CN109270615A - The preparation system and preparation method of optical grating construction - Google Patents
The preparation system and preparation method of optical grating construction Download PDFInfo
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- CN109270615A CN109270615A CN201811393152.7A CN201811393152A CN109270615A CN 109270615 A CN109270615 A CN 109270615A CN 201811393152 A CN201811393152 A CN 201811393152A CN 109270615 A CN109270615 A CN 109270615A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
Abstract
Present disclose provides a kind of preparation system of optical grating construction and preparation methods, belong to grating technology field.The optical grating construction includes multiple mutually isolated grating regions in substrate, and the preparation system of optical grating construction includes laser aid, light path system and sample stage, wherein laser aid is for providing laser beam；Light path system is used to the laser beam being divided at least two beam coherent beams, and controls each coherent beam and interfere in target area；Sample stage is for fixing and moving the substrate, so that each grating region of the substrate, which is successively in the target area according to preset path and exposes, forms grating.The preparation system and preparation method of the optical grating construction can fast and accurately prepare optical grating construction.
Description
Technical field
This disclosure relates to the preparation system and preparation method of grating technology field more particularly to a kind of optical grating construction.
Background technique
Optical grating element is a kind of important optical element, is widely used in spectroscopy, metering, optic communication and information processing etc.
Field.
Grating is processed at present according to the requirement of machining accuracy and substrate etc., and the methods of electron-beam direct writing, uv-exposure are divided into.
However, existing method is complex, it is difficult to quickly and accurately be respectively formed different gratings in the different zones of same substrate.
For example, although electron-beam direct writing can be in the structure of silicon chip realization nanoscale arbitrary shape, when grating is processed
Between it is long, processing charges is high, leads to processing cost height.
Above- mentioned information disclosed in the background technology part are only used for reinforcing the understanding to the background of the disclosure, therefore it can
To include the information not constituted to the prior art known to persons of ordinary skill in the art.
Summary of the invention
The preparation system and preparation method for being designed to provide a kind of optical grating construction of the disclosure, so as to fast and accurately
Prepare optical grating construction.
For achieving the above object, the disclosure adopts the following technical scheme that
According to the first aspect of the disclosure, a kind of preparation system of optical grating construction is provided, the optical grating construction includes base
Multiple mutually isolated grating regions on bottom；The preparation system of the optical grating construction includes:
Laser aid, for providing laser beam；
Light path system for the laser beam to be divided at least two beam coherent beams, and controls each coherent beam and exists
Target area interference；
Sample stage, for fixing and moving the substrate, so that each grating region of the substrate is according to default
Path, which is successively in the target area and exposes, forms grating.
In a kind of exemplary embodiment of the disclosure, the light path system includes:
Beam splitter, for the laser beam to be divided into the first coherent beam and the second coherent beam；
First reflecting mirror, for first coherent beam to be reflected towards the target area；
Second reflecting mirror, for second coherent beam to be reflected towards the target area；
First control mechanism, the angle for controlling the position of first reflecting mirror and with first associated beam,
And then first coherent beam is controlled in the incidence angle of the target area；
Second control mechanism, the angle for controlling the position of second reflecting mirror and with second associated beam,
And then second coherent beam is controlled in the incidence angle of the target area.
In a kind of exemplary embodiment of the disclosure, the sample stage includes:
Sample carrier, for fixing the substrate；
First translation mechanism is translated for controlling the sample carrier along first direction；
Second translation mechanism translates in a second direction for controlling first translation mechanism；
Rotating mechanism is rotated in Plane of rotation, the rotary flat for controlling second translation mechanism
Face is parallel to the first direction and the second direction.
According to the second aspect of the disclosure, a kind of preparation method of optical grating construction is provided, the optical grating construction includes base
Multiple mutually isolated grating regions on bottom；The preparation method of the optical grating construction includes:
A laser beam and the substrate are provided, the substrate includes multiple grating regions；
The laser beam is divided at least two beam coherent beams, and controls each coherent beam and interferes in target area；
Each grating region of control substrate, which is successively in target area according to preset path and exposes, forms grating.
In a kind of exemplary embodiment of the disclosure, the preparation method of the optical grating construction further include:
Light shield layer is formed in the substrate surface, the light shield layer includes multiple transmission regions, the transmission region and institute
Grating region one-to-one correspondence is stated, and the edge of any transmission region and the grating region being correspondingly arranged flushes.
In a kind of exemplary embodiment of the disclosure, the edge of each grating region is identical；
Each grating region of control substrate is successively in target area according to preset path and exposes and forms grating and include:
The mask plate of the substrate can be covered by providing one, and the mask plate includes the window region of a light transmission, the window
The edge of mouth region is flushed with the edge of the grating region；
The mask plate and the substrate relative motion are controlled, so that successively exposure is each according to preset order for the window region
A grating region；
When the exposure of any grating region, the mask plate and the substrate synchronizing moving are controlled, so that the institute of exposure
State grating region be moved to the target area and expose form grating.
In a kind of exemplary embodiment of the disclosure, the preparation method of the optical grating construction further include:
After upper one grating region forms grating, and next grating region is formed before grating, described in adjustment
The wavelength of laser beam.
In a kind of exemplary embodiment of the disclosure, the preparation method of the optical grating construction further include:
After upper one grating region forms grating, and next grating region is formed before grating, described in adjustment
Incidence angle of the coherent beam in the target area.
