CN109307988A - Lamp optical system, exposure device and article manufacturing method - Google Patents
Lamp optical system, exposure device and article manufacturing method Download PDFInfo
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- CN109307988A CN109307988A CN201810814945.5A CN201810814945A CN109307988A CN 109307988 A CN109307988 A CN 109307988A CN 201810814945 A CN201810814945 A CN 201810814945A CN 109307988 A CN109307988 A CN 109307988A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
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- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
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- Optics & Photonics (AREA)
- Microscoopes, Condenser (AREA)
- Lenses (AREA)
Abstract
The present invention relates to lamp optical system, exposure device and article manufacturing methods.Lamp optical system includes the 1st optical system, the 2nd optical system that shaping is carried out to the light beam from light source；Light integrator；And optical system, light beam from the 1st optical system and the light beam from the 2nd optical system are directed to the plane of incidence of light integrator, the optical component for the 1st light intensity distributions that there is 1st optical system change to be formed by the 1st optical system in the plane of incidence of light integrator, the optical component for the 2nd light intensity distributions that there is 2nd optical system change to be formed by the 2nd optical system in the plane of incidence of light integrator, keep the 1st light intensity distributions and the 2nd light intensity distributions mutually different and form the light intensity distributions at the plane of incidence of light integrator using the 1st optical system and the 2nd optical system.
Description
Technical field
The present invention relates to lamp optical system, exposure device and article manufacturing methods.
Background technique
Exposure device be in the photo-mask process of the manufacturing process as semiconductor devices, liquid crystal display device etc., will be former
The pattern of version (reticle mask or mask) is transferred to photosensitive substrate via projection optical system and (is formed on surface against corrosion
Chip, glass plate of oxidant layer etc.) device.
There is the formula of the formula 1 for being referred to as Rayleigh for the performance for indicating exposure device.
[formula 1]
Wherein, k1Be indicate solution picture difficulty without dimension amount.λ is the wavelength for the light being exposed to substrate.NA is
The pattern of master is projected to the numerical aperture of the projection optical system of substrate.
The value of resolution ratio RP is smaller as a result, then is able to carry out finer exposure.As one of the method for reducing RP,
Know the NA for increasing projection optical system from formula 1.
On the other hand, about the depth of focus DOF of exposure device, the relationship of formula 2 is set up.
[formula 2]
The k of formula 22Also with k1It is similarly no dimension amount, according to the type of anticorrosive additive material, the photograph illuminated to master
Bright condition etc. and change.If as described above in order to obtain high-resolution and increase the NA of projection optical system, from formula 2, DOF
Value according to its square reduce.
Therefore, it in order to ensure depth of focus while obtaining high-resolution, carries out making efficient light sources point according to the pattern of master
Cloth (lighting condition) optimizes.
Efficient light sources distribution is the light intensity distributions in the pupil face of the lamp optical system illuminated to master, or logical
Over-illumination optical system is incident on the angular distribution of the light of master (illuminated surface).
By the distribution or the necessary illumination light of offer of the inner transformation illumination light in lamp optical system, can make
Make the various efficient light sources distributions such as circular shape, ring-band shape.For example, being disclosed logical in No. 5327056 bulletins of Japanese Patent No.
The a part for switching the optical system for each plane of incidence that each light from multiple light sources is directed to optical fiber is crossed, change is effective
The lamp optical system of distribution of light sources.
Shape quilt in the lamp optical system that No. 5327056 bulletins of Japanese Patent No. are recorded, in the plane of incidence of optical fiber
It is fixed, so also there are many efficient light sources distributions to be formed.In addition, even if switchable optics system, in the incidence of optical fiber
In face, the loss of illumination light is also become larger.
Summary of the invention
Lamp optical system as the of the invention side for solving the above subject is the photograph illuminated to object
Bright optical system carries out shaping to the light beam from light source comprising: the 1st optical system；2nd optical system,
Shaping is carried out to the light beam from light source；Light integrator；And optical system, by the light beam from the 1st optical system
The plane of incidence of the light integrator is directed to the light beam from the 2nd optical system, the 1st optical system, which has, to be become
The optical component of the 1st light intensity distributions more formed by the 1st optical system in the plane of incidence of the light integrator, it is described
The 2nd luminous intensity point that there is 2nd optical system change to be formed by the 2nd optical system in the plane of incidence of the light integrator
The optical component of cloth makes the 1st light intensity distributions and described using the 1st optical system and the 2nd optical system
2nd light intensity distributions are mutually different and form the light intensity distributions at the plane of incidence of the light integrator, with from the light
The light for learning integrator illuminates the object.
According to following example description (referring to attached drawing), other feature of the invention will be clear.
Detailed description of the invention
Fig. 1 is the figure for showing the lamp optical system of the 1st embodiment.
Fig. 2 is the figure for showing the example of optical system.
Fig. 3 is the figure for showing the light intensity distributions formed by optical system.
Fig. 4 is the skeleton diagram of light integrator.
Fig. 5 is the figure for showing the example of σ diaphragm.
Fig. 6 is the synoptic diagram of slit.
Fig. 7 is the figure for showing the formation example of effective distribution of light sources.
Fig. 8 is the figure for showing the exposure device of the 2nd embodiment.
Fig. 9 is the skeleton diagram of angular transducer.
Figure 10 is the skeleton diagram of uneven illumination measurement.
Figure 11 is the skeleton diagram of slit mechanism.
Figure 12 is the figure for illustrating uneven illumination correction.
Specific embodiment
Hereinafter, according to appended attached drawing, the preferred embodiment that the present invention will be described in detail.
[the 1st embodiment]
Illustrate the structure of lamp optical system involved in the 1st embodiment.The lamp optical system of present embodiment is
Such as it is carried to the lamp optical system of exposure device, it is for being directed to the light from light source as irradiation object object (object
Body) the figuratum mask of formation (master) device.
Fig. 1 is the skeleton diagram for showing the structure of lamp optical system involved in present embodiment.Lamp optical system 100
The 1st optical system 301 is included, shaping is carried out to the light from the 1st light source portion 120a；2nd optical system 302, to from the 2nd
The light of light source portion 120b carries out shaping；And the 3rd optical system 303, shaping is carried out to the light from the 3rd light source portion 120c.Separately
Outside, lamp optical system 100 have combining optical 500, light integrator (compound eye optical system) 109, σ diaphragm 110,
112, optical system 150, slit 111, optical system 160.
Light source portion 120a~c is made of light source 101 and elliptical reflector 102.High-pressure sodium lamp is used in light source 101.It removes
Other than this, light source portion 120a~c can also use xenon lamp, excimer laser etc..Elliptical reflector 102 is for from light source
The light of 101 outputs carries out the condensing optical system of optically focused, the shape of a part using elliptical shape is formed, by light source 101
It is configured at a side of elliptical 2 focal positions.
It is exported from light source 101 and the focus position in elliptical another party is condensed to by the light that elliptical reflector 102 reflects
The entrance for the optical system 301~303 set.
Optical system 301,302,303 is configured to change entering in light integrator 109 by each optical system
Penetrate the light intensity distributions of face formation.Optical system 301,302,303 is respectively provided on the direction vertical with the direction of travel of light
The 1st optical section 311, the 2nd optical section 312, the 3rd optical section 313, the 4th optical section 314 of arrangement.Optical section 311,312,313,
1 in 314 is selected and is configured in optical path.Optical system 301,302,303 has for handover configurations in optical path
The mechanism of optical section.Optical section 311,312,313,314 forms mutually different luminous intensity in the plane of incidence of light integrator 109
Distribution.Wherein, optical section has 4, but is not limited to 4.
(A) of Fig. 2~(D) shows the schematic structural diagram of optical section 311,312,313,314.Hacures portion indicates that light passes through
Optical path.Optical section 311 is to roll over the light beam exported from plane of incidence OBJ by lens L1, L2, L3, L4 as shown in Fig. 2 (A)
It penetrates and forms the imaging optical system of image in outgoing plane IMG.
Optical section 312 is to reflect the light beam exported from plane of incidence OBJ by lens L5, L6 as shown in Fig. 2 (B), is led to
The cylindric reflecting mirror for crossing axicon PR1 and the outlet configuration in axicon PR1, transforms on annulus in outgoing plane IMG
Optical system.Optical section 313 is to reflect the light beam exported from plane of incidence OBJ by lens L7 as shown in Fig. 2 (C), is led to
Cross the optical system that axicon PR2 focuses on the mode conversion in smaller region in outgoing plane IMG.Optical section 312 and light
The department of the Chinese Academy of Sciences 313 is known as illumination profile and shifts optical system.
Optical section 314 is to make the light beam exported from plane of incidence OBJ optical bar (photoconductive tube) OL's as shown in Fig. 2 (D)
Inner face reflection is multiple, in its outgoing plane IMG so that its light intensity distributions becomes the optical system of the mode conversion of homogenization.
Fig. 3 shows that (preceding: OBJ, rear: light intensity distributions IMG) are (with light by the front and back of optical section 311,312,313,314
Two dimensional cross-section centered on axis).Firstly, showing the brightness point of light source 101 by elliptical reflector 102 in plane of incidence OBJ
Cloth, so becoming the light intensity distributions near optical axis center with stronger characteristic.
Through the light after optical section 311 on outgoing plane IMG, present substantially equal with the light intensity distributions of plane of incidence OBJ
Distribution.Optical section 312 forms annulus shape on outgoing plane IMG.Optical section 313 is formed in center tool on outgoing plane IMG
The intensity distribution of slightly pointed peak value.Optical section 314 forms uniform flat intensity distribution on outgoing plane IMG.Outgoing plane IMG
It is conjugated with the plane of incidence of light integrator 109.
Combining optical 500 is made of 3 optical systems, 105,2 deflection mirrors 107 and optical system 140
, synthesis (guidance) from multiple optical paths corresponding with the light from multiple light sources and light beam reflection and refraction optical system.
Directional light is transformed to by optical system 105 via the light of any optical section in optical section 311~314, reaches combining unit
108.At this point, the deflection mirror 107 for deflecting the direction of travel of light reflects in the optical path of a part in multiple.?
In present embodiment, 2 deflected reflecting mirrors 107 in 3 optical paths reflect.
In the present embodiment, light source portion has 3, but as long as the quantity of light source is 2 or more multiple.In addition,
According to the difference of the quantity of light source, the structure of combining optical 500 is varied, in order to reduce the loss (damage of illumination light
Consumption), the optical system of compound lens and deflection mirror preferably as described in this embodiment.But combining optical 500
Both it can be only made of lens, optical waveguide can also be used in part of.In addition, as combining optical 500, it can also
To use optical fiber.
Optical system 105, which is configured to combining unit 108, becomes the outgoing plane IMG in optical system portion 311,312,313,314
Substantial Fourier transform position.The light exported from combining unit 108 is directed into light integrator by optical system 140
109.At this point, the plane of incidence that optical system 140 is configured to light integrator 109 becomes the substantial Fourier of combining unit 108
It shifts one's position.That is, the plane of incidence of outgoing plane IMG and light integrator 109 is optically in the positional relationship of conjugation.
Fig. 4 is the figure for showing light integrator 109.As shown in figure 4, light integrator 109 is by with a large amount of plano-convex lens
Split is that planar 2 lens groups 131,132 are constituted.So that pairs of plano-convex lens, which are in, constitutes the 1 of lens group 131,132
The mode of the focal position of a 1 plano-convex lens, configures curvature surface face to face.By using such light integrator
109, a large amount of secondary souce distribution of equal value with light source 101 is formed (effectively in 110 position of outgoing plane of light integrator 109
Distribution of light sources).
Near the outgoing plane of light integrator 109, it is configured with σ diaphragm (aperture diaphragm) 110.Light integrator 109
Outgoing plane is the pupil face of lamp optical system, and the light intensity distributions formed in the pupil face are known as efficient light sources distribution.With σ light
The direction of travel of the light of door screen 110 is configured with σ diaphragm 112 on vertical direction.σ diaphragm 110 and σ diaphragm 112 are provided with mutually
The opening of different shapes.σ diaphragm 110 and σ diaphragm 112 can for example select aperture diaphragm in (A)~(D) of Fig. 5
231, any aperture diaphragm in 232,233,234.Aperture diaphragm 231~234 is such diaphragm, i.e. the one of shielding light
Point, 225,226,227,228 transmitted light of opening indicated using only white.Each opening is opening 225, the small circle of ring-band shape
Opening 226, the opening 227 of moderate circular shape, the opening 228 of big circular shape of shape.In addition, in this implementation
In mode, constitute as can optionally by diverse σ diaphragm σ switching mechanism 113.
The light beam projected from the outgoing plane 110 of light integrator 109 is directed into slit 111 by optical system 150.This
When, optical system 150 is configured to substantial Fourier transform of the slit 111 as the outgoing plane 110 of light integrator 109
Face.A large amount of secondary souce distribution, by optical system 150, the light from each secondary souce are formed in the position of outgoing plane 110
It overlaps on outgoing plane 110, so becoming uniform light intensity distributions on slit 111.
Fig. 6 shows the shape of slit 111, and the light other than the opening 23 of the circular shape indicated with white is by shading.Later,
Plane of illumination ILP is irradiated to by optical system 160 by the illuminating bundle of the circular shape after opening.In present embodiment
In, slit is using the slit that opening is circular shape but it is also possible to be other shapes, such as rectangular shape.
According to the present embodiment, illumination light can not be lost and forms various efficient light sources distributions.
[embodiment 1]
When the pattern for being depicted in mask is transferred to substrate using exposure device, make effectively preferably by the pattern form
The shape of distribution of light sources becomes best.The incident angle distribution of the illumination light of mask is still incident in efficient light sources distribution.
According to the difference of the pattern of mask, the contrast of image is improved when reducing coherence sometimes, improves coherence sometimes
And depth of focus expands when forming the efficient light sources distribution of ring-band shape.That is, changing efficient light sources distribution by the pattern using mask
Shape can reach good imaging performance in various patterns.
By using the 1st optical system 301, the 2nd optical system 302, the 3rd optical system recorded in the 1st embodiment
System 303 can utilize the pattern of mask M, and efficient light sources distribution is changed to various shape.
Using table 1 and Fig. 7, illustrate the optical section 311 by each middle composition in optical system 301,302,303,
312,313,314 selection, the example for the change in shape for being distributed efficient light sources.
Table 1 shows the combination of the optical section configured in the optical path of optical system 301,302,303.Fig. 7 is to show to pass through
The optical section for being configured at each optical path is formed in the light intensity distributions of outgoing plane IMG and closes them by combining optical 500
At light intensity distributions (plane of incidence or outgoing plane (efficient light sources distribution) of light integrator 109) shape outline
Figure.
[table 1]
In the case where synthesis is from the light of multiple optical paths, the intensity distribution of the light of synthesis can use the light intensity of each optical path
The phase Calais of degree distribution indicates.That is, make the light beam from the 1st optical system 301, the light beam from the 2nd optical system 302 and
Light beam from the 3rd optical system 303 is overlapped in the plane of incidence of light integrator 109.Therefore, become will be by for efficient light sources distribution
The intensity distribution that the light intensity distributions of each formation of optical system 301,302,303 add up.
P1 is the case where using optical section 313 in the whole of optical system 301~303.In this case, efficient light sources
It is distributed as the small σ illumination that light intensity distributions focus on center.
P2, P3 are in optical system 301~303 and with the combination of optical section 311 and optical section 313, efficient light sources shape
Shape is middle σ.The luminous intensity that center and periphery can be changed by the number of combinations of optical section 311 and optical section 313, so energy
Enough optimal combination is selected using the pattern of mask.P4 is the configuration optical section 311 in the whole of optical system 301~303
Situation.In this case, efficient light sources distribution shape is middle σ.
P5 is the case where configuring optical section 312 in the whole of optical system 301~303.In this case, efficient light sources
Distribution shape is annulus.
P6 is in optical system 301~303 and with the combination of optical section 312,314, and efficient light sources distribution shape is big
σ.P7 is in optical system 301~303 and with the combination of optical section 311,312, and efficient light sources distribution shape is big σ.Pass through
The combination of optical section can change the center of big σ and the luminous intensity on periphery, so the pattern using mask selects optimal group
Conjunction.In addition, P8 is the case where using optical section 314 in the whole of optical system 301~303.At this point, efficient light sources point
Cloth is flat big σ.In addition, the σ diaphragm that should be used in P1~P8 is displayed in Table 1.
Illustrate that the efficient light sources of 8 patterns are formed in the present embodiment, but according to the quantity of light source or by synthesizing light
The difference of the number of the quantity and optical section for the light path that system 500 synthesizes can also make various effective in addition to this
Distribution of light sources.For stringent, even if using the optical section of identical type in each optical system 301~303, pass through synthesizing optical
The contribution to efficient light sources distribution that the result of system 500 is realized also can be different.
For example, as table 2 P6, P6 ', P6 ", about the optical section used in optical system 301~303, optical section 312
For 2 and optical section 314 be 1 be it is identical, but efficient light sources distribution it is entirely different.
[table 2]
Therefore, the quantity of light path (optical system 301 etc.) is being set as N, the type (quantity) of optical section is set as M
When, theoretically it is capable of forming MNThe efficient light sources of a pattern are distributed.
More than, it according to the present embodiment, can reduce the loss of illumination light, form that big small circle, annulus etc. are various to be had
Imitate distribution of light sources.
[the 2nd embodiment]
Next, exposure device 200 of the explanation as the 2nd embodiment.Fig. 8 is the exposure dress for showing the 2nd embodiment
Set 200 figure.The part described in the 1st embodiment omits the description.
The mask M as master for the illuminated surface ILP for being configured at lamp optical system 100 is illuminated.Illumination light
A part be imaged in substrate P via projection optical system PO, so that transfer is depicted in the pattern of mask M.
Multiple light intensity sensors are configured in exposure device 200.Firstly, near mask M, it is incident configured with measurement
To the angular transducer JS (measurement portion) of the incident angle distribution (light intensity distributions) of the illumination light of mask M.Angular transducer JS
As shown in figure 9, being made of pin hole 351 and CCD camera 352 (light receiving element).Pin hole 351 is configured near mask M,
CCD camera 352 is configured from the position that pin hole leaves abundant distance.By the light of pin hole 351 it is corresponding with its incident angle,
The position different from CCD camera 352 is detected.Therefore, pass through the control unit using exposure device, external machine solution
The pixel value (luminous intensity) for analysing the image obtained by CCD camera 352, can learn the incident angle for being incident on the light of mask M
Characteristic.
In order to according to the incident angle characteristic of the illumination light obtained using the angular transducer JS for being configured at exposure device 200
It is distributed to obtain desired efficient light sources, at least one in multiple light sources 101a, 101b, 101c, which has, adjusts its input voltage
Control unit (adjustment section).That is, there is adjustment to be formed in light by the 1st optical system 301 using the light from the 1st light source portion 101a
Learn the 1st adjustment section of the 1st light intensity distributions of the plane of incidence of integrator 109.Alternatively, it is also possible to go back other than the 1st adjustment section
It is formed in the incidence of light integrator 109 by the 2nd optical system 302 using the light from the 2nd light source portion 101b with adjustment
2nd adjustment section of the 2nd light intensity distributions in face.Efficient light sources distribution is the addition of the intensity distribution of the light from each light source, institute
To change the luminous intensity from each optical path by the adjustment of the input voltage using each light source, efficient light sources can be distributed
It is micro-adjusted.
In addition, as the intensity distribution (the 1st light intensity distributions, the 2nd light intensity distributions) for changing the light from each optical path
Unit, the adjustment section for thering is the position to the optical element in the position of light source or each optical path to be micro-adjusted.For example, parsing exists
Multiple images that the position of the position or the optical element in each optical path that make light source is obtained when mobile with angular transducer JS, root
According to the difference of the pixel value of multiple images, determined in a manner of becoming the distribution of desired efficient light sources light source position or each light
The position of optical element in road.
In addition, though not showing in fig. 8, but filtered by being configured in the optical path from each light source or not configuring dim light
Piece can change the intensity distribution of the light from each optical path.In this case, for example, being subtracted near optical system 105
The configuration of light optical filter or not.
In the exposure device 200 of present embodiment, other than near mask M, it is also configured near substrate P
Angular transducer JS.But near mask M, near substrate P it is optically mutually conjugate position, so wherein
At least one position arrangement angles sensor JS.
Near substrate P, the photograph of the illumination (luminous intensity) in the exposure area configured with the arc-shaped in measurement substrate P
Spend distribution sensor 304.Illumination Distribution sensor 304 is as shown in figure 8, by slit 303, utilize the optics of lens or reflecting mirror
System 306 and sensor 305 are constituted.As shown in Figure 10, make the exposure area 401 of the opposite light being imaged in substrate P of slit 303
It scans (movement).At this point, being only imaged on the opening portion 306 (white) of slit 303 in the light being imaged in exposure area 401
Light be incident in Illumination Distribution sensor 304.The light in Illumination Distribution sensor 304 is incident on via 306 quilt of optical system
It is directed to sensor 305.Slit 303 is scanned in X-direction shown in Fig. 10 by one side, reads reach sensor on one side
The energy of 305 light measures the accumulated illumination of each X position in exposure area 401.It is tired in substrate P thereby, it is possible to calculate
Count uneven illumination.
In the case where changing efficient light sources distribution in the 1st embodiment, the 2nd embodiment, it is illuminated to there is generation
Face or a possibility that with uneven illumination in the position optically of illuminated surface.Therefore, lamp optical system can be replaced
Slit 111 and use slit mechanism 182 (adjustment mechanism) in 100.By according to the survey measured by Illumination Distribution sensor 304
The opening width as a result, adjusting slit mechanism 181 is measured, can reduce uneven illumination.For example, being set as through Illumination Distribution sensor
304 measure the uneven illumination as shown in (A) of Figure 12.In this case, make the part (position in the direction x) of luminance reduction
The width in the direction y of the opening of slit mechanism 182 locally broadens, the slit for the part (position in the direction x) for increase illumination
The width in the direction y of the opening of mechanism 182 locally narrows.Thereby, it is possible to so that Illumination Distribution is become equal shown in (B) of such as Figure 12
It is even.
The structural example of Figure 11 illustration slit mechanism 182.Slit mechanism 182 has the lighting area formed in regulation illuminated surface
1st barn door 175,176 of the opening portion 172 of the shape in domain.Light-blocking member 175 is the upstream of the Y-direction of regulation opening portion 172
The component of the position on the boundary of side.Light-blocking member 176 is the component on the boundary at the both ends of the X-direction of regulation opening portion 172.
In addition, slit mechanism 181 has the position in the Y-direction of the 1st barn door 175 of adjustment to change in illuminated surface
The adjustment section 53 of illumination region.Position adjustment section 53 includes actuator.By changing barn door 175 using position adjustment section 53
The position on the boundary of the upstream side of the Y-direction in illumination region is changed in position in Y-direction.
Opening portion 172 is, for example, the slit for the circular shape that light passes through.Adjustment section 91 may include the 1st barn door 171 of adjustment
Y-direction (the 1st direction) on position the 1st adjustment section 53 and adjustment Y-direction on opening portion 172 shape the 2nd adjustment
Portion 173.1st adjustment section 53 is connect with control unit, and the movement of the 1st adjustment section 53 can be controlled by control unit.
In an end of the arc-shaped for forming opening portion 172, it is formed with the 2nd barn door 170.2nd light shielding part 170 is to use
The component of the shape on the boundary in the downstream side of the Y-direction in change illumination region.2nd barn door 170 is provided with X-direction
The 2nd adjustment section 173 (push-and-pull portion) that each position of the 2nd barn door 170 on (the 2nd direction) pushes and pulls in the Y direction.2nd adjustment
Portion 173 can be multiple actuators.These multiple actuators are connect via wiring 174 with control unit respectively.Multiple actuatings as a result,
Device is driven by the control of control unit 50 respectively.The 2nd barn door 170 is changed by driving the actuator of the 2nd adjustment section 173
End shape, to change the shape on the boundary in the downstream side of the Y-direction in illumination region.In addition, the 2nd barn door 170
Also it is configurable to the shape on the boundary of the upstream side of the Y-direction in change illumination region.
There can also be setting for the angular distribution for setting the light illuminated to mask in the control unit of exposure device 200
Determine portion.In this case, it is also configured to the efficient light sources distribution being desirable for configuration part setting user, wishes change
Efficient light sources distribution changes above-mentioned 1st light intensity distributions or the 2nd optical system according to the angular distribution using configuration part setting
System.
[the 3rd embodiment]
(article manufacturing method)
Next, article (semiconducter IC element, liquid crystal display element, colorized optical filtering of the explanation using above-mentioned exposure device
Piece, MEMS etc.) manufacturing method.By using above-mentioned exposure device to substrate (chip, glass substrate for being coated with emulsion
Deng) process that is exposed, the process developed to the substrate (emulsion) and handled with other well known manufacturing procedure
The process of substrate after development, to manufacture article.Other well known process includes etching, resist removing, cutting, bonding, envelope
Dress etc..According to this manufacturing method, it can manufacture compared to previous method, in the performance of article, quality, productivity, be produced into
More favorable article in this at least one.
Although describing the present invention referring to exemplary embodiment, it should be appreciated that, the present invention is not limited to disclosed
Exemplary embodiment.The range of claims below should be endowed broadest explanation with cover all such modifications with
And equivalent structure and function.
Claims (16)
1. a kind of lamp optical system, object is illuminated comprising:
1st optical system carries out shaping to the light beam from light source；
2nd optical system carries out shaping to the light beam from light source；
Light integrator；And
Light beam from the 1st optical system and the light beam from the 2nd optical system are directed to described by optical system
The plane of incidence of light integrator,
1st optical system has the 1st that change is formed by the 1st optical system in the plane of incidence of the light integrator
The optical component of light intensity distributions,
2nd optical system has the 2nd that change is formed by the 2nd optical system in the plane of incidence of the light integrator
The optical component of light intensity distributions,
Make the 1st light intensity distributions and the 2nd luminous intensity using the 1st optical system and the 2nd optical system
The light intensity distributions being distributed at the plane of incidence that is mutually different and forming the light integrator, with from the light integrator
Light illuminates the object.
2. lamp optical system according to claim 1, which is characterized in that
The optical component of 1st optical system includes
1st optical section；And
2nd optical section is formed in the plane of incidence and is formed in the plane of incidence of the light integrator by the 1st optical section
The different light intensity distributions of light intensity distributions,
1st optical system is changed by the way that the 1st optical section and the 2nd optical section switching to be configured in optical path
1st light intensity distributions.
3. lamp optical system according to claim 2, which is characterized in that
1st optical section is imaging optical system, and the 2nd optical section is the optical system for including prism.
4. lamp optical system according to claim 2, which is characterized in that
1st optical section is imaging optical system, and the 2nd optical section is optical bar.
5. lamp optical system according to claim 3, which is characterized in that
The optical component of 1st optical system has optical bar, which forms in the plane of incidence and by the imaging
The light intensity distributions and the optical system by including the prism that optical system is formed in the plane of incidence are in the plane of incidence
The different light intensity distributions of the light intensity distributions of formation.
6. lamp optical system according to claim 2, which is characterized in that
The optical component of 2nd optical system has the 3rd optical section, and the 3rd optical section forms in the plane of incidence and by institute
Each light intensity that the 1st optical section and the 2nd optical section for stating the 1st optical system are formed in the plane of incidence of the light integrator
Degree is distributed different light intensity distributions.
7. lamp optical system according to claim 1, which is characterized in that
The optical component of 2nd optical system includes
3rd optical section；And
4th optical section is formed in the plane of incidence and is formed in the plane of incidence of the light integrator by the 3rd optical section
The different light intensity distributions of light intensity distributions,
2nd optical system is changed by the way that the 3rd optical section and the 4th optical section switching to be configured in optical path
2nd light intensity distributions.
8. lamp optical system according to claim 1, which is characterized in that
1st optical system carries out shaping to the light beam from the 1st light source,
2nd optical system carries out shaping to the light beam from the 2nd light source.
9. lamp optical system according to claim 8, which is characterized in that
The lamp optical system has the 3rd optical system that shaping is carried out to the light beam from the 3rd light source,
3rd optical system has the 3rd that change is formed by the 3rd optical system in the plane of incidence of the light integrator
The optical component of light intensity distributions,
Light beam from the 1st optical system and the light beam from the 2nd optical system are directed to the optical integration
The optical system of the plane of incidence of device by the light beam from the 1st optical system, the light beam from the 2nd optical system and
Light beam from the 3rd optical system is directed to the plane of incidence of the light integrator.
10. lamp optical system according to claim 1, which is characterized in that
The lamp optical system has the 1st adjustment section for adjusting the 1st light intensity distributions.
11. lamp optical system according to claim 1, which is characterized in that
The lamp optical system has the 2nd adjustment section for adjusting the 2nd light intensity distributions.
12. lamp optical system according to claim 10, which is characterized in that
The lamp optical system has the measurement portion for the angular distribution for measuring the light illuminated to the object,
1st adjustment section adjusts the 1st light intensity distributions according to the angular distribution measured by the measurement portion.
13. lamp optical system according to claim 10, which is characterized in that
1st adjustment section passes through the adjustment of the input voltage of the 1st light source, the adjustment of the position of the 1st optical system
Or the configuration of dim light optical filter, adjust the 1st light intensity distributions.
14. a kind of exposure device, substrate is exposed comprising:
Lamp optical system described in claim 1 illuminates the mask as object；And
The pattern of the mask is projected to substrate by projection optical system.
15. exposure device according to claim 14, which is characterized in that
The exposure device has the configuration part for the angular distribution for setting the light illuminated to the mask,
According to the angular distribution using configuration part setting, the 1st light intensity distributions or the 2nd optical system are changed
System.
