CN109321887A - The apparatus and method of the preparation uniform film of large scale are monitored using multiple spot reflectivity - Google Patents
The apparatus and method of the preparation uniform film of large scale are monitored using multiple spot reflectivity Download PDFInfo
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- CN109321887A CN109321887A CN201811375130.8A CN201811375130A CN109321887A CN 109321887 A CN109321887 A CN 109321887A CN 201811375130 A CN201811375130 A CN 201811375130A CN 109321887 A CN109321887 A CN 109321887A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
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- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
The present invention provides a kind of device and method for monitoring the preparation uniform film of large scale using multiple spot reflectivity, method suitable for utilizing the monitoring of multiple spot reflectivity in large-sized substrates prepares the uniform film of large scale, pass through the real time monitoring of the reflectivity to multiple monitoring sites, determine the real-time change rate of reflectivity, weak position is supplemented controlling evaporation source by the comparison in each site, the uniformity vapor deposition of entire film layer is completed in conjunction with the preset value initially set up.Plated film is carried out compared to traditional mode for taking thickness monitoring, of the invention monitors the reflectivity changes that the uniform thin device and method of preparation large scale have more directly monitored each position of large size product in coating process using multiple spot reflectivity, it can solve the problems, such as that spot measurement can not assess large size product uniformity in the fabrication process, improve production efficiency.
Description
Technical field
The present invention relates to the surface uniform film layers of photomultiplier transit technical field, especially large scale photocathode to prepare skill
Art, in particular to a kind of apparatus and method for monitoring the preparation uniform film of large scale using multiple spot reflectivity.
Background technique
The uniform film preparing technology of large scale is widely used in optical coating, material surface plated film etc., Related product
Relate to the numerous areas of people's production and living.Large scale film preparation mostly uses a variety of methods of coating, vacuum coating.In reality
In use, parameter needed for many large scale coated products is optical parameter in fact, such as reflectivity, transmitance, absorptivity
Etc..For transparent and semitransparent thin film, manufacturing process can be monitored by optical instrument, and advantage is can to carry out
In situ measurement, and the common film thickness monitoring method of existing filming equipment is that film thickness monitoring is carried out using crystal-vibration-chip, this method is
The relative measurement of ex situ, substrate to be coated can then be blocked by carrying out in situ measurement.
Multiple spot original position optical monitoring technique, make to monitor in the uniform film production preparation process of large scale its product uniformity at
In order to possible.And the product in actual production, being partially completed plated film also needs to carry out corresponding optical check, produces to verify
Whether product meet design requirement, and multiple spot original position optical monitoring technique can carry out the optical property inspection of product while production
It tests.
Summary of the invention
It is an object of that present invention to provide a kind of device and sides that the preparation uniform film of large scale is monitored using multiple spot reflectivity
Method, can each position of direct monitoring large size product reflectivity changes, solve spot measurement can in the fabrication process can
The problem of assessing large size product uniformity.
To reach above-mentioned purpose, the present invention proposes a kind of dress that the preparation uniform film of large scale is monitored using multiple spot reflectivity
It sets, being suitable for product to be coated be in transparent perhaps trnaslucent materials while coating process is still transparent or translucent,
Described device includes vaporization chamber, multi-point transmitting rate test equipment, multichannel bidirectional optical fiber, substrate, evaporation source, evaporation source mobile device
And control system, in which:
Vaporization chamber, the vacuum and temperature environment being arranged to needed for film layer vapor deposition provides, the substrate pass through substrate frame
It is supported on the middle position of vaporization chamber, multichannel bidirectional optical fiber and evaporation source are located above and below substrate；
The multiple spot reflectance test equipment being set to outside deposited chamber, it is monochromatic to be emitted by the multichannel bidirectional optical fiber
Optical signal, and corresponding multipath reflection optical signal is received, the reflectivity of measurand different location is thus calculated；
The evaporation source is configured to the raw material of evaporation coating, and the made film layer of the evaporation source has transparent or translucent
Characteristic；The evaporation source is fixed in evaporation source mobile device and with its synchronizing moving；
The control system is arranged for working as based on the initial value of the multiple spot reflectivity monitored with minimum value to determine
Front-reflection rate change rate Pn, and the comparison based on each current reflectance change rate Pn, and pair with target reflectivity Pre
Than driving the movement of evaporation source mobile device to move to control evaporation source in two-dimensional surface, the position to film layer relatively thin is carried out
It supplies, finally prepares uniform film layer.
