CN109671602B - Composite electron source based on thermionic discharge - Google Patents
Composite electron source based on thermionic discharge Download PDFInfo
- Publication number
- CN109671602B CN109671602B CN201811360138.7A CN201811360138A CN109671602B CN 109671602 B CN109671602 B CN 109671602B CN 201811360138 A CN201811360138 A CN 201811360138A CN 109671602 B CN109671602 B CN 109671602B
- Authority
- CN
- China
- Prior art keywords
- discharge
- cavity
- seat
- hollow cathode
- cooling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000002131 composite material Substances 0.000 title claims abstract description 27
- 238000001816 cooling Methods 0.000 claims abstract description 72
- 239000011148 porous material Substances 0.000 claims abstract description 32
- 238000010438 heat treatment Methods 0.000 claims abstract description 8
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 82
- 229910052721 tungsten Inorganic materials 0.000 claims description 40
- 239000010937 tungsten Substances 0.000 claims description 40
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 22
- 229910052715 tantalum Inorganic materials 0.000 claims description 17
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 17
- 238000004804 winding Methods 0.000 claims description 13
- 210000004907 gland Anatomy 0.000 claims description 11
- 238000009413 insulation Methods 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 238000003466 welding Methods 0.000 claims description 8
- 238000002844 melting Methods 0.000 claims description 3
- 230000008018 melting Effects 0.000 claims description 3
- 238000007789 sealing Methods 0.000 claims description 3
- 230000006798 recombination Effects 0.000 claims 7
- 238000005215 recombination Methods 0.000 claims 7
- 239000000498 cooling water Substances 0.000 claims 4
- 229910001220 stainless steel Inorganic materials 0.000 claims 3
- 239000010935 stainless steel Substances 0.000 claims 3
- 230000005284 excitation Effects 0.000 claims 1
- 238000005192 partition Methods 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 17
- 230000008569 process Effects 0.000 abstract description 14
- 230000000694 effects Effects 0.000 abstract description 10
- 150000001875 compounds Chemical class 0.000 abstract description 6
- 230000005684 electric field Effects 0.000 description 14
- 239000007789 gas Substances 0.000 description 12
- 230000009471 action Effects 0.000 description 10
- 230000005672 electromagnetic field Effects 0.000 description 5
- 239000002784 hot electron Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- -1 argon ions Chemical class 0.000 description 2
- 230000000712 assembly Effects 0.000 description 2
- 238000000429 assembly Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
- H01J3/024—Electron guns using thermionic emission of cathode heated by electron or ion bombardment or by irradiation by other energetic beams, e.g. by laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/13—Solid thermionic cathodes
- H01J1/20—Cathodes heated indirectly by an electric current; Cathodes heated by electron or ion bombardment
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
The invention discloses a compound electron source based on thermionic discharge, which comprises: the hot wire electrode assembly is mainly used for conducting and heating by utilizing the hot wire electrode assembly to generate hot wire discharge, electrons form a cathode discharge cavity through the hollow cathode assembly and the hot wire fixing seat, a hollow cathode pore passage and a discharge cylinder in the hollow cathode assembly form multi-stage cascade collision discharge, and meanwhile, the cavity connecting assembly is externally sleeved with the magnetic pole to effectively increase the collision times in the discharge process so as to form large-beam high-energy electron flow; meanwhile, three cooling cavities can be formed in the composite electron source to cool the hot wire electrode, the cathode discharge cavity and the hollow cathode component, and the invention has the following advantages and effects: according to the invention, by combining the hollow cathode discharge effect with the hot wire discharge, uniform and stable discharge is realized, a better cooling effect can be achieved, and the long-time high-efficiency stability of the composite electron source is improved.
Description
Technical Field
The present invention relates to an electron source, and more particularly, to a compound electron source based on thermionic discharge.
Background
The traditional thermal discharge electron source is usually wound by a tungsten wire into different shapes and emission areas according to different requirements in application, and the tungsten wire can generate a large amount of thermal electrons under the condition of heating to a higher current, so that the tungsten wire can be used for cleaning, etching and auxiliary coating, and the quality of a film layer and the bonding force between the film layer and a substrate are improved. In the prior art, an electron source mainly comprises hot electrons generated by using large current of a tungsten filament, the electron beam current generated by the method is small, the discharge rate is low, the electron source cannot be cooled well, and no method is provided for enabling the electron source to discharge uniformly and stably for a long time.
Disclosure of Invention
The invention aims to provide a compound electron source based on thermionic discharge, which can achieve better cooling effect and realize uniform and stable discharge.
The technical purpose of the invention is realized by the following technical scheme: a composite electron source based on thermionic discharge comprises a hot wire electrode assembly, a fixed seat, a hollow cathode discharge assembly, an insulating seat, a cavity connecting assembly and a magnetic pole; the hot wire electrode assembly comprises a discharge tungsten wire, a tungsten wire fixing sleeve, a tungsten wire seat, a water inlet pipe, a wiring board, a tungsten wire insulating seat and a tungsten wire seat gland, and the water inlet pipe and the tungsten wire seat form a first cooling cavity; a second cooling cavity is arranged in the fixed seat, and the tungsten filament seat gland, the tungsten filament insulation seat and the tungsten filament seat are fixed on the fixed seat by the hot filament electrode assembly through bolts with insulation sleeves; the hollow cathode assembly comprises a hollow cathode seat, a tantalum pipe sleeve and a discharge tube, wherein the hollow cathode seat is provided with a third water-cooling seat, the hollow cathode seat is fixed on the fixed seat and forms a first discharge cavity, the hollow cathode seat is provided with a plurality of hollow cathode channels, the tantalum pipe sleeve is sleeved on the channels and forms a second discharge cavity, and the discharge tube is sleeved on the back of the hollow cathode seat and forms a third discharge cavity; the cavity connecting assembly comprises a cathode connecting plate and a flange ring, the flange ring is formed by welding a standard flange interface at two sides with a flange sleeve, the standard flange interface at one side is fixed on the cathode connecting plate through a standard flange interface sealing ring, and the standard flange at the other side is assembled on the hollow cathode seat; the cavity connecting assembly is used for tightly connecting the insulating seat and the hollow cathode seat through a bolt with an insulating sleeve, and the magnetic pole is sleeved on the flange ring.
By adopting the technical scheme, the tungsten filament loads low voltage (direct current and alternating current) large current, the discharge cavity and the hollow cathode assembly loads negative pressure, the tungsten filament is heated and emits electrons, the electrons are influenced by an electric field in the first discharge cavity and are subjected to cascade collision, more electrons are generated by collision, the electrons enter the pore channel on the hollow cathode seat under the action of the electric field, the electrons in the pore channel on the hollow cathode seat continuously collide and are gathered, hollow cathode discharge can be generated, and the hollow cathode discharge effect can form uniformly distributed array hollow cathode discharge holes on the metal discharge plate and can provide uniform electrons; electrons escaping from the hollow cathode pore channel are acted by an electric field and a magnetic field of the third discharge cavity, the electrons collide with the working gas violently, and a large amount of electrons are generated in the collision process. The hot electrons are acted by the electric field of the discharge cavity, pass through the through hole and enter the third discharge cavity, and the electrons are interacted with the magnetic field and the electric field and collide with the process gas entering the discharge cavity from the air inlet hole, so that the concentration of the plasma is further improved, and uniform and stable discharge is realized.
The first cooling cavity is arranged to cool the electrode, the second cooling cavity is arranged to cool the fixing seat, the third cooling cavity can cool the first discharge cavity and the hollow cathode assembly, and the second discharge cavity and the third discharge cavity are cooled through heat conduction.
Further setting the following steps: the device comprises three discharge cavities, wherein a hollow cathode seat and a fixed seat form a first discharge cavity, a plurality of pore channels are arranged on the hollow cathode seat, tantalum pipe sleeves are assembled on the pore channels to form a second discharge cavity, and a discharge lamp is assembled on the hollow cathode seat to form a third discharge cavity; thermal electrons excited by heating the tungsten filament can be in cascade collision in the first discharge cavity, more electrons are excited to enter the second discharge cavity, electrons in the tantalum tube sleeve are converged to generate hollow cathode discharge and enter the third discharge cavity, and the third discharge cavity is further in cascade collision under the influence of the magnetic field of the magnetic pole to generate more electrons.
Further setting the following steps: the magnetic field of the magnetic pole can be a single-polarity magnetic field and a composite magnetic field formed by a permanent magnet, and can also be a single-phase coil wound by a coil and a rotating magnetic field formed by a winding coil, wherein the winding coil is connected into a symmetrical three-phase winding according to a two-pole magnetic field rule; the winding coil is excited by a three-phase variable-frequency sinusoidal alternating-current power supply with the phase difference of 120 degrees, the current frequency and the voltage are independently adjusted, the intensity of the rotating magnetic field is adjusted by the voltage, and the rotating speed of the rotating magnetic field is adjusted by the current frequency; the single-phase coil is an electromagnetic coil with adjustable frequency and voltage in various sine, cosine, triangle and rectangle waveforms.
The electron source based on thermionic discharge may be a square electron source, characterized in that:
a square composite electron source based on thermionic discharge comprises a hot wire electrode assembly, a square fixed seat, a hollow cathode plate, an insulating seat, a square cavity and a magnetic pole; the hot wire electrode assembly comprises a discharge tungsten wire, a tungsten wire fixing sleeve, a tungsten wire seat, a water inlet pipe, a wiring board, a tungsten wire seat insulating seat and a tungsten wire seat pressing cover, wherein the water inlet pipe and the tungsten wire seat form a first cooling cavity; a second cooling cavity is arranged in the square fixed seat, and the tungsten filament seat gland bush, the tungsten filament seat insulating seat and the tungsten filament seat are fixed on the square fixed seat by the hot filament electrode assembly through bolts with insulating sleeves; the hollow cathode plate is a metal plate provided with array hollow cathode pore channels, the square cavity is a directional annular flange welding structural part and is provided with a third water cooling seat, the hollow cathode plate and the square fixing seat are fixed on the square cavity and form a first discharge cavity, the hollow cathode plate is provided with a plurality of hollow cathode pore channels, and pore channels with certain thickness can form a second discharge cavity; the square cavity is a square annular welding structural part, the two sides of the square cavity can be respectively provided with a square fixing seat and a hollow cathode plate, and the square cavity can be connected with the first discharge cavity through an insulation plate; the magnetic pole is sleeved on the square cavity.
By adopting the technical scheme, the tungsten filaments of the multiple groups of electrodes are loaded with low-voltage large current, electrons are heated and emitted, the electrons enter an electron channel which is formed by the pore channels of the hollow cathode plate and has an electron convergence effect and can generate a hollow cathode effect under the action of the electric field and the magnetic field of the discharge cavity, the electrons collide with process gas entering the discharge cavity from the air inlet due to the interaction of the magnetic field and the electric field, the concentration of plasma is further improved, and the electrons are converged through the pore channels of the hollow cathode to output stable electron flow.
