CN109669324B - Device for implementing soft lithography technology on spherical substrate and use method thereof - Google Patents
Device for implementing soft lithography technology on spherical substrate and use method thereof Download PDFInfo
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- CN109669324B CN109669324B CN201910029332.5A CN201910029332A CN109669324B CN 109669324 B CN109669324 B CN 109669324B CN 201910029332 A CN201910029332 A CN 201910029332A CN 109669324 B CN109669324 B CN 109669324B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
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Abstract
The invention discloses a device for implementing soft lithography technology on a spherical substrate and a use method thereof, relating to the field of micro-machining and comprising the following steps: the device comprises a fixed support, a fixed suspension beam, a main cavity body height adjusting part, a barometer and an inflation connector. When the micro-nano structure curing device is used, the surface of the PDMS soft template with the micro-nano structure is fixed outwards, the PDMS soft template is in close contact with the spherical substrate coated with the curing glue by controlling the size of air pressure in the main cavity and the fixed height of the main cavity, the colloid is cured through the heating plate, the spherical substrate is separated from the PDMS soft template after the colloid is cured, and the micro-nano structure is prepared on the spherical substrate. The device of the invention is easy to process, convenient to operate and simple in use method, and can meet the requirements of implementing soft lithography technology on spherical substrates with different calibers and different curvature radii.
Description
Technical Field
The invention relates to the field of micro-machining, in particular to a device for implementing a soft lithography technology on a spherical substrate and a using method thereof.
Background
Soft lithography, a collective term for a series of micromachining processes that use patterned elastomers as stamps or templates, was developed in the nineties of the last century by the whitesides. Techniques including microcontact imprinting, replica molding, micro-transfer molding, capillary micro-molding, solvent assisted micro-molding, and phase shift lithography have been proposed by this group, and later techniques including cast molding, embossing, and spray molding, decal transfer lithography, and the like, all of which collectively constitute soft lithography.
Soft lithography has many advantages over conventional lithography. First, the soft lithography does not require expensive lithography equipment support, and can greatly reduce the manufacturing cost. This is because the soft lithography technology is performed only on one elastic template having a micro-nano structure, and once an operator has a master having a micro-nano structure, such an elastic template (typically, PDMS) can be easily manufactured. Generally, a soft lithographic master may be obtained by a method of self-fabrication or purchase. Second, soft lithography is very easy to learn and operate, and most people can master it when first touched. Third, soft lithography has a high resolution, and can currently achieve at least 30nm nanostructure fabrication. Fourthly, the soft lithography technology can be used for manufacturing the micro-nano structure on the spherical substrate (such as an optical lens), and the soft lithography technology adopts an elastic template, so that the soft lithography technology has good flexibility and can be easily in close contact with the substrate, and the micro-nano structure can be manufactured.
However, in experiments, it is found that when the soft lithography technology is used for preparing the micro-nano structure on the spherical substrate, the situation that the PDMS soft template is not in close contact with the substrate, large-area bubbles are generated, and even the soft template is separated from the substrate always occurs, and finally the soft lithography technology fails to be implemented on the spherical substrate.
Disclosure of Invention
The invention provides a device for implementing a soft lithography technology on a spherical substrate and a using method thereof, aiming at overcoming the practical problems of loose contact, bubble occurrence, shedding of a PDMS soft template from the substrate and the like when a micro-nano structure is prepared on the spherical substrate by using the soft lithography technology.
In order to achieve the above purpose, the invention provides the following technical scheme:
an apparatus for performing soft lithography on a spherical substrate, comprising: the device comprises a fixed support, a fixed suspension beam, a main cavity body height adjusting part, a barometer and an inflation connector; the main cavity body is connected with a barometer and an inflation connector; the main cavity body consists of a PDMS soft template bearing part and a PDMS soft template fixing part; the main cavity is connected with the fixed suspension beam through a back fastening screw; the front surface of the main cavity is provided with a cylindrical cavity.
The main cavity can be taken off from the fixed bracket and can also be taken off from the fixed suspension beam; the diameter of the cylindrical cavity on the front surface of the main cavity can be determined according to the diameter of the spherical substrate.
The PDMS soft template bearing part and the PDMS soft template fixing part are fixed by fastening screws; and a circle of bosses for sealing are arranged on the bearing part of the PDMS soft template.