In further embodiment, the hole for passing through and fixing for multichannel bidirectional optical fiber is provided in the vaporization chamber, and
Hole is sealed.
In further embodiment, 10 tunnels or more are at least arranged in the multichannel bidirectional optical fiber.
In further embodiment, the substrate is circular-base, and 13 monitoring positions are provided with during film layer is deposited
Point, is respectively correspondingly arranged bidirectional optical fiber, wherein 3*3 distributed rectangular of 9 monitoring sites by substrate centered on round, 4 points
Not Wei Yu each rectangular edges outer side center position.
In further embodiment, the monitoring site forms axial symmetry distribution.
In further embodiment, the evaporation source mobile device includes fixed frame, threaded rod, motor and shaft.
In further embodiment, the control system includes reflectivity computing unit and evaporation source motion control list
Member, wherein calculating current reflectance change rate in the following manner is set in reflectivity computing unit:
Initial reflectance R1 is recorded first, and initial reflectance R1 is stored as reflectivity minimum R2；
Then according to record reflectivity monitoring value R in real time, and the size of R and R2 are judged, when R is less than R2, then using R's
Value substitution R2, i.e. execution R2=R, otherwise do not cover, i.e. holding R2 is constant；
It obtains current reflectance change rate Pn according to reflectivity changes rate Pn calculation formula again and exports；
The evaporation source motion control unit determines each prison according to the comparison of each monitoring site current reflectance change rate Pn
The thicknesses of layers of location point, and it is flat in two dimension to control evaporation source to drive the movement of evaporation source mobile device according to comparing result
It is moved in face, the position relatively thin to film layer is supplied, and finally prepares uniform film with target reflectivity Pre comparison
Layer, wherein Pn=(R+R1-2R2)/R1.
A kind of disclosure according to the present invention, it is also proposed that side that the preparation uniform film of large scale is monitored using multiple spot reflectivity
Method, comprising the following steps:
The target reflectivity change rate Pre of step 1, setting film layer vapor deposition；
Step 2 calibrates multiple spot reflectance test equipment by standard reflectivity print；
Step 3 replaces standard reflectivity print using substrate, prepares evaporation source and starts to be deposited；
Step 4 starts plated film after the interior condition of vaporization chamber reaches plated film requirement, and according to setting in coating process
It fixes time to be spaced and records each reflectivity for monitoring site, then the comparison of the current reflectance change rate by each monitoring point,
And the movement of evaporation source mobile device is driven to move to control evaporation source in two-dimensional surface with the comparison of target reflectivity Pre
Dynamic, the position relatively thin to film layer is supplied, and uniform film layer is finally prepared.
Plated film is carried out compared to traditional mode for taking thickness monitoring, of the invention is prepared using the monitoring of multiple spot reflectivity
The uniform thin device and method of large scale have more directly monitored the reflectivity of each position of large size product in coating process
Variation can solve the problems, such as that spot measurement can not can not assess large size product uniformity in the fabrication process, improve product one
Cause property improves production yields, reduces production and processing link, improves production efficiency.
Detailed description of the invention
Attached drawing is not intended to drawn to scale.In the accompanying drawings, identical or nearly identical group each of is shown in each figure
It can be indicated by the same numeral at part.For clarity, in each figure, not each component part is labeled.
Now, example will be passed through and the embodiments of various aspects of the invention is described in reference to the drawings, in which:
Fig. 1 is that being monitored using multiple spot reflectivity for preferred embodiment prepares the uniform thin device of large scale according to the present invention
Schematic diagram.
