CN109536897B - 24 source continuous organic material evaporation equipment - Google Patents

24 source continuous organic material evaporation equipment Download PDF

Info

Publication number
CN109536897B
CN109536897B CN201910040797.0A CN201910040797A CN109536897B CN 109536897 B CN109536897 B CN 109536897B CN 201910040797 A CN201910040797 A CN 201910040797A CN 109536897 B CN109536897 B CN 109536897B
Authority
CN
China
Prior art keywords
vacuum
evaporation
cabin
upper substrate
baffle plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201910040797.0A
Other languages
Chinese (zh)
Other versions
CN109536897A (en
Inventor
孔令杰
吴克松
李明
李晓丽
陶辉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Anhui Beq Equipment Technology Co ltd
Original Assignee
Anhui Beq Equipment Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anhui Beq Equipment Technology Co ltd filed Critical Anhui Beq Equipment Technology Co ltd
Priority to CN201910040797.0A priority Critical patent/CN109536897B/en
Publication of CN109536897A publication Critical patent/CN109536897A/en
Application granted granted Critical
Publication of CN109536897B publication Critical patent/CN109536897B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12Organic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • C23C14/505Substrate holders for rotation of the substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention discloses 24-source continuous organic material evaporation equipment, which comprises an equipment frame, wherein a vacuum cabin and a touch computer are arranged at the upper end of the equipment frame, the touch computer is positioned at the edge position of one side of the vacuum cabin, a molecular pump controller is arranged at the front end of the equipment frame, molecular pumps are symmetrically arranged at the two sides of the vacuum cabin, a baffle plate and an electrode are arranged at the bottom end of the vacuum cabin, the electrode is positioned at the two sides of the bottom end of the baffle plate, evaporation source selection holes are formed in the baffle plate, a first motor is connected at the middle position of the bottom end of the baffle plate, the first motor is positioned in the equipment frame, and an upper substrate is arranged right above the baffle plate; the 24-source continuous organic material evaporation equipment can uniformly receive molecules or atoms evaporated from different evaporation molybdenum boats, and adjusts the heating temperature and heating time of the evaporation molybdenum boats through the thickness variation trend and uniformity of the organic film, so that the organic coating film with target components and thickness is obtained.

Description

24 source continuous organic material evaporation equipment
Technical Field
The invention belongs to the technical field of multi-source organic material evaporation equipment, and particularly relates to 24-source continuous organic material evaporation equipment.
Background
When current universities, scientific research institutions and enterprises carry out scientific research and small-batch preparation of new film materials, a vacuum coating system is adopted to realize the growth of various film materials, and the vacuum coating system mainly comprises metal vapor deposition equipment and organic vapor deposition equipment. The organic vapor deposition equipment is mainly used for the optimal equipment for organic electroluminescence, lighting devices, solar cells and semiconductor process research, has high working efficiency and has the effect of twice the result with little effort; however, the existing organic material evaporation equipment has the following defects in the using process: (1) At the same evaporation temperature, the vapor pressures of the elements in the alloy are different, so that the evaporation rates are also different, a fractionation phenomenon occurs, and an alloy or a compound film with a desired proportion of components is often not obtained; (2) When an alloy or compound raw material composed of two or more elements is vapor-deposited, a thin film having the same composition as the raw material is not necessarily obtained; (3) When preparing alloy or compound film with preset components by vapor deposition, the evaporation source needs to be improved, such as instant vapor deposition and double evaporation sources, and organic small molecules are easy to accumulate on the top substrate of the vacuum cabin after evaporation to generate local non-uniformity.
Disclosure of Invention
In order to overcome the technical problems, the invention aims to provide a 24-source continuous organic material evaporation equipment, which is used for realizing alloy coating of an upper substrate material by adopting 24 organic evaporation sources, can uniformly receive molecules or atoms evaporated from different evaporation molybdenum boats, and is used for adjusting the heating temperature and heating time of the evaporation molybdenum boats through the thickness variation trend and uniformity of an organic film so as to obtain an organic coating film with target components and thickness.
The aim of the invention can be achieved by the following technical scheme:
the utility model provides a 24 continuous organic material evaporation equipment of source, includes the equipment frame, vacuum cabin and touch computer are installed to the upper end of equipment frame, and the touch computer is located vacuum cabin one side border position, molecular pump controller is installed to the front end of equipment frame, molecular pump is installed to vacuum cabin both sides symmetry, baffle and electrode are installed to the inside bottom of vacuum cabin, the electrode is located the bottom both sides of baffle, the evaporation source selection hole has been seted up on the baffle, the bottom intermediate position of baffle is connected with the motor No. one, and the motor No. one is located the equipment frame, install the upper substrate directly over the baffle, run through vacuum cabin top left side position and be connected with the film thickness appearance probe, and the film thickness appearance probe stretches into upper substrate surface, run through vacuum cabin top right side position installs the vacuum gauge, install the push-pull valve on the molecular pump, two sets of push-pull valve are about the vacuum cabin symmetry setting;
the back end of the vacuum cabin is provided with a movable back cabin door, the front end of the vacuum cabin is provided with a front cabin door in a movable mode, evaporation sources are distributed in the middle of the inner portion of the vacuum cabin, and one side of the vacuum cabin is provided with a standby interface.
As a further scheme of the invention: and a second motor is arranged right above the vacuum chamber, the second motor is sequentially connected with a coupler and magnetic fluid from top to bottom, an upper heating plate penetrates through the middle position of the top of the vacuum chamber and is connected with the upper heating plate, and the upper base plate is matched with the upper heating plate to rotate through the second motor.
As a further scheme of the invention: an O-shaped ring and a clamp are arranged on the inner wall of the upper end of the vacuum chamber, and the electrode and the vacuum gauge are connected with the top of the vacuum chamber in a sealing way through the O-shaped ring and the clamp.
As a further scheme of the invention: the back of the equipment frame is provided with a film thickness instrument controller, the film thickness instrument probe is electrically connected with the film thickness instrument controller, and the output end of the touch computer is electrically connected with the film thickness instrument controller, the vacuum gauge, the molecular pump controller and the vacuum cabin.
As a further scheme of the invention: the lower base plate is arranged right below the baffle, 24 groups of evaporation molybdenum boats are arranged on the lower base plate, materials to be evaporated are placed on the 24 groups of evaporation molybdenum boats, a lower heating plate is arranged at the bottom end of the baffle, and the baffle and the lower heating plate are connected with the bottom of the vacuum cabin through electrodes.
As a further scheme of the invention: the high vacuum unit is installed in the vacuum cabin, and an upper heating plate is installed at the upper end of the upper base plate.
As a further scheme of the invention: and a vacuum pipeline penetrates through the molecular pump and is arranged on one side close to the vacuum cabin, and the gate valve is matched with the vacuum pipeline.
As a further scheme of the invention: the specific operation steps of the evaporation equipment are as follows:
step one: respectively placing an upper substrate and a lower substrate on an upper heating plate and a lower heating plate in a vacuum cabin, and respectively placing materials to be evaporated on 24 groups of evaporation molybdenum boats of the lower substrate;
