CN110060951B - Graphite boat for silicon wafer coating - Google Patents
Graphite boat for silicon wafer coating Download PDFInfo
- Publication number
- CN110060951B CN110060951B CN201910421035.5A CN201910421035A CN110060951B CN 110060951 B CN110060951 B CN 110060951B CN 201910421035 A CN201910421035 A CN 201910421035A CN 110060951 B CN110060951 B CN 110060951B
- Authority
- CN
- China
- Prior art keywords
- graphite boat
- clamping point
- silicon wafer
- piece
- strip hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 88
- 229910002804 graphite Inorganic materials 0.000 title claims abstract description 88
- 239000010439 graphite Substances 0.000 title claims abstract description 88
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 45
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 45
- 239000010703 silicon Substances 0.000 title claims abstract description 45
- 239000011248 coating agent Substances 0.000 title claims abstract description 13
- 238000000576 coating method Methods 0.000 title claims abstract description 13
- 239000000919 ceramic Substances 0.000 claims abstract description 22
- 235000012431 wafers Nutrition 0.000 claims 6
- 238000000034 method Methods 0.000 claims 1
- 239000012634 fragment Substances 0.000 abstract description 13
- 238000007747 plating Methods 0.000 abstract 1
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67346—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders characterized by being specially adapted for supporting a single substrate or by comprising a stack of such individual supports
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The invention discloses a graphite boat for silicon wafer coating, which comprises: a row of vertically arranged graphite boat sheets connected together in series through ceramic rods; the graphite boat piece is provided with: a clamping point group capable of bearing a single vertical silicon wafer; the graphite boat piece is also provided with three strip holes for installing clamping points; the three strip holes respectively penetrate through the two side surfaces of the graphite boat piece, the three strip holes also extend along the transverse direction of the graphite boat piece, and the three strip holes extend from one transverse end to the other transverse end of the graphite boat piece. The clamping points of the graphite boat for silicon wafer film plating are clamped with the graphite boat sheets, and the mounting positions of the clamping points in the corresponding strip holes can be freely set, so that the graphite boat can bear the whole silicon wafer and the divided fragments of the whole silicon wafer.
Description
Technical Field
The invention relates to a graphite boat for silicon wafer coating.
Background
The silicon wafer used for the solar cell needs to be coated, and the silicon wafer needs to be carried by a graphite boat during coating, the graphite boat comprises a row of graphite boat sheets connected in series by ceramic rods, and clamping points for carrying the silicon wafer are arranged on the graphite boat sheets.
With the development of solar cell technology, the whole silicon wafer is equally divided into at least two fragments, so that the efficiency of the solar module can be improved. However, the position of the clamping point of the existing graphite boat is designed according to the shape of the whole silicon wafer, so that the graphite boat is required to be independently designed for slicing, and the production cost of enterprises is increased.
Disclosure of Invention
The invention aims to provide a graphite boat for silicon wafer coating, wherein the clamping points of the graphite boat are clamped with graphite boat sheets, and the mounting positions of the clamping points in corresponding strip holes can be freely set, so that the graphite boat can bear the whole silicon wafer and the divided fragments of the whole silicon wafer.
In order to achieve the above object, the present invention provides a graphite boat for silicon wafer coating, comprising: a row of vertically arranged graphite boat sheets connected together in series through ceramic rods; the graphite boat piece is provided with: a clamping point group capable of bearing a single vertical silicon wafer;
the graphite boat piece is also provided with three strip holes for installing clamping points: the bottom strip hole is positioned at the bottom of the graphite boat piece, the middle strip hole is positioned at the vertical middle part of the graphite boat piece, and the upper strip hole is positioned at the upper part of the graphite boat piece; the three strip holes respectively penetrate through the two side surfaces of the graphite boat piece, the three strip holes also extend along the transverse direction of the graphite boat piece, and the three strip holes extend from one transverse end of the graphite boat piece to the other transverse end;
the stuck points in the same stuck point group comprise: the bottom clamping point is clamped in the bottom strip hole, the middle clamping point is clamped in the middle strip hole, and the upper clamping point is clamped in the upper strip hole; the bottom clamping point, the middle clamping point and the upper clamping point in the same clamping point group, wherein the middle clamping point and the upper clamping point are respectively arranged at two sides of the bottom clamping point.
Preferably, the bottom clip point, the middle clip point and the upper clip point respectively include: the supporting column penetrates through the corresponding strip hole and is clamped with the strip hole; the support column is perpendicular to the graphite boat sheet, a pair of annular grooves for inserting silicon wafer edge lines are arranged on the support column, the pair of annular grooves and the support column are coaxial, and the pair of annular grooves are respectively arranged on two sides of the graphite boat sheet.
Preferably, the number of the clamping point groups is multiple, and the clamping point groups are sequentially arranged at equal intervals along the transverse direction of the graphite boat sheet.
Preferably, the ceramic rods are two pairs, and the ceramic rods are parallel to each other; the graphite boat sheets are mutually parallel, and are sequentially arranged at equal intervals along the extending direction of the ceramic rod; the single graphite boat sheet is penetrated by the two pairs of ceramic rods, wherein one pair of ceramic rods are respectively arranged at the transverse two sides of the top end of the graphite boat sheet, and the other pair of ceramic rods are respectively arranged at the transverse two sides of the bottom end of the graphite boat sheet.
The invention has the advantages and beneficial effects that: the graphite boat for silicon wafer coating is provided, the clamping points of the graphite boat are clamped with the graphite boat sheets, and the mounting positions of the clamping points in the corresponding strip holes can be freely set, so that the graphite boat can bear the whole silicon wafer and the divided fragments of the whole silicon wafer.
The clamping points are clamped with the corresponding strip holes, when the positions of the clamping points need to be adjusted, the clamping points can be pulled out of the strip holes and then inserted into the proper positions in the strip holes, so that the mounting positions of the clamping points in the corresponding strip holes can be freely set.
The mounting positions of the bottom clamping point, the middle clamping point and the upper clamping point in the corresponding strip holes can be freely set, so that the graphite boat can bear the whole silicon wafer and the divided fragments of the whole silicon wafer; the whole piece is square, and the width of the whole piece is larger than the vertical distance between the bottom strip hole and the middle strip hole; the slicing is as follows: dividing the whole wafer into fragments by equal parts along the width direction of the whole wafer, wherein N is an integer and is more than or equal to 2; the segments are rectangular, and the length of the segments is the width of the whole segment.
When a graphite boat is used for bearing a vertically arranged silicon wafer whole wafer, firstly, determining the mounting positions of a bottom clamping point, a middle clamping point and an upper clamping point according to the size of the whole wafer, so that the middle clamping point and the upper clamping point are respectively arranged at two sides of the bottom clamping point, the horizontal spacing of the middle clamping point and the upper clamping point is adapted to the width of the whole wafer, and the horizontal spacing of the bottom clamping point and the middle clamping point is equal to the horizontal spacing of the bottom clamping point and the upper clamping point; after the bottom clamping point, the middle clamping point and the upper clamping point are all installed, the whole silicon wafer can be vertically inserted, a pair of vertical edges of the whole silicon wafer are assembled with the middle clamping point and the upper clamping point respectively, and the bottom edge of the whole silicon wafer is supported by the bottom clamping point.
When the graphite boat is used for bearing vertical fragments, the installation positions of the bottom clamping point, the middle clamping point and the upper clamping point are determined according to the size of the fragments, so that the middle clamping point and the upper clamping point are respectively arranged on two sides of the bottom clamping point, the horizontal spacing between the middle clamping point and the upper clamping point is adapted to the width of the fragments, and the horizontal spacing between the bottom clamping point and the middle clamping point is equal to the horizontal spacing between the bottom clamping point and the upper clamping point; after the bottom clamping point, the middle clamping point and the upper clamping point are all installed, the split can be vertically inserted, so that a pair of vertical edges of the split (namely a pair of long edges of the split) are assembled with the middle clamping point and the upper clamping point respectively, and the bottom edge of the split (namely a wide edge of the split) is supported by the bottom clamping point.
Drawings
Fig. 1 is a schematic diagram of the present invention.
Detailed Description
The following describes the embodiments of the present invention further with reference to the drawings and examples. The following examples are only for more clearly illustrating the technical aspects of the present invention, and are not intended to limit the scope of the present invention.
As shown in FIG. 1, the invention provides a graphite boat for silicon wafer coating, comprising: a row of vertically arranged graphite boat sheets 2 connected in series through two pairs of horizontally arranged ceramic rods 11, 12; the ceramic rods are parallel to each other; the graphite boat pieces 2 are mutually parallel, and the graphite boat pieces 2 are sequentially arranged at equal intervals along the extending direction of the ceramic rod; the single graphite boat sheet 2 is penetrated by the two pairs of ceramic rods 11 and 12, wherein one pair of ceramic rods 11 are respectively arranged at the transverse two sides of the top end of the graphite boat sheet 2, and the other pair of ceramic rods 12 are respectively arranged at the transverse two sides of the bottom end of the graphite boat sheet 2; the graphite boat piece 2 is provided with: a clamping point group capable of bearing a single vertical silicon wafer;
the graphite boat piece 2 is also provided with three strip holes for installing clamping points: a bottom bar hole 31 positioned at the bottom of the graphite boat sheet 2, a middle bar hole 32 positioned at the vertical middle of the graphite boat sheet 2, and an upper bar hole 33 positioned at the upper part of the graphite boat sheet 2; the three strip holes respectively penetrate through the two side surfaces of the graphite boat piece 2, the three strip holes also extend along the transverse direction of the graphite boat piece 2, and the three strip holes extend from one transverse end of the graphite boat piece 2 to the other transverse end;
the stuck points in the same stuck point group comprise: a bottom snap-in point 41 snapped into the bottom bar hole 31, a middle snap-in point 42 snapped into the middle bar hole 32, and an upper snap-in point 43 snapped into the upper bar hole 33; the bottom clamping point 41, the middle clamping point 42 and the upper clamping point 43 in the same clamping point group, wherein the middle clamping point 42 and the upper clamping point 43 are respectively arranged at two sides of the bottom clamping point 41;
the bottom snap point 41, the middle snap point 42 and the upper snap point 43, which respectively comprise: the supporting column penetrates through the corresponding strip hole and is clamped with the strip hole; the support column is vertical to the graphite boat piece 2, a pair of annular grooves for inserting silicon wafer edge lines are arranged on the support column, the pair of annular grooves and the support column are coaxial, and the pair of annular grooves are respectively arranged on two sides of the graphite boat piece 2;
the number of the clamping point groups is multiple, and the clamping point groups are sequentially arranged at equal intervals along the transverse direction of the graphite boat piece 2.
The clamping points are clamped with the corresponding strip holes, when the positions of the clamping points need to be adjusted, the clamping points can be pulled out of the strip holes and then inserted into the proper positions in the strip holes, so that the mounting positions of the clamping points in the corresponding strip holes can be freely set.
The mounting positions of the bottom clamping point 41, the middle clamping point 42 and the upper clamping point 43 in the corresponding strip holes can be freely set, so that the graphite boat can bear the whole silicon wafer 5 and the split pieces separated by the whole silicon wafer 5; the whole piece 5 is square, and the width of the whole piece 5 is larger than the vertical distance between the bottom strip hole 31 and the middle strip hole 32; the slicing is as follows: dividing the whole piece 5N into fragments in equal parts along the width direction of the whole piece 5, wherein N is an integer and is more than or equal to 2; the segments are rectangular, and the length of the segments is the width of the whole segment 5.
When the graphite boat is used for bearing the vertically arranged silicon wafer whole wafer 5, the mounting positions of the bottom clamping point 41, the middle clamping point 42 and the upper clamping point 43 are determined according to the size of the whole wafer 5, so that the middle clamping point 42 and the upper clamping point 43 are respectively arranged on two sides of the bottom clamping point 41, the horizontal distance between the middle clamping point 42 and the upper clamping point 43 is matched with the width of the whole wafer 5, and the horizontal distance between the bottom clamping point 41 and the middle clamping point 42 is equal to the horizontal distance between the bottom clamping point 41 and the upper clamping point 43; after the bottom clamping point 41, the middle clamping point 42 and the upper clamping point 43 are all installed, the whole silicon wafer 5 can be vertically inserted, a pair of vertical edges of the whole silicon wafer 5 are respectively inserted into annular grooves of the middle clamping point 42 and the upper clamping point 43, the bottom edge of the whole silicon wafer 5 is inserted into the annular groove of the bottom clamping point 41, and the bottom edge of the whole silicon wafer 5 is supported by the bottom clamping point 31.
When the graphite boat is used for bearing vertical fragments, the mounting positions of the bottom clamping point 41, the middle clamping point 42 and the upper clamping point 43 are determined according to the size of the fragments, so that the middle clamping point 42 and the upper clamping point 43 are respectively arranged on two sides of the bottom clamping point 41, the horizontal distance between the middle clamping point 42 and the upper clamping point 43 is matched with the width of the fragments, and the horizontal distance between the bottom clamping point 41 and the middle clamping point 42 is equal to the horizontal distance between the bottom clamping point 41 and the upper clamping point 43; after the bottom clamping point 41, the middle clamping point 42 and the upper clamping point 43 are all installed, the split piece can be vertically inserted, a pair of vertical edges of the split piece (namely a pair of long edges of the split piece) are respectively inserted into annular grooves of the middle clamping point 42 and the upper clamping point 43, the bottom edge of the split piece (namely one wide edge of the split piece) is inserted into the annular groove of the bottom clamping point 41, and the bottom edge of the whole silicon wafer 5 is supported by the bottom clamping point 31. The split may be a two-half split 51, a three-half split 52, or a four-half split 53 divided by the whole wafer 5.
The foregoing is merely a preferred embodiment of the present invention, and it should be noted that it will be apparent to those skilled in the art that several modifications and variations can be made without departing from the technical principle of the present invention, and these modifications and variations should also be regarded as the scope of the invention.
Claims (4)
1. A graphite boat for coating silicon wafers, comprising: a row of vertically arranged graphite boat sheets connected together in series through ceramic rods; the graphite boat piece is provided with: a clamping point group capable of bearing a single vertical silicon wafer; the method is characterized in that:
the graphite boat piece is also provided with three strip holes for installing clamping points: the bottom strip hole is positioned at the bottom of the graphite boat piece, the middle strip hole is positioned at the vertical middle part of the graphite boat piece, and the upper strip hole is positioned at the upper part of the graphite boat piece; the three strip holes respectively penetrate through the two side surfaces of the graphite boat piece, the three strip holes also extend along the transverse direction of the graphite boat piece, and the three strip holes extend from one transverse end of the graphite boat piece to the other transverse end;
the stuck points in the same stuck point group comprise: the bottom clamping point is clamped in the bottom strip hole, the middle clamping point is clamped in the middle strip hole, and the upper clamping point is clamped in the upper strip hole; the bottom clamping point, the middle clamping point and the upper clamping point in the same clamping point group, wherein the middle clamping point and the upper clamping point are respectively arranged at two sides of the bottom clamping point.
2. The graphite boat for coating a silicon wafer according to claim 1, wherein the bottom clamping point, the middle clamping point and the upper clamping point respectively comprise: the supporting column penetrates through the corresponding strip hole and is clamped with the strip hole; the support column is perpendicular to the graphite boat sheet, a pair of annular grooves for inserting silicon wafer edge lines are arranged on the support column, the pair of annular grooves and the support column are coaxial, and the pair of annular grooves are respectively arranged on two sides of the graphite boat sheet.
3. The graphite boat for coating a silicon wafer according to claim 1, wherein the number of the clamping point groups is plural, and the plurality of clamping point groups are sequentially arranged at equal intervals in the transverse direction of the graphite boat sheet.
