CN109852931A - The film plating process of vacuum coating equipment and composite coating - Google Patents
The film plating process of vacuum coating equipment and composite coating Download PDFInfo
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- CN109852931A CN109852931A CN201910012476.XA CN201910012476A CN109852931A CN 109852931 A CN109852931 A CN 109852931A CN 201910012476 A CN201910012476 A CN 201910012476A CN 109852931 A CN109852931 A CN 109852931A
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- 239000011248 coating agent Substances 0.000 title claims abstract description 25
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- 239000007789 gas Substances 0.000 claims description 47
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 41
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 34
- 229910052757 nitrogen Inorganic materials 0.000 claims description 21
- 239000000463 material Substances 0.000 claims description 20
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- 239000000919 ceramic Substances 0.000 claims description 16
- 238000004080 punching Methods 0.000 claims description 16
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- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 10
- 238000004062 sedimentation Methods 0.000 claims description 10
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Abstract
This exposure is related to the film plating process of a kind of vacuum coating equipment and composite coating.A kind of vacuum coating equipment, comprising: cavity；Vacuum suction device forms vacuum environment for making in cavity；Work rest is set in cavity for carrying mold to be processed；Driving device is for driving work rest to rotate；Heater is set in cavity and insulate with cavity and heat to mold to be processed；One or more rectangle multi sphere cathode ion sources are set in cavity, and rectangle multi sphere cathode ion source includes cathode pedestal and target, and cathode pedestal and cavity insulate, and target is set to surface in cathode block body；Anode disc portion is set in cavity and insulate with cavity；Hollow cathode ion source is corresponding with anode disc and part is set in cavity；Hollow cathode power supply, wherein anode disc is electrically connected with the anode of hollow cathode power supply, and hollow cathode ion source is electrically connected with the cathode of hollow cathode power supply；Hollow cathode power supply makes to generate electronics and electric field between anode disc and hollow cathode ion source.
Description
Technical field
This application involves coating technique field, in particular to the film plating process of a kind of vacuum coating equipment and composite coating.
Background technique
Be directed to machining in cold punching die and hot pressing casting mould, in order to improve the service life of mold, need into
The row techniques such as plasma nitrided or gas nitriding and physical vapor deposition (PVD).
Summary of the invention
One of embodiment of this exposure is the provision of a kind of vacuum coating equipment, comprising: cavity；Vacuum suction device,
For making to form vacuum environment in the cavity；Work rest is set in the cavity for carrying mold to be processed；Driving
Device is used to that the work rest to be driven to rotate；Heater is set in the cavity and insulate with the cavity, described to add
Hot device is used to heat mold to be processed；One or more rectangle multi sphere cathode ion sources, are set in the cavity, the square
Shape multi sphere cathode ion source includes cathode pedestal and target, wherein the cathode block body and the cavity insulate, the target is set
It is placed in surface in the cathode block body；Anode disc, part are set in cavity, and are insulated with the cavity；Hollow cathode from
Component, it is corresponding with the anode disc, and part is set in the cavity；Hollow cathode power supply, wherein the anode disc
It is electrically connected with the anode of the hollow cathode power supply, the cathode of the hollow cathode ion source and the hollow cathode power supply is electrically connected
It connects；Wherein, the hollow cathode power supply is for being configured so as to generate between the anode disc and the hollow cathode ion source
Electronics and electric field.
In the embodiment of this exposure, the rectangle multi sphere cathode ion source further includes the gas in target material surface installation
Pipe, the tracheae are connected by interface with external gas mixing box, and the gas mixing box is for being passed through the mixed gas.
In the embodiment of this exposure, wherein the gas mixing box is at least connected to nitrogen cylinder, argon bottle and hydrogen cylinder, with
It is imported in the cavity in the mixed gas that will have nitrogen, argon gas and hydrogen by tracheae and interface；And it described connects
Mouth is for carrying out vacuum sealing by sealing ring and the cavity.
In the embodiment of this exposure, vacuum coating equipment further comprises temperature control device, and the temperature control device is for measuring
And show the intracorporal temperature of the chamber；Wherein the temperature control device includes temperature thermocouple, and the temperature thermocouple is set to institute
It states in cavity.
