JP6701136B2 - Illumination optical system, exposure apparatus, and article manufacturing method - Google Patents

Description

  The present invention relates to an illumination optical system, an exposure apparatus, and an article manufacturing method.

  The exposure apparatus uses a pattern of an original plate (reticle or mask) on a photosensitive substrate (a resist layer is formed on the surface of the original plate (reticle or mask) through a projection optical system in a lithography process that is a manufacturing process of semiconductor devices, liquid crystal display devices, and the like. It is a device for transferring to a wafer or a glass plate).

  There is a formula called Rayleigh's equation 1 that describes the performance of an exposure apparatus.

However, k ₁ is a dimensionless quantity indicating the difficulty of resolution. λ is the wavelength of the light that exposes the substrate. NA is the numerical aperture of the projection optical system that projects the original pattern onto the substrate.

  According to this, the smaller the resolution RP, the finer the exposure becomes possible. It can be seen from Formula 1 that the NA of the projection optical system can be increased as one of the methods for reducing RP.

  On the other hand, the relationship of Expression 2 holds for the depth of focus DOF of the exposure apparatus.

Similarly to k ₁ , k _{2 in} Equation 2 is also a dimensionless quantity, and changes depending on the type of resist material and the illumination conditions for illuminating the original plate. As described above, if the NA of the projection optical system is increased in order to obtain high resolution, the value of DOF decreases from the equation 2 according to the square law.

  Therefore, in order to secure the depth of focus while obtaining high resolution, the effective light source distribution (illumination condition) is optimized according to the pattern of the original plate.

  The effective light source distribution is the light intensity distribution on the pupil plane of the illumination optical system that illuminates the original plate, and is also the angular distribution of the light that enters the original plate (illuminated surface) by the illumination optical system.

  Various effective light source distributions such as a circular shape and an annular shape can be created by converting the distribution of the illumination light inside the illumination optical system or cutting out the necessary illumination light. For example, Patent Document 1 discloses an illumination optical system that changes an effective light source distribution by switching a part of an optical system that guides light from each of a plurality of light sources to each incident surface of an optical fiber.

Japanese Patent No. 5327056

  In the illumination optical system described in Patent Document 1, since the shape of the incident surface of the optical fiber is fixed, various effective light source distributions cannot be formed. Further, even if the optical system is switched, the loss of illumination light on the incident surface of the optical fiber becomes large.

  Therefore, it is an object of the present invention to provide an illumination optical system that can reduce the loss of illumination light and form various effective light source distributions.

An illumination optical system as one aspect of the present invention for solving the above-mentioned problems is an illumination optical system for illuminating an object, and a first optical system for shaping a light beam from a light source and a second optical system for shaping a light beam from a light source. An optical system; an optical integrator; and a synthetic optical system that superimposes a light beam from the first optical system and a light beam from the second optical system on an incident surface of the optical integrator. Forms a first light intensity distribution on the incident surface of the optical integrator, the second optical system forms a second light intensity distribution on the incident surface of the optical integrator, and the first optical system includes the first optical system. It is possible to change the first light intensity distribution by including the optical unit and the second optical unit, and switching the first optical unit and the second optical unit to arrange them in the optical path. The optical system includes a third optical unit and a fourth optical unit, and the second optical intensity distribution can be changed by switching the third optical unit and the fourth optical unit and arranging them in the optical path. At least one of the first optical system and the second optical system includes an adjusting unit that changes the intensity of a light beam incident on the optical integrator, and the first optical system and the second optical system allow the first optical system and the second optical system. The first light intensity distribution and the second light intensity distribution may be different from each other to form a light intensity distribution on the incident surface of the optical integrator.

  According to the present invention, it is possible to reduce the loss of illumination light and form various effective light source distributions.

It is the figure which showed the illumination optical system of 1st Embodiment. It is the figure which showed the example of the optical system. It is the figure which showed the light intensity distribution formed by an optical system. It is a schematic diagram of an optical integrator. It is a figure showing an example of a sigma stop. It is a schematic diagram of a slit. It is a figure showing an example of forming an effective light source distribution. It is the figure which showed the exposure apparatus of 2nd Embodiment. It is a schematic diagram of an angle sensor. It is a schematic diagram of illuminance nonuniformity measurement. It is a schematic diagram of a slit mechanism. It is a figure for demonstrating illuminance nonuniformity correction.

  Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

[First Embodiment]
The configuration of the illumination optical system according to the first embodiment will be described. The illumination optical system of the present embodiment is mounted on, for example, an exposure apparatus, and is an apparatus for guiding light from a light source to a mask (original plate) on which a pattern is formed, which is an irradiation target (object). is there.

  FIG. 1 is a schematic diagram showing a configuration of an illumination optical system according to this embodiment. The illumination optical system 100 includes a first optical system 301 that shapes light from the first light source unit 120a, a second optical system 302 that shapes light from the second light source unit 120b, and light from the third light source unit 120c. Has a third optical system 303 for shaping. The illumination optical system 100 also includes a combining optical system 500, an optical integrator (fly-eye optical system) 109, σ stops 110 and 112, an optical system 150, a slit 111, and an optical system 160.

  The light source units 120a to 120c are configured by the light source 101 and the elliptical mirror 102. A high pressure mercury lamp is used as the light source 101. Alternatively, the light source units 120a to 120c may use a xenon lamp, an excimer laser, or the like. The elliptical mirror 102 is a condensing optical system for condensing the light emitted from the light source 101, and has a shape using a part of the elliptical shape. The light source 101 is placed at one of the two focal positions of the ellipse. It is arranged.

  The light emitted from the light source 101 and reflected by the elliptical mirror 102 is condensed near the entrances of the optical systems 301 to 303 at the other focal point of the ellipse.

  The optical systems 301, 302, 303 are configured so that the light intensity distribution formed on the incident surface of the optical integrator 109 can be changed by each optical system. Each of the optical systems 301, 302, and 303 has a first optical unit 311, a second optical unit 312, a third optical unit 313, and a fourth optical unit 314, which are arranged in a direction perpendicular to the traveling direction of light. One of the optical units 311, 312, 313, and 314 is selected and placed in the optical path. The optical systems 301, 302, 303 have a mechanism for switching the optical units arranged in the optical path. The optical units 311, 312, 313, 314 form different light intensity distributions on the incident surface of the optical integrator 109. However, although there are four optical units, the number of optical units is not limited to four.

  2A to 2D are schematic configuration diagrams of the optical units 311, 312, 313, and 314. The hatched portion indicates the optical path through which light passes. As shown in FIG. 2A, the optical unit 311 is an imaging optical system that refracts the light flux emitted from the incident surface OBJ by the lenses L1, L2, L3, and L4 to form an image on the emission surface IMG. .

  As shown in FIG. 2B, the optical unit 312 refracts the light flux emitted from the incident surface OBJ by the lenses L5 and L6, and arranges it at the exit of the axicon prism PR1 and the axicon prism PR1. It is an optical system that converts the light into an annular zone at the exit surface IMG by the mirror. As shown in FIG. 2C, the optical unit 313 refracts the light flux emitted from the incident surface OBJ with the lens L7 and converts the light flux with the axicon prism PR2 so as to be collected in a smaller area on the emission surface IMG. It is an optical system. The optical unit 312 and the optical unit 313 are called an illumination distribution shift optical system.

  As shown in FIG. 2(D), the optical unit 314 reflects the light flux emitted from the incident surface OBJ many times on the inner surface of the optical rod (optical pipe) OL, and the light intensity distribution on the exit surface IMG thereof is It is an optical system that performs conversion so as to make it uniform.

  FIG. 3 shows a light intensity distribution (two-dimensional cross section around the optical axis) before and after passing through the optical units 311, 312, 313, and 314 (front: OBJ, back: IMG). First, on the incident surface OBJ, since the luminance distribution of the light source 101 is projected by the elliptical mirror 102, the light intensity distribution has a relatively strong characteristic near the center of the optical axis.

