CN115774296B - Method for manufacturing anti-electromagnetic interference electronic grating - Google Patents
Method for manufacturing anti-electromagnetic interference electronic grating Download PDFInfo
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- CN115774296B CN115774296B CN202211438508.0A CN202211438508A CN115774296B CN 115774296 B CN115774296 B CN 115774296B CN 202211438508 A CN202211438508 A CN 202211438508A CN 115774296 B CN115774296 B CN 115774296B
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Abstract
The invention relates to the technical field of electronic grating equipment manufacturing, in particular to an electromagnetic interference resistant electronic grating manufacturing method, which comprises the following steps: the width of the stripes and the interval between any adjacent stripes are controlled by using the monitoring module to be adjusted to be a first preset interval; the monitoring module controls the execution module to etch the grating substrate; bonding the etched parts of any two grating substrates to form a grating semi-finished product; packaging the grating semi-finished product into a grating finished product; the convex lens is arranged on one side of the grating finished product, which is different from the screen, and the convex surface of the convex lens faces to one side, which is far away from the grating finished product; the anti-short wave electromagnetic interference capability of the grating is effectively avoided, the external anti-pressure capability is improved, and the problem that the grating imaging is damaged due to screen transmission faults is avoided, so that the stability of the grating imaging is effectively improved.
Description
Technical Field
The invention relates to the technical field of electronic grating equipment manufacturing, in particular to an electromagnetic interference resistant electronic grating manufacturing method.
Background
The grating is used as an important display component for stereoscopic imaging and medical imaging, and can cause the diffraction image of the grating to be destroyed due to the interference of equipment and/or external force under the electromagnetic environment due to the precise characteristic of the grating.
Chinese patent publication No.: CN110260898A discloses an anti-interference grating wavelength demodulation method and system, which uses software to collect spectrum data, perform spectrum peak searching, calculate the number of gratings, improve the anti-interference capability of demodulation, and enhance stability; chinese patent publication No.: CN111981306a discloses a grating and an anti-interference method, and uses a mode of sending out pulses at intervals to realize that two sets of gratings do not interfere with each other, so as to realize the purpose of stable operation; chinese patent publication No.: CN107272098A discloses a near-field holographic dynamic exposure method for suppressing secondary interference in the direction perpendicular to the vector of the grating, which suppresses the primary secondary interference pattern perpendicular to the vector of the grating by micro-displacement in the direction perpendicular to the vector of the grating during near-field holographic exposure, reduces the stray light level of the manufactured grating, and improves the uniformity of the duty ratio of the grating.
It can be seen that the above technical solution has the following problems:
1. the imaging cannot be performed under the condition that a large amount of short wave interference exists in the imaging environment;
2. cannot be imaged in the presence of external forces and/or interference with the transmission device.
Disclosure of Invention
Therefore, the invention provides an anti-electromagnetic interference electronic grating manufacturing method, which is used for solving the problems that in the prior art, imaging cannot be performed under the condition that a large amount of short wave interference exists in a development environment and imaging cannot be performed under the condition that external force and/or transmission equipment is interfered, so that the imaging stability of the grating is reduced.
In order to achieve the above objective, the present invention provides a method for manufacturing an anti-electromagnetic interference electronic grating.
