CN109825802A - Mask plate and preparation method thereof - Google Patents
Mask plate and preparation method thereof Download PDFInfo
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- CN109825802A CN109825802A CN201910286060.7A CN201910286060A CN109825802A CN 109825802 A CN109825802 A CN 109825802A CN 201910286060 A CN201910286060 A CN 201910286060A CN 109825802 A CN109825802 A CN 109825802A
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Abstract
The embodiment of the present invention provides a kind of mask plate and preparation method thereof, is related to evaporation coating technique field, can improve the mixed color phenomenon of mask plate angular position, improves product yield.A kind of preparation method of mask plate, comprising: multiple first mask strips are successively spaced and are fixed on the first mask plate framework, each first mask strips are located at the hollow region of the first mask plate framework, and the both ends of the first mask strips are fixed with the first mask plate framework；Except near the first mask plate framework first while and two the first mask strips when second in addition to, the extending direction of remaining the first mask strips is parallel with the first side of the first mask plate framework, and first is opposite while with second；Respectively close to first while and the first mask strips when second be obliquely installed with respect to remaining first mask strips, and tilt angle is calculated according to evaporation deviation.
Description
Technical field
The present invention relates to evaporation coating technique field more particularly to mask plates and preparation method thereof.
Background technique
By taking organic electroluminescent LED (Organic Light Emitting Diode, OLED) display as an example, have
Machine luminous material layer is typically all to be formed by carrying out vacuum vapor plating to organic material.Wherein, independent for RGB sub-pixel
Luminous OLED, since each RGB sub-pixel uses different luminous organic materials, thus the organic luminous layer of RGB sub-pixel
It needs to be deposited respectively, generally controls plated film position of the organic material on substrate using fine mask plate in the process
It sets, corresponding organic material is then successively deposited in each subpixel area.
Summary of the invention
The embodiment of the present invention provides a kind of mask plate and preparation method thereof, can improve the colour mixture of mask plate angular position
Phenomenon improves product yield.
In order to achieve the above objectives, the embodiment of the present invention adopts the following technical scheme that
On the one hand, a kind of preparation method of mask plate is provided, comprising: multiple first mask strips are successively spaced and are fixed on
On one mask plate framework, wherein each first mask strips are located at the hollow region of the first mask plate framework, and
The both ends of first mask strips are fixed with the first mask plate framework；Except near the first of the first mask plate framework
While and two the first mask strips when second outside, the extending direction of remaining first mask strips and the first mask plate framework
First side it is parallel, described first is opposite while with described second；Respectively close to described first while and it is described second while
First mask strips are obliquely installed with respect to the first mask strips described in remaining, and tilt angle is calculated according to evaporation deviation.
Optionally, the direction on relatively described first side, respectively close to described first while and it is described second while described first
Mask strips respectively turn an angle clockwise or counterclockwise and are inclined to set.
Optionally, respectively close to described first while and it is described second while first mask strips tilt angle by such as
Lower method obtains: carrying out evaporation process using test mask plate, wherein the test mask plate includes the first mask sheet frame
Frame and multiple intervals and the second mask strips disposed in parallel；Of the number of second mask strips and first mask strips
Number is equal, and the extending direction of second mask strips is parallel with the first side of the first mask plate framework；It is passed by image
Second mask strips that sensor obtains close to first side extend along the coordinate in two vapor deposition holes of direction both sides of the edge,
Respectively (x1, y1) and (x2, y2)；And second mask strips obtained close to second side extend along direction two
The coordinate in two vapor deposition holes of side edge, respectively (x3, y3) and (x4, y4)；It is obtained and this four steamings by imaging sensor
The coordinate of the corresponding vapor deposition pattern of plated hole；The corresponding vapor deposition pattern of coordinate and this four vapor deposition holes in hole is deposited according to this four
Coordinate, be calculated this four vapor deposition holes in it is each vapor deposition hole vapor deposition after deviations；By inclined after the vapor deposition of each vapor deposition hole
The coordinate that this four are deposited hole is modified to (x1 ', y1 '), (x2 ', y2 '), (x3 ', y3 '), (x4 ', y4 ') by difference respectively；According to
Coordinate (x1 ', y1 ') and (x2 ', y2 ') obtain the tilt angle of first mask strips close to first side；According to seat
It marks (x3 ', y3 ') and (x4 ', y4 '), obtains the tilt angle of first mask strips close to second side.
It is further alternative, according to coordinate (x1 ', y1 ') and (x2 ', y2 '), obtain described the close to first side
The tilt angle of one mask strips, comprising: using the central point of second mask strips close to first side as origin, establish straight
Angular coordinate system, wherein the direction on the first side is X-direction, and the direction vertical with the direction on the first side is Y direction；According to seat
The position of mark (x1 ', y1 ') obtains the corresponding coordinate in the position (x1 ", y1 ") in the rectangular coordinate system；According to (x2 ', y2 ')
Position obtain the corresponding coordinate in the position (x2 ", y2 ") in the rectangular coordinate system；Close to described the first of first side
The tilt angle of mask stripsWherein, a is the correction factor of screen-tensioning machine.
Optionally, according to coordinate (x3 ', y3 ') and (x4 ', y4 '), first mask close to second side is obtained
The tilt angle of item, comprising: using the central point of second mask strips close to second side as origin, establish rectangular co-ordinate
System, wherein the direction on the first side is X-direction, and the direction vertical with the direction on the first side is Y direction；According to coordinate (x3 ',
Y3 ') position obtain the corresponding coordinate in the position (x3 ", y3 ") in the rectangular coordinate system；According to the position of (x4 ', y4 '),
In the rectangular coordinate system, the corresponding coordinate in the position (x4 ", y4 ") is obtained；First mask strips on close second side
Tilt angleWherein, a is the correction factor of screen-tensioning machine.