Further setting the following steps: the device comprises three water-cooling cavities, wherein a first water-cooling cavity is fastened with a tungsten wire seat through a water inlet pipe to form a cooling cavity; a second cooling cavity surrounding the hot wire electrode assembly is arranged on the square fixing seat; a third cooling cavity is arranged on the square cavity; the first cooling cavity can cool the hot wire electrode assembly, the second cooling cavity can cool the hot wire electrode assembly and the first discharge cavity, and the third cooling cavity can cool the whole hollow cathode plate and the first discharge cavity
Further setting the following steps: the cathode plate is provided with a plurality of pore channels 230 to form a second discharge cavity; thermal electrons excited by heating the tungsten filament can be in cascade collision in the first discharge cavity, more electrons are excited to enter the second discharge cavity, electrons in the pore channel on the hollow cathode plate are converged to generate hollow cathode discharge, the number of cascade collision times is increased under the influence of a magnetic field of the magnetic pole sleeved on the first discharge cavity, and more electrons can be generated.
Further setting the following steps: the magnetic field of the magnetic pole can be a single-polarity magnetic field and a composite magnetic field formed by a permanent magnet, and can also be a single-phase coil wound by a coil; the single-phase coil is an electromagnetic coil with adjustable frequency and voltage in various sine, cosine, triangle and rectangle waveforms.
Further setting the following steps: the hollow cathode discharge plate is a metal plate with high melting point and low work function, preferably one of tantalum and tungsten.
In summary, the compound electron source based on thermionic discharge provided by the invention has the following substantial differences and significant improvements:
1) the invention can provide high-energy large-beam-current stable electron current for the vacuum chamber by utilizing thermionic emission, electron convergence through a hollow cathode discharge effect and electron cascade collision in the discharge chamber.
2) The invention is provided with a plurality of discharge cavities and a magnetic field, can efficiently emit thermal electrons and high-energy electrons obtained by converging hollow cathode electrons, and further generates cascade collision to generate more electrons.
3) The invention is provided with three water cooling cavities, the first cooling cavity and the second cooling cavity can realize the high-efficiency cooling of the thermionic emission electrode, meanwhile, the second cooling cavity and the third cooling cavity can realize the cooling of a plurality of discharge cavities and hollow cathode discharge components, and the arrangement of the plurality of cooling cavities can effectively cool the composite electron source, which means that the composite electron source can stably and efficiently work.
4) The invention utilizes the pore passages arranged in an array on the square hollow cathode plate and the tantalum tube sleeved on the circular electron source, and adopts the metal plate with high melting point and low work function as the hollow cathode discharge plate, thereby efficiently and stably outputting large beam current electrons.
5) The magnetic pole magnetic field sleeved on the electron source can realize various combinations, and the moving stroke of electrons in the discharge cavity is increased by utilizing the action of the magnetic field on the moving electrons, so that the concentration of plasma is improved.
Through adopting above-mentioned technical scheme, utilize the hot electron to burst and the hollow cathode discharge combines together and can effectively increase the motion stroke of electron through the electron cascade collision in a plurality of discharge chambers and the magnet of suit on discharge chamber, the complex of multiple technique is used, very big promotion the hot electron utilization efficiency who jets, increase the effective stroke of electron in the collision discharge chamber, promotion and process gas's that can be very big collision number of times, the collision will produce more electron and the concentration that promotes plasma.
Drawings
FIG. 1 is a perspective view of a first embodiment;
FIG. 2 is a schematic plane view of the first embodiment;
FIG. 3 is a sectional view according to one embodiment;
FIG. 4.1 is a schematic view of a single magnetic pole magnetic field in the second embodiment;
FIG. 4.2 is a schematic diagram of the composite magnetic field in the second embodiment;
FIG. 4.3 is a schematic diagram of the magnetic field of the coil-wound single-phase coil in the second embodiment;
FIG. 4.4 is a schematic diagram of the rotating magnetic field of the winding coil in the second embodiment;
FIG. 5 is a sectional view of the second embodiment;
FIG. 6 is a partial cross-sectional view of the second embodiment;
fig. 7 is another partial sectional view of the second embodiment.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings.
Example one
Referring to fig. 1 to 3, a circular composite electron source 1 based on thermionic discharge includes a hot wire electrode assembly 11, a fixed base 12, a hollow cathode discharge assembly 13, an insulating base 14, a cavity connecting assembly 15, and a magnetic pole 16; the hot wire electrode assembly 11 comprises a discharge tungsten wire 110, a tungsten wire fixing sleeve 111, a tungsten wire base 112, a water inlet pipe 113, a wiring board 114, a tungsten wire insulating base 115 and a tungsten wire base gland 116, wherein the water inlet pipe 113 and the tungsten wire base 112 form a first cooling cavity 101; a second cooling cavity 102 is arranged in the fixed seat 12, and the tungsten filament seat gland 116, the tungsten filament insulation seat 115 and the tungsten filament seat 112 are fixed on the fixed seat 12 by the hot filament electrode assembly 11 through bolts with insulation sleeves; the hollow cathode assembly 13 comprises a hollow cathode seat 131, a tantalum tube sleeve 132 and a discharge cylinder 133, wherein the hollow cathode seat 131 is provided with a third water-cooling seat 103, the hollow cathode seat 131 is fixed on the fixed seat 12 and forms a first discharge cavity 104, the hollow cathode seat 131 is provided with a plurality of hollow cathode pore canals 130, the tantalum tube sleeve 132 is sleeved on the pore canals 130 and forms a second discharge cavity 105, and the discharge cylinder 133 is sleeved on the back of the hollow cathode seat 131 and forms a third discharge cavity 106; the cavity connecting assembly 15 comprises a cathode connecting plate 151 and a flange ring 152, wherein the flange ring 152 is formed by welding a standard flange interface at two sides with a flange sleeve, the standard flange interface at one side is fixed on the cathode connecting plate 151 through a standard flange interface sealing ring, and the standard flange at the other side is assembled on the vacuum cavity; the cavity connecting assembly 15 is used for tightly connecting the insulating base 14 and the hollow cathode base through a bolt with an insulating sleeve, and the magnetic pole 16 is sleeved on the flange ring 152.
