KR20190013511A - Illumination optical system, exposure apparatus, and method of manufacturing article - Google Patents

Abstract

An illumination optical system includes: first and second optical systems shaping light speed from a light source; an optical integrator; and an optical system inducing the light speed from the first optical system and the light speed from the second optical system into an incident surface of the optical integrator, wherein the first optical system has an optical member which changes first light intensity distribution formed on the incident surface of the optical integrator by the first optical system, and the second optical system has an optical member which changes second light intensity distribution formed on the incident surface of the optical integrator by the second optical system, wherein the first optical system and the second optical system make the first light intensity distribution and the second light intensity distribution different from each other, and form the light intensity distribution on the incident surface of the optical integrator.

Description

TECHNICAL FIELD [0001] The present invention relates to an illumination optical system, an exposure apparatus,

The present invention relates to an illumination optical system, an exposure apparatus, and a method of manufacturing an article.

The exposure apparatus is a system in which a pattern of an original plate (reticle or mask) is irradiated onto a photosensitive substrate (a wafer or a glass plate on which a resist layer is formed on the surface, etc.) through a projection optical system in a lithography process as a manufacturing process of a semiconductor device or a liquid crystal display ).

There is a formula called Rayleigh's formula (Equation 1) which shows the performance of the exposure apparatus.

However, k ₁ is a dimensionless amount representing difficulty of the sea. is a wavelength of light exposing the substrate. NA is the numerical aperture of the projection optical system for projecting the pattern of the original plate onto the substrate.

According to this, the smaller the value of the resolving power RP, the finer the exposure becomes possible. As one of the methods of reducing the RP, it can be understood that the NA of the projection optical system can be increased by the equation (1).

On the other hand, the relationship of Equation 2 is established for the depth of focus (DOF) of the exposure apparatus.

Similarly to k ₁ , k _{2 in the} expression (2) is a non-dimensional amount and varies depending on the type of the resist material and the illumination condition for illuminating the original plate. As described above, when the NA of the projection optical system is increased in order to obtain a high resolution, the value of DOF in Equation (2) is reduced to its 2-order rule.

Therefore, in order to secure the depth of focus while obtaining high resolving power, the effective light source distribution (illumination condition) is optimized in accordance with the pattern of the original plate.

The effective light source distribution is a light intensity distribution in the pupil plane of the illumination optical system for illuminating the original plate, and is also an angular distribution of light incident on the original plate (illuminated plane) by the illumination optical system.

Various effective light source distributions such as a circle or a circle can be created by changing the distribution of the illumination light inside the illumination optical system or by cutting out the necessary illumination light. For example, Japanese Patent No. 5327056 discloses an illumination optical system that changes the effective light source distribution by switching a part of an optical system that guides light from each of a plurality of light sources to each incident surface of an optical fiber.

In the illumination optical system disclosed in Japanese Patent No. 5327056, since the shape on the incident surface of the optical fiber is fixed, various effective light source distributions can not be formed. Further, even if the optical system is switched, the loss of the illumination light on the incident surface of the optical fiber becomes large.

According to an aspect of the present invention, there is provided an illumination optical system for illuminating an object, comprising: a first optical system for shaping a light flux from a light source; a second optical system for shaping a light flux from the light source; and an optical system for guiding a light flux from the first optical system and a light flux from the second optical system to an incident surface of the optical integrator, wherein the first optical system is arranged so that the optical inter- And the second optical system changes the second light intensity distribution formed on the incident surface of the optical integrator by the second optical system, wherein the second optical system changes the first light intensity distribution formed on the incident surface of the optical integrator Wherein the first optical system and the second optical system have a first optical intensity distribution and a second optical intensity distribution which are different from each other And further characterized in that for illuminating the object to form a light intensity distribution on the entrance surface of said optical integrator, and the light from the optical integrator.

Other features of the present invention will become apparent from the following description of exemplary embodiments (with reference to the accompanying drawings).

1 is a view showing an illumination optical system of a first embodiment.
2 is a diagram showing an example of an optical system.
3 is a diagram showing a light intensity distribution formed by an optical system.
4 is a schematic diagram of an optical integrator.
5 is a view showing an example of a σ stop.
6 is a schematic view of a slit.
7 is a view showing an example of formation of an effective light source distribution.
8 is a view showing the exposure apparatus of the second embodiment.
9 is a schematic view of an angle sensor.
Fig. 10 is a schematic diagram of measurement of unevenness in illumination.
11 is a schematic view of a slit mechanism.
Fig. 12 is a diagram for explaining correction of unevenness in illumination.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

[First Embodiment]

The configuration of the illumination optical system according to the first embodiment will be described. The illumination optical system of the present embodiment is mounted on an exposure apparatus, for example, and is an apparatus for guiding light from a light source to a mask (original plate) having a pattern, which is an object to be irradiated (object).

1 is a schematic view showing a configuration of an illumination optical system according to the present embodiment. The illumination optical system 100 includes a first optical system 301 for shaping light from the first light source section 120a, a second optical system 302 for shaping light from the second light source section 120b, And a third optical system 303 for shaping light from the light source 120c. The illumination optical system 100 has a synthetic optical system 500, an optical integrator (fly's eye optical system) 109, σ stoppers 110 and 112, an optical system 150, a slit 111, and an optical system 160 .

The light source units 120a to 120c are constituted by a light source 101 and an elliptical mirror 102. [ The light source 101 uses a high-pressure mercury lamp. In addition to the light sources 120a to 120c, a xenon lamp or an excimer laser may be used. The elliptical mirror 102 is a condensing optical system for condensing the light emitted from the light source 101 and has a shape using a part of an elliptical shape and arranges the light source 101 on one side of two focus positions of the ellipse.

The light emitted from the light source 101 and reflected by the elliptical mirror 102 is condensed in the vicinity of the entrance of the optical system 301 to 303 at the other focus position of the ellipse.

The optical systems 301, 302, and 303 are configured so that the light intensity distribution formed on the incident surface of the optical integrator 109 can be changed by each optical system. The optical systems 301, 302 and 303 each have a first optical portion 311, a second optical portion 312, a third optical portion 313, a fourth optical portion 314). One of the optical sections 311, 312, 313, and 314 is selected and disposed in the optical path. The optical systems 301, 302, and 303 have a mechanism for switching the optical portion disposed in the optical path. The optical units 311, 312, 313, and 314 form light intensity distributions that are different from each other on the incident surface of the optical integrator 109. However, the number of optical parts is four, but the number is not limited to four.

Figs. 2 (A) to 2 (D) show a schematic configuration of the optical sections 311, 312, 313 and 314. The hatched portion represents an optical path through which light passes. As shown in Fig. 2A, the optical portion 311 refracts the light flux emitted from the incident surface OBJ by the lenses L1, L2, L3 and L4 to form an image on the emission surface IMG And is an imaging optical system.

The optical section 312 refracts the light flux emitted from the incident surface OBJ by the lenses L5 and L6 to form the axicon prism PR1 and the axicon prism PR1, And is converted by the cylindrical mirror disposed at the exit of the light guide plate IMG to a ring shape. The optical section 313 refracts the light flux emitted from the incident surface OBJ by the lens L7 as shown in Fig. 2C, and, on the exit surface IMG by the axicon prism PR2, To converge into a smaller area. The optical portion 312 and the optical portion 313 are referred to as an illumination distribution shift optical system.

The optical portion 314 reflects the light flux from the incident surface OBJ many times on the inner surface of the optical rod OL as shown in FIG. ), The optical intensity distribution is converted so as to be uniform.

3 shows a light intensity distribution (two-dimensional cross section centering on the optical axis) before and after passing through the optical sections 311, 312, 313, and 314 (before: OBJ and after: IMG). First, in the incident surface OBJ, since the luminance distribution of the light source 101 is reflected by the elliptical mirror 102, the light intensity distribution has a relatively strong characteristic in the vicinity of the optical axis center.

The light having passed through the optical portion 311 has the same distribution as the light intensity distribution of the incident surface OBJ on the emission surface IMG. The optical portion 312 forms a ring shape on the emission surface IMG. The optical portion 313 forms an intensity distribution having a sharp peak at the center on the emission surface IMG. The optical portion 314 forms a uniform and flat intensity distribution on the exit surface IMG. The emission surface IMG is conjugate with the incident surface of the optical integrator 109. [

The combining optical system 500 is composed of three optical systems 105, two deflection mirrors 107 and an optical system 140 and is configured to synthesize a light flux from a plurality of optical paths corresponding to light from a plurality of light sources And is a reflection-refracting optical system. The light having passed through any one of the optical sections 311 to 314 is converted into parallel light by the optical system 105 and reaches the combining section 108. At this time, in some of the plural optical paths, the light is reflected by the deflection mirror 107 that deflects the traveling direction of the light. In this embodiment, two of the three optical paths are reflected by the deflection mirror 107. [

In the present embodiment, there are three light sources, but the number of light sources may be two or more. Although the composition of the combining optical system 500 varies depending on the number of light sources, an optical system combining a lens and a deflection mirror is preferable as in the present embodiment in order to reduce loss (loss) of illumination light. However, the combining optical system 500 may be composed of only a lens, or a part of the optical waveguide may be used. Further, an optical fiber may be used as the synthesis optical system 500.

The optical system 105 is arranged so that the combining section 108 is a substantially Fourier transformed position on the emission surface IMG of the optical system sections 311, 312, 313, and 314. The light emitted from the combining section 108 is guided to the optical integrator 109 by the optical system 140. At this time, the optical system 140 is arranged such that the incident surface of the optical integrator 109 is a substantially Fourier transformed position of the combining section 108. That is, the emission surface IMG is in a positional relationship optically conjugate with the incident surface of the optical integrator 109. [

4 is a diagram showing the optical integrator 109. Fig. As shown in Fig. 4, the optical integrator 109 includes two lens groups 131 and 132 in which a plurality of plano-convex lenses are bonded in a planar manner. Are arranged so as to face each other with a curvature surface so that there are paired convex lenses at the focal positions of the plano-convex lenses constituting the lens groups (131, 132). By using such an optical integrator 109, a plurality of secondary light source distributions (effective light source distributions) equivalent to the light source 101 are formed at the emission surface 110 of the optical integrator 109.

A σ aperture (aperture stop) 110 is disposed in the vicinity of the exit surface of the optical integrator 109. The exit surface of the optical integrator 109 is the surface of the illumination optical system, and the light intensity distribution formed on the surface of the optical integrator 109 is referred to as effective light source distribution. the ς stop 112 is arranged in a direction perpendicular to the traveling direction of the light of the σ stop 110. The sigma diaphragm 110 and the sigma diaphragm 112 are provided with openings of different shapes. The sigma diaphragm 110 and the sigma diaphragm 112 can be selected from among the aperture diaphragms 231, 232, 233, and 234 in Figs. 5A to 5D, for example. The aperture stops 231 to 234 are diaphragms that shield a part of the light and transmit light only through the openings 225, 226, 227 and 228 shown by white. Each opening is an annular opening 225, a small circular opening 226, a medium circular opening 227, and a large circular opening 228. Further, in this embodiment, a? Switching mechanism 113 capable of selectively using a σ diaphragm of different kinds is constituted.

The light beam emitted from the emitting surface 110 of the optical integrator 109 is guided to the slit 111 by the optical system 150. At this time, the optical system 150 is arranged such that the slit 111 is a substantially Fourier transform plane of the exit surface 110 of the optical integrator 109. [ Since a plurality of secondary light source distributions are formed at the position of the emitting surface 110 and the light from each secondary light source is superimposed on the emitting surface 110 by the optical system 150, Light intensity distribution.

6 shows the shape of the slit 111, and light other than the arc-shaped opening 23 indicated by white is shielded. Thereafter, the arc illumination light flux passing through the aperture is irradiated onto the surface ILP to be irradiated by the optical system 160. [ In this embodiment, the slit has an arc-shaped opening, but another shape, for example, a rectangular shape or the like may be used.

According to the present embodiment, it is possible to form various effective light source distributions without losing illumination light.

[Example 1]

When the pattern drawn on the mask is transferred onto the substrate using the exposure apparatus, it is preferable that the shape of the effective light source distribution is optimized by the pattern shape. The effective light source distribution is also an incident angle distribution of the illumination light incident on the mask.

Depending on the pattern of the mask, there is a case where the contrast of the image is improved by lowering the coherence property, or the depth of focus is enlarged when the coherence property is increased and the effective light source distribution of the large shape is formed. That is, by changing the shape of the effective light source distribution in accordance with the pattern of the mask, it is possible to achieve good imaging performance in various patterns.

By using the first optical system 301, the second optical system 302 and the third optical system 303 described in the first embodiment, it is possible to change the effective light source distribution in various shapes by the pattern of the mask M Do.

Examples of changing the shape of the effective light source distribution by the selection of the optical sections 311, 312, 313, and 314 in each of the optical systems 301, 302, and 303 will be described with reference to Table 1 and FIG.

Table 1 shows combinations of the optical parts arranged in the optical paths of the optical systems 301, 302, and 303. 7 is a graph showing the relationship between the light intensity distribution formed on the exit surface IMG by the optical portion disposed in each optical path and the light intensity distribution obtained by combining them with the synthetic optical system 500 (Effective light source distribution)).

When synthesizing light from a plurality of optical paths, the intensity distribution of the synthesized light can be represented by the addition of the light intensity distribution for each optical path. That is, the light flux from the first optical system 301, the light flux from the second optical system 302, and the light flux from the third optical system 303 are superimposed on the incident surface of the optical integrator 109. Therefore, the effective light source distribution is the intensity distribution obtained by adding the light intensity distributions formed in the optical systems 301, 302, and 303, respectively.

P1 is a case where the optical portion 313 is used in all the optical systems 301 to 303. [ In this case, the effective light source distribution is a small sigma illumination in which the light intensity distribution is concentrated at the center.

P2 and P3 are combinations in which the optical part 311 and the optical part 313 are used in combination in the optical systems 301 to 303 and the effective optical circular form is medium σ. Since the light intensity at the center and the periphery can be changed by the number of combinations of the optical portion 311 and the optical portion 313, the optimum combination can be selected by the pattern of the mask. P4 is a case in which the optical portion 311 is disposed in all of the optical systems 301 to 303. [ In this case, the effective light source distribution shape is medium sigma.

P5 is a case where the optical portion 312 is disposed in all of the optical systems 301 to 303. [ In this case, the effective light source distribution shape becomes annular.

P6 is a combination of the optical systems 301 and 303 combined with the optical units 312 and 314, and the effective light source distribution shape becomes a sigma. P7 is a combination of the optical systems 301 to 303 combined with the optical units 311 and 312, and the effective light source distribution shape is a σ. Since the light intensity at the center and the periphery of the sigma can be changed by the combination of the optical portions, the optimum combination can be selected by the pattern of the mask. P8 is a case where the optical portion 314 is used in all the optical systems 301 to 303. [ At this time, the effective light source distribution is flat. The σ diaphragms to be used when P1 to P8 are shown in Table 1.

However, depending on the number of light sources, the number of optical paths to be combined in the combining optical system 500, and the number of optical sections, various effective light source distributions can be produced in addition to the eight patterns . Strictly speaking, even if the optical units of the same type are used for the respective optical systems 301 to 303, the contribution to the effective light source distribution, which is completed as a result of passing through the combining optical system 500, is not the same.

For example, as in the case of P6, P6 ', and P6' in Table 2, the optical unit used in the optical systems 301 to 303 has two optical units 312 and one optical unit 314, The effective light source distribution is not completely equal.

Therefore, if the number of optical paths (optical system 301, etc.) is N and the number of kinds of optical parts (number) is M, the effective light source distribution of a pattern of M ^N can theoretically be formed.

As described above, according to this embodiment, it is possible to reduce the loss of the illumination light, and to form various effective light source distributions such as a large circle, a circle, and the like.

[Second Embodiment]

Next, the exposure apparatus 200 according to the second embodiment will be described. 8 is a view showing the exposure apparatus 200 according to the second embodiment. The description of the parts already described in the first embodiment will be omitted.

And illuminates a mask M serving as a disk disposed on an illuminated plane ILP of the illumination optical system 100. [ The pattern drawn on the mask M is transferred by forming a part of the illumination light on the substrate P via the projection optical system PO.

In the exposure apparatus 200, a plurality of light intensity sensors are disposed. An angle sensor JS (metrology section) for measuring the incident angle distribution (light intensity distribution) of the illumination light incident on the mask M is disposed near the mask M at first. The angle sensor JS is constituted by a pin hole 351 and a CCD camera 352 (light receiving element) as shown in Fig. The pinhole 351 is disposed in the vicinity of the mask M and the CCD camera 352 is disposed at a position sufficiently distant from the pinhole. Light having passed through the pinhole 351 is detected at a different position of the CCD camera 352 corresponding to the incident angle. Therefore, the incident angle characteristic of the light incident on the mask M can be determined by analyzing the pixel value (light intensity) of the image acquired by the CCD camera 352 by the control unit of the exposure apparatus or by an external computer.

At least one of the plurality of light sources 101a, 101b, and 101c is arranged at a position corresponding to an input of the input light source 101a, 101b, and 101c in order to obtain a desired effective light source distribution based on the incident angle characteristics of the illumination light obtained by the angle sensor JS disposed in the exposure apparatus 200. [ And a control unit (adjustment unit) for adjusting the voltage. That is, there is a first adjusting section for adjusting the first light intensity distribution formed on the incident surface of the optical integrator 109 by the first optical system 301 using the light from the first light source section 101a. In addition to the first adjusting section, a second adjusting section for adjusting the second light intensity distribution formed on the incident surface of the optical integrator 109 by the second optical system 302 using the light from the second light source section 101b, . Since the effective light source distribution is the sum of the light intensity distributions of the respective light sources, the effective light source distribution can be finely adjusted by changing the light intensity from each light path by adjusting the input voltage of each light source.

In addition, as a means for changing the intensity distribution (first light intensity distribution or second light intensity distribution) of light from each optical path, there is an adjustment section for finely adjusting the position of the light source or the position of the optical element in each optical path. For example, a plurality of images obtained by the angle sensor JS are analyzed when the position of the light source or the position of the optical element in each optical path is moved, and based on the difference of the pixel values of the plurality of images, The position of the light source or the position of the optical element in each optical path may be determined.

Although not shown in Fig. 8, the intensity distribution of the light from each optical path can be changed by placing the light-sensitive filter in and out of the light path from each light source. In this case, for example, the dimming filter may be moved in or out of the vicinity of the optical system 105.

In the exposure apparatus 200 of the present embodiment, the angle sensor JS is arranged in the vicinity of the substrate P in addition to the vicinity of the mask M. However, since the vicinity of the mask M and the vicinity of the substrate P are mutually optically conjugate with each other, an angle sensor JS may be disposed at at least one of them.

In the vicinity of the substrate P, an illuminance distribution sensor 304 for measuring the illuminance (light intensity) in an arcuate exposure area of the substrate P is disposed. The illuminance distribution sensor 304 is constituted by a slit 303, an optical system 306 by a lens or a mirror, and a sensor 305, as shown in Fig. The slit 303 is scanned (moved) with respect to the exposure area 401 of the light image formed on the substrate P, as shown in Fig. At this time, only the light focused on the opening 306 (white) of the slit 303 among the light forming the exposure area 401 enters into the illuminance distribution sensor 304. The light incident into the illuminance distribution sensor 304 is guided to the sensor 305 through the optical system 306. The energy of light reaching the sensor 305 is read while the slit 303 is scanned in the X-axis direction shown in Fig. 10, whereby the integrated illumination intensity for each X position in the exposure area 401 is measured. This makes it possible to calculate the integrated roughness unevenness on the substrate P. [

When the effective light source distribution is changed in the first embodiment or the second embodiment, there is a possibility of causing irregularity of illumination at the optical surface and the surface to be illuminated or the optical surface. Therefore, the slit mechanism 182 (adjusting mechanism) can be used instead of the slit 111 in the illumination optical system 100. [ By controlling the opening width of the slit mechanism 181 based on the measurement result by the illuminance distribution sensor 304, it is possible to reduce unevenness in illumination. For example, it is assumed that the roughness unevenness as shown in FIG. 12 (A) is measured by the roughness distribution sensor 304. In this case, the width in the opening y direction of the slit mechanism 182 in the portion where the illuminance is decreased (the position in the x direction) is locally widened and the width of the slit mechanism 182 in the illuminated portion The width in the opening y direction is locally narrowed. Thereby, the illuminance distribution can be made uniform as shown in Fig. 12 (B).

11 shows a configuration example of the slit mechanism 182. As shown in Fig. The slit mechanism 182 has first light shielding plates 175 and 176 that form openings 172 that define the shape of the illumination area on the illuminated surface. The light shielding member 175 is a member that defines the position of the boundary on the upstream side of the opening 172 in the Y direction. The light shielding member 176 is a member that defines the boundary between the openings 172 in the X direction.

The slit mechanism 181 also has an adjustment unit 53 for adjusting the position of the first light shield plate 175 in the Y direction so as to change the illumination area on the surface to be illuminated. The position adjusting section 53 includes an actuator. The position of the light blocking plate 175 in the Y direction is changed by the position adjusting unit 53 to change the position of the boundary on the upstream side in the Y direction in the illumination area.

The opening 172 is, for example, an arc-shaped slit through which light passes. The adjustment section 91 includes a first adjustment section 53 for adjusting the position of the first light blocking plate 171 in the Y direction (first direction), a second adjustment section 53 for adjusting the shape of the opening section 172 in the Y direction 2 < / RTI > The first adjustment unit 53 is connected to the control unit, and the operation of the first adjustment unit 53 can be controlled by the control unit.

A second light blocking plate 170 is formed at one end of the opening 172, which has an arcuate shape. The second light blocking portion 170 is a member for changing the shape of the boundary on the downstream side in the Y direction in the illumination area. The second light shielding plate 170 is provided with a second adjusting portion 173 (an inverting portion) for pushing or pulling each position of the second light shielding plate 170 in the X direction (second direction) in the Y direction. The second adjusting unit 173 may be a plurality of actuators. These plurality of actuators are connected to the control unit through the wiring 174, respectively. Thereby, each of the plurality of actuators is driven under the control of the control section 50, respectively. By changing the shape of the end portion of the second light blocking plate 170 by driving the actuator of the second adjusting portion 173, the shape of the boundary on the downstream side in the Y direction in the illumination region is changed. The second light blocking plate 170 may be arranged so as to change the shape of the boundary on the upstream side in the Y direction in the illumination area.

The control unit of the exposure apparatus 200 may have a setting unit for setting the angle distribution of the light illuminating the mask. In this case, the setting section sets the effective light source distribution desired to be used by the user or the effective light source distribution to be changed, and changes the first optical intensity distribution or the second optical system based on the angular distribution set by the setting section .

[Third embodiment]

(Article manufacturing method)

Next, a manufacturing method of an article (a semiconductor IC element, a liquid crystal display element, a color filter, a MEMS or the like) using the above exposure apparatus will be described. The article includes a step of exposing a substrate (a wafer, a glass substrate or the like) coated with a photosensitizer, a step of developing the substrate (photosensitive agent), and a step of developing the developed substrate in another known processing step . Other well-known processes include etching, resist stripping, dicing, bonding, packaging, and the like. According to the present manufacturing method, an article advantageous from at least one of performance, quality, productivity, and production cost of an article can be manufactured compared with the conventional method.

While the present invention has been described with reference to exemplary embodiments, it should be understood that the invention is not limited to the disclosed exemplary embodiments. The scope of the following claims should be accorded the broadest interpretation, including all such modifications and equivalent structural examples and functional examples.

Claims (16)

An illumination optical system for illuminating an object,
A first optical system for shaping a light flux from a light source,
A second optical system for shaping the light flux from the light source,
An optical integrator,
And an optical system for guiding the light flux from the first optical system and the light flux from the second optical system to the incident surface of the optical integrator,
The first optical system has an optical member which changes the first light intensity distribution formed on the incident surface of the optical integrator by the first optical system,
The second optical system has an optical member that changes the second light intensity distribution formed on the incident surface of the optical integrator by the second optical system,
The first light intensity distribution and the second light intensity distribution are made different from each other by the first optical system and the second optical system to form a light intensity distribution on the incident surface of the optical integrator, And illuminates the object with light from the grating. 2. The optical integrator according to claim 1, wherein the optical member of the first optical system has a first optical portion and a light intensity distribution different from a light intensity distribution formed on the incident surface of the optical integrator by the first optical portion, And a second optical portion formed on the surface,
Wherein the first optical system changes the first light intensity distribution by switching between the first optical portion and the second optical portion and arranging the first optical portion and the second optical portion in the optical path. The illumination optical system according to claim 2, wherein the first optical portion is an imaging optical system, and the second optical portion is an optical system including a prism. The illumination optical system according to claim 2, wherein the first optical portion is an imaging optical system, and the second optical portion is an optical rod. The optical element according to claim 3, wherein the optical member of the first optical system is different from the light intensity distribution formed on the incident surface by the optical system including the prism, and the light intensity distribution formed on the incident surface by the imaging optical system And an optical rod for forming a light intensity distribution on the incident surface. 3. The optical detector according to claim 2, wherein the optical member of the second optical system includes a first optical portion and a second optical portion that are different from each light intensity distribution formed on the incident surface of the optical integrator by the first optical portion and the second optical portion of the first optical system And a third optical section that forms an intensity distribution on the incident surface. 2. The optical integrator according to claim 1, wherein the optical member of the second optical system has a third optical portion and a light intensity distribution different from a light intensity distribution formed on the incident surface of the optical integrator by the third optical portion, And a fourth optical portion formed on the surface,
Wherein the second optical system changes the second light intensity distribution by switching the third optical section and the fourth optical section and arranging them in the optical path. The optical system according to claim 1, wherein the first optical system forms a light flux from the first light source,
And the second optical system shapes the light flux from the second light source. The optical system according to claim 8, further comprising a third optical system for shaping the light flux from the third light source,
The third optical system has an optical member that changes the third light intensity distribution formed on the incident surface of the optical integrator by the third optical system,
Wherein the optical system for guiding the light flux from the first optical system and the light flux from the second optical system to the incident surface of the optical integrator includes a light flux from the first optical system, a light flux from the second optical system, To the incident surface of the optical integrator. The illumination optical system according to claim 1, further comprising a first adjustment section for adjusting the first light intensity distribution. The illumination optical system according to claim 1, further comprising a second adjustment section for adjusting the second light intensity distribution. The apparatus according to claim 10, further comprising: a measuring section for measuring an angular distribution of light illuminating the object,
Wherein the first adjustment unit adjusts the first light intensity distribution based on the angular distribution measured by the measurement unit. 11. The image pickup apparatus according to claim 10, wherein the first adjustment unit adjusts the first light intensity distribution by adjusting the input voltage of the first light source, adjusting the position of the first optical system, or arranging the neutral density filter The illumination optical system. An exposure apparatus for exposing a substrate,
An illumination optical system for illuminating a mask as an object according to claim 1;
And a projection optical system for projecting the pattern of the mask onto a substrate. The apparatus according to claim 14, further comprising: a setting unit for setting an angle distribution of light illuminating the mask,
And changes the first optical intensity distribution or the second optical system based on the angular distribution set by the setting unit. A method of manufacturing an article,
An exposure optical system for illuminating the mask; a step of exposing the substrate using a projection optical system for projecting the pattern of the mask onto the substrate;
And a step of developing the exposed substrate,
Producing an article from the developed substrate,
The illumination optical system includes:
A first optical system for shaping a light flux from a light source,
A second optical system for shaping the light flux from the light source,
An optical integrator,
And an optical system for guiding the light flux from the first optical system and the light flux from the second optical system to the incident surface of the optical integrator,
The first optical system has an optical member which changes the first light intensity distribution formed on the incident surface of the optical integrator by the first optical system,
The second optical system has an optical member that changes the second light intensity distribution formed on the incident surface of the optical integrator by the second optical system,
The first light intensity distribution and the second light intensity distribution are made different from each other by the first optical system and the second optical system to form a light intensity distribution on the incident surface of the optical integrator, And the mask is illuminated with light from the grater.

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