In the embodiment of this exposure, the driving device includes: servo motor, shaft coupling and magnetic fluid transmission shaft,
Described in servo motor magnetic fluid transmission shaft rotation, the magnetic fluid transmission shaft and the work driven by the shaft coupling
Part frame is connected and fixed, and the magnetic fluid transmission shaft is insulated by magnetic fluid and the cavity, and the magnetic fluid is also used to the magnetic
The sealing of Fluid-transmission axis under vacuum conditions；And wherein, the vacuum coating equipment further includes grid bias power supply, the bias plasma
The cathode in source passes through connection driving device transmission shaft and connects work rest, and the anode connection cavity of the grid bias power supply is described inclined
Electric field is formed between the cathode and an anode of voltage source.
In the embodiment of this exposure, vacuum coating equipment further comprises: chilled water unit, wherein the cooling water dress
It sets for cooling down the cavity.
The embodiment of this exposure additionally provides a kind of film plating process of composite coating, real using the vacuum coating equipment
Existing, the film plating process is the following steps are included: make to form vacuum environment in cavity；To positioned at the intracorporal mold to be processed of the chamber
It is nitrogenized；The die surface to be processed after nitridation deposits the first metal layer；Is deposited on the first metal layer
Two metal-ceramic nano structural film layers.
In the embodiment of this exposure, wherein the pressure in the vacuum environment is 1x10-2Pa-10-3Pa。
In the embodiment of this exposure, wherein before the step of being nitrogenized to the mold to be processed, further includes: when
When the intracorporal temperature of chamber is 450 DEG C -550 DEG C, the intracorporal temperature of the chamber is made by temperature control device auto controlled heater
It is maintained at set temperature.
In the embodiment of this exposure, before the step of being nitrogenized to the mold to be processed, further includes: will mix
Gas imports the cavity, and adjusting the intracorporal pressure of the chamber is 1Pa-6Pa.
In the embodiment of this exposure, the mixed gas includes argon gas, nitrogen and hydrogen.
In the embodiment of this exposure, after adjusting the step of intracorporal pressure of chamber is 1Pa-6Pa, further includes:
Grid bias power supply is opened, the voltage of the grid bias power supply is adjusted to 100V-300V；And open hollow cathode power supply and will be described
The output electric current of hollow cathode power supply is set as 60A-200A, and imports argon gas 20-100SCCM；Wherein, to positioned at the cavity
The time that interior mold to be processed is nitrogenized is 1h-3h.
In the embodiment of this exposure, after to the step of intracorporal mold to be processed of the chamber nitrogenizes is located at,
And before the step of die surface to be processed deposition the first metal layer after nitridation, further includes: close hollow cathode
The voltage of grid bias power supply is adjusted to 30V-200V by power supply.
In the embodiment of this exposure, the step of die surface to be processed deposition the first metal layer after nitridation, is wrapped
It includes: opening the rectangle multi sphere cathode ion source of the first quantity, setting electric current 150A, sedimentation time 5min-30min.
In the embodiment of this exposure, the second metal-ceramic nano structural film layer is deposited on the first metal layer
Step includes: that nitrogen is imported the cavity, and the pressure for adjusting the cavity is 1Pa-5Pa, and the rectangle for opening the second quantity is more
Arc cathode ion source, setting electric current 150A-200A, sedimentation time 60min-150min.
In the embodiment of this exposure, when the mold to be processed is cold punching die, to the mold to be processed
Before the step of being nitrogenized, when the intracorporal temperature of chamber is 450 DEG C -500 DEG C, pass through temperature control device auto controlled heater
So that the intracorporal temperature of the chamber is maintained at set temperature, wherein the material of the cold punching die be Cr12MoV, Cr12WoV,
Cr12Mo1V1 or Cr8MoV；Alternatively, being carried out when the mold to be processed is hot pressing casting mould to the mold to be processed
Before the step of nitridation, when the intracorporal temperature of chamber is 500 DEG C -550 DEG C, institute is made by temperature control device auto controlled heater
It states the intracorporal temperature of chamber and is maintained at set temperature, wherein the material of the injection moulding mold is 4Cr5MoSiV1,0.4C-
5.5Cr-Mo-V, 0.38C-5.3Cr-1.3M0-0.9V, 4Cr5Mo2V, 3Cr2W8V or 4Cr5MoSiV.