A method of using an apparatus for performing soft lithography on a spherical substrate, comprising the steps of:
step 1: taking down the main cavity, placing the main cavity with the front side facing upwards, placing a PDMS soft template with a micro-nano structure between a PDMS soft template bearing part and a PDMS soft template fixing part, and screwing a fixing screw, wherein one surface of the PDMS soft template with the micro-nano structure faces outwards;
step 2: the main cavity body fixed with the PDMS soft template is arranged on a fixed support, the front surface of the main cavity body faces downwards, and an inflating joint is externally connected with an inflating device and used for controlling the inflating pressure;
and step 3: placing the spherical substrate on an un-started heating plate after spinning or spraying colloid capable of being thermally cured on the spherical substrate, and placing the heating plate right below the main cavity;
and 4, step 4: if the soft lithography technology is implemented on the concave spherical substrate, the inflation pressure needs to be increased to make the PDMS soft template convex, and the position of the spherical substrate, the height of the main cavity and the inflation pressure are adjusted to make the spherical substrate and the convex PDMS soft template tightly contact; if the soft lithography technology is implemented on the convex spherical substrate, a small air pressure is required to be applied, the PDMS soft template is kept under an air thrust but is not protruded, the height of the main cavity is adjusted to tightly press the convex substrate and the PDMS soft template together, and at the moment, the protruded part of the convex substrate pushes the PDMS soft template into the main cavity;
and 5: and after the spherical substrate is tightly contacted with the PDMS soft template, keeping the current situation, starting a heating plate for heating, and after the colloid is cured, separating the spherical substrate from the PDMS soft template, so that the micro-nano structure is prepared on the spherical substrate.
The invention has the following beneficial effects:
the invention is novel in that a device for implementing the soft lithography technology on the spherical substrate and a using method thereof are designed, the caliber of the PDMS soft template fixing groove can be designed and adjusted according to the diameter of the required spherical substrate, and the device is flexible and convenient. The gas pressure in the main cavity can be accurately controlled according to actual needs, and the requirements of implementing the soft lithography technology on spherical substrates with different curvature radii are met. The device is easy to process, convenient to operate, simple in using method, free of expensive additional equipment, capable of saving using cost, and has the characteristics of high efficiency, economy, simplicity, easiness in use and the like.
Drawings
FIG. 1 is a schematic diagram of an apparatus for performing soft lithography on a spherical substrate according to the present invention.
FIG. 2 is a schematic view of the bearing portion of the PDMS soft template of the present invention.
FIG. 3 is a schematic view of a fixing portion of a PDMS soft template according to the present invention.
FIG. 4 is a schematic diagram of the main body cavity of the present invention with the barometer and inflation fitting attached.
In the figure: 1. the device comprises a fixed support, 2, a fixed suspension beam, 3, a main cavity, 4, a main cavity height adjusting part, 5, a barometer, 6, an inflation connector, 7, a PDMS soft template bearing part, 8, a PDMS soft template fixing part, 9, a boss, 10, a front fastening screw and 11, a back fastening screw.
Detailed Description
As shown in fig. 1, a device for implementing a soft lithography technique on a spherical substrate comprises a fixed support 1, a fixed suspension beam 2, a main cavity body 3, a main cavity body height adjusting part 4, a barometer 5 and an inflation connector 6; the main cavity 3 is connected with a barometer 5 and an inflation connector 6; the main cavity 3 consists of a PDMS soft template bearing part 7 and a PDMS soft template fixing part 8; the main cavity 3 is connected with the fixed suspension beam 2 through a back fastening screw 11; the front surface of the main cavity 3 is provided with a cylindrical cavity. The main cavity 3 can be taken off from the fixed bracket 1 and also from the fixed suspension beam 2; the diameter of the cylindrical cavity on the front surface of the main cavity 3 can be determined according to the diameter of the spherical substrate. The PDMS soft template bearing part 7 and the PDMS soft template fixing part 8 are fixed by a front fastening screw 10; and a circle of bosses 9 for sealing are arranged on the PDMS soft template bearing part 7.
The invention also provides a use method of the device for implementing the soft lithography technology on the spherical substrate, which comprises the following steps:
step 1: taking down the main cavity, placing the main cavity with the front side facing upwards, placing a PDMS soft template with a micro-nano structure between a PDMS soft template bearing part and a PDMS soft template fixing part, and screwing a fixing screw, wherein one surface of the PDMS soft template with the micro-nano structure faces outwards;
step 2: the main cavity body fixed with the PDMS soft template is arranged on a fixed support, the front surface of the main cavity body faces downwards, and an inflating joint is externally connected with an inflating device and used for controlling the inflating pressure;
and step 3: placing the spherical substrate on an un-started heating plate after spinning or spraying colloid capable of being thermally cured on the spherical substrate, and placing the heating plate right below the main cavity;
and 4, step 4: if the soft lithography technology is implemented on the concave spherical substrate, the inflation pressure needs to be increased to make the PDMS soft template convex, and the position of the spherical substrate, the height of the main cavity and the inflation pressure are adjusted to make the spherical substrate and the convex PDMS soft template tightly contact; if the soft lithography technology is implemented on the convex spherical substrate, a small air pressure is required to be applied, the PDMS soft template is kept under an air thrust but is not protruded, the height of the main cavity is adjusted to tightly press the convex substrate and the PDMS soft template together, and at the moment, the protruded part of the convex substrate pushes the PDMS soft template into the main cavity;
and 5: and after the spherical substrate is tightly contacted with the PDMS soft template, keeping the current situation, starting a heating plate for heating, and after the colloid is cured, separating the spherical substrate from the PDMS soft template, so that the micro-nano structure is prepared on the spherical substrate.
The above description is only an embodiment of the present invention, and it should be noted that, for those skilled in the art, modifications can be made without departing from the spirit of the present invention, such as changing the shape or material of each part of the device, changing the way of controlling the air pressure, changing the way of fixing each part, and these modifications should be considered as being within the protection scope of the present invention.