  The light that has passed through the optical unit 311 exhibits a distribution on the exit surface IMG that is substantially the same as the light intensity distribution on the entrance surface OBJ. The optical unit 312 forms an annular shape on the exit surface IMG. The optical unit 313 forms an intensity distribution having a sharp peak at the center on the emission surface IMG. The optical unit 314 forms a uniform flat intensity distribution on the emission surface IMG. The exit surface IMG is conjugate with the entrance surface of the optical integrator 109.

  The combining optical system 500 is a catadioptric optical system that is composed of three optical systems 105, two deflecting mirrors 107, and an optical system 140, and combines light fluxes coming from a plurality of optical paths corresponding to lights from a plurality of light sources. The light passing through any of the optical units 311 to 314 is converted into parallel light by the optical system 105 and reaches the combining unit 108. At that time, in some of the plurality of optical paths, the light is reflected by the deflection mirror 107 that deflects the traveling direction of the light. In this embodiment, two of the three optical paths are reflected by the deflection mirror 107.

  In the present embodiment, there are three light source units, but the number of light sources may be two or more, or a plurality. Further, the composition of the combining optical system 500 varies depending on the number of light sources, but in order to reduce the loss of illumination light, an optical system combining a lens and a deflection mirror as in this embodiment is desirable. However, the synthetic optical system 500 may be configured only with lenses, or an optical waveguide may be used in part.

  The optical system 105 is arranged such that the combining unit 108 is substantially at the Fourier transform position of the exit surface IMG of the optical system units 311, 312, 313, and 314. The light emitted from the combining unit 108 is guided to the optical integrator 109 by the optical system 140. At this time, the optical system 140 is arranged such that the incident surface of the optical integrator 109 is substantially at the Fourier transform position of the combining unit 108. That is, the exit surface IMG is in a position that is optically conjugate with the entrance surface of the optical integrator 109.

  FIG. 4 is a diagram showing the optical integrator 109. As shown in FIG. 4, the optical integrator 109 is composed of two lens groups 131 and 132 in which a large number of plano-convex lenses are laminated in a plane. At the focal position of each of the plano-convex lenses forming the lens groups 131 and 132, the curvature surfaces are arranged to face each other so that there is a pair of plano-convex lenses. By using such an optical integrator 109, a large number of secondary light source distributions (effective light source distributions) equivalent to the light sources 101 are formed at the position of the exit surface 110 of the optical integrator 109.

  A σ stop (aperture stop) 110 is arranged near the exit surface of the optical integrator 109. The exit surface of the optical integrator 109 is the pupil surface of the illumination optical system, and the light intensity distribution formed on this pupil surface is called the effective light source distribution. The σ stop 112 is arranged in a direction perpendicular to the light traveling direction of the σ stop 110. The σ diaphragm 110 and the σ diaphragm 112 are provided with openings having different shapes. As the σ diaphragm 110 and the σ diaphragm 112, for example, any one of the aperture diaphragms 231, 232, 233, 234 in FIGS. 5A to 5D can be selected. The aperture diaphragms 231 to 234 are diaphragms that block a part of light and allow only the openings 225, 226, 227, and 228 shown in white to transmit light. Each opening is an annular opening 225, a small circular opening 226, a medium circular opening 227, and a large circular opening 228. Further, in this embodiment, the σ switching mechanism 113 is configured so that different types of σ diaphragms can be selectively used.

  The light flux emitted from the emission surface 110 of the optical integrator 109 is guided to the slit 111 by the optical system 150. At this time, the optical system 150 is arranged such that the slit 111 is substantially a Fourier transform surface of the exit surface 110 of the optical integrator 109. A large number of secondary light source distributions are formed at the position of the emission surface 110, and the light from each secondary light source is superimposed on the emission surface 110 by the optical system 150, so a uniform light intensity distribution on the slit 111. Becomes

  FIG. 6 shows the shape of the slit 111, and the light other than the arc-shaped opening 23 shown in white is blocked. After that, the arc-shaped illumination light flux that has passed through the opening is irradiated onto the irradiated surface ILP by the optical system 160. In the present embodiment, the slit has an opening with an arc shape, but may have another shape, for example, a rectangular shape.

  According to this embodiment, various effective light source distributions can be formed without loss of illumination light in the optical fiber.

[Example 1]
When the pattern drawn on the mask is transferred to the substrate using the exposure apparatus, it is desirable to optimize the shape of the effective light source distribution according to the pattern shape. The effective light source distribution is also the incident angle distribution of the illumination light that enters the mask.

  Depending on the mask pattern, lowering the coherence may improve the image contrast, or increasing the coherence and forming an annular effective light source distribution may increase the depth of focus. That is, by changing the shape of the effective light source distribution according to the mask pattern, it is possible to achieve good imaging performance in various patterns.

  By using the first optical system 301, the second optical system 302, and the third optical system 303 described in the first embodiment, it is possible to change the effective light source distribution to various shapes depending on the pattern of the mask M. is there.

  An example in which the shape of the effective light source distribution is changed by selecting the optical units 311, 312, 313, 314 configured in each of the optical systems 301, 302, 303 will be described with reference to Table 1 and FIG. 7.

  Table 1 shows combinations of optical units arranged in the optical paths of the optical systems 301, 302 and 303. FIG. 7 shows a light intensity distribution formed on the emission surface IMG by the optical units arranged in the respective optical paths, and a light intensity distribution obtained by combining them in the combining optical system 500 (incident surface or emission surface of the optical integrator 109 (effective light source). It is a figure showing the outline of the shape of (distribution)).

  When light from a plurality of optical paths is combined, the intensity distribution of the combined light can be expressed by adding the light intensity distributions for each optical path. That is, the light flux from the first optical system 301, the light flux from the second optical system 302, and the light flux from the third optical system 303 are superposed on the incident surface of the optical integrator 109. Therefore, the effective light source distribution is an intensity distribution obtained by adding the light intensity distributions formed by each of the optical systems 301, 302, 303.

  P1 is a case where the optical unit 313 is used in all the optical systems 301 to 303. In this case, the effective light source distribution is a small σ illumination in which the light intensity distribution is concentrated in the center.

  P2 and P3 are combinations in which the optical units 311 and 313 are used together in the optical systems 301 to 303, and the effective light source shape is medium σ. Since the central and peripheral light intensities can be changed by the number of combinations of the optical units 311 and 313, the optimum combination can be selected according to the mask pattern. P4 is a case where the optical unit 311 is arranged in all the optical systems 301 to 303. In this case, the effective light source distribution shape is medium σ.

  P5 is a case where the optical unit 312 is arranged in all of the optical systems 301 to 303. In this case, the effective light source distribution shape is an annular zone.

  P6 is a combination in which the optical units 312 and 314 are used together in the optical systems 301 to 303, and the effective light source distribution shape is large σ. P7 is a combination in which the optical units 311 and 312 are used together in the optical systems 301 to 303, and the effective light source distribution shape is large σ. Since the light intensity at the center of the large σ and the light intensity at the periphery can be changed depending on the combination of the optical parts, it is preferable to select the optimum combination depending on the mask pattern. Further, P8 is a case where the optical unit 314 is used in all the optical systems 301 to 303. At this time, the effective light source distribution has a flat large σ. Table 1 shows the σ diaphragms to be used in P1 to P8.

  In this embodiment, the formation of eight patterns of effective light sources has been described. However, depending on the number of light sources, the number of light paths combined by the combining optical system 500, and the number of optical parts, various other effective light source distributions may be provided. Can be created. Strictly speaking, even if the same type of optical unit is used for each of the optical systems 301 to 303, the contribution to the effective light source distribution obtained as a result of passing through the combining optical system 500 is not the same.

  For example, as P6, P6′, and P6″ in Table 2, the optical parts used in the optical systems 301 to 303 are the same in that the optical parts 312 are two and the optical part 314 is one, but the effective light source distribution is Are not exactly the same.

Therefore, assuming that the number of optical paths (optical system 301 and the like) is N and the type (number) of optical parts is M, theoretically an effective light source distribution having a pattern of ^MN can be formed.

  As described above, according to the present embodiment, it is possible to reduce the loss of illumination light and form various effective light source distributions such as large and small circles and annular zones.

[Second Embodiment]
Next, the exposure apparatus 200 as the second embodiment will be described. FIG. 8 is a diagram showing the exposure apparatus 200 of the second embodiment. The description of the parts already described in the first embodiment will be omitted.

  The mask M, which is the original plate and is arranged on the illuminated surface ILP of the illumination optical system 100, is illuminated. The pattern drawn on the mask M is transferred by forming a part of the illumination light on the substrate P through the projection optical system PO.

  The exposure apparatus 200 is provided with a plurality of light intensity sensors. First, in the vicinity of the mask M, an angle sensor JS (measurement unit) that measures the incident angle distribution (light intensity distribution) of the illumination light that enters the mask M is arranged. As shown in FIG. 9, the angle sensor JS includes a pinhole 351 and a CCD camera 352 (light receiving element). The pinhole 351 is arranged near the mask M, and the CCD camera 352 is arranged at a position sufficiently separated from the pinhole. The light passing through the pinhole 351 is detected at different positions of the CCD camera 352 corresponding to the incident angle. Therefore, by analyzing the pixel value (light intensity) of the image acquired by the CCD camera 352 by the control unit of the exposure apparatus or an external computer, the incident angle characteristic of the light incident on the mask M can be known.

  In order to obtain a desired effective light source distribution based on the incident angle characteristic of the illumination light obtained by the angle sensor JS arranged in the exposure apparatus 200, at least one of the plurality of light sources 101a, 101b, 101c is It has a control part (adjustment part) which adjusts an input voltage. That is, there is a first adjusting unit that adjusts the first light intensity distribution formed on the incident surface of the optical integrator 109 by the first optical system 301 using the light from the first light source unit 101a. In addition to the first adjusting unit, a second adjusting unit that adjusts the second light intensity distribution formed on the incident surface of the optical integrator 109 by the second optical system 302 using the light from the second light source unit 101b is provided. You may have. Since the effective light source distribution is the sum of the light intensity distributions from each light source, the effective light source distribution can be finely adjusted by changing the light intensity from each optical path by adjusting the input voltage of each light source. it can.

  In addition, as a means for changing the intensity distribution of the light from each optical path (first light intensity distribution or second light intensity distribution), there is an adjusting unit for finely adjusting the position of the light source or the position of the optical element in each optical path. For example, a plurality of images obtained by the angle sensor JS when the position of the light source or the position of the optical element in each optical path is moved is analyzed, and a desired effective light source is obtained based on the difference in pixel value of the plurality of images. The position of the light source or the position of the optical element in each optical path may be determined so that the distribution is obtained.

  Although not shown in FIG. 8, the intensity distribution of the light from each optical path can be changed by installing and removing the neutral density filter in the optical path from each light source. In this case, for example, the neutral density filter may be taken in and out near the optical system 105.

  In the exposure apparatus 200 of the present embodiment, the angle sensor JS is arranged near the substrate P as well as near the mask M. However, since the vicinity of the mask M and the vicinity of the substrate P are optically conjugate with each other, the angle sensor JS may be arranged at at least one of them.

  An illuminance distribution sensor 304 that measures illuminance (light intensity) in an arc-shaped exposure area on the substrate P is arranged near the substrate P. As shown in FIG. 8, the illuminance distribution sensor 304 includes a slit 303, an optical system 306 including a lens or a mirror, and a sensor 305. As shown in FIG. 10, the slit 303 is scanned (moved) with respect to the exposure area 401 of the light imaged on the substrate P. At this time, of the light that forms an image in the exposure area 401, only the light that forms an image in the opening 306 (white) of the slit 303 enters the illuminance distribution sensor 304. The light that has entered the illuminance distribution sensor 304 is guided to the sensor 305 via the optical system 306. By scanning the slit 303 in the X-axis direction shown in FIG. 10 and reading the energy of light reaching the sensor 305, the integrated illuminance for each X position in the exposure region 401 is measured. Thereby, the integrated illuminance unevenness on the substrate P can be calculated.

  When the effective light source distribution is changed in the first embodiment or the second embodiment, there is a possibility that illuminance unevenness may occur in the illuminated surface or the illuminated surface and an optical position. Therefore, the slit mechanism 182 (adjustment mechanism) can be used instead of the slit 111 in the illumination optical system 100. By adjusting the opening width of the slit mechanism 181 based on the measurement result by the illuminance distribution sensor 304, the illuminance unevenness can be reduced. For example, it is assumed that the illuminance distribution sensor 304 measures the illuminance unevenness as shown in FIG. In this case, the width in the y direction of the opening of the slit mechanism 182 in the portion where the illuminance is reduced (the position in the x direction) is locally widened, and the slit mechanism 182 in the portion where the illuminance is increased (the position in the x direction). The width in the y direction of the opening is locally narrowed. Thereby, the illuminance distribution can be made uniform as shown in FIG.

  FIG. 11 shows a configuration example of the slit mechanism 182. The slit mechanism 182 includes first light shielding plates 175 and 176 that form an opening 172 that defines the shape of the illuminated area on the illuminated surface. The light blocking member 175 is a member that defines the position of the boundary on the upstream side of the opening 172 in the Y direction. The light blocking member 176 is a member that defines the boundaries of both ends of the opening 172 in the X direction.

  Further, the slit mechanism 181 has an adjusting unit 53 that adjusts the position of the first light blocking plate 175 in the Y direction so as to change the illumination area on the illuminated surface. The position adjusting unit 53 includes an actuator. The position of the light shielding plate 175 in the Y direction is changed by the position adjusting unit 53, so that the position of the boundary on the upstream side in the Y direction in the illumination region is changed.

  The opening 172 is, for example, an arc-shaped slit through which light passes. The adjustment unit 91 may include a first adjustment unit 53 that adjusts the position of the first light blocking plate 171 in the Y direction (first direction) and a second adjustment unit 173 that adjusts the shape of the opening 172 in the Y direction. .. The first adjustment unit 53 is connected to the control unit, and the operation of the first adjustment unit 53 can be controlled by the control unit.

  A second light shielding plate 170 is formed at one end of the opening 172 having an arc shape. The second light shielding unit 170 is a member for changing the shape of the boundary on the downstream side in the Y direction in the illumination area. The second light blocking plate 170 is provided with a second adjusting unit 173 (pushing/pulling unit) that pushes and pulls each position of the second light blocking plate 170 in the X direction (second direction) in the Y direction. The second adjustment unit 173 may be a plurality of actuators. Each of the plurality of actuators is connected to the control unit via a wiring 174. Thereby, each of the plurality of actuators is driven under the control of the control unit 50. By driving the actuator of the second adjusting unit 173 to change the shape of the end of the second light shielding plate 170, the shape of the downstream boundary in the Y direction in the illumination region is changed. The second light shielding plate 170 may be arranged so as to change the shape of the boundary on the upstream side in the Y direction in the illumination area.

  The control unit of the exposure apparatus 200 may have a setting unit that sets the angular distribution of the light that illuminates the mask. In this case, the effective light source distribution that the user wants to use and the effective light source distribution that the user wants to change are set by the setting unit, and the first light intensity distribution or the second optical system is changed based on the angular distribution set by the setting unit. It may be configured as follows.

[Third Embodiment]
(Product manufacturing method)
Next, a method of manufacturing an article (semiconductor IC element, liquid crystal display element, color filter, MEMS, etc.) using the above-described exposure apparatus will be described. The article includes a step of exposing a substrate (wafer, glass substrate, etc.) coated with a photosensitive agent using the above-described exposure apparatus, a step of developing the substrate (photosensitive agent), and a step of developing the developed substrate. It is manufactured by processing in the well-known processing steps of. Other known processes include etching, resist stripping, dicing, bonding, packaging and the like. According to this manufacturing method, it is possible to manufacture an article that is advantageous in at least one of the performance, quality, productivity, and production cost of the article as compared with the conventional method.

