CN109825802B - Mask plate and preparation method thereof - Google Patents
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- CN109825802B CN109825802B CN201910286060.7A CN201910286060A CN109825802B CN 109825802 B CN109825802 B CN 109825802B CN 201910286060 A CN201910286060 A CN 201910286060A CN 109825802 B CN109825802 B CN 109825802B
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Abstract
The embodiment of the invention provides a mask plate and a preparation method thereof, relates to the technical field of evaporation, and can improve the color mixing phenomenon at the angular position of the mask plate and improve the yield of products. A preparation method of a mask plate comprises the following steps: fixing a plurality of first mask strips on a first mask plate frame at intervals in sequence, wherein each first mask strip is arranged in a hollow area of the first mask plate frame in a spanning mode, and two ends of each first mask strip are fixed with the first mask plate frame; the extending directions of the rest of the first mask strips except for the two first mask strips closest to the first edge and the second edge of the first mask frame are parallel to the first edge of the first mask frame, and the first edge and the second edge are opposite; the first mask strips respectively close to the first edge and the second edge are obliquely arranged relative to the rest first mask strips, and the inclination angle is obtained by calculation according to evaporation deviation.
Description
Technical Field
The invention relates to the technical field of evaporation, in particular to a mask plate and a preparation method thereof.
Background
Taking an Organic Light Emitting Diode (OLED) display as an example, the Organic Light Emitting material layer is generally formed by vacuum evaporation coating of an Organic material. For the OLED with independent light emission of RGB sub-pixels, each RGB sub-pixel uses a different organic light emitting material, so the organic light emitting layers of the RGB sub-pixels need to be separately evaporated, in this process, a fine mask plate is generally used to control the position of the organic material on the substrate, and then the corresponding organic material is evaporated in each sub-pixel region in sequence.
Disclosure of Invention
The embodiment of the invention provides a mask plate and a preparation method thereof, which can improve the color mixing phenomenon at the angular position of the mask plate and improve the product yield.
In order to achieve the above purpose, the embodiment of the invention adopts the following technical scheme:
in one aspect, a method for preparing a mask plate is provided, which includes: fixing a plurality of first mask strips on a first mask plate frame at intervals in sequence, wherein each first mask strip is arranged in a hollow area of the first mask plate frame in a spanning mode, and two ends of each first mask strip are fixed with the first mask plate frame; the extending direction of the other first mask bars except for two first mask bars closest to a first edge and a second edge of the first mask frame is parallel to the first edge of the first mask frame, and the first edge and the second edge are opposite; the first mask strips respectively close to the first edge and the second edge are obliquely arranged relative to the rest of the first mask strips, and the inclination angle is calculated according to evaporation deviation.
Optionally, the first mask stripes respectively close to the first edge and the second edge are respectively inclined by rotating a certain angle in a clockwise or counterclockwise direction relative to the direction of the first edge.
Optionally, the inclination angles of the first mask stripes respectively adjacent to the first edge and the second edge are obtained by: carrying out an evaporation process by adopting a test mask plate, wherein the test mask plate comprises a first mask plate frame and a plurality of second mask strips which are arranged at intervals and in parallel; the number of the second mask stripes is equal to that of the first mask stripes, and the extending direction of the second mask stripes is parallel to the first edge of the first mask plate frame; acquiring coordinates of two evaporation holes of two side edges of the second mask strip close to the first edge along the extending direction of the second mask strip by an image sensor, wherein the coordinates are (x1, y1) and (x2, y 2); and acquiring coordinates of two evaporation holes of two side edges of the second mask strip along the extending direction thereof, which are close to the second edge, which are (x3, y3) and (x4, y4), respectively; acquiring coordinates of the evaporation patterns corresponding to the four evaporation holes through an image sensor; calculating to obtain the deviation of each evaporation hole in the four evaporation holes after evaporation according to the coordinates of the four evaporation holes and the coordinates of the evaporation patterns corresponding to the four evaporation holes; the coordinates of the four evaporation holes are corrected to (x1 ', y 1'), (x2 ', y 2'), (x3 ', y 3'), (x4 ', y 4') respectively, by the deviation of each evaporation hole after evaporation; acquiring the inclination angle of the first mask stripes close to the first edge according to coordinates (x1 ', y 1') and (x2 ', y 2'); the inclination angle of the first mask stripes near the second side is acquired according to coordinates (x3 ', y 3') and (x4 ', y 4').
Further optionally, obtaining the inclination angle of the first mask stripes near the first edge according to the coordinates (x1 ', y 1') and (x2 ', y 2'), comprises: establishing a rectangular coordinate system by taking the central point of the second mask strip close to the first edge as an origin, wherein the direction of the first edge is the X-axis direction, and the direction vertical to the direction of the first edge is the Y-axis direction; acquiring coordinates (x1 ', y 1') corresponding to the position according to the position of the coordinates (x1 ', y 1') in the rectangular coordinate system; acquiring coordinates (x2 ", y 2") corresponding to the position according to the position (x2 ', y 2') in the rectangular coordinate system; the inclination angle of the first mask stripes near the first edge
Wherein a is a correction coefficient of the net-expanding machine.
Alternatively, according to the coordinates (x3 ', y3 ') and (x4 ', y4)') obtaining an inclination angle of said first mask stripes adjacent to said second edge, comprising: establishing a rectangular coordinate system by taking the central point of the second mask strip close to the second edge as an origin, wherein the direction of the first edge is the X-axis direction, and the direction vertical to the direction of the first edge is the Y-axis direction; acquiring coordinates (x3 ', y 3') corresponding to the position according to the position of the coordinates (x3 ', y 3') in the rectangular coordinate system; acquiring coordinates (x4 ", y 4") corresponding to the position according to the position (x4 ', y 4') in the rectangular coordinate system; the angle of inclination of the first mask stripes near the second edge
Wherein a is a correction coefficient of the net-expanding machine.
