CN110129722A - Mask plate component and preparation method thereof - Google Patents
Mask plate component and preparation method thereof Download PDFInfo
- Publication number
- CN110129722A CN110129722A CN201910544833.7A CN201910544833A CN110129722A CN 110129722 A CN110129722 A CN 110129722A CN 201910544833 A CN201910544833 A CN 201910544833A CN 110129722 A CN110129722 A CN 110129722A
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- China
- Prior art keywords
- mask
- mask strip
- strip
- frame
- contraposition
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
Abstract
This application provides a kind of mask plate components and preparation method thereof.The mask plate component includes: frame and at least two first mask strips；Each first mask strip is set between two opposite frames of frame；Each first mask strip relative to reference position offset in target offset range.The offset of the first mask strip of each of the embodiment of the present application is in target offset range, in the case where frame generates the deformation of class parallelogram, the whole deformation for being formed by mask plate component reduces, to reduce or keep out the influence of frame deformation, using mask plate component provided by the embodiments of the present application, the PPA of deposition unit can be improved, promote the using effect and product yield of mask plate component.
Description
Technical field
This application involves mask plate technical fields, specifically, this application involves a kind of mask plate component and its preparation sides
Method.
Background technique
In OLED (Organic Light-Emitting Diode, Organic Light Emitting Diode) manufacturing technology, vacuum is steamed
Plating the mask plate used is highly important component, PPA (the Pixel Position of deposition unit (Cell) on final mask plate
Accuracy, location of pixels precision/pixel accuracy) yield of product is had an important influence.
Currently, in the manufacturing process of mask plate, due to frame supplied materials, equipment of throwing the net, the deficiency of technique etc. of throwing the net,
Final mask plate obtained can generate the deformation of more or less class parallelogram, cause the PPA of deposition unit lower, sternly
Ghost image rings the using effect of mask plate.
The influence of class parallelogram deformation is reduced or eliminated therefore, it is necessary to a kind of effective mode.
Summary of the invention
The application is directed to the shortcomings that existing way, proposes a kind of mask plate component and preparation method thereof, existing to solve
Mask plate the technical issues of being also easy to produce the deformation of class parallelogram and seriously affecting mask plate using effect.
In a first aspect, the embodiment of the present application provides a kind of mask plate component, comprising: frame and at least two first exposure masks
Item；
Each first mask strip is set between two opposite frames of frame；
Each first mask strip relative to reference position offset in target offset range.
Second aspect, the embodiment of the present application provide a kind of preparation method of mask plate component, are used to prepare the application reality
Apply the mask plate component that a first aspect provides, comprising:
First the first mask strip is aligned, first the first mask strip after contraposition is set to two of frame
Between opposite frame；
At least one remaining first mask strip is successively configured, setting includes: according to first be arranged every time
Mask strip compensates the first mask strip to be placed, aligns to compensated first mask strip to be placed, will be right
The first mask strip to be placed behind position is set between two opposite frames of frame, makes each first mask strip relative to ginseng
According to position offset in target offset range.
Technical solution provided by the embodiments of the present application, at least has the following beneficial effects:
1) offset of the first mask strip of each of the embodiment of the present application generates in target offset range in frame
In the case where class parallelogram deformation, the whole deformation for being formed by mask plate component reduces, to reduce or balance out frame
The PPA of deposition unit can be improved using mask plate component provided by the embodiments of the present application in the influence of frame deformation, promotes mask plate
The using effect and product yield of component；
2) successively the first mask strip to be placed is compensated according to the first mask strip being arranged, and then to be placed
The first mask strip aligned and be arranged, the aligning accuracy of most first mask strips can be promoted, so that the first of setting
Mask strip relative to reference position offset in target offset range, and then the essence of throwing the net of mask plate entirety can be promoted
Degree, reduces or balances out the influence of frame deformation, reduces or eliminates the PPA offset of deposition unit, reducing mask plate component makes
With error in the process, using effect and product yield are promoted.
The additional aspect of the application and advantage will be set forth in part in the description, these will become from the following description
It obtains obviously, or recognized by the practice of the application.
Detailed description of the invention
The application is above-mentioned and/or additional aspect and advantage will become from the following description of the accompanying drawings of embodiments
Obviously and it is readily appreciated that, in which:
Fig. 1 is the deformation schematic diagram for the class parallelogram that existing mask plate generates；
Fig. 2 is a kind of structural schematic diagram of mask plate component provided by the embodiments of the present application；
Fig. 3 is a kind of flow diagram of the preparation method of mask plate component provided by the embodiments of the present application；
Fig. 4 is the schematic illustration of the preparation method of mask plate component provided by the embodiments of the present application；
Fig. 5 be mask plate component provided by the embodiments of the present application preparation method in second to m-th mask strip into
The flow diagram of row setting.