Claims (14)

An illumination optical system for illuminating an object,
A first optical system for shaping the light flux from the light source,
A second optical system for shaping the light flux from the light source,
Optical integrator,
A light beam from the first optical system and a light beam from the second optical system at the incident surface of the optical integrator, and a combining optical system,
The first optical system forms a first light intensity distribution on an incident surface of the optical integrator, and the second optical system forms a second light intensity distribution on an incident surface of the optical integrator,
The first optical system includes a first optical unit and a second optical unit, and the first optical intensity distribution is obtained by switching the first optical unit and the second optical unit and arranging them in the optical path. Can be changed,
The second optical system includes a third optical unit and a fourth optical unit, and the second optical intensity distribution is obtained by switching the third optical unit and the fourth optical unit and arranging them in the optical path. Can be changed,
At least one of the first optical system and the second optical system includes an adjusting unit that changes the intensity of a light beam incident on the optical integrator,
Illumination characterized in that the first optical system and the second optical system make the first light intensity distribution and the second light intensity distribution different from each other to form a light intensity distribution on an incident surface of the optical integrator. Optical system. The illumination optical system according to claim 1, wherein each of the first optical system and the second optical system includes an adjusting unit that changes an intensity of a light beam incident on the optical integrator. The illumination optical system according to claim 1 or 2, wherein the first optical unit is an imaging optical system, and the second optical unit is an optical system including a prism. The first optical unit is an imaging optical system, the second optical unit is an optical rod, an illumination optical system according to claim 1 or 2, characterized in that. The first optical system enters the light intensity distribution different from the light intensity distribution formed on the incident surface by the imaging optical system and the light intensity distribution formed on the incident surface by the optical system including the prism. The illumination optical system according to claim 4 , further comprising an optical rod formed on the surface. The first optical system shapes the light flux from the first light source,
The illumination optical system according to any one of claims 1 to 5 , wherein the second optical system shapes the light flux from the second light source. A third optical system for shaping the light flux from the third light source,
The third optical system can change a third light intensity distribution formed on the incident surface of the optical integrator by the third optical system,
The synthetic optical system is characterized in that the light flux from the first optical system, the light flux from the second optical system, and the light flux from the third optical system are superposed on an incident surface of the optical integrator. 6. The illumination optical system according to item 6 . The illumination optical system according to any one of claims 1 to 7, characterized in that it has a first adjusting unit for adjusting the first light intensity distribution. The illumination optical system according to any one of claims 1 to 7 , further comprising a second adjusting unit that adjusts the second light intensity distribution. A measuring unit for measuring an angular distribution of light for illuminating the object,
The illumination according to any one of claims 1 to 9, wherein the adjusting unit adjusts a light intensity distribution on an incident surface of the optical integrator based on the angular distribution measured by the measuring unit. Optical system. Before Sulfur butterfly-save, the adjustment of the input voltage of the light source, adjustment of the position of the optical system for shaping a light beam from the light source, or by the arrangement of the neutral density filter, adjusting the light intensity distribution on the entrance surface of the optical integrator The illumination optical system according to any one of claims 1 to 10, wherein: An exposure apparatus for exposing a substrate,
An illumination optical system for illuminating a mask as an object according to any one of claims 1 to 11 ,
A projection optical system for projecting the pattern of the mask onto a substrate. A setting unit for setting the angular distribution of the light illuminating the mask,
13. The exposure apparatus according to claim 12 , wherein the first light intensity distribution or the second optical system is changed based on the angle distribution set by the setting unit. A method of manufacturing an article, comprising:
Exposing a substrate using the exposure apparatus according to claim 12 or 13 ;
Developing the exposed substrate,
A method for producing an article, comprising producing an article from a developed substrate.

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