Fig. 2A -2C is the evaporation source mobile device of preferred embodiment according to the present invention and its schematic diagram of working principle.
Fig. 3 is the schematic diagram of the multiple spot reflectivity monitoring system test point distribution of preferred embodiment according to the present invention.
Fig. 4 is that its reflectivity changes is illustrated when a kind of film layer is deposited on the specific products of preferred embodiment according to the present invention
Figure.
Fig. 5 is the calculating logic schematic diagram of the product reflectivity changes rate of preferred embodiment according to the present invention.
Fig. 6 is the signal for respectively monitoring position reflectivity changes rate size in the coating process of preferred embodiment according to the present invention
Figure.
Fig. 7 is the signal for respectively monitoring position reflectivity changes rate size after the plated film of preferred embodiment according to the present invention
Figure.
Specific embodiment
In order to better understand the technical content of the present invention, special to lift specific embodiment and institute's accompanying drawings is cooperated to be described as follows.
Various aspects with reference to the accompanying drawings to describe the present invention in the disclosure, shown in the drawings of the embodiment of many explanations.
It is not intended to cover all aspects of the invention for embodiment of the disclosure.It should be appreciated that a variety of designs and reality presented hereinbefore
Those of apply example, and describe in more detail below design and embodiment can in many ways in any one come it is real
It applies, this is because conception and embodiment disclosed in this invention are not limited to any embodiment.In addition, disclosed by the invention one
A little aspects can be used alone, or otherwise any appropriately combined use with disclosed by the invention.
In conjunction with shown in Fig. 1-Fig. 7, preferred embodiment according to the present invention is a kind of to prepare big ruler using the monitoring of multiple spot reflectivity
The device of very little uniform film, suitable for utilizing the method preparation large scale of multiple spot reflectivity monitoring uniformly thin in large-sized substrates
Film.During vapor deposition, by the real time monitoring of the reflectivity to multiple monitoring sites, the real-time variation of reflectivity is determined
Rate supplements weak position controlling evaporation source by the comparison in each site, in conjunction with the preset value initially set up
To complete the uniformity vapor deposition of entire film layer.
Plated film is carried out compared to traditional mode for taking thickness monitoring, of the invention is prepared using the monitoring of multiple spot reflectivity
The uniform thin device and method of large scale have more directly monitored the reflectivity of each position of large size product in coating process
Variation can solve the problems, such as that spot measurement can not can not assess large size product uniformity in the fabrication process, improve product one
Cause property improves production yields, reduces production and processing link, improves production efficiency.
The device that the preparation uniform film of large scale is monitored using multiple spot reflectivity of the embodiment in conjunction with shown in Fig. 1-3,
It is in transparent perhaps trnaslucent materials while coating process suitable for product to be coated is still transparent or translucent, it should
Device includes multi-point transmitting rate test equipment 101, multichannel bidirectional optical fiber 102, vaporization chamber 103,104 (especially large scale of substrate
Substrate), evaporation source 105, evaporation source mobile device 106 and control system 110.
Vaporization chamber 103, the vacuum and temperature environment being arranged to needed for film layer vapor deposition provides.As shown in Figure 1, vaporization chamber
103 generally there are the holes for passing through and fixing for multichannel bidirectional optical fiber 102, and take appropriate measures and be sealed to hole.
Substrate 104 is supported on the middle position of vaporization chamber 103, multichannel bidirectional optical fiber 102 and steaming by substrate frame 104A
It rises and 105 is located above and below substrate 104.
It is isolated among vaporization chamber by large-sized substrate 104 and substrate frame 104A, to ensure the film layer in coating process
It will not be deposited on multichannel bidirectional optical fiber.
Multiple spot reflectance test equipment 101, is set to outside deposited chamber, to emit list by multichannel bidirectional optical fiber 102
Coloured light signal, and corresponding multipath reflection optical signal is received, the reflectivity of measurand different location is thus calculated, such as
It is converted into electric signal by photoelectricity test module, the reflectivity for calculating testee different location (obtains reflectivity
Monitor value).Intuitively it can also characterize or transmit.