Step S1, controlling an execution module to adjust a laser beam by using a monitoring module, enabling stripes formed by the laser beam on a preset horizontal plane at a first preset angle and a second preset angle to coincide, and adjusting the space between each stripe at the same time so as to adjust the width of the stripe and the space between any two adjacent stripes to be the first preset space;
step S2, the monitoring module controls the execution module to etch the grating substrate to form a grating etched substrate, comprising,
step S201, the monitoring module controls the executing module to coat etching glue on any surface of the grating substrate, marks the surface as a glue coating surface, fixes the grating substrate and etches the glue coating surface at a first preset angle and a first preset interval;
step S202, when the execution module finishes etching at a first preset angle, the monitoring module controls the execution module to be closed, when a first preset forming condition is reached, the monitoring module controls the execution module to etch the glue coating surface at a first preset interval at a second preset angle, and after etching is finished, the grating substrate is cleaned to form the grating etching substrate; when the grating substrate is etched for any time, the monitoring module controls the execution module to periodically brush photoresist to obtain a set etching depth;
Step S3, the monitoring module controls the execution module to put the grating etching substrate into filling liquid with refractive index corresponding to the grating etching substrate, and the etched parts of any two grating etching substrates are mutually attached to form a grating semi-finished product;
step S4, the monitoring module controls the execution module to adjust the grating semi-finished product to a preset packaging angle for packaging, and the whole grating semi-finished product and each grating substrate are assembled into a grating finished product through a frame;
step S5, the monitoring module controls the execution module to install the grating finished product and the display device at a second preset interval, and meanwhile, a convex lens is installed on one side of the grating finished product far away from the display device, and the convex surface of the convex lens is protruded to one side far away from the grating finished product;
the first preset spacing is a stripe spacing corresponding to the number of grating lines, the first preset angle is a grating structure inclination angle preset in the monitoring module, the second preset angle is perpendicular to a grating plane, the first preset forming condition is that a grating substrate is etched to a preset depth, the second preset spacing is a distance set by the monitoring module according to the focal length of the convex lens, and the preset packaging angle is a corresponding angle of grating imaging.
Further, in the step S1, the monitoring module controls the execution module to project a plurality of equally-spaced laser stripes with equal widths to the preset horizontal plane at the first preset angle and the second preset angle, and the coverage area of the stripes exceeds the area of the grating substrate;
the monitoring module marks the laser projected at the first preset angle and the corresponding metal master plate in the execution module as first etching laser, marks the laser projected at the second preset angle and the corresponding metal master plate in the execution module as second etching laser, and the stripe illumination of the first etching laser corresponds to the stripe illumination of the second etching laser.
Further, the monitoring module judges the illumination of each laser stripe projected by the first etching laser, and for the 1 st stripe and any other stripe, the illumination of each stripe corresponds to L respectively 1 L and i ，L 1 and L is equal to i Is delta L i Setting, the 1 st stripe is the stripe farthest from the light source of the first etching laser, wherein i=2, 3, …, n, n > 3, and n is the maximum stripe corresponding number, Δl i ＝L i -L 1 The monitoring module is provided with a first preset illumination difference L α A second preset illuminance difference L β Wherein 0 < L α ＜L β The monitoring module outputs delta L i And L is equal to α L and β comparing to adjust the angle of the first etching laser corresponding to the metal master plate and the power of each stripe corresponding to the light source;
if DeltaL i The monitoring module judges that the illumination of the ith stripe is lower than a preset allowable illumination range and controls the execution module to adjust an angle A at a first preset angle α Adjusting the angle between the metal master plate and the horizontal plane;
if DeltaL i The monitoring module judges that the illumination of the ith stripe is qualified and continuously detects the other stripes;
if 0 < DeltaL i ＜L α The monitoring module judges that the illumination of the ith stripe is in a preset error illumination range and continuously detects the other stripes;
if L α ≤ΔL i ≤L β The monitoring moduleDetermining that the illuminance of the ith stripe is within a preset fluctuation illuminance range, and controlling the execution module to adjust the illuminance by a first preset adjustment angle A α Reducing the angle between the metal master plate and the horizontal plane;
if L β ＜ΔL i The monitoring module judges that the illumination of the ith stripe exceeds the preset fluctuation illumination range, and simultaneously controls the execution module to reduce the light source power corresponding to the ith stripe by a first preset adjustment power W α ；
When the monitoring module judges the illumination of each laser stripe and controls the execution module to finish adjustment, the monitoring module adjusts the power of the second etching laser and the angle of the metal master plate according to the illumination of each laser stripe projected by the first etching laser so that the illumination of each laser stripe of the second etching laser corresponds to the illumination of each stripe of the first etching laser;
The metal master plate is fixed by an axis parallel to each stripe in the master plate, the metal master plate can rotate around the axis, and the angle between the metal master plate and the horizontal plane is an acute angle formed by the metal master plate and the horizontal plane.
