CN102751155B - Beam transmission system and beam transmission method - Google Patents
Beam transmission system and beam transmission method Download PDFInfo
- Publication number
- CN102751155B CN102751155B CN201110102596.2A CN201110102596A CN102751155B CN 102751155 B CN102751155 B CN 102751155B CN 201110102596 A CN201110102596 A CN 201110102596A CN 102751155 B CN102751155 B CN 102751155B
- Authority
- CN
- China
- Prior art keywords
- shaft
- quadrupole magnet
- coil
- beam transport
- current value
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a beam transmission system and a beam transmission method. The beam transmission system comprises a beam emitting device, a target workpiece serving as a terminal point of beam transmission, a first rod-shaped four-pole magnet and a second rod-shaped four-pole magnet. The first rod-shaped four-pole magnet and the second rod-shaped four-pole magnet are arranged on two sides of a beam transmission path in parallel mode and provided with a core respectively. One or a plurality of mutually-independent coils are arranged along the length direction of the core of the first rod-shaped four-pole magnet and the core of the second rod-shaped four-pole magnet, the coils arranged at the same positions of the cores of the first rod-shaped four-pole magnet and the second rod-shaped four-pole magnet correspond to each other, and current value of each coil of the first rod-shaped four-pole magnet and the second rod-shaped four-pole magnet is adjustable. The beam transmission system can control deflection angles and focus or diffusion of injected beam precisely so as to improved injection evenness and precision of focus or diffusion.
Description
Technical field
The present invention relates to a kind of Beam Transport Systems and transmission method thereof, particularly relate to and a kind ofly regulate the deflection angle of line and beam focusing or the Beam Transport Systems dispersed and transmission method thereof.
Background technology
Ion implantation is used to the standard technique impurity changing conductance being introduced semiconductor wafer.Required impurity material is ionized in an ion source, and ion is accelerated into the ion beam with predetermined energy, and the surface of ion beam alignment wafer.Energetic ion in beam gos deep into the main body of semi-conducting material and the lattice embedding semi-conducting material forms the region that suits the requirements of conductance.
And use ion implantation to adulterate in monocrystalline or polysilicon, be manufacture a kind of common process process used in modern integrated circuits.
But current solar wafer doping field, use maximum methods remain thermal diffusion doping, although this method production efficiency is higher, the technique needing some follow-up as a supplement, such as trimming etc.Thus processing step is more, and procuring equipment cost is high.In addition due to thermal diffusion process, can not the dosage of very accurate controlled doping ion and uniformity, so the solar wafer produced can be caused to lose a part of solar conversion efficiency.So from the developing history of semiconductor technology, using ion implantation to substitute thermal diffusion in solar wafer doping field is also inexorable trend.
In existing ion beam implantation systems, major part is all control the precision of the dosage injected by multi-polar structure and control workpiece by the speed of injection ion beam.But this structure and method for implanting all need to adopt software algorithm to support that it is to the control of the precision of implantation dosage.Thus, when needing to carry out independent adjustment to the part in injection zone, existing ion beam implantation systems is difficult to regulate, and cannot reduce influencing each other on the impact of implantation dosage between ion beam current.
In addition the multipole magnet in existing ion beam implantation systems or electric lens only for controlling dispersing and focusing on of ion beam, do not have the ability in deflected ion beam direction.If need the deflection regulating ion beam further, only have and add deflecting electrode further, thus improve the complexity of process units and the complexity of production.
Summary of the invention
The technical problem to be solved in the present invention be in order to overcome access in prior art uneven, focus on or the undesirable defect of dissipating effect, a kind of Beam Transport Systems and transmission method thereof are provided.By the mode of multi-coil, the characteristic that further increasing the uniformity of implantation dosage and focusing and defocus.
The present invention solves above-mentioned technical problem by following technical proposals:
A kind of Beam Transport Systems, it comprises a branch of outflow injection device, one as beam transport terminal target workpiece and be arranged at one first shaft-like quadrupole magnet and the one second shaft-like quadrupole magnet of both sides, beam transport path in parallel to each other, its feature is, described first shaft-like quadrupole magnet and the second shaft-like quadrupole magnet have an iron core respectively, wherein along the length direction of the iron core of the iron core of described first shaft-like quadrupole magnet and the second shaft-like quadrupole magnet, one or more separate coil is set respectively, wherein be arranged at described first shaft-like quadrupole magnet respectively mutually corresponding with the coil in the same position of the iron core of described second shaft-like quadrupole magnet, and the current value of each coil of described first shaft-like quadrupole magnet and described second shaft-like quadrupole magnet is all adjustable.
Preferably, the sense of current of each coil of described first shaft-like quadrupole magnet and described second shaft-like quadrupole magnet is all adjustable.
Preferably, the core length direction of described first shaft-like quadrupole magnet and the second shaft-like quadrupole magnet, vertical with beam transport path direction.
Preferably, described line beam emitter is an ion beam source.
Preferably, described target workpiece is a wafer.
Another technical scheme of the present invention is: a kind of beam transport method of described Beam Transport Systems, and its feature is to comprise the following steps:
S
101, make described first shaft-like quadrupole magnet identical with the sense of current of the coil of described second shaft-like quadrupole magnet, described line beam emitter emission current;
S
102, by adjust each current value to mutual corresponding coil on described first shaft-like quadrupole magnet and described second shaft-like quadrupole magnet respectively and regulate by the line of the described mutual corresponding coil place plane deflection angle relative to beam transport path;
S
103, determine and keep the current value of described mutual corresponding coil and, then by regulating each coil to being positioned at described first shaft-like quadrupole magnet in mutual corresponding coil and the difference of current value of coil that is positioned at the second shaft-like quadrupole magnet regulate by the focusing of the line of described mutual corresponding coil place plane and disperse respectively;
S
104, by through overshoot, to focus on or the line dispersed injects target workpiece.
Preferably, described deflection angle and each current value to mutual corresponding coil on described first shaft-like quadrupole magnet and described second shaft-like quadrupole magnet and be directly proportional.
Preferably, the difference of current value of described focusing or the angle of dispersing and each coil to being positioned at described first shaft-like quadrupole magnet in described mutual corresponding coil and the coil that is positioned at the second shaft-like quadrupole magnet is directly proportional.
Another technical scheme of the present invention is: a kind of beam transport method of described Beam Transport Systems, and its feature is to comprise the following steps:
S
201, make the sense of current of the coil of described first shaft-like quadrupole magnet and described second shaft-like quadrupole magnet contrary, described line beam emitter emission current;
S
202, by adjust each current value to mutual corresponding coil on described first shaft-like quadrupole magnet and described second shaft-like quadrupole magnet respectively and regulate by the focusing of the line of described mutual corresponding coil place plane and disperse;
S
203, determine and keep the current value of described mutual corresponding coil and, then by regulating each coil to being positioned at described first shaft-like quadrupole magnet in mutual corresponding coil and the difference of current value of coil that is positioned at the second shaft-like quadrupole magnet to regulate by the line of the described mutual corresponding coil place plane deflection angle relative to beam transport path respectively;
S
204, by through overshoot, to focus on or the line dispersed injects target workpiece.
Preferably, described focusing or the angle of dispersing and each current value to mutual corresponding coil on described first shaft-like quadrupole magnet and described second shaft-like quadrupole magnet and be directly proportional.
Preferably, the difference of current value of described deflection angle and each coil to being positioned at described first shaft-like quadrupole magnet in described mutual corresponding coil and the coil that is positioned at the second shaft-like quadrupole magnet is directly proportional.
