CN109669324A - A kind of device and its application method for implementing soft lithography in spherical substrate - Google Patents
A kind of device and its application method for implementing soft lithography in spherical substrate Download PDFInfo
- Publication number
- CN109669324A CN109669324A CN201910029332.5A CN201910029332A CN109669324A CN 109669324 A CN109669324 A CN 109669324A CN 201910029332 A CN201910029332 A CN 201910029332A CN 109669324 A CN109669324 A CN 109669324A
- Authority
- CN
- China
- Prior art keywords
- spherical substrate
- soft template
- pdms
- pdms soft
- main cavity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Abstract
The invention discloses a kind of in spherical substrate implements the device and its application method of soft lithography, is related to micro processing field, comprising: fixed bracket, fixed overarm, main cavity, main cavity height adjusting part, air gauge, gas-charging connection.When use, one that PDMS soft template is had micro-nano structure, which faces outwardly, to be fixed, pass through the size of air pressure and the fixed height of main cavity in control main cavity, PDMS soft template is realized with the spherical substrate for being coated with solidification glue to be in close contact, then pass through hot plate curing colloid, spherical substrate is separated with PDMS soft template after colloid solidification, micro-nano structure is just made in spherical substrate at this time.Apparatus of the present invention are easy to process, easy to operate, and application method is simple, can satisfy the requirement for implementing soft lithography in different bores, different curvature radius spherical substrate.
Description
Technical field
The present invention relates to micro processing fields, and in particular to it is a kind of in spherical substrate implement soft lithography device and
Its application method.
Background technique
Soft lithography is to be mentioned by the Whitesides. M. G research group of Harvard University in the 1990s
Out, it is a series of general names for using the elastomer with patterning as seal or the micro-processing method of template.This grinds
Study carefully group to propose including Microcontact printing, duplication molding, micro- transfer molding, capillary micro shaping, solvent assist micro shaping with
And the technologies such as phase-shift photolithography, other later research groups propose including cast molding technology, embossing technology and injection molding
Technology, decalcomania transfer photoetching technique etc., all these methods have collectively constituted soft lithography.
Compared with conventional lithographic techniques, soft lithography is had many advantages.First, soft lithography does not need expensive
Lithographic equipment is supported, cost of manufacture can greatly be reduced.This is because the prerequisite for implementing soft lithography is only one
Block has the Elastic forming board of micro-nano structure, can be easily once operator has one piece of motherboard with micro-nano structure
Produce such Elastic forming board (typical material is PDMS).In general, soft lithographic motherboard can pass through self manufacture or purchase
The method bought obtains.Second, soft lithography is very easy to study and operation, and most people can be slapped when contacting first time
It holds.Third, the resolution ratio with higher of soft lithography, at least may be implemented the preparation of 30nm nanostructure at present.4th,
Soft lithography can be used for making the micro-nano structure on spherical substrate (such as optical lens), this is because soft lithography uses
Be Elastic forming board, itself have good flexibility, can be relatively easily in close contact with substrate, to realize micro-
The production of micro-nano structure.
However, in experimenting, we find out that, when soft lithography is used for the preparation of micro-nano structure in spherical substrate always
There is the case where PDMS soft template contacts not close, generation large area bubble with substrate, even soft template is separated with substrate, finally
Cause to implement soft lithography failure in spherical substrate.
Summary of the invention
The present invention is to overcome contact not existing when preparing micro-nano structure in spherical substrate using soft lithography
Closely, there is bubble to occur, PDMS soft template the practical problems such as falls off from substrate, the present invention provides a kind of to be implemented in spherical substrate
The device and its application method of soft lithography.
To achieve the goals above, the invention provides the following technical scheme:
A kind of device for implementing soft lithography in spherical substrate, comprising: fixed bracket, fixed overarm, main cavity, main cavity
Height adjusting part, air gauge, gas-charging connection；Air gauge and gas-charging connection are connected on main chamber body；Main chamber body be by
PDMS soft template supporting part and PDMS soft template fixed part two parts composition；Main chamber body passes through back side fastening screw and fixation
Overarm connection；Main chamber body front is provided with cylindrical cavity.
Main chamber physical efficiency is taken off from fixed bracket, can also take off from fixed overarm；Main chamber body front
Cylindrical cavity diameter can according to the diameter of spherical substrate determine.
The PDMS soft template supporting part and PDMS soft template fixed part two parts are fixed using fastening screw；The PDMS
There is a boss for enclosing sealing function on soft template supporting part.
A kind of application method of device that implementing soft lithography in spherical substrate, includes the following steps:
Step 1: main cavity is removed, it is face-up to place, the PDMS soft template with micro-nano structure is placed in PDMS soft template
Between supporting part and PDMS soft template fixed part, fixed screw is tightened, wherein have micro-nano structure in PDMS soft template one faces
Outside；
Step 2: the main cavity for fixing PDMS soft template being attached on fixed bracket, and allows main cavity face down, inflation connects
External air charging system, for controlling inner gas pressure size；
Step 3: the colloid that heat cure is capable of in rotation way or spraying in spherical substrate is placed in inactive heating plate, will be heated
Plate is placed on immediately below main cavity；
Step 4: if it is soft lithography is implemented in concave ball surfaces substrate, then needing to increase inner gas pressure, make PDMS soft template
Protrusion adjusts position, main cavity height and the blowing pressure size of spherical substrate, makes the PDMS soft template of spherical substrate and protrusion
It is in close contact；It if it is soft lithography is implemented in convex spherical substrate, then needs to apply a lesser air pressure, keeps
PDMS soft template is kept convex substrate and PDMS soft template close by a thrust gas but not raised, adjustment main cavity height
It forces together, the convex portion of convex substrate can will be in PDMS soft template top to main cavity at this time；
Step 5: after spherical substrate and the close contact of PDMS soft template, keeping status, start heater plate, wait colloid solidification
Spherical substrate is separated with PDMS soft template afterwards, micro-nano structure is just made in spherical substrate at this time.
The invention has the following beneficial effects:
It is to devise a kind of device and its application method for implementing soft lithography in spherical substrate in place of novelty of the invention,
The bore of its PDMS soft template fixing groove can be adjusted according to the diameter designed, designed of required spherical substrate, flexibly and easily.Main body
Gas pressure intensity in cavity can also be accurately controlled according to actual needs, be met in the spherical substrate of different curvature radius
Implement the needs of soft lithography.The device is easy to process, easy to operate, and application method does not need the additional of valuableness simply and sets
It is standby, use cost can be saved, is had the characteristics that efficient, economical, simple, easy-to-use.
Detailed description of the invention
Fig. 1 is a kind of apparatus structure schematic diagram for implementing soft lithography in spherical substrate of the present invention.
Fig. 2 is PDMS soft template supporting part structural schematic diagram of the present invention.
Fig. 3 is PDMS soft template fixing part structure schematic diagram of the present invention.
Fig. 4 is the structural schematic diagram being connected to after air gauge and gas-charging connection on main cavity of the present invention.
In figure: 1, fixed bracket, 2, fixed overarm, 3, main cavity, 4, main cavity height adjusting part, 5, air gauge, 6, fill
Gas connector, 7, PDMS soft template supporting part, 8, PDMS soft template fixed part, 9, boss, 10, front side fastening screw, 11, the back side it is tight
Gu screw.
Specific embodiment
As shown in Figure 1, a kind of device for implementing soft lithography in spherical substrate, including fixed bracket 1, fixed overarm
2, main cavity 3, main cavity height adjusting part 4, air gauge 5, gas-charging connection 6；Air gauge 5 and inflation are connected on main chamber body 3
Connector 6；Main chamber body 3 is made of PDMS soft template supporting part 7 and 8 two parts of PDMS soft template fixed part；Main chamber
Body 3 is connect by back side fastening screw 11 with fixed overarm 2；3 front of main chamber body is provided with cylindrical cavity.Main chamber body
3 can take off from fixed bracket 1, can also take off from fixed overarm 2；The positive cylindrical cavity of main chamber body 3 is straight
Diameter size can be determined according to the diameter of spherical substrate.The PDMS soft template supporting part 7 and PDMS soft template fixed part 8
Two parts are fixed using front side fastening screw 10；There is a boss 9 for enclosing sealing function on the PDMS soft template supporting part 7.
The present invention also provides a kind of in spherical substrate implement soft lithography device application method, including it is as follows
Step:
Step 1: main cavity is removed, it is face-up to place, the PDMS soft template with micro-nano structure is placed in PDMS soft template
Between supporting part and PDMS soft template fixed part, fixed screw is tightened, wherein have micro-nano structure in PDMS soft template one faces
Outside；
Step 2: the main cavity for fixing PDMS soft template being attached on fixed bracket, and allows main cavity face down, inflation connects
External air charging system, for controlling inner gas pressure size；
Step 3: the colloid that heat cure is capable of in rotation way or spraying in spherical substrate is placed in inactive heating plate, will be heated
Plate is placed on immediately below main cavity；
Step 4: if it is soft lithography is implemented in concave ball surfaces substrate, then needing to increase inner gas pressure, make PDMS soft template
Protrusion adjusts position, main cavity height and the blowing pressure size of spherical substrate, makes the PDMS soft template of spherical substrate and protrusion
It is in close contact；It if it is soft lithography is implemented in convex spherical substrate, then needs to apply a lesser air pressure, keeps
PDMS soft template is kept convex substrate and PDMS soft template close by a thrust gas but not raised, adjustment main cavity height
It forces together, the convex portion of convex substrate can will be in PDMS soft template top to main cavity at this time；
Step 5: after spherical substrate and the close contact of PDMS soft template, keeping status, start heater plate, wait colloid solidification
Spherical substrate is separated with PDMS soft template afterwards, micro-nano structure is just made in spherical substrate at this time.
The above is only embodiments of the present invention, it is noted that for those skilled in the art, is not being taken off
Under the premise of from present inventive concept, several improvement can also be made, such as change the shape or material of device each section, change control
The mode of air pressure processed changes the fixed form of each section, these improvement also should be regarded as in protection scope of the present invention.
Claims (4)
1. a kind of device for implementing soft lithography in spherical substrate characterized by comprising fixed bracket (1), fixed outstanding
Beam (2), main cavity (3), main cavity height adjusting part (4), air gauge (5), gas-charging connection (6)；Main chamber body connects on (3)
Air gauge (5) and gas-charging connection (6)；Main chamber body (3) is by PDMS soft template supporting part (7) and PDMS soft template fixed part
(8) two parts form；Main chamber body (3) is connect by back side fastening screw (11) with fixed overarm (2)；Main chamber body
(3) front is provided with cylindrical cavity.
2. a kind of device for implementing soft lithography in spherical substrate according to claim 1, which is characterized in that institute
Stating main cavity (3) can take off from fixed bracket (1), can also take off from fixed overarm (2)；Main chamber body (3) is just
The cylindrical cavity diameter in face can be determined according to the diameter of spherical substrate.
3. a kind of device for implementing soft lithography in spherical substrate according to claim 1, which is characterized in that institute
It is fixed using front side fastening screw (10) to state PDMS soft template supporting part (7) and PDMS soft template fixed part (8) two parts；It is described
There is a boss (9) for enclosing sealing function on PDMS soft template supporting part (7).
4. a kind of application method for the device for implementing soft lithography in spherical substrate described in a kind of claim 1-3,
It is characterized in that, includes the following steps:
Step 1: main cavity (3) is removed, it is face-up to place, the PDMS soft template with micro-nano structure is placed in PDMS soft mode
Between plate supporting part (7) and PDMS soft template fixed part (8), fixed screw is tightened, wherein has micro-nano structure in PDMS soft template
One face outwardly；
Step 2: the main cavity (3) for fixing PDMS soft template being attached on fixed bracket (1), and main cavity (3) is allowed just to face
Under, gas-charging connection (6) external air charging system, for controlling inner gas pressure size；
Step 3: the colloid that heat cure is capable of in rotation way or spraying in spherical substrate is placed in inactive heating plate, will be heated
Plate is placed on immediately below main cavity (3)；
Step 4: if it is soft lithography is implemented in concave ball surfaces substrate, then needing to increase inner gas pressure, make PDMS soft template
Protrusion adjusts position, main cavity height and the blowing pressure size of spherical substrate, makes the PDMS soft template of spherical substrate and protrusion
It is in close contact；It if it is soft lithography is implemented in convex spherical substrate, then needs to apply a lesser air pressure, keeps
PDMS soft template is kept convex substrate and PDMS soft template close by a thrust gas but not raised, adjustment main cavity height
It forces together, the convex portion of convex substrate can will be in PDMS soft template top to main cavity at this time；
Step 5: after spherical substrate and the close contact of PDMS soft template, keeping status, start heater plate, wait colloid solidification
Spherical substrate is separated with PDMS soft template afterwards, micro-nano structure is just made in spherical substrate at this time.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910029332.5A CN109669324B (en) | 2019-01-13 | 2019-01-13 | Device for implementing soft lithography technology on spherical substrate and use method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910029332.5A CN109669324B (en) | 2019-01-13 | 2019-01-13 | Device for implementing soft lithography technology on spherical substrate and use method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109669324A true CN109669324A (en) | 2019-04-23 |
| CN109669324B CN109669324B (en) | 2021-12-24 |
Family
ID=66149449
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910029332.5A Active CN109669324B (en) | 2019-01-13 | 2019-01-13 | Device for implementing soft lithography technology on spherical substrate and use method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109669324B (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060280829A1 (en) * | 2005-06-13 | 2006-12-14 | Asml Netherlands B.V. | Imprint lithography |
| CN101452207A (en) * | 2007-12-05 | 2009-06-10 | 中国科学院微电子研究所 | Nanometer stamping and photoetching machine |
| CN102346369A (en) * | 2011-09-08 | 2012-02-08 | 青岛理工大学 | Nanoimprint lithography machine for whole wafer |
| CN202205025U (en) * | 2011-09-08 | 2012-04-25 | 青岛理工大学 | Full wafer photo nanoimprint lithography machine |
| CN207172731U (en) * | 2017-09-14 | 2018-04-03 | 长春工业大学 | A kind of device for vibrating auxiliary hot padding |
-
2019
- 2019-01-13 CN CN201910029332.5A patent/CN109669324B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060280829A1 (en) * | 2005-06-13 | 2006-12-14 | Asml Netherlands B.V. | Imprint lithography |
| CN101452207A (en) * | 2007-12-05 | 2009-06-10 | 中国科学院微电子研究所 | Nanometer stamping and photoetching machine |
| CN102346369A (en) * | 2011-09-08 | 2012-02-08 | 青岛理工大学 | Nanoimprint lithography machine for whole wafer |
| CN202205025U (en) * | 2011-09-08 | 2012-04-25 | 青岛理工大学 | Full wafer photo nanoimprint lithography machine |
| CN207172731U (en) * | 2017-09-14 | 2018-04-03 | 长春工业大学 | A kind of device for vibrating auxiliary hot padding |
Also Published As
| Publication number | Publication date |
|---|---|
| CN109669324B (en) | 2021-12-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1981236B (en) | Apparatus, system and method to vary dimensions of a substrate during nano-scale manufacturing | |
| CN103048878B (en) | Imprint method, imprint apparatus, and article manufacturing method | |
| CN103135341B (en) | Imprinting apparatus, the article manufacturing method using this imprinting apparatus and method for stamping | |
| US7204686B2 (en) | Parallelism adjustment device | |
| CN1726429B (en) | Chucking system and method for modulating shapes of substrates | |
| CN101073034B (en) | Method for imprint lithography at constant temperature | |
| TWI271777B (en) | Uniform pressing micro-nano transfer printing apparatus | |
| CN101852877B (en) | Method and nanoimprint equipment for manufacturing moire grating | |
| CN101776851B (en) | Three DOF micro-positioning workbench for nano-imprint lithography system | |
| CN107457984B (en) | A kind of producing device and method of high fill-ratio PDMS microlens array | |
| JP2008512697A5 (en) | ||
| CN101403855A (en) | Ultraviolet/hot pressing curing type nano-printing method and stamping press | |
| WO2001033300A3 (en) | High precision orientation alignment and gap control stages for imprint lithography processes | |
| WO2020119469A1 (en) | Processing device and processing method for toroidal gratings | |
| EP2865513B1 (en) | Roller pressing device, imprinting device, and roller pressing method | |
| CN103913784A (en) | Method for preparing polymer micro lens array | |
| CN102463293A (en) | Uniform pressing device for embossing roll-to-sheet | |
| CN109669324A (en) | A kind of device and its application method for implementing soft lithography in spherical substrate | |
| CN106494009A (en) | The production method of minute surface hyperbolic aluminum honeycomb panel | |
| CN111674172A (en) | Printing process for forming metal texture on surface of base material | |
| CN110441838A (en) | Preparation method based on titanium dioxide organic and inorganic photosensitive composite film abnormity convex lens array | |
| CN105293429A (en) | Preparation method of structure with controllable surface hydrophobic property | |
| CN107123724B (en) | Method and device for molding electric control variable curved surface fluorescent membrane | |
| KR20120123193A (en) | Apparatus and method for manufacturing sheet-like device | |
| CN209606769U (en) | Nano-imprinting device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |