CN109564886A - 基板清洗装置 - Google Patents

基板清洗装置 Download PDF

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Publication number
CN109564886A
CN109564886A CN201780047281.8A CN201780047281A CN109564886A CN 109564886 A CN109564886 A CN 109564886A CN 201780047281 A CN201780047281 A CN 201780047281A CN 109564886 A CN109564886 A CN 109564886A
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Prior art keywords
water
purge chamber
base plate
water container
ozone
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CN201780047281.8A
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CN109564886B (zh
Inventor
徐顺龙
谢忠伟
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Shenzhen Royole Technologies Co Ltd
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Shenzhen Royole Technologies Co Ltd
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere

Abstract

提供了一种基板清洗装置(10)，包括光清洗室(11)、循环水清洗装置(17)及载水容器(15)；光清洗室(11)用于对基板(100)进行光清洗，并容纳在光清洗的过程中生成的臭氧，光清洗室(11)与载水容器(15)连通，使得臭氧能够导入载水容器(15)，以对载水容器(15)内的水进行杀菌消毒；载水容器(15)内的水能够流入循环水清洗装置(17)，以供循环水清洗装置(17)对基板(100)进行水清洗。通过将光清洗室内生成的多余臭氧导入载水容器，对载水容器进行杀菌消毒，保证了循环水清洗装置所用的水干净清洁，从而能够确保基板的洁净无菌；并且，也对多余的臭氧进行了有效利用，避免了多余臭氧直接排出造成的污染。

Description

PCT国内申请，说明书已公开。

Claims (10)

  1. PCT国内申请，权利要求书已公开。
CN201780047281.8A 2017-06-27 2017-06-27 基板清洗装置 Active CN109564886B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2017/090298 WO2019000216A1 (zh) 2017-06-27 2017-06-27 基板清洗装置

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CN109564886A true CN109564886A (zh) 2019-04-02
CN109564886B CN109564886B (zh) 2020-06-23

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ID=64740797

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CN201780047281.8A Active CN109564886B (zh) 2017-06-27 2017-06-27 基板清洗装置

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CN (1) CN109564886B (zh)
WO (1) WO2019000216A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112435938A (zh) * 2020-11-11 2021-03-02 深圳市华星光电半导体显示技术有限公司 基板清洗设备及基板清洗方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5464477A (en) * 1992-09-18 1995-11-07 Crest Ultrasonics Corporation Process for cleaning and drying ferrous surfaces without causing flash rusting
CN1214535A (zh) * 1997-10-09 1999-04-21 三菱电机株式会社 半导体基片的处理系统及处理方法
CN102888584A (zh) * 2012-09-17 2013-01-23 上海大学 一种基于金刚石薄膜上沉积CdTe薄膜的方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN203521379U (zh) * 2013-06-18 2014-04-02 上海交通大学 紫外光和臭氧表面清洗与氧化改性真空设备
CN104392898A (zh) * 2014-10-11 2015-03-04 北京工业大学 一种清洗钝化GaAS晶圆表面的方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5464477A (en) * 1992-09-18 1995-11-07 Crest Ultrasonics Corporation Process for cleaning and drying ferrous surfaces without causing flash rusting
CN1214535A (zh) * 1997-10-09 1999-04-21 三菱电机株式会社 半导体基片的处理系统及处理方法
CN102888584A (zh) * 2012-09-17 2013-01-23 上海大学 一种基于金刚石薄膜上沉积CdTe薄膜的方法

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WO2019000216A1 (zh) 2019-01-03
CN109564886B (zh) 2020-06-23

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Address after: 518172 43 Universiade Software Town, 8288 Longgang Avenue, Henggang Street, Longgang District, Shenzhen City, Guangdong Province

Patentee after: Shenzhen Ruoyu Technology Co.,Ltd.

Address before: 518172 43 Universiade Software Town, 8288 Longgang Avenue, Henggang Street, Longgang District, Shenzhen City, Guangdong Province

Patentee before: SHENZHEN ROYOLE TECHNOLOGIES Co.,Ltd.

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