The circular compound electron source 1 is provided with three water-cooling cavities, wherein the first water-cooling cavity 101 is a cooling cavity formed by fastening a water inlet pipe 113 and a tungsten filament seat 112 through threads; the fixed seat 12 is provided with a second cooling cavity 102 surrounding the two groups of hot wire electrode assemblies 11; a third cooling cavity 103 with an annular water-proof strip is arranged on the hollow cathode base 131; the first cooling chamber 101 can cool the hot wire electrode assembly 11, the second cooling chamber 102 can cool the hot wire electrode assembly 11 and the first discharge chamber 104, and the third cooling chamber 103 can cool the whole hollow cathode assembly 13, and can cool three discharge chambers.
The circular compound electron source 1 is provided with three discharge cavities, wherein a hollow cathode seat 131 and a fixed seat 12 form a first discharge cavity 104, the hollow cathode seat 131 is provided with a plurality of pore channels 130, tantalum pipe sleeves 132 are assembled on the pore channels to form a second discharge cavity 105, and a discharge cylinder 133 is assembled on the hollow cathode seat 131 to form a third discharge cavity 106; thermal electrons excited by heating the tungsten filament can be in cascade collision in the first discharge cavity 104 to excite more electrons to enter the second discharge cavity 105, the electrons in the tantalum tube sleeve 132 are converged to generate hollow cathode discharge and enter the third discharge cavity 106, and the third discharge cavity 106 is further in cascade collision under the influence of the magnetic field of the magnetic pole 16 to generate more electrons.
Referring to FIG. 4: the magnetic field of the magnetic pole 16 may be a single-polarity magnetic field and a composite magnetic field formed by permanent magnets, or may be a single-phase coil wound by a coil or a rotating magnetic field formed by a winding coil, wherein the winding coil is connected into a symmetrical three-phase winding according to a two-pole magnetic field rule.
Wherein: the single polar direction magnetic field is a magnetic group which is formed by magnets with the same polarity and is sleeved on the flange ring 152, the magnetic field direction of the magnetic group is parallel to the axial direction, electrons are influenced by the magnetic field under the action of the single polar direction magnetic field, the electrons move spirally, the effective stroke of the electrons in the collision discharge cavity 106 is increased, the number of times of collision with process gas is increased, and meanwhile, more electrons are generated;
the composite magnetic field comprises an annular single-poloidal magnetic field and an annular bipolar magnetic field, wherein the annular bipolar magnetic field is formed by placing magnets (NS) with different polarities on annular magnetic shoes, the direction of the magnetic field of each magnet is parallel to the radial direction of the discharge tube 133, the two magnetic fields with different polarities are adjacently placed, the annular bipolar magnetic field forms a certain number of annular closed magnetic fields in the circumferential direction of the discharge tube 133, electrons overflow from the second discharge cavity 105 and are influenced by the annular single-poloidal magnetic field to generate spiral motion when continuing to move towards the outlet of the third discharge cavity 106, and the electrons continue to move towards the outlet;
and an electromagnetic coil is loaded to serve as a magnetic field source to provide a stable and controllable electromagnetic field for the electron source. The electromagnetic coil can be a conventional single-phase wound electromagnetic coil, various waveforms such as sine, cosine, square wave, triangular wave and the like, and loads with adjustable frequency and current can be applied to the electromagnetic coil, correspondingly, an oscillating magnetic field with certain frequency can be formed in the lengthened discharge cavity 30, and the effective movement stroke of electrons in the oscillating magnetic field is further enlarged compared with that of a single-polarity magnetic field, so that the electromagnetic coil can collide with more process gas to generate more electrons;
the electromagnetic coil can also be a rotating magnetic field formed by winding coils, and the winding coils are connected into a symmetrical three-phase winding according to a two-pole magnetic field rule; the winding coil is excited by a three-phase variable-frequency sinusoidal alternating-current power supply with the phase difference of 120 degrees, the current frequency and the voltage are independently adjusted, the intensity of the rotating magnetic field is adjusted through the voltage, and the rotating speed of the rotating magnetic field is adjusted through the current frequency. When the rotating coil is sleeved on the flange ring 152, a rotating magnetic field with more changeable magnetic field intensity and direction can be formed in the third discharge cavity 106, and the movement of electrons in the rotating magnetic field can be increased by tens of times in comparison with the movement of an oscillating electromagnetic field, so that the electrons can collide with more process gas to generate more electrons.
When a low-voltage large current (direct current or alternating current) is applied to the tungsten filament 110 on both electrodes of the hot filament electrode assembly in the circular electron source 1, the tungsten filament is heated, the kinetic energy of electrons in the tungsten filament is increased, and a large amount of electrons are emitted from the surface of the tungsten filament when the kinetic energy exceeds the electron emission energy.
The three discharge chambers 101, 102, 103 are at the same potential, which is negative. The escaped hot electrons enter the second discharge cavity 102 under the action of the electric field in the first discharge cavity 101, and when passing through the tantalum tube 132 sleeved on the hollow cathode pore channel 130 on the hollow cathode seat 131, the electrons are converged and generate a hollow cathode discharge effect under the limitation of the shape and the size of the tantalum tube 132, a large number of electrons in the hollow cathode discharge process enter the third discharge cavity 103 under the action of the electric field, and in the third discharge cavity 103, the electrons are influenced by the electric field and the magnetic field (including a single-polarity magnetic field, a composite magnetic field, an oscillating electromagnetic field and a rotating magnetic field) to generate more intense collision, so that plasma with higher concentration is generated, and under the action of the electric field, argon ions are adsorbed on the wall of the collision discharge cavity and are changed into gas again, and the electrons overflow from an outlet.