step two: closing and fastening the front cabin door and the rear cabin door, starting a high vacuum unit to vacuumize the vacuum cabin, heating the upper substrate by the upper heating plate when the vacuum is below a target value, performing program heating on the evaporation molybdenum boat by the lower heating plate, enabling the evaporation material to be evaporated of the lower substrate to escape from an evaporation source selection Kong Qihua arranged on the baffle plate in a molecular or atomic mode after being heated, forming a vapor flow of the plating material, making the vapor flow incident on the surface of the upper substrate, and simultaneously driving the upper substrate to rotate at a constant speed by the combination of the upper heating plate and the second motor;
step three: the film thickness meter probe is arranged on the surface of the upper substrate and detects the film thickness change and uniformity of the coating film of the upper substrate in real time.
The invention has the beneficial effects that:
1. through adopting 24 continuous organic material evaporation sources to realize the alloy coating film to base plate material, can effectually avoid organic micromolecule to gather at vacuum cabin top upper substrate easily after evaporating and produce local inhomogeneous phenomenon, and the upper substrate cooperates the target head to rotate at the uniform velocity under the effect of No. two motors, runs through vacuum cabin top left side simultaneously and installs the film thickness appearance probe and stretch into upper substrate surface, can detect upper substrate film thickness variation and homogeneity in real time, ensures coating film quality.
2. The baffle plate is provided with the vapor deposition source selection holes, molecules or atoms generated after the material to be vapor deposited is heated can be well selected, and thus, the film with the same components as the raw materials is obtained.
3. The vacuum cabin is vacuumized through the high vacuum unit and the molecular pump, the vacuum gauge can detect the vacuum degree in the vacuum cabin, and the vacuum state of the vacuum cabin is ensured, so that the vapor pressures of all alloy elements in the vacuum cabin are kept consistent at the same evaporation temperature, and the phenomenon of fractionation is avoided due to different evaporation rates.
Drawings
The invention is further described below with reference to the accompanying drawings.
Fig. 1 is a schematic diagram of the overall structure of a 24-source continuous organic material vapor deposition device according to the present invention.
Fig. 2 is a schematic diagram of the internal structure of a vacuum chamber in a 24-source continuous organic material evaporation device according to the present invention.
In the figure, a motor I; 2. an electrode; 3. a baffle; 4. a vapor deposition source selection hole; 5. an upper substrate; 6. a film thickness gauge probe; 7. a motor II; 8. a vacuum gauge; 9. a gate valve; 10. a molecular pump; 11. a touch control computer; 12. a molecular pump controller; 13. a rear hatch; 14. a standby interface; 15. a vapor deposition source; 16. a vacuum chamber; 17. a front hatch; 18. an upper heating plate; 19. a lower substrate; 20. a lower heating plate; 21. and a device frame.
Detailed Description
The technical solutions of the embodiments of the present invention will be clearly and completely described below in conjunction with the embodiments of the present invention, and it is apparent that the described embodiments are only some embodiments of the present invention, not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
As shown in fig. 1-2, a 24-source continuous organic material evaporation device comprises an equipment frame 21, wherein a vacuum cabin 16 and a touch computer 11 are installed at the upper end of the equipment frame 21, the touch computer 11 is located at the edge position of one side of the vacuum cabin 16, a molecular pump controller 12 is installed at the front end of the equipment frame 21, molecular pumps 10 are symmetrically installed at the two sides of the vacuum cabin 16, a baffle 3 and an electrode 2 are installed at the inner bottom end of the vacuum cabin 16, the electrode 2 is located at the two sides of the bottom end of the baffle 3, evaporation source selection holes 4 are formed in the baffle 3, a first motor 1 is connected to the middle position of the bottom end of the baffle 3, the first motor 1 is located in the equipment frame 21, an upper substrate 5 is installed right above the baffle 3, a film thickness gauge probe 6 is connected to the left side position penetrating through the top of the vacuum cabin 16, the film thickness gauge probe 6 stretches into the surface of the upper substrate 5, a vacuum gauge 8 is installed at the right side position penetrating the top of the vacuum cabin 16, a gate valve 9 is installed on the molecular pump 10, two groups of gate valves 9 are symmetrically arranged about the vacuum cabin 16;
the rear end of the vacuum cabin 16 is provided with a movable rear cabin door 13, the front end of the vacuum cabin 16 is provided with a front cabin door 17, evaporation sources 15 are distributed in the middle position inside the vacuum cabin 16, and one side of the vacuum cabin 16 is provided with a standby interface 14.
The motor No. two 7 is installed directly over the vacuum chamber 16, the motor No. two 7 is connected with a coupler and magnetic fluid from top to bottom in sequence, and an upper heating plate 18 penetrates through the middle position of the top of the vacuum chamber 16, and the upper base plate 5 is matched with the upper heating plate 18 to rotate through the motor No. two 7.
An O-shaped ring and a clamp are arranged on the inner wall of the upper end of the vacuum chamber 16, and the electrode 2 and the vacuum gauge 8 are connected with the top of the vacuum chamber 16 in a sealing way through the O-shaped ring and the clamp.
The back of the equipment frame 21 is provided with a film thickness gauge controller, the film thickness gauge probe 6 is electrically connected with the film thickness gauge controller, and the output end of the touch control computer 11 is electrically connected with the film thickness gauge controller, the vacuum gauge 8, the molecular pump controller 12 and the vacuum cabin 16.