In the embodiment of this exposure, need before the cold punching die is put into the cavity to the cold stamping
Mold carries out 520 DEG C or more high-temperature heat treatment tempering；And it is needed pair when the hot pressing casting mould to be put into before the cavity
The hot pressing casting mould carries out 530 DEG C or more high-temperature heat treatment tempering.
In the embodiment of this exposure, when depositing the first metallic layer, the rectangle multi sphere cathode ion of first quantity
The material of the target in source is Ti or Cr；When depositing the second metal-ceramic nano structural film layer, the rectangle of second quantity
The material of the target in multi sphere cathode ion source is TiAl7030, TiAl50, Cr, Ti, TiSi8020 or CrAl7030；And it is described
The material of second metal-ceramic nano structural film layer is TiAlN, TiAlCrN, CrN, AlCrN or TiAlSiN.
Detailed description of the invention
Fig. 1 is the partial structure diagram of the vacuum coating equipment of the embodiment of this exposure.
Fig. 2 is the partial structure diagram of the vacuum coating equipment of the embodiment of this exposure.
Fig. 3 is the flow chart of the film plating process of the composite coating of the embodiment of this exposure.
Fig. 4 is the flow chart of the film plating process of the composite coating of the embodiment of this exposure.
Fig. 5 is the flow chart of the film plating process of the composite coating of the embodiment of this exposure.
Specific embodiment
For the cold punching die and hot pressing casting mould in machining, in order to improve the service life of mold, at present will
Plasma nitrided or gas nitriding and PVD coating process step are carried out using independent two furnace bodies, i.e., by nitrogen in the first furnace body
Mold to be processed after change is re-fed into progress PVD coating process in the second furnace body.However, using independent two furnace bodies into
When row plated film, in nitridation stage, 700V or so is applied between the intracorporal anode of the first furnace and cathode using pulse dc power
Voltage nitrogenizes air pressure in 20Pa-200Pa, is acted on by glow discharge, nitrogen cation flies to mold under electric field action, with iron
Mould inside is gradually penetrated into after ions binding.Electric arc is easily caused in above-mentioned nitridation process, mold of burning.Hollow yin simultaneously
Polar effect is obvious, and the hollow and aperture having in mold causes mold to be tempered under aura superposition, leads to die hardness
It reduces, the mold after nitridation is easy to produce nitride layer, white layer, leads to subsequent when the second furnace completes PVD coating process, binding force change
Difference.
The film plating process of vacuum coating equipment and composite coating that the embodiment of this exposure provides can effectively solve the above problems.
Spirit in order to better understand the present invention makees further it below in conjunction with part preferred embodiment of the invention
Explanation.
Fig. 1 and 2 show the partial structure diagram of the vacuum coating equipment of the embodiment of this exposure.Vacuum coating equipment 1 wraps
Include cavity 10, vacuum suction device 11, work rest 12, driving device 13, heater 14, rectangle multi sphere cathode ion source 15, sun
Pole disk 16, hollow cathode ion source 17 and hollow cathode power supply (not shown).Wherein hollow cathode ion source 17 uses HCD
(Hollow Cathode Discharge, hollow cathode discharge method) technology is realized.
In the embodiment of this exposure, vacuum suction device 11 forms vacuum environment for making in cavity 10.Work rest 12
It is set in cavity 10 for carrying mold to be processed.Driving device 13 is for driving work rest 12 to rotate.Heater 14 is set
It is placed in cavity 10 and insulate with cavity 10, and for being heated to mold to be processed.Rectangle multi sphere cathode ion source 15 is set to
In cavity 10 comprising cathode pedestal and target (not shown), wherein cathode pedestal and cavity 10 insulate, target setting
In surface in cathode block body.16 part of anode disc is set in cavity 10, and is insulated with cavity 10.Hollow cathode ion source 17 with
Anode disc 16 is corresponding, and part is set in cavity 10.Anode disc 16 is electrically connected with the anode of hollow cathode power supply, hollow yin
Pole ion source 17 is electrically connected with the cathode of hollow cathode power supply.Wherein, hollow cathode power supply is for being configured so that anode disc 16
Electronics and electric field are generated between hollow cathode ion source 17 so that electronics under electric field action with the mixing that imports in cavity 10
Gas, which collides, generates avalanche effect, so that realization carries out nitridation in a cavity 10 of vacuum coating equipment 1 and PVD is compound
Coating process, can effectively shorten the production time, reduce cost, and can effectively solve electric arc, hollow yin in nitridation process
Polar effect and nitride layer, white layer problem.
In the embodiment of this exposure, cavity 10 and work rest 12 are formed by stainless steel material welding processing.Cathode pedestal
External direct current power supply or direct current pulse power source, power cathode connect rectangle multi sphere cathode ion source 15, positive pole connection cavity
10.Rectangle multi sphere cathode ion source 15 further includes the tracheae in target material surface installation, which is stainless steel tube tracheae, the tracheae
It is connected to by interface with external gas mixing box, gas mixing box is for being passed through mixed gas.Gas mixing box at least with nitrogen cylinder, argon bottle, hydrogen
Gas cylinder connection, with for that will have the mixed gas of nitrogen, argon gas and hydrogen to import in cavity 10 by tracheae and interface, this is connect
Mouth carries out vacuum sealing by sealing ring and cavity 10.Gas mixing box can also be with nitrogen cylinder, argon bottle, hydrogen cylinder and other gas cylinders
Four gas cylinder connections, and gas mass flow meter is additionally provided between gas mixing box and four gas cylinders.
In the embodiment of this exposure, vacuum coating equipment 1 further includes temperature control device, is used to measure and show in cavity 10
Temperature, which includes temperature thermocouple 181, which is set in cavity 10.
In the embodiment of this exposure, driving device 13 includes servo motor, shaft coupling and magnetic fluid rotation axis, servo electricity
Machine drives magnetic fluid transmission shaft to rotate as driver, servo motor by shaft coupling, magnetic fluid transmission shaft and the fixed company of work rest
It connects, to drive work rest rotation by transmission shaft, mold to be processed is made to carry out uniform coated.Wherein, magnetic fluid transmission is taken out
It is insulated by magnetic fluid and cavity 10, magnetic fluid is also used to the sealing of magnetic fluid transmission shaft under vacuum conditions.Wherein, Vacuum Deposition
Film machine further includes grid bias power supply, and grid bias power supply is used to power to driving device, and the cathode of grid bias power supply passes through connection driving device
Transmission shaft simultaneously connects work rest, and the anode connection cavity 10 of grid bias power supply forms electric field between the cathode and anode of grid bias power supply.
In the embodiment of this exposure, vacuum coating equipment 1 further includes chilled water unit 19, and chilled water unit 19 includes cooling
Sink and cooling water tank.Cooling water tank is that cooling trough conveys cooling water and exports the cooling water after heat absorption, cooling trough
It is welded in 10 outer surface of cavity, in favor of the fast cooling in cavity 10, improves production efficiency.Ion source is provided in cavity 10
Interface, reaction gas access interface, vacuum meter access interface, heater access interface, driving device interface, vacuum suction device
Access interface and temperature control device access interface etc..
In the embodiment of this exposure, vacuum-pumping system 11 includes vacuum pump group, by mechanical pump, lobe pump, molecular pump
It is formed by connecting by stainless steel pipeline, and is connect by connector with cavity 10.
In the embodiment of this exposure, vacuum coating equipment 1 further includes electric control cabinet 18, for controlling vacuum coating equipment
1 other electrical installation stable operations, and the DC power supply in rectangle multi sphere cathode ion source and grid bias power supply are placed in institute
It states in electric control cabinet 18.
In the embodiment of this exposure, hollow cathode ion source 17 is by hollow cathode effect, in the nozzle of cavity 10
A large amount of thermoelectron is generated, forms electric field between hollow cathode ion source 17 and anode disc, electronics faces south from HCD ion source 17
With the intracorporal gas of chamber in 16 motion process of pole disk, if nitrogen or argon gas collide, nitrogen or argon gas carry out ionization, are decomposed into
Nitrogen cation and electronics, argon cation and electronics, electronics occur sharp impacts with gas under electric field action and avalanche effect occur,
Generate a large amount of nitrogen cations.
Fig. 3 show the film plating process of the composite coating of this exposure embodiment.The film plating process of the composite coating is using upper
State embodiment vacuum coating equipment realize, film plating process the following steps are included:
Step 200 makes to form vacuum environment in cavity.Wherein, the pressure in vacuum environment is 1x10-2Pa-10-3Pa。
Step 201 nitrogenizes mold to be processed within the cavity.