Further, in the step S2, the depth of the grating substrate where the junction point of the first etching laser and the second etching laser on the grating substrate is located is the deepest etching depth of the grating substrate;
for a single grating substrate, when the monitoring module judges that the execution module finishes etching the grating substrate by the first etching laser, the monitoring module controls the execution module to be closed and kept still, and meanwhile, the monitoring module judges the forming state of the grating substrate according to the temperature of the grating substrate;
and the monitoring module is provided with a preset forming temperature, and when the temperature of the grating substrate is not greater than the preset forming temperature, the monitoring module judges that the first preset forming condition is reached, and meanwhile, the monitoring module controls the execution module to etch the grating substrate by the second etching laser.
Further, in the step S3, the monitoring module bonds any two of the grating etching substrates in pairs, marks any one of the grating etching substrates for bonding as a lower grating, and marks the grating etching substrate bonded with the lower grating as an upper grating;
When the monitoring module controls the execution module to fill the filling liquid, the monitoring module controls the execution module to completely soak the lower grating and the upper grating in the filling liquid, and simultaneously controls the execution module to oscillate at a preset filling frequency until bubbles on the surfaces of the lower grating and the upper grating are completely released.
Further, in the step S4, when the monitoring module determines that the bubbles on the surfaces of the lower grating and the upper grating are completely released, the monitoring module controls the execution module to make the lower grating and the upper grating correspond to each other one by one and attach to form a grating semi-finished product, and the monitoring module performs a diffraction simulation test on the grating semi-finished product to determine whether each grating semi-finished product is qualified;
for the jth grating semi-finished product, the monitoring module irradiates the jth grating semi-finished product with the detection light source corresponding to the first preset interval, judges whether the grating semi-finished product is qualified according to the generated diffraction fringes, and a third preset interval L is arranged in the monitoring module γ Fourth preset distance L δ The monitoring module controls the detection light source to pass through a third preset interval L at a preset test speed from a preset nearest distance from the grating semi-finished product γ Move to a fourth preset distance L δ Distance L between the detection light source and the jth grating semi-finished product when the jth grating semi-finished product forms an image appearance curve in the light source moving process is recorded j Wherein 0 < L γ ＜L j Third preset distance L γ A fourth preset interval L for the interval corresponding to the minimum test error δ In order to test the limit spacing of the electrodes,
if 0 is less than L j ＜L γ The monitoring module judges that the grating semi-finished product is abnormal in etching and judges that the corresponding grating semi-finished product is scrapped;
if L γ ≤L j ≤L δ The monitoring module judges that bubbles exist in the grating semi-finished product, separates an upper grating and a lower grating corresponding to the grating semi-finished product, and removes the upper grating and the lower grating againRemoving bubbles;
if there is no L j And the monitoring module judges that the grating semi-finished product is qualified and controls the execution module to package the corresponding grating semi-finished product into a grating finished product.
Further, the monitoring module records the times N of re-removing the bubbles from the jth grating semi-finished product, and determines the ultrasonic frequency of removing the bubbles by the executing module according to the N;
when n=2, the monitoring module controls the execution module to remove at a first preset frequency;
when n=3, the monitoring module controls the execution module to remove at a second preset frequency;
When N is more than 3, the monitoring module controls the execution module to respectively form two grating semi-finished products by the upper grating and the lower grating corresponding to the jth grating semi-finished product and other grating etching substrates, sweep the two grating semi-finished products and re-perform the diffraction simulation test;
the first preset frequency is a frequency corresponding to low-frequency ultrasonic cleaning, the second preset frequency is a frequency corresponding to high-frequency ultrasonic cleaning, and the purging is water spraying purging.