Optionally, the shapes of two evaporation holes on two side edges of the second mask strip close to the first edge along the extending direction are different from the shapes of other evaporation holes in the second mask strip; the shapes of two evaporation holes on two side edges of the second mask strip close to the second edge along the extension direction are different from the shapes of other evaporation holes in the second mask strip.
Optionally, before each first mask strip is fixed to the first mask frame, the method for preparing the mask further includes: and aligning the first mask plate frame.
Further optionally, aligning the first mask frame includes: acquiring coordinates of a plurality of alignment marks on the first mask frame through an image sensor; judging whether the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range or not according to the coordinate and the theoretical coordinate of each alignment mark, and if so, ending alignment; if not, controlling the machine of the net-expanding machine to move until the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range.
Optionally, controlling the machine of the web-tensioning machine to move until the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range, including: controlling the machine table of the net-opening machine to move, and carrying out a judgment process once when the machine table moves until the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range; wherein the judging process comprises: acquiring coordinates of a plurality of alignment marks on the first mask plate frame; and judging whether the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range or not according to the coordinate and the theoretical coordinate of each alignment mark.
In another aspect, there is provided a mask blank including: the mask structure comprises a hollow first mask frame and a plurality of first mask strips arranged at intervals, wherein each first mask strip is arranged in a hollow area of the first mask frame in a spanning mode, and two ends of each first mask strip are fixed with the first mask frame; the extending direction of the other first mask bars except for two first mask bars closest to a first edge and a second edge of the first mask frame is parallel to the first edge of the first mask frame, and the first edge and the second edge are opposite; the first mask strips respectively close to the first edge and the second edge are obliquely arranged relative to the rest of the first mask strips, and the inclination angle is calculated according to evaporation deviation.
Optionally, the first mask stripes respectively close to the first edge and the second edge are respectively tilted by rotating a certain angle in a clockwise or counterclockwise direction relative to the direction of the first edge.
Optionally, the mask plate is prepared by the preparation method of the mask plate.
In another aspect, a method for preparing a mask plate is provided, which includes: repeatedly carrying out the alignment of the second mask frame and fixing each third mask strip on the second mask frame; aligning the second reticle frame, including: fixing a second mask plate frame on a machine table of a net-stretching machine; acquiring coordinates of a plurality of alignment marks on the second mask frame through an image sensor; judging whether the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range or not according to the coordinate and the theoretical coordinate of each alignment mark, and if so, ending alignment; if not, controlling the machine table of the net-expanding machine to move until the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range; fixing a third reticle bar to the second reticle frame, comprising: and spanning the third mask strips in the hollow area of the second mask plate frame, so that two ends of the third mask strips are fixed with the second mask plate frame.
Optionally, controlling the machine of the web-tensioning machine to move until the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range, including: controlling the machine table of the net-opening machine to move, and carrying out a judgment process once when the machine table moves until the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range; wherein the judging process comprises: acquiring coordinates of a plurality of alignment marks on the second mask frame; and judging whether the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range or not according to the coordinate and the theoretical coordinate of each alignment mark.
In another aspect, a mask plate is provided, which is prepared by the preparation method of the mask plate.
According to the mask plate and the preparation method thereof provided by the embodiment of the invention, the inclination angle is obtained by calculating the evaporation deviation, so that when the screen is stretched, the first mask strips closest to the first edge and the second edge are fixed on the first mask plate frame by taking the included angle between the first mask strips and the first edge as the inclination angle, and the rest first mask strips are fixed on the first mask plate frame in parallel with the first edge. By changing the arrangement mode of the first mask strips respectively closest to the first edge and the second edge, the evaporation deviation of the first mask strips respectively closest to the first edge and the second edge in the evaporation process is compensated, the pixel position precision matching is realized, the color mixing phenomenon at the angular position of the mask plate is improved, and the product yield is improved.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
Fig. 1 is a flowchart of a method for manufacturing a mask plate according to the present invention;
FIG. 2 is a schematic structural diagram of a mask blank according to the present invention;
FIG. 3 is a schematic structural diagram of another mask blank according to the present invention;
FIG. 4 is a flowchart of obtaining the tilt angles of the first mask stripes near the first edge and the second edge, respectively, according to the present invention;
FIG. 5 is a schematic structural diagram of a test mask plate according to the present invention;
FIG. 6 is a flowchart of the present invention for obtaining the tilting angle of the first mask stripes near the first edge according to the coordinates (x1 ', y 1') and (x2 ', y 2');
FIG. 7 is a schematic structural view of a second mask strip close to a first edge according to the present invention after compensating for an evaporation bias;
FIG. 8 is a flowchart of the present invention for obtaining the tilt angle of the first mask stripes near the second edge according to the coordinates (x3 ', y 3') and (x4 ', y 4');
FIG. 9 is a schematic structural view of a second mask strip close to a second edge for compensating evaporation deviation according to the present invention;
fig. 10 is a schematic structural view of a first mask blank frame according to the present invention;
fig. 11 is a flowchart illustrating alignment of the first mask blank frame according to the present invention;
fig. 12 is a flowchart illustrating a coordinate determination of a plurality of alignment marks on a first mask frame according to the present invention;
fig. 13 is a flowchart illustrating alignment of the second mask frame according to the present invention;
fig. 14 is a flowchart illustrating the coordinate determination of a plurality of alignment marks on a second mask blank frame according to the present invention.
Reference numerals
01-mask plate; 02-testing a mask plate; 10-a first reticle frame; 11-a hollow region; 12-a carrier strip; 13-alignment mark; 21-a first mask stripe; 22-second mask stripes; 40-vapor plating holes; 101-first side; 102-a second edge; 103-third side; 104-fourth side.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the related art, a plurality of mask stripes in a mask plate are arranged in parallel, for example, each of the mask stripes extends in a horizontal direction. The mask plate is used in the vapor deposition process, and the problem that the positions of vapor deposition holes on the mask plate and vapor deposition patterns are deviated due to alignment deviation and deviation of a vapor deposition path when a vapor deposition material is vapor-deposited on a substrate exists. Especially, the deviation of the pattern evaporated by the evaporation holes at the angular position of the mask plate is the largest, so that the color mixing phenomenon occurs, and the product yield is seriously influenced.