In a kind of exemplary embodiment of the disclosure, the preparation method of the optical grating construction further include:
After upper one grating region forms grating, and next grating region is formed before grating, described in rotation
Substrate, to adjust the direction in the period of the grating formed in next grating region.
In a kind of exemplary embodiment of the disclosure, the preparation method of the optical grating construction further include:
When one grating region is in the target area, grating region exposure back spin is turned at least once, and
The grating region is exposed after rotation every time.
The preparation system for the optical grating construction that the disclosure provides provides coherent beam by laser aid and light path system,
Coherent beam is interfered in grating region so that grating region exposes and formed grating, and the grating forming method is simple, quick.Not only
In this way, movement of the sample stage by control substrate, and then control grating region is moved to target area and is exposed, and avoids logical
Positioning of the optical path realization for changing coherent beam to exposure area is crossed, it is more accurate to the positioning of exposure area, rapid, it reduces
The time of grating preparation.
Detailed description of the invention
Its example embodiment is described in detail by referring to accompanying drawing, the above and other feature and advantage of the disclosure will become
It is more obvious.
Fig. 1 is the preparation method flow diagram of the optical grating construction of disclosure embodiment.
Fig. 2 is the grating schematic diagram of one embodiment of the disclosure.
Fig. 3 is the substrate of one embodiment of the disclosure and the stereoscopic schematic diagram of mask plate cooperation.
Fig. 4 is the substrate of one embodiment of the disclosure and the schematic diagram of mask plate cooperation.
Fig. 5 is the schematic diagram that a grating region exposes in one embodiment of the disclosure.
Fig. 6 is the schematic diagram of the optical grating construction of one embodiment of the disclosure.
Fig. 7 is the schematic diagram of the substrate provided in one embodiment of the disclosure.
Fig. 8 is the structural schematic diagram after grating region successively exposes in one embodiment of the disclosure.
Fig. 9 is the structural schematic diagram that light shield layer is formed on the substrate in one embodiment of the disclosure.
Figure 10 is the structural schematic diagram that light shield layer is formed on the substrate in another embodiment of the disclosure.
Figure 11 is the structural schematic diagram after grating region successively exposes in another embodiment of the disclosure.
Figure 12 is the circular hole micro-nano structure schematic diagram of two-dimensional grating in one embodiment of the disclosure.
Figure 13 is the cylindric micro-nano structure schematic diagram of two-dimensional grating in one embodiment of the disclosure.
Figure 14 is the oval micro-nano structure schematic diagram of two-dimensional grating in one embodiment of the disclosure.
Figure 15 is the enlarged diagram of the oval micro-nano structure of two-dimensional grating in one embodiment of the disclosure.
Figure 16 is the structural schematic diagram of the preparation system of optical grating construction in one embodiment of the disclosure.
Figure 17 is the structural schematic diagram of the preparation system of optical grating construction in another embodiment of the disclosure.
Figure 18 is the positive structure diagram of sample stage in one embodiment of the disclosure.
Figure 19 is the side structure schematic view of sample stage in one embodiment of the disclosure.
Main element description of symbols includes: in figure
11, laser；12, diaphragm；21, beam splitter；22, the first reflecting mirror；23, the second reflecting mirror；24, spatial frequency is filtered
Wave device；25, third reflecting mirror；3, sample stage；31, sample carrier；311, negative pressure hole；32, the first translation mechanism；33, the second translation
Mechanism；34, rotating mechanism；35, pedestal；4, substrate；41, grating region；42, photosensitive polymer；43, glass substrate；5, exposure mask
Plate；51, window region；6, light shield layer；61, transmission region；7, grating；71, grating fringe；8, target area；9, exposure area；A,
First direction；B, second direction.
Specific embodiment
Example embodiment is described more fully with reference to the drawings.However, example embodiment can be real in a variety of forms
It applies, and is not understood as limited to example set forth herein；On the contrary, these embodiments are provided so that the disclosure will more comprehensively and
Completely, and by the design of example embodiment comprehensively it is communicated to those skilled in the art.Described feature, structure or characteristic
It can be incorporated in any suitable manner in one or more embodiments.In the following description, many details are provided
Embodiment of the disclosure is fully understood to provide.
In the figure for clarity, may be exaggerated the thickness of region and layer.Identical appended drawing reference indicates identical in figure
Or similar structure, thus the detailed description that them will be omitted.
When certain structure is at other structures "upper", it is possible to refer to that certain structural integrity is formed in other structures, or refer to certain
Structure is " direct " to be arranged in other structures, or refers to that certain structure is arranged in other structures by the way that another structure is " indirect ".
Term "one", " one ", " described " to indicate there are one or more elements/component part/etc.；Term " packet
Include " and " having " to indicate the open meaning being included and refer to that the element/component part/in addition to listing waits it
Outside also may be present other element/component part/etc..Term " first " and " second " etc. are only used as label, are not to it
The quantity of object limits.
A kind of preparation method of optical grating construction is provided in disclosure embodiment, optical grating construction may include more in substrate
A mutually isolated grating region.As shown in figs. 1,7 and 8, the preparation method of optical grating construction includes:
S110 provides a laser beam and substrate 4, and wherein substrate 4 includes multiple grating regions 41；
Laser beam is divided at least two beam coherent beams by S120, and is controlled each coherent beam and interfered in target area 8；
Each grating region 41 of S130, control substrate 4 are successively in target area 8 according to preset path and expose to be formed
Grating.