Further, in the step S5, the monitoring module controls the execution module to install the convex lens at a side of the grating finished product far away from the display device at a second preset interval, and makes the convex surface of the convex lens convex to a side far away from the grating finished product, and meanwhile, a lens filling liquid with the same refractive index as that of the convex lens is filled between the convex lens and the grating finished product and is packaged.
Further, when the execution module makes the display device, the monitoring module controls the execution module to select the optical filter with the corresponding color according to the first preset interval and install the optical filter in front of a screen backboard of the display device.
Further, for the single grating finished product, the grating line number is determined by setting the inclination angle of the frame so that the lower grating and the upper grating are positioned at the set relative positions;
When the monitoring module judges that the single grating semi-finished product is qualified, the monitoring module controls the execution module to cut the upper grating and the lower grating corresponding to the grating semi-finished product into preset shapes.
Compared with the prior art, the method has the beneficial effects that the two identical gratings are etched, filled and overlapped respectively, and meanwhile, the external compressive capacity is improved while the shortwave electromagnetic interference resistance of the gratings is effectively avoided by stabilizing the outer part of the grating screen and overlapping the color compensation on the screen, and the problem that the grating imaging is damaged due to the transmission failure of the screen is solved, so that the stability of the grating imaging is effectively improved.
Furthermore, the grating substrate is completely etched by expanding the coverage area of the etching laser stripes, so that the utilization rate of the grating substrate is effectively improved, and meanwhile, the stability of grating imaging is further improved.
Furthermore, by means of adjusting the first etching laser, the etching angle and the etching area of the grating are adjusted, so that the accuracy of etching is effectively improved, and meanwhile, the stability of grating imaging is further improved.
Further, by means of mutual bonding of etched surfaces of the grating and simultaneous immersion in filling liquid for oscillation, the imaging of the grating due to internal inflation in the manufacturing process is reduced, interference of the production process on the imaging of the grating is effectively reduced, and meanwhile the imaging stability of the grating is further improved.
Further, whether the grating works normally or not is judged by means of diffraction test on the grating semi-finished product, and raw materials forming the grating semi-finished product are processed according to the result, so that the raw material utilization rate is effectively improved, and meanwhile, the stability of grating imaging is further improved.
Further, by means of recording the times of removing bubbles again in the grating semi-finished product, fine bubbles in the grating semi-finished product are further vibrated and purged after the times exceed a certain number, and the stability of grating imaging is further improved while the qualification rate of the grating finished product is effectively improved.
Furthermore, by means of arranging the convex lens on the outer side of the grating and filling liquid with the same refractive index as the convex lens, the grating imaging interference caused by external extrusion is effectively avoided, and meanwhile the stability of the grating imaging is further improved.
Further, by means of installing the optical filter in front of the screen backboard, the mode that imaging is caused by screen blue light missing to generate mole patterns so as to interfere with grating operation is utilized to compensate, and the stability of grating imaging is further improved while the grating imaging caused by transmission interference is effectively avoided.
Further, through adjusting the included angle between the grating and the screen and the angle of the grating, the line number of the grating is dynamically adjusted, so that the imaging effect of the grating is effectively improved, and meanwhile, the imaging stability of the grating is further improved.
Further, by means of integrally cutting the grating semi-finished product, the integrity of the grating finished product is effectively improved, and meanwhile, the stability of grating imaging is further improved.
Drawings
FIG. 1 is a flow chart of an anti-electromagnetic interference electronic grating manufacturing method of the invention;
FIG. 2 is a flowchart of step S2 of the anti-electromagnetic interference electronic grating manufacturing method of the present invention;
FIG. 3 is a schematic diagram of module connection of an anti-electromagnetic interference electronic grating manufacturing method according to the present invention;
FIG. 4 is an etching schematic diagram of a first etching laser according to an embodiment of the invention;
FIG. 5 is an etching schematic diagram of a second etching laser according to an embodiment of the present invention;
FIG. 6 is a schematic view of an embodiment of a grating etched substrate;
FIG. 7 is a schematic view of the appearance of a final grating product according to an embodiment of the present invention;
FIG. 8 is a schematic diagram illustrating the adjustment of a final grating product according to an embodiment of the present invention;
wherein: 1: a first etching laser; 2: a second etching laser; 3: an etched portion; 4: a grating substrate; 5: filling liquid.