Positive progressive effect of the present invention is:
Beam Transport Systems of the present invention, by adopting multi-coil mode in shaft-like level Four magnet, can control deflection angle and the focusing of the line injected more accurately or disperse, thus improves the uniformity injected, and improves the precision and effect that focus on or disperse.
Accompanying drawing explanation
Fig. 1 is the end view of the preferred embodiment of Beam Transport Systems of the present invention.
Fig. 2 is the vertical view of the preferred embodiment of Beam Transport Systems of the present invention.
Fig. 3 is the flow chart of the preferred embodiment coil electric current beam transport method in the same way of Beam Transport Systems of the present invention.
Fig. 4 is the flow chart of the reverse beam transport method of the preferred embodiment coil electric current of Beam Transport Systems of the present invention.
Embodiment
Present pre-ferred embodiments is provided, to describe technical scheme of the present invention in detail below in conjunction with accompanying drawing.
Beam Transport Systems shown in Fig. 1 and Fig. 2 comprises a branch of outflow injection device 1, wafer 2 and two shaft-like quadrupole magnets 3 and 4.
The line of the beam emitter 1 of line described in the present embodiment outgoing after transmission, finally requires to arrive wafer 2 place according to the intensity distributions preset and angular distribution, thus completes procedure for processing to wafer 2 on beam transport path.This line beam emitter 1 can be an ion source, and correspondingly, the line of transmission can be then ion beam, and described wafer 2 is as target workpiece, and described target workpiece can also be that other receive the parts of ion beam.The present invention is provided with a pair that be parallel to each other, to lay respectively at both sides, beam transport path shaft-like quadrupole magnet 3 and 4 between described line beam emitter 1 and described wafer 2.
Described in the present embodiment, shaft-like quadrupole magnet 3 is vertical with beam transport path direction with the core length direction of 4, according to needs of production etc., can make described core length direction and beam transport path direction at angle in addition.
Described shaft-like quadrupole magnet 3 and 4 is formed by rod core and 5 solenoids be around on iron core, wherein said rod core can be cuboid, or there is the approximate cuboid of certain radian on the length direction of iron core, or the cross section of iron core also can in approximate rectangular, when rod core is not standard cuboid, the described shaft-like quadrupole magnet 3 and 4 being arranged at both sides, beam transport path still needs to keep symmetrical shape.The quadrupole magnet group of above-mentioned various derived type all can realize identical focusing or defocus and deflecting effect.
The length direction of the iron core of shaft-like quadrupole magnet 3 and 4 described in this outer, 5 separate coils are set respectively, wherein be arranged at described shaft-like quadrupole magnet 3 respectively mutually corresponding with the coil in the same position of the iron core of described shaft-like quadrupole magnet 4, thus be arranged at described shaft-like quadrupole magnet 3 and the coil of same position on described shaft-like quadrupole magnet 4 respectively and form a pair mutually corresponding coil.
And the described quantity being arranged at the coil of shaft-like quadrupole magnet 3 and 4 respectively can be arbitrary, such as 1 pair of coil or 7 pairs of coils etc., thus the requirement of different line implantation homogeneity and precision can be met.
The current value being arranged at the described coil on described shaft-like quadrupole magnet 3 and 4 in the present embodiment respectively can regulate, thus can be changed line by the electric current changing coil relative to the deflection angle in beam transport path and the focusing of line or the angle of dispersing.Namely by the current value of regulating winding, regulate the deflection angle θ of line as shown in Figure 1 and carry out the adjustment dispersing or focus on along direction of arrow A halved tie stream as shown in Figure 2.
In addition the sense of current of the described described coil be arranged at respectively on described shaft-like quadrupole magnet 3 and 4 also can regulate, 5 coils of shaft-like quadrupole magnet 3 are counterclockwise as shown in Figure 1,5 coils of shaft-like quadrupole magnet 4 are clockwise direction, the sense of current of described 5 coils be arranged at respectively on shaft-like quadrupole magnet 3 and 4 can be clockwise arbitrary or counterclockwise, thus can change line further relative to the deflection angle in beam transport path and the focusing of line or the angle of dispersing.
