CN109416515B - 保持装置、投影光学系统、曝光装置及物品制造方法 - Google Patents

保持装置、投影光学系统、曝光装置及物品制造方法 Download PDF

Info

Publication number
CN109416515B
CN109416515B CN201780041316.7A CN201780041316A CN109416515B CN 109416515 B CN109416515 B CN 109416515B CN 201780041316 A CN201780041316 A CN 201780041316A CN 109416515 B CN109416515 B CN 109416515B
Authority
CN
China
Prior art keywords
optical element
support member
holding device
curved surface
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201780041316.7A
Other languages
English (en)
Chinese (zh)
Other versions
CN109416515A (zh
Inventor
春见和之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN109416515A publication Critical patent/CN109416515A/zh
Application granted granted Critical
Publication of CN109416515B publication Critical patent/CN109416515B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/10—Mirrors with curved faces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/185—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors with means for adjusting the shape of the mirror surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
CN201780041316.7A 2016-07-07 2017-06-16 保持装置、投影光学系统、曝光装置及物品制造方法 Active CN109416515B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016-135253 2016-07-07
JP2016135253A JP6808381B2 (ja) 2016-07-07 2016-07-07 保持装置、投影光学系、露光装置、および物品製造方法
PCT/JP2017/022347 WO2018008366A1 (ja) 2016-07-07 2017-06-16 保持装置、投影光学系、露光装置、および物品製造方法

Publications (2)

Publication Number Publication Date
CN109416515A CN109416515A (zh) 2019-03-01
CN109416515B true CN109416515B (zh) 2021-03-30

Family

ID=60912741

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201780041316.7A Active CN109416515B (zh) 2016-07-07 2017-06-16 保持装置、投影光学系统、曝光装置及物品制造方法

Country Status (4)

Country Link
JP (1) JP6808381B2 (https=)
KR (1) KR102193387B1 (https=)
CN (1) CN109416515B (https=)
WO (1) WO2018008366A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3566637B1 (en) 2018-05-11 2024-11-06 Optos plc Oct image processing
JP7227810B2 (ja) * 2019-03-25 2023-02-22 キヤノン株式会社 光学装置、露光装置および物品製造方法
TWI730666B (zh) * 2020-03-12 2021-06-11 財團法人國家實驗研究院 具有次鏡調焦機構之光學系統
JP7328292B2 (ja) * 2021-09-24 2023-08-16 キヤノン株式会社 保持装置、露光装置、及び物品の製造方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101231389A (zh) * 2003-11-06 2008-07-30 松下电器产业株式会社 可变形镜
CN102162900A (zh) * 2011-05-18 2011-08-24 中国科学院长春光学精密机械与物理研究所 反射镜高精度装夹装置
CN102436052A (zh) * 2011-12-13 2012-05-02 北京空间机电研究所 一种大口径轻质反射镜光轴水平重力卸载支撑方法
CN102997880A (zh) * 2012-11-26 2013-03-27 西安力德测量设备有限公司 三坐标机防振动气动控制微调系统
CN104101999A (zh) * 2013-04-12 2014-10-15 赫克斯冈技术中心 包括可利用致动器有针对性地形变的透镜的旋转激光器

