CN109906206A - Method for treating water and device - Google Patents
Method for treating water and device Download PDFInfo
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- CN109906206A CN109906206A CN201780067211.9A CN201780067211A CN109906206A CN 109906206 A CN109906206 A CN 109906206A CN 201780067211 A CN201780067211 A CN 201780067211A CN 109906206 A CN109906206 A CN 109906206A
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- Prior art keywords
- water
- hydrogen peroxide
- dissolved oxygen
- oxygen concentration
- treated water
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 203
- 238000000034 method Methods 0.000 title claims abstract description 58
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims abstract description 106
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 85
- 239000001301 oxygen Substances 0.000 claims abstract description 85
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 85
- 239000005416 organic matter Substances 0.000 claims abstract description 28
- 230000008569 process Effects 0.000 claims abstract description 27
- 239000000654 additive Substances 0.000 claims abstract description 25
- 210000003296 saliva Anatomy 0.000 claims abstract description 24
- 230000000996 additive effect Effects 0.000 claims abstract description 13
- 238000005259 measurement Methods 0.000 claims abstract description 8
- 230000003647 oxidation Effects 0.000 claims description 60
- 238000007254 oxidation reaction Methods 0.000 claims description 60
- 238000001223 reverse osmosis Methods 0.000 claims description 25
- 238000012545 processing Methods 0.000 claims description 24
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 19
- 239000012498 ultrapure water Substances 0.000 claims description 19
- 239000012528 membrane Substances 0.000 claims description 13
- 239000004615 ingredient Substances 0.000 claims description 12
- 230000004907 flux Effects 0.000 claims description 7
- 238000005286 illumination Methods 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 5
- 238000000354 decomposition reaction Methods 0.000 abstract description 8
- 150000002500 ions Chemical class 0.000 description 19
- 238000007872 degassing Methods 0.000 description 11
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 8
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 6
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- -1 hydroxyl radical free radical Chemical class 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000003456 ion exchange resin Substances 0.000 description 5
- 229920003303 ion-exchange polymer Polymers 0.000 description 5
- 150000007524 organic acids Chemical class 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 238000005342 ion exchange Methods 0.000 description 4
- 238000011084 recovery Methods 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000003957 anion exchange resin Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical compound O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 241000894007 species Species 0.000 description 3
- 101100435119 Arabidopsis thaliana APRR1 gene Proteins 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 101100481792 Schizosaccharomyces pombe (strain 972 / ATCC 24843) toc1 gene Proteins 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 230000008595 infiltration Effects 0.000 description 2
- 238000001764 infiltration Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000005549 size reduction Methods 0.000 description 2
- UUFQTNFCRMXOAE-UHFFFAOYSA-N 1-methylmethylene Chemical compound C[CH] UUFQTNFCRMXOAE-UHFFFAOYSA-N 0.000 description 1
- 241000894006 Bacteria Species 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 238000005349 anion exchange Methods 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 230000003487 anti-permeability effect Effects 0.000 description 1
- 239000003729 cation exchange resin Substances 0.000 description 1
- 239000003610 charcoal Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000006392 deoxygenation reaction Methods 0.000 description 1
- 238000010612 desalination reaction Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 238000006864 oxidative decomposition reaction Methods 0.000 description 1
- 238000010525 oxidative degradation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000013535 sea water Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000010129 solution processing Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000008400 supply water Substances 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/722—Oxidation by peroxides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
- B01D61/025—Reverse osmosis; Hyperfiltration
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/008—Control or steering systems not provided for elsewhere in subclass C02F
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
- C02F1/325—Irradiation devices or lamp constructions
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/441—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by reverse osmosis
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/02—Non-contaminated water, e.g. for industrial water supply
- C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
- C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/22—O2
Landscapes
- Water Supply & Treatment (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Nanotechnology (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Water Treatments (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
Abstract
The water treatment facilities for carrying out resolution process to organic matter contained in treated water realizes high TOC removal rate to improve the decomposition efficiency of organic matter, has: hydrogen peroxide adding set, adds hydrogen peroxide to treated water；Ultraviolet lamp irradiates ultraviolet light to the treated water for being added to hydrogen peroxide；Dissolved oxygen sensing unit, the dissolved oxygen concentration for going out saliva of measurement ultraviolet lamp；And control unit, the additive amount of hydrogen peroxide is controlled according to the dissolved oxygen concentration measured by dissolved oxygen sensing unit.
Description
Technical field
The present invention relates to organic matters contained in the treated water to the water as process object to carry out resolution process
Method for treating water and device.
Background technique
In the past, as the ejected wash water used in the manufacturing process of semiconductor device or the manufacturing process of liquid crystal display device
Deng the pure water such as ultrapure water after having used organic matter, ion component, particle, bacterium etc. highly to be removed.Especially wrapped in manufacture
When containing electronic component including semiconductor device, a large amount of pure water will use in its cleaning process, the requirement to its water quality
Increase year by year.For the pure water used in cleaning process for being manufactured in electronic component etc., contain in pure water in order to prevent
Organic matter is carbonized in heat treatment procedure later and causes defective insulation etc., it is desirable that makes as the total of one of water quality management project
Organic carbon (TOC；Total Organic Carbon) concentration become extremely low level.
As this requirement for height to pure water water quality is obviously changed, in recent years, having studied has micro contained in pure water
The various methods that machine object (TOC ingredient) is decomposed and removed.As the exemplary process of this method, using based on ultra-violet oxidation
The organic matter of processing decomposes removing step.
In general, in the case where handling the decomposition removal for carrying out organic matter by ultra-violet oxidation, such as tool is used
The ultra-violet oxidation device of the ultraviolet radiator of the reactive tank and tubulose being arranged in the reactive tank of standby stainless steel, to reactive tank
Interior importing treated water, and ultraviolet light is irradiated to treated water.As ultraviolet radiator, for example, using generate have 254nm and
The low pressure UV lamps of the ultraviolet light of each wavelength of 185nm.When the ultraviolet light to wavelength of the treated water irradiation containing 185nm
When, oxide species such as hydroxyl radical free radical (OH) are generated in treated water, it is processed by the oxidability of the oxide species
Micro-content organism in water is decomposed into carbon dioxide, organic acid.Implement ultra-violet oxidation processing as described so to treated water
Obtained from processing water be then delivered to the ion interchange unit for being configured at rear class, remove removing carbon dioxide, organic acid.