Optionally, second mask strips close to first side extend along two vapor deposition holes of direction both sides of the edge
Shape, from second mask strips other vapor deposition the shapes in hole it is different；Close to second mask strips edge on second side
The shape in two vapor deposition holes of its extending direction both sides of the edge is different from other vapor deposition shapes in hole in second mask strips.
Optionally, before each first mask strips are fixed on the first mask plate framework, the mask plate
Preparation method further include: the first mask plate framework is aligned.
It is further alternative, the first mask plate framework is aligned, comprising: described in being obtained by imaging sensor
The coordinate of multiple alignment marks on first mask plate framework；According to the coordinate and theoretical coordinate of each alignment mark, sentence
Break each alignment mark at a distance from theoretical coordinate corresponding position whether within a preset range, if so, contraposition terminate；If
No, the board for controlling screen-tensioning machine is mobile, until each alignment mark is at a distance from theoretical coordinate corresponding position in default model
In enclosing.
Optionally, the board for controlling screen-tensioning machine is mobile, until each alignment mark and theoretical coordinate corresponding position
Distance is within a preset range, comprising: and the board for controlling screen-tensioning machine is mobile, and the every movement of board is primary, carries out a deterministic process,
Until each alignment mark at a distance from theoretical coordinate corresponding position within a preset range；Wherein, the deterministic process packet
It includes: obtaining the coordinate of multiple alignment marks on the first mask plate framework；According to the coordinate of each alignment mark with
Within a preset range whether theoretical coordinate judge each alignment mark at a distance from theoretical coordinate corresponding position.
On the other hand, a kind of mask plate is provided, comprising: the first hollow mask plate framework and multiple spaced first
Mask strips, each first mask strips are located at the hollow region of the first mask plate framework, and first mask strips
Both ends fixed with the first mask plate framework；Except near the first mask plate framework first while and when second two
Outside a first mask strips, first side of the extending direction of remaining first mask strips and the first mask plate framework is flat
Row, described first is opposite while with described second；Respectively close to described first while and it is described second while first mask strips
Remaining opposite described first mask strips are obliquely installed, and tilt angle is calculated according to evaporation deviation.
Optionally, the direction on relatively described first side, respectively close to described first while and first mask when second
Item respectively turns an angle clockwise or counterclockwise and is inclined to set.
Optionally, the mask plate is prepared by the preparation method of above-mentioned mask plate.
In another aspect, providing a kind of preparation method of mask plate, comprising: repeat the contraposition of the second mask plate framework with
And the step of each third mask strips are fixed on the second mask plate framework；The second mask plate framework is carried out pair
Position, comprising: the second mask plate framework is fixed on the board of screen-tensioning machine；Second mask plate is obtained by imaging sensor
The coordinate of multiple alignment marks on frame；According to the coordinate and theoretical coordinate of each alignment mark, judge each described
Alignment mark at a distance from theoretical coordinate corresponding position whether within a preset range, if so, contraposition terminate；If it is not, control
The board of net machine is mobile, until each alignment mark at a distance from theoretical coordinate corresponding position within a preset range；By
Three mask strips are fixed on the second mask plate framework, comprising: the third mask strips are located at the second mask sheet frame
The hollow region of frame fixes the both ends of the third mask strips with the second mask plate framework.
Optionally, the board for controlling screen-tensioning machine is mobile, until each alignment mark and theoretical coordinate corresponding position
Distance is within a preset range, comprising: and the board for controlling screen-tensioning machine is mobile, and the every movement of board is primary, carries out a deterministic process,
Until each alignment mark at a distance from theoretical coordinate corresponding position within a preset range；Wherein, the deterministic process packet
It includes: obtaining the coordinate of multiple alignment marks on the second mask plate framework；According to the coordinate of each alignment mark with
Within a preset range whether theoretical coordinate judge each alignment mark at a distance from theoretical coordinate corresponding position.
Another aspect provides a kind of mask plate, is prepared by the preparation method of above-mentioned mask plate.
The mask plate and preparation method thereof that the embodiment of the present invention provides, is calculated tilt angle using evaporation deviation,
To when throwing the net, make respectively near first while and the first mask strips when second fixed with the first side angle tilt angle
It is fixed on the first mask plate framework on the first mask plate framework, remaining first mask strips is parallel with the first side.Pass through change
Respectively near first while and the first mask strips when second set-up mode, and then compensate respectively near the first side and second
The evaporation deviation that first mask strips on side generate during vapor deposition realizes location of pixels Accuracy Matching, improves mask plate angle position
The mixed color phenomenon at place is set, product yield is improved.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
Some embodiments of invention for those of ordinary skill in the art without creative efforts, can be with
It obtains other drawings based on these drawings.
Fig. 1 is a kind of flow chart of the preparation method of mask plate provided by the invention；
Fig. 2 is a kind of structural schematic diagram of mask plate provided by the invention；
Fig. 3 is the structural schematic diagram of another mask plate provided by the invention；
Fig. 4 be it is provided by the invention obtain respectively close to first while and first mask strips when second tilt angle
Flow chart；
Fig. 5 is a kind of structural schematic diagram for testing mask plate provided by the invention；
Fig. 6 be it is provided by the invention according to coordinate (x1 ', y1 ') and (x2 ', y2 '), obtain described the of close first side
The flow chart of the tilt angle of one mask strips；
Fig. 7 is that second mask strips on close first side provided by the invention compensate the structural schematic diagram after evaporation deviation；
Fig. 8 be it is provided by the invention according to coordinate (x3 ', y3 ') and (x4 ', y4 '), obtain described the of close second side
The flow chart of the tilt angle of one mask strips；
Fig. 9 is that second mask strips on close second side provided by the invention compensate the structural schematic diagram after evaporation deviation；
Figure 10 is a kind of structural schematic diagram of first mask plate framework provided by the invention；
Figure 11 is the flow chart provided by the invention aligned to the first mask plate framework；
Figure 12 is the flow chart of the coordinate judgement provided by the invention to multiple alignment marks on the first mask plate framework；
Figure 13 is the flow chart provided by the invention aligned to the second mask plate framework；
The flow chart of the position Figure 14 coordinate judgement provided by the invention to multiple alignment marks on the second mask plate framework.