In figure:
110 be frame, and 120 be mask strip；
220 be the first mask strip, and 230 be the second mask strip；
221-226 is respectively first to the 6th the first mask strip.
Specific embodiment
The application is described below in detail, the example of the embodiment of the present application is shown in the accompanying drawings, wherein it is identical from beginning to end or
Similar label indicates same or similar component or component with the same or similar functions.In addition, if known technology
Detailed description is characterized in the application shown unnecessary, then omits it.Below with reference to the reality of attached drawing description
It applies example to be exemplary, is only used for explaining the application, and the limitation to the application cannot be construed to.
Those skilled in the art of the present technique are appreciated that unless otherwise defined, all terms used herein (including technology art
Language and scientific term), there is meaning identical with the general understanding of those of ordinary skill in the application fields.Should also
Understand, those terms such as defined in the general dictionary, it should be understood that have in the context of the prior art
The consistent meaning of meaning, and unless idealization or meaning too formal otherwise will not be used by specific definitions as here
To explain.
Those skilled in the art of the present technique are appreciated that unless expressly stated, singular " one " used herein, " one
It is a ", " described " and "the" may also comprise plural form.It is to be further understood that being arranged used in the description of the present application
Diction " comprising " refer to that there are the feature, integer, step, operation, element and/or component, but it is not excluded that in the presence of or addition
Other one or more features, integer, step, operation, element, component and/or their group.Wording used herein " and/
Or " it include one or more associated wholes for listing item or any cell and all combinations.
The deformation situation of a type parallelogram caused by existing mask plate is as shown in Figure 1, relative on the left of Fig. 1
Shown on the right side of frame (Frame) 110, Fig. 1 shown in frame 110 in mask plate generate the deformation of class parallelogram, by
Mask plate shown on the right side of Fig. 1 is as it can be seen that each mask strip (Sheet) 120 on frame 110 (is with the direction in X-direction
Just, opposite direction is negative), offset (PPA-x offset) is above produced, so that finally formed mask plate produces class on the whole and puts down
The deformation of equal quadrangles.
How the technical solution of the application and the technical solution of the application are solved with specifically embodiment below above-mentioned
Technical problem is described in detail.These specific embodiments can be combined with each other below, for the same or similar concept
Or process may repeat no more in certain embodiments.Below in conjunction with attached drawing, embodiments herein is described.
The embodiment of the present application provides a kind of mask plate component, as shown in Fig. 2, the mask plate component includes: 110 He of frame
At least two first mask strips 220.
Each first mask strip 220 is set between two opposite frames of frame 110；Each first mask strip 220 is opposite
In reference position offset in target offset range.
Reference position in the embodiment of the present application be designer at the beginning of preparing mask plate component to each first exposure mask
Item 220 should be at the design value which location point is designed, and be in rectangle rather than such as Fig. 1 to make mask plate component on the whole
Shown in class parallelogram, the reference position of each first mask strip 220 is usually designed as identical numerical value；Target offset model
Enclose to set according to actual needs, such as [- 10,10], i.e., along positive negative direction deviate 10 unit distances range, the unit away from
From specific dimension can be set according to actual conditions, such as micron.
Optionally, first the first mask strip 221 at least two first mask strips 220 is set to frame along first direction
The intermediate region of frame 110；At least one remaining first mask strip 220 is equably arranged in except intermediate region along first direction
Region.
In one example, as shown in Fig. 2, in the intermediate region of frame 110, first the first mask strip 221 is in X direction
It is fixedly connected respectively with the left frame of frame 110 and left frame across the opening portion of frame 110.
Optionally, mask plate component provided by the embodiments of the present application further includes the second mask strip (Side Mask) 230；The
Two mask strips 230 are set on the frame of frame 110.
Optionally, the quantity of the second mask strip 230 can be set according to demand, such as two the second mask strips can be set
230, two the second mask strips 230 are connected to along two of frame 110 opposite frames along first direction respectively, each second exposure mask
Item 230 is respectively positioned in the region of a connected frame.
Optionally, the first direction in the embodiment of the present application can be set according to actual needs, such as may be set to such as Fig. 2
Shown in X-direction.
In one example, as shown in Fig. 2, two the second mask strips 230 are fixedly connected on frame 110 in X direction respectively
Upper side frame and lower frame.
It will be understood by those skilled in the art that frame 110 and mask strip (the first mask strip 220 in the embodiment of the present application
Or second mask strip 230) settable alignment mark, which can be diversified forms, such as cavernous structure is (i.e.
Align Hole, registration holes), some pattern on the attachment (such as varnish stain) or frame 110 that are attached on frame 110, should
The quantity of alignment mark and position can be arranged according to actual needs, for example, can the both ends of mask strip be respectively set one it is right
Position label, can also be arranged one or two alignment mark in the intermediate region of mask strip, specific location can be set according to actual needs
It sets.
In the embodiment of the present application, mask strip and frame 110 be fixedly connected mode can be any one following welding,
Hot fusion connection, bonding, riveted connection etc..
In the embodiment of the present application, the first mask strip 220 can be FMM Sheet (Fine Matel Mask Sheet,
Fine metal mask item), it is FMM (Fine Matel Mask, fine gold based on the mask plate component that the FMM Sheet is prepared
Belong to mask plate) component.
The offset of the first mask strip of each of the embodiment of the present application generates class in target offset range, in frame
In the case where parallelogram deformation, the whole deformation for being formed by mask plate component reduces, to reduce or balance out frame
The PPA of deposition unit can be improved using mask plate component provided by the embodiments of the present application in the influence of deformation, promotes exposure mask board group
The using effect and product yield of part.
Based on the same inventive concept, the embodiment of the present application provides a kind of preparation method of mask plate component, can be used for making
Standby above-mentioned mask plate component provided by the embodiments of the present application, as shown in figure 3, the preparation method includes:
S310 aligns first the first mask strip 221, and first the first mask strip 221 after contraposition is arranged
Between two opposite frames of frame 110.
Optionally, first the first mask strip 221 is aligned, comprising: covered for contraposition reference to second with frame 110
Film item 230 is aligned, by the second mask strip 230 after contraposition along the frame that first direction is set to frame 110；With second
Mask strip 230 is that contraposition reference aligns first the first mask strip 221.
Optionally, two the second mask strips 230 are carried out pair respectively using the alignment mark on frame 110 as contraposition reference
Position makes two the second mask strips 230 after contraposition along two opposite frames that first direction is set to frame 110 respectively
Each second mask strip 230 is respectively positioned in the region of a connected frame.In one example, the second exposure mask after connection
The relative positional relationship of item 230 and frame 110 is as shown in figures 2 or 4.
Optionally, two the second mask strips 230 are carried out pair respectively using the alignment mark on frame 110 as contraposition reference
When position, first the second mask strip 230 can be aligned using the alignment mark on frame 110 as contraposition reference first, then
Using the alignment mark in first the second mask strip 230 as contraposition reference, second the second mask strip 230 is aligned.
Optionally, when being aligned to first the first mask strip 221, with the alignment mark in the second mask strip 230
First the first exposure mask 221 is aligned for contraposition reference.
Optionally, first the first mask strip 221 after contraposition is set between two opposite frames of frame 110,
It include: that first the first mask strip 221 after contraposition is set to frame 110 along first direction in the intermediate region of frame 110
Two opposite frames between.
In one example, as shown in first mask strip connection schematic diagram in Fig. 4, in the intermediate region of frame 110,
First the first mask strip 221 is fixed with left frame and left frame across the opening portion of frame 110 respectively in X direction and is connected
It connects.It is fixedly connected with mode as previously mentioned, the intermediate region can be in the region, such as Fig. 4 that staff specifies
Most intermediate region, the region of upper middle or the region of lower middle between upper and lower two the second mask strips 230.
S320 is successively configured at least one remaining first mask strip 220, and setting includes: that basis has been set every time
The first mask strip 220 set compensates the first mask strip 220 to be placed, to compensated first mask strip to be placed
220 are aligned, and the first mask strip 220 to be placed after contraposition is set between two opposite frames of frame 110, is made
Each first mask strip 220 relative to reference position offset in target offset range.
Optionally, by the first mask strip 220 to be placed after contraposition be set to two of frame 110 opposite frames it
Between, comprising: the first mask strip 220 to be placed after contraposition is set to by the region except intermediate region along first direction
Between the opposite frame of two of frame 110.
Optionally, the two side areas in intermediate region alternately performs the following operations: by be placed after contraposition
One mask strip 220 is set between two opposite frames of frame 110 along first direction.