The preparation method for the optical grating construction that the disclosure provides, the grating region of substrate 4 is made by the method for laser interference
41 exposures form grating, and method is simple and is easily achieved, and optical grating construction preparation cost and period can be effectively reduced.By controlling base
The movement at bottom 4, and then control grating region 41 is moved to target area and is exposed, and avoids the light by changing coherent beam
Positioning to exposure area 9 is realized on road, more accurate to the positioning of exposure area 9, rapid, reduce optical grating construction preparation when
Between.
Each component of the preparation method of the optical grating construction provided with reference to the accompanying drawing disclosure embodiment carries out detailed
Illustrate:
In step s 110, substrate 4 can be single layer structure or multilayered structure, and the material of each layer structure can be according to need
The type of optical grating construction to be prepared is selected.
For example, in one embodiment, as shown in fig. 7, substrate 4 can be a photosensitive glass.In this way, the substrate 4
Grating region 41 when being in target area, coherent beam forms interference array in grating region 41 or interference fringe is realized pair
The inner refractive index of the exposure of the grating region 41, photosensitive glass changes, and then forms Bragg grating.
It is understood that the embodiment provides only a kind of substrate 4 for forming Bragg grating, technical staff may be used also
To select other substrates 4.For example, can choose the glass substrate 43 coated with photosensitive polymer 42 or holographic material as substrate
4, photosensitive polymer 42 or holographic material form Bragg grating after exposure.
In another embodiment, as shown in Fig. 2, the glass substrate that substrate 4 can be coated with photosensitive polymer 42 for one
43.In this way, when the grating region 41 of the substrate 4 is in target area 8, coherent beam grating region 41 formed interference array or
Person's interference fringe realizes the exposure to the grating region 41.If photosensitive polymer 42 is photoresist, photoresist layer is after exposure
Common grating can be formed by development.
It is understood that being used to form 4 material of substrate of common grating has very much, it is above-mentioned to be coated with photosensitive polymer 42
Glass substrate 43 as just a kind of substrate 4 example.It is all can change under exposure surface smoothness or exposure after by
The material for handling and then changing surface smoothness, may be incorporated for substrate 4, this is not listed one by one in the disclosure.
It is understood that as shown in fig. 7, grating region 41 refers to being used to form the specific of grating 7 in substrate 4
Region does not mean that in the grating region 41 in substrate 4 and necessarily has existed grating 7.In provided substrate 4, grating region
Grating 7 can be not present in domain 41；Grating 7 in grating region 41 can be the preparation of the optical grating construction provided using the disclosure
What method was formed, in this way, the substrate 4 of prepared optical grating construction has grating 7 in grating region 41.
In step s 110, as shown in Figure 16 and Figure 17, laser beam can be as caused by a laser aid.The laser
Device may include a laser 1.
Formula (1) is the calculation formula of screen periods, wherein wherein Λ is screen periods, and λ is optical maser wavelength, and θ is incidence
Angular, n are the refractive index (air 1) of incident optical medium.According to formula (1) it is found that can by change optical maser wavelength come
Change the periods lambda of grating 7.
Λ=λ/(2*n*sin θ) (1)
Therefore, in one embodiment, in order to adapt to the demand that different gratings 7 are processed, preparation has different screen periods
Grating 7, improve laser 1 the scope of application, the laser 1 can be a Wavelength tunable laser 1, the wave of laser 1
Long tunable range is bigger, then it is bigger to the screen periods adjusting range of grating 7.
In another embodiment, the laser 1 that laser 1 can be adjustable for a power.In this way, tune can be passed through
The light intensity of the power adjustment coherent beam of laser 1 is saved, and then adjusts the light exposure of grating region 41, is realized to being formed by light
The adjustment of the duty ratio of grid 7.The power adjustable adjusting range of laser 1 is bigger, then the adjusting range of the duty ratio of grating 7 is bigger.
Of course, the power adjustment of laser 1 can adjust accordingly the time for exposure under conditions of identical light exposure, and then adjust
The manufacturing cycle of optical grating construction.
Laser aid can also include light barrier, and when not needing when substrate 4 is exposed, light barrier can stop laser
Beam；When needing to be exposed, light barrier is then removed from the optical path of laser beam, so that optical path is unimpeded, and then in target area
Form interference.Light barrier is by the control disconnection of laser beam optical path and unimpeded, and then the grating region 41 that can control substrate 4 exists
The time for exposure of target area, and then can control the light exposure of grating region 41, control is formed by the duty ratio of grating 7.
It is understood that light barrier can be not only used for the control time for exposure, can also have other function and purposes.
For example, when needing that laser beam is avoided to be irradiated in substrate 4, which can disconnect the optical path of laser beam, avoid phase
It the generation of dry light beam and is irradiated in substrate 4.
Laser aid can also include diaphragm 12, and diaphragm 12 is set between laser 1 and light path system, for realizing right
The modulation of laser beam.In this way, the shape constraining to laser beam may be implemented in diaphragm 12, the light beam with target shape is formed.It lifts
For example, in one embodiment, which can be an aperture 12, become one for further constraining laser beam
Round linear light source.In this way, being formed by grating 7 is the dotted grating 7 being linearly distributed.In another implementation method, the light
Door screen 12 can be a slit diaphragm 12, for becoming linear beam by slit constraint after expanding laser beam.In this way, in base
The bar shaped grating 7 (as shown in Figure 2) that 7 striped of grating is linearly distributed is formed on bottom 4.By changing the width of linear beam,
The adjustable width for being formed by bar shaped grating 7.Of course, in other embodiments, which can also be other
Structure, and then laser beam is constrained to other shapes.
Laser aid can also include beam expander, and the laser beam for issuing laser 1 expands.In this way, can prepare
Provide the grating 7 of the micro-nano structure of array distribution.For example, when being expanded laser beam for hot spot by beam expander, institute
The micro-nano structure of the grating 7 of formation is a conical structure or cylindrical structure.When by different 41 shapes of grating region
At different micro-nano structures grating 7 when, which becomes a holographic grating 7 on the whole.
In the step s 120, laser beam can be divided by least two beam coherent beams by a light path system, and controlled each
Coherent beam is interfered in target area.In this way, target area will after the grating region 41 of substrate 4 is set to target area
Exposure forms grating 7.
In one embodiment, as shown in figure 16, which may include a beam splitter 21, laser beam irradiate to point
The first coherent beam and the second coherent beam are divided into after beam device 21.The power of first coherent beam and the second coherent beam
It can be same or similar.Divided beams can for metal film constitute beam splitter 21, deielectric-coating constitute beam splitter 21 or other
Beam splitter 21, the disclosure do not do special restriction to this.
As shown in figure 16, which can also include the first reflecting mirror 22 and the second reflecting mirror 23, the first reflecting mirror
22 for being reflected towards target area for the first coherent beam；Second reflecting mirror 23 is used to the second coherent beam being reflected towards target area
Domain.In this way, the first coherent beam and the second coherent beam can interfere in target area, and then to positioned at target area
Interior grating region 41 is exposed.
The light path system can also include the first control mechanism and the second control mechanism, and the first control mechanism is for controlling the
The position of one reflecting mirror 22 and the angle of itself and the first coherent beam, and then the first coherent beam is controlled in the incidence of target area
Angle；Second control mechanism is used to control the position of the second reflecting mirror 23 and the angle of itself and the second coherent beam, and then control the
Incidence angle of two coherent beams in target area.
It could be aware that according to formula (1), when changing the incidence angle of coherent light, the adjustable light for being formed by grating 7
Grid cycle.Therefore the first reflecting mirror 22 and the second reflecting mirror can be changed by the first control mechanism and the second control mechanism respectively
23 angles and positions, so that the first coherent beam and the second coherent beam of reflection still can be irradiated to target area and enter
Firing angle degree changes, and then changes the screen periods of grating 7 while target area keeps interfering.
First reflecting mirror 22 and the second reflecting mirror 23 can use all especially low to the absorptivity and transmitance of incident light
Optical mirror especially can choose the planar wave reflecting mirror high to the wavelength reflection of tunable laser 1.First phase
The incidence angle in dry light beam and the second coherent beam homed on its target region can also be identical.
In another embodiment, as shown in figure 17, light path system may include a spatial filter 24 and third
Reflecting mirror 25, laser beam expand after spatial filter 24, and a part of the laser beam after expanding shines directly into mesh
Region is marked, another part is irradiated to target area after the reflection of third reflecting mirror 25, and then is formed and interfered in target area.It should
Light path system is suitable for processing transmission-type grating.
In step s 130, each grating region 41 for controlling substrate 4 is successively in target area simultaneously according to preset path
Exposure forms grating 7.Preset path can be set according to the positional relationship of each grating region 41, can also be according to each
The parameter of grating 7 to be formed is set in grating region 41, or is set using other modes.
It for example, in one embodiment, can be according to the positional relationship of each grating region 41, according to successively adjacent
Principle be arranged preset path.In this way, the preset path can be set to a circular path, straight line path, curved path or
Other paths.In another embodiment, each grating region 41 can be divided according to the parameter of grating 7 to be formed
Class, and after to complete to have the exposure of all grating regions 41 of same grating 7, it is carrying out with another grating 7
The exposure of all grating regions 41.
Substrate 4 can be realized fixed and mobile by the same sample platform 3.Sample stage 3 is for controlling and moving substrate 4, shape
Formula and structure can be multiplicity, such as can be precision displacement table etc..Technical staff can be according to grating region 41 in substrate 4
Distribution situation and the situation of preset path select suitable sample stage 3.
In one embodiment, as shown in Figure 18 and Figure 19, sample stage 3 may include sample carrier 31, the first translation mechanism
32, the second translation mechanism 33 and rotating mechanism 34, sample carrier 31 are used for anchoring base 4；First translation mechanism 32 is for controlling sample
Product support 31 is translated along first direction A；For controlling the first translation mechanism 32, B is translated second translation mechanism 33 in a second direction；Rotation
Rotation mechanism 34 is rotated in Plane of rotation for controlling the second translation mechanism 33, and Plane of rotation is parallel to first direction
A and second direction B.Appointed in the plane for being parallel to first direction A and second direction B in this way, can control sample carrier 31
Anticipate direction translation and rotate at any angle, and then the precisely position of substrate 4 and angle, guarantee grating region 41 can be according to
Preset path is exposed to target area.
In one embodiment, as shown in figure 18, first direction A and second direction B are mutually perpendicular to, and are realized with facilitating to sample
The accurate control of product support 31.
In one embodiment, as shown in figure 19, substrate 4 can tile and be fixed on sample carrier 31, in this way, substrate 4
Place plane is parallel to first direction A and second direction B.Target area can be located at the plane where substrate 4, in this way, first
Coherent beam and the second coherent beam can be exposed in the same side directive substrate 4 of substrate 4, the grating region 41 positioned at target area
Transmission-type grating can be formed after light.Negative pressure hole 311 can be set on sample carrier 31 and connect negative pressure device, when substrate 4 tiles
Negative pressure can be formed when on sample carrier 31, in negative pressure hole 311 and then substrate 4 is adsorbed on sample carrier 31.Of course, sample
Support 31 can also realize the fixation to substrate 4 by other means, such as can be using adherency, pressing, engaging mode.
In another embodiment, substrate 4 can be vertically installed in sample carrier 31, i.e. 4 place plane of substrate is perpendicular to rotation
Turn plane.Target area can be located at 4 place plane of substrate, and the first coherent beam and the second coherent beam can be in substrates 4
Two sides homed on its target region, in this way, be located at target area grating region 41 expose after can form reflective gratings.Sample
Clamping device etc. can be set in support 31, realized clamping and fixation to substrate 4.
As shown in figure 19, sample stage 3 can also include pedestal 35, and pedestal 35 can be used for fixed rotating mechanism 34, and bottom
Scale can be set on seat 35, for determining the rotation angle of rotating mechanism 34.
Sample stage 3 can also include third translation mechanism, and third translation mechanism can control rotating mechanism 34 along third party
To translation, and third direction is perpendicular to first direction A and second direction B.In this way, the sample stage 3 can have first direction A,
The displacement platform of second direction B and third direction etc. three different displacement dimensions and a rotation dimension, realizes the displacement to substrate 4
And pose adjustment.
Sample carrier 31 can be set according to actual needs using common easily precision machined material, size, and the disclosure is to sample
The material and size of product support 31 do not do particular determination.First translation mechanism 32, the second translation mechanism 33 and third translation mechanism can
With a variety of feasible translation mechanisms, such as the screw mechanism of Serve Motor Control can be used.Rotating mechanism 34 can also use
Servo motor or other feasible mechanisms.The disclosure is to the first translation mechanism 32, rotating mechanism 34, the second translation mechanism 33 and
The type and model of three translation mechanisms do not do special restriction.First translation mechanism 32, the second translation mechanism 33 and third translation
The required precision that the translation precision of mechanism can according to need the grating region 41 of preparation is determined.In one embodiment,
The translation precision of first translation mechanism 32, the second translation mechanism 33 and third translation mechanism can achieve micron dimension.
As shown in Fig. 7~11, the preparation method of optical grating construction can also include step S210, formed and hidden on 4 surface of substrate
Photosphere 6, light shield layer 6 include multiple transmission regions 61, and transmission region 61 and grating region 41 correspond, and any transmission region
61 and the edge of grating region 41 that is correspondingly arranged flush.In this way, light shield layer 6 can expose grating region 41, and cover grating
Other regions in substrate 4 other than region 41.In one embodiment, transmission region 61 can be cavity.
Light shield layer 6 can be to avoid the exposure in non-grating region 41, or blocks the non-grating region 41 of exposure, so that
Grating 7 is merely present in grating region 41, reaches the purpose for precisely limiting grating region 41.Moreover, the setting of light shield layer 6
The range of target area 8 is allowed to be greater than grating region 41, sample stage 3 only needs grating region 41 being moved to target area 8
In range, it is not necessary to which close alignment reduces the requirement for controlling sample stage 3 precision, can reduce equipment cost.Not only such as
This, due to target area 8 can be greater than grating region 41, need not stringent modulating lasering beam size, reduce to laser
The control accuracy requirement of device can reduce the cost and control difficulty of laser aid.
In one embodiment, as shown in Fig. 7, Figure 10 and Figure 11, advance that light shield layer 6 can be exposed in substrate 4
Row preparation.After step S110 provides substrate 4 (as shown in Figure 7), light shield layer 6 can be first formed in substrate 4 and is exposed
Grating region 41 (as shown in Figure 10) then executes step S130 (as shown in figure 11) again.
For example, one can be provided and be coated with the glass of photosensitive polymer 42 as substrate 4, or one photosensitive glass of offer
Glass is as substrate 4 (as shown in Figure 7)；Then, light shield layer 6 is formed in substrate 4, by photoetching process (photo) in light shield layer 6
Upper formation cavity, cavity expose grating region 41 (as shown in Figure 10).Then, substrate 4 is controlled, so that grating region 41 is successively
In target area 8, and grating region 41 exposes to form grating 7 (as shown in figure 11) at target area 8.In this way, substrate 4
Exposure area 9 is identical as grating region 41.When different grating regions 41 is in target area 8, thus it is possible to vary the wave of laser beam
Long and coherent beam incidence angle, so that the grating of different grating regions 41 has different screen periods.
In another embodiment, light shield layer 6 can execute after step s 130, i.e., when in each grating region 41 and its
After surrounding forms grating 7, light shield layer 6 is prepared in substrate 4 and exposes grating region 41.
For example, Fig. 6 is an optical grating construction for being used for dispersion, can realize white color by four Micro-LED
It dissipates.The optical grating construction includes four grating parts, and each grating part includes 10 linearly aligned grating regions 41, grating
The period in region 41 is 300 μm.In the preparation, an available photosensitive glass is as substrate 4 (as shown in Figure 7).Then, pass through
Linear laser beam is divided into the coherent beam of two bunch shapes, two coherent lights at threadiness, light path system by modulating lasering beam shape
Beam is interfered in target area 8.As shown in figure 8, control substrate 4, so that a grating region 41 is located in target area 8, substrate 4
Grating 7 is formed in exposure area 9, and grating region 41 is located in the exposure area 9.By the mobile substrate 4 of sample stage 3, so that
Next grating region 41 is located at target area 8 and exposes；So until all grating regions 41 expose and form grating 7.When
Different grating regions 41 are at target area 8, thus it is possible to vary the wavelength of laser beam and the incidence angle of coherent beam, so that
The grating of different grating regions 41 has different screen periods.As shown in figure 9, when all grating regions 41 expose shape
After grating 7, light shield layer 6 can be formed in substrate 4, light shield layer 6 covers substrate 4 and exposes grating region 41.Of course,
Holographic material of a layer thickness greater than 70 μm can also be coated on a substrate as substrate 4.
Light shield layer 6 can be obtained by patterning processes, perhaps obtain or use other schemes by masking process.It lifts
For example, in one embodiment, one layer of light screening material can be first formed in substrate 4, then forms one on light screening material
Photoresist layer.Then photoresist layer is exposed by masking process, is then developed, the pattern of mask plate is transferred to
On photoresist layer.After development, the position that photoresist layer corresponds to grating region 41 is removed and can expose light screening material, then
By the light screening material of etching removal exposure, grating region 41 is exposed.Finally, removal photoresist layer, obtains covering shading
The substrate 4 of layer 6.
If the edge of each grating region 41 is identical, step S130 may include step:
Step S131, as shown in Figure 3 and Figure 4, the mask plate 5 of substrate 4 can be covered by providing one, and mask plate 5 includes one
The edge of the window region 51 of light transmission, window region 51 can be flushed with the edge of grating region 41；
Step S132, as shown in figure 5, control mask plate 5 and 4 relative motion of substrate, so that window region 51 is suitable according to presetting
Sequence successively exposes each grating region 41；When the exposure of any grating region 41, control mask plate 5 and 4 synchronizing moving of substrate, so that
Exposed grating region 41, which is moved to target area 8 and exposes, forms grating 7.
In step S131, the window region 51 of mask plate 5 can be a cavity, can also be made of translucent material.Window
The shape in area 51 and the shape of grating region 41 match, therefore when window region 51 is aligned with a grating region 41, substrate 4
Exposure area 9 is strictly limited the grating region 41 in exposure.Therefore, the grating region that sample stage 3 only needs to expose every time
Domain 41 is moved to target area 8 and is exposed, and the size of target area 8 can be greater than the size of grating region 41, this drop
The control precision and control difficulty of low sample stage 3 and laser aid, can be reduced the preparation cost of optical grating construction.
Step S132 includes multiple unit operations repeated, and each unit operation includes two parts, it may be assumed that
Step S1321, control mask plate 5 and 4 relative motion of substrate, so that window region 51 is aligned with a grating region 41,
Expose the grating region 41；
Step S1322, control mask plate 5 and 4 synchronizing moving of substrate, so that the grating region 41 of exposure is moved to target area
Domain 8 and expose form grating 7.
It, can be by repeating operating unit as above, until in all formation of grating region 41 in step S132
Grating 7.
The preparation method of optical grating construction can also include: step S310, after a upper grating region 41 forms grating 7, and
Next grating region 41 is formed before grating 7, and the wavelength of laser beam is adjusted.In this way, a upper grating region 41 and next grating region
The period of grating 7 possessed by domain 41 can change, so that optical grating construction becomes holographic grating on the whole.
The preparation method of optical grating construction can also include: step S410, after a upper grating region 41 forms grating 7, and
Next grating region 41 is formed before grating 7, incidence angle of the adjustment coherent beam in target area 8.In this way, a upper grating region
41 can change with period of grating possessed by next grating region 41, so that optical grating construction becomes complete on the whole
Cease grating.
The preparation method of optical grating construction can also include: step S510, after a upper grating region 41 forms grating 7, and
Next grating region 41 is formed before grating 7, rotating substrate 4, to adjust the period of the grating formed in next grating region 41
Direction.In this way, the period direction of a upper grating region 41 and grating possessed by next grating region 41 can change,
So that optical grating construction becomes holographic grating on the whole.
The preparation method of optical grating construction can also include: step S610, will when a grating region 41 is in target area 8
Grating region 41 exposes back spin and turns at least once, and every time exposes grating region 41 after rotation.In this way, the grating region 41
It will be exposed at least twice with different space angles, and then form multidimensional grating.
For example, laser beam can be made to become hot spot by beam expander, and make laser beam in hot spot model as far as possible
It is uniformly distributed in enclosing.Substrate 4 can choose the substrate coated with photoresist, after grating region 41 exposes first time, by the light
Then gate region 41 carries out second of exposure in place plane internal rotation predetermined angle again, form the two dimension with micro-nano structure
Grating.The micro-nano structure of two-dimensional grating is related with the predetermined angle rotated.