Appended drawing reference
01- mask plate；02- tests mask plate；10- the first mask plate framework；11- hollow region；12- carrier strip；13- pairs
Position label；The first mask strips of 21-；The second mask strips of 22-；Hole is deposited in 40-；The first side 101-；The second side 102-；103- third
Side；The 4th side 104-.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
In the related technology, multiple mask strips in mask plate are arranged in parallel, such as each mask strips are prolonged in the horizontal direction
It stretches.The mask plate is for being deposited path when meeting is due in contraposition deviation and evaporation material vapor deposition to substrate in evaporation process
Offset, and there are problems that the position in hole and vapor deposition pattern are deposited on mask plate deviation occurs.Especially mask plate Angle Position
The deviation that the pattern of hole vapor deposition is deposited is maximum, leads to mixed color phenomenon occur, has seriously affected product yield.
Wherein, the reason of mixed color phenomenon occur is, vapor deposition has exceeded the plated film of its script to the evaporation material on substrate
Position (i.e. theoretical vapor deposition position), and be deposited into adjacent subpixels.In evaporation process, when vapor deposition offset is more than 1/
When 2pdlgap (half of two pel spacings), that is, think that deviation is larger, mixed color phenomenon occurs.
In the related technology, by the way that mask strips translation can be compensated the offset issue during being deposited, but this method is difficult to
According to location of pixels precision on substrate to be deposited (Pixel Position Accuracy, PPA), realize that matching is thrown the net.
In order to solve mixed color phenomenon above-mentioned, the present invention provides a kind of preparation method of mask plate, as shown in Figure 1, comprising:
S10, it is fixed on the first mask plate framework 10 as shown in Fig. 2, multiple first mask strips 21 are successively spaced,
In, each first mask strips 21 are located at the hollow region 11 of the first mask plate framework 10, and described first covers
The both ends of mould item 21 and the first mask plate framework 10 are fixed.
Interval between adjacent first mask strips 21 corresponds to the cutting region on substrate to be deposited.
For the first mask plate framework 10 hollow region 11 shape without limitation, the shape of hollow region 11 can root
It is configured according to needs.
In some embodiments, as shown in Fig. 2, the shape of the hollow region 11 of the first mask plate framework 10 is rectangle.
On this basis, the first mask plate framework 10 can be formed by integrated processing technology.Alternatively, the first mask sheet frame
Frame 10 is spliced to form by four independent opposite side.Wherein, whole when the use of the first mask plate framework 10, which is integrally machined molding, to be formed
Precision is higher, and error is smaller.
The both ends of first mask strips 21 can be weldingly fixed on the first mask plate framework 10 by screen-tensioning machine.First mask
The material of item 21 and the first mask plate framework 10 can be metal or alloy.Wherein, multiple steamings are provided in the first mask strips 21
Plated hole 40.
S20, except near the first mask plate framework 10 first at 101 and second 102 two the first mask strips 21
Outside, the extending direction of remaining first mask strips 21 is parallel with the first side 101 of the first mask plate framework 10, the first side 101
It is opposite with the second side 102.
It is understood that all first mask strips 21 are successively arranged along the direction on vertical first side 101.Near first
The first of mask plate framework 10 at 101 and second 102 two the first mask strips 21, i.e., this two the first mask strips 21 are at this
It is located at the most two sides along the direction on vertical first side 101 in all first mask strips 21 of mask plate.
Exemplary, the first side 101 can be horizontally extending, alternatively, the first side 101 extends along the vertical direction.
In some embodiments, first while 101 with second while it is 102 parallel.
It include two pairs of parallel opposite side with the first mask plate framework 10, and for this four opposite side are sequentially connected, such as Fig. 2 institute
Show, the shorter opposite side of one pair of them can be for first at 101 and second 102, and another pair of longer opposite side can be third
At 103 and the 4th 104.Wherein, first while 101 with third while 103 can be vertically arranged, in the case, the first mask plate
The shape of the hollow region 11 of frame 10 is rectangle.
S30, respectively close to first at 101 and second 102 remaining opposite described first mask strips of the first mask strips 21
21 are obliquely installed, and tilt angle is calculated according to evaporation deviation.
Evaporation deviation, that is, the deviation between theory vapor deposition position and practical vapor deposition position.
In the preparation method for the mask plate 01 that the embodiment of the present invention provides, inclination angle is calculated using evaporation deviation
Degree, thus when throwing the net, make respectively near first at 101 and second 102 101 angle of the first mask strips 21 and the first side
It is fixed on the first mask plate framework 10 for tilt angle, remaining first mask strips 21 is parallel with the first side 101 to be fixed on first
On mask plate framework 10.By change respectively near first at 101 and second 102 the first mask strips 21 setting side
Formula, and then compensate the vapor deposition that 102 the first mask strips 21 generate during vapor deposition at 101 and second near first respectively
Deviation realizes location of pixels Accuracy Matching, improves the mixed color phenomenon of 01 angular position of mask plate, improves product yield.
In view of there is the position of colour mixture usually in the angular position of the diagonally opposing corner of substrate, therefore, optionally, with respect to first
The direction on side 101, respectively close to first at 101 and second 102 first mask strips 21 respectively along the clockwise or inverse time
Needle direction, which turns an angle, to be inclined to set.
It is understood that the certain angle that the first mask strips 21 close to the first side 101 rotate, as first mask
The tilt angle of item 21.The certain angle that first mask strips 21 close to the second side 102 rotate, as first mask strips 21
Tilt angle.
As shown in Fig. 2, when the lower left corner and the upper right corner of the position for colour mixture occur in substrate, respectively close to the first side 101
Certain angle is respectively rotated in the clockwise direction with first mask strips 21 on the second side 102.