The reason why the color mixture occurs is that the evaporation material evaporated onto the substrate exceeds the original coating position (i.e., the theoretical evaporation position) and is evaporated into the adjacent sub-pixels. In the vapor deposition process, when the amount of vapor deposition shift exceeds 1/2pdlgap (half of the pitch between two pixels), it is considered that the deviation is large, and the color mixing phenomenon occurs.
In the related art, the deviation problem in the evaporation process can be compensated by translating the mask bars, but it is difficult to realize the matching tensioned screen according to the Pixel Position Accuracy (PPA) on the substrate to be evaporated.
In order to solve the color mixing phenomenon, the present invention provides a method for preparing a mask blank, as shown in fig. 1, comprising:
s10, as shown in fig. 2, sequentially fixing a plurality of first mask bars 21 on a first mask frame 10 at intervals, wherein each first mask bar 21 spans over the hollow area 11 of the first mask frame 10, and both ends of the first mask bar 21 are fixed to the first mask frame 10.
The interval between the adjacent first mask stripes 21 corresponds to a cutting region on the substrate to be evaporated.
The shape of the hollow region 11 of the first reticle frame 10 is not limited, and the shape of the hollow region 11 may be set as needed.
In some embodiments, as shown in fig. 2, the hollow area 11 of the first reticle frame 10 is rectangular in shape.
On this basis, the first mask frame 10 can be formed by an integral process. Alternatively, the first reticle frame 10 is formed by splicing four independent opposite sides. When the first mask frame 10 is formed by integral processing, the overall accuracy is higher and the error is smaller.
Both ends of the first mask bar 21 may be fixed to the first mask frame 10 by welding with a tenter. The material of the first mask bars 21 and the first mask frame 10 may be a metal or an alloy. Wherein, a plurality of evaporation holes 40 are provided on the first mask stripes 21.
S20, except for the two first mask bars 21 closest to the first side 101 and the second side 102 of the first reticle frame 10, the remaining first mask bars 21 extend in a direction parallel to the first side 101 of the first reticle frame 10, with the first side 101 and the second side 102 opposing each other.
It will be appreciated that all of the first mask stripes 21 are arranged in sequence in a direction perpendicular to the first edge 101. The two first mask stripes 21 closest to the first side 101 and the second side 102 of the first reticle frame 10, that is, the two first mask stripes 21 are located on the most two sides in the direction perpendicular to the first side 101 among all the first mask stripes 21 of the reticle.
Illustratively, the first edge 101 may extend in a horizontal direction, or the first edge 101 may extend in a vertical direction.
In some embodiments, the first side 101 and the second side 102 are parallel.
Taking the example that the first reticle frame 10 includes two pairs of parallel opposite sides, and the four opposite sides are connected in sequence, as shown in fig. 2, one pair of shorter opposite sides may be the first side 101 and the second side 102, and the other pair of longer opposite sides may be the third side 103 and the fourth side 104. Wherein the first side 101 and the third side 103 may be disposed vertically, in which case the hollow area 11 of the first reticle frame 10 is rectangular in shape.
S30, the first mask stripes 21 respectively close to the first side 101 and the second side 102 are arranged to be inclined relative to the rest of the first mask stripes 21, and the inclination angle is calculated according to the evaporation deviation.
The deposition deviation, i.e., the deviation between the theoretical deposition position and the actual deposition position.
In the method for manufacturing the mask blank 01 according to the embodiment of the present invention, the inclination angle is calculated by using the vapor deposition deviation, so that when the mask blank is stretched, the first mask bars 21 closest to the first side 101 and the second side 102, respectively, are fixed to the first mask blank frame 10 at the inclination angle with respect to the first side 101, and the remaining first mask bars 21 are fixed to the first mask blank frame 10 in parallel with the first side 101. By changing the arrangement mode of the first mask strips 21 respectively closest to the first edge 101 and the second edge 102, the evaporation deviation generated in the evaporation process of the first mask strips 21 respectively closest to the first edge 101 and the second edge 102 is compensated, the pixel position precision matching is realized, the color mixing phenomenon at the angular position of the mask plate 01 is improved, and the product yield is improved.
Considering that the place where the color mixing occurs is generally at an angular position of an oblique corner of the substrate, the first mask stripes 21 adjacent to the first side 101 and the second side 102, respectively, are optionally obliquely arranged by being rotated by a certain angle in a clockwise or counterclockwise direction with respect to the direction of the first side 101.
It will be appreciated that the angle of rotation of the first mask stripes 21 adjacent to the first edge 101 is the angle of inclination of the first mask stripes 21. The angle of rotation of the first mask stripes 21 near the second edge 102 is the angle of inclination of the first mask stripes 21.
As shown in fig. 2, when the locations where the color mixing occurs are at the lower left corner and the upper right corner of the substrate, the first mask stripes 21 respectively adjacent to the first side 101 and the second side 102 are each rotated by a certain angle in the clockwise direction.
As shown in fig. 3, when the positions where the color mixing occurs are at the upper left corner and the lower right corner of the substrate, the first mask stripes 21 respectively adjacent to the first side 101 and the second side 102 are each rotated by a certain angle in the counterclockwise direction.
In the embodiment of the present invention, the first mask stripes 21 respectively adjacent to the first side 101 and the second side 102 are respectively tilted by rotating clockwise or counterclockwise by a certain angle, so that the evaporation deviation can be compensated, and the color mixing phenomenon at the lower left corner and the upper right corner, or the upper left corner and the lower right corner of the first mask frame 10 can be correspondingly improved.