Example two
Description of the drawings: the hot wire electrode assembly 11 in the present embodiment has the same structure as that in the first embodiment, and is different in that a plurality of groups of hot wire electrode assemblies 11 can be longitudinally assembled on a square composite electron source, and only one group of the circular composite electron source is generally assembled; the hot wire electrode assembly 11 will not be described in detail in this embodiment.
The difference between the magnetic pole of the embodiment and the first embodiment is as follows: the magnetic field does not contain a rotating magnetic field wound by three phases, and the basic structure of the single-polarity magnetic field, the composite magnetic field and the electromagnetic coil magnetic field is the same as that of a circular composite electron source in magnet arrangement, but the difference is that the shape of the magnetic field is changed from an original circular ring shape into a direction annular magnetic pole sleeved on a square cavity, so the magnetic pole in the embodiment is only briefly described.
See fig. 5-7 for an illustration: a square composite electron source 2 based on thermionic discharge comprises a hot wire electrode assembly 11, a square fixed seat 22, a hollow cathode plate 23, an insulating seat 24, a square cavity 25 and a magnetic pole 26; the hot wire electrode assembly 11 comprises a discharge tungsten wire 110, a tungsten wire fixing sleeve 111, a tungsten wire base 112, a water inlet pipe 113, a wiring board 114, a tungsten wire insulating base 115 and a tungsten wire base gland 116, wherein the water inlet pipe 113 and the tungsten wire base 112 form a first cooling cavity 101; a second cooling cavity 202 is arranged in the square fixed seat 22, and the tungsten filament seat gland 116, the tungsten filament insulation seat 115 and the tungsten filament seat 112 are fixed on the square fixed seat 22 by the hot filament electrode assembly 11 through bolts with insulation sleeves; the hollow cathode plate 23 is a metal plate provided with array hollow cathode pore channels, the square cavity 25 is a directional annular flange welding structural part and is provided with a third water cooling seat 203, the hollow cathode plate 23 and the square fixing seat 22 are fixed on the square cavity 25 and form a first discharge cavity 204, the hollow cathode plate 23 is provided with a plurality of hollow cathode pore channels 230, and pore channels 230 with certain thickness can form a second discharge cavity 205; the square cavity 25 is a square annular welding structural member, two sides of which can be respectively provided with a square fixed seat 22 and a hollow cathode plate 23 and can be connected with the vacuum cavity through an insulation plate 24; the magnetic pole 26 is sleeved on the square cavity 25.
The square composite electron source 2 is provided with three water-cooling cavities, wherein the first water-cooling cavity 101 is a cooling cavity formed by fastening a water inlet pipe 113 and a tungsten filament seat 112 in a threaded manner; the square fixed seat 22 is provided with a second cooling cavity 202 surrounding each hot wire electrode assembly 11; a third cooling cavity 203 is arranged on the square cavity 25; the first cooling chamber 101 may cool the hot wire electrode assembly 11, the second cooling chamber 202 may cool the hot wire electrode assembly 11 and the first discharge chamber 204, and the third cooling chamber 203 may cool the entire hollow cathode plate 23 and the first discharge chamber 204.
The square composite electron source 2 is provided with two discharge cavities, wherein the hollow cathode plate 23, the square fixing seat 22 and the square cavity 25 form a first discharge cavity 204, and the hollow cathode plate 23 is provided with a plurality of pore channels 230 with certain depth to form a second discharge cavity 205; thermal electrons excited by heating the tungsten filament can be in cascade collision in the first discharge cavity 204 to excite more electrons to enter the second discharge cavity 205, electrons in the pore channels 230 on the hollow cathode plate 23 are converged to generate hollow cathode discharge, wherein the number of cascade collision times is increased under the influence of the magnetic field of the magnetic pole 26 sleeved on the first discharge cavity 204, and more electrons can be generated.
See fig. 4.1-4.3 for a schematic representation of: the single polar direction magnetic field is a magnetic group which is formed by magnets with the same polarity and is sleeved on the flange ring 152, the magnetic field direction of the magnetic group is parallel to the axial direction, electrons are influenced by the magnetic field under the action of the single polar direction magnetic field, the electrons move spirally, the effective stroke in the collision discharge cavity 204 is increased, the number of times of collision with process gas is increased, and meanwhile, more electrons are generated;
the composite magnetic field comprises an annular single-poloidal magnetic field and an annular bipolar magnetic field, wherein the annular bipolar magnetic field is formed by placing magnets (NS) with different polarities on an annular magnetic shoe, the magnetic field direction of the magnets is parallel to the height direction of the square cavity 25, the two magnetic fields with different polarities are adjacently placed, the annular bipolar magnetic field forms a certain number of annular closed magnetic fields in the circumferential direction of the discharge tube 133, electrons are influenced by the annular single-poloidal magnetic field firstly in the discharge cavity 204 after being heated and sprayed, and then generate spiral motion and continue to move towards an outlet, and when entering the annular bipolar magnetic field, the number of times of collision of the electrons with process gas in the motion process is increased by the plurality of circumferential closed magnetic fields, so that more electrons are generated;
and an electromagnetic coil is loaded to serve as a magnetic field source to provide a stable and controllable electromagnetic field for the electron source. The electromagnetic coil can be a conventional single-phase wound electromagnetic coil, various waveforms such as sine, cosine, square wave, triangular wave and the like, and loads with adjustable frequency and current can be applied to the electromagnetic coil, correspondingly, an oscillating magnetic field with certain frequency can be formed in the discharge cavity 204, and the effective movement stroke of electrons in the oscillating magnetic field is further enlarged compared with that of a single-polarity magnetic field, so that the electromagnetic coil can collide with more process gas to generate more electrons.
The tungsten filament 110 on two electrodes of the multi-group hot filament electrode assembly in the square electron source 2 is applied with low voltage and large current (direct current and alternating current), the tungsten filament is heated, the electron kinetic energy in the tungsten filament is increased, and when the kinetic energy exceeds the electron escape energy, a large amount of electrons escape from the surface of the tungsten filament.
