CN109188856A - Mask plate framework, mask plate and preparation method thereof, screen-tensioning machine - Google Patents
Mask plate framework, mask plate and preparation method thereof, screen-tensioning machine Download PDFInfo
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- CN109188856A CN109188856A CN201811291504.8A CN201811291504A CN109188856A CN 109188856 A CN109188856 A CN 109188856A CN 201811291504 A CN201811291504 A CN 201811291504A CN 109188856 A CN109188856 A CN 109188856A
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- Prior art keywords
- alignment mark
- mask plate
- plate framework
- coordinate
- frame
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/042—Coating on selected surface areas, e.g. using masks using masks
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Screen Printers (AREA)
Abstract
The embodiment of the present invention provides a kind of mask plate framework, mask plate and preparation method thereof, screen-tensioning machine, is related to mask plate technical field, and contraposition measurement can be made more accurate.A kind of mask plate framework is provided with multiple first alignment marks and multiple second alignment marks including hollow chassis body in the chassis body；First alignment mark and second alignment mark correspond, and first alignment mark and the second alignment mark no overlap；First alignment mark is set to the side of the chassis body；Second alignment mark is the through-hole through the chassis body.
Description
Technical field
The present invention relates to mask plate technical field more particularly to a kind of mask plate framework, mask plate and preparation method thereof, open
Net machine.
Background technique
Currently, mask plate is widely used in carrying out pattern production in each field.
It after mask strips complete, needs that mask strips and mask plate framework fit together on screen-tensioning machine, makes shape
At mask plate.
Mask strips have certain tension in production, and inside destruction of edition type occurs after being bonded with mask plate framework.When covering
When mould item is bonded with metal framework, one mask strips of every patch, mask plate framework can all generate certain deformation, therefore be bonded every time all
It is aligned, contraposition inaccuracy will will affect precision of throwing the net, to influence the quality of mask plate obtained.
Summary of the invention
The embodiment of the present invention provides a kind of mask plate framework, mask plate and preparation method thereof, screen-tensioning machine, can make pair
Position measurement is more accurate.
In order to achieve the above objectives, the embodiment of the present invention adopts the following technical scheme that
On the one hand, a kind of mask plate framework is provided, including hollow chassis body, is provided in the chassis body multiple
First alignment mark and multiple second alignment marks；First alignment mark and second alignment mark correspond, and
First alignment mark and the second alignment mark no overlap；First alignment mark is set to the chassis body
Side；Second alignment mark is the through-hole through the chassis body.
Optionally, the chassis body includes that middle part has the frame of open area and is located at the open area
Carrier strip；Second alignment mark is set in the carrier strip, and is located at the open area.
Further alternative, first alignment mark is located at the overlapping region of the frame and the carrier strip, and institute
Stating the first alignment mark is the through-hole through the carrier strip.
Optionally, first alignment mark is located at the Non-overlapping Domain of the frame and the carrier strip；Described first
Alignment mark is set on the frame and the ipsilateral surface of the carrier strip.
Optionally, the carrier strip is at least two；Two carrier strips are respectively arranged at opposite the two of the frame
Side.
Optionally, first alignment mark is four, and four first alignment marks are respectively arranged at the frame
Four angles at；Second alignment mark is arranged respectively close to corresponding first alignment mark.
In another aspect, a kind of mask plate is provided, including above-mentioned mask plate framework, mask strips.
On the other hand, a kind of screen-tensioning machine, including plummer, bottom sensor, top sensor and processor are provided；It is described
Plummer is used to carry the mask plate framework of preceding claim；The bottom sensor is set to the lower section of the plummer,
The bottom sensor is used to measure the coordinate of the second alignment mark on the mask plate framework；The top sensor setting
In the top of the plummer, the top sensor is for measuring one-to-one first register guide on the mask plate framework
The distance between note and second alignment mark；The processor is used for the coordinate according to second alignment mark, and
The distance between one-to-one first alignment mark and second alignment mark calculate the seat of first alignment mark
Mark.
Optionally, the top sensor and the bottom sensor are CCD.