Current value and the sense of current thereof of the coil on shaft-like quadrupole magnet 3 and 4 described in the present embodiment are all Independent adjustable, thus can control through the deflection of the line of each pair of coil and focusing or the angle of dispersing respectively, thus control the deflection angle of line and the focusing of line of injection more accurately or disperse, thus improve the uniformity injected, improve the precision and effect that focus on or disperse.
The operation principle of the Beam Transport Systems of the present embodiment is as follows:
1, when in described Beam Transport Systems, make to be arranged at respectively described shaft-like quadrupole magnet 3 identical with the sense of current of the described coil on 4 time, such as, the sense of current of all coils is clockwise direction or counter clockwise direction, the beam transport method of described Beam Transport Systems as shown in Figure 3, comprising following steps:
Step 101, makes described shaft-like quadrupole magnet 3 identical with the sense of current of the coil on 4, described line beam emitter 1 emission current.
Step 102, adjust respectively each current value to mutual corresponding coil in described shaft-like quadrupole magnet 3 and 4 and regulate by the line of the described mutual corresponding coil place plane deflection angle relative to beam transport path.
In the present embodiment, when the sense of current of the coil on described shaft-like quadrupole magnet 3 is with 4 is identical, the size of described deflection angle θ and each current value to mutual corresponding coil on described shaft-like quadrupole magnet 3 and 4 and be directly proportional.
Step 103, determine and keep each current value to mutual corresponding coil and, then by regulating each coil to being positioned at described shaft-like quadrupole magnet 3 in mutual corresponding coil and the difference of current value that is positioned on the coil of shaft-like quadrupole magnet 4 to regulate by the focusing of the line of described mutual corresponding coil place plane and the angle of dispersing respectively.
In the present embodiment, because the sense of current of the coil on described shaft-like quadrupole magnet 3 and 4 is identical, the difference of current value that described A in the direction of the arrow carries out the angle that focuses on or disperse and each coil to being positioned at described shaft-like quadrupole magnet 3 in described mutual corresponding coil and the coil that is positioned at shaft-like quadrupole magnet 4 is directly proportional.
Step 104, by through overshoot, to focus on or the line dispersed injects wafer 2.
2, when in described Beam Transport Systems, when making the sense of current of 5 coils be arranged at respectively on described shaft-like quadrupole magnet 3 and 4 contrary, such as the direction of the winding current of shaft-like quadrupole magnet 3 is clockwise direction, the direction of the winding current of described shaft-like quadrupole magnet 4 is counter clockwise direction etc., the beam transport method of described Beam Transport Systems as shown in Figure 4, comprising following steps:
Step 201, makes the sense of current of the coil on described shaft-like quadrupole magnet 3 and 4 contrary, described line beam emitter 1 emission current.
Step 202, by adjust each current value to mutual corresponding coil in described shaft-like quadrupole magnet 3 and 4 respectively and regulate by the focusing of the line of described mutual corresponding coil place plane and the angle of dispersing.
In the present embodiment, because the sense of current of the coil on described shaft-like quadrupole magnet 3 and 4 is contrary, described A in the direction of the arrow carry out the angle that focuses on or disperse with each to be positioned in described mutual corresponding coil described shaft-like quadrupole magnet 3 coil and be positioned at shaft-like quadrupole magnet 4 coil current value be directly proportional.
Step 203, determine and keep each current value to mutual corresponding coil and, then by regulating each coil to being positioned at described shaft-like quadrupole magnet 3 in mutual corresponding coil and the difference of current value that is positioned at the coil on shaft-like quadrupole magnet 4 to regulate by the line of the described mutual corresponding coil place plane deflection angle relative to beam transport path respectively.