Claims (3)
1. An apparatus for performing soft lithography on a spherical substrate, comprising: the device comprises a fixed support (1), a fixed suspension beam (2), a main cavity body (3), a main cavity body height adjusting part (4), a barometer (5) and an inflation connector (6); the main cavity (3) is connected with a barometer (5) and an inflation connector (6); the main cavity (3) consists of a PDMS soft template bearing part (7) and a PDMS soft template fixing part (8); the main cavity (3) is connected with the fixed suspension beam (2) through a back fastening screw (11); the front surface of the main cavity (3) is provided with a cylindrical cavity, wherein the PDMS soft template bearing part (7) and the PDMS soft template fixing part (8) are fixed by using a front surface fastening screw (10); a circle of bosses (9) playing a sealing role are arranged on the PDMS soft template bearing part (7), and a PDMS soft template with a micro-nano structure is arranged between the PDMS soft template bearing part (7) and the PDMS soft template fixing part (8); if the soft lithography technology is implemented on the concave spherical substrate, the inflation pressure needs to be increased to make the PDMS soft template convex, and the position of the concave spherical substrate, the height of the main cavity and the inflation pressure are adjusted to make the concave spherical substrate and the convex PDMS soft template tightly contact; if the soft lithography technology is implemented on the convex spherical substrate, a small air pressure is required to be applied, the PDMS soft template is kept under an air thrust but is not protruded, the height of the main cavity is adjusted to tightly press the convex spherical substrate and the PDMS soft template together, at the moment, the protrusion part of the convex spherical substrate pushes the PDMS soft template into the main cavity, and the height of the main cavity is adjusted through the main cavity height adjusting part.
2. An apparatus for performing soft lithography on spherical substrates according to claim 1, characterized in that said main chamber (3) can be removed from the fixed support (1) and also from the fixed cantilever beam (2); the diameter of the cylindrical cavity on the front surface of the main cavity (3) can be determined according to the diameter of the spherical substrate.
3. Use of a device for performing soft lithography on spherical substrates according to claim 1 or 2, characterized in that it comprises the following steps:
step 1: taking down the main cavity (3), placing the main cavity with the front side facing upwards, placing a PDMS soft template with a micro-nano structure between a PDMS soft template bearing part (7) and a PDMS soft template fixing part (8), and screwing a fastening screw, wherein one side of the PDMS soft template with the micro-nano structure faces outwards;
step 2: the main cavity body (3) with the PDMS soft template fixed is arranged on the fixed support (1), the front surface of the main cavity body (3) faces downwards, and an inflating joint (6) is externally connected with an inflating device and used for controlling the inflating pressure;
and step 3: the spherical substrate is screwed or sprayed with colloid capable of being thermally cured and then placed on a heating plate which is not started, and the heating plate is placed under the main cavity (3);
and 4, step 4: if the soft lithography technology is implemented on the concave spherical substrate, the inflation pressure needs to be increased to make the PDMS soft template convex, and the position of the concave spherical substrate, the height of the main cavity and the inflation pressure are adjusted to make the concave spherical substrate and the convex PDMS soft template tightly contact; if the soft lithography technology is implemented on the convex spherical substrate, a small air pressure is required to be applied, the PDMS soft template is kept under an air thrust but is not protruded, the height of the main cavity is adjusted to tightly press the convex spherical substrate and the PDMS soft template together, and at the moment, the protruded part of the convex spherical substrate pushes the PDMS soft template into the main cavity;
and 5: and after the spherical substrate is tightly contacted with the PDMS soft template, keeping the current situation, starting a heating plate for heating, and after the colloid is cured, separating the spherical substrate from the PDMS soft template, so that the micro-nano structure is prepared on the spherical substrate.
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101452207A (en) * | 2007-12-05 | 2009-06-10 | 中国科学院微电子研究所 | Nanometer stamping and photoetching machine |
| CN102346369A (en) * | 2011-09-08 | 2012-02-08 | 青岛理工大学 | Nanoimprint lithography machine for whole wafer |
| CN202205025U (en) * | 2011-09-08 | 2012-04-25 | 青岛理工大学 | Full wafer photo nanoimprint lithography machine |
| CN207172731U (en) * | 2017-09-14 | 2018-04-03 | 长春工业大学 | A kind of device for vibrating auxiliary hot padding |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7377764B2 (en) * | 2005-06-13 | 2008-05-27 | Asml Netherlands B.V. | Imprint lithography |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101452207A (en) * | 2007-12-05 | 2009-06-10 | 中国科学院微电子研究所 | Nanometer stamping and photoetching machine |
| CN102346369A (en) * | 2011-09-08 | 2012-02-08 | 青岛理工大学 | Nanoimprint lithography machine for whole wafer |
| CN202205025U (en) * | 2011-09-08 | 2012-04-25 | 青岛理工大学 | Full wafer photo nanoimprint lithography machine |
| CN207172731U (en) * | 2017-09-14 | 2018-04-03 | 长春工业大学 | A kind of device for vibrating auxiliary hot padding |
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