Another aspect provides a kind of production method of mask plate, comprising: according to above-mentioned mask plate framework, by throwing the net
The bottom sensor of machine measures the coordinate of the second alignment mark, and measures one-to-one the by the top sensor of screen-tensioning machine
The distance between one alignment mark and second alignment mark；It is a pair of according to the coordinate of second alignment mark and one
The distance between first alignment mark and second alignment mark for answering calculate the coordinate of first alignment mark；According to
Mask strips are fixed on the mask plate framework by the coordinate of first alignment mark.
The present invention provides a kind of mask plate framework, mask plate and preparation method thereof, screen-tensioning machine, by mask plate framework
First alignment mark is set and the second alignment mark corresponds, and the first alignment mark and the second alignment mark no overlap, it can
By being located at the bottom sensor below chassis body to the precision of the measurement of coordinates of the second alignment mark, and one-to-one correspondence
The first alignment mark and the variation of the distance between the second alignment mark, make the coordinate for the first alignment mark being calculated more
Precisely, so that mask strips to be fixed on precision when on mask plate framework higher, and then precision of throwing the net is more acurrate, throws the net the time more
It is short, improve production efficiency.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
Some embodiments of invention for those of ordinary skill in the art without creative efforts, can be with
It obtains other drawings based on these drawings.
Fig. 1 is the schematic shapes of the first alignment mark of one kind on mask plate framework provided in an embodiment of the present invention；
Fig. 2 is the schematic shapes of another the first alignment mark on mask plate framework provided in an embodiment of the present invention；
Fig. 3 is the schematic shapes of another the first alignment mark on mask plate framework provided in an embodiment of the present invention；
Fig. 4 is the schematic shapes of another the first alignment mark on mask plate framework provided in an embodiment of the present invention；
Fig. 5 is the coordinate calculation schematic diagram of mask plate framework provided in an embodiment of the present invention；
Fig. 6 is a kind of structural schematic diagram of mask plate framework provided in an embodiment of the present invention；
Fig. 7 is the structural schematic diagram of another mask plate framework provided in an embodiment of the present invention；
Fig. 8 is a kind of flow diagram of mask plate preparation method provided in an embodiment of the present invention.
Detailed description of the invention:
The first alignment mark of 01-；The second alignment mark of 02-；10- chassis body；11- frame；The open area 12-；13- is held
Carrier strip.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
The embodiment of the present invention provides a kind of mask plate framework, as shown in Figs 1-4, including hollow chassis body 10, frame
Multiple first alignment marks 01 and multiple second alignment marks 02 are provided in main body 10；First alignment mark 01 and the second contraposition
Label 02 corresponds, and 02 no overlap of the first alignment mark 01 and the second alignment mark；First alignment mark 01 is set to frame
The side of frame body 10；Second alignment mark 02 is the through-hole through chassis body 10.
First alignment mark 01 and the second alignment mark 02 correspond, that is, each first in multiple first alignment marks
Alignment mark 01 corresponds to second alignment mark 02.Wherein, the through-hole as the second alignment mark 02, along chassis body 10
Thickness direction runs through chassis body 10.
In addition, multiple first alignment marks 01 and multiple second alignment marks 02 refer at least two first alignment marks, 01 He
Two the second alignment marks 02.
No overlap is set by the first alignment mark 01 and the second alignment mark 02, it can be when throwing the net, using positioned at frame
The not ipsilateral sensor of frame body 10 measures.Wherein, by the way that the first alignment mark 01 is set to the one of chassis body 10
Side, and it is the through-hole through the chassis body 10 that the second alignment mark, which is arranged, it is therefore intended that, by being located at and the first register guide
Remember that the sensor of 01 the same side can measure the distance between one-to-one first alignment mark 01 and the second alignment mark 02.
And it is located at the sensor of 10 other side of chassis body, the coordinate of the second alignment mark 02 can be measured.
Based on this, according to the distance between one-to-one first alignment mark 01 and the second alignment mark 02, and it is every
The coordinate of each first alignment mark 01 can be calculated in the coordinate of a second alignment mark 02.