Preferably, the reflectivity that multiple spot reflectance test equipment 101 can be realized simultaneously 2 or more monitoring points is surveyed
Examination and calculating.Multiple spot reflectance test equipment 101 can be carried out not by dividing time-sharing multiplex to light source, photoelectricity test module
With the reflectance test of monitoring point, thus the quantity of monitoring point realized of multiple spot reflectance test equipment 101 not by its light source,
The limitation of photoelectricity test module number, but can be limited by 102 quantity of multichannel bidirectional optical fiber.In some embodiments, it may be implemented
Monitoring point quantity can reach dozens of even it is hundreds of.
Multichannel bidirectional optical fiber 102 can use existing Bidirectional Conduction optical fiber, realize and produce multiple spot reflectance test equipment
Raw optical signal export, while the function that reflected light signal can be led back to.
Substrate 104 is used as product to be coated, while having in coating process, and substrate reflectivity changes anti-with thicknesses of layers
The rate of penetrating can change.
Evaporation source 105 is configured to the raw material of evaporation coating, and the made film layer of the evaporation source has transparent or translucent
Characteristic.Evaporation source 105 is fixed in evaporation source mobile device 106 and with its synchronizing moving.
As shown in Figure 1, evaporation source 105 and multichannel bidirectional optical fiber 102 generally via large-sized substrates 104 and its support frame every
It opens, to prevent evaporation source 105 from being vaporized on multichannel bidirectional optical fiber 102, to influence the test of multiple spot reflectance test equipment 101
As a result.
Evaporation source mobile device 106 may be implemented evaporation source and evaporate indoor any movement.As seen in figs. 2a-2c, it steams
The mobile device that rises 106 realizes evaporation source by evaporation source fixed frame 106A, threaded rod 106B, motor 106C, shaft 106D
Evaporating indoor any movement.Wherein shaft 106D can be gone up and down (when being driven), realize the movement in the direction space NeizZhou.
Evaporation source fixed frame 106A and threaded rod 106B is fixed as one by modes such as welding.It, can band when motor 106C rotation
Dynamic threaded rod 106B moves along a straight line, and then realizes evaporation source 105 in the movement in the direction r.Level may be implemented in shaft 106D
The rotation in direction, when shaft 106D rotation, evaporation source 105 is driven, and is planar rotated, and realizes the direction θ
Movement.Any movement of the evaporation source 105 on the direction z, r, θ may be implemented, to realize evaporation source in the combination of above-mentioned movement
105 are evaporating indoor any movement.Motor 106C is especially preferably stepper motor.
That is, threaded rod 106B can be driven to move along a straight line when motor 106C work, and then realize evaporation source
105 linear motion.The rotation of horizontal direction may be implemented in shaft 106D, and when shaft 106D work, evaporation source 105 is by band
It is dynamic, planar it is rotated.In conjunction with motor 106C in perpendicular and shaft 106D work, evaporation source 105 may be implemented and exist
Any movement in filming equipment in two-dimensional surface.
In certain embodiments, it as shown in Fig. 3-Fig. 7, for circular large-sized substrates 104, can be set in coating process
13 reflectivity monitoring sites are set, bidirectional optical fiber is respectively correspondingly set, wherein 9 monitoring sites are centered on substrate circle
3*3 distributed rectangular, 4 are located at the outer side center position of each rectangular edges.
In some preferred embodiments, the monitoring site being arranged in substrate 104 forms axial symmetry distribution, to be more conducive to advise
The monitoring of rule ground and equably vapor deposition supplement.
Control system 110 connect with point reflection rate test equipment 101 and evaporation source mobile device 106, is arranged for base
Current reflectance change rate Pn is determined with minimum value in the initial value of the multiple spot reflectivity monitored, and current based on each point
The comparison of reflectivity changes rate Pn, and drive the movement of evaporation source mobile device to control with the comparison of target reflectivity Pre
Evaporation source processed moves in two-dimensional surface, and the position relatively thin to film layer is supplied, and finally prepares uniform film layer.
In certain embodiments, as shown in figure 4, there is only reflectivity initial value R1 and reflections during reflectivity monitoring
Rate monitoring value R, and there are minimum point R2 in its reflectance curve, therefore the calculation needs of its reflectivity changes rate P are more
Point reflection rate test equipment 101 takes corresponding mode to be calculated.Its technical approach is as shown in figure 5, record record first is first
Beginning reflectivity R1, and R1 is stored as reflectivity minimum R2.Then start to record reflectivity monitoring value R in real time, and judge R with
The size of R2 then covers R2 with the value of R when R is less than R2, then according to formula reflectivity changes rate Pn=(R+R1-2R2)/
R1 obtains current reflectance change rate Pn and exports.Carry out current reflectance R value record every time later, just carry out once to R and
The size of R2 is once judged, stores R2 numerical value, final output current reflectance change rate Pn again.
Implementing procedure as shown in connection with fig. 5, the control system 110 include reflectivity computing unit and evaporation source movement
Control unit, wherein calculating current reflectance change rate in the following manner is set in reflectivity computing unit:
Initial reflectance R1 is recorded first, and initial reflectance R1 is stored as reflectivity minimum R2；
Then according to record reflectivity monitoring value R in real time, and the size of R and R2 are judged, when R is less than R2, then using R's
Value substitution R2, i.e. execution R2=R, otherwise do not cover, i.e. holding R2 is constant；
It obtains current reflectance change rate Pn according to reflectivity changes rate Pn calculation formula again and exports；
The evaporation source motion control unit determines each prison according to the comparison of each monitoring site current reflectance change rate Pn
The thicknesses of layers of location point, and it is flat in two dimension to control evaporation source to drive the movement of evaporation source mobile device according to comparing result
It is moved in face, the position relatively thin to film layer is supplied, and finally prepares uniform film with target reflectivity Pre comparison
Layer, wherein Pn=(R+R1-2R2)/R1.
In certain embodiments, as shown in fig. 6, in coating process the reflectivity changes rate Pn of each monitoring point not phase
Together, therefore in coating process the reflectivity changes rate Pn size for needing more each position, determines the thicknesses of layers of each position,
And according to 105 position of result moving evaporation source, the position relatively thin to film layer is supplied, is finally prepared with good uniformity
Film layer, as shown in Figure 7.
In conjunction with shown in Fig. 1, Fig. 2A -2C, Fig. 5, disclosure according to the present invention also proposes that a kind of utilization multiple spot reflectivity monitors
The method for preparing the uniform film of large scale, comprising the following steps:
The target reflectivity change rate Pre of step 1, setting film layer vapor deposition；
Step 2 calibrates multiple spot reflectance test equipment by standard reflectivity print；
Step 3 replaces standard reflectivity print using substrate, prepares evaporation source and starts to be deposited；
Step 4 starts plated film after the interior condition of vaporization chamber reaches plated film requirement, and according to setting in coating process
It fixes time to be spaced and records each reflectivity for monitoring site, then the comparison of the current reflectance change rate by each monitoring point,
And the movement of evaporation source mobile device is driven to move to control evaporation source in two-dimensional surface with the comparison of target reflectivity Pre
Dynamic, the position relatively thin to film layer is supplied, and uniform film layer is finally prepared.
It in step 1, can be by theoretical calculation, based on items such as large-sized substrates 104, evaporation source 105 and thicknesses of layers
Part calculates plated film target reflectivity change rate by model calculating.For example, the meter that peak Institutes Of Technology Of Nanjing Li Xiao et al. proposes
Calculation method.
Before reflectivity monitoring of the invention is implemented, before starting plated film, it is also necessary in installation large-sized substrates 104
Each monitoring position installation standard reflectivity print is set, multiple spot reflectance test equipment 101 is calibrated.Then it is reflected to multiple spot
After the completion of rate test equipment 101 is calibrated, standard reflectivity print is taken out, places large-sized substrates 104 and evaporation source 105, is placed
Check that whether evaporation source 105 and multichannel bidirectional optical fiber 102 are completed isolation, are finally starting progress coating process after the completion.
Start plated film after 103 interior condition of vaporization chamber reaches plated film requirement.In some firepower of having a try, in coating process
Each point reflectivity changes rate Pn numerical value is compared at interval of certain time, it is right according to comparison result moving evaporation source position
Its reflectivity changes rate Pn minimum position carries out supplement plated film, until each point reaches plated film target reflectivity change rate.
By above technical scheme, this hair propose using multiple spot reflectivity monitor preparation the uniform film of large scale device and
Method, have it is following significant the utility model has the advantages that
1) present invention carries out large scale film preparation using multiple spot reflectivity monitor mode, can be more conveniently not to production
Product carry out multiple spot in situ measurement, the film layer variation of real time monitoring product different location to the performance of product in the case where blocking；
2) present invention carries out large scale film preparation using multiple spot reflectivity monitor mode, can during the preparation process directly
The optical performance parameter and even film layer implementations for recognizing product, do not need to test by postorder, can be in process of production
Judge whether product reaches design requirement；
3) present invention can pass through moving evaporation according to the monitored results of large-sized substrates different location in coating process
Source position is corrected membrane uniformity；
4) aforementioned techniques of the invention solution as a whole is suitable for a variety of large scale optical articles and manufactures,
Production process monitoring data are perfect, and product membrane uniformity is good, and the production efficiency and yields of optical articles can be improved.
Although the present invention has been disclosed as a preferred embodiment, however, it is not to limit the invention.Skill belonging to the present invention
Has usually intellectual in art field, without departing from the spirit and scope of the present invention, when can be used for a variety of modifications and variations.Cause
This, the scope of protection of the present invention is defined by those of the claims.
Claims (8)
1. it is a kind of using multiple spot reflectivity monitor preparation the uniform film of large scale device, be suitable for product to be coated be it is transparent or
Person's trnaslucent materials, while being still transparent or translucent in coating process, which is characterized in that described device includes evaporation
Room, multi-point transmitting rate test equipment, multichannel bidirectional optical fiber, substrate, evaporation source, evaporation source mobile device and control system,
In:
Vaporization chamber, the vacuum and temperature environment being arranged to needed for film layer vapor deposition provides, the substrate are supported by substrate frame
In the middle position of vaporization chamber；
The multiple spot reflectance test equipment being set to outside deposited chamber, to emit monochromatic light letter by the multichannel bidirectional optical fiber
Number, and corresponding multipath reflection optical signal is received, the reflectivity of measurand different location is thus calculated；
The evaporation source is configured to the raw material of evaporation coating, and the made film layer of the evaporation source has transparent or translucent spy
Property；The evaporation source is fixed in evaporation source mobile device and with its synchronizing moving；
The control system is arranged for determining based on the initial value of the multiple spot reflectivity monitored and minimum value current anti-
Rate change rate Pn, and the comparison based on each current reflectance change rate Pn are penetrated, and is come with the comparison of target reflectivity Pre
The movement of driving evaporation source mobile device is moved with controlling evaporation source in two-dimensional surface, and the position relatively thin to film layer is mended
Foot, finally prepares uniform film layer.
2. the device according to claim 1 for being monitored the preparation uniform film of large scale using multiple spot reflectivity, feature are existed
In being provided with the hole for passing through and fixing for multichannel bidirectional optical fiber in the vaporization chamber, and be sealed to hole.
3. the device according to claim 1 for being monitored the preparation uniform film of large scale using multiple spot reflectivity, feature are existed
In 10 tunnels or more are at least arranged in the multichannel bidirectional optical fiber.