As shown in figure 3, when the upper left corner and the lower right corner of the position for colour mixture occur in substrate, respectively close to the first side 101
It respectively turns an angle along direction counterclockwise with first mask strips 21 on the second side 102.
In embodiments of the present invention, by making, respectively close to first, at 101 and second, 102 the first mask strips 21 are respective
It turns an angle and is inclined to set clockwise or counterclockwise, evaporation deviation can be compensated, corresponding improvement first is covered
The mixed color phenomenon in the lower left corner and the upper right corner of mold framework 10 or the upper left corner and lower right corner angular position.
Optionally, in above-mentioned S30 respectively close to first at 101 and second 102 first mask strips 21 inclination
Angle, as shown in figure 4, obtaining by the following method:
S31, as shown in connection with fig. 5 carries out evaporation process using test mask plate 02, wherein the packet of test mask plate 02
The first mask plate framework 10 and multiple intervals and the second mask strips 22 disposed in parallel are included, second mask strips 22
Number is equal with the number of first mask strips 21, and the extending direction of second mask strips 22 and first mask plate
First side 101 of frame 10 is parallel.
That is, mask plate framework used in test mask plate 02 and mask plate 01 of the invention is identical mask plate framework.
In some embodiments, for test mask plate 02 and mask plate 01 of the invention, in the first mask plate framework 10
Same position, the second mask strips 22 at least have vapor deposition hole 40 identical with the first mask strips 21.Herein, identical vapor deposition hole
40 refer to that position, size are all the same.
In view of subsequent the second mask strips 22 for needing to obtain close first side 101 extend along the two of direction both sides of the edge
A vapor deposition hole 40, second mask strips 22 close to the second side 102 extend along two vapor deposition holes 40 of direction both sides of the edge,
The coordinate of the corresponding vapor deposition pattern in this four vapor deposition holes 40.Therefore, in some embodiments, as shown in figure 5, can make close to the
101 the second mask strips 22 extend along the shape in two vapor deposition holes 40 of direction both sides of the edge on one side, with second mask strips
The shape in other vapor deposition holes 40 is different in 22；The second mask strips 22 close to the second side 102 extend along direction both sides of the edge
The shape in two vapor deposition holes 40 is different from other vapor deposition shapes in hole 40 in second mask strips 22.
For example, as shown in figure 5, the second mask strips 22 close to the first side 101 extend along two of direction both sides of the edge
Hole 40 is deposited, second mask strips 22 close to the second side 102 extend along two vapor deposition holes 40 of direction both sides of the edge, this
The shape of four vapor deposition holes 40 (i.e. using four vapor deposition holes 40 of A, B, C and D mark in Fig. 5) is quadrangle, and other vapor deposition holes
40 shape is hexagon.
It on this basis, can be close to the first side 101 as shown in figure 5, the second mask strips 22 close to the first side 101
The first mask strips 21 on the basis of, in its extending direction both sides of the edge two additional vapor deposition holes 40 of production (such as in Fig. 5 with
A and B mark), obtain second mask strips 22.Wherein, this two vapor depositions hole A, B can be located at this close to the second of the first side 101
At the diagonally opposing corner position of mask strips 22.Based on this, this two vapor depositions hole A, B are above-mentioned 22 side of extending along of the second mask strips
To two vapor deposition holes 40 of both sides of the edge.
It similarly, can be in the first mask strips 21 close to the second side 102 close to second mask strips 22 on the second side 102
On the basis of, two additional vapor deposition holes 40 (such as C and D in Fig. 5) of production in its extending direction both sides of the edge, obtain this second
Mask strips 22.Wherein, this two vapor depositions hole C, D can be positioned at the diagonally opposing corner positions of second mask strips 22 close to the second side 102
Place.Based on this, this two vapor depositions hole C, D are two vapor depositions that the second above-mentioned mask strips 22 extend along direction both sides of the edge
Hole 40.
Wherein, it is contemplated that this four additional vapor deposition holes 40 are the evaporation deviations in order to measure other vapor deposition holes 40, in order to
Measurement is more accurate, and therefore, this four vapor deposition hole A, B, C, D vapor deposition hole 40 vertical ranges nearest with it are respectively less than and are equal to 1um.
The second mask strips 22 by making close first side 101 extend along two vapor deposition holes 40 of direction both sides of the edge
Shape, it is different from other vapor deposition shapes in hole 40 in second mask strips 22, and, make the second mask close to the second side 102
Item 22 extends along the shape in two vapor deposition holes 40 of direction both sides of the edge, with other vapor deposition holes 40 in second mask strips 22
Shape is different, is conducive to imaging sensor and is identified according to shape, grabs its coordinate.
S32, direction two sides are extended along by second mask strips 22 that imaging sensor is obtained close to the first side 101
The coordinate in two vapor deposition holes 40 at edge, respectively (x1, y1) and (x2, y2)；And it obtains close to the described of the second side 102
Second mask strips 22 extend along the coordinate in two vapor deposition holes 40 of direction both sides of the edge, respectively (x3, y3) and (x4, y4).
Imaging sensor for example can be charge-coupled device (Charge Couple Device, CCD) imaging sensor.
Herein, as shown in connection with fig. 5, second mask strips 22 close to the first side 101 extend along direction both sides of the edge
Two vapor deposition holes 40, i.e., vapor deposition hole A and vapor deposition hole B, vapor deposition hole A coordinate be (x1, y1), vapor deposition hole B coordinate be (x2,
y2).Second mask strips 22 close to the second side 102 extend along two vapor deposition holes 40 of direction both sides of the edge, that is, are deposited
Hole C and vapor deposition hole D, the coordinate of vapor deposition hole C are (x3, y3), and the coordinate of vapor deposition hole D is (x4, y4).The seat of hole A, B, C and D is deposited
It is marked on the basis of the absolute coordinate of screen-tensioning machine and is obtained.
S33, the coordinate that vapor deposition pattern corresponding with this four vapor deposition holes 40 is obtained by imaging sensor.
In conjunction with Fig. 5, it is assumed that the corresponding vapor deposition pattern of four vapor deposition holes A, B, C and D is respectively a, b, c and d, then, vapor deposition figure
The coordinate of case a is (m1, n1), and the coordinate of vapor deposition pattern b is (m2, n2), and the coordinate of vapor deposition pattern c is (m3, n3), and pattern is deposited
The coordinate of d is (m4, n4).
The coordinate of S34, the corresponding vapor deposition pattern of the coordinate that hole 40 is deposited according to this four and this four vapor deposition holes 40, meter
It calculates and obtains the deviation in this four vapor deposition holes 40 after the vapor deposition of each vapor deposition hole 40.
According to the coordinate of A and a, the deviation after vapor deposition hole A vapor deposition is calculated is △ A (x1-m1, y1-n1).
Similarly, according to the coordinate of B and b, the deviation after vapor deposition hole B vapor deposition is calculated is △ B (x2-m2, y2-n2).
According to the coordinate of C and c, the deviation after vapor deposition hole C vapor deposition is calculated is △ C (x3-m3, y3-n3).
According to the coordinate of D and d, the deviation after vapor deposition hole D vapor deposition is calculated is △ D (x4-m4, y4-n4).
S35, by it is each vapor deposition hole vapor deposition after deviation, by this four be deposited holes coordinate be modified to respectively (x1 ',
Y1 '), (x2 ', y2 '), (x3 ', y3 '), (x4 ', y4 ').
A with △ A is added to the revised coordinate (x1 ', y1 ') that can obtain vapor deposition hole A, at this point, x1 '=x1+x1-m,
1y1 '=y1+y1-n1.
Similarly, the vapor deposition revised coordinate of hole B (x2 ', y2 ') can be obtained by B with △ B being added, at this point, x2 '=x2+x2-
M, 2y2 '=y2+y2-n2.
C with △ C, which is added, can obtain the vapor deposition revised coordinate of hole C (x3 ', y3 '), at this point, x3 '=x3+x3-m, 3y3 '
=y3+y3-n3.
D with △ D, which is added, can obtain the vapor deposition revised coordinate of hole D (x4 ', y4 '), at this point, x4 '=x4+x4-m, 4y4 '
=y4+y4-n4.
S36, according to coordinate (x1 ', y1 ') and (x2 ', y2 '), obtain first mask strips close to the first side 101
Tilt angle；According to coordinate (x3 ', y3 ') and (x4 ', y4 '), the inclination of first mask strips close to the second side 102 is obtained
Angle.
According to coordinate (x1 ', y1 ') and (x2 ', y2 '), it can be obtained the second mask strips 22 close to the first side 101 and compensate
The angle for needing to change when evaporation deviation, that is, the tilt angle of first mask strips 21 on close first side in the present invention.
According to coordinate (x3 ', y3 ') and (x4 ', y4 '), it can be obtained the second mask strips 22 close to the second side 102 and compensate
The angle for needing to change when evaporation deviation, that is, the tilt angle of first mask strips 21 on close second side 102 in the present invention.
In an embodiment of the present invention, using on test mask plate 02 close to first at 101 and second 102 and with first
The second parallel mask strips 22 of first side 101 of mask frame 10 obtain this close to the first side 101 and the by imaging sensor
Two sides 102 22 top edge of the second mask strips vapor deposition hole 40 coordinate with it is corresponding vapor deposition pattern coordinate, calculate vapor deposition partially
Difference obtains the edge vapor deposition revised coordinate in hole 40 on this basis after compensating evaporation deviation.Thus it is leaned on respectively
Nearly first at 101 and second 102 the first mask strips 21 tilt angle.
Optionally, according to coordinate (x1 ', y1 ') and (x2 ', y2 '), first mask strips close to the first side 101 are obtained
21 tilt angle, as shown in Figure 6, comprising:
S361, as shown in connection with fig. 7 is established using the central point of second mask strips 22 close to the first side 101 as origin
Rectangular coordinate system, wherein the direction on the first side 101 is X-direction, and the direction vertical with the direction on the first side 101 is Y-axis side
To.
According to the preset length of the second mask strips 22 and width, imaging sensor can obtain the central point of the second mask strips 22.
S362, according to the position of coordinate (x1 ', y1 '), in the rectangular coordinate system, obtain the corresponding coordinate in the position (x1 ",
y1″)；According to the position of (x2 ', y2 '), in the rectangular coordinate system, the corresponding coordinate in the position (x2 ", y2 ") is obtained.
Since the coordinate of revised A ', B ' are established with the absolute coordinate of screen-tensioning machine, thus with close to the first side 101
The center of the second mask strips 22 when establishing rectangular coordinate system as origin, the coordinate of corresponding A " and B " need to be obtained.
S363, close to the first side 101 first mask strips 21 tilt angleWherein, a is the correction factor of screen-tensioning machine.
Calculate separately out the line of the line of A " and origin and the angle of X-axis, B " and origin and the angle of X-axis, ask its two
The average value of a angle is that the second mask strips 22 close to the first side 101 compensate the theoretical tilt angle that evaporation deviation needs to change
Degree, the correction factor multiplied by screen-tensioning machine are the tilt angle of the first mask strips 21 close to the first side 101.
The correction factor of screen-tensioning machine, that is, actual tilt of first mask strips 21 on close first side 101 during throwing the net
The ratio of angle and theoretical tilt angle.During throwing the net, since the operation of screen-tensioning machine causes tilt angle certain miss occur
Difference, therefore, it is necessary to correction factors to be modified theoretical tilt angle.When different screen-tensioning machines are thrown the net, correction factor is different.