Detailed Description
In order that the objects and advantages of the invention will become more apparent, the invention will be further described with reference to the following examples; it should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the scope of the invention.
Preferred embodiments of the present invention are described below with reference to the accompanying drawings. It should be understood by those skilled in the art that these embodiments are merely for explaining the technical principles of the present invention, and are not intended to limit the scope of the present invention.
It should be noted that, in the description of the present invention, terms such as "upper," "lower," "left," "right," "inner," "outer," and the like indicate directions or positional relationships based on the directions or positional relationships shown in the drawings, which are merely for convenience of description, and do not indicate or imply that the apparatus or elements must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as limiting the present invention.
Furthermore, it should be noted that, in the description of the present invention, unless explicitly specified and limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be either fixedly connected, detachably connected, or integrally connected, for example; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the above terms in the present invention can be understood by those skilled in the art according to the specific circumstances.
Referring to fig. 1, a flowchart of an electromagnetic interference resistant electronic grating manufacturing method according to the present invention includes:
step S1, controlling an execution module to adjust a laser beam by using a monitoring module, enabling stripes formed by the laser beam on a preset horizontal plane at a first preset angle and a second preset angle to coincide, and adjusting the space between each stripe at the same time so as to adjust the width of the stripe and the space between any two adjacent stripes to be the first preset space;
step S2, the monitoring module controls the execution module to etch the grating substrate to form a grating etched substrate;
step S3, the monitoring module controls the execution module to put the grating etching substrate into filling liquid with refractive index corresponding to the grating etching substrate, and the etched parts of any two grating etching substrates are mutually attached to form a grating semi-finished product;
step S4, the monitoring module controls the execution module to adjust the grating semi-finished product to a preset packaging angle for packaging, and the whole grating semi-finished product and each grating substrate are assembled into a grating finished product through a frame;
step S5, the monitoring module controls the execution module to install the grating finished product and the display device at a second preset interval, and meanwhile, the convex lens is installed on one side of the grating finished product far away from the display device, and the convex surface of the convex lens is protruded to one side far away from the grating finished product;
Referring to fig. 2, a flowchart of step S2 of the electromagnetic interference resistant electronic grating manufacturing method of the present invention is shown, which includes:
step S201, the monitoring module controls the execution module to coat etching glue on any surface of the grating substrate, marks the surface as a glue coating surface, fixes the grating substrate and etches the glue coating surface at a first preset interval at a first preset angle;
step S202, when the execution module finishes etching at a first preset angle, the monitoring module controls the execution module to be closed, when a first preset forming condition is reached, the monitoring module controls the execution module to etch the glue coating surface at a first preset interval at a second preset angle, and after etching is finished, the grating substrate is cleaned to form a grating etching substrate; and when any etching is carried out on the grating substrate, the monitoring module controls the execution module to periodically brush the photoresist to obtain the set etching depth.
The first preset spacing is a stripe spacing corresponding to the number of the grating lines, the first preset angle is a preset grating structure inclination angle in the monitoring module, the second preset angle is perpendicular to a grating plane, the first preset forming condition is that a grating substrate is etched to a preset depth, the second preset spacing is a distance set by the monitoring module according to the focal length of the convex lens, and the preset packaging angle is a corresponding angle of grating imaging.
The two identical gratings are etched, filled and overlapped, and the mode of stabilizing the outside of the grating screen and overlapping color compensation on the screen is utilized, so that the external anti-short wave electromagnetic interference capability of the grating is effectively avoided, the problem that the grating imaging is damaged due to screen transmission faults is solved, and the stability of the grating imaging is effectively improved.
Fig. 3 is a schematic diagram showing module connection of the method for fabricating an electromagnetic interference resistant electronic grating according to the present invention.