But in the oxidative decomposition method of the TOC in general ultra-violet oxidation device, ultraviolet radiator is all used, still
It is very expensive for ultraviolet radiator, can also be with the process during use, uitraviolet intensity reduces, thus for example needs 1 year
Carry out 1 time or so replacement.Therefore, in the oxygenolysis processing of the TOC using ultra-violet oxidation device, ultraviolet radiator is more
The inhibition for changing the operating costs such as the reduction of expense and the reduction of energy consumption becomes project.
In order to improve the decomposition efficiency of TOC, such as in patent document 1, as using low pressure UV oxidation unit
The water treatment facilities for removing the TOC in treated water, the prime proposed in low pressure UV oxidation unit are provided with to being located
Manage the water treatment facilities that the dissolved oxygen concentration adjustment process of oxygen is added in water.Low pressure UV oxidation unit is to have used low pressure
The oxidation unit of ultraviolet radiator.In addition, in patent document 2, prime in low pressure UV oxidation unit is proposed to being located
Manage the hydrogen peroxide (H of water addition specified rate2O2) scheme.
However, in recent years, in order to cope with the exhaustion and deterioration of water resource, in the semiconductor factory etc. using a large amount of ultrapure waters
In, also it is expected strongly water-saving.Water-saving in order to realize, it is effectively, in order to mention that recycling, which used primary water and recycle,
The high water rate of recovery, for example, handling the highly concentrated draining of TOC after point of use use, then the skill being recycled
The research of art constantly promotes.This technology is also commonly referred to as drainage sunk well technology, draining recovery processing technology etc..In order to
The highly concentrated draining of TOC is recycled and recycled as the raw water that ultrapure water generates, needs not increase cost of energy simultaneously
And TOC concentration is made to be reduced to the level that will not make the ultrapure water water quality deterioration of end.As to the highly concentrated treated water of TOC into
The technology of row processing, there are add hydrogen peroxide or ozone (O to treated water3) etc. oxidants, pass through ultraviolet light irradiation pair
The technology of TOC progress oxygenolysis.In such a case, it is contemplated that the TOC concentration in treated water is mg/L magnitude, in addition, will
Originally the treated water for containing a large amount of various impurity is carried out as object, therefore for example using the reaction vessel of open system
Ultraviolet light irradiation.Moreover, as ultraviolet source, it is generally ultraviolet using the low pressure UV lamps or high pressure for the wavelength for generating 254nm
Line lamp.
Existing technical literature
Patent document
Patent document 1: Japanese Unexamined Patent Publication 2011-167633 bulletin
Patent document 2: Japanese Unexamined Patent Publication 2011-218248 bulletin
Patent document 3: Japanese Unexamined Patent Publication 5-305297 bulletin
Summary of the invention
Problem to be solved by the invention
In order to decompose the TOC ingredient in removal treated water, the place for being generally irradiated ultraviolet light to aoxidize TOC ingredient
Reason, if but from the viewpoint of the TOC that can be removed in how many treated water, cannot say must be using technology so far
It is optimal.In particular, as shown in patent document 2, in the case where carrying out ultra-violet oxidation processing after being added to hydrogen peroxide,
It is influenced caused by TOC removal rate about the factor other than the additive amount or concentration of hydrogen peroxide, it cannot be said that have been carried out and fill
The research divided.Therefore, when attempting to improve the TOC removal rate in treated water, ultraviolet irradiation amount can excessively be increased, to deposit
Become larger in required amount of power, cost of energy rises, and unit scale also becomes larger such project.
The object of the present invention is to provide one kind, size reduction of an apparatus can be attained, is able to suppress and exists including cost of energy
Interior operating cost, and can be improved the method for treating water and device of the decomposition efficiency of organic matter.
The means used to solve the problem
The present inventors' discovery carries out treated water passing through addition hydrogen peroxide and carry out ultraviolet light irradiation
In organic matter resolution process in the case where, in ultra-violet oxidation treated dissolved oxygen concentration and TOC removal rate, peroxidating
There are correlations between hydrogen additive amount, and have found and can control hydrogen peroxide additive amount in optimal relationship, thus complete
The present invention.That is, method for treating water of the invention is carried out at the water of resolution process to organic matter contained in treated water
Reason method, comprising: hydrogen peroxide adds the stage, adds hydrogen peroxide to treated water；Ultraviolet light illumination stage, to being added with
The treated water of hydrogen oxide irradiates ultraviolet light；And measure the rank of the dissolved oxygen concentration for going out saliva from ultraviolet light illumination stage
Section, in the method for treating water, the peroxidating in the hydrogen peroxide addition stage is controlled according to the dissolved oxygen concentration measured
The additive amount of hydrogen.
Water treatment facilities of the invention is the water process dress that resolution process is carried out to organic matter contained in treated water
It sets, comprising: hydrogen peroxide adding set adds hydrogen peroxide to treated water；Ultraviolet lamp, to being added with
The treated water of hydrogen oxide irradiates ultraviolet light；Dissolved oxygen sensing unit, the dissolution for going out saliva of measurement ultraviolet lamp
Oxygen concentration；And control unit, added according to the dissolved oxygen concentration measured by dissolved oxygen sensing unit to control hydrogen peroxide
The additive amount of hydrogen peroxide in feeder apparatus.
Invention effect
In accordance with the invention it is possible to improve the decomposition efficiency of the organic matter in treated water and realize high TOC removal rate, thus
Size reduction of an apparatus can be attained and the reduction of operating cost.
Detailed description of the invention
Fig. 1 is the figure for indicating the basic structure based on water treatment facilities of the invention.
Fig. 2 is the figure for indicating the other structures example of water treatment facilities.
Fig. 3 is the figure for indicating the other structures example of water treatment facilities.
Fig. 4 is the figure for indicating the other structures example of water treatment facilities.
Fig. 5 is the figure for indicating the other structures example of water treatment facilities.
Fig. 6 is the figure for indicating the other structures example of water treatment facilities.
Fig. 7 is the figure for indicating the other structures example of water treatment facilities.
Fig. 8 is the figure for indicating the application examples based on water treatment facilities of the invention.
Fig. 9 is the figure for indicating the structure of used device in embodiment.
Specific embodiment
Next, being illustrated referring to attached drawing to the preferred embodiment of the present invention.
Fig. 1 shows the figure of the basic structure based on water treatment facilities of the invention.Water treatment facilities tool shown in FIG. 1
Standby: hydrogen peroxide adding set 20 adds hydrogen peroxide (H to treated water2O2)；Ultraviolet lamp 30, with peroxide
The outlet connection for changing hydrogen adding set 20 irradiates ultraviolet light to the treated water for being added to hydrogen peroxide；Dissolved oxygen meter (DO meter)
41, it is the dissolved oxygen sensing unit for measuring the dissolved oxygen concentration for going out saliva of ultraviolet lamp 30；And control device
40, it is that the H to treated water is controlled according to the dissolved oxygen concentration measured by DO meter 412O2Additive amount control unit.
Hydrogen peroxide adding set 20 has storage H2O2Store groove 21 and with store groove 21 outlet connection pulse control type pump
22, the pulse of pump 22 is controlled by carrying out the signal of self-control device 40, and H is mixed into treated water2O2.Control device 40 from
DO meter 41 receives the measurement result of dissolved oxygen, and is based on the measurement result, sends to the pump 22 in hydrogen peroxide adding set 20
The signal that is controlled of pulse, be output to hydrogen peroxide adding set 20.
Shown in embodiment as be described hereinafter, the present inventors' discovery: to being added to H2O2Treated water carry out it is purple
In the case where outside line oxidation processes, the dissolved oxygen concentration in treated water has an impact TOC removal rate；And in ultraviolet light oxygen
Change treated dissolved oxygen concentration and TOC removal rate, H2O2Additive amount between there are correlations.In particular, it is found that adding
Add H2O2But when its additive amount is few, regardless of H2O2Additive amount how, treated that dissolved oxygen concentration is still maintained for ultra-violet oxidation
It is smaller；And increasing H2O2Additive amount when, be more than the feelings of certain value in ultra-violet oxidation treated dissolved oxygen concentration
Under condition, TOC removal rate is not necessarily improved.Therefore, the preferred control hydrogen peroxide adding set 20 of control device 40, so that ultraviolet
The dissolved oxygen concentration in saliva that goes out of beam irradiating apparatus 30 is no more than in the range of such as 0.1mg/L, adds into treated water
H2O2。
As ultraviolet lamp 30, it is preferable to use irradiation comes containing the ultraviolet light that wavelength is 185nm ingredient below
Carry out the ultra-violet oxidation device of ultra-violet oxidation processing.In water treatment facilities shown in Fig. 1, ultraviolet lamp is come from
30 saliva that goes out becomes by the water treatment facilities treatment and supplied to external water.
In addition H2O2In the existing water treatment facilities for carrying out ultraviolet treatment with irradiation, as at ultraviolet light irradiation
The ultraviolet lamp of reason, generally using the bactericidal lamp or high-pressure mercury-vapor lamp for issuing the ultraviolet light that wavelength is 254nm.In addition,
The system recorded in above-mentioned patent document 2 is the system for manufacturing ultrapure water by circulation refinement treatment, wherein using generating
The low pressure UV oxidation unit of ultraviolet light containing the ingredient that wavelength is 185nm, H is added into treated water2O2, carry out purple
Outside line oxidation processes.Wavelength is that the ultraviolet light of 185nm is generally generated by Cooper-Hewitt lamp, Cooper-Hewitt lamp while also generation wavelength
For the ultraviolet light of 254nm.For the ratio by intensity than about 1: 9, wavelength is that the intensity of a side of the ingredient of 254nm is bigger.Wavelength
Although ultraviolet light for 185nm is low-intensity, being capable of direct decomposing organic matter but have the advantages that.On the other hand, wavelength is
The ultraviolet light and H of 254nm2O2It reacts and generates hydroxyl radical free radical (OH), thus decomposing organic matter.Based on water of the invention
It as ultraviolet source, such as the use of generation wavelength is 185nm and wavelength is in ultraviolet lamp used in processing unit
The mercury vapor lamp of both ultraviolet lights of 254nm, but ultraviolet source in addition to this also can be used, such as ultraviolet light LED (luminous two
Pole pipe).
However, in the case where the dissolved oxygen concentration of treated water is high, if it is desired to make going out for ultraviolet lamp 30
Dissolved oxygen concentration in saliva becomes such as 0.1mg/L hereinafter, cannot then add the H of the sufficient quantity needed for organic matter decomposes2O2,
As a result, TOC removal rate will not improve sometimes.At this point, it is preferred that the prime in hydrogen peroxide adding set 20 is arranged for dropping
The device for deoxidizing of the dissolved oxygen concentration of low treated water.Water treatment facilities shown in Fig. 2 is water treatment facilities shown in Fig. 1
In, it uses and is generated containing the ingredient that wavelength is 185nm as the ultraviolet lamp 30 for carrying out ultra-violet oxidation processing
The ultra-violet oxidation device 31 of ultraviolet light, and in the device of the prime of hydrogen oxide adding set 20 setting device for deoxidizing 20.As
Device for deoxidizing 10 the, as long as oxygen (O being dissolved in water can be removed2), then arbitrary device can be used, such as be able to use true
Any one in empty degasser, film degasser and nitrogen degasser.Vacuum degasser, film degasser and nitrogen are de-
Device of air can remove volatile organic matter, carbonic acid etc. in gas phase, reduce these while reducing the dissolved oxygen concentration in water
Water in concentration, in this regard preferably.As other device for deoxidizing, it also can be used and be added to hydrogen (H2) pass through later
Palladium (Pd) catalyst makes oxygen and hydrogen react and form water, thus removes the device of deoxygenation.
It is 7~8mg/L or so when dissolved oxygen concentration in water is saturated under atmospheric pressure.Surpass even dissolved oxygen concentration is low
Pure water, oxygen can also dissolve in immediately when exposed to the atmosphere, so that dissolved oxygen concentration rises.Therefore, under normal circumstances, from various works
Dissolved oxygen concentration in the draining of sequence discharge is more than that 1mg/L becomes the saturation capacity close under atmospheric pressure in most cases
Value.The opinion of inventors according to the present invention, if dissolved oxygen concentration is more than 1mg/L, even if addition H2O2Carry out ultraviolet light
Oxidation processes, the also different raising for surely seeing TOC removal rate.Therefore, in based on water treatment facilities of the invention, it is being arranged
In the case where device for deoxidizing 10, the dissolved oxygen concentration for going out saliva of device for deoxidizing 10 is preferably made to become 1mg/L or less.Due to dissolution
Oxygen absorbs ultraviolet light, therefore in the case where dissolved oxygen concentration height, should be used for the ultraviolet light of the decomposition reaction of organic matter originally
Amount is reduced, to be difficult to that organic matter is promoted to decompose.On the other hand, by removing dissolved oxygen to a certain extent, purple can be reduced
The absorbed influence of outside line.As a result, ultraviolet light efficiently reacts with organic substance, so that TOC removal rate improves.In addition,
Pass through ultraviolet light and H2O2It efficiently reacts, generates hydroxyl radical free radical, so that hydroxyl radical free radical reacts with organic matter,
TOC removal rate improves.Therefore, by making the dissolved oxygen concentration for going out saliva of device for deoxidizing 10 become 1mg/L hereinafter, as base
Standard, by becoming 1/10 of the saturation capacity under atmospheric pressure hereinafter, effect of the invention can be played more significantly.More preferably
For, by device for deoxidizing 10 go out saliva dissolved oxygen concentration be set as 0.5mg/L hereinafter, further preferably, be set as 0.1mg/L with
Under.Although dissolved oxygen can also be reduced to extremely low concentration such as μ g/L, even if highly carrying out deoxidation treatment until μ g/
L magnitude, obtained TOC removal capacity will not generate big difference.In view of the cost as needed for deoxidation treatment and TOC are gone
Except the cost-effectiveness that rate is constituted, the dissolved oxygen concentration for going out saliva of device for deoxidizing 10 is preferably set as 0.05mg/L or more and 1mg/
L or less.
Fig. 3 shows the other structures example based on water treatment facilities of the invention.It is based on water treatment facilities of the invention
The device that the TOC ingredient in treated water removes TOC is decomposed by ultra-violet oxidation processing, but in the processed water
In the highly concentrated situation of TOC, the load of ultra-violet oxidation processing becomes excessive, therefore preferably handles it in progress ultra-violet oxidation
Before, specifically in addition H2O2Before, the TOC of treated water is reduced.At water treatment facilities shown in Fig. 3 water shown in Fig. 2
It manages in device, the prime of device for deoxidizing 10 is provided with reverse osmosis unit 15.Treated water is supplied to reverse osmosis unit first
15, TOC is reduced wherein, is then fed to device for deoxidizing 10.As a result, can subtract for water treatment facilities shown in Fig. 3
The load of the TOC removal of light ultra-violet oxidation device 31.As reverse osmosis unit 15, it is preferable to use multistage is provided with reverse osmosis membrane
Multi-stage treatment units.By using the reverse osmosis membrane of multistage setting, TOC can be further excluded, to reduce ultraviolet light oxygen
Change the load of processing.
As the reverse osmosis membrane for being set to reverse osmosis unit 15, it is preferable to use TOC removal ability is high, such as use seawater
The reverse osmosis membrane of high prevention rate used in desalination etc..Specifically, which is characterized in that the infiltration of every 1MPa effective pressure is logical
Amount is 0.5m3/m2/ d or less.As can be based on reverse osmosis membrane used in water treatment facilities of the invention, such as can enumerate
The film of the SWC series of Hydranautics corporation, the film of the TM800 series of Toray corporation, DOW corporation SW30 system
Film, film of HR-RO series of Li Tian industrial group of column etc..More specifically, it as reverse osmosis membrane, is able to use
SWC5MAX (the 0.32m of Hydranautics corporation3/m2/ d), the SWC6MAX (0.43m of Hydranautics corporation3/
m2/ d), the SW30ULE (0.39m of DOW corporation3/m2/ d), the SW30HRLE (0.25m of DOW corporation3/m2/ d), Toray it is public
Take charge of the TM820V (0.32m of system3/m2/ d), the TM820K (0.20m of Toray corporation3/m2/ d) etc., Li Tian industrial group
HR-RO(0.36m3/m2/ d) etc..Here, the numerical value in bracket is the permeation flux of every 1MPa effective pressure of the reverse osmosis membrane.
In addition, permeation flux amount of seepage is obtained divided by membrane area.So-called " effective pressure " is in JIS K3802:
The slave average operating pressure recorded in 2015 " film terms " subtracts and acts on having for film after permeable pressure head and secondary pressure
The pressure of effect.In addition, average operation pressure be the primary side of film film supply water pressure i.e. operating pressure and condensed water pressure i.e.
The average value of condensed water outlet pressure can be expressed from the next.
Average operating pressure=(operating pressure+condensed water outlet pressure)/2
The permeation flux of every 1MPa effective pressure can according to the information recorded in the catalogue of film manufacturer, such as amount of seepage,
The rate of recovery, NaCl concentration etc. when membrane area, evaluation calculate.In addition, being loaded in one or more pressure vessels multiple identical
Permeation flux film in the case where, can be according to average operating pressure/secondary pressure, raw water quality, the infiltration of pressure vessel
The information such as permeable amount, film quantity, to calculate the permeation flux of loaded film.
It as the film shape of reverse osmosis membrane, is not particularly limited, such as cyclic annular type, flat membranous type, screw type, hollow can be enumerated
Fibrous type etc. can be any one of 4 inch type, 8 inch type, 16 inch type etc. about screw type.
In water treatment facilities shown in Fig. 3, it is provided with reverse osmosis unit 15 in the prime of device for deoxidizing 10, but for dropping
As long as the position of the reverse osmosis unit 15 of the load of low ultraviolet ray oxidation processes in the entrance side of hydrogen peroxide adding set 20,
It then can be any position.Therefore, as shown in figure 4, the position of device for deoxidizing 10 and reverse osmosis unit 15 can also be exchanged, located
Reason water is fed into device for deoxidizing 10 first, and the saliva that goes out of device for deoxidizing 10 is fed into hydrogen peroxide by reverse osmosis unit 15
Adding set 20.In addition, even if setting reverse osmosis unit 15 is also effective in the structure for being not provided with device for deoxidizing 10.Fig. 5
Show following water treatment facilities, it may be assumed that be not provided with device for deoxidizing 10 and connect in the entrance of hydrogen peroxide adding set 20 anti-
Permeability apparatus 15, so that after reducing TOC by reverse osmosis unit 15 to the supply of the water treatment facilities of hydrogen peroxide adding set 20
Treated water.