In the present embodiment, because the sense of current of the coil on described shaft-like quadrupole magnet 3 and 4 is contrary, the size of described deflection angle θ is directly proportional with the difference of the current value being positioned at the coil on shaft-like quadrupole magnet 4 with each coil 3 to being positioned at described shaft-like quadrupole magnet in described mutual corresponding coil.
Step 204, by through overshoot, to focus on or the line dispersed injects wafer 2.
In sum, Beam Transport Systems of the present invention by adopting multi-coil mode in shaft-like level Four magnet, deflection angle and the focusing of the line injected can be controlled more accurately or disperse, thus improving the uniformity injected, improving the precision and effect that focus on or disperse.
Although the foregoing describe the specific embodiment of the present invention, it will be understood by those of skill in the art that these only illustrate, protection scope of the present invention is defined by the appended claims.Those skilled in the art, under the prerequisite not deviating from principle of the present invention and essence, can make various changes or modifications to these execution modes, but these change and amendment all falls into protection scope of the present invention.
Claims (12)
1. a beam transport method, this beam transport method uses a Beam Transport Systems, it comprises a branch of outflow injection device, one as beam transport terminal target workpiece and be arranged at one first shaft-like quadrupole magnet and the one second shaft-like quadrupole magnet of both sides, beam transport path in parallel to each other, it is characterized in that, described first shaft-like quadrupole magnet and the second shaft-like quadrupole magnet have an iron core respectively, wherein along the length direction of the iron core of the iron core of described first shaft-like quadrupole magnet and the second shaft-like quadrupole magnet, one or more separate coil is set respectively, wherein be arranged at described first shaft-like quadrupole magnet respectively mutually corresponding with the coil in the same position of the iron core of described second shaft-like quadrupole magnet, and the current value of each coil of described first shaft-like quadrupole magnet and described second shaft-like quadrupole magnet is all adjustable, the sense of current of each coil of described first shaft-like quadrupole magnet and described second shaft-like quadrupole magnet is all adjustable,
This beam transport method comprises the following steps:
S101, make described first shaft-like quadrupole magnet identical with the sense of current of the coil of described second shaft-like quadrupole magnet, described line beam emitter emission current;
S102, by adjust each current value to mutual corresponding coil on described first shaft-like quadrupole magnet and described second shaft-like quadrupole magnet respectively and regulate by the line of the described mutual corresponding coil place plane deflection angle relative to beam transport path;
S103, determine and keep the current value of described mutual corresponding coil and, then by regulating each coil to being positioned at described first shaft-like quadrupole magnet in mutual corresponding coil and the difference of current value of coil that is positioned at the second shaft-like quadrupole magnet regulate by the focusing of the line of described mutual corresponding coil place plane and disperse respectively;
S104, by through overshoot, to focus on or the line dispersed injects target workpiece.
2. beam transport method as claimed in claim 1, is characterized in that, described deflection angle and each current value to mutual corresponding coil on described first shaft-like quadrupole magnet and described second shaft-like quadrupole magnet be directly proportional.
3. beam transport method as claimed in claim 1 or 2, it is characterized in that, the difference of current value of described focusing or the angle of dispersing and each coil to being positioned at described first shaft-like quadrupole magnet in described mutual corresponding coil and the coil that is positioned at the second shaft-like quadrupole magnet is directly proportional.
4. beam transport method as claimed in claim 1 or 2, it is characterized in that, described first shaft-like quadrupole magnet is vertical with beam transport path direction with the core length direction of the second shaft-like quadrupole magnet.
5. beam transport method as claimed in claim 1, it is characterized in that, described line beam emitter is an ion beam source.
6. beam transport method as claimed in claim 5, it is characterized in that, described target workpiece is a wafer.