In one embodiment, predetermined angle can be n*90 ° (n=1,3,5 ...), then grating region 41 can form two
Tie up the micro-nano structure of cylindric (as shown in figure 13) or circular hole (as shown in figure 12).When the photoresist used is photoetching negtive photoresist
When, obtained micro-nano structure is cylindric；When the photoresist used is photoetching positive photoresist, obtained micro-nano structure is circular hole
Shape.When being exposed, light exposure, time for exposure etc. can be adjusted, the disclosure pair according to the type difference of photoresist
This does not do special restriction.It is understood that when forming grating 7 as substrate 4 using photoresist, after completion of the exposure,
It also needs that 7 structure of grating could be formed by development.Developing time and the preceding time dried, dried afterwards can be according to photoresists
Specific type is adjusted, and the disclosure does not do special restriction to this.
In another embodiment, with the angle before rotation between 0~90 ° after grating region 41 is rotated according to predetermined angle
Between when, be formed by micro-nano structure be elliptical cylinder-shape or elliptical aperture shape.For example, it when predetermined angle is 60 °, can obtain
Obtain micro-nano structure as shown in Figure 14 and Figure 15.
The number that grating region 41 rotates and the number of dimensions for being formed by optical grating construction, to meet the design need of optical grating construction
Subject to asking, the disclosure does not do special restriction to this.
In order to prepare common two-dimensional grating structure, the photoresist in substrate 4 can be common photoresist, such as NEB22
Deng.If necessary to prepare two-dimentional Bragg grating, then the photoresist in substrate 4 can choose holographic photosensitive photoresist or directly
Using holographic dry plate as substrate 4.The selection of substrate 4, which is subject to, is capable of forming corresponding grating, and it is special that the disclosure does not do this
Restriction.
It is noted that although describing each step of method in the disclosure in the accompanying drawings with particular order, this
These steps must be executed in this particular order by not requiring that or implying, or have to carry out step shown in whole
It is able to achieve desired result.Additional or alternative, it is convenient to omit multiple steps are merged into a step and held by certain steps
Row, and/or a step is decomposed into execution of multiple steps etc., it is regarded as a part of this disclosure.
The disclosure additionally provides a kind of preparation system of optical grating construction, optical grating construction include in substrate 4 it is multiple mutually every
From grating region 41；As shown in Figure 16 and Figure 17, the preparation system of optical grating construction includes laser aid, light path system and sample
Platform 3, wherein laser aid is for providing laser beam；Light path system is used to laser beam being divided at least two beam coherent beams, and controls
Each coherent beam is made to interfere in target area 8；Sample stage 3 is for fixing and moving substrate 4, so that each grating region of substrate 4
Domain 41, which is successively in target area 8 according to preset path and exposes, forms grating 7.
The preparation system for the optical grating construction that the disclosure provides provides coherent beam by laser aid and light path system,
Coherent beam is interfered in grating region 41 so that grating region 41 exposes and formed grating 7, and the grating forming method is simple, fast
Speed.Moreover, sample stage 3 is by controlling the movement of substrate 4, and then controls grating region 41 and be moved to the progress of target area 8
Exposure avoids and realizes positioning to exposure area 9 by the optical path for changing coherent beam, more to the positioning of exposure area 9
Accurately, the time of grating preparation rapidly, is reduced.
In one embodiment, as shown in figure 16, light path system may include beam splitter 21, the first reflecting mirror 22, second
Reflecting mirror 23, the first control mechanism and the second control mechanism, wherein
Beam splitter 21 is used to laser beam being divided into the first coherent beam and the second coherent beam.First reflecting mirror 22 is used for will
First coherent beam is reflected towards target area 8.Second reflecting mirror 23 is used to the second coherent beam being reflected towards target area 8.The
One control mechanism is used to control the position of the first reflecting mirror 22 and the angle with the first coherent beam, and then controls the first coherent light
Incidence angle of the beam in target area 8.Second control mechanism be used for control the second reflecting mirror 23 position and with the second coherent beam
Angle, and then control the second coherent beam target area 8 incidence angle.
The working principle and method of light path system have carried out in detail in the preparation method embodiment of above-mentioned optical grating construction
Description, details are not described herein.
In one embodiment, as shown in Figure 18 and Figure 19, sample stage 3 includes sample carrier 31, the first translation mechanism 32, the
Two translation mechanisms 33 and rotating mechanism 34, wherein sample carrier 31 is used for anchoring base 4.First translation mechanism 32 is for controlling sample
Product support 31 is translated along first direction A.For controlling the first translation mechanism 32, B is translated second translation mechanism 33 in a second direction.Rotation
Rotation mechanism 34 is rotated in Plane of rotation for controlling the second translation mechanism 33, and Plane of rotation is parallel to first direction
A and second direction B.
The working principle and method of sample stage 3 have carried out retouching in detail in the preparation method embodiment of above-mentioned optical grating construction
It states, details are not described herein.
It should be appreciated that the disclosure is not limited in its application to the detailed construction and arrangement of the component of this specification proposition
Mode.The disclosure can have other embodiments, and can realize and execute in many ways.Aforesaid deformation form and
Modification is fallen within the scope of this disclosure.It should be appreciated that this disclosure and the disclosure of restriction extend in text
And/or it is mentioned in attached drawing or all alternative combinations of two or more apparent independent features.It is all these different
Combination constitutes multiple alternative aspects of the disclosure.Embodiment described in this specification illustrates to become known for realizing the disclosure
Best mode, and those skilled in the art will be enable using the disclosure.
Claims (10)
1. a kind of preparation system of optical grating construction, the optical grating construction includes multiple mutually isolated grating regions in substrate；
It is characterized in that, the preparation system of the optical grating construction includes:
Laser aid, for providing laser beam；
Light path system for the laser beam to be divided at least two beam coherent beams, and controls each coherent beam in target
Region interference；
Sample stage, for fixing and moving the substrate, so that each grating region of the substrate is according to preset path
It is successively in the target area and exposes and form grating.