Alternatively, the inclination angles of the first mask stripes 21 near the first side 101 and the second side 102 in S30 are obtained by the following method as shown in fig. 4:
s31, referring to fig. 5, a test mask 02 is used to perform a vapor deposition process, where the test mask 02 includes the first mask frame 10 and a plurality of second mask stripes 22 arranged in parallel at intervals, the number of the second mask stripes 22 is equal to the number of the first mask stripes 21, and the extending direction of the second mask stripes 22 is parallel to the first side 101 of the first mask frame 10.
That is, mask frames used for the test mask 02 and the mask 01 of the present invention are the same mask frame.
In some embodiments, for the test mask plate 02 and the mask plate 01 of the present invention, the second mask stripes 22 have at least the same evaporation holes 40 as the first mask stripes 21 at the same positions of the first mask frame 10. Here, the same vapor deposition holes 40 are the same in position and size.
In consideration of the need to acquire two evaporation holes 40 at both side edges of the second mask strip 22 along the extending direction thereof near the first edge 101, two evaporation holes 40 at both side edges of the second mask strip 22 along the extending direction thereof near the second edge 102, and coordinates of the evaporation patterns corresponding to these four evaporation holes 40. Therefore, in some embodiments, as shown in fig. 5, the shapes of two evaporation holes 40 at both side edges of the second mask strip 22 near the first edge 101 in the extending direction thereof may be made different from the shapes of the other evaporation holes 40 in the second mask strip 22; the shapes of two deposition holes 40 at both side edges of the second mask strip 22 in the extending direction thereof near the second edge 102 are different from the shapes of the other deposition holes 40 in the second mask strip 22.
For example, as shown in fig. 5, two evaporation holes 40 are formed at both side edges of the second mask strip 22 along the extending direction thereof near the first edge 101, two evaporation holes 40 are formed at both side edges of the second mask strip 22 along the extending direction thereof near the second edge 102, the four evaporation holes 40 (i.e., the four evaporation holes 40 identified by A, B, C and D in fig. 5) have a quadrangular shape, and the other evaporation holes 40 have a hexagonal shape.
On the basis of this, as shown in fig. 5, the second mask stripes 22 close to the first edge 101 may be obtained by forming two additional evaporation holes 40 (for example, marked as a and B in fig. 5) on both side edges in the extending direction of the first mask stripes 21 close to the first edge 101. Wherein the two evaporation holes A, B may be located at diagonally opposite corners of the second mask stripes 22 near the first side 101. Accordingly, the two evaporation holes A, B are the two evaporation holes 40 at the two side edges of the second mask stripe 22 along the extending direction.
Similarly, the second mask stripes 22 near the second edge 102 may be formed by forming two additional evaporation holes 40 (e.g., C and D in fig. 5) on both side edges of the first mask stripe 21 near the second edge 102, so as to obtain the second mask stripes 22. Wherein the two evaporation holes C, D may be located at diagonally opposite corners of the second mask stripes 22 near the second side 102. Accordingly, the two evaporation holes C, D are the two evaporation holes 40 at the two side edges of the second mask stripe 22 along the extending direction.
In consideration of the fact that the four additional evaporation holes 40 are used to measure the evaporation deviation of other evaporation holes 40, and in order to measure more accurately, the vertical distances between the four evaporation holes A, B, C, D and the nearest evaporation hole 40 are all less than or equal to 1 um.
The shapes of the two evaporation holes 40 at the two side edges of the second mask strip 22 close to the first edge 101 in the extending direction are different from the shapes of the other evaporation holes 40 in the second mask strip 22, and the shapes of the two evaporation holes 40 at the two side edges of the second mask strip 22 close to the second edge 102 in the extending direction are different from the shapes of the other evaporation holes 40 in the second mask strip 22, so that the image sensor can recognize the shapes and grasp the coordinates of the shapes.
S32, acquiring coordinates of two evaporation holes 40 of two side edges of the second mask strip 22 close to the first edge 101 along the extending direction thereof by an image sensor, wherein the coordinates are (x1, y1) and (x2, y 2); and acquiring coordinates of two evaporation holes 40 of two side edges of the second mask strip 22 along the extending direction thereof near the second edge 102, which are (x3, y3) and (x4, y4), respectively.
The image sensor may be, for example, a Charge Coupled Device (CCD) image sensor.
Here, referring to fig. 5, the two evaporation holes 40, i.e., the evaporation hole a and the evaporation hole B, at both side edges of the second mask stripe 22 in the extending direction thereof near the first edge 101 have coordinates of (x1, y1) and coordinates of (x2, y 2). Two evaporation holes 40, i.e., an evaporation hole C and an evaporation hole D, are formed at both side edges of the second mask stripe 22 along the extending direction thereof near the second side 102, the coordinates of the evaporation hole C are (x3, y3), and the coordinates of the evaporation hole D are (x4, y 4). The coordinates of the evaporation holes A, B, C and D were obtained with reference to the absolute coordinates of the tenter.
S33, coordinates of the vapor deposition patterns corresponding to the four vapor deposition holes 40 are acquired by the image sensor.
Referring to fig. 5, assuming that the vapor deposition patterns corresponding to the four vapor deposition holes A, B, C and D are a, b, c, and D, respectively, the coordinates of the vapor deposition pattern a are (m1, n1), the coordinates of the vapor deposition pattern b are (m2, n2), the coordinates of the vapor deposition pattern c are (m3, n3), and the coordinates of the vapor deposition pattern D are (m4, n 4).
S34, calculating the deviation of each of the four evaporation holes 40 after evaporation according to the coordinates of the four evaporation holes 40 and the coordinates of the evaporation pattern corresponding to the four evaporation holes 40.
Calculating the deviation delta A (x1-m1, y1-n1) of the evaporated hole A after evaporation according to the coordinates of A and a.