In an embodiment of the present invention, it by the angle of the line and X-axis of coordinates computed (x1 ", y1 ") and origin, and counts
The line of coordinate (x2 ", y2 ") and origin and the angle of X-axis are calculated, takes the average value of the two multiplied by the correction factor of screen-tensioning machine,
Obtain the tilt angle of the first mask strips 21 close to the first side 101.
Optionally, according to coordinate (x3 ', y3 ') and (x4 ', y4 '), first mask strips close to the second side 102 are obtained
Tilt angle, as shown in Figure 8, comprising:
S364, as shown in connection with fig. 9 is established using the central point of second mask strips 22 close to the second side 102 as origin
Rectangular coordinate system, wherein the direction on the first side 101 is X-direction, and the direction vertical with the direction on the first side 101 is Y-axis side
To.
Herein, for how to determine central point, with above-mentioned determination in second mask strips 22 on the first side 101
Heart point is similar, and details are not described herein.
S365, according to the position of coordinate (x3 ', y3 '), in the rectangular coordinate system, obtain the corresponding coordinate in the position (x3 ",
y3″)；According to the position of (x4 ', y4 '), in the rectangular coordinate system, the corresponding coordinate in the position (x4 ", y4 ") is obtained.
Since the coordinate of revised C ', D ' are established with the absolute coordinate of screen-tensioning machine, thus with close to the second side 102
The center of the second mask strips 22 when establishing rectangular coordinate system as origin, the coordinate of corresponding C " and D " need to be obtained.
S366, close to the second side 102 first mask strips 21 tilt angleWherein, a is the correction factor of screen-tensioning machine.
Calculate separately out the line of the line of C " and origin and the angle of X-axis, D " and origin and the angle of X-axis, ask its two
The average value of a angle is that the second mask strips 22 close to the second side 102 compensate the theoretical tilt angle that evaporation deviation needs to change
Degree, the correction factor multiplied by screen-tensioning machine are the tilt angle of the first mask strips 21 close to the second side 102.
In an embodiment of the present invention, it by the angle of the line and X-axis of coordinates computed (x3 ", y3 ") and origin, and counts
The line of coordinate (x4 ", y4 ") and origin and the angle of X-axis are calculated, takes the average value of the two multiplied by the correction factor of screen-tensioning machine,
Obtain the tilt angle of the first mask strips 21 close to the second side 102.
On this basis, during preparing mask plate, since the first mask strips 21 have certain tension in production,
Introversive destruction of edition type occurs after being bonded with the first mask plate framework 10.When the first mask strips 21 and the first mask plate framework 10 are pasted
When conjunction, every to fix first mask strips 21, the first mask plate framework 10 can all generate certain deformation, therefore fitting all needs every time
It is aligned, to improve aligning accuracy.
Therefore, optionally, before each first mask strips 21 are fixed on the first mask plate framework 10,
That is, before S10, the preparation method of the mask plate 01 further include: the first mask plate framework 10 is aligned.
As shown in Figure 10, the first mask plate framework 10 includes two carrier strips 12, and two carrier strips 12 are located at
The opposite sides of one mask plate framework 10 is provided with multiple alignment marks 13 in carrier strip 12.
Alignment mark can be through-hole or figure etc..The figure of alignment mark can be solid cruciform shape, hollow cross
Shape, annulus shape, filled circles shape etc..Certainly, the embodiment of the present invention is not limited to above situation, can also be other energy
It is made on the first mask frame 10, and can be all belonged to the scope of protection of the present invention by what sensor identified.
In the related technology, contraposition when by imaging sensor obtain alignment mark 13 coordinate, calculate its average value with
The difference of theoretical coordinate average value, judge difference whether control in a certain range and accordingly screen-tensioning machine board continue contraposition or
Terminate contraposition.
It is exemplary, if asking the average value of its four coordinates and the average value of four theoretical coordinates there are four alignment mark
Difference.The method of the difference of the existing coordinate for calculating alignment mark and theoretical coordinate is easy the maximum error of individual alignment marks
The average error at four alignment marks, this method error are larger.
And in the present invention, the first mask plate framework 10 is aligned, as shown in figure 11, comprising:
S1, the coordinate that multiple alignment marks on the first mask plate framework 10 are obtained by imaging sensor.
S2, according to the coordinate and theoretical coordinate of each alignment mark, judge each alignment mark and theoretical sit
Mark corresponding position distance whether within a preset range, if so, execute S3, if it is not, execute S4.
Exemplary, preset range can be 0~1um.
The coordinate for obtaining an alignment mark is P (u, v), and theoretical coordinate is P ' (u ', v '), calculates the coordinate of alignment mark
The coordinate difference of P (u, v) and theoretical coordinate P ' (u ', v ') are △ P (u-u ', v-v '), then can pass through formulaP and theoretical coordinate P ' distance L are obtained, judges distance L whether within a preset range.
S3, contraposition terminate.
S4, the board for controlling screen-tensioning machine are mobile, until each alignment mark is at a distance from theoretical coordinate corresponding position
Within a preset range.
In an embodiment of the present invention, according to the coordinate and theoretical coordinate of each alignment mark, by controlling each contraposition
Label all within a preset range, reduces the error of the coordinate of each alignment mark at a distance from theoretical coordinate corresponding position, right
Position is more accurate.
Optionally, S4 controls the board movement of screen-tensioning machine, until each alignment mark and theoretical coordinate corresponding position
Distance within a preset range, comprising: the board for controlling screen-tensioning machine is mobile, and the every movement of board is primary, and progress once judged
Journey, until each alignment mark at a distance from theoretical coordinate corresponding position within a preset range.
Wherein, as shown in figure 12, the deterministic process includes:
S41, the coordinate for obtaining multiple alignment marks on the first mask plate framework 10.
S42, according to the coordinate and theoretical coordinate of each alignment mark, judge each alignment mark and theoretical sit
Whether within a preset range to mark the distance of corresponding position.
In an embodiment of the present invention, by judge each alignment mark at a distance from theoretical coordinate corresponding position whether
In preset range, to control whether board moves, until board is moved to each alignment mark and theoretical coordinate corresponding position
Distance within a preset range so that it is subsequent throw the net it is more accurate.
The embodiment of the present invention also provides a kind of mask plate 01, as shown in Figures 2 and 3, comprising: the first hollow mask plate
Frame 10 and multiple spaced first mask strips 21, each first mask strips 21 are located at the first mask sheet frame
The hollow region 11 of frame 10, and the both ends of first mask strips 21 and the first mask plate framework 10 are fixed；Except near
At 101 and second outside 102 two the first mask strips 21, remaining described first is covered the first of the first mask plate framework 10
The extending direction of mould item 21 is parallel with the first side 101 of the first mask plate framework 10, and first is 102 opposite at 101 and second；Point
Close to first, at 101 and second, 102 first mask strips 21 are not obliquely installed with respect to remaining described first mask strips 21,
And tilt angle is calculated according to evaporation deviation.
Optionally, the direction on opposite first side 101, respectively close to first at 101 and second 102 first mask
Item 21 respectively turns an angle clockwise or counterclockwise and is inclined to set.
Optionally, the mask plate 01 is prepared by the preparation method of mask plate described above.
In the mask plate 01 that the embodiment of the present invention provides, the preparation method system of mask plate 01 described above is utilized
It is standby, tilt angle is calculated according to evaporation deviation so that respectively near first at 101 and second 102 first
Mask strips 21 and 101 angle of the first side are that tilt angle is fixed on the first mask plate framework 10, remaining first mask strips 21 with
First side 101 is fixed on the first mask plate framework 10 in parallel.By changing respectively near first at 101 and second 102
The first mask strips 21 fixation position, and then compensate respectively near first at 101 and second 102 the first mask strips 21
The evaporation deviation generated during vapor deposition realizes location of pixels Accuracy Matching, and the colour mixture for improving 01 angular position of mask plate is existing
As improving product yield.
The embodiment of the present invention also provides the preparation method of another mask plate, comprising: repeats the second mask sheet frame
The contraposition of frame and the step of each third mask strips are fixed on the second mask plate framework.
That is, will once be aligned when each third mask strips is fixed on the second mask plate framework.
Third mask strips can be fixed on the second mask plate framework in such a way that screen-tensioning machine welds.
The second mask plate framework is aligned, as shown in figure 13, comprising:
S100, the second mask plate framework is fixed on the board of screen-tensioning machine.
S200, the coordinate that multiple alignment marks on the second mask plate framework are obtained by imaging sensor.
S300, according to the coordinate and theoretical coordinate of each alignment mark, judge each alignment mark and theoretical
The distance of coordinate corresponding position whether within a preset range, if so, execute S400, if it is not, execute S500.
S400, contraposition terminate.
S500, the board for controlling screen-tensioning machine are mobile, until each alignment mark and theoretical coordinate corresponding position away from
From within a preset range.
Optionally, third mask strips are fixed on the second mask plate framework, comprising:
The third mask strips are located to the hollow region of the second mask plate framework, make the third mask strips
Both ends are fixed with the second mask plate framework.
It is every all once to be aligned when fixing a third mask strips in embodiment provided by the invention, and according to
The coordinate and theoretical coordinate of each alignment mark control each alignment mark at a distance from theoretical coordinate corresponding position default
In range, reduce the error of each coordinate, so that third mask strips attach to the position on the second mask plate framework more
Precisely, it realizes location of pixels Accuracy Matching, improves product yield.
Optionally, the board for controlling screen-tensioning machine is mobile, until each alignment mark and theoretical coordinate corresponding position
Distance is within a preset range, comprising:
The board for controlling screen-tensioning machine is mobile, and the every movement of board is primary, carries out a deterministic process, until each described right
Position marks at a distance from theoretical coordinate corresponding position within a preset range；
Wherein, as shown in figure 14, the deterministic process includes:
S501, the coordinate for obtaining multiple alignment marks on the second mask plate framework.
S502, according to the coordinate and theoretical coordinate of each alignment mark, judge each alignment mark and theoretical
Within a preset range whether the distance of coordinate corresponding position.
In embodiment provided by the invention, by judge each alignment mark at a distance from theoretical coordinate corresponding position whether
Within a preset range, control whether board moves, until board is moved to each alignment mark and theoretical coordinate corresponding position
Distance within a preset range so that it is subsequent throw the net it is more accurate.
The embodiment of the present invention also provides a kind of mask plate, is prepared by the preparation method of another mask plate above-mentioned
It arrives.
The above description is merely a specific embodiment, but scope of protection of the present invention is not limited thereto, any
Those familiar with the art in the technical scope disclosed by the present invention, can easily think of the change or the replacement, and should all contain
Lid is within protection scope of the present invention.Therefore, protection scope of the present invention should be based on the protection scope of the described claims.
Claims (12)
1. a kind of preparation method of mask plate characterized by comprising
Multiple first mask strips are successively spaced and are fixed on the first mask plate framework, wherein each first mask strips are equal
It is located at the hollow region of the first mask plate framework, and the both ends of first mask strips and the first mask plate framework
It is fixed；
Except near the first mask plate framework first while and two the first mask strips when second in addition to, remaining described first
The extending direction of mask strips is parallel with first side of the first mask plate framework, described first while and it is described second while phase
It is right；Respectively close to described first while and it is described second while first mask strips set with respect to remaining described first mask strips inclination
It sets, and tilt angle is calculated according to evaporation deviation.
2. the preparation method of mask plate according to claim 1, which is characterized in that the direction on relatively described first side, point
Not close to described first while and it is described second while first mask strips respectively rotation is certain clockwise or counterclockwise
Angle is inclined to set.