7. a beam transport method, this beam transport method uses a Beam Transport Systems, it comprises a branch of outflow injection device, one as beam transport terminal target workpiece and be arranged at one first shaft-like quadrupole magnet and the one second shaft-like quadrupole magnet of both sides, beam transport path in parallel to each other, it is characterized in that, described first shaft-like quadrupole magnet and the second shaft-like quadrupole magnet have an iron core respectively, wherein along the length direction of the iron core of the iron core of described first shaft-like quadrupole magnet and the second shaft-like quadrupole magnet, one or more separate coil is set respectively, wherein be arranged at described first shaft-like quadrupole magnet respectively mutually corresponding with the coil in the same position of the iron core of described second shaft-like quadrupole magnet, and the current value of each coil of described first shaft-like quadrupole magnet and described second shaft-like quadrupole magnet is all adjustable,
This beam transport method comprises and comprising the following steps:
S
201, make the sense of current of the coil of described first shaft-like quadrupole magnet and described second shaft-like quadrupole magnet contrary, described line beam emitter emission current;
S
202, by adjust each current value to mutual corresponding coil on described first shaft-like quadrupole magnet and described second shaft-like quadrupole magnet respectively and regulate by the focusing of the line of described mutual corresponding coil place plane and disperse;
S
203, determine and keep the current value of described mutual corresponding coil and, then by regulating each coil to being positioned at described first shaft-like quadrupole magnet in mutual corresponding coil and the difference of current value of coil that is positioned at the second shaft-like quadrupole magnet to regulate by the line of the described mutual corresponding coil place plane deflection angle relative to beam transport path respectively;
S
204, by through overshoot, to focus on or the line dispersed injects target workpiece.
8. beam transport method as claimed in claim 7, is characterized in that, described focusing or the angle of dispersing and each current value to mutual corresponding coil on described first shaft-like quadrupole magnet and described second shaft-like quadrupole magnet be directly proportional.
9. beam transport method as claimed in claim 7 or 8, it is characterized in that, the difference of current value of described deflection angle and each coil to being positioned at described first shaft-like quadrupole magnet in described mutual corresponding coil and the coil that is positioned at the second shaft-like quadrupole magnet is directly proportional.
10. beam transport method as claimed in claim 7 or 8, it is characterized in that, described first shaft-like quadrupole magnet is vertical with beam transport path direction with the core length direction of the second shaft-like quadrupole magnet.
11. beam transport methods as claimed in claim 7, it is characterized in that, described line beam emitter is an ion beam source.
12. beam transport methods as claimed in claim 11, it is characterized in that, described target workpiece is a wafer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110102596.2A CN102751155B (en) | 2011-04-22 | 2011-04-22 | Beam transmission system and beam transmission method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110102596.2A CN102751155B (en) | 2011-04-22 | 2011-04-22 | Beam transmission system and beam transmission method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102751155A CN102751155A (en) | 2012-10-24 |
| CN102751155B true CN102751155B (en) | 2015-02-11 |
Family
ID=47031245
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201110102596.2A Active CN102751155B (en) | 2011-04-22 | 2011-04-22 | Beam transmission system and beam transmission method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102751155B (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102791073A (en) * | 2011-05-17 | 2012-11-21 | 上海凯世通半导体有限公司 | Beam transmission system and transmission method thereof |
| CN103811251A (en) * | 2012-11-08 | 2014-05-21 | 北京中科信电子装备有限公司 | Beam uniformity adjusting device in ion implantation system |
