CN110007473A - 一种多波长光学系统和一种激光退火装置 - Google Patents
一种多波长光学系统和一种激光退火装置 Download PDFInfo
- Publication number
- CN110007473A CN110007473A CN201810666925.8A CN201810666925A CN110007473A CN 110007473 A CN110007473 A CN 110007473A CN 201810666925 A CN201810666925 A CN 201810666925A CN 110007473 A CN110007473 A CN 110007473A
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- CN
- China
- Prior art keywords
- optical path
- unit
- regulated
- path unit
- focal plane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 314
- 230000001105 regulatory effect Effects 0.000 claims abstract description 140
- 239000000463 material Substances 0.000 claims description 16
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 9
- 238000005452 bending Methods 0.000 claims description 9
- 230000005499 meniscus Effects 0.000 claims description 9
- 239000000571 coke Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 238000010586 diagram Methods 0.000 description 24
- 238000009826 distribution Methods 0.000 description 16
- 238000005516 engineering process Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 2
- 238000009738 saturating Methods 0.000 description 2
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000003760 hair shine Effects 0.000 description 1
- 230000035800 maturation Effects 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Laser Beam Processing (AREA)
- Lenses (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
- Microscoopes, Condenser (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810666925.8A CN110007473A (zh) | 2018-06-26 | 2018-06-26 | 一种多波长光学系统和一种激光退火装置 |
TW108122425A TW202001347A (zh) | 2018-06-26 | 2019-06-26 | 一種多波長光學系統和一種雷射退火裝置 |
JP2020572844A JP2021529437A (ja) | 2018-06-26 | 2019-06-26 | 多波長光学系及びレーザアニール装置 |
KR1020217002698A KR20210027397A (ko) | 2018-06-26 | 2019-06-26 | 다파장 광학 시스템 및 레이저 어닐링 장치 |
PCT/CN2019/092965 WO2020001467A1 (zh) | 2018-06-26 | 2019-06-26 | 一种多波长光学系统和一种激光退火装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810666925.8A CN110007473A (zh) | 2018-06-26 | 2018-06-26 | 一种多波长光学系统和一种激光退火装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN110007473A true CN110007473A (zh) | 2019-07-12 |
Family
ID=67164806
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201810666925.8A Pending CN110007473A (zh) | 2018-06-26 | 2018-06-26 | 一种多波长光学系统和一种激光退火装置 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP2021529437A (ja) |
KR (1) | KR20210027397A (ja) |
CN (1) | CN110007473A (ja) |
TW (1) | TW202001347A (ja) |
WO (1) | WO2020001467A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112756775A (zh) * | 2020-10-30 | 2021-05-07 | 苏州创鑫激光科技有限公司 | 一种激光加工方法、光学系统及激光加工设备 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005313195A (ja) * | 2004-04-28 | 2005-11-10 | Miyachi Technos Corp | 二波長重畳型レーザ出射ユニット及びレーザ加工装置 |
JP2007027612A (ja) * | 2005-07-21 | 2007-02-01 | Sony Corp | 照射装置および照射方法 |
JP2013055111A (ja) * | 2011-09-01 | 2013-03-21 | Phoeton Corp | レーザ光合成装置、レーザアニール装置およびレーザアニール方法 |
CN105182523A (zh) * | 2015-09-23 | 2015-12-23 | 北京大学 | 一种基于一阶贝塞尔光束的sted超分辨显微镜及调节方法 |
CN208506382U (zh) * | 2018-06-26 | 2019-02-15 | 上海微电子装备(集团)股份有限公司 | 一种多波长光学系统和一种激光退火装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006040949A (ja) * | 2004-07-22 | 2006-02-09 | Advanced Lcd Technologies Development Center Co Ltd | レーザー結晶化装置及びレーザー結晶化方法 |
KR20140020816A (ko) * | 2011-06-15 | 2014-02-19 | 가부시끼가이샤 니혼 세이꼬쇼 | 레이저 처리 장치 및 레이저 처리 방법 |
JP6004932B2 (ja) * | 2012-12-18 | 2016-10-12 | 住友重機械工業株式会社 | レーザ装置 |
CN105108330A (zh) * | 2015-08-20 | 2015-12-02 | 京东方科技集团股份有限公司 | 一种分束器、激光发生器及准分子激光退火设备 |
CN205982851U (zh) * | 2016-08-26 | 2017-02-22 | 成都理想境界科技有限公司 | 一种多光束合束结构 |
-
2018
- 2018-06-26 CN CN201810666925.8A patent/CN110007473A/zh active Pending
-
2019
- 2019-06-26 JP JP2020572844A patent/JP2021529437A/ja active Pending
- 2019-06-26 KR KR1020217002698A patent/KR20210027397A/ko not_active Application Discontinuation
- 2019-06-26 TW TW108122425A patent/TW202001347A/zh unknown
- 2019-06-26 WO PCT/CN2019/092965 patent/WO2020001467A1/zh active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005313195A (ja) * | 2004-04-28 | 2005-11-10 | Miyachi Technos Corp | 二波長重畳型レーザ出射ユニット及びレーザ加工装置 |
JP2007027612A (ja) * | 2005-07-21 | 2007-02-01 | Sony Corp | 照射装置および照射方法 |
JP2013055111A (ja) * | 2011-09-01 | 2013-03-21 | Phoeton Corp | レーザ光合成装置、レーザアニール装置およびレーザアニール方法 |
CN105182523A (zh) * | 2015-09-23 | 2015-12-23 | 北京大学 | 一种基于一阶贝塞尔光束的sted超分辨显微镜及调节方法 |
CN208506382U (zh) * | 2018-06-26 | 2019-02-15 | 上海微电子装备(集团)股份有限公司 | 一种多波长光学系统和一种激光退火装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112756775A (zh) * | 2020-10-30 | 2021-05-07 | 苏州创鑫激光科技有限公司 | 一种激光加工方法、光学系统及激光加工设备 |
Also Published As
Publication number | Publication date |
---|---|
JP2021529437A (ja) | 2021-10-28 |
WO2020001467A1 (zh) | 2020-01-02 |
TW202001347A (zh) | 2020-01-01 |
KR20210027397A (ko) | 2021-03-10 |
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