3. the preparation method of mask plate according to claim 1 or 2, which is characterized in that respectively close to first side and
The tilt angle of first mask strips on second side obtains by the following method:
Using test mask plate carry out evaporation process, wherein the test mask plate include the first mask plate framework and
Multiple intervals and the second mask strips disposed in parallel；The number phase of the number of second mask strips and first mask strips
Deng, and the extending direction of second mask strips is parallel with the first side of the first mask plate framework；
The two of direction both sides of the edge are extended along by second mask strips that imaging sensor is obtained close to first side
The coordinate in a vapor deposition hole, respectively (x1, y1) and (x2, y2)；And obtain second mask strips on close second side
Extend along the coordinate in two vapor deposition holes of direction both sides of the edge, respectively (x3, y3) and (x4, y4)；
The coordinate of vapor deposition pattern corresponding with this four vapor deposition holes is obtained by imaging sensor；
The coordinate of the corresponding vapor deposition pattern of the coordinate that hole is deposited according to this four and this four vapor deposition holes, is calculated this four
The deviation in hole after the vapor deposition of each vapor deposition hole is deposited；
By it is each vapor deposition hole vapor deposition after deviation, by this four be deposited holes coordinate be modified to respectively (x1 ', y1 '), (x2 ',
Y2 '), (x3 ', y3 '), (x4 ', y4 ')；
According to coordinate (x1 ', y1 ') and (x2 ', y2 '), the inclination angle of first mask strips close to first side is obtained
Degree；
According to coordinate (x3 ', y3 ') and (x4 ', y4 '), the inclination angle of first mask strips close to second side is obtained
Degree.
4. the preparation method of mask plate according to claim 3, which is characterized in that according to coordinate (x1 ', y1 ') and (x2 ',
Y2 '), obtain the tilt angle of first mask strips close to first side, comprising:
Using the central point of second mask strips close to first side as origin, rectangular coordinate system is established, wherein the first side
Direction be X-direction, the direction vertical with the direction on the first side be Y direction；
According to the position of coordinate (x1 ', y1 '), in the rectangular coordinate system, the corresponding coordinate in the position (x1 ", y1 ") is obtained；According to
The position of (x2 ', y2 ') obtains the corresponding coordinate in the position (x2 ", y2 ") in the rectangular coordinate system；
Close to the tilt angle of first mask strips on first sideWherein,
A is the correction factor of screen-tensioning machine.
5. the preparation method of mask plate according to claim 3, which is characterized in that according to coordinate (x3 ', y3 ') and (x4 ',
Y4 '), obtain the tilt angle of first mask strips close to second side, comprising:
Using the central point of second mask strips close to second side as origin, rectangular coordinate system is established, wherein the first side
Direction be X-direction, the direction vertical with the direction on the first side be Y direction；
According to the position of coordinate (x3 ', y3 '), in the rectangular coordinate system, the corresponding coordinate in the position (x3 ", y3 ") is obtained；According to
The position of (x4 ', y4 ') obtains the corresponding coordinate in the position (x4 ", y4 ") in the rectangular coordinate system；
Close to the tilt angle of first mask strips on second sideWherein,
A is the correction factor of screen-tensioning machine.
6. the preparation method of mask plate according to claim 3, which is characterized in that close to described the second of first side
Mask strips extend along the shape in two vapor deposition holes of direction both sides of the edge, the shape with other vapor deposition holes in second mask strips
It is different；
Second mask strips close to second side extend along the shape in two vapor deposition holes of direction both sides of the edge, with this
The shape in other vapor deposition holes is different in second mask strips.
7. the preparation method of mask plate according to claim 1, which is characterized in that consolidate by each first mask strips
Before the first mask plate framework, the preparation method of the mask plate further include:
The first mask plate framework is aligned.
8. the preparation method of mask plate according to claim 7, which is characterized in that carried out to the first mask plate framework
Contraposition, comprising:
The coordinate of multiple alignment marks on the first mask plate framework is obtained by imaging sensor；
According to the coordinate and theoretical coordinate of each alignment mark, each alignment mark position corresponding with theoretical coordinate is judged
The distance set whether within a preset range, if so, contraposition terminate；
If it is not, the board of control screen-tensioning machine is mobile, until each alignment mark at a distance from theoretical coordinate corresponding position
In preset range.
9. the preparation method of mask plate according to claim 8, which is characterized in that the board for controlling screen-tensioning machine is mobile, directly
To each alignment mark at a distance from theoretical coordinate corresponding position within a preset range, comprising:
The board for controlling screen-tensioning machine is mobile, and the every movement of board is primary, carries out a deterministic process, until each register guide
Remember at a distance from theoretical coordinate corresponding position within a preset range；
Wherein, the deterministic process includes:
Obtain the coordinate of multiple alignment marks on the first mask plate framework；
According to the coordinate and theoretical coordinate of each alignment mark, each alignment mark position corresponding with theoretical coordinate is judged
Within a preset range whether the distance set.
10. a kind of mask plate characterized by comprising hollow the first mask plate framework and multiple spaced first is covered
Mould item, each first mask strips are located at the hollow region of the first mask plate framework, and first mask strips
Both ends are fixed with the first mask plate framework；
Except near the first mask plate framework first while and two the first mask strips when second in addition to, remaining described first
The extending direction of mask strips is parallel with first side of the first mask plate framework, described first while and it is described second while phase
It is right；Respectively close to described first while and it is described second while first mask strips set with respect to remaining described first mask strips inclination
It sets, and tilt angle is calculated according to evaporation deviation.
11. mask plate according to claim 10, which is characterized in that the direction on relatively described first side, respectively close to institute
State first while and it is described second while first mask strips respectively turn an angle clockwise or counterclockwise in inclining
Tiltedly setting.
12. mask plate described in 0 or 11 according to claim 1, which is characterized in that the mask plate is appointed by claim 3-9
The preparation method of mask plate described in one is prepared.
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