Similarly, calculating the deviation delta B of the evaporation hole B after evaporation according to the coordinates of B and B (x2-m2, y2-n 2).
Calculating the deviation Delta C (x3-m3, y3-n3) of the evaporated hole C after evaporation according to the coordinates of C and C.
And calculating the deviation delta D (x4-m4, y4-n4) of the evaporation hole D after evaporation according to the coordinates of the D and the D.
S35, correcting the coordinates of the four vapor deposition holes to (x1 ', y 1'), (x2 ', y 2'), (x3 ', y 3'), (x4 ', y 4') by the deviation after vapor deposition for each vapor deposition hole.
The corrected coordinates (x1 ', y 1') of the deposition hole a can be obtained by adding a and Δ a, where x1 ═ x1+ x1-m and 1y1 ═ y1+ y1-n 1.
Similarly, the coordinates (x2 ', y 2') corrected for the deposition hole B can be obtained by adding B and Δ B, where x2 ═ x2+ x2-m, and 2y2 ═ y2+ y2-n 2.
The coordinates (x3 ', y 3') of the vapor deposition hole C after correction can be obtained by adding C and Δ C, and in this case, x3 ═ x3+ x3-m, and 3y3 ═ y3+ y3-n 3.
The coordinates (x4 ', y 4') of the deposition hole D after correction can be obtained by adding D and Δ D, and in this case, x4 ═ x4+ x4-m, and 4y4 ═ y4+ y4-n 4.
S36, obtaining the inclination angle of the first mask stripes close to the first side 101 according to the coordinates (x1 ', y 1') and (x2 ', y 2'); the inclination angle of the first mask stripes near the second edge 102 is obtained from the coordinates (x3 ', y 3') and (x4 ', y 4').
According to the coordinates (x1 ', y 1') and (x2 ', y 2'), the angle of the second mask stripes 22 near the first edge 101, which needs to be changed when compensating for the evaporation bias, that is, the inclination angle of the first mask stripes 21 near the first edge in the present invention, can be obtained.
According to the coordinates (x3 ', y 3') and (x4 ', y 4'), the angle of the second mask stripes 22 near the second side 102, which needs to be changed when compensating for the evaporation bias, i.e., the inclination angle of the first mask stripes 21 near the second side 102 in the present invention, can be obtained.
In the embodiment of the present invention, the coordinates of the edge vapor deposition holes 40 and the coordinates of the corresponding vapor deposition pattern on the second mask bars 22 close to the first side 101 and the second side 102 are acquired by the image sensor using the second mask bars 22 close to the first side 101 and the second side 102 on the mask blank 02 and parallel to the first side 101 of the first mask frame 10, and the vapor deposition deviation is calculated and then compensated to obtain the coordinates after the correction of the edge vapor deposition holes 40. Thereby obtaining the inclination angles of the first mask stripes 21 near the first side 101 and the second side 102, respectively.
Alternatively, acquiring the inclination angle of the first mask stripes 21 near the first edge 101 according to the coordinates (x1 ', y 1') and (x2 ', y 2'), as shown in fig. 6, includes:
s361, as shown in fig. 7, a rectangular coordinate system is established with the center point of the second mask stripe 22 near the first edge 101 as the origin, wherein the direction of the first edge 101 is the X-axis direction, and the direction perpendicular to the direction of the first edge 101 is the Y-axis direction.
The image sensor may acquire the center point of the second mask stripe 22 according to the preset length and width of the second mask stripe 22.
S362, acquiring coordinates (x1 'and y 1') corresponding to the position in the rectangular coordinate system according to the position of the coordinates (x1 ', y 1'); according to the position of (x2 ', y 2'), in the rectangular coordinate system, obtaining the corresponding coordinates (x2 ', y 2') of the position.
Since the coordinates of a 'and B' after correction are established in absolute coordinates of the tenter, when a rectangular coordinate system is established with the center of the second mask strip 22 near the first edge 101 as the origin, the coordinates of a "and B" are acquired.
S363, inclination angle of the first mask stripes 21 near the first edge 101
Wherein a is a correction coefficient of the net-expanding machine.
The included angles between the connecting line of the A 'and the original point and the X axis and the included angles between the connecting line of the B' and the original point and the X axis are respectively calculated, the average value of the two included angles is the theoretical inclination angle of the second mask strip 22 close to the first edge 101, which needs to be changed for compensating evaporation deviation, and then the theoretical inclination angle is multiplied by the correction coefficient of the screen expanding machine to be the inclination angle of the first mask strip 21 close to the first edge 101.
The correction factor of the web-opener, i.e. the ratio of the actual inclination angle of the first mask stripes 21 near the first edge 101 during the web-opening process to the theoretical inclination angle. In the process of stretching, because the operation of the stretching machine causes certain errors of the inclination angle, a correction coefficient is needed to correct the theoretical inclination angle. When different net stretching machines stretch nets, the correction coefficients are different.
In the embodiment of the invention, the inclination angle of the first mask strip 21 close to the first edge 101 is obtained by calculating the angle between the connecting line of the coordinates (X1 ', y 1') and the origin and the X-axis, calculating the angle between the connecting line of the coordinates (X2 ', y 2') and the origin and the X-axis, taking the average value of the two values and multiplying the average value by the correction coefficient of the screen printer.
Alternatively, obtaining the inclination angle of the first mask stripes near the second edge 102 according to the coordinates (x3 ', y 3') and (x4 ', y 4'), as shown in fig. 8, includes:
s364, with reference to fig. 9, a rectangular coordinate system is established with the center point of the second mask stripe 22 near the second side 102 as the origin, wherein the direction of the first side 101 is the X-axis direction, and the direction perpendicular to the direction of the first side 101 is the Y-axis direction.
