CN101764031A - Novel magnetic quadrupole lens pipeline - Google Patents

Novel magnetic quadrupole lens pipeline Download PDF

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Publication number
CN101764031A
CN101764031A CN200810238900A CN200810238900A CN101764031A CN 101764031 A CN101764031 A CN 101764031A CN 200810238900 A CN200810238900 A CN 200810238900A CN 200810238900 A CN200810238900 A CN 200810238900A CN 101764031 A CN101764031 A CN 101764031A
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CN
China
Prior art keywords
pipeline
quadrupole lens
magnetic quadrupole
implanter
vacuum system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN200810238900A
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Chinese (zh)
Inventor
田小海
伍三忠
郭健辉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beijing Zhongkexin Electronic Equipment Co Ltd
Original Assignee
Beijing Zhongkexin Electronic Equipment Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing Zhongkexin Electronic Equipment Co Ltd filed Critical Beijing Zhongkexin Electronic Equipment Co Ltd
Priority to CN200810238900A priority Critical patent/CN101764031A/en
Publication of CN101764031A publication Critical patent/CN101764031A/en
Pending legal-status Critical Current

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Abstract

The invention discloses a magnetic quadrupole lens pipeline of an ion implanter applied to a process of semiconductor manufacture and ion implantation. The magnetic quadrupole lens pipeline comprises a sealing pipeline, an air extraction pipeline and a connecting flange. The three parts are welded to form a whole body or in whole casting forming. In the invention, through optimization design of the pipeline appearance, the pipeline volume is enhanced, air extraction flow conductance of a vacuum system is increased, the establishing time of the vacuum system of the implanter is shortened, the production efficiency is enhanced and the installation performance and the maintenance performance are favorable.

Description

Novel magnetic quadrupole lens pipeline
Technical field
What patent of the present invention was described is that this structural design belongs to the part of magnetic quadrupole lens in the ion implantor in a kind of version of condenser lens zone beam transport pipeline, relates to semiconductor equipment and makes the field.
Background technology
Along with the fast development of present semiconductor industry and technology, advanced semiconductor technology has proposed more and more higher requirement to semiconductor production equipment.As the key equipment on the ion-implanted semiconductor production line, from being suggested higher requirement at the aspects such as control, uniformity, reliability and productivity ratio of injecting wafer size, the injection degree of depth in implanter.
Magnetic quadrupole lens is important composition parts determining light path system on the ion implantor.It is such device: produce suitable Distribution of Magnetic Field, make the ion that enters wherein be subjected to the effect of Luo Lun magnetic force, and change running orbit, come thus the line of transmission is focused on, and obtain the ion beam spot of certain size size, shape on target.
Quadrupole lens pipeline then is the part of magnetic quadrupole lens structure.It is the one section pipeline that is used for connecting vacuum cavity before and after the lens unit, and its basic function is to keep certain high vacuum and guarantee that line transmits smoothly therein and focuses on.
Summary of the invention
The present invention is applied on the angled ion implanter magnetic quadrupole lens, and carried out optimal design, make it except that satisfying basic function requires, also have the ion implantor of shortening complete machine vacuum system settling time, contributing aspect the implanter production efficiency improving.
Technical scheme of the present invention is achieved in that
This pipeline is installed in four cartridge centers of magnetic quadrupole lens, sees accompanying drawing 1.Its version is seen accompanying drawing 2: closed conduit 1, pump-line 2 connects connection orchid 3.
Described closed conduit 1 is the outlet of ion beam current transmission.The profile of left-hand component is cylindric, and the seize sealing by loose flange is connected with next vacuum cavity; The profile of right-hand component is consistent with pump-line 2, and adopts welded connection with pump-line; Described pump-line 2 is main thoroughfares of ion beam current transmission.Its curved profile and magnetic quadrupole lens cartridge curved surface are tangent, and can not interfere; Described adpting flange 3 is inlets of ion beam current transmission.Its profile is the circular flange dish, 2 welding of left side and pump-line, and there is an annular seal groove on the right side, built-in rubber seal, and be connected with the vacuum cavity of front by screw.
With reference to accompanying drawing 1, Fig. 2, do following description to the design's characteristics:
Magnetic quadrupole lens pipeline in the angled ion implanter with made very big improvement in the past: changed the channel shape of lens pipelines, and adopted the loose flange seize to be tightly connected in the outlet junction of beam transport.The basic role of lens pipeline is as the high vacuum passage, guarantees that line transmits smoothly therein and focuses on, and therefore lens pipeline in the past is designed to the cylinder pipeline, and cylindrical and the tangent cartridge centers of guaranteeing to be installed in smoothly four symmetry installations of quadrupole lens cartridge.In the magnetic quadrupole lens of angled ion implanter, the passage of simple circular cross-section in the past is modified into the passage that surrounds with the tangent curved surface of cartridge, expanded the volume of passage so to greatest extent.For vacuum cavity and whole vacuum system before and after the lens pipeline, the volume of expansion can be ignored, but for the pipeline of circular cross-section, sectional area has increased 75%.The increase that pipeline section amasss has increased the conductance of vacuum system exactly for vacuum system, has therefore shortened the settling time of implanter complete machine vacuum system, has improved production efficiency.The seize of the loose flange of lens pipeline is tightly connected, and has increased implanter lens installation flexibility, makes things convenient for the installation of implanter complete machine greatly.Its closed conduit is the scope of lap joint flange seize sealing.
Description of drawings
Fig. 1 is the position installation diagram of quadrupole lens pipeline of the present invention.Wherein, the 1st, annular yoke, the 2nd, cartridge, the 3rd, exhausted magnetic backing plate, the 4th, lens pipeline, the 5th, excitation wire bag.
Fig. 2 is the structure chart of quadrupole lens pipeline of the present invention.
Embodiment
The invention will be described further below in conjunction with the drawings and specific embodiments, as limitation of the invention.
The manufacturing of this magnetic quadrupole lens pipeline can have two kinds of methods:
Or adopt welding: be made up of closed conduit 1, pump-line 2, adpting flange 3 three parts, the profile of its pump-line part is the curved surface tangent with cartridge.The material of three parts adopts stainless steel.
Or monoblock cast, surfaces externally and internally polishing then, material selection cast aluminium.