16. a kind of manufacturing method of article comprising:
The projection optics system of substrate is projected to using the lamp optical system illuminated to mask and by the pattern of the mask
The process that system is exposed substrate；And
To the process that the substrate after exposure develops,
From the substrate manufacture article after development,
The lamp optical system includes
1st optical system carries out shaping to the light beam from light source；
2nd optical system carries out shaping to the light beam from light source；
Light integrator；And
Light beam from the 1st optical system and the light beam from the 2nd optical system are directed to described by optical system
The plane of incidence of light integrator,
1st optical system has the 1st that change is formed by the 1st optical system in the plane of incidence of the light integrator
The optical component of light intensity distributions,
2nd optical system has the 2nd that change is formed by the 2nd optical system in the plane of incidence of the light integrator
The optical component of light intensity distributions,
Make the 1st light intensity distributions and the 2nd luminous intensity using the 1st optical system and the 2nd optical system
The light intensity distributions being distributed at the plane of incidence that is mutually different and forming the light integrator, with from the light integrator
Light illuminates the mask.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017146781A JP6701136B2 (en) | 2017-07-28 | 2017-07-28 | Illumination optical system, exposure apparatus, and article manufacturing method |
| JP2017-146781 | 2017-07-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109307988A true CN109307988A (en) | 2019-02-05 |
| CN109307988B CN109307988B (en) | 2021-07-09 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810814945.5A Active CN109307988B (en) | 2017-07-28 | 2018-07-24 | Illumination optical system, exposure apparatus, and article manufacturing method |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6701136B2 (en) |
| KR (1) | KR102354064B1 (en) |
| CN (1) | CN109307988B (en) |
| TW (1) | TWI709825B (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005236088A (en) * | 2004-02-20 | 2005-09-02 | Nikon Corp | Illuminating optical device, aligner, and exposure method |
| CN101241318A (en) * | 2002-02-13 | 2008-08-13 | 佳能株式会社 | Exposure apparatus and method, and device fabricating method using the same |
| CN101925976A (en) * | 2008-01-21 | 2010-12-22 | 株式会社尼康 | Illuminating apparatus, exposure apparatus, exposure method and device manufacturing method |
| JP2016188878A (en) * | 2015-03-28 | 2016-11-04 | 株式会社ニコン | Illumination optical system, exposure apparatus, and method for manufacturing device |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3879142B2 (en) * | 1996-04-22 | 2007-02-07 | 株式会社ニコン | Exposure equipment |
| JP2002083759A (en) * | 2000-09-07 | 2002-03-22 | Nikon Corp | Illuminating optical equipment, and aligner equipped with the illuminating optical equipment |
| US8379187B2 (en) * | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| JP2009164495A (en) * | 2008-01-10 | 2009-07-23 | Nikon Corp | Illuminator, exposure device, exposure method, and device manufacturing method |
| JP2016218381A (en) * | 2015-05-26 | 2016-12-22 | 株式会社ブイ・テクノロジー | Illumination device for proximity exposure, proximity exposure apparatus and proximity exposure method |
-
2017
- 2017-07-28 JP JP2017146781A patent/JP6701136B2/en active Active
-
2018
- 2018-06-01 TW TW107118894A patent/TWI709825B/en active
- 2018-07-19 KR KR1020180083910A patent/KR102354064B1/en active IP Right Grant
- 2018-07-24 CN CN201810814945.5A patent/CN109307988B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101241318A (en) * | 2002-02-13 | 2008-08-13 | 佳能株式会社 | Exposure apparatus and method, and device fabricating method using the same |
| JP2005236088A (en) * | 2004-02-20 | 2005-09-02 | Nikon Corp | Illuminating optical device, aligner, and exposure method |
| CN101925976A (en) * | 2008-01-21 | 2010-12-22 | 株式会社尼康 | Illuminating apparatus, exposure apparatus, exposure method and device manufacturing method |
| JP2016188878A (en) * | 2015-03-28 | 2016-11-04 | 株式会社ニコン | Illumination optical system, exposure apparatus, and method for manufacturing device |
Also Published As
| Publication number | Publication date |
|---|---|
| KR102354064B1 (en) | 2022-01-24 |
| JP6701136B2 (en) | 2020-05-27 |
| CN109307988B (en) | 2021-07-09 |
| TWI709825B (en) | 2020-11-11 |
| JP2019028224A (en) | 2019-02-21 |
| TW201910925A (en) | 2019-03-16 |
| KR20190013511A (en) | 2019-02-11 |
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