As shown in figure 5, illustrating coordinate calculation by taking a pair of first alignment mark 01 and the second alignment mark 02 as an example.
Between sensor measurement first alignment mark 01 and the second alignment mark 02 of 01 the same side of the first alignment mark
Distance be (△ X, △ Y), positioned at 10 other side of chassis body the second alignment mark of sensor measurement 02 coordinate be (X2,
Y2), according to calculation formula X1=X2+ △ X, Y1=Y2+ △ Y, the coordinate that the first alignment mark 01 is calculated is (X1, Y1)。
Relative to the first alignment mark 01 is only arranged, although by being located at the sensor with 01 the same side of the first alignment mark
It can also measure to obtain the coordinate of the first alignment mark 01, but since the sensor of measurement 01 coordinate of the first alignment mark is located at
The top of chassis body 10, and it is located at the connection type on the top rack of screen-tensioning machine of the top sensor above chassis body 10
Complexity, heavier-weight, movement is not flexible, therefore causes measurement not accurate.
And the present invention is after increasing by the second alignment mark 02, while it is desirable to add sensor in the other side of chassis body 10
The coordinate of the second alignment mark 02 is measured, still, since the sensor of the second alignment mark 02 of measurement is located at chassis body 10
Lower section, positioned at the lower section of chassis body 10 bottom sensor screen-tensioning machine is set lower part rack on, connection type is simpler, weight
Amount is lighter, mobile flexible, so as to keep measurement more accurate.On this basis, even if one-to-one first alignment mark, 01 He
The distance between second alignment mark 02 can generate variation during throwing the net, can also be according to one-to-one first alignment mark
01 and second the distance between alignment mark 02 and each second alignment mark 02 coordinate, the first contraposition is calculated
The coordinate of label 01, so that the measurement of coordinates of the first alignment mark 01 is more accurate.
It should be noted that not being defined to the set-up mode of the first alignment mark 01, for example, the first alignment mark 01
It may be disposed at the upper surface of chassis body 10." upper surface " that the present invention is previously mentioned refers to that mask plate framework is used for and mask strips
Fixed surface.
In the case where the first alignment mark 01 is set to the upper surface of chassis body 10, as shown in Figs 1-4, the first contraposition
The shape of label 01 can be solid cruciform shape, hollow cross shape, annulus shape, filled circles shape etc..Certainly, of the invention
Embodiment be not limited to above-mentioned shape, can also be that other can be made in chassis body 10, and sensor can be made to identify
Shape all belong to the scope of protection of the present invention.
In addition, for chassis body 10 hollow region shape without limitation, such as can be rectangle, be also possible to justify
Shape, the shape of hollow region, which can according to need, to be configured.
In the mask plate framework that the embodiment of the present invention provides, pass through the first alignment mark 01 of setting and the second register guide
Note 02 corresponds, and 02 no overlap of the first alignment mark 01 and the second alignment mark, can be by being located at 10 lower section of chassis body
Precision and one-to-one first alignment mark 01 He of the bottom sensor to the measurement of coordinates of the second alignment mark 02
The variation of the distance between second alignment mark 02, keeps the coordinate for the first alignment mark 01 being calculated more accurate, to make
Mask strips to be fixed on precision when on mask plate framework higher, and then precision of throwing the net is more acurrate, and the time of throwing the net is shorter, improves production
Efficiency.
Optionally, as shown in Figures 6 and 7, chassis body 10 includes that middle part has the frame 11 of open area 12 and across setting
Carrier strip 13 in open area 12；Second alignment mark 02 is set in carrier strip 13, and is located at open area 12.
Chassis body 10 includes frame 11, and 11 center of frame forms open area 12.Frame 11, which can be, to be integrally machined into
Type structure, alternatively, frame 11 is the structure that four independent opposite side are spliced to form.When frame 11 is formed using molding is integrally machined
When, overall precision is higher, and error is smaller.
After carrier strip (Side Mask) 13 is located at open area 12, the opposite end of carrier strip 13 is fixed on frame
On 11, wherein along the extending direction of vertical bearing item 13, carrier strip 13 also exists with open area 12 overlapping, that is, carrier strip 13
Covering part open area 12.