In the present invention, ion interchange unit, the ion exchange can also be set in the outlet side of ultraviolet lamp
Device is used to remove the decomposition product in ultra-violet oxidation processing or the ionic impurity from treated water.Shown in Fig. 6
In water treatment facilities, relative to water treatment facilities shown in Fig. 3, it is additionally provided with the saliva out for being supplied to ultra-violet oxidation device 31
Ion interchange unit 35.The saliva that goes out from ion interchange unit 35 becomes by the water treatment facilities treatment and supplied to outside
Water.
Although in the processed water also containing the stage before receiving ultra-violet oxidation processing in contained organic matter
Rising is ionic substance, but passes through addition H2O2The ultra-violet oxidation of progress is handled, and generates various organic acids or carbonic acid plasma
Property substance.Ion interchange unit 35 removes these ionic species.Ion interchange unit 35 is for example by being filled with ion exchange resin
Ion exchange tower constitute.In the biggish situation of concentration of the ionic impurity in the saliva out of ultra-violet oxidation device 31,
It is preferable to use regenerative ion interchange units.Since the organic acid of reaction product or carbonic acid that handle as ultra-violet oxidation exist
In water in the form of anion, therefore ion exchange resin used in ion interchange unit 35 is at least anion exchange tree
Rouge.Since organic acid and carbonic acid are weak acid, thus in order to reliably remove them, it is preferable to use strong-base anion-exchange resin
As anion exchange resin.Moreover, by using the hybrid resin conduct of anion exchange resin and cation exchange resin
Ion exchange resin, or use the mixed bed formula ion exchange tower filled with hybrid resin as ion exchange tower, so as to
Obtain the processing water of high-purity.
However, ultra-violet oxidation device 31 goes out excessive H contained in saliva2O2There is a possibility that ion interchange unit
Ion exchange resin oxidative degradation in 35.It is therefore preferable that the prime in ion interchange unit 35 removes H2O2.Water shown in Fig. 7
Processing unit is arranged between ultra-violet oxidation device 31 and ion interchange unit 35 in water treatment facilities shown in Fig. 6
Decompose the H in water2O2Hydrogen peroxide decomposer 37.The saliva that goes out of ultra-violet oxidation device 31 is decomposed by hydrogen peroxide
Device 37 and be removed hydrogen peroxide, be then supplied to ion interchange unit 35.Hydrogen peroxide decomposer 35 is, for example, to fill
The decomposition tower of active charcoal.As can be with low cost effectively decomposing H2O2Substance, it is preferable to use active carbon.Alternatively, in mistake
In hydrogen oxide decomposer 37, also it is able to use palladium (Pd) catalyst and carrys out decomposing H2O2。
More than, various structural examples are illustrated for based on water treatment facilities of the invention, but these water treatment facilities are for example
It can be used for being 0.1mg/L or more, dissolved oxygen concentration to TOC concentration being more than that organic matter in the treated water of 1mg/L divides
Solution processing.According to the present invention, contained from aftermentioned embodiment it will be clear that can be handled with high TOC removal rate with mg/L magnitude
The treated water of TOC.
In the present invention, treated water is for example drained from process.Method for treating water of the invention is drained for recovery process,
It especially recycles the draining being discharged from semiconductor fabrication sequence etc. using the process of ultrapure water and is handled.Through the invention
The processed water of method for treating water may be used as generating the raw water of ultrapure water.Therefore, method for treating water of the invention can be used in
The draining from the process for using ultrapure water is recycled and handled, ultrapure water is generated for cycling and reutilization.
Fig. 8 shows the application examples based on water treatment facilities of the invention.It will be from based on water treatment facilities 81 of the invention
The recycle-water for using the process i.e. ultrapure water of ultrapure water that technique 83 is used to recycle handles it and is generated as treated water
Reduce the recycle-water of organic matter.In ultrapure water using ultrapure water used in technique 83 by being supplied to the ultrapure water of 1 st pure water
Manufacturing device 82 manufactures, but the recycle-water for reducing organic matter from water treatment facilities 81 is mixed with 1 st pure water and is supplied to
Ultrapure Water Purifiers 82.In system shown in Fig. 8, the recycling and reusing of ultrapure water is realized by water treatment facilities 81,
Due to will only be consumed with by ultrapure water using technique 83 and the 1 st pure water of the corresponding amount of irretrievable ultrapure water be supplied to it is super
Water Purifiers 82, therefore can be realized significantly water-saving.
[embodiment]
Next, the experimental result carried out and the present inventors are completed with the present invention is illustrated,
It is next that present invention be described in more detail.
[experimental example 1]
Assemble the device of structure shown in Fig. 7.The device is after carrying out the deoxidation treatment using film degassing to pure water, addition
Isopropanol (CH3CH(OH)CH3；IPA), H is then added2O2, to being added to IPA and H2O2Water carry out ultra-violet oxidation processing.
The water quality of pure water used herein above are as follows: resistivity is 1M Ω cm or more, and TOC is 3 μ g/L hereinafter, dissolved oxygen concentration is
7.8mg/L, H2O2Concentration is 1 μ g/L or less.The device is will to contain IPA as the pure water of organic matter (TOC ingredient) as being located
Water is managed, the device of resolution process is carried out to organic matter contained in the treated water, it may be said that is before addition IPA de- based on film
The deoxidation treatment of gas is the processing of the dissolved oxygen concentration for reducing treated water.In view of will not generally be removed by film degassing
IPA in water, then by device shown in Fig. 9, can obtain with by the treated water containing IPA supply to deoxidation treatment device into
Row deoxidation treatment, adds H later2O2The identical result of the case where carrying out ultra-violet oxidation processing.
In device shown in Fig. 7, pure water is fed into the film degassing component 11 as device for deoxidizing.As film degassing group
Part 11 depressurizes the gas phase side of film degassing component 11 with pump 12 using " Liqui-CellG284 " of Celgard corporation, real
Having applied degassing process makes dissolved oxygen concentration become given concentration.Dissolved oxygen concentration is reduced for by film degassing component 11
Water, via store groove 51 and pump 52 addition specified rates IPA as TOC ingredient.Generating as a result, reduces dissolved oxygen concentration
Treated water.Then, for the treated water, the H2O2 of specified rate is added to via store groove 21 and pump 22.H will be added with2O2
A part of treated water carry out branch, respectively with its dissolved oxygen of dissolved oxygen meter (DO meter) 56 and TOC 57 on-line measurements of meter
Concentration and TOC concentration.As DO meter 56, Sievers public affairs are used as TOC meter 57 using the DO-30A of TOA electronics corporation
The SIEVERS900 type TOC meter of department's system.Dissolved oxygen concentration at DO meter 56 becomes the dissolution of film degassing component 11 gone out in saliva
Oxygen concentration becomes the dissolved oxygen concentration of the inlet of ultra-violet oxidation device 31.TOC meter 57 at TOC measured value TOC0 at
For the TOC concentration of treated water.
H will be added with2O2The water of treated water Zhong Wei branch supply to ultra-violet oxidation device 31.As ultraviolet light oxygen
Makeup sets 31, using the JPW-2 of Japanese PhotoScience corporation, in ultra-violet oxidation device 31, and as ultraviolet radiator,
Configure light that 4 generation wavelengths are 254nm and the low pressure UV lamps (Japan of wavelength is 185nm light both light
The ultraviolet radiator AZ-9000W of the 165W of PhotoScience corporation).With going out for 41 measurement ultra-violet oxidation device 31 of DO meter
The dissolved oxygen concentration of saliva, and by a part of branch for going out saliva of ultra-violet oxidation device 31, to ion interchange unit 35
The TOC concentration of 58 pairs of processing water gone out in the saliva i.e. water treatment facilities from ion interchange unit 35 is counted in water flowing with TOC
TOC1 is measured.As DO meter 41, the DO-30A of TOA electronics corporation has been used, as TOC meter 58, has been used
The SIEVERS900 type TOC of Sievers corporation is counted.
As ion interchange unit 35, mixed bed formula ion interchange unit has been used.Mixed bed formula ion interchange unit has third
The ion of the cylindrical vessel (internal diameter 25mm, height 1000mm) of olefin(e) acid resin, the mixed bed in the container filled with 300mL is handed over
Change resin (EG-5A:Organo corporation).At this point, the height of ion exchange resin layer is about 600mm.
TOC removal rate in the water treatment facilities is defined by following calculating formula:
TOC removal rate (%)=((TOC0-TOC1)/TOC0) × 100
As described above, TOC0 is the TOC concentration of treated water, i.e., by the 57 TOC concentration measured of TOC meter, TOC1 be from from
The TOC concentration of the processing water of sub- switch 35, i.e., the TOC concentration measured by TOC meter 58.
The dissolved oxygen concentration of the entrance of ultra-violet oxidation device 31 is adjusted to 50 μ g/L by film degassing component 11, and is adjusted
The additive amount of whole IPA, so that TOC concentration of the TOC concentration of treated water i.e. in the inlet of ultra-violet oxidation device 31 becomes
500 μ g/L, in this state, by H2O2Additive amount be adjusted to 0mg/L, 2.5mg/L, 5.0mg/L, 10.0mg/L, and for each
The i.e. DO of dissolved oxygen concentration that a situation measures the exit of TOC removal rate and ultra-violet oxidation device 31 respectively is counted to be surveyed at 41
The dissolved oxygen concentration of amount.As a result it is shown in table 1.In addition, for confluent being 800L/ hours to ultra-violet oxidation device 31.
It can be seen from this result that by adding H2O2To TOC removal rate improve, and if liquid to be treated TOC concentration and ultraviolet light oxygen
Disguise set 31 inlet dissolved oxygen concentration be it is certain, then H is being excessively added2O2When, TOC removal rate reduces instead, and purple
The dissolved oxygen concentration in the exit of outside line oxidation unit 31 rises.It follows that going out by measurement ultra-violet oxidation device 31
Dissolved oxygen concentration at mouthful, can be by H2O2Additive amount control be best.
In addition, by making film degassing component 11 that dissolved oxygen concentration are adjusted to 7.8mg/L and bypass, by H2O2Additive amount
It is set as 0mg/L, measures the dissolved oxygen concentration in the exit of TOC removal rate and ultra-violet oxidation device 31.As a result also in table 1
It shows.TOC removal rate in this case is 82%, accordingly it is found that by reducing the dissolved oxygen concentration in treated water, and it is right
It is added to H2O2Treated water irradiate ultraviolet light, thus TOC removal rate improve.
[table 1]
[experimental example 2]
In addition to TOC concentration of the TOC concentration i.e. in the inlet of ultra-violet oxidation device 31 by water is handled is set as 1000 μ g/L, and
And it also adds H2O2Additive amount was set as other than the case where 20.0mg/L, was tested under the same conditions with experimental example 1.
As a result it is shown in table 2.Thus it can also obtain by reducing the dissolved oxygen concentration in treated water and adding H2O2, so that TOC is gone
The result improved except rate.
In addition, by make film deaerate component 11 bypass come be adjusted so that dissolved oxygen concentration adjustment become 7.8mg/L,
By H2O2Additive amount be set as 0mg/L, 2.5mg/L, measure TOC removal rate.These results are also shown in table 2.Film is set to deaerate
Component 11 bypasses, and referring to does not reduce dissolved oxygen concentration and maintain substantially the saturation capacity under atmospheric pressure, however, one will appreciate that like this
In the case that the dissolved oxygen concentration of liquid to be treated is high, even if addition H2O2, ultra-violet oxidation processing in TOC removal rate will not
It improves.
[table 2]
[experimental example 3]
In addition to the dissolved oxygen concentration of the inlet of ultra-violet oxidation device 31 is set as 500 μ g/L, by H2O2Additive amount is set as
Other than 0mg/L, 1.5mg/L, 2.5mg/L, 5.0mg/L, tested under the conditions of same as experimental example 1.It shows the result in
Table 3.