A lower base plate 19 is arranged right below the baffle plate 3, 24 groups of evaporation molybdenum boats are arranged on the lower base plate 19, materials to be evaporated are placed on the 24 groups of evaporation molybdenum boats, a lower heating plate 20 is arranged at the bottom end of the baffle plate 3, and the baffle plate 3 and the lower heating plate 20 are connected with the bottom of the vacuum cabin 16 through electrodes 2.
A high vacuum unit is installed in the vacuum chamber 16, and an upper heating plate 18 is installed at the upper end of the upper substrate 5.
A vacuum pipeline is arranged through the interior of the molecular pump 10 and near one side of the vacuum cabin 16, and the gate valve 9 is matched with the vacuum pipeline.
The specific operation steps of the evaporation equipment are as follows:
step one: the upper base plate 5 and the lower base plate 19 are respectively placed on an upper heating plate 18 and a lower heating plate 20 in a vacuum chamber 16, and materials to be evaporated are respectively placed on 24 groups of evaporation molybdenum boats of the lower base plate 19;
step two: closing and fastening the front cabin door 17 and the rear cabin door 13, starting a high vacuum unit to vacuumize the vacuum cabin 16, heating the upper substrate 5 by the upper heating plate 18 when the vacuum is below a target value, heating the evaporation molybdenum boat by the lower heating plate 20 in a program, vaporizing and escaping the material to be evaporated of the lower substrate 19 in a molecular or atomic mode from the evaporation source selection holes 4 arranged on the baffle plate 3 after being heated, forming a vapor flow of the plating material, and making the vapor flow incident on the surface of the upper substrate 5, and simultaneously driving the upper substrate 5 to rotate at a constant speed by the cooperation of the second motor 7 and the upper heating plate 18;
step three: the film thickness gauge probe 6 is mounted on the surface of the upper substrate 5 and detects the film thickness variation and uniformity of the coating film of the upper substrate 5 in real time.
A24-source continuous organic material evaporation equipment is characterized in that when in operation, an upper substrate and a lower substrate are respectively arranged on an upper heating plate and a lower heating plate in a vacuum cabin, materials to be evaporated are respectively arranged on 24 groups of evaporation molybdenum boats of the lower substrate, a front cabin door and a rear cabin door are closed and fastened, the equipment is operated by a touch computer, a power supply is connected under the action of a molecular pump controller, a high vacuum unit is started to vacuumize the vacuum cabin, when the vacuum reaches below a target value of 10-2Pa, the upper heating plate heats the upper substrate, the lower heating plate heats the evaporation molybdenum boats in a program, the materials to be evaporated of the lower substrate are selected Kong Qihua in a molecular or atomic mode after being heated, vapor of the formed plating materials flows into the surface of the upper substrate, the vapor is continuously shaped, the vapor is diffused and sublimated to form a solid film in the film forming process, the second motor drives the upper substrate to rotate at a certain speed for uniformly receiving molecules or atoms evaporated from different evaporation molybdenum boats, wherein the arrangement of the front cabin door and the rear cabin door is convenient for the sampling, the laying and the dismounting and the mounting of organic sources in the evaporation molybdenum boats, the vacuum cabin can well provide a vacuum environment required by experiments, the electrodes and the vacuum gauges are all in sealed connection with the top of the vacuum cabin through O-shaped rings and hoops, so that the sealing performance of the vacuum cabin is improved, finally, a film thickness meter probe penetrates through the left side of the top of the vacuum cabin and is arranged on the surface of the upper substrate, the film thickness variation and the uniformity of an upper substrate film are detected in real time through the film thickness meter controller, the heating temperature and the heating time of the evaporation molybdenum boat are adjusted through the thickness parameters detected by the film thickness meter probe, so that the organic film with target components and thickness can be obtained, a standby interface is arranged on one side of the vacuum cabin, interfaces can be reserved for extending other functions.
According to the invention, the alloy coating of the substrate material is realized by adopting 24 continuous organic material evaporation sources, so that the phenomenon that organic small molecules are easy to gather on the top of the vacuum chamber to generate local non-uniformity after evaporation can be effectively avoided, the upper substrate is matched with the target head to rotate at a uniform speed under the action of the second motor, meanwhile, a film thickness meter probe is installed on the left side penetrating through the top of the vacuum chamber and stretches into the surface of the upper substrate, the film thickness variation and uniformity of the upper substrate can be detected in real time, and the coating quality is ensured; the baffle is provided with the vapor deposition source selection holes, so that molecules or atoms generated after the material to be vapor deposited is heated can be well selected, and a film with the same components as the raw materials is obtained; the vacuum cabin is vacuumized through the high vacuum unit and the molecular pump, the vacuum gauge can detect the vacuum degree in the vacuum cabin, and the vacuum state of the vacuum cabin is ensured, so that the vapor pressures of all alloy elements in the vacuum cabin are kept consistent at the same evaporation temperature, and the phenomenon of fractionation is avoided due to different evaporation rates.
In the description of the present specification, the descriptions of the terms "one embodiment," "example," "specific example," and the like, mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present invention. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiments or examples. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
The foregoing is merely illustrative of the structures of this invention and various modifications, additions and substitutions for those skilled in the art can be made to the described embodiments without departing from the scope of the invention or from the scope of the invention as defined in the accompanying claims.

Claims (6)

1. A24 source continuous organic material evaporation equipment is characterized by comprising an equipment frame (21), wherein a vacuum cabin (16) and a touch computer (11) are arranged at the upper end of the equipment frame (21), the touch computer (11) is positioned at one side edge position of the vacuum cabin (16), a molecular pump controller (12) is arranged at the front end of the equipment frame (21), a molecular pump (10) is symmetrically arranged at two sides of the vacuum cabin (16), a baffle plate (3) and an electrode (2) are arranged at the inner bottom end of the vacuum cabin (16), the electrode (2) is positioned at two sides of the bottom end of the baffle plate (3), evaporation source selection holes (4) are formed in the baffle plate (3), a first motor (1) is connected at the middle position of the bottom end of the baffle plate (3), the first motor (1) is positioned in the equipment frame (21), an upper substrate (5) is arranged right above the baffle plate (3), a film thickness gauge probe (6) is connected at the left side position of the top of the vacuum cabin (16), the film thickness gauge (6) extends into the upper substrate (5), the vacuum cabin (8) is arranged at the top of the vacuum cabin (9), the two groups of gate valves (9) are symmetrically arranged about the vacuum cabin (16);
the rear end of the vacuum cabin (16) is provided with a movable rear cabin door (13), the front end of the vacuum cabin (16) is movably provided with a front cabin door (17), evaporation sources (15) are distributed in the middle position inside the vacuum cabin (16), and one side of the vacuum cabin (16) is provided with a standby interface (14);
a second motor (7) is arranged right above the vacuum chamber (16), the second motor (7) is sequentially connected with a coupler and magnetic fluid from top to bottom, an upper heating plate (18) penetrates through the middle position of the top of the vacuum chamber (16), and the upper substrate (5) is matched with the upper heating plate (18) to rotate through the second motor (7);
a lower base plate (19) is arranged right below the baffle plate (3), 24 groups of evaporation molybdenum boats are arranged on the lower base plate (19), evaporation materials to be evaporated are placed on the 24 groups of evaporation molybdenum boats, a lower heating plate (20) is arranged at the bottom end of the baffle plate (3), and the baffle plate (3) and the lower heating plate (20) are connected with the bottom of the vacuum cabin (16) through electrodes (2);
the upper heating plate heats the upper substrate, the lower heating plate heats the evaporation molybdenum boat in a program, the material to be evaporated of the lower substrate escapes from the evaporation source selection Kong Qihua arranged on the baffle plate in a molecular or atomic mode after being heated, the vapor forming the plating material flows into the surface of the upper substrate, the vapor is continuously nucleated, diffused and sublimated to form a solid film, and the second motor drives the upper substrate to rotate at a certain speed in the film forming process, so that the molecules or atoms evaporated from different evaporation molybdenum boats are uniformly received.
2. The 24-source continuous organic material evaporation equipment according to claim 1, wherein an O-shaped ring and a clamp are arranged on the inner wall of the upper end of the vacuum chamber (16), and the electrode (2) and the vacuum gauge (8) are connected with the top of the vacuum chamber (16) in a sealing manner through the O-shaped ring and the clamp.
3. The 24-source continuous organic material evaporation equipment according to claim 1, wherein a film thickness gauge controller is installed on the back of the equipment frame (21), the film thickness gauge probe (6) is electrically connected with the film thickness gauge controller, and the output end of the touch control computer (11) is electrically connected with the film thickness gauge controller, the vacuum gauge (8), the molecular pump controller (12) and the vacuum chamber (16).
4. The 24-source continuous organic material evaporation equipment according to claim 1, wherein a high vacuum unit is installed in the vacuum chamber (16), and an upper heating plate (18) is installed at the upper end of the upper substrate (5).
5. A 24-source continuous organic material evaporation equipment according to claim 1, wherein a vacuum pipeline is arranged through the interior of the molecular pump (10) and near one side of the vacuum chamber (16), and the gate valve (9) is matched with the vacuum pipeline.
6. The 24-source continuous organic material evaporation equipment according to claim 1, wherein the specific operation steps of the evaporation equipment are as follows:
step one: an upper heating plate (18) and a lower heating plate (19) which are respectively arranged in the vacuum chamber (16) are respectively arranged on the upper substrate (5) and the lower substrate (19)
On the hot plate (20), the materials to be evaporated are respectively placed on 24 groups of evaporation molybdenum boats of the lower substrate (19);
step two: closing and fastening the front cabin door (17) and the rear cabin door (13), starting a high-vacuum unit to vacuumize the vacuum cabin (16), heating the upper substrate (5) by the upper heating plate (18) when the vacuum is below a target value, heating the vapor deposition molybdenum boat by the lower heating plate (20), vaporizing and escaping the vapor deposition material to be vapor deposited of the lower substrate (19) in a molecular or atomic mode from the vapor deposition source selection holes (4) arranged on the baffle plate (3) after being heated, forming vapor flow of the plating material, making the vapor flow of the plating material incident on the surface of the upper substrate (5), and simultaneously driving the upper substrate (5) to rotate at a uniform speed by the cooperation of the upper heating plate (18) by the second motor (7);
step three: the film thickness meter probe (6) is arranged on the surface of the upper substrate (5) and detects the film thickness change and uniformity of the coating film of the upper substrate (5) in real time.
CN201910040797.0A 2019-01-16 2019-01-16 24 source continuous organic material evaporation equipment Active CN109536897B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910040797.0A CN109536897B (en) 2019-01-16 2019-01-16 24 source continuous organic material evaporation equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910040797.0A CN109536897B (en) 2019-01-16 2019-01-16 24 source continuous organic material evaporation equipment

Publications (2)

Publication Number Publication Date
CN109536897A CN109536897A (en) 2019-03-29
CN109536897B true CN109536897B (en) 2023-11-07

Family

ID=65835305

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201910040797.0A Active CN109536897B (en) 2019-01-16 2019-01-16 24 source continuous organic material evaporation equipment

Country Status (1)

Country Link
CN (1) CN109536897B (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006016627A (en) * 2004-06-30 2006-01-19 Nec Kansai Ltd Vacuum vapor deposition apparatus
JP2008121104A (en) * 2006-10-16 2008-05-29 Able:Kk Vacuum vapor-deposition apparatus
CN101280418A (en) * 2008-04-29 2008-10-08 南京邮电大学 Multi-source vacuum evaporation device having multi-layer radial type evaporation source distribution structure
CN101988185A (en) * 2010-12-14 2011-03-23 无锡虹彩科技发展有限公司 Film coating source, vacuum film coating device and film coating process thereof
CN204898054U (en) * 2015-07-30 2015-12-23 苏州方昇光电装备技术有限公司 Small -size vacuum deposition appearance
CN106440803A (en) * 2016-10-12 2017-02-22 安徽贝意克设备技术有限公司 Vertical vacuum tube type hot-press furnace
CN209508393U (en) * 2019-01-16 2019-10-18 合肥百思新材料研究院有限公司 A kind of continuous organic material evaporating-plating equipment in 24 sources

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006016627A (en) * 2004-06-30 2006-01-19 Nec Kansai Ltd Vacuum vapor deposition apparatus
JP2008121104A (en) * 2006-10-16 2008-05-29 Able:Kk Vacuum vapor-deposition apparatus
CN101280418A (en) * 2008-04-29 2008-10-08 南京邮电大学 Multi-source vacuum evaporation device having multi-layer radial type evaporation source distribution structure
CN101988185A (en) * 2010-12-14 2011-03-23 无锡虹彩科技发展有限公司 Film coating source, vacuum film coating device and film coating process thereof
CN204898054U (en) * 2015-07-30 2015-12-23 苏州方昇光电装备技术有限公司 Small -size vacuum deposition appearance
CN106440803A (en) * 2016-10-12 2017-02-22 安徽贝意克设备技术有限公司 Vertical vacuum tube type hot-press furnace
CN209508393U (en) * 2019-01-16 2019-10-18 合肥百思新材料研究院有限公司 A kind of continuous organic material evaporating-plating equipment in 24 sources

Also Published As

Publication number Publication date
CN109536897A (en) 2019-03-29

Similar Documents

Publication Publication Date Title
CN102534491B (en) Preparation device and preparation method for absorbing layer of high conversion efficiency CIGS (Copper Indium Gallium Selenium) thin film solar cell
CN107058970B (en) A kind of fuel battery metal polar plate vacuum plated film pipelining equipment and its film plating process
CN100594255C (en) Method and device for preparing rare earth doped gallium nitride light-emitting film
CN104962876B (en) Graphite surface boron-doped diamond film material and preparation method thereof
CN207552442U (en) A kind of large area HF CVD diamond film growth device
CN105714256A (en) Method for low-temperature preparation of DLC film through magnetron sputtering
CN104711527A (en) Method for magnetron sputtering low-temperature preparation of TiN film
CN107604328A (en) A kind of fuel battery metal double polar plate highly effective ring vacuum coater
CN102496565A (en) Device for roll-to-roll deposited absorption layer on flexible substrate
CN104532190B (en) A kind of preparation method of Zr Cu metal glass thin film
CN109536897B (en) 24 source continuous organic material evaporation equipment
CN104677950A (en) Formaldehyde-sensitive material used for semiconductor formaldehyde sensor and semiconductor formaldehyde sensor
CN109487338A (en) A kind of preparation method of monocrystalline vanadium dioxide film
CN209508393U (en) A kind of continuous organic material evaporating-plating equipment in 24 sources
CN208803138U (en) A kind of double ion beam sputtered coating apparatus of four targets
CN110318035A (en) The more hot filament deposit method and devices of the discrete of alloy cpd film
CN102051576A (en) Method for preparing n type doped cubic boron nitride pellicle
CN208701194U (en) A kind of novel device for preparing film
CN104480441B (en) The method that metal alloy target prepares hydrogeneous zinc oxide aluminum transparent electroconductive film
CN102828152A (en) Preparation method of Mo film with low resistance rate
CN105132875B (en) A kind of method that diffusion method prepares high concentration gradient AZO monocrystalline conductive films
CN101660132B (en) Method for preparing silicon-carbon hydride film by magnetron sputtering
CN104505462A (en) Organic metal halide film and preparation method and application thereof
CN206271716U (en) A kind of copper-indium-galliun-selenium film solar cell that prefabricated layers of copper is uniformly distributed based on high-quality
CN204385286U (en) Plunder angle reactive deposition equipment

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
TA01 Transfer of patent application right

Effective date of registration: 20230112

Address after: 230000 China (Anhui) Pilot Free Trade Zone, Hefei, Anhui Province D7-308, Phase I, Innovation Industrial Park Road, No. 800, Wangjiang West Road, High-tech Zone, Hefei

Applicant after: ANHUI BEQ EQUIPMENT TECHNOLOGY CO.,LTD.

Address before: 238000 northwest corner of the intersection of Heping Avenue and Xiuhu Road, Chaohu Economic Development Zone, Hefei City, Anhui Province

Applicant before: HEFEI BAISI NEW MATERIALS RESEARCH INSTITUTE Co.,Ltd.

TA01 Transfer of patent application right
GR01 Patent grant
GR01 Patent grant