Wherein, the opposite end of carrier strip 13 can be fixed on by welding on frame 11.The material of carrier strip 13
It can be metal or alloy.
By the through-hole for running through carrier strip 13 corresponding to the position setting of open area 12 in carrier strip 13, as second
Alignment mark 02, so that the technique of the second alignment mark 02 of production only carries out in carrier strip 13, without carrying out to frame 11
Operation.In the case where only including the first alignment mark 01 in the related technology relatively, frame 11 in the related technology can be continued to use, and nothing
New frame 11 need to be made again, thus escapable cost.
Optionally, carrier strip 13 is at least two；Two carrier strips 13 are respectively arranged at the opposite sides of frame 11.
Optionally, as shown in fig. 6, the first alignment mark 01 is located at the overlapping region of frame 11 and carrier strip 13, and first
Alignment mark 01 is the through-hole through carrier strip 13.
Through-hole as the first alignment mark 01 is blocked close to the side of frame 11 by frame 11, in this way, when throwing the net, the
The sensor that one alignment mark 01 will not be located at 10 other side of chassis body recognizes, and avoids mixed with the second alignment mark 02
Confuse.
In the case, the first alignment mark 01 and the second alignment mark 02 are all located in carrier strip 13, so that production the
The technique of one alignment mark 01 and the second alignment mark 02 only carries out in carrier strip 13, simple process, and without to frame
11 are operated.
Wherein, the first alignment mark 01 and the second alignment mark 02 can be formed in carrier strip 13 by etch process.
Optionally, as shown in fig. 7, the first alignment mark 01 is located at the Non-overlapping Domain of frame 11 and carrier strip 13, first
Alignment mark 01 is set on frame 11 and the ipsilateral surface of carrier strip 13.
In the case, the first alignment mark 01 is located at the Non-overlapping Domain of frame 11 and carrier strip 13, and and carrier strip
On 13 ipsilateral surfaces, the second alignment mark 02 is located in carrier strip 13.
The first alignment mark 01 is arranged to be located on frame 11 and the ipsilateral surface of carrier strip 13, and is located at frame 11 and carrying
The Non-overlapping Domain of item 13, so that the first alignment mark 01 can only be recognized by the sensor ipsilateral with it, and cannot be another
The sensor of side identifies.
Optionally, as shown in fig. 6-7, the first alignment mark 01 is four, and four the first alignment marks 01 are respectively arranged at
At four angles of frame 11；Second alignment mark 02 is arranged respectively close to the first corresponding alignment mark 01.
In the case where chassis body 10 includes carrier strip 13, four the second alignment marks 02 are respectively arranged at two carryings
On item 13, each there are two the second alignment mark 02, and the second contraposition is equivalent in the carrier strip 13 of 11 opposite sides of frame
Label 02 is located at the both ends of carrier strip 13.That is, each first alignment mark 01 and corresponding second alignment mark 02 are set
It is placed at an angle of mask plate chassis body 10, a pair of first alignment mark 01 is provided at four angles of chassis body 10
With the second alignment mark 02.
Based on this, by being respectively provided with a pair of first alignment mark 01 and the second register guide at four angles of chassis body 10
Note 02, measures and counts to the first alignment mark 01 and the second alignment mark 02 that are arranged at each angle using sensor
It calculates, so that the measurement of coordinates of the first alignment mark 01 at each angle is more accurate, and then passes through first alignment mark at four angles
01 is aligned, so as to be fixed on position when in chassis body 10 more acurrate for mask strips.
The embodiment of the present invention also provides a kind of mask plate, including above-mentioned mask plate framework.The mask plate has and covers
The identical beneficial effect of diaphragm plate frame, details are not described herein.
Optionally, the mask plate further includes mask strips；Mask strips are fixed on mask plate framework.
The embodiment of the present invention also provides a kind of screen-tensioning machine, including plummer, bottom sensor, top sensor and processing
Device.Plummer is for carrying above-mentioned mask plate framework.Bottom sensor is set to the lower section of plummer, and bottom sensor is used for
Measure the coordinate of the second alignment mark on the mask plate framework.Top sensor is set to the top of plummer, and top passes
Sensor is for measuring the distance between one-to-one first alignment mark 01 and the second alignment mark 02 on mask plate framework.Place
Device is managed to be used for according to the coordinate of the second alignment mark 02 and one-to-one first alignment mark 01 and the second alignment mark 02
The distance between, calculate the coordinate of the first alignment mark 01.
Optionally, top sensor and bottom sensor are imaging sensor (Charge Couple Device, abbreviation
CCD)。
It is understood that top CCD is set to the top of plummer, that is, top when plummer carries mask plate framework
CCD is located at the top of mask plate framework, and realization measures the first alignment mark 01 and the second alignment mark above mask plate framework
The distance between 02 purpose.Bottom CCD is set to the lower section of plummer, that is, and bottom CCD is located at the lower part of mask plate framework,
Realize the purpose that the coordinate of the second alignment mark 02 is measured below mask plate framework.
The embodiment of the present invention also provides a kind of preparation method of mask plate, as shown in Figure 8, comprising:
S10, according to above-mentioned mask plate framework, the bottom sensor for passing through screen-tensioning machine measures the seat of the second alignment mark 02
Mark, and measured between one-to-one first alignment mark 01 and the second alignment mark 02 by the top sensor of screen-tensioning machine
Distance.
S20, according to the coordinate of the second alignment mark 02 and one-to-one first alignment mark 01 and the second register guide
The distance between note 02 calculates the coordinate of the first alignment mark 01；According to the coordinate of the first alignment mark 01, mask strips are fixed
In on mask plate framework.
In the preparation method for the mask plate that the embodiment of the present invention provides, the second register guide is measured by bottom sensor
The coordinate of note 02, top sensor measure the distance between one-to-one first alignment mark 01 and second alignment mark 02,
Calculate the coordinate of the first alignment mark 01.It can be by the bottom sensor of screen-tensioning machine to the measurement of coordinates of the second alignment mark 02
Precision and the distance between one-to-one first alignment mark 01 and the second alignment mark 02 variation, make to calculate
The coordinate of the first alignment mark 01 arrived is more accurate, so as to be fixed on precision when on mask plate framework higher for mask strips,
Throwing the net in turn, precision is more acurrate, and the time of throwing the net is shorter, improves production efficiency.
The above description is merely a specific embodiment, but scope of protection of the present invention is not limited thereto, any
Those familiar with the art in the technical scope disclosed by the present invention, can easily think of the change or the replacement, and should all contain
Lid is within protection scope of the present invention.Therefore, protection scope of the present invention should be based on the protection scope of the described claims.
Claims (10)
1. a kind of mask plate framework, which is characterized in that including hollow chassis body, multiple are provided in the chassis body
One alignment mark and multiple second alignment marks；First alignment mark and second alignment mark correspond, and institute
State the first alignment mark and the second alignment mark no overlap；
First alignment mark is set to the side of the chassis body；Second alignment mark is through the frame master
The through-hole of body.
2. mask plate framework according to claim 1, which is characterized in that the chassis body includes that middle part has open region
The frame in domain and the carrier strip for being located at the open area；
Second alignment mark is set in the carrier strip, and is located at the open area.
3. mask plate framework according to claim 2, which is characterized in that first alignment mark be located at the frame with
The overlapping region of the carrier strip, and first alignment mark is the through-hole through the carrier strip.
4. mask plate framework according to claim 2, which is characterized in that first alignment mark be located at the frame with
The Non-overlapping Domain of the carrier strip；First alignment mark is set to the frame and the ipsilateral surface of the carrier strip
On.
5. mask plate framework according to claim 2, which is characterized in that the carrier strip is at least two；
Two carrier strips are respectively arranged at the opposite sides of the frame.
6. according to the described in any item mask plate frameworks of claim 2-5, which is characterized in that first alignment mark is four
A, four first alignment marks are respectively arranged at four angles of the frame；
Second alignment mark is arranged respectively close to corresponding first alignment mark.