4. The graphite boat for coating silicon wafers according to claim 1, wherein the ceramic rods are two pairs, and the ceramic rods are parallel to each other; the graphite boat sheets are mutually parallel, and are sequentially arranged at equal intervals along the extending direction of the ceramic rod; the single graphite boat sheet is penetrated by the two pairs of ceramic rods, wherein one pair of ceramic rods are respectively arranged at the transverse two sides of the top end of the graphite boat sheet, and the other pair of ceramic rods are respectively arranged at the transverse two sides of the bottom end of the graphite boat sheet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910421035.5A CN110060951B (en) | 2019-05-21 | 2019-05-21 | Graphite boat for silicon wafer coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910421035.5A CN110060951B (en) | 2019-05-21 | 2019-05-21 | Graphite boat for silicon wafer coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110060951A CN110060951A (en) | 2019-07-26 |
| CN110060951B true CN110060951B (en) | 2024-02-13 |
Family
ID=67323895
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910421035.5A Active CN110060951B (en) | 2019-05-21 | 2019-05-21 | Graphite boat for silicon wafer coating |
Country Status (1)
| Country | Link |
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| CN (1) | CN110060951B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110323165A (en) * | 2019-07-31 | 2019-10-11 | 常州时创能源科技有限公司 | It is a kind of for carrying the graphite frame of silicon wafer |
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| CN106898541A (en) * | 2015-12-21 | 2017-06-27 | 扬州虹扬科技发展有限公司 | A kind of method for improving silicon chip performance |
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| CN208240631U (en) * | 2018-01-10 | 2018-12-14 | 安徽继远检验检测技术有限公司 | A kind of graphite boat of photovoltaic production |
| CN109082649A (en) * | 2018-09-06 | 2018-12-25 | 深圳市捷佳伟创新能源装备股份有限公司 | A kind of loading device of stable plated film |
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| CN109449252A (en) * | 2018-11-15 | 2019-03-08 | 浙江艾能聚光伏科技股份有限公司 | The manufacture craft of half multicrystalline solar cells |
| CN109747055A (en) * | 2019-03-04 | 2019-05-14 | 常州时创能源科技有限公司 | The preparation method and application of monocrystalline silicon piece |
| CN209607715U (en) * | 2019-05-21 | 2019-11-08 | 常州时创能源科技有限公司 | It is silicon chip film-coated to use graphite boat |
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2019
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| CN103862584A (en) * | 2014-04-04 | 2014-06-18 | 常州时创能源科技有限公司 | Squaring process and application of monocrystal silicon round bar for solar cells |
| CN204857689U (en) * | 2015-08-20 | 2015-12-09 | 浙江艾能聚光伏科技股份有限公司 | Novel structure graphite boat of solar cell |
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| CN206502866U (en) * | 2017-02-22 | 2017-09-19 | 广东爱康太阳能科技有限公司 | A kind of adjustable graphite boat in stuck point position |
| CN206505899U (en) * | 2017-02-22 | 2017-09-19 | 广东爱康太阳能科技有限公司 | A kind of tubular film plating Horizontal graphite boat |
| CN207409466U (en) * | 2017-10-16 | 2018-05-25 | 四川英发太阳能科技有限公司 | A kind of graphite boat piece and graphite boat |
| CN208240631U (en) * | 2018-01-10 | 2018-12-14 | 安徽继远检验检测技术有限公司 | A kind of graphite boat of photovoltaic production |
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| CN109082649A (en) * | 2018-09-06 | 2018-12-25 | 深圳市捷佳伟创新能源装备股份有限公司 | A kind of loading device of stable plated film |
| CN109449252A (en) * | 2018-11-15 | 2019-03-08 | 浙江艾能聚光伏科技股份有限公司 | The manufacture craft of half multicrystalline solar cells |
| CN109747055A (en) * | 2019-03-04 | 2019-05-14 | 常州时创能源科技有限公司 | The preparation method and application of monocrystalline silicon piece |
| CN209607715U (en) * | 2019-05-21 | 2019-11-08 | 常州时创能源科技有限公司 | It is silicon chip film-coated to use graphite boat |
Also Published As
| Publication number | Publication date |
|---|---|
| CN110060951A (en) | 2019-07-26 |
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