The monitoring module is connected with the execution module and used for controlling the execution module to etch the grating substrate by the first etching laser and the second etching laser sections respectively.
Specifically, in step S1, the monitoring module controls the execution module to project a plurality of equally-spaced laser stripes with equal widths at a first preset angle and a second preset angle to a preset horizontal plane, and the coverage area of the stripes exceeds the area of the grating substrate;
the monitoring module marks the laser projected at the corresponding first preset angle and the corresponding metal master plate in the execution module as first etching laser, marks the laser projected at the corresponding second preset angle and the corresponding metal master plate in the execution module as second etching laser, and the illumination of each stripe of the first etching laser corresponds to the illumination of each stripe of the second etching laser.
Fig. 4 is an etching schematic diagram of a first etching laser according to an embodiment of the invention.
The monitoring module projects the first etching laser 1 at a predetermined angle toward the grating substrate 4, and etches the grating substrate 4 by etching, and the portion of the grating substrate 4 projected by the first etching laser 1 is etched into a shape shown by the etched portion 3.
The grating substrate is completely etched by expanding the coverage area of the etched laser stripes, so that the utilization rate of the grating substrate is effectively improved, and the stability of grating imaging is further improved.
Specifically, for the first etchingThe laser etching, the monitoring module judges the illumination of each laser stripe projected by the first etching laser, and for the 1 st stripe and any other stripe, the illumination respectively corresponds to L 1 L and i ，L 1 and L is equal to i Is delta L i Setting, the 1 st stripe is the stripe farthest from the light source of the first etching laser, wherein i=2, 3, …, n, n > 3, n is the corresponding number of the largest stripes, Δl i ＝L i -L 1 The monitoring module is provided with a first preset illumination difference L α A second preset illuminance difference L β Wherein 0 < L α ＜L β The monitoring module outputs delta L i And L is equal to α L and β comparing to adjust the angle of the first etching laser corresponding to the metal master plate and the power of each stripe corresponding to the light source;
If DeltaL i The monitoring module judges that the illumination of the ith stripe is lower than a preset allowable illumination range and controls the execution module to adjust an angle A at a first preset angle α Angle between metal mother plate and horizontal plane is enlarged, A α A range;
if DeltaL i The monitoring module judges that the illumination of the ith stripe is qualified and continuously detects the other stripes;
if 0 < DeltaL i ＜L α The monitoring module judges that the illumination of the ith stripe is in a preset error illumination range, and continuously detects the other stripes;
if L α ≤ΔL i ≤L β The monitoring module judges that the illumination of the ith stripe is in the range of preset fluctuation illumination and controls the execution module to adjust the angle A at a first preset angle α Reducing the angle between the metal master plate and the horizontal plane;
if L β ＜ΔL i The monitoring module judges that the illumination of the ith stripe exceeds the preset fluctuation illumination range, and simultaneously controls the execution module to reduce the light source power corresponding to the ith stripe by a first preset adjustment power W α ；
When the monitoring module judges the illumination of each laser stripe and controls the execution module to finish adjustment, the monitoring module adjusts the power of the second etching laser and the angle of the metal master plate according to the illumination of each laser stripe projected by the first etching laser so that the illumination of each laser stripe of the second etching laser corresponds to the illumination of each stripe of the first etching laser;
The metal master plate is fixed by an axis parallel to each stripe in the master plate, the metal master plate can rotate around the axis, and the angle between the metal master plate and the horizontal plane is an acute angle formed by the metal master plate and the horizontal plane.
The grating substrate is completely etched by expanding the coverage area of the etched laser stripes, so that the utilization rate of the grating substrate is effectively improved, and the stability of grating imaging is further improved.
Fig. 5 is an etching schematic diagram of a second etching laser according to an embodiment of the invention.
Upon completion of the first etching laser light, the monitor module projects the second etching laser light 2 to the etched portion 3 of the grating substrate 4 etched by the first etching laser light, and further etches the etched portion 3 of the grating substrate 4.