In one example, as shown in first mask strip connection schematic diagram in Fig. 4, by first the first mask strip
After 221 are set between the left frame of intermediate region and left frame, second the can be arranged in the region above the intermediate region
One mask strip 222, region setting the first mask strip 223 of third below the intermediate region, subsequent first mask strip 220
Be arranged it is similar, until all first mask strips 220 to be placed be respectively provided with finish or frame 110 in there is no remaining area can be used for
First mask strip 220 is set.
Optionally, the first mask strip 220 to be placed is compensated according to the first mask strip 220 being arranged, to benefit
The first mask strip 220 to be placed after repaying is aligned, and the first mask strip 220 to be placed after contraposition is set to frame
Between the opposite frame of two of 110, comprising:
The first mask strip 220 to be placed is compensated according to the first mask strip 220 being arranged；With the second mask strip
230 or the first mask strip 220 for being arranged be that contraposition reference aligns compensated first mask strip 220 to be placed；
In the adjacent area for the first mask strip 220 being arranged, the first mask strip 220 to be placed after contraposition is set along first direction
It is placed between two opposite frames of frame 110.
Optionally, as shown in figure 5, when at least one remaining first mask strip 220 is covered including second to m-th first
When film item 220, following steps S321-S322 is successively executed to second to the first mask strip of m-th 220:
S321, according to first the first mask strip 221 being arranged, to second the first mask strip 222 to be placed into
Row compensation；It is contraposition reference to compensated second the first exposure mask with the second mask strip 230 or first the first mask strip 221
Item 222 is aligned；In the adjacent area of first the first mask strip 221, by second 222 edge of the first mask strip after contraposition
First direction is set between two opposite frames of frame 110.
Optionally, according to first the first mask strip 221 being arranged, to second the first mask strip 222 to be placed
It compensates, comprising:
Measure offset of first the first mask strip 221 being arranged relative to first reference position in a first direction
Amount；Second the first mask strip 222 to be placed is determined in a first direction according to the offset of first the first mask strip 221
Offset.
It optionally, is contraposition reference to compensated second with the second mask strip 230 or first the first mask strip 221
First mask strip 222 is aligned, comprising: according to the offset of second the first mask strip 222, with the second mask strip 230 or
First the first mask strip 221 is that contraposition reference aligns second the first mask strip 222.It specifically, can be in first party
To and/or perpendicular to first direction direction carry out alignment compensation.
In one example, when first direction X-direction as shown in Figure 4, first the first mask strip 221 of measurement is opposite
In the offset of first reference position in the X direction.
Specifically, in an optional embodiment, a measurement can be selected in first the first mask strip 221
Point measures the offset PPA-x between the current location of the measurement point and its reference position (as first reference position), will
Offset PPA-x or offset PPA-x is multiplied by the numerical value obtained after a coefficient as first 221 phase of the first mask strip
For the offset of first predeterminated position in the X direction.
In another optional embodiment, more than two measurement points can be selected in first the first mask strip 221,
Measure respectively the current location of each measurement point relative to its reference position (reference position of any one measurement point or two with
The average value of the reference position of upper measurement point can be used as first reference position) offset PPA-x, the multiple measurements that will be measured
The average value P PA-x-ave of the offset PPA-x of point or the offset PPA-x of multiple measurement points are obtained multiplied by after a coefficient respectively
The average value of the multiple numerical value arrived is as first the first mask strip 221 relative to first reference position in the X direction inclined
Shifting amount.
In above-mentioned optional embodiment, the coefficient that the offset PPA-x of measurement point is multiplied can be according to belonging to measurement point
Drawing force (or power of throwing the net) that first mask strip 220 is born is set, if the drawing force born is larger, can set one
Biggish coefficient can set a lesser coefficient if the drawing force born is smaller.
Optionally, determining first the first mask strip 221 relative to first reference position in a first direction
After offset, the offset of second the first mask strip 222 is predicted in combination with the slope of the offset and frame 110,
The offset of second the first mask strip 222 is determined according to the offset of prediction；Wherein, the slope of frame 110 can carry out reality
Measurement determines based on experience value.
In an example it is assumed that a measurement point in the X direction inclined that will be selected in first the first mask strip 221
Shifting amount is the offset as first the first mask strip 221 in the X direction, and the slope of frame 110 is 1, when selected measurement
Point reference position be 0, and survey current location be -1 when, it may be determined that go out the measurement point offset PPA-x be -1, i.e., should
The current location of measurement point offsets by 1 unit distance relative to the opposite direction of reference position in X direction.