| CN104914119B (en) * | 2015-06-15 | 2017-10-27 | 中国工程物理研究院流体物理研究所 | It is a kind of to match the charged particle photographic means that line is parallel beam |
| CN113194596B (en) * | 2019-06-11 | 2023-08-01 | 合肥工业大学 | High-temperature superconductive multipolar magnet structure and particle medical equipment thereof |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5530251A (en) * | 1994-12-21 | 1996-06-25 | International Business Machines Corporation | Inductively coupled dual-stage magnetic deflection yoke |
| EP0926699A1 (en) * | 1997-10-22 | 1999-06-30 | Nissin Electric Co., Ltd. | Method and apparatus for deflecting charged particles |
| CN1806309A (en) * | 2003-06-13 | 2006-07-19 | 艾克塞利斯技术公司 | A hybrid magnetic/electrostatic deflector for ion implantation systems |
| CN102024656A (en) * | 2009-09-17 | 2011-04-20 | 上海凯世通半导体有限公司 | System and method for improving beam current intensity distribution after leading ion beam out |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2760213B2 (en) * | 1992-05-29 | 1998-05-28 | 富士通株式会社 | Electron beam exposure method and apparatus |
-
2011
- 2011-04-22 CN CN201110102596.2A patent/CN102751155B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5530251A (en) * | 1994-12-21 | 1996-06-25 | International Business Machines Corporation | Inductively coupled dual-stage magnetic deflection yoke |
| EP0926699A1 (en) * | 1997-10-22 | 1999-06-30 | Nissin Electric Co., Ltd. | Method and apparatus for deflecting charged particles |
| CN1806309A (en) * | 2003-06-13 | 2006-07-19 | 艾克塞利斯技术公司 | A hybrid magnetic/electrostatic deflector for ion implantation systems |
| CN102024656A (en) * | 2009-09-17 | 2011-04-20 | 上海凯世通半导体有限公司 | System and method for improving beam current intensity distribution after leading ion beam out |
Non-Patent Citations (1)
| Title |
|---|
| JP特开平5-335219A 1993.12.17 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102751155A (en) | 2012-10-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8552404B2 (en) | Ion implantation method and ion implantation apparatus | |
| KR100913445B1 (en) | Ion implanter apparatus and method for adjusting and controlling uniformity of charged particles in continuous ion beam | |
| US8058626B2 (en) | Method and apparatus for modifying a ribbon-shaped ion beam | |
| CN102751155B (en) | Beam transmission system and beam transmission method | |
| CN101901734A (en) | Multimode ion implantation machine system and implantation regulating method | |
| JP5818168B2 (en) | Quadrupole lens, system and method | |
| CN102479654B (en) | Ion implantation equipment and method thereof | |
| CN102791073A (en) | Beam transmission system and transmission method thereof | |
| CN102102189B (en) | Ion implantation system and method for improving beam current intensity and angle distribution | |
| CN102110568B (en) | Beam transmission system and method | |
| CN102315065B (en) | Beam current transmission system and method | |
| CN102856147B (en) | Beam Transport Systems and beam transport method thereof | |
| CN105185683B (en) | Use the relatively low-dose ion implanting compared with wide ion beam | |
| JP2006313750A (en) | High resolution analyzer magnet with high aspect ratio for ribbon ion beam, and system | |
| TWI647733B (en) | Ion source and ion implantation system | |
| TW201601187A (en) | Ion implanter | |
| CN111261477B (en) | Double-outlet parallel lens | |
| JP2011233386A (en) | Ion implanter and beam current density distribution adjustment method | |
| US9818574B2 (en) | Beam transmission system and method thereof | |
| CN106653539A (en) | Ion implantation tool and ion implantation method | |
| JP2023008929A (en) | Ribbon beam angle adjustment in an ion implantation system | |
| CN103187233A (en) | Focus control device of multiple-magnetic-pole beam | |
| CN117393407A (en) | Mass analysis magnet system for ribbon ion beam | |
| TW201725610A (en) | Method of improving the uniformity of ion implantation and corresponding ion implanter |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 201203 Shanghai City Newton Road, Zhangjiang High Tech Park of Pudong New Area No. 200 Building No. 7, No. 1 Patentee after: KINGSTONE SEMICONDUCTOR COMPANY LTD. Address before: 201203 Shanghai City Newton Road, Zhangjiang High Tech Park of Pudong New Area No. 200 Building No. 7, No. 1 Patentee before: Shanghai Kaishitong Semiconductor Co., Ltd. |