Here, how to determine the center point is similar to the above-mentioned determination of the center point of the second mask stripe 22 near the first edge 101, and is not described in detail here.
S365, acquiring coordinates (x3 'and y 3') corresponding to the position in the rectangular coordinate system according to the position of the coordinates (x3 ', y 3'); according to the position of (x4 ', y 4'), in the rectangular coordinate system, obtaining the corresponding coordinates (x4 ', y 4') of the position.
Since the coordinates of C 'and D' after correction are established by the absolute coordinates of the stretching machine, when a rectangular coordinate system is established with the center of the second mask strip 22 near the second edge 102 as the origin, the coordinates of C "and D" are acquired.
S366, inclination angle of the first mask stripes 21 near the second side 102
Wherein a is a correction coefficient of the net-expanding machine.
The included angles between the connecting line of the C 'and the original point and the X axis and the included angles between the connecting line of the D' and the original point and the X axis are respectively calculated, the average value of the two included angles is the theoretical inclination angle of the second mask strip 22 close to the second edge 102, which needs to be changed for compensating evaporation deviation, and then the theoretical inclination angle is multiplied by the correction coefficient of the screen expanding machine to be the inclination angle of the first mask strip 21 close to the second edge 102.
In the embodiment of the invention, the inclination angle of the first mask stripes 21 close to the second edge 102 is obtained by calculating the included angle between the connecting line of the coordinates (X3 ', y 3') and the origin and the X-axis, calculating the included angle between the connecting line of the coordinates (X4 ', y 4') and the origin and the X-axis, and taking the average value of the two values and multiplying the average value by the correction coefficient of the screen printer.
On the basis, in the process of preparing the mask plate, the first mask strips 21 have certain tension in the manufacturing process, and are attached to the first mask frame 10 to be retracted and deformed inwards. When the first mask bars 21 are attached to the first mask frame 10, the first mask frame 10 is deformed to some extent when one first mask bar 21 is fixed, and therefore alignment is required for each attachment, thereby improving the alignment accuracy.
Therefore, optionally, before each of the first mask bars 21 is fixed to the first mask frame 10, that is, before S10, the method for preparing the mask plate 01 further includes: the first mask frame 10 is aligned.
As shown in fig. 10, the first mask frame 10 includes two carrier bars 12, the two carrier bars 12 are respectively located at two opposite sides of the first mask frame 10, and a plurality of alignment marks 13 are disposed on the carrier bars 12.
The alignment mark can be a through hole or a pattern. The pattern of the alignment mark can be a solid cross shape, a hollow cross shape, a circular ring shape, a solid circular shape and the like. Of course, the embodiments of the present invention are not limited to the above cases, and other embodiments that can be fabricated on the first mask frame 10 and recognized by the sensor are also within the scope of the present invention.
In the related art, the coordinates of the alignment mark 13 are obtained by the image sensor during alignment, the difference between the average value and the theoretical coordinate average value is calculated, and whether the difference is within a certain range is judged to correspondingly control the stretching machine to continue alignment or end alignment.
For example, if there are four alignment marks, the difference between the average of the four coordinates and the average of the four theoretical coordinates is determined. The existing method for calculating the difference value between the coordinate of the alignment mark and the theoretical coordinate is easy to average the maximum error of the individual alignment mark into the error of four alignment marks, and the error of the method is larger.
In the present invention, the aligning of the first mask frame 10 includes, as shown in fig. 11:
s1, acquiring coordinates of the alignment marks on the first reticle frame 10 by using an image sensor.
S2, judging whether the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range according to the coordinate and the theoretical coordinate of each alignment mark, if so, executing S3, and if not, executing S4.
For example, the predetermined range may be 0-1 um.
Obtaining a coordinate of a alignment mark as P (u, v) and a theoretical coordinate as P '(u', v '), calculating a coordinate difference value of the coordinate of the alignment mark P (u, v) and the theoretical coordinate as P' (u ', v') as Δ P (u-u ', v-v'), and obtaining the coordinate difference value through a formula
And obtaining the distance L between the P and the theoretical coordinate P', and judging whether the distance L is within a preset range.
And S3, finishing the alignment.
And S4, controlling the machine of the net-expanding machine to move until the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range.
In the embodiment of the invention, according to the coordinate and the theoretical coordinate of each alignment mark, the distance between each alignment mark and the corresponding position of the theoretical coordinate is controlled to be within the preset range, so that the error of the coordinate of each alignment mark is reduced, and the alignment is more accurate.
Optionally, S4 controls the movement of the machine of the web-tensioning machine until the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range, where the method includes: and controlling the machine table of the net-opening machine to move, and carrying out a judgment process once when the machine table moves until the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range.
As shown in fig. 12, the determining process includes:
s41, acquiring coordinates of the alignment marks on the first mask frame 10.
And S42, judging whether the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range according to the coordinate and the theoretical coordinate of each alignment mark.
In the embodiment of the invention, whether the machine table moves is controlled by judging whether the distance between each alignment mark and the corresponding position of the theoretical coordinate is within the preset range or not until the machine table moves until the distance between each alignment mark and the corresponding position of the theoretical coordinate is within the preset range, so that the subsequent screen tensioning is more accurate.
An embodiment of the present invention further provides a mask plate 01, as shown in fig. 2 and 3, including: a hollow first mask frame 10 and a plurality of first mask bars 21 arranged at intervals, wherein each first mask bar 21 is arranged across the hollow area 11 of the first mask frame 10, and two ends of each first mask bar 21 are fixed with the first mask frame 10; the remaining first mask bars 21, except for the two first mask bars 21 closest to the first 101 and second 102 sides of the first reticle frame 10, extend in a direction parallel to the first side 101 of the first reticle frame 10, with the first 101 and second 102 sides being opposite; the first mask stripes 21 respectively close to the first side 101 and the second side 102 are obliquely arranged relative to the rest of the first mask stripes 21, and the inclination angle is calculated according to the evaporation deviation.
