in the coil of these two the first shaft-like quadrupole magnets is all constantly changed between this preset upper limit and this default lower limit, and current value in the coil of these two the second shaft-like quadrupole magnets is equated and sum remains this second preset value, in the method, line by this line beam emitter outgoing after, this makes beam focusing or defocuses the first shaft-like quadrupole magnet, and make line with this focusing or the perpendicular dimension of the dimension that defocuses in continuous shuttle-scanning, then this makes line at this scanning dimension inner focusing or defocuses the second shaft-like quadrupole magnet, then inject this target workpiece.
Preferably, this makes the dimension inner focusing that line need to focus on or defocus at it or defocuses the first shaft-like quadrupole magnet.
Preferably, at this target workpiece place, one line diagnostic device is set, utilize intensity distributions and the angular distribution of this beam diagnostics device measuring line, and based on this data measured adjust this to the first shaft-like quadrupole magnet and this to the current value in the coil of the second shaft-like quadrupole magnet, so that intensity distributions and the angular distribution of line while arriving this target workpiece meets preset requirement.
Preferably, this proofreaies and correct line to horizontal infection the second shaft-like quadrupole magnet in this scanning dimension.
Positive progressive effect of the present invention is: the present invention is by arranging a pair of the first shaft-like quadrupole magnet, and by the current value in its coil is controlled especially, in the sphere of action of this single beam optics device, realized simultaneously the focusing of line in a dimension and with perpendicular another dimension of this focusing dimension on shuttle-scanning; In addition, by a pair of the second shaft-like quadrupole magnet is set after this is to the first shaft-like quadrupole magnet again, this system of the present invention can also focus in this scanning dimension it before line arrives target workpiece, to proofread and correct line angle.Therefore, the present invention can be by controlling the size of current of a pair of or two pairs of shaft-like quadrupole magnets, control intensity distributions and the angular distribution of line, thereby improve the utilization ratio of line, optimize more easily the dosage of line and the uniformity of angle, have benefited from the focusing effect of shaft-like quadrupole magnet, the beam intensity when can also improving the efficiency of transmission of line and arriving workpiece simultaneously.
Brief description of the drawings
Fig. 1 a is the end view of the first embodiment of Beam Transport Systems of the present invention.
Fig. 1 b is the vertical view of the first embodiment of Beam Transport Systems of the present invention.
Fig. 2 is a pair of shaft-like quadrupole magnet in the present invention focusing effect schematic diagram to line.
Fig. 3 is a pair of shaft-like quadrupole magnet in the present invention deflecting effect schematic diagram to line.
Fig. 4 a is the end view of the second embodiment of Beam Transport Systems of the present invention.
Fig. 4 b is the vertical view of the second embodiment of Beam Transport Systems of the present invention.
Embodiment
Provide preferred embodiment of the present invention below in conjunction with accompanying drawing, to describe technical scheme of the present invention in detail.
Shown in Fig. 1 a and Fig. 1 b, be respectively end view and the vertical view of the first embodiment of Beam Transport Systems of the present invention.Line by 1 outgoing of line beam emitter after process transmission, finally requires arrival target workpiece 4 to sentence according to default intensity distributions and angular distribution workpiece is completed to procedure for processing on line path.This line beam emitter 1 can be an ion source or an electron source, and correspondingly, the line of transmission can be ion beam or electron beam.The present invention is provided with a pair of the first shaft-like quadrupole magnet 21,22 that be parallel to each other, that lay respectively at both sides, line path between this line beam emitter 1 and this target workpiece 4.
These two the first shaft-like quadrupole magnets 21,22 form by rod core and the solenoid that is around on iron core, wherein, this rod core can be cuboid, or on the length direction of iron core, there is the approximate cuboid of certain radian, or it is approximate rectangular that the cross section of iron core also can be, in the situation that rod core is not standard cuboid, these two the first shaft-like quadrupole magnets 21,22 that are arranged at both sides, line path still need to keep shape symmetry.The quadrupole magnet group of above-mentioned various derived types all can realize identical focusing or defocus and deflecting effect, below will elaborate to this.