The two discharge chambers 204, 205 are at the same potential, which is a negative potential. Electrons escaping from the thermal electrons in the first discharge cavity 204 are influenced by an electric field and a magnetic field (including a single-polarity magnetic field, a composite magnetic field, an oscillating electromagnetic field and a rotating magnetic field) to collide violently to generate plasma with higher concentration, argon ions are adsorbed on the wall of the colliding discharge cavity under the action of the electric field and are changed into gas again, the electrons overflow from the outlet and enter the second discharge cavity 205, when passing through the hollow cathode pore passage 230 on the hollow cathode plate 23, the electrons are converged and generate a hollow cathode discharge effect under the limitation of the shape and the size of the pore passage 230, and a large number of electrons in the hollow cathode discharge process enter the vacuum chamber under the action of the electric field.
The present embodiment is only for explaining the present invention, and it is not limited to the present invention, and those skilled in the art can make modifications of the present embodiment without inventive contribution as needed after reading the present specification, but all of them are protected by patent law within the scope of the claims of the present invention.
Claims (9)
1. A composite electron source based on thermionic discharge, comprising: the device comprises a hot wire electrode assembly, a fixed seat, a hollow cathode discharge assembly, an insulating seat, a cavity connecting assembly and a magnetic pole; the hot wire electrode assembly comprises a discharge tungsten wire, a tungsten wire fixing sleeve, a tungsten wire seat, a water inlet pipe, a wiring board, a tungsten wire insulating seat and a tungsten wire seat gland, wherein the water inlet pipe in the hot wire electrode assembly is in threaded connection with the tungsten wire seat to form a cavity, so that the circulation of cooling water can be realized and the hot wire electrode assembly is used as a first cooling cavity; a second cooling cavity is arranged in the fixed seat, and the tungsten filament seat gland, the tungsten filament insulation seat and the tungsten filament seat are fixed on the fixed seat by the hot filament electrode assembly through bolts with insulation sleeves; the hollow cathode assembly comprises a hollow cathode seat, a tantalum tube sleeve and a discharge tube, wherein a cavity with a water channel partition bar is arranged on the inner side surface of the hollow cathode seat and can serve as a cooling water channel to serve as a third water cooling seat, the hollow cathode seat is fixed on the fixed seat and forms a first discharge cavity, a plurality of hollow cathode channels are arranged on the hollow cathode seat, the tantalum tube sleeve is sleeved on the channels and forms a second discharge cavity, and the discharge tube is sleeved on the back of the hollow cathode seat and forms a third discharge cavity; the cavity connecting assembly comprises a cathode connecting plate and a flange ring, the flange ring is formed by welding a standard flange interface at two sides with a flange sleeve, the standard flange interface at one side is fixed on the cathode connecting plate through a standard flange interface sealing ring, and the standard flange at the other side is assembled on the hollow cathode seat; the cavity connecting assembly is used for tightly connecting the insulating seat and the hollow cathode seat through a bolt with an insulating sleeve, and the two electromagnetic coils are sleeved on the flange ring.
2. A thermionic discharge based recombination electron source as claimed in claim 1, wherein: the device comprises three water-cooling cavities, wherein a first water-cooling cavity is fastened with a tungsten wire seat through a water inlet pipe to form a cooling cavity; the fixed seat is provided with a second cooling cavity surrounding the hot wire electrode assembly; a third cooling cavity with an annular water-insulating strip is arranged on the hollow cathode seat; the first cooling cavity cools the hot wire electrode assembly, the second cooling cavity cools the hot wire electrode assembly and the first discharge cavity, and the third cooling cavity cools the whole hollow cathode assembly, so that the three discharge cavities can be cooled.
3. A thermionic discharge based recombination electron source as claimed in claim 1, wherein: the device comprises three discharge cavities, wherein a hollow cathode seat and a fixed seat form a first discharge cavity, a pore channel arranged on the hollow cathode seat is provided with a tantalum pipe sleeve to form a second discharge cavity, and a discharge lamp is assembled on the hollow cathode seat to form a third discharge cavity; thermal electrons excited by heating the tungsten filament are in cascade collision in the first discharge cavity, more electrons are excited to enter the second discharge cavity, electrons in the tantalum tube sleeve are converged to generate hollow cathode discharge and enter the third discharge cavity, and the third discharge cavity is further in cascade collision under the influence of the magnetic field of the magnetic pole to generate more electrons.
4. A thermionic discharge based recombination electron source as claimed in claim 1, wherein: a first electromagnetic coil is arranged on the flange ring close to the hollow cathode seat, and the first electromagnetic coil is a single-phase coil; the center of the flange ring is sleeved with a second electromagnetic coil, the second electromagnetic coil is a rotating magnetic field wound in three phases, the second electromagnetic coil is connected into symmetrical three-phase winding according to a dipolar magnetic field rule, a three-phase variable-frequency sinusoidal alternating-current power supply with a phase difference of 120 degrees is adopted for excitation, the current frequency and the voltage are independently adjusted, the intensity of the rotating magnetic field is adjusted through the voltage, and the rotating speed of the rotating magnetic field is adjusted through the current frequency; the single-phase coil is an electromagnetic coil with adjustable frequency and voltage of various sine, cosine, triangle and rectangle waveforms.
5. A composite electron source based on thermionic discharge comprises a hot wire electrode assembly, a square fixed seat, a hollow cathode plate, an insulating seat, a square cavity and a magnetic pole; the hot wire electrode assembly comprises a discharge tungsten wire, a tungsten wire fixing sleeve, a tungsten wire seat, a water inlet pipe, a wiring board, a tungsten wire seat insulating seat and a tungsten wire seat gland, wherein the water inlet pipe in the hot wire electrode assembly is fastened with the tungsten wire seat through threads to form a cavity, so that cooling water can circulate to serve as a first cooling cavity; a second cooling cavity is arranged in the square fixed seat, and the tungsten filament seat gland bush, the tungsten filament seat insulating seat and the tungsten filament seat are fixed on the square fixed seat by the hot filament electrode assembly through bolts with insulating sleeves; the hollow cathode plate is a metal plate provided with array hollow cathode pore channels, the square cavity is a structural part formed by welding a plurality of stainless steel plates and 2 annular flanges, the stainless steel plates are of a double-layer structure, the stainless steel plates are provided with inner cavities capable of realizing the circulation of cooling water and are third water cooling seats, the hollow cathode plate and the square fixing seat are fixed on the square cavity to form a first discharge cavity, the hollow cathode plate is provided with a plurality of hollow cathode pore channels, and pore channels with certain thickness can form a second discharge cavity; the two sides of the square cavity can be respectively provided with a square fixing seat and a hollow cathode plate and are connected with the first discharge cavity through an insulation plate; the magnetic pole is sleeved on the square cavity.
6. A thermionic discharge based recombination electron source according to claim 5, wherein: the device comprises three water-cooling cavities, wherein a first water-cooling cavity is fastened with a tungsten wire seat through a water inlet pipe to form a cooling cavity; a second cooling cavity surrounding the hot wire electrode assembly is arranged on the square fixing seat; a third cooling cavity is arranged on the square cavity; the first cooling cavity cools the hot wire electrode assembly, the second cooling cavity cools the hot wire electrode assembly and the first discharge cavity, and the third cooling cavity cools the whole hollow cathode plate and the first discharge cavity.
7. A thermionic discharge based recombination electron source according to claim 5, wherein: the cathode plate comprises two discharge cavities, wherein a first discharge cavity is formed by a hollow cathode plate, a square fixing seat and a square cavity, and a plurality of pore channels are arranged on the hollow cathode plate to form a second discharge cavity; thermal electrons excited by heating the tungsten filament are in cascade collision in the first discharge cavity, more electrons are excited to enter the second discharge cavity, electrons in the pore channel on the hollow cathode plate are converged to generate hollow cathode discharge, the number of cascade collision times is increased under the influence of a magnetic field of the magnetic pole sleeved on the first discharge cavity, and more electrons can be generated.
8. A thermionic discharge based recombination electron source according to claim 5, wherein: the magnetic field of the magnetic pole is a single-polarity magnetic field and a composite magnetic field formed by a permanent magnet, or is a single-phase coil wound by a coil; the single-phase coil is an electromagnetic coil with adjustable frequency and voltage of various sine, cosine, triangle and rectangle waveforms.
9. A thermionic discharge based recombination electron source according to claim 5, wherein: the hollow cathode plate is a metal plate with high melting point and low work function, and the metal plate is made of one of tantalum and tungsten.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811360138.7A CN109671602B (en) | 2018-11-15 | 2018-11-15 | Composite electron source based on thermionic discharge |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811360138.7A CN109671602B (en) | 2018-11-15 | 2018-11-15 | Composite electron source based on thermionic discharge |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109671602A CN109671602A (en) | 2019-04-23 |
| CN109671602B true CN109671602B (en) | 2021-05-21 |
Family
ID=66141798
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811360138.7A Active CN109671602B (en) | 2018-11-15 | 2018-11-15 | Composite electron source based on thermionic discharge |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109671602B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113056083A (en) * | 2019-12-26 | 2021-06-29 | 上海宏澎能源科技有限公司 | Plasma beam generating device |
Citations (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63254639A (en) * | 1987-04-11 | 1988-10-21 | Nissin Electric Co Ltd | Ion source |
| JPH02291650A (en) * | 1989-05-01 | 1990-12-03 | Fujitsu Ltd | Electric field ionization type gas ion source |
| JPH04154026A (en) * | 1990-10-15 | 1992-05-27 | Toshiba Corp | Electrode plate for ion source and magnetic filter |
| JPH07142020A (en) * | 1993-11-19 | 1995-06-02 | Rikagaku Kenkyusho | Electron beam exciting negative ion source and negative ion generating method |
| JPH07282993A (en) * | 1994-04-14 | 1995-10-27 | Kawasaki Heavy Ind Ltd | Electron beam generating device for plasma generation energized with electron beam |
| JPH0813151A (en) * | 1994-06-27 | 1996-01-16 | Rikagaku Kenkyusho | Plasma cvd method and apparatus therefor |
| JPH11149882A (en) * | 1997-11-13 | 1999-06-02 | Nissin Electric Co Ltd | Electrode for ion source |
| CN1238551A (en) * | 1998-03-20 | 1999-12-15 | 株式会社荏原制作所 | Beam generation apparatus |