[table 3]
[experimental example 4]
In addition to the dissolved oxygen concentration of the inlet of ultra-violet oxidation device 31 is set as 1000 μ g/L, by H2O2Additive amount is set as
Other than 0mg/L, 1.5mg/L, 2.0mg/L, 2.5mg/L, tested under the conditions of same as experimental example 1.It shows the result in
Table 4.
[table 4]
[experimental example 5]
The dissolved oxygen concentration of the entrance of ultra-violet oxidation device 31 is adjusted to 50 μ g/L by film degassing component 11, adjusts IPA
Additive amount, make treated water TOC concentration (the TOC concentration in the inlet of ultra-violet oxidation device 31) become 100 μ g/L.
In this state, by H2O2Additive amount be adjusted to 0mg/L, 0.2mg/L, 0.4mg/L, and measured respectively for each situation
TOC removal rate.What it is to ultra-violet oxidation device 31 is 2000L/ hours for confluent.In addition, in addition to this, with experimental example 1
It is tested under the conditions of same.As a result it is shown in table 5.
[table 5]
Symbol description
10 device for deoxidizing
15 reverse osmosis units
20 hydrogen peroxide adding sets
30 ultraviolet lamps
31 ultra-violet oxidation devices
40 control devices
41,56 dissolved oxygens (DO) are counted.
Claims (14)
1. a kind of method for treating water is the method for treating water that resolution process is carried out to organic matter contained in treated water,
The method for treating water includes
Hydrogen peroxide adds the stage, and Xiang Suoshu treated water adds hydrogen peroxide；
Ultraviolet light illumination stage irradiates ultraviolet light to the treated water for being added to hydrogen peroxide；And
The stage of the dissolved oxygen concentration that goes out saliva of the measurement from the ultraviolet light illumination stage,
The additive amount of the hydrogen peroxide in the hydrogen peroxide addition stage is controlled according to the dissolved oxygen concentration measured.
2. method for treating water according to claim 1, wherein
Control the additive amount of the hydrogen peroxide so that from the ultraviolet light illumination stage go out saliva dissolved oxygen concentration at
For 0.1mg/L or less.
3. method for treating water according to claim 1 or 2, wherein
In the ultraviolet light illumination stage, irradiation is the ultraviolet light of 185nm ingredient below comprising wavelength.
4. method for treating water according to any one of claim 1 to 3, wherein
The method for treating water also has before the hydrogen peroxide addition stage and reduces the quilt by reverse osmosis treatment
Handle the stage of organic matter contained in water.
5. method for treating water according to claim 4, wherein
The permeation flux of every 1MPa effective pressure of the reverse osmosis membrane used in the reverse osmosis treatment is 0.5m3/m2/ d with
Under.
6. method for treating water according to any one of claims 1 to 5, wherein
The organic carbon concentration of the treated water before carrying out the processing based on the method for treating water be 0.1mg/L with
On, dissolved oxygen concentration is more than 1mg/L.
7. method for treating water described according to claim 1~any one of 6, wherein
The treated water is drained from process.
8. method for treating water according to claim 7, wherein
Process draining is the water being discharged from the process for using ultrapure water, passes through the method for treating water treated water conduct
Raw water for generating the ultrapure water used in the process come using.
9. a kind of water treatment facilities carries out resolution process, the water treatment facilities to organic matter contained in treated water
It includes
Hydrogen peroxide adding set adds hydrogen peroxide to the treated water；
Ultraviolet lamp irradiates ultraviolet light to the treated water for being added to the hydrogen peroxide；
Dissolved oxygen sensing unit measures the dissolved oxygen concentration for going out saliva of the ultraviolet lamp；And
Control unit adds according to the dissolved oxygen concentration measured by the dissolved oxygen sensing unit to control the hydrogen peroxide
The additive amount of hydrogen peroxide in feeder apparatus.
10. water treatment facilities according to claim 9, wherein
Described control unit controls the additive amount of the hydrogen peroxide, so that the saliva out from the ultraviolet lamp
Dissolved oxygen concentration becomes 0.1mg/L or less.
11. water treatment facilities according to claim 9 or 10, wherein
The ultraviolet lamp is ultra-violet oxidation dress of the irradiation comprising the ultraviolet light that wavelength is 185nm ingredient below
It sets.
12. the water treatment facilities according to any one of claim 9 to 11, wherein
The hydrogen peroxide adding set entrance side for reverse osmosis unit, which has reverse osmosis membrane, subtracts
Organic matter contained in few treated water.
13. water treatment facilities according to claim 12, wherein
The permeation flux of every 1MPa effective pressure of the reverse osmosis membrane is 0.5m3/m2/ d or less.
14. the water treatment facilities according to any one of claim 9~13, wherein
Supplying to the organic carbon concentration of the treated water of the water treatment facilities is 0.1mg/L or more, dissolved oxygen concentration
More than 1mg/L.
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| CN111454851A (en) * | 2020-03-20 | 2020-07-28 | 苏州禾优泰源农业科技有限公司 | Aerobic fermentation system for microorganisms |
| CN113779504A (en) * | 2021-09-07 | 2021-12-10 | 天津大学 | Method for calculating optimal adding concentration of oxidant in ultraviolet advanced oxidation process based on primary free radicals |
| WO2023060986A1 (en) * | 2021-10-12 | 2023-04-20 | 江苏中电创新环境科技有限公司 | Removal method for trace of small-molecule organic matter in reclaimed water |
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| JP2022138429A (en) | 2021-03-10 | 2022-09-26 | オルガノ株式会社 | Water treatment method and device |
| JP2022174865A (en) * | 2021-05-12 | 2022-11-25 | オルガノ株式会社 | Pure water production device and pure water production method |
| JP2024042977A (en) * | 2022-09-16 | 2024-03-29 | オルガノ株式会社 | Water treatment system and water treatment method |
| KR102553948B1 (en) | 2023-02-14 | 2023-07-10 | 김기수 | Water treatment apparatus for reduction |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4012321A (en) * | 1975-03-25 | 1977-03-15 | The United States Of America As Represented By The Secretary Of The Navy | Oxidation of refractory organics in aqueous waste streams by hydrogen peroxide and ultraviolet light |
| CA1138529A (en) * | 1978-11-24 | 1982-12-28 | Patrick E. Fowles | Method and apparatus for measuring hydrogen peroxide concentration in a solution |
| JPH10277572A (en) * | 1997-04-03 | 1998-10-20 | Japan Organo Co Ltd | Removal of organic matter in water |
| TW446687B (en) * | 1996-02-20 | 2001-07-21 | Nomura Micro Science Kk | Method and apparatus for producing ultra pure water |
| JP2003236566A (en) * | 2002-02-19 | 2003-08-26 | Toshiba Corp | Apparatus for controlling residual hydrogen peroxide concentration |
| CN101423310A (en) * | 2008-11-14 | 2009-05-06 | 钱志刚 | Circulative reuse treatment method of electric ultrapure water |
| CN101983175A (en) * | 2008-03-31 | 2011-03-02 | 栗田工业株式会社 | Method for producing pure water and pure water production system |
| JP2012061443A (en) * | 2010-09-17 | 2012-03-29 | Japan Organo Co Ltd | Apparatus of manufacturing pure water or ultrapure water, and method of manufacturing the same |
| CN105461128A (en) * | 2015-12-18 | 2016-04-06 | 碳氢技术工程管理（武汉）有限公司 | Device and method for treating high COD (Chemical Oxygen Demand) sewage in combined way |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05305297A (en) * | 1992-04-30 | 1993-11-19 | Kurita Water Ind Ltd | Apparatus for treating acid drainage containing organic material |
| US6372699B1 (en) * | 1997-12-22 | 2002-04-16 | Kurita Water Industries Ltd. | Cleaning solution for electronic materials and method for using same |
| JP5280038B2 (en) * | 2007-11-06 | 2013-09-04 | 野村マイクロ・サイエンス株式会社 | Ultrapure water production equipment |
| JP5430983B2 (en) * | 2009-03-18 | 2014-03-05 | オルガノ株式会社 | Platinum group metal supported catalyst, method for producing hydrogen peroxide decomposition treatment water, method for producing dissolved oxygen removal treatment water, and method for cleaning electronic components |
| JP5499753B2 (en) | 2010-02-18 | 2014-05-21 | 栗田工業株式会社 | Water treatment method and apparatus |
| JP5512357B2 (en) | 2010-04-05 | 2014-06-04 | オルガノ株式会社 | Pure water production method and apparatus |
| JP2014168743A (en) * | 2013-03-04 | 2014-09-18 | Nomura Micro Sci Co Ltd | Pure water manufacturing method |
| JP6228531B2 (en) * | 2014-12-19 | 2017-11-08 | 栗田工業株式会社 | Ultrapure water production apparatus and ultrapure water production method |
-
2016
- 2016-11-18 JP JP2016224969A patent/JP6752693B2/en active Active
-
2017
- 2017-11-14 TW TW106139248A patent/TWI732970B/en active
- 2017-11-16 CN CN201780067211.9A patent/CN109906206B/en active Active
- 2017-11-16 WO PCT/JP2017/041215 patent/WO2018092832A1/en active Application Filing
- 2017-11-16 KR KR1020197014291A patent/KR102233505B1/en active IP Right Grant
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4012321A (en) * | 1975-03-25 | 1977-03-15 | The United States Of America As Represented By The Secretary Of The Navy | Oxidation of refractory organics in aqueous waste streams by hydrogen peroxide and ultraviolet light |
| CA1138529A (en) * | 1978-11-24 | 1982-12-28 | Patrick E. Fowles | Method and apparatus for measuring hydrogen peroxide concentration in a solution |
| TW446687B (en) * | 1996-02-20 | 2001-07-21 | Nomura Micro Science Kk | Method and apparatus for producing ultra pure water |
| JPH10277572A (en) * | 1997-04-03 | 1998-10-20 | Japan Organo Co Ltd | Removal of organic matter in water |
| JP2003236566A (en) * | 2002-02-19 | 2003-08-26 | Toshiba Corp | Apparatus for controlling residual hydrogen peroxide concentration |
| CN101983175A (en) * | 2008-03-31 | 2011-03-02 | 栗田工业株式会社 | Method for producing pure water and pure water production system |
| CN105217853A (en) * | 2008-03-31 | 2016-01-06 | 栗田工业株式会社 | Pure water production method and Water Purifiers |
| CN101423310A (en) * | 2008-11-14 | 2009-05-06 | 钱志刚 | Circulative reuse treatment method of electric ultrapure water |
| JP2012061443A (en) * | 2010-09-17 | 2012-03-29 | Japan Organo Co Ltd | Apparatus of manufacturing pure water or ultrapure water, and method of manufacturing the same |
| CN105461128A (en) * | 2015-12-18 | 2016-04-06 | 碳氢技术工程管理（武汉）有限公司 | Device and method for treating high COD (Chemical Oxygen Demand) sewage in combined way |
Non-Patent Citations (1)
| Title |
|---|
| YANGXIAN LIU ET AL: "study on absorption of elemental mercury from flue gas by UV/h2o2:Process parameters and reaction mechanism", 《CHEMICAL ENGINEERING JOURNAL》 * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111454851A (en) * | 2020-03-20 | 2020-07-28 | 苏州禾优泰源农业科技有限公司 | Aerobic fermentation system for microorganisms |
| CN113779504A (en) * | 2021-09-07 | 2021-12-10 | 天津大学 | Method for calculating optimal adding concentration of oxidant in ultraviolet advanced oxidation process based on primary free radicals |
| WO2023060986A1 (en) * | 2021-10-12 | 2023-04-20 | 江苏中电创新环境科技有限公司 | Removal method for trace of small-molecule organic matter in reclaimed water |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2018092832A1 (en) | 2018-05-24 |
| CN109906206B (en) | 2022-03-04 |
| TWI732970B (en) | 2021-07-11 |
| KR20190066059A (en) | 2019-06-12 |
| JP2018079448A (en) | 2018-05-24 |
| JP6752693B2 (en) | 2020-09-09 |
| TW201821371A (en) | 2018-06-16 |
| KR102233505B1 (en) | 2021-03-29 |
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