Since the adjacent area of first the first mask strip, 221 top, linking frame is arranged in second the first mask strip 222
The physical location for the measurement point selected in predictable second the first mask strip 222 out of the slope of frame 110 is relative to it referring to position
The offset set is 0, in order to reduce the offset of second the first mask strip 222, makes this second the first mask strip 222 and first
A first mask strip 221 forms rectangle on the whole, the offset of second the first mask strip 222 can be determined as -1, by
The reference position (being assumed to be 0) for the measurement point selected in two the first mask strips 222 compensates 1 list on the opposite direction of X-direction
Position distance, makes the reference position of the measurement point be changed to -1 by 0, is aligned according to compensated reference position.
Based on above-mentioned compensation and contraposition, to second the first mask strip 222 after setting completed, second the first mask strip
The physical location for the measurement point selected on 222 is up to the numerical value of -1 or close -1, i.e. the physical location can be with first first
Mask strip 221 is consistent substantially in the position of X-direction (as shown in Figure 4), to make two the first mask strips 220 on the whole
Form rectangle.
S322 covers articles 220 according to the N-2 being arranged first mask strips 220 or N-1 first, to be placed
The first mask strip of n-th 220 compensates；It is contraposition with N-2 the first mask strips 220 or N-1 the first mask strips 220
Benchmark aligns compensated the first mask strip of n-th 220, or with the second mask strip 230 be contraposition reference to compensation after
The first mask strip of n-th 220 aligned；In N-2 the first mask strips 220 or the phase of N-1 the first mask strips 220
The first mask strip of n-th 220 after contraposition is set between two opposite frames of frame 110 by neighbouring region along first direction.
M and N in the embodiment of the present application meet following condition: 3≤N≤M, M and N are integer.
In an optional embodiment, when the adjacent area of N-2 the first mask strips 220 is unoccupied, root
According to the N-2 being arranged first mask strips 220, the first mask strip of n-th 220 to be placed is compensated；With the N-2
A first mask strip 220 or the second mask strip 230 are that contraposition reference is aligned；In the adjacent of a first mask strip 220 of N-2
The first mask strip of n-th 220 after contraposition is set between two opposite frames of frame 110 by region along first direction.
In one example, as shown in figure 4, when at least one remaining first mask strip 220 includes second to the 6th
It, can be to second to the 6th the first exposure mask when a first mask strip 220 (i.e. the first mask strip of serial number 222-226 in Fig. 4)
Item 220 successively performs the following operations:
It is right according to being fixedly connected on first the first mask strip 221 between left frame and left frame in intermediate region
Second the first mask strip 222 to be connected compensates, and is that contraposition reference covers second first with first mask strip 221
Film item 222 is aligned, the adjacent area above first the first mask strip 221, by second the first exposure mask after contraposition
Item 222 is fixedly connected between left frame and left frame in X direction.
It is right according to being fixedly connected on first the first mask strip 221 between left frame and left frame in intermediate region
The first mask strip 223 of third to be connected compensates, and is that contraposition reference covers third first with first mask strip 221
Film item 223 is aligned, the adjacent area below first the first mask strip 221, by the first exposure mask of third after contraposition
Item 223 is fixedly connected between left frame and left frame in X direction.
According to second the first mask strip 222 being fixedly connected is completed, the 4th the first mask strip 224 of connection is treated
It compensates, is that contraposition reference aligns the 4th the first mask strip 224 with second the first mask strip 222, second
The adjacent area of a first mask strip, 222 top, the 4th the first mask strip 224 after contraposition is fixedly connected in X direction
Between left frame and left frame.
According to the first mask strip 223 of a third being fixedly connected is completed, the 5th the first mask strip 225 of connection is treated
It compensates, is that contraposition reference aligns the 5th the first mask strip 225 with the first mask strip 223 of third, in third
The adjacent area of a first mask strip, 223 lower section, the 5th the first mask strip 225 after contraposition is fixedly connected in X direction
Between left frame and left frame.
According to the 4th the first mask strip 224 being fixedly connected is completed, the 6th the first mask strip 226 of connection is treated
It compensates, is that contraposition reference aligns the 6th the first mask strip 226 with the 4th the first mask strip 224, the 4th
The adjacent area of a first mask strip, 224 top, the 6th the first mask strip 226 after contraposition is fixedly connected in X direction
Between left frame and left frame.
In another optional embodiment, when the adjacent area of N-2 the first mask strips 220 is occupied,
According to the N-1 being arranged first mask strips 220, the first mask strip of n-th 220 to be placed is compensated；With N-1
A first mask strip 220 or the second mask strip 230 are that contraposition reference aligns the first mask strip of n-th 220；In N-1
The first mask strip of n-th 220 after contraposition is set to frame 110 along first direction by the adjacent area of a first mask strip 220
Two opposite frames between.
In one example, referring to Fig. 4, if the position of the 4th the first mask strip 224 has been approached upper side frame, i.e., the 4th
The adjacent area of a first mask strip 224 is occupied, and (side is occupied by upper side frame, and the other side is by second the first mask strip
222 occupy), at this time when the 6th the first mask strip 226 is arranged, it is configured on the basis of the 5th the first mask strip 225,
It finally may be disposed at the adjacent area of 225 lower section of the 5th the first mask strip；If the position of the 5th the first mask strip 225 is
Adjacent area close to lower frame, i.e., the 5th the first mask strip 225 is also occupied, at this time without settable in frame 110
Region, then stop setting to the 6th mask strip 226.
Optionally, it according to the N-2 being arranged first mask strips 220 or N-1 the first mask strips 220, treats and sets
The first mask strip of n-th 220 set compensates, comprising:
The N-2 that has been arranged the first mask strips 220 are measured relative to the N-2 reference position in a first direction inclined
The N-1 that has been arranged the first mask strips 220 of shifting amount or measurement are relative to the N-1 reference position in a first direction inclined
Shifting amount；According to the offset of a first mask strip 220 of N-2 or the offset of N-1 the first mask strips 220, determine wait set
The offset of the first mask strip of n-th 220 set in a first direction.
Optionally, according to N-2 the first mask strips 220 or N-1 the first mask strips 220 to compensated n-th
First mask strip 220 is aligned, comprising: according to the offset of the first mask strip of n-th 220, with N-2 the first mask strips
220 or N-1 the first mask strips 220 are that contraposition reference aligns the first mask strip of n-th 220.
Optionally, compensated the first mask strip of n-th 220 is aligned according to the second mask strip 230, comprising: root
According to the offset of the first mask strip of n-th 220, with the second mask strip 230 be contraposition reference to the first mask strip of n-th 220 into
Row contraposition.
Optionally, N-2 the first mask strips 220 being arranged are being measured relative to the N-2 reference position first
When offset on direction, the measurement point or more than two measurements click-through in N-2 the first mask strips 220 can be chosen
Row measurement, specific measurement method is similar to the measurement method of first the first mask strip 221, in the N-1 that measurement has been arranged
When a first mask strip 220 is relative to the N-1 reference position offset in a first direction similarly.
Optionally, the first mask strip of n-th 220 to be placed is determined according to the offset of N-2 the first mask strips 220
Offset in a first direction, and according to the offset of the first mask strip of n-th 220, to the first mask strip of n-th 220
It is specific to compensate the compensation for determining method and alignment method such as with second the first mask strip 222 above-mentioned when being aligned
Value determination is similar with alignment method, and details are not described herein again.
In an example it is assumed that reference position of each first mask strip 220 before compensation is 0, the slope of frame 110
It is 1, then actual value (i.e. offset), offset, compensated reference position and the compensation before the compensation of each first mask strip 220
Physical location afterwards is as shown in the table:
In upper table, offset is that 0 expression does not compensate first mask strip 220, difference according to the actual situation, respectively
Numerical value might have certain error；As seen from the above table, by above-mentioned compensation method described in the embodiment of the present application to each first
Mask strip 220 (except first the first mask strip 221) compensates, and can make the reality of compensated each first mask strip 220
Position reaches the numerical value of -1 or close -1, i.e., the position of each first mask strip 220 in the X direction is consistent substantially, to make
Each first mask strip 220 forms rectangle or class rectangle on the whole.
It will be understood by those skilled in the art that may also include at least one preposition step before the step S310 of the application
Suddenly, such as: frame 110 is placed in stretcher (or equipment of throwing the net) (Frame Load) and frame 110 is carried out
Segmentation and welding (Dummy Welding) etc., the previous step are the conventional pre action of this field, are not repeated herein.
Using the preparation method of mask plate component provided by the embodiments of the present application, at least may be implemented it is following the utility model has the advantages that
1) successively the first mask strip to be placed is compensated and is aligned according to the first mask strip being arranged, and then is right
First mask strip to be placed is configured, and can promote the aligning accuracy of most first mask strips, so that the first of setting
Mask strip relative to reference position offset in target offset range, and then the essence of throwing the net of mask plate entirety can be promoted
Degree, reduces or balances out the influence of frame deformation, reduces or eliminates the PPA offset of deposition unit, reducing mask plate component makes
With error in the process, using effect and product yield are promoted；
2) start setting up first the first mask strip from intermediate region, after be arranged respectively in the two sides of the intermediate region it is remaining
At least one first mask strip, make the first mask strip intermediate region two sides formed be symmetrically arranged structure, help to release
Stress is put, the drawing force for bearing frame different piece tends to the deformation degree for uniformly mitigating frame, reduces to mask plate component
The influence of global shape and the PPA of deposition unit.
Those skilled in the art of the present technique have been appreciated that in the application the various operations crossed by discussion, method, in process
Steps, measures, and schemes can be replaced, changed, combined or be deleted.Further, each with what is crossed by discussion in the application
Kind of operation, method, other steps, measures, and schemes in process may also be alternated, changed, rearranged, decomposed, combined or deleted.
Further, in the prior art to have and the step in various operations disclosed herein, method, process, measure, scheme
It may also be alternated, changed, rearranged, decomposed, combined or deleted.
In the description of the present application, it is to be understood that term " center ", "upper", "lower", "front", "rear", " left side ",
The orientation or positional relationship of the instructions such as " right side ", "vertical", "horizontal", "top", "bottom", "inner", "outside" is based on the figure
Orientation or positional relationship is merely for convenience of description of the present invention and simplification of the description, rather than the device of indication or suggestion meaning or
Element must have a particular orientation, be constructed and operated in a specific orientation, therefore be not considered as limiting the invention.
Term " first ", " second " be used for descriptive purposes only and cannot be understood as indicating or suggesting relative importance or
Implicitly indicate the quantity of indicated technical characteristic." first " is defined as a result, the feature of " second " can be expressed or imply
Ground includes one or more of the features.In the description of the present invention, unless otherwise indicated, the meaning of " plurality " is two or
It is more than two.
In the description of the present application, it should be noted that unless otherwise clearly defined and limited, term " installation ", " phase
Even ", " connection " shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or be integrally connected；It can
To be to be connected directly, the connection inside two elements can also be can be indirectly connected through an intermediary.For this field
For those of ordinary skill, the concrete meaning of above-mentioned term in the present invention can be understood with concrete condition.
In the description of this specification, particular features, structures, materials, or characteristics can be real in any one or more
Applying can be combined in any suitable manner in example or example.
It should be understood that although each step in the flow chart of attached drawing is successively shown according to the instruction of arrow,
These steps are not that the inevitable sequence according to arrow instruction successively executes.Unless expressly stating otherwise herein, these steps
Execution there is no stringent sequences to limit, can execute in the other order.Moreover, at least one in the flow chart of attached drawing
Part steps may include that perhaps these sub-steps of multiple stages or stage are not necessarily in synchronization to multiple sub-steps
Completion is executed, but can be executed at different times, execution sequence, which is also not necessarily, successively to be carried out, but can be with other
At least part of the sub-step or stage of step or other steps executes in turn or alternately.
The above is only some embodiments of the application, it is noted that for the ordinary skill people of the art
For member, under the premise of not departing from the application principle, several improvements and modifications can also be made, these improvements and modifications are also answered
It is considered as the protection scope of the application.
Claims (10)
1. a kind of mask plate component characterized by comprising frame and at least two first mask strips；
Each first mask strip is set between two opposite frames of the frame；
Each first mask strip relative to reference position offset in target offset range.
2. mask plate component according to claim 1, which is characterized in that first at least two first mask strip
A first mask strip is set to the intermediate region of the frame along first direction；
At least one remaining described first mask strip is equably arranged in except the intermediate region along the first direction
Region.
3. mask plate component according to any one of claim 1 or 2, which is characterized in that further include the second mask strip；
Second mask strip is set on the frame of the frame.
4. a kind of preparation method of mask plate component, is used to prepare exposure mask board group as claimed any one in claims 1 to 3
Part characterized by comprising
First the first mask strip is aligned, first first mask strip after contraposition is set to two of frame
Between opposite frame；
At least one remaining described first mask strip is successively configured, the setting includes: that basis has been arranged every time
First mask strip compensates first mask strip to be placed, to compensated first exposure mask to be placed
Item is aligned, and first mask strip to be placed after contraposition is set between two opposite frames of the frame,
Make each first mask strip relative to reference position offset in target offset range.
5. the preparation method according to claim 4, which is characterized in that it is described that first the first mask strip is aligned,
Include:
The second mask strip is aligned using the frame as contraposition reference, by second mask strip after contraposition along first party
To being set on the frame of the frame；
First first mask strip is aligned using second mask strip as contraposition reference；
And first first mask strip after contraposition is set between two opposite frames of the frame, comprising:
In the intermediate region of the frame, first first mask strip after contraposition is set to the frame along first direction
Between the opposite frame of two of frame.
6. preparation method according to claim 5, which is characterized in that be placed described first by after contraposition is covered
Film item is set between two opposite frames of the frame, comprising:
Region except the intermediate region sets first mask strip to be placed after contraposition along the first direction
It is placed between two opposite frames of the frame.
7. the preparation method according to claim 4, which is characterized in that first mask strip pair that the basis has been arranged
First mask strip to be placed compensates, and aligns to compensated first mask strip to be placed, will be right
First mask strip to be placed behind position is set between two opposite frames of the frame, comprising:
First mask strip to be placed is compensated according to first mask strip being arranged；
It is contraposition reference to compensated to be placed described first using the second mask strip or first mask strip being arranged
Mask strip is aligned；
In the adjacent area for first mask strip being arranged, by first mask strip to be placed after contraposition along first
Direction is set between two opposite frames of the frame.
8. preparation method according to claim 7, which is characterized in that first mask strip pair that the basis has been arranged
First mask strip to be placed compensates, using the second mask strip or first mask strip being arranged as contraposition reference
Compensated first mask strip to be placed is aligned, in the adjacent area for first mask strip being arranged,
First mask strip to be placed after contraposition is set between two opposite frames of the frame along first direction, packet
It includes:
When at least one remaining described first mask strip include second to the first mask strip described in m-th when, to second
It is successively performed the following operations to the first mask strip described in m-th:
According to first be arranged first mask strip, second first mask strip to be placed is compensated；
It is contraposition reference to compensated second described first using second mask strip or first first mask strip
Mask strip is aligned；
In the adjacent area of first first mask strip, by second first mask strip after contraposition along described first
Direction is set between two opposite frames of the frame；
According to the N-2 being arranged first mask strips or N-1 first mask strips, to n-th to be placed
First mask strip compensates；
It is contraposition reference to compensated n-th institute using N-2 first mask strips or N-1 first mask strips
The first mask strip is stated to be aligned, or using the second mask strip as contraposition reference first mask strip described in compensated n-th into
Row contraposition；
In the adjacent area of N-2 first mask strips or N-1 first mask strips, by the n-th after contraposition
First mask strip is set between two opposite frames of the frame along the first direction；
3≤N≤M, M and N are integer.
9. preparation method according to claim 8, which is characterized in that be arranged first described first of the basis covers
Film item compensates second first mask strip to be placed, comprising:
First first mask strip being arranged is measured relative to first reference position in said first direction inclined
Shifting amount；
Determine first mask strip of to be placed second in institute according to the offset of first first mask strip
State the offset on first direction；
And described using second mask strip or first first mask strip is contraposition reference to compensated second
First mask strip is aligned, comprising:
According to the offset of second first mask strip, with second mask strip or first first exposure mask
Item is that contraposition reference aligns compensated second first mask strip.
10. preparation method according to claim 8, which is characterized in that N-2 described first that the basis has been arranged
Mask strip or N-1 first mask strips, first mask strip described in n-th to be placed compensate, comprising:
The N-2 that has been arranged first mask strips are measured relative to the N-2 reference position in said first direction
N-1 first mask strips that offset or measurement have been arranged are relative to the N-1 reference position in the first direction
On offset；
According to the institute of the offset of a first mask strip of the N-2 or the N-1 first mask strips
Offset is stated, determines the offset of the first mask strip in said first direction described in n-th to be placed；
And according to N-2 first mask strips or N-1 first mask strips described in compensated n-th
First mask strip is aligned, comprising:
The offset of the first mask strip according to n-th, it is described with N-2 first mask strips or N-1
First mask strip is that contraposition reference first mask strip described in n-th aligns；
And it is aligned according to the second mask strip first mask strip described in compensated n-th, comprising:
The offset of the first mask strip according to n-th is contraposition reference described in n-th using second mask strip
First mask strip is aligned.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910544833.7A CN110129722A (en) | 2019-06-21 | 2019-06-21 | Mask plate component and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910544833.7A CN110129722A (en) | 2019-06-21 | 2019-06-21 | Mask plate component and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
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| CN110129722A true CN110129722A (en) | 2019-08-16 |
Family
ID=67579022
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910544833.7A Pending CN110129722A (en) | 2019-06-21 | 2019-06-21 | Mask plate component and preparation method thereof |
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| CN (1) | CN110129722A (en) |
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| CN111218645A (en) * | 2020-02-28 | 2020-06-02 | 云谷（固安）科技有限公司 | Mask plate screen tensioning method, mask plate screen tensioning device and mask plate |
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