Wherein, heater is controlled when the intracorporal temperature of the chamber is 450 DEG C -550 DEG C by temperature control device automatically
Heater processed makes the intracorporal temperature of the chamber be maintained at set temperature.Then, mixed gas, that is, argon gas, nitrogen and hydrogen are imported
In cavity, and adjusting the intracorporal pressure of chamber is 1Pa-6Pa.Grid bias power supply is opened, the voltage of grid bias power supply is adjusted to 100V-
300V.Hollow cathode power supply is opened, and the output electric current of the hollow cathode power supply is set as 60A-200A, and import argon gas
20-100SCCM (i.e. standard milliliters/minute).Wherein, to the time nitrogenized positioned at the intracorporal mold to be processed of the chamber
For 1h-3h.
Step 202, the die surface to be processed after nitridation deposit the first metal layer.
Wherein, hollow cathode power supply is closed, reaction gas valve is closed, the voltage for adjusting grid bias power supply is 30V-200V.
Then, the rectangle multi sphere cathode ion source of the first quantity, setting electric current 150A, sedimentation time 5min-30min are opened.
Step 203 deposits the second metal-ceramic nano structural film layer on the first metal layer.
Wherein, reaction gas valve is opened, nitrogen is imported into cavity, the pressure for adjusting cavity is 1Pa-5Pa, opens second
The rectangle arc cathode ion source of quantity, setting electric current 150A-200A, sedimentation time 60min-150min.
Then, the DC power supply or direct current pulse power source in rectangle multi sphere cathode ion source are closed, reaction gas valve is closed,
Grid bias power supply is closed, heater is closed, allows natural cooling in cavity.
In this exposure embodiment, the first quantity can be 1, and the second quantity can be 3, rectangle multi sphere cathode ion source
First quantity and the second quantity can be selected according to the actual situation, be not especially limited here.In addition, the second gold medal of deposition
The material for belonging to ceramic nanostructured films layer can be TiAlN, TiAlCrN, CrN, AlCrN or TiAlSiN.
By using cathodic multi arc ion plating depositing process, increased by hollow cathode ion source or electron beam ion source device
Nitrogen ionization level；It is nitrogenized using low pressure, nitridation pressure is 1Pa-6Pa, reduces or prevent the generation of nitride layer, white layer in tissue；Plasma
Nitridation is completed with PVD composite coating " same to furnace ", is reduced nitration case surface contamination, is increased the combination of nitration case and PVD coating
Power improves production efficiency, reduces the energy and manpower expense.
It is illustrated in figure 4 the film plating process of the composite coating of the embodiment of this exposure.The film plating process of the composite coating is adopted
Realized with the vacuum coating equipment of above-described embodiment, film plating process the following steps are included:
Cold punching die is put into work rest by step 300, and makes to form vacuum environment in cavity, and vacuum environment pressure is
1x10-2Pa-10-3Pa。
Wherein, it needs to carry out 520 DEG C to the cold punching die before the cold punching die is put into the cavity
The above high-temperature heat treatment tempering, wherein the material of the cold punching die or model SKD11 (Japan and TaiWan, China steel board
Number, corresponding China's trade mark is Cr12MoV), Cr12WoV, D2 (U.S.'s type of steels, corresponding chemical formula is Cr12Mo1V1) or
DC53 (Japanese trade mark mould steel is the improvement to SKD11 steel, and corresponding chemical formula is Cr8MoV).
Step 301, heater, when temperature control device measurement temperature is at 450 DEG C -500 DEG C, auto controlled heater makes
The intracorporal temperature of chamber is maintained at set temperature.
Mixed gas is imported the cavity by step 302, and adjusting the intracorporal pressure of the chamber is 1Pa-6Pa.
Step 303 opens grid bias power supply, is 100V-300V by the voltage of grid bias power supply.
Step 304 opens hollow cathode power supply and the output electric current of the hollow cathode power supply is set as 60A-200A,
And import argon gas 20-100SCCM.
Step 305 is 1h-3h to the time that the intracorporal cold punching die of the chamber is nitrogenized is located at.
Step 306 closes hollow cathode power supply, and the voltage of grid bias power supply is adjusted to 30V-200V.