Claims (1)

1. this magnetic quadrupole lens pipeline is made up of closed conduit 1, pump-line 2, adpting flange 3 three parts, and the profile of its pump-line part is the curved surface tangent with cartridge.The manufacturing of pipeline can have two kinds of methods: be welded to connect, the material of three parts adopts stainless steel; Monoblock cast, surfaces externally and internally polishing then, material selection aluminium.
CN200810238900A 2008-12-04 2008-12-04 Novel magnetic quadrupole lens pipeline Pending CN101764031A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN200810238900A CN101764031A (en) 2008-12-04 2008-12-04 Novel magnetic quadrupole lens pipeline

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN200810238900A CN101764031A (en) 2008-12-04 2008-12-04 Novel magnetic quadrupole lens pipeline

Publications (1)

Publication Number Publication Date
CN101764031A true CN101764031A (en) 2010-06-30

Family

ID=42495123

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200810238900A Pending CN101764031A (en) 2008-12-04 2008-12-04 Novel magnetic quadrupole lens pipeline

Country Status (1)

Country Link
CN (1) CN101764031A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104851471A (en) * 2015-05-18 2015-08-19 北京大学 Three-unit magnetic quadrupole lens system and manufacturing method thereof
CN110075995A (en) * 2019-04-22 2019-08-02 中国电子科技集团公司第三十八研究所 A kind of magnetic filter

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104851471A (en) * 2015-05-18 2015-08-19 北京大学 Three-unit magnetic quadrupole lens system and manufacturing method thereof
CN104851471B (en) * 2015-05-18 2017-02-01 北京大学 Three-unit magnetic quadrupole lens system and manufacturing method thereof
CN110075995A (en) * 2019-04-22 2019-08-02 中国电子科技集团公司第三十八研究所 A kind of magnetic filter

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C57 Notification of unclear or unknown address
DD01 Delivery of document by public notice

Addressee: Zhao Na

Document name: Notification of Passing Preliminary Examination of the Application for Invention

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PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
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Open date: 20100630