| CN1253659A (en) * | 1997-04-25 | 2000-05-17 | 汤姆森管及展示有限公司 | Cathode structure and electron gun for cathode ray tubes |
| JP2000294123A (en) * | 1999-04-07 | 2000-10-20 | Toshiba Corp | Manufacture of ion source electrode plate |
| JP2002194527A (en) * | 2000-12-27 | 2002-07-10 | Kawasaki Heavy Ind Ltd | Nitriding equipment with electron beam excitation plasma |
| US7947966B2 (en) * | 2007-07-31 | 2011-05-24 | Axcelis Technologies, Inc. | Double plasma ion source |
| JP2013045747A (en) * | 2011-08-26 | 2013-03-04 | Toshiba Corp | Electrode for ion source, and method of manufacturing the same |
| CN107211520A (en) * | 2015-02-05 | 2017-09-26 | 韩国基础科学支援研究院 | Plasma-generating source including porous dielectric |
| CN108441826A (en) * | 2018-02-26 | 2018-08-24 | 温州职业技术学院 | A kind of gas ion source, metal ion source and electron source enhancing arc source and arc current excitation |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09259781A (en) * | 1996-03-21 | 1997-10-03 | Nissin Electric Co Ltd | Ion source device |
| RU2372755C1 (en) * | 2008-02-07 | 2009-11-10 | Федеральное государственное унитарное предприятие "Всероссийский научно-исследовательский институт автоматики им. Н.Л. Духова" | Gas-filled neutron tube with penning source |
-
2018
- 2018-11-15 CN CN201811360138.7A patent/CN109671602B/en active Active
Patent Citations (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63254639A (en) * | 1987-04-11 | 1988-10-21 | Nissin Electric Co Ltd | Ion source |
| JPH02291650A (en) * | 1989-05-01 | 1990-12-03 | Fujitsu Ltd | Electric field ionization type gas ion source |
| JPH04154026A (en) * | 1990-10-15 | 1992-05-27 | Toshiba Corp | Electrode plate for ion source and magnetic filter |
| JPH07142020A (en) * | 1993-11-19 | 1995-06-02 | Rikagaku Kenkyusho | Electron beam exciting negative ion source and negative ion generating method |
| JPH07282993A (en) * | 1994-04-14 | 1995-10-27 | Kawasaki Heavy Ind Ltd | Electron beam generating device for plasma generation energized with electron beam |
| JPH0813151A (en) * | 1994-06-27 | 1996-01-16 | Rikagaku Kenkyusho | Plasma cvd method and apparatus therefor |
| CN1253659A (en) * | 1997-04-25 | 2000-05-17 | 汤姆森管及展示有限公司 | Cathode structure and electron gun for cathode ray tubes |
| JPH11149882A (en) * | 1997-11-13 | 1999-06-02 | Nissin Electric Co Ltd | Electrode for ion source |
| CN1238551A (en) * | 1998-03-20 | 1999-12-15 | 株式会社荏原制作所 | Beam generation apparatus |
| JP2000294123A (en) * | 1999-04-07 | 2000-10-20 | Toshiba Corp | Manufacture of ion source electrode plate |
| JP2002194527A (en) * | 2000-12-27 | 2002-07-10 | Kawasaki Heavy Ind Ltd | Nitriding equipment with electron beam excitation plasma |
| US7947966B2 (en) * | 2007-07-31 | 2011-05-24 | Axcelis Technologies, Inc. | Double plasma ion source |
| JP2013045747A (en) * | 2011-08-26 | 2013-03-04 | Toshiba Corp | Electrode for ion source, and method of manufacturing the same |
| JP5717590B2 (en) * | 2011-08-26 | 2015-05-13 | 株式会社東芝 | Ion source electrode and manufacturing method thereof |
| CN107211520A (en) * | 2015-02-05 | 2017-09-26 | 韩国基础科学支援研究院 | Plasma-generating source including porous dielectric |
| CN108441826A (en) * | 2018-02-26 | 2018-08-24 | 温州职业技术学院 | A kind of gas ion source, metal ion source and electron source enhancing arc source and arc current excitation |
Also Published As
| Publication number | Publication date |
|---|---|
| CN109671602A (en) | 2019-04-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CA1239486A (en) | Gas discharge derived annular plasma pinch x-ray source | |
| KR100577323B1 (en) | Device using low-temperature plasma for generating electrical power | |
| CN108962704A (en) | Magnetron | |
| CN109468598B (en) | Rotating magnetic field cathode arc source | |
| CN109671602B (en) | Composite electron source based on thermionic discharge | |
| US3736447A (en) | Uniform ionization means for mhd generators | |
| JPH02814B2 (en) | ||
| CN108307577B (en) | A kind of high-pressure multi-stage accelerates the cooling structure and current potential distribution method of electrode | |
| JP3550831B2 (en) | Particle beam irradiation equipment | |
| CN106531600A (en) | Device of negative hydrogen ion source of hole-shaped water-cooled electrode extraction system | |
| CN108601193A (en) | A kind of long scale uniform heat plasma arcs production method and device | |
| RU139030U1 (en) | ION-PLASMA ENGINE | |
| CN216391496U (en) | Plasma generating device and ion source | |
| CN109302792A (en) | Space small microwave ecr plasma electron beam generating apparatus and method | |
| CN109659212B (en) | Array hole hollow cathode discharge ion source | |
| Kohlhase et al. | Pulsed metastable atomic beam source for time‐of‐flight applications | |
| Leung et al. | Development of an advanced ‘‘volume’’H− source for neutral beam application | |
| CN109935504B (en) | Rectangular electron source based on thermionic discharge | |
| US3736453A (en) | Arc control in compact arc lamps | |
| CN109671604B (en) | Penning ion source based on hollow cathode discharge | |
| CN111681937B (en) | Cold cathode penning ion source device for high-energy ion implanter | |
| CN209448961U (en) | Space small microwave ecr plasma electron beam generating apparatus | |
| CN107591301A (en) | Novel plasma cathode solid electron gun | |
| CN110144560B (en) | Composite surface modification method and device combining pulse magnetron sputtering and ion implantation | |
| CN109686631B (en) | Array porous hollow cathode discharge electron source |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20240528 Address after: 215000, 2nd Floor, Building 1, No. 19 Yong'an Road, High tech Zone, Suzhou City, Jiangsu Province Patentee after: Suzhou Puweidi Nanotechnology Co.,Ltd. Country or region after: China Address before: 325000 Wenzhou City National University Science Park incubator, No. 38 Dongfang South Road, Ouhai District, Wenzhou, Zhejiang Patentee before: WENZHOU VOCATIONAL & TECHNICAL College Country or region before: China |
|
| TR01 | Transfer of patent right |