Step 307 opens 1 rectangle multi sphere cathode ion source, setting electric current 150A, sedimentation time 5min-
30min deposits the first metal layer on cold punching die surface.Wherein, when depositing the first metallic layer, the rectangle multi sphere cathode from
The material of the target of component is Ti or Cr.It's not limited to that for the quantity in rectangle multi sphere cathode ion source.
Nitrogen is imported the cavity by step 308, and the pressure for adjusting the cavity is 1Pa-5Pa, opens other 3 squares
Shape multi sphere cathode ion source, setting electric current 150A, sedimentation time 60min-150min, the deposition the on cold punching die surface
Two metal-ceramic nano structural film layers.Wherein, when depositing the second metal-ceramic nano structural film layer, 3 rectangle multi spheres
The material of the target in cathode ion source is TiAl7030, TiAl50, Cr, Ti, TiSi8020 or CrAl7030.Meanwhile described
The material of two metal-ceramic nano structural film layers is TiAlN, TiAlCrN, CrN, AlCrN or TiAlSiN.Rectangle multi sphere cathode
It's not limited to that for the quantity of ion source.
Then, the DC power supply or direct current pulse power source in rectangle multi sphere cathode ion source are closed, reaction gas valve is closed,
Grid bias power supply is closed, heater is closed, allows natural cooling in cavity.
It is illustrated in figure 5 the film plating process of the composite coating of the embodiment of this exposure.The film plating process of the composite coating is adopted
Realized with the vacuum coating equipment of above-described embodiment, film plating process the following steps are included:
Hot pressing casting mould is put into work rest by step 400, and makes to form vacuum environment in cavity, and vacuum environment pressure is
1x10-2Pa-10-3Pa。
Wherein, it needs to carry out 530 DEG C to the hot pressing casting mould before the hot pressing casting mould is put into the cavity
The tempering of above high-temperature heat treatment, (Japanese type of steels chemical formula is wherein the material of the injection moulding mold or model SKD61
4Cr5MoSiV1), DAC (Japanese Datong District's trade mark, SKD61 steel improve money, chemical formula 4Cr5MoSiV1), DH-31 (Japanese Datong District's board
Number, chemical formula 0.4C-5.5Cr-Mo-V), 8407 (the German trade mark, chemical formula 0.38C-5.3Cr-1.3M0-0.9V), 8418
(Sweden's trade mark, chemical formula 4Cr5Mo2V), H13 (the Chinese trade mark, chemical formula 4Cr5MoSiV1), 3Cr2W8V, 4Cr5MoSiV,
1.2344 (the German trade mark, chemical formula 4Cr5MoSiV1) or W302 (the Austrian trade mark, chemical formula 4Cr5MoSiV1).
Step 401, heater, when temperature control device measurement temperature is at 500 DEG C -550 DEG C, auto controlled heater makes
The intracorporal temperature of chamber is maintained at set temperature.
Mixed gas is imported the cavity by step 402, and adjusting the intracorporal pressure of the chamber is 1Pa-6Pa.
Step 403 opens grid bias power supply, is 100V-300V by the voltage of grid bias power supply.
Step 404 opens hollow cathode power supply and the output electric current of the hollow cathode power supply is set as 60A-200A,
And import argon gas 20-100SCCM.
Step 405 is 1h-3h to the time that the intracorporal hot pressing casting mould of the chamber is nitrogenized is located at.
Step 406 closes hollow cathode power supply, and the voltage of grid bias power supply is adjusted to 30V-200V.
Step 407 opens 1 rectangle multi sphere cathode ion source, setting electric current 150A, sedimentation time 5min-
30min deposits the first metal layer in injection moulding die surface.Wherein, when depositing the first metallic layer, the rectangle multi sphere cathode from
The material of the target of component is Ti or Cr.It's not limited to that for the quantity in rectangle multi sphere cathode ion source.
Nitrogen is imported the cavity by step 408, and the pressure for adjusting the cavity is 1Pa-5Pa, opens other 3 squares
Shape multi sphere cathode ion source, setting electric current 150A-200A, sedimentation time 60min-150min, in injection moulding die surface
Deposit the second metal-ceramic nano structural film layer.Wherein, when depositing the second metal-ceramic nano structural film layer, 3 squares
The material of the target in shape multi sphere cathode ion source is TiAl7030, TiAl50, Cr, Ti, TiSi8020 or CrAl7030.Meanwhile
The material of the second metal-ceramic nano structural film layer is TiAlN, TiAlCrN, CrN, AlCrN or TiAlSiN.Rectangle is more
It's not limited to that for the quantity in arc cathode ion source.
Then, the DC power supply or direct current pulse power source in rectangle multi sphere cathode ion source are closed, reaction gas valve is closed,
Grid bias power supply is closed, heater is closed, allows natural cooling in cavity.
The composite coating that the film plating process of the composite coating of Fig. 4 and embodiment shown in fig. 5 for this exposure is formed with
Common two groups of coating performances comparison, as shown in table 1:
Table 1
The film plating process of the composite coating of this exposure, by using cathodic multi arc ion plating depositing process, by hollow cathode from
Component or electron beam ion source device increase nitrogen ionization level；Nitrogenized using low pressure, nitridation pressure be 1Pa-6Pa, reduce or
Prevent the generation of nitride layer, white layer in tissue；It is plasma nitrided to be completed with PVD composite coating " same to furnace ", nitration case surface contamination is reduced,
The binding force for increasing nitration case Yu PVD coating, improves production efficiency, reduces the energy and manpower expense.
The technology contents and technical characterstic of this exposure have revealed that as above, however those skilled in the art still may base
In this exposure teaching and announcement and make various replacements and modification without departing substantially from this exposure spirit.Therefore, the protection model of this exposure
The revealed content of embodiment should be not limited to by enclosing, and should include various replacements and modification without departing substantially from this exposure, and be this patent
Application claims are covered.
Claims (18)
1. a kind of vacuum coating equipment, comprising:
Cavity；
Vacuum suction device is used to make to form vacuum environment in the cavity；
Work rest is set in the cavity for carrying mold to be processed；
Driving device is used to that the work rest to be driven to rotate；
Heater is set in the cavity and insulate with the cavity, and the heater is used to heat mold to be processed；
One or more rectangle multi sphere cathode ion sources, are set in the cavity, and the rectangle multi sphere cathode ion source includes
Cathode pedestal and target, wherein the cathode block body and the cavity insulate, the target is set to table in the cathode block body
Face；
Anode disc, part are set in the cavity, and are insulated with the cavity；
Hollow cathode ion source, it is corresponding with the anode disc, and part is set in the cavity；
Hollow cathode power supply, wherein the anode disc is electrically connected with the anode of the hollow cathode power supply, the hollow cathode from
Component is electrically connected with the cathode of the hollow cathode power supply；
Wherein, the hollow cathode power supply makes to generate electronics and electric field between the anode disc and the hollow cathode ion source.
2. vacuum coating equipment as described in claim 1, the rectangle multi sphere cathode ion source further includes in the target material surface
The tracheae of installation, the tracheae are connected by interface with external gas mixing box, and the gas mixing box is for being passed through mixed gas.
3. vacuum coating equipment as claimed in claim 2, the gas mixing box is at least connected to nitrogen cylinder, argon bottle and hydrogen cylinder,
For that will have the mixed gas of nitrogen, argon gas and hydrogen to import in the cavity by tracheae and interface；And
The interface is used to carry out vacuum sealing by sealing ring and the cavity.
4. vacuum coating equipment as described in claim 1 further comprises temperature control device, the temperature control device is for measuring simultaneously
Show the intracorporal temperature of the chamber；
The temperature control device includes temperature thermocouple, and the temperature thermocouple is set in the cavity.
5. vacuum coating equipment as described in claim 1, wherein the driving device includes: servo motor, shaft coupling and magnetic current
Body transmission shaft, wherein the servo motor drives the magnetic fluid transmission shaft rotation by the shaft coupling, the magnetic fluid is passed
Moving axis is connected and fixed with the work rest, and the magnetic fluid transmission shaft is insulated by magnetic fluid and the cavity, the magnetic fluid
It is also used to the sealing of the magnetic fluid transmission shaft under vacuum conditions；And
Wherein, the vacuum coating equipment further includes grid bias power supply, and the grid bias power supply powers to the driving device.
6. vacuum coating equipment according to claim 1, further comprising: chilled water unit, the chilled water unit is used
In the cooling cavity.
7. a kind of film plating process of composite coating is realized, the plating using vacuum coating equipment described in any one of claims 1-6
Film method the following steps are included:
Make to form vacuum environment in cavity；
It is nitrogenized to the intracorporal mold to be processed of the chamber is located at；
The die surface to be processed after nitridation deposits the first metal layer；
The second metal-ceramic nano structural film layer is deposited on the first metal layer.
8. film plating process according to claim 7, the pressure in the vacuum environment is 1x10-2Pa-10-3Pa。
9. film plating process according to claim 8 also wraps before the step of nitrogenizing to the mold to be processed
It includes:
When the intracorporal temperature of the chamber is 450 DEG C -550 DEG C, made in the cavity by temperature control device auto controlled heater
Temperature be maintained at set temperature.
10. film plating process according to claim 8 also wraps before the step of nitrogenizing to the mold to be processed
It includes:
Mixed gas is imported into the cavity, and adjusting the intracorporal pressure of the chamber is 1Pa-6Pa.
11. film plating process according to claim 10, the mixed gas includes argon gas, nitrogen and hydrogen.
12. film plating process according to claim 11, adjust the step of intracorporal pressure of chamber is 1Pa-6Pa it
Afterwards, further includes:
Grid bias power supply is opened, the voltage of the grid bias power supply is adjusted to 100V-300V；And
It opens hollow cathode power supply and the output electric current of the hollow cathode power supply is set as 60A-200A, and import argon gas
20-100SCCM；
It wherein, is 1h-3h to the time that the intracorporal mold to be processed of the chamber is nitrogenized is located at.
13. film plating process according to claim 12, to being located at what the intracorporal mold to be processed of the chamber was nitrogenized
Before the step of die surface to be processed after step, and after nitridation deposits the first metal layer, further includes:
Hollow cathode power supply is closed, the voltage of grid bias power supply is adjusted to 30V-200V.
14. film plating process according to claim 13, the die surface to be processed after nitridation deposits the first metal
Layer the step of include:
Open the rectangle multi sphere cathode ion source of the first quantity, setting electric current 150A, sedimentation time 5min-30min.
15. film plating process according to claim 14 deposits the second metal-ceramic nano knot on the first metal layer
The step of structure film layer includes:
Nitrogen is imported into the cavity, the pressure for adjusting the cavity is 1Pa-5Pa, opens the rectangle multi sphere cathode of the second quantity
Ion source, setting electric current 150A-200A, sedimentation time 60min-150min.
16. film plating process according to claim 15, when the mold to be processed is cold punching die, to it is described to
Before the step of processing mold is nitrogenized, when the intracorporal temperature of chamber is 450 DEG C -500 DEG C, controlled automatically by temperature control device
Heater processed makes the intracorporal temperature of the chamber be maintained at set temperature, wherein the material of the cold punching die be Cr12MoV,
Cr12WoV, Cr12Mo1V1 or Cr8MoV；
Alternatively,
It is described before the step of being nitrogenized to the mold to be processed when the mold to be processed is hot pressing casting mould
When the intracorporal temperature of chamber is 500 DEG C -550 DEG C, keep the intracorporal temperature of the chamber by temperature control device auto controlled heater
In set temperature, wherein the material of the injection moulding mold is 4Cr5MoSiV1,0.4C-5.5Cr-Mo-V, 0.38C-5.3Cr-
1.3M0-0.9V, 4Cr5Mo2V, 3Cr2W8V or 4Cr5MoSiV.
17. the film plating process according to any one of claim 7-16, when the cold punching die is put into the cavity
Need to carry out the cold punching die 520 DEG C or more high-temperature heat treatment tempering before；And
Need to carry out the hot pressing casting mould 530 DEG C or more high warm before the hot pressing casting mould is put into the cavity
Processing tempering.
18. film plating process according to claim 16, when depositing the first metallic layer, the rectangle multi sphere of first quantity
The material of the target in cathode ion source is Ti or Cr；
When depositing the second metal-ceramic nano structural film layer, the target in the rectangle multi sphere cathode ion source of second quantity
Material or model TiAl7030, TiAl50, Cr, Ti, TiSi8020 or CrAl7030；And
The material of the second metal-ceramic nano structural film layer is TiAlN, TiAlCrN, CrN, AlCrN or TiAlSiN.
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Cited By (2)
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| CN114481008A (en) * | 2022-01-20 | 2022-05-13 | 清华大学 | Ion nitrogen carbon sulfur multi-element co-permeation auxiliary equipment, treatment system and method |
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