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0626571Y2 (ja) * 1986-12-12 1994-07-20 三菱重工業株式会社 砂杭施工機用液圧式押し込み装置
JP2000084795A (ja) 1998-09-17 2000-03-28 Nikon Corp 光学部品の加工システム及び加工方法
US6618209B2 (en) * 2000-08-08 2003-09-09 Olympus Optical Co., Ltd. Optical apparatus
DE10045265A1 (de) * 2000-09-13 2002-03-21 Zeiss Carl Vorrichtung zum Bündeln der Strahlung einer Lichtquelle
EP1365270B1 (en) * 2001-01-30 2012-01-18 Panasonic Corporation Variable mirror and information apparatus comprising variable mirror
KR100596498B1 (ko) * 2004-06-30 2006-07-03 전자부품연구원 다중 프레임 기반 온라인 얼굴 인식 시스템
JP2006196559A (ja) * 2005-01-12 2006-07-27 Nikon Corp 露光装置及びマイクロデバイスの製造方法
JP4633484B2 (ja) * 2005-01-19 2011-02-16 オリンパス株式会社 光学素子の支持機構
JP5414204B2 (ja) * 2008-05-29 2014-02-12 キヤノン株式会社 光学素子保持装置、露光装置およびデバイス製造方法
KR101254177B1 (ko) * 2011-10-07 2013-04-19 위아코퍼레이션 주식회사 방사형 기저 함수 신경회로망 알고리즘을 이용한 실시간 얼굴 인식 시스템
JP2015065246A (ja) * 2013-09-24 2015-04-09 キヤノン株式会社 光学装置、光学系、露光装置及び物品の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101231389A (zh) * 2003-11-06 2008-07-30 松下电器产业株式会社 可变形镜
CN102162900A (zh) * 2011-05-18 2011-08-24 中国科学院长春光学精密机械与物理研究所 反射镜高精度装夹装置
CN102436052A (zh) * 2011-12-13 2012-05-02 北京空间机电研究所 一种大口径轻质反射镜光轴水平重力卸载支撑方法
CN102997880A (zh) * 2012-11-26 2013-03-27 西安力德测量设备有限公司 三坐标机防振动气动控制微调系统
CN104101999A (zh) * 2013-04-12 2014-10-15 赫克斯冈技术中心 包括可利用致动器有针对性地形变的透镜的旋转激光器

Also Published As

Publication number Publication date
JP6808381B2 (ja) 2021-01-06
WO2018008366A1 (ja) 2018-01-11
KR20190022731A (ko) 2019-03-06
CN109416515A (zh) 2019-03-01
KR102193387B1 (ko) 2020-12-22
JP2018005117A (ja) 2018-01-11

Similar Documents

Publication Publication Date Title
KR101232234B1 (ko) 클램핑 디바이스 및 대상물 로딩 방법
CN100413112C (zh) 投影曝光设备中的成像装置
CN109416515B (zh) 保持装置、投影光学系统、曝光装置及物品制造方法
JP5820905B2 (ja) スキャナ
JP2014225639A (ja) ミラーユニット及び露光装置
TWI631430B (zh) Optical device, projection optical system, exposure device, and article manufacturing method
JP5206132B2 (ja) 光学素子保持装置、光学系、露光装置、デバイスの製造方法
JP2015537239A (ja) パターニングデバイス操作システム及びリソグラフィ装置
US8064152B2 (en) Supporting device, optical apparatus, exposure apparatus, and device manufacturing method
JP2014529901A (ja) リソグラフィ装置、リソグラフィ装置のセットアップ方法、及びデバイス製造方法
JPH11251409A (ja) 位置決め装置、及び露光装置
JP5989233B2 (ja) リソグラフィ装置およびデバイス製造方法
JP4408301B2 (ja) 流体および磁気軸受の補償技術
KR102165797B1 (ko) 광학 장치, 노광 장치 및 물품의 제조 방법
JP2008112756A (ja) 光学素子駆動装置及びその制御方法、露光装置、並びにデバイス製造方法
KR102230464B1 (ko) 광학 소자, 노광 장치, 및 물품의 제조 방법
KR102319819B1 (ko) 광학장치, 투영 광학계, 노광장치, 및 물품 제조방법
JP2004070192A (ja) 光学要素の支持手段、該光学要素の支持手段による光学系、光学系の調整方法、露光装置、露光方法、デバイス製造方法
JP7759430B1 (ja) 露光装置、露光方法及び物品の製造方法
JP2010102130A (ja) 露光装置
JP2007266511A (ja) 光学系、露光装置、及び光学特性の調整方法
WO2018043314A1 (ja) 光学装置、投影光学系、露光装置、および物品の製造方法
JP2019184928A (ja) 露光装置、および物品の製造方法
JP2016033999A (ja) 露光装置及び物品の製造方法

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant