CN109297987A - High reflective mirror surface scattering multi-parameter distribution characterization measuring device and measuring method - Google Patents
High reflective mirror surface scattering multi-parameter distribution characterization measuring device and measuring method Download PDFInfo
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- 238000012512 characterization method Methods 0.000 title claims abstract description 13
- 238000000034 method Methods 0.000 title claims abstract description 13
- 230000007547 defect Effects 0.000 claims abstract description 54
- 239000004065 semiconductor Substances 0.000 claims abstract description 23
- 238000003384 imaging method Methods 0.000 claims abstract description 19
- 238000005259 measurement Methods 0.000 claims abstract description 19
- 238000001514 detection method Methods 0.000 claims description 29
- 230000003287 optical effect Effects 0.000 claims description 14
- 238000007493 shaping process Methods 0.000 claims description 5
- 238000012360 testing method Methods 0.000 claims description 5
- 238000005070 sampling Methods 0.000 claims description 3
- 230000003796 beauty Effects 0.000 description 5
- 239000007787 solid Substances 0.000 description 3
- 238000000149 argon plasma sintering Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000012634 optical imaging Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N2021/0106—General arrangement of respective parts
- G01N2021/0112—Apparatus in one mechanical, optical or electronic block
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N2021/4704—Angular selective
- G01N2021/4707—Forward scatter; Low angle scatter
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N2021/4704—Angular selective
- G01N2021/4709—Backscatter
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N2021/4735—Solid samples, e.g. paper, glass
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N2021/9511—Optical elements other than lenses, e.g. mirrors
Abstract
The present invention relates to a kind of high reflective mirror surface scattering multi-parameters to be distributed characterization measuring device and measuring method, the device is made of semiconductor laser, CCD imaging system, two integral scattered power measurement components and light trap, the CCD imaging system includes CCD camera and microlens, it is disposed with light beam switching rotating cylinder in the laser beam input path and measures component backwards to integral scattered power, measures component to integral scattered power before being provided on reflected light path.Measuring device and measuring method of the invention, overcome the problems, such as the prior art cannot detect simultaneously laser gyro high reflection mirror defect and defect region caused by backscattering rate and forward transitivity.
Description
Technical field:
The invention belongs to optical instrument detection technique fields, and in particular to a kind of high reflective mirror surface scattering multi-parameter distribution characterization survey
Measure device and measurement method.
Background technique:
When the input speed of laser gyro is lower than a certain threshold value, suitable, the anticlockwise light beam in gyro can generate synchronization
Phenomenon, i.e. latch up effect, the working region lower than this threshold value are known as locking area.Usually directions other other than chief ray glazing
It propagates and is known as light scattering, backscattering refers to the scattering light in inverse chief ray direction, and directly measurement is highly difficult to it.Laser top
The defect of high reflective mirror in the ring resonator of spiral shell will lead in gyro optical path backwards to and forward light scattering phenomenon.Due to resonance
The scattering of chamber, transmission, the presence of diffraction light, especially back-scattering light and forward scattering light are easier to be coupled to and propagate along inverse two beams
Working beam in increase laser gyro lock area, to reduce the measurement sensitivity of laser gyro.
At present for precison optical component beauty defects, especially for optical imaging lens flaw inspection have it is more mature
Detection method and instrument, but for laser gyro high reflection mirror, due to playing the role of when its work along inverse two-beam, backwards
Scattering light is to cause the main reason for locking area, is overlapped with incident light axis or locks area to gyro close to the scattering light of incident light axis
The influence of size becomes apparent from, and since the reflectivity of laser gyro high reflection mirror is up to 99.99% or more, defect is having a size of micron
Magnitude, scattering caused by defect is very faint, and back-scattering light therein and forward scattering light are just fainter, at present also
None of these methods can detect simultaneously laser gyro high reflection mirror defect and defect region caused by backscattering rate and forward direction
Scattered power, the equipment that also laser gyro defect, backscattering rate and forward transitivity can not characterized simultaneously.
Summary of the invention
The present invention will provide a kind of high reflective mirror surface scattering multi-parameter distribution characterization measuring device and measuring method, to overcome
The prior art cannot detect simultaneously laser gyro high reflection mirror defect and defect region caused by backscattering rate and forward direction dissipate
The problem of penetrating rate.
In order to reach the purpose of the present invention, present invention provide the technical scheme that
A kind of high reflective mirror surface scattering multi-parameter distribution characterization measuring device, by semiconductor laser, CCD imaging system, two
Integral scattered power measures component and light trap is constituted, and the CCD imaging system includes CCD camera and microlens, the laser
It is disposed with light beam switching rotating cylinder in light beam input path and measures component backwards to integral scattered power, is provided on reflected light path
Forward direction integral scattered power measures component.
The method that high reflective mirror surface scattering multi-parameter distribution characterization measuring device is detected, comprising the following steps:
When a) detecting, two integral scattered power measurement components are first shut off, by the measured surface court of laser gyro high reflective mirror to be checked
On be placed on sample stage, semiconductor laser issues steady power optical beam, adjusts laser, is radiated at its emergent light spot and to be checked swashs
On optical circulator high reflective mirror measured surface；
If b) measured surface of testing laser gyro high reflective mirror is there are defect, when laser light incident is to defect, scattering light passes through micro-
Camera lens (4) enters in CCD camera (3), and the defect image of CCD camera imaging presents bright under dark field environment on computers
Picture；
C) position of the mobile laser gyro high reflective mirror of sample stage is controlled by computer, to set path mobile example, is completed each
The sampling in sub-aperture region handles the collected defect image of CCD camera by computer, completes the son in each direction
Aperture splicing obtains the two-dimensional signal of defect；Simultaneously to selected defect zone location.
D) the driving electric signal for switching semiconductor laser makes semiconductor laser issue modulation light beam, opens two products
Divide scattered power to measure component, detect selection area, acquires the back-scattering light of selection area and the light intensity of forward scattering light respectively.
Further, whole to adjust the light beam before semiconductor laser according to the size of detection defect in the step a)
Shape component is directed to the detection of different size of defect by changing laser beam spot diameter, to obtain optimal result.
Compared with prior art, the beneficial effects of the present invention are:
1) apparatus of the present invention light beam is adaptable, can be incident on sample by the angle that laser gyro works, such as square laser
Gyro can by 45 ° of incidences, triangle laser gyro can by 30 ° of angle incidences, more meet in this way under actual service conditions to defect
The measurement request of parameter.
2) in the present apparatus semiconductor laser utilize laser modulation technique, make semiconductor laser can get modulation light beam and
Steady power optical beam, detection when steady power optical beam works for CCD to defect, modulation light beam measure component for integral scattered power
To the detection of defect backscattering rate and forward transitivity when work.
3) beam shaping component is set before semiconductor laser in the present apparatus, and the hot spot that can adjust outgoing laser beams is straight
Diameter can realize more accurate measurement to the defect of selection area.
4) imaging system of the invention belongs to the bright picture of dark field, and being absorbed using light trap to reflected light can be to avoid reflection
Light in measured zone caused by influence.And can detect simultaneously beauty defects and laser gyro high reflective mirror backscattering rate and before
To scattered power, keeps detection efficient, improve the assembling quality of laser gyro.
5) it is applicable not only to the detection and assembly of laser gyro reflecting optics, is also applied for other similar super-smooth surfaces
Scatter multi-parameter detection.
6) in detection method provided by the invention, integrating sphere uses Detection of Weak Signals theory when working, and is dissipated using integral
When penetrating rate measurement component detection, faint light can be extracted using Theory of correlation detection from strong noise background using modulation light beam
Strong signal, and back-scattering light and the energy of forward scattering are faint, measuring component by integral scattered power can detecte backwards to scattered
The energy size of light and forward scattering is penetrated, the back-scattering light of detection and the energy of forward scattering are smaller, the resonant cavity of gyro
Be lost it is smaller, lock area it is smaller, the resolution ratio of gyro is higher.It can instruct the use and high reflection mirror processing work of high reflection mirror
The improvement of the improvement of skill, assurance and manufacturing process to high reflection mirror quality has important value.
Detailed description of the invention
Fig. 1 is schematic structural view of the invention
Appended drawing reference are as follows: 1- laser, 2- light beam switch rotating cylinder, and 3-CCD camera, 4- microlens, 5- is backwards to integral scattered power
Component is measured, measures component, 7- light trap, 8- detector to integral scattered power before 6-.
Specific embodiment
The present invention is described in detail below in conjunction with drawings and examples.
The present invention combines the detection of existing optical element surface defect and laser gyro backscattering rate, devises a kind of energy
Detection laser gyro high reflective mirror beauty defects and simultaneously can backscattering rate to selection area and forward transitivity detect
Device.
Referring to Fig.1, a kind of high reflective mirror surface scattering multi-parameter distribution characterization measuring device, by semiconductor laser 1, CCD
Imaging system, two integral scattered power measurement components and light trap 7 are constituted, and the CCD imaging system includes CCD camera 3 and shows
Micro lens 4 is disposed with light beam switching rotating cylinder 2 in the laser beam input path and measures component backwards to integral scattered power
5, component 6 is measured to integral scattered power before being provided on reflected light path.
Two groups of integral scattered power components are separately positioned on laser beam input path and reflected light path in the present apparatus, described
Integral scattered power component include detector 8 on integrating sphere and integrating sphere exit portal, wherein backwards to integral scattered power measurement group
Part collects the scattering light centered on incident light in certain solid angle with integrating sphere come approximate characterization back-scattering light；Forward direction integral
Scattered power measure component with integrating sphere collect scattering light centered on reflected light in certain solid angle come before approximate characterization to scattered
Penetrate light.Apparatus of the present invention utilize modulation technique, realize that the output to light is modulated by changing driving current, obtain modulation light respectively
Two kinds of light sources of beam and steady power optical beam are adjusted further through in laser emitting mouth installation beam shaping component according to defect to be measured
Launching spot diameter.Steady power optical beam cooperates the CCD imaging system vertical with sample for the micro- dark field of high reflection mirror
The illumination of imaging is scattered, CCD imaging system mainly realizes the Two dimensional Distribution detection of defect, and modulation light beam cooperation is backwards to integral scattering
Rate measurement component and forward direction integral scattered power measurement component respectively detect back-scattering light and forward scattering light.
The testing principle of the device is that laser gyro high reflective mirror beauty defects is detected by CCD microscopic scattering imaging system
Two-dimensional signal, by the energy for detecting backscattering and forward scattering to the integral scattering measuring system in aperture solid angle
Size can adjust incident beam by beam shaping component preferably to obtain defect information for selected defect region.
The present apparatus uses semiconductor laser, real by the driving current for changing semiconductor laser using modulation technique
Now the output of light is modulated, to obtain steady power optical beam and modulation light beam, preferably applied to CCD imaging system and integrating sphere
Environment is detected, the accuracy of detection is improved.The energy of backscattering or forward scattering light is faint, uses integral scattered power measurement group
When part detects, faint light intensity signal can be extracted using Theory of correlation detection from strong noise background using modulation light beam,
Measuring component by integral scattered power can detecte the backscattering and forward scattering light energy size of defect, and then calculate back
To scattered power and forward transitivity.
When detection, it is first shut off integral scattered power measurement component, semiconductor laser issues steady power laser, through defect table
Face reflection, is finally absorbed by light trap, and the detection of beauty defects is carried out using CCD imaging system, cooperates translation, the rotation of sample
The distribution of defect is determined, to position selected measured zone；Then modulation is issued using electric signal control semiconductor laser to swash
Light reuses integral scattered power measurement component and detects to selected measured zone, detects the region back-scattering light and forward direction respectively
Scatter the energy size of light.Can accurate detection go out the multi-parameter information of defect, instruct the assembly of laser gyro high reflective mirror,
Selecting small defect, back-scattering light and the weak region of forward scattering light is working region.