When after the coil electricity of a pair of shaft-like quadrupole magnet, can be to producing and focus on or defocusing effect in a certain dimension from the line passing through therebetween, Fig. 2 (shaft-like quadrupole magnet is wherein side-looking) is depicted as a special case in focusing effect, be line by this focus place outgoing to shaft-like quadrupole magnet, be focused into parallel line in paper dimension at Fig. 2 by this after to shaft-like quadrupole magnet.The focusing of a pair of shaft-like quadrupole magnet or the ability that defocuses only (are defined as the size of electric current with their coil current value substantially, irrelevant with the sense of current) sum is relevant, as long as current value sum remains unchanged, their focusing or defocusing effects to the line from passing through therebetween also do not change substantially.A pair of shaft-like quadrupole magnet is related with their coil current values separately to the deflecting effect of line, in the time that both current values equate, to the effect of line zero deflection, in the time that both current value is unequal, can make line deflect, and it is larger that current value differs, just stronger to the deflecting action of line, shown in Fig. 3 (shaft-like quadrupole magnet is wherein for overlooking), be the schematic diagram that line deflects under the effect of a pair of shaft-like quadrupole magnet in the paper dimension of Fig. 3, but in the process of this deflection, line with the perpendicular dimension of the paper dimension of Fig. 3 in distribution substantially can not change.Can know by inference thus, if constantly change the gap between the current value of two shaft-like quadrupole magnets, can make line that deflection in various degree constantly occurs, thereby just can realize the scanning of line; Further, if in constantly changing the difference of current value, also remain that current value sum is constant, can in realizing line scanning, keep stablizing constant focusing or defocusing performance.
In the embodiment shown in Fig. 1 a and Fig. 1 b, according to the requirement of the intensity distributions to line and angular distribution, current value sum in the coil of these two the first shaft-like quadrupole magnets 21,22 is remained to one first preset value, to realize the focusing effect of predeterminable level in the paper dimension of Fig. 1 a, reduce the loss of line in this dimension; Simultaneously, current value in the coil of these two the first shaft-like quadrupole magnets 21,22 is all constantly changed between a preset upper limit and a default lower limit, constantly change thus the poor of current value between them, to realize the scanning effect of default amplitude in the paper dimension of Fig. 1 b, the for example solid line in Fig. 1 b can represent the beam trace of inscribing when a certain, the beam trace of inscribing when dotted line can represent another.Scanning motion makes line can cover the larger range of work at target workpiece 4 places, and be conducive to meet the uniformity requirement of workpiece place to line, can make the transmission loss of line reduce and focus on action, and obtain more preferably intensity and angular distribution at workpiece place.When workpiece size is less, can be covered by line time, just can conveniently promptly complete processing without making workpiece carry out any mechanical scanning campaign; And when workpiece size larger, part while having exceeded the coverage of line, also only need make workpiece carry out more short-range one dimension or two-dimentional machinery scanning motion, has shortened widely processing procedure consuming time, has improved operating efficiency.Certainly, according to the requirement of different processing procedures, these two the first shaft-like quadrupole magnets 21,22 also can be set to carry out and defocus function, simultaneously defocusing in the perpendicular dimension of dimension and carry out scan function with this.
Due to from the line of line beam emitter 1 outgoing the degree of divergence on each dimension different often, therefore can be by this core length direction (vertical direction in Fig. 1 a paper to the first shaft-like quadrupole magnet 21,22, and the vertical paper direction of Fig. 1 b) be set to on line cross section a certain need focus on direction parallel, thereby in the dimension that line need to be focused at it, obtain preferably focusing effect, improved efficiency of transmission and the final beam intensity that arrives target workpiece 4 of line.Similarly, in the time requiring to need line to defocus in a certain dimension according to processing procedure, also correspondingly this core length direction to the first shaft-like quadrupole magnet 21,22 is set to parallel with this direction that need to defocus on line cross section.
In different procedure for processing, in order to make intensity distributions and the angular distribution of line in the time finally arriving workpiece can more accurately meet specific processing procedure needs, be necessary this current value to the first shaft-like quadrupole magnet 21,22 to carry out corresponding accurately setting, to make line obtain the focusing of appropriate level in transmitting procedure and to carry out the scanning of appropriate level.The specific current value combination that this is accurately set need to grope to obtain by debugging repeatedly, therefore, one line diagnostic device can be set at target workpiece 4 places, for measuring intensity distributions and the angular distribution of line in the time arriving workpiece, and data measured is fed back to for controlling this computer to the first shaft-like quadrupole magnet 21,22, by current value being regulated, measured beam parameters, feedback data, the continuous circulation debugging of adjusting again, finally just can obtain the line that meets preset requirement completely.
On the basis of above-described embodiment, as shown in Fig. 4 a and Fig. 4 b, a pair of the second shaft-like quadrupole magnet 31,32 that be parallel to each other, that lay respectively at both sides, line path can also be preferably set between this is to the first shaft-like quadrupole magnet 21,22 and this target workpiece 4, and this is perpendicular to the first shaft-like quadrupole magnet 21,22 to (its core length direction is the vertical direction in vertical paper direction and Fig. 4 b paper plane in Fig. 4 a) and this to the setting party of the second shaft-like quadrupole magnet 31,32.It is one second preset value that current value in the coil of these two the second shaft-like quadrupole magnets 31,32 is set to equate and keep its sum of the two constant.Thus, this just can make line after leaving the first shaft-like quadrupole magnet 21,22 to the second shaft-like quadrupole magnet 31,32, in its scanning dimension, be focused, thereby not only in this dimension, reduce beam loss, can also flow to the angle while reaching workpiece by corrective beam, make it reach default implant angle and the requirement of even angle.Certainly,, according to the requirement of different processing procedures, these two the second shaft-like quadrupole magnets 31,32 also can be set to carry out and defocus function.Especially, in the time that this is positioned at this focus place to the second shaft-like quadrupole magnet 31,32 just to the first shaft-like quadrupole magnet 21,22, this can proofread and correct line to horizontal infection (as shown in Figure 4 b) the second shaft-like quadrupole magnet 31,32 in its scanning dimension.Similarly, beam diagnostics equipment can be set in this embodiment equally, come intensity distributions and the angular distribution of measuring workpieces place line, and data measured is fed back to for controlling this to the first shaft-like quadrupole magnet 21, 22 and this to the second shaft-like quadrupole magnet 31, 32 computer, carry out the adjusting to current value constantly, measure beam parameters, feedback data, after the circulation debugging again regulating, just this that can grope to obtain to meet current actual processing procedure needs is to the first shaft-like quadrupole magnet 21, 22 and this is to the second shaft-like quadrupole magnet 31, 32 specific current value combination, thereby finally obtain the line that meets preset requirement completely at workpiece place.
In sum, the present invention can be by controlling the current value of a pair of or two pairs of shaft-like quadrupole magnets, control intensity distributions and the angular distribution of line, thereby improve the utilization ratio of line, optimize more easily the dosage of line and the uniformity of angle, simultaneously due to the focusing effect of shaft-like quadrupole magnet, the beam intensity when can also improving the efficiency of transmission of line and arriving workpiece.
Although more than described the specific embodiment of the present invention, it will be understood by those of skill in the art that these only illustrate, protection scope of the present invention is limited by appended claims.Those skilled in the art is not deviating under the prerequisite of principle of the present invention and essence, can make various changes or modifications to these execution modes, but these changes and amendment all fall into protection scope of the present invention.
Claims (13)
1. a Beam Transport Systems, it comprises a branch of outflow injection device and a target workpiece as beam transport terminal, it is characterized in that, between this line beam emitter and this target workpiece, be provided with a pair of being parallel to each other, lay respectively at the first shaft-like quadrupole magnet of both sides, line path, these two the first shaft-like quadrupole magnets form by rod core and the solenoid that is around on iron core, this remains one first preset value to the current value sum in the coil of the first shaft-like quadrupole magnet, and this all constantly changes the current value in the coil of the first shaft-like quadrupole magnet between a preset upper limit and a default lower limit.
2. Beam Transport Systems as claimed in claim 1, it is characterized in that, between this is to the first shaft-like quadrupole magnet and this target workpiece, be provided with a pair of the second shaft-like quadrupole magnet that be parallel to each other, that lay respectively at both sides, line path, this to the setting party of the second shaft-like quadrupole magnet to perpendicular to the first shaft-like quadrupole magnet with this, and this to the current value in the coil of the second shaft-like quadrupole magnet equate and sum remain one second preset value.
3. Beam Transport Systems as claimed in claim 1 or 2, is characterized in that, this line beam emitter is an ion source or an electron source.
4. Beam Transport Systems as claimed in claim 1 or 2, is characterized in that, this is parallel with a direction that need to focus on or defocus on line cross section to the core length direction of the first shaft-like quadrupole magnet.
5. Beam Transport Systems as claimed in claim 1, it is characterized in that, this Beam Transport Systems also comprises a line diagnostic device of being located at this target workpiece place, for measuring intensity distributions and the angular distribution of line, and data measured is fed back to for controlling this computer to the first shaft-like quadrupole magnet.
6. Beam Transport Systems as claimed in claim 2, it is characterized in that, this Beam Transport Systems also comprises a line diagnostic device of being located at this target workpiece place, for measuring intensity distributions and the angular distribution of line, and data measured is fed back to for controlling this to the first shaft-like quadrupole magnet and this computer to the second shaft-like quadrupole magnet.
7. a beam transport method of utilizing the Beam Transport Systems described in claim 1 to realize, it is characterized in that, make this remain this first preset value to the current value sum in the coil of the first shaft-like quadrupole magnet, and this is all constantly changed between this preset upper limit and this default lower limit to the current value in the coil of the first shaft-like quadrupole magnet, in the method, line by this line beam emitter outgoing after, this makes beam focusing or defocuses the first shaft-like quadrupole magnet, and make line with this focusing or the perpendicular dimension of the dimension that defocuses in continuous shuttle-scanning, then inject this target workpiece.
8. beam transport method as claimed in claim 7, is characterized in that, this makes the dimension inner focusing that line need to focus on or defocus at it or defocus the first shaft-like quadrupole magnet.
9. beam transport method as claimed in claim 7 or 8, it is characterized in that, at this target workpiece place, one line diagnostic device is set, utilize intensity distributions and the angular distribution of this beam diagnostics device measuring line, and adjust this to the current value in the coil of the first shaft-like quadrupole magnet based on this data measured, so that intensity distributions and the angular distribution of line while arriving this target workpiece meets preset requirement.
10. a beam transport method of utilizing the Beam Transport Systems described in claim 2 to realize, it is characterized in that, make this remain this first preset value to the current value sum in the coil of the first shaft-like quadrupole magnet, and this is all constantly changed between this preset upper limit and this default lower limit to the current value in the coil of the first shaft-like quadrupole magnet, and make this to the current value in the coil of the second shaft-like quadrupole magnet equate and sum remain this second preset value, in the method, line by this line beam emitter outgoing after, this makes beam focusing or defocuses the first shaft-like quadrupole magnet, and make line with this focusing or the perpendicular dimension of the dimension that defocuses in continuous shuttle-scanning, then this makes line at this scanning dimension inner focusing or defocuses the second shaft-like quadrupole magnet, then inject this target workpiece.
11. beam transport methods as claimed in claim 10, is characterized in that, this makes the dimension inner focusing that line need to focus on or defocus at it or defocus the first shaft-like quadrupole magnet.
12. beam transport methods as described in claim 10 or 11, it is characterized in that, at this target workpiece place, one line diagnostic device is set, utilize intensity distributions and the angular distribution of this beam diagnostics device measuring line, and based on this data measured adjust this to the first shaft-like quadrupole magnet and this to the current value in the coil of the second shaft-like quadrupole magnet, so that intensity distributions and the angular distribution of line while arriving this target workpiece meets preset requirement.
13. beam transport methods as described in claim 10 or 11, is characterized in that, this proofreaies and correct line to horizontal infection the second shaft-like quadrupole magnet in this scanning dimension.
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| CN200910200780.3A CN102110568B (en) | 2009-12-25 | 2009-12-25 | Beam transmission system and method |
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| CN102315065B (en) * | 2010-07-09 | 2014-04-30 | 上海凯世通半导体有限公司 | Beam current transmission system and method |
| CN103871809A (en) * | 2012-12-11 | 2014-06-18 | 北京中科信电子装备有限公司 | Wide-beam ion source device used for ion implanter |
| CN106793447B (en) * | 2016-12-30 | 2019-10-25 | 中国科学技术大学 | A kind of fast two-dimensional Uniform Irradiation scan method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU693549A1 (en) * | 1977-08-26 | 1979-10-25 | Предприятие П/Я В-8315 | Quadrupole lens on the base of permanent magnets |
| CN101527246A (en) * | 2009-03-16 | 2009-09-09 | 复旦大学 | Novel cascade four-electrode quality analyzer |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| KR100538813B1 (en) * | 2004-07-31 | 2005-12-23 | 주식회사 하이닉스반도체 | Implanter for uniformity of transistor parameter and method for implantation using the same |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU693549A1 (en) * | 1977-08-26 | 1979-10-25 | Предприятие П/Я В-8315 | Quadrupole lens on the base of permanent magnets |
| CN101527246A (en) * | 2009-03-16 | 2009-09-09 | 复旦大学 | Novel cascade four-electrode quality analyzer |
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Address after: 201203 Shanghai City Newton Road, Zhangjiang High Tech Park of Pudong New Area No. 200 Building No. 7, No. 1 Patentee after: KINGSTONE SEMICONDUCTOR COMPANY LTD. Address before: 201203 Shanghai City Newton Road, Zhangjiang High Tech Park of Pudong New Area No. 200 Building No. 7, No. 1 Patentee before: Shanghai Kaishitong Semiconductor Co., Ltd. |