7. a kind of mask plate, which is characterized in that including mask strips and mask plate framework described in any one of claims 1-6.
8. a kind of screen-tensioning machine, which is characterized in that including plummer, bottom sensor, top sensor and processor；
The plummer is for carrying mask plate framework described in any one of claims 1-6；
The bottom sensor is set to the lower section of the plummer, and the bottom sensor is for measuring the mask plate framework
On the second alignment mark coordinate；
The top sensor is set to the top of the plummer, and the top sensor is for measuring the mask plate framework
Upper the distance between one-to-one first alignment mark and second alignment mark；
The processor is used for according to the coordinate of second alignment mark and one-to-one first alignment mark and described
The distance between second alignment mark calculates the coordinate of first alignment mark.
9. screen-tensioning machine according to claim 8, which is characterized in that the top sensor and the bottom sensor are
CCD。
10. a kind of production method of mask plate characterized by comprising
Mask plate framework according to claim 1-6 passes through the second contraposition of bottom sensor measurement of screen-tensioning machine
The coordinate of label, and one-to-one first alignment mark and second register guide are measured by the top sensor of screen-tensioning machine
The distance between note；
According to the coordinate of second alignment mark and one-to-one first alignment mark and second alignment mark it
Between distance, calculate the coordinate of first alignment mark；
According to the coordinate of first alignment mark, mask strips are fixed on the mask plate framework.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811291504.8A CN109188856B (en) | 2018-10-31 | 2018-10-31 | Mask plate frame, mask plate, manufacturing method of mask plate and screen stretching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811291504.8A CN109188856B (en) | 2018-10-31 | 2018-10-31 | Mask plate frame, mask plate, manufacturing method of mask plate and screen stretching machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109188856A true CN109188856A (en) | 2019-01-11 |
| CN109188856B CN109188856B (en) | 2021-10-08 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811291504.8A Active CN109188856B (en) | 2018-10-31 | 2018-10-31 | Mask plate frame, mask plate, manufacturing method of mask plate and screen stretching machine |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109825802A (en) * | 2019-04-10 | 2019-05-31 | 京东方科技集团股份有限公司 | Mask plate and preparation method thereof |
| CN111218645A (en) * | 2020-02-28 | 2020-06-02 | 云谷（固安）科技有限公司 | Mask plate screen tensioning method, mask plate screen tensioning device and mask plate |
| CN112725727A (en) * | 2020-12-08 | 2021-04-30 | 武汉天马微电子有限公司 | Mask plate, display panel and manufacturing method of mask plate |
| CN112885241A (en) * | 2021-02-07 | 2021-06-01 | 业成科技（成都）有限公司 | Frame and manufacturing method thereof, display module and measuring method thereof and electronic equipment |
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| CN109825802A (en) * | 2019-04-10 | 2019-05-31 | 京东方科技集团股份有限公司 | Mask plate and preparation method thereof |
| CN109825802B (en) * | 2019-04-10 | 2021-01-26 | 京东方科技集团股份有限公司 | Mask plate and preparation method thereof |
| CN111218645A (en) * | 2020-02-28 | 2020-06-02 | 云谷（固安）科技有限公司 | Mask plate screen tensioning method, mask plate screen tensioning device and mask plate |
| CN111218645B (en) * | 2020-02-28 | 2022-02-11 | 云谷（固安）科技有限公司 | Mask plate screen tensioning method, mask plate screen tensioning device and mask plate |
| CN112725727A (en) * | 2020-12-08 | 2021-04-30 | 武汉天马微电子有限公司 | Mask plate, display panel and manufacturing method of mask plate |
| CN112725727B (en) * | 2020-12-08 | 2022-05-10 | 武汉天马微电子有限公司 | Mask plate, display panel and manufacturing method of mask plate |
| CN112885241A (en) * | 2021-02-07 | 2021-06-01 | 业成科技（成都）有限公司 | Frame and manufacturing method thereof, display module and measuring method thereof and electronic equipment |
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