Detection method provided by the invention based on above-mentioned laser gyro high reflective mirror surface scattering detection device, specifically includes
Following steps:
A) two integral scattered power measurement components are first shut off, the measured surface of laser gyro high reflective mirror to be checked is placed in sample upward
In sample platform, semiconductor laser issues steady power optical beam, so that its emergent light spot is radiated at laser gyro high reflective mirror to be checked and is tested table
On face；
If b) measured surface of testing laser gyro high reflective mirror is there are defect, when laser light incident is to defect, scattering light passes through micro-
Mirror enters in CCD camera 3, and the bright picture under dark field environment is presented in the defect image that CCD imaging system obtains on computers；
C) it is completed with the path mobile example of setting the position that the mobile laser gyro high reflective mirror of sample stage is controlled by computer
The sampling in each sub-aperture region handles the collected defect image of CCD imaging system by computer, completes each side
To sub-aperture stitching, obtain the two-dimensional signal of defect；Simultaneously to selected defect zone location, convenient for subsequent to selected area
Domain carry out backwards to and forward direction integral scattering light measurement；
D) the driving electric signal for switching semiconductor laser makes semiconductor laser issue modulation light beam, opens integral scattered power
Component is measured, selected region is detected, because using Detection of Weak Signals theory when integrating sphere work, selection area can be acquired respectively
Backscattering and forward scattering energy information.
E) comprehensive analysis, the testing result of comparison all directions, pick out small all directions defect and backscattering and forward direction dissipate
It penetrates small region to be marked, instructs the assembly of laser gyro.
Here the beam shaping component before semiconductor laser can be adjusted according to the size of detection defect, and (light beam switching turns
2) cylinder, is directed to the detection of various sizes of defect by changing laser beam spot diameter, to obtain optimal result.
The above-described embodiments merely illustrate the principles and effects of the present invention, and the embodiment that part uses, for
For those skilled in the art, without departing from the concept of the premise of the invention, can also make it is several deformation and
It improves, these are all within the scope of protection of the present invention.
Claims (3)
1. a kind of high reflective mirror surface scattering multi-parameter distribution characterization measuring device, it is characterised in that: by semiconductor laser (1),
CCD imaging system, two integral scattered power measurement components and light trap (7) are constituted, and the CCD imaging system includes CCD camera
(3) and microlens (4) it, is disposed with light beam switching rotating cylinder (2) in the laser beam input path and is dissipated backwards to integrating
Rate measurement component (5) is penetrated, measures component (6) to integral scattered power before being provided on reflected light path.
2. the method that high reflective mirror surface scattering multi-parameter distribution characterization measuring device according to claim 1 is detected,
It is characterized by comprising following steps
When a) detecting, two integral scattered power measurement components are first shut off, by the measured surface court of laser gyro high reflective mirror to be checked
On be placed on sample stage, semiconductor laser issues steady power optical beam, adjusts laser, is radiated at its emergent light spot and to be checked swashs
On optical circulator high reflective mirror measured surface；
If b) measured surface of testing laser gyro high reflective mirror is there are defect, when laser light incident is to defect, scattering light passes through micro-
Camera lens (4) enters in CCD camera (3), and the defect image of CCD camera (3) imaging is presented on computers under dark field environment
Bright picture；
C) position of the mobile laser gyro high reflective mirror of sample stage is controlled by computer, to set path mobile example, is completed each
The sampling in sub-aperture region handles the collected defect image of CCD camera (3) by computer, completes each direction
Sub-aperture stitching, obtain the two-dimensional signal of defect；Simultaneously to selected defect zone location；
D) the driving electric signal for switching semiconductor laser makes semiconductor laser (1) to issue modulation light beam, opens two integrals
Scattered power measures component, detects selection area, acquires the back-scattering light of selection area and the light intensity of forward scattering light respectively.
3. the method that high reflective mirror surface scattering multi-parameter distribution characterization measuring device according to claim 2 is detected,
It is characterized by: adjusting the beam shaping group before semiconductor laser (1) according to the size of detection defect in the step a)
Part is directed to the detection of different size of defect by changing laser beam spot diameter, to obtain optimal result.
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Cited By (1)
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