Alternatively, the first mask stripes 21 adjacent to the first side 101 and the second side 102 are inclined by rotating clockwise or counterclockwise respectively.
Optionally, the mask plate 01 is prepared by the above mask plate preparation method.
In the mask blank 01 provided by the embodiment of the present invention, the mask blank 01 is prepared by the above-described preparation method of the mask blank 01, and the inclination angle is calculated according to the vapor deposition deviation, so that the first mask bars 21 respectively closest to the first side 101 and the second side 102 are fixed to the first mask frame 10 at the inclination angle from the first side 101, and the remaining first mask bars 21 are fixed to the first mask frame 10 in parallel with the first side 101. By changing the fixed positions of the first mask stripes 21 respectively closest to the first side 101 and the second side 102, the evaporation deviation generated in the evaporation process of the first mask stripes 21 respectively closest to the first side 101 and the second side 102 is compensated, the pixel position precision matching is realized, the color mixing phenomenon at the angular position of the mask plate 01 is improved, and the product yield is improved.
The embodiment of the invention also provides another mask plate preparation method, which comprises the following steps: and repeatedly carrying out the alignment of the second mask frame and the step of fixing each third mask strip on the second mask frame.
That is, alignment is performed once when each of the third mask bars is fixed to the second mask frame.
The third mask strip can be fixed on the second mask plate frame in a welding mode through a net stretching machine.
Aligning the second mask frame, as shown in fig. 13, includes:
and S100, fixing the second mask plate frame on a machine table of a net-expanding machine.
And S200, acquiring coordinates of the plurality of alignment marks on the second mask frame through an image sensor.
S300, judging whether the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range or not according to the coordinate and the theoretical coordinate of each alignment mark, if so, executing S400, and if not, executing S500.
And S400, finishing alignment.
And S500, controlling a machine table of the net-expanding machine to move until the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range.
Optionally, fixing a third mask strip to the second mask frame includes:
and spanning the third mask strips in the hollow area of the second mask plate frame, so that two ends of the third mask strips are fixed with the second mask plate frame.
In the embodiment provided by the invention, alignment is carried out once when each third mask strip is fixed, and the distance between each alignment mark and the corresponding position of the theoretical coordinate is controlled to be within the preset range according to the coordinate and the theoretical coordinate of each alignment mark, so that the error of each coordinate is reduced, the position of the third mask strip attached to the second mask plate frame is more accurate, the pixel position precision matching is realized, and the product yield is improved.
Optionally, controlling the machine of the web-tensioning machine to move until the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range, including:
controlling the machine table of the net-opening machine to move, and carrying out a judgment process once when the machine table moves until the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range;
as shown in fig. 14, the determining process includes:
and S501, acquiring coordinates of a plurality of alignment marks on the second mask frame.
S502, judging whether the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range according to the coordinate and the theoretical coordinate of each alignment mark.
In the embodiment provided by the invention, whether the machine table moves is controlled by judging whether the distance between each alignment mark and the corresponding position of the theoretical coordinate is within the preset range or not until the machine table moves until the distance between each alignment mark and the corresponding position of the theoretical coordinate is within the preset range, so that the subsequent screen tensioning is more accurate.
The embodiment of the invention also provides a mask plate, which is prepared by the preparation method of the other mask plate.
The above description is only for the specific embodiments of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art can easily conceive of the changes or substitutions within the technical scope of the present invention, and all the changes or substitutions should be covered within the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the appended claims.
Claims (11)
1. A preparation method of a mask plate is characterized by comprising the following steps:
fixing a plurality of first mask strips on a first mask plate frame at intervals in sequence, wherein each first mask strip is arranged in a hollow area of the first mask plate frame in a spanning mode, and two ends of each first mask strip are fixed with the first mask plate frame;
the extending direction of the other first mask bars except for two first mask bars closest to a first edge and a second edge of the first mask frame is parallel to the first edge of the first mask frame, and the first edge and the second edge are opposite; the first mask stripes respectively close to the first edge and the second edge are obliquely arranged relative to the rest of the first mask stripes, and the inclination angles are obtained by calculation according to evaporation deviation, wherein the inclination angles of the first mask stripes respectively close to the first edge and the second edge are obtained by the following method:
carrying out an evaporation process by adopting a test mask plate, wherein the test mask plate comprises a first mask plate frame and a plurality of second mask strips which are arranged at intervals and in parallel; the number of the second mask stripes is equal to that of the first mask stripes, and the extending direction of the second mask stripes is parallel to the first edge of the first mask plate frame;
acquiring coordinates of two evaporation holes of two side edges of the second mask strip close to the first edge along the extending direction of the second mask strip by an image sensor, wherein the coordinates are (x1, y1) and (x2, y 2); and acquiring coordinates of two evaporation holes of two side edges of the second mask strip along the extending direction thereof, which are close to the second edge, which are (x3, y3) and (x4, y4), respectively;
acquiring coordinates of the evaporation patterns corresponding to the four evaporation holes through an image sensor;
calculating to obtain the deviation of each evaporation hole in the four evaporation holes after evaporation according to the coordinates of the four evaporation holes and the coordinates of the evaporation patterns corresponding to the four evaporation holes;
the coordinates of the four evaporation holes are corrected to (x1 ', y 1'), (x2 ', y 2'), (x3 ', y 3'), (x4 ', y 4') respectively, by the deviation of each evaporation hole after evaporation;
acquiring the inclination angle of the first mask stripes close to the first edge according to coordinates (x1 ', y 1') and (x2 ', y 2');
the inclination angle of the first mask stripes near the second side is acquired according to coordinates (x3 ', y 3') and (x4 ', y 4').
2. The method for manufacturing a mask blank according to claim 1, wherein the first mask stripes respectively adjacent to the first edge and the second edge are respectively inclined by rotating at a certain angle in a clockwise or counterclockwise direction with respect to the direction of the first edge.
3. The mask blank producing method according to claim 1, wherein obtaining the inclination angle of the first mask bars near the first edge from coordinates (x1 ', y 1') and (x2 ', y 2') includes:
establishing a rectangular coordinate system by taking the central point of the second mask strip close to the first edge as an origin, wherein the direction of the first edge is the X-axis direction, and the direction vertical to the direction of the first edge is the Y-axis direction;
acquiring coordinates (x1 ', y 1') corresponding to the position according to the position of the coordinates (x1 ', y 1') in the rectangular coordinate system; acquiring coordinates (x2 ", y 2") corresponding to the position according to the position (x2 ', y 2') in the rectangular coordinate system;
the inclination angle of the first mask stripes near the first edge
Wherein a is a correction coefficient of the net-expanding machine.
4. The mask blank producing method according to claim 1, wherein obtaining the inclination angle of the first mask bars near the second side from coordinates (x3 ', y 3') and (x4 ', y 4') includes:
establishing a rectangular coordinate system by taking the central point of the second mask strip close to the second edge as an origin, wherein the direction of the first edge is the X-axis direction, and the direction vertical to the direction of the first edge is the Y-axis direction;
acquiring coordinates (x3 ', y 3') corresponding to the position according to the position of the coordinates (x3 ', y 3') in the rectangular coordinate system; acquiring coordinates (x4 ", y 4") corresponding to the position according to the position (x4 ', y 4') in the rectangular coordinate system;
the angle of inclination of the first mask stripes near the second edge
Wherein a is a correction coefficient of the net-expanding machine.
5. The method for producing a mask blank according to claim 1, wherein the shape of two evaporation holes in both side edges of the second mask strip in the extending direction thereof near the first edge is different from the shape of the other evaporation holes in the second mask strip;
the shapes of two evaporation holes on two side edges of the second mask strip close to the second edge along the extension direction are different from the shapes of other evaporation holes in the second mask strip.
6. The method for producing a mask blank according to claim 1, wherein before fixing each of the first mask bars to the first mask frame, the method further comprises:
and aligning the first mask plate frame.
7. The method for manufacturing a mask blank according to claim 6, wherein the aligning the first mask frame includes:
acquiring coordinates of a plurality of alignment marks on the first mask frame through an image sensor;
judging whether the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range or not according to the coordinate and the theoretical coordinate of each alignment mark, and if so, ending alignment;
if not, controlling the machine of the net-expanding machine to move until the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range.
8. The method for preparing a mask plate according to claim 7, wherein the step of controlling the movement of the machine of the screen expanding machine until the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range comprises the following steps:
controlling the machine table of the net-opening machine to move, and carrying out a judgment process once when the machine table moves until the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range;
wherein the judging process comprises:
acquiring coordinates of a plurality of alignment marks on the first mask plate frame;
and judging whether the distance between each alignment mark and the corresponding position of the theoretical coordinate is within a preset range or not according to the coordinate and the theoretical coordinate of each alignment mark.
9. A mask blank, comprising: the mask structure comprises a hollow first mask frame and a plurality of first mask strips arranged at intervals, wherein each first mask strip is arranged in a hollow area of the first mask frame in a spanning mode, and two ends of each first mask strip are fixed with the first mask frame;
the extending direction of the other first mask bars except for two first mask bars closest to a first edge and a second edge of the first mask frame is parallel to the first edge of the first mask frame, and the first edge and the second edge are opposite; the first mask stripes respectively close to the first edge and the second edge are obliquely arranged relative to the rest of the first mask stripes, and the inclination angles are obtained by calculation according to evaporation deviation, wherein the inclination angles of the first mask stripes respectively close to the first edge and the second edge are obtained by the following method:
carrying out an evaporation process by adopting a test mask plate, wherein the test mask plate comprises a first mask plate frame and a plurality of second mask strips which are arranged at intervals and in parallel; the number of the second mask stripes is equal to that of the first mask stripes, and the extending direction of the second mask stripes is parallel to the first edge of the first mask plate frame;
acquiring coordinates of two evaporation holes of two side edges of the second mask strip close to the first edge along the extending direction of the second mask strip by an image sensor, wherein the coordinates are (x1, y1) and (x2, y 2); and acquiring coordinates of two evaporation holes of two side edges of the second mask strip along the extending direction thereof, which are close to the second edge, which are (x3, y3) and (x4, y4), respectively;
acquiring coordinates of the evaporation patterns corresponding to the four evaporation holes through an image sensor;
calculating to obtain the deviation of each evaporation hole in the four evaporation holes after evaporation according to the coordinates of the four evaporation holes and the coordinates of the evaporation patterns corresponding to the four evaporation holes;
the coordinates of the four evaporation holes are corrected to (x1 ', y 1'), (x2 ', y 2'), (x3 ', y 3'), (x4 ', y 4') respectively, by the deviation of each evaporation hole after evaporation;
acquiring the inclination angle of the first mask stripes close to the first edge according to coordinates (x1 ', y 1') and (x2 ', y 2');
the inclination angle of the first mask stripes near the second side is acquired according to coordinates (x3 ', y 3') and (x4 ', y 4').
10. The mask blank according to claim 9, wherein the first mask strips respectively adjacent to the first edge and the second edge are respectively inclined by rotating a certain angle in a clockwise or counterclockwise direction relative to the direction of the first edge.
11. The mask blank according to claim 9 or 10, wherein the mask blank is prepared by the method for preparing a mask blank according to any one of claims 1 and 3 to 8.
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| CN110129722A (en) * | 2019-06-21 | 2019-08-16 | 京东方科技集团股份有限公司 | Mask plate component and preparation method thereof |
| CN113410151B (en) * | 2021-06-01 | 2022-10-14 | 云谷（固安）科技有限公司 | Method, device and equipment for determining position offset of mask |
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