CN104296670B - Multiple beam optical thick film monitor - Google Patents
Multiple beam optical thick film monitor Download PDFInfo
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- CN104296670B CN104296670B CN201410577499.2A CN201410577499A CN104296670B CN 104296670 B CN104296670 B CN 104296670B CN 201410577499 A CN201410577499 A CN 201410577499A CN 104296670 B CN104296670 B CN 104296670B
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- optic fibre
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- rotary chopper
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Abstract
The present invention relates to a kind of multiple beam optical thick film monitor, and it belongs to a kind of optical coating real-time monitoring equipment.The present invention mainly solves that control point existing for existing optical film thickness meter is few, monitoring precision is low and monitoring efficiency is poor technical problem.The technical solution adopted by the present invention is:Multiple beam optical thick film monitor, it includes monochromator, photodetector, signal amplifier, control computer, location triggered circuit and convergent lens, wherein:It also includes:One halogen tungsten lamp;One rotary chopper:Rotary chopper is located on a rotary-tray and can rotated centered on lamp filament of halogen-tungsten;At least three optic fibre light paths:Each optic fibre light path is made up of lens and optical fiber;Substrate holder:Substrate holder is located at the lower section of rotary chopper, and control point is located on substrate holder.The present invention has the advantages of control point is more, monitoring precision is high low with cost.
Description
Technical field
The present invention relates to a kind of multiple beam optical thick film monitor, and it belongs to a kind of optical coating real-time monitoring equipment.
Background technology
During vacuum coating, the monitoring of film thickness is completed by optical thick film monitor.The monitoring of film thickness
It is:Light beam through measured glass or is reflected after chopper chopping modulation as caused by light source, with coating process
The continuous deposition of material, thicknesses of layers constantly change, and the transmissivity of film layer utilizes light because of the interference effect also respective change of light
Optical signal is introduced monochromator by fibre, and the light of required supervisory wavelength is gone out by exit slit filtering again, and monochromatic optical signal is through photodetection
Device is converted into electric signal, then is handled through analog-to-digital conversion supply optical thick film monitor computer, finally gives the thickness of film
Degree.
Traditional optical thickness instrument is generally by light source, chopper, optical fiber, slit, monochromator, photodetector, lens, light
Column, signal processing system etc. form, and are to be with the transmissive system or reflection of the compositions such as a light source and detector
Unite and carried out only for a control point.But use the measuring method of single control point, either indirect monitoring or straight
Connect monitoring, can only all ensure that the film thickness at control point is accurate, the film thickness on control point periphery can only just assume they
Keep completely the same with the thickness at control point all the time in whole coating process.It will be apparent that this is impossible.And plated film week
Phase is longer, and coated product is higher to wavelength index request, and the unstable influence of film thickness distribution is bigger, and ultimately results in plating
The decrease in yield of film product.It is a kind of to seem feasible and do that many independent blooming ceremonies are installed on a coating machine
Method, but this not only considerably increases the cost of coating machine, and it is similarly subjected to the influence of film thickness distribution.Even if making is monitored simultaneously
Identical product, can also there is various inconsistent error each other between each film thickness gauge, for example, supervisory wavelength can not possibly be complete
It is adjusted to identical consistent entirely, light source and detector are also impossible to synchronization with the fluctuating of time, thus such solution party's method is taken stopgap measures
Do not effect a permanent cure, and introduce more errors.Therefore, control point existing for existing optical film thickness meter is few, monitoring efficiency is low and supervises
Control the technical problem of effect difference.
The content of the invention
Present invention aim to address control point existing for existing optical film thickness meter is few, precision is low and monitoring efficiency for monitoring
A kind of technical problem of difference, there is provided multiple beam optical thick film monitor.The multiple beam optical thick film monitor both maintains monochromatic light
The luminous intensity in source, the quantity of detection light beam is added again, at the same it is small in short time temperature drift using same light source and same detector
The characteristics of, the unstability of light source and detector is eliminated, realizes high-precision film thickness distributed monitoring.
In order to solve the above technical problems, the technical solution adopted by the present invention is:
Multiple beam optical thick film monitor, it includes monochromator, photodetector, signal amplifier, control computer, position
Triggers circuit and convergent lens are put, wherein:It also includes:
One halogen tungsten lamp:Halogen tungsten lamp is arranged in rotary chopper;
One rotary chopper:Rotary chopper is located on a rotary-tray and can revolved centered on lamp filament of halogen-tungsten
Turn, a light perforation hole is provided with rotary chopper centre position, be connected with the axle of rotary chopper optoelectronic switch or
Person's encoder, to set the trigger pulse for each light path and details in a play not acted out on stage, but told through dialogues position, for selecting corresponding signal processing circuit;
At least three optic fibre light paths:Each optic fibre light path is made up of lens and optical fiber, and optic fibre light path is with lamp filament of halogen-tungsten
Centered on be circumferentially positioned at successively around rotary chopper, and the lens in optic fibre light path are located at rotary chopper light perforation hole
In the light path of outgoing beam, optical fiber is located at behind lens;One of optic fibre light path is reference path, and remaining optic fibre light paths are
Monitoring optic fibre light path;
Substrate holder:Substrate holder is located at the lower section of rotary chopper, and control point is located on substrate holder.
The rotary electric machine of the rotary chopper will keep synchronous or integral multiple pass with the rotary electric machine of substrate holder
System.
Any one being shaped as in spherical or annular of the rotary chopper.
Due to present invention employs above-mentioned technical proposal, realizing a light source and producing multiple monitoring similar in multiple light intensity
Light beam, and make full use of single light source simple detector to fluctuate the characteristics of minimum in a short time, obtain high-precision more control points
Blooming distribution.Coordinate real-time film thickness correction plate, film thickness distribution, the thickness point of solution can be dynamically managed in coating process
Cloth can not effective monitoring the problem of, improve optical thin film production yield rate, reduce cost.Therefore, with background technology phase
Than the present invention has the advantages of control point is more, monitoring precision is high low with cost.
Brief description of the drawings
Fig. 1 is the structural representation of the present invention;
Fig. 2 is the signal sequence chart that optic fibre light path of the present invention receives;
In figure, 1-halogen tungsten lamp, 2-rotary chopper, 3-light perforation hole, 4-lens, 5-optical fiber, 6-substrate holder,
7-control point, 8-merger of optical fiber, 9-entrance slit, 10-monochromator, 11-exit slit, 12-photodetector, 13-
Signal amplifier, 14-control computer, the rotating shaft of 15-substrate holder, 16-location triggered circuit, 17-convergent lens.
Embodiment
As shown in figure 1, the multiple beam optical thick film monitor in the present embodiment, it includes monochromator 10, photodetector
12nd, signal amplifier 13, control computer 14, location triggered circuit 16 and convergent lens 17, wherein:It also includes:
One halogen tungsten lamp 1:Halogen tungsten lamp 1 is arranged in annular rotary chopper 2;
One annular rotary chopper 2:Annular rotary chopper 2 is located on a rotary-tray and can be with halogen tungsten
Rotated centered on the filament of lamp 1, a light perforation hole 3 is provided with the centre position of annular rotary chopper 2, rotated in annular
Optoelectronic switch or encoder are coaxially connected with the axle of chopper 2, to set the triggering for each light path and details in a play not acted out on stage, but told through dialogues position
Pulse, for selecting corresponding signal processing circuit;
Five optic fibre light paths:Each optic fibre light path is made up of lens 4 and optical fiber 5, optic fibre light path using the filament of halogen tungsten lamp 1 as
Center is circumferentially positioned at around annular rotary chopper 2 successively, and the lens 4 in optic fibre light path are located at annular rotation and cut
In the light path of the outgoing beam of light device light perforation hole 3, one end of optical fiber 5 is located at behind lens 4;One of optic fibre light path is ginseng
Light path is examined, the other end of the optical fiber 5 in remaining four monitoring optic fibre light path is located at the top of control point 7, the light of the lower section of control point 7
Fibre 5 merges into a branch of merger of optical fiber 8, and merger of optical fiber 8 is located at before convergent lens 17;
Substrate holder 6:Substrate holder 6 is located at the lower section of annular rotary chopper 2, and control point 7 is located at substrate holder 6
On.Convergent lens 17 is located at before the entrance slit 9 of monochromator 10, and photodetector 12 is located at the exit slit of monochromator 10
It is connected behind 11 and with the input of signal amplifier 13, the output end of signal amplifier 13 and the input of control computer 14
End connection, location triggered circuit 16 are located at the side of the substrate holder rotating shaft 15 of substrate holder 6 and defeated with control computer 14
Enter end connection.
The rotary electric machine of the annular rotary chopper 2 will keep synchronous or whole with the rotary electric machine of substrate holder 6
The relation of several times.
Above-mentioned optic fibre light path, is divided into monitoring optic fibre light path and reference optical fiber light path, monitoring optic fibre light path have it is multiple, by prison
Control point 7 is subsequently into monochromator 10, and reference optical fiber light path is one, is directly entered monochromator 10;Light perforation hole 3 turns to not
Same position, it is irradiated to successively in each different light path, caused light beam has just given different signals.Monitored on substrate holder 6
The position of point 7 is controlled by unified synchronous circuit, control computer 14 and related amplifying circuit is directed to each light path
Monitoring signal carry out independent process.
The shape of annular rotary chopper 2 in above-described embodiment can also be spherical.
Optic fibre light path in above-described embodiment is at least three.
The present invention operation principle be:The light beam that rotary chopper 2 is shot out by light perforation hole 3, it is irradiated to successively each
On individual different optic fibre light path, after the convergence of lens 4, received by optical fiber 5, each road optical fiber is by the monitoring on substrate holder 6
After point 7, be ultimately to be incorporated into turns into a branch of merger of optical fiber 8 together, by convergent lens 17, enters from the entrance slit 9 of monochromator 10
Enter, select grating angle to select the light of wanted supervisory wavelength by exit slit 11, monochrome signal is finally by photodetector 12
Receive and optical signal is converted into electric signal, for the intensity and frequency of each road signal, by the amplifying circuit of signal amplifier 13
It is amplified, and is sent into control computer 14 and is handled, control computer 14 selects corresponding letter according to the signal of each monitoring
Number process circuit, finally realize that the film thickness distribution of more control points under the conditions of same light source and same photodetector is surveyed in high precision
Amount.According to the variation tendency of film thickness distribution, the yield rate that film thickness correction plate drastically increases film thickness product is adjusted in real time.
As shown in Fig. 2 the signal sequence that the optic fibre light path receives is:First optic fibre light path (S1), Dark, the second optical fiber
The n-th optic fibre light path of light path (S2) ... ... (Sn), Dark, reference optical fiber light path (Ref), Dark, the first optic fibre light path (S1),
Dark, the n-th optic fibre light path of the second optic fibre light path (S2) ... ... (Sn), Dark, reference optical fiber light path (Ref), Dark ....No
Same light path corresponds to different control points.
Claims (3)
1. a kind of multiple beam optical thick film monitor, it includes monochromator (10), photodetector (12), signal amplifier
(13), control computer (14), location triggered circuit (16) and convergent lens (17), it is characterised in that:It also includes:
One halogen tungsten lamp (1):Halogen tungsten lamp (1) is arranged in rotary chopper (2);
One rotary chopper (2):Rotary chopper (2) be located on a rotary-tray and can using halogen tungsten lamp (1) filament as
Central rotation, a light perforation hole (3) is provided with rotary chopper (2) centre position, is connected on the axle of rotary chopper (2)
Optoelectronic switch or encoder are connected to, to set the trigger pulse for each light path and details in a play not acted out on stage, but told through dialogues position, corresponding to selecting
Signal processing circuit;
At least three optic fibre light paths:Each optic fibre light path is made up of lens (4) and optical fiber (5), and optic fibre light path is with halogen tungsten lamp (1)
It is circumferentially positioned at successively centered on filament around rotary chopper (2), and the lens (4) in optic fibre light path are positioned at rotation chopping the light
In the light path of device (2) light perforation hole (3) outgoing beam, optical fiber (5) is located at behind lens (4);One of optic fibre light path is
Reference path, remaining optic fibre light paths are monitoring optic fibre light path;
Substrate holder (6):Substrate holder (6) is located at the lower section of rotary chopper (2), and control point (7) are located at substrate holder (6)
On.
2. multiple beam optical thick film monitor according to claim 1, it is characterised in that:The rotary chopper (2)
Rotary electric machine will keep synchronous or integral multiple relation with the rotary electric machine of substrate holder (6).
3. multiple beam optical thick film monitor according to claim 1 or 2, it is characterised in that:The rotary chopper (2)
Any one being shaped as in spherical or annular.
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CN201410577499.2A CN104296670B (en) | 2014-10-24 | 2014-10-24 | Multiple beam optical thick film monitor |
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CN201410577499.2A CN104296670B (en) | 2014-10-24 | 2014-10-24 | Multiple beam optical thick film monitor |
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CN104296670A CN104296670A (en) | 2015-01-21 |
CN104296670B true CN104296670B (en) | 2017-11-14 |
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Families Citing this family (4)
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US9921149B2 (en) * | 2015-04-24 | 2018-03-20 | Otsuka Electronics Co., Ltd. | Optical measurement apparatus and optical measurement method |
JP6512361B1 (en) * | 2018-11-29 | 2019-05-15 | 横河電機株式会社 | Measurement apparatus, measurement method, and measurement program |
CN112229336B (en) * | 2020-10-12 | 2022-04-19 | 宁波盈瑞聚合科技有限公司 | High resistant separates infrared thickness measurement system of packaging film production line |
CN113267130B (en) * | 2021-06-11 | 2022-08-05 | 华中科技大学 | Line scanning film thickness measuring system |
Citations (3)
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CN2677913Y (en) * | 2003-12-31 | 2005-02-09 | 中山大学 | Near-infrared film thcikness monitoring instrument for optical coating film |
CN201307000Y (en) * | 2008-11-07 | 2009-09-09 | 四川南光电气有限责任公司 | Film thickness measuring light path system |
CN201369319Y (en) * | 2009-02-19 | 2009-12-23 | 苏州硕光科技有限公司 | Multi-channel real-time film thickness monitor |
Family Cites Families (4)
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JP3878016B2 (en) * | 2001-12-28 | 2007-02-07 | 株式会社荏原製作所 | Substrate polishing equipment |
JP3737442B2 (en) * | 2002-03-19 | 2006-01-18 | 日本電信電話株式会社 | Film thickness monitoring apparatus and film thickness monitoring method |
US7828929B2 (en) * | 2004-12-30 | 2010-11-09 | Research Electro-Optics, Inc. | Methods and devices for monitoring and controlling thin film processing |
CN204142194U (en) * | 2014-10-24 | 2015-02-04 | 杰莱特(苏州)精密仪器有限公司 | Multiple beam optical thick film monitor |
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2677913Y (en) * | 2003-12-31 | 2005-02-09 | 中山大学 | Near-infrared film thcikness monitoring instrument for optical coating film |
CN201307000Y (en) * | 2008-11-07 | 2009-09-09 | 四川南光电气有限责任公司 | Film thickness measuring light path system |
CN201369319Y (en) * | 2009-02-19 | 2009-12-23 | 苏州硕光科技有限公司 | Multi-channel real-time film thickness monitor |
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