2. the preparation system of optical grating construction according to claim 1, which is characterized in that the light path system includes:
Beam splitter, for the laser beam to be divided into the first coherent beam and the second coherent beam；
First reflecting mirror, for first coherent beam to be reflected towards the target area；
Second reflecting mirror, for second coherent beam to be reflected towards the target area；
First control mechanism, the angle for controlling the position of first reflecting mirror and with first associated beam, in turn
First coherent beam is controlled in the incidence angle of the target area；
Second control mechanism, the angle for controlling the position of second reflecting mirror and with second associated beam, in turn
Second coherent beam is controlled in the incidence angle of the target area.
3. the preparation system of optical grating construction according to claim 1, which is characterized in that the sample stage includes:
Sample carrier, for fixing the substrate；
First translation mechanism is translated for controlling the sample carrier along first direction；
Second translation mechanism translates in a second direction for controlling first translation mechanism；
Rotating mechanism is rotated in Plane of rotation for controlling second translation mechanism, and the Plane of rotation is flat
Row is in the first direction and the second direction.
4. a kind of preparation method of optical grating construction, the optical grating construction includes multiple mutually isolated grating regions in substrate；
It is characterized in that, the preparation method of the optical grating construction includes:
A laser beam and the substrate are provided, the substrate includes multiple grating regions；
The laser beam is divided at least two beam coherent beams, and controls each coherent beam and interferes in target area；
Each grating region of control substrate, which is successively in target area according to preset path and exposes, forms grating.
5. the preparation method of optical grating construction according to claim 4, which is characterized in that the preparation method of the optical grating construction
Further include:
Light shield layer is formed in the substrate surface, the light shield layer includes multiple transmission regions, the transmission region and the light
Gate region corresponds, and the edge of any transmission region and the grating region being correspondingly arranged flushes.
6. the preparation method of optical grating construction according to claim 4, which is characterized in that the edge phase of each grating region
Together；
Each grating region of control substrate is successively in target area according to preset path and exposes and forms grating and include:
The mask plate of the substrate can be covered by providing one, and the mask plate includes the window region of a light transmission, the window region
Edge flushed with the edge of the grating region；
The mask plate and the substrate relative motion are controlled, so that the window region successively exposes each institute according to preset order
State grating region；
When the exposure of any grating region, the mask plate and the substrate synchronizing moving are controlled, so that the light of exposure
Gate region, which is moved to the target area and exposes, forms grating.
7. the preparation method of optical grating construction according to claim 4, which is characterized in that the preparation method of the optical grating construction
Further include:
After upper one grating region forms grating, and next grating region is formed before grating, and the laser is adjusted
The wavelength of beam.
8. the preparation method of optical grating construction according to claim 4, which is characterized in that the preparation method of the optical grating construction
Further include:
After upper one grating region forms grating, and next grating region is formed before grating, is adjusted described relevant
Incidence angle of the light beam in the target area.
9. the preparation method of optical grating construction according to claim 4, which is characterized in that the preparation method of the optical grating construction
Further include:
After upper one grating region forms grating, and next grating region is formed before grating, and the substrate is rotated,
To adjust the direction in the period of the grating formed in next grating region.
10. the preparation method of optical grating construction according to claim 4, which is characterized in that the preparation side of the optical grating construction
Method further include:
When one grating region is in the target area, grating region exposure back spin is turned at least once, and every time
The grating region is exposed after rotation.
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| CN110320582A (en) * | 2019-07-15 | 2019-10-11 | 英诺激光科技股份有限公司 | Interfere the method for production diffraction optical device using multi-beam laser |
| CN110346857A (en) * | 2019-07-15 | 2019-10-18 | 英诺激光科技股份有限公司 | Utilize the method for multi beam ultrafast laser production diffraction optical device |
| CN111880254A (en) * | 2020-07-14 | 2020-11-03 | 浙江大学 | Preparation method of grating with continuously-changed diffraction efficiency |
| CN112928465A (en) * | 2021-02-22 | 2021-06-08 | 北京理工大学 | Method for simply preparing multiband near-field enhanced composite nano antenna |
| CN114966930A (en) * | 2022-08-02 | 2022-08-30 | 北京至格科技有限公司 | Holographic grating making device |
| CN115774296A (en) * | 2022-11-16 | 2023-03-10 | 梁可心 | Anti-electromagnetic interference electronic grating manufacturing method |
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| CN110320582A (en) * | 2019-07-15 | 2019-10-11 | 英诺激光科技股份有限公司 | Interfere the method for production diffraction optical device using multi-beam laser |
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| CN111880254A (en) * | 2020-07-14 | 2020-11-03 | 浙江大学 | Preparation method of grating with continuously-changed diffraction efficiency |
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| CN114966930B (en) * | 2022-08-02 | 2022-11-04 | 北京至格科技有限公司 | Holographic grating manufacturing device |
| CN115774296A (en) * | 2022-11-16 | 2023-03-10 | 梁可心 | Anti-electromagnetic interference electronic grating manufacturing method |
| CN115774296B (en) * | 2022-11-16 | 2023-07-18 | 京东方科技集团股份有限公司 | Method for manufacturing anti-electromagnetic interference electronic grating |
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