4. the device according to claim 1 for being monitored the preparation uniform film of large scale using multiple spot reflectivity, feature are existed
In the substrate is circular-base, and 13 monitoring sites are provided with during film layer is deposited, bi-directional light is respectively correspondingly arranged
Fibre, wherein 3*3 distributed rectangular of 9 monitoring sites by substrate centered on round, 4 are located in the outside of each rectangular edges
Heart position.
5. the device according to claim 4 for being monitored the preparation uniform film of large scale using multiple spot reflectivity, feature are existed
In the monitoring site forms axial symmetry distribution.
6. the device according to claim 1 for being monitored the preparation uniform film of large scale using multiple spot reflectivity, feature are existed
In multichannel bidirectional optical fiber and evaporation source are located above and below substrate.
7. monitoring the dress of the preparation uniform film of large scale described in any one of -6 using multiple spot reflectivity according to claim 1
It sets, which is characterized in that the control system includes reflectivity computing unit and evaporation source motion control unit, wherein reflectivity
Calculating current reflectance change rate in the following manner is set in computing unit:
Initial reflectance R1 is recorded first, and initial reflectance R1 is stored as reflectivity minimum R2；
Then according to record reflectivity monitoring value R in real time, and judge the size of R and R2, when R is less than R2, then replaced using the value of R
It for R2, i.e. execution R2=R, does not otherwise cover, i.e. holding R2 is constant；
It obtains current reflectance change rate Pn according to reflectivity changes rate Pn calculation formula again and exports；
The evaporation source motion control unit determines each monitoring position according to the comparison of each monitoring site current reflectance change rate Pn
The thicknesses of layers of point, and drive the movement of evaporation source mobile device to control evaporation source in two-dimensional surface according to comparing result
Mobile, the position relatively thin to film layer is supplied, and finally prepares uniform film layer with target reflectivity Pre comparison,
Middle Pn=(R+R1-2R2)/R1.
8. a kind of method based on the preparation uniform film of large scale of device described in any one of claim 1-7, feature
It is, comprising the following steps:
The target reflectivity change rate Pre of step 1, setting film layer vapor deposition；
Step 2 calibrates multiple spot reflectance test equipment by standard reflectivity print；
Step 3 replaces standard reflectivity print using substrate, prepares evaporation source and starts to be deposited；
Step 4 starts plated film after the interior condition of vaporization chamber reaches plated film requirement, and in coating process according to setting when
Between interval record the reflectivity in each monitoring site, then the comparison of the current reflectance change rate by each monitoring point, and
Comparison with target reflectivity Pre drives the movement of evaporation source mobile device to move to control evaporation source in two-dimensional surface,
The position relatively thin to film layer is supplied, and uniform film layer is finally prepared.
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| CN111549319A (en) * | 2020-05-20 | 2020-08-18 | 上海天马有机发光显示技术有限公司 | Vacuum evaporation system and vacuum evaporation method |
| CN111979517A (en) * | 2020-08-24 | 2020-11-24 | 京东方科技集团股份有限公司 | Temperature adjusting method and device and evaporation equipment |
| CN112176309A (en) * | 2020-11-27 | 2021-01-05 | 江苏永鼎光电子技术有限公司 | Laser direct light control device for film plating machine |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN111549319A (en) * | 2020-05-20 | 2020-08-18 | 上海天马有机发光显示技术有限公司 | Vacuum evaporation system and vacuum evaporation method |
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| CN111979517B (en) * | 2020-08-24 | 2022-12-20 | 京东方科技集团股份有限公司 | Temperature adjusting method and device and evaporation equipment |
| CN112176309A (en) * | 2020-11-27 | 2021-01-05 | 江苏永鼎光电子技术有限公司 | Laser direct light control device for film plating machine |
| CN113755806A (en) * | 2021-09-10 | 2021-12-07 | 四川旭虹光电科技有限公司 | Reflective magnetron sputtering coating thickness monitoring device, coating machine and method |
| CN116005117A (en) * | 2023-03-24 | 2023-04-25 | 江苏新超科氢动力系统有限公司 | Preparation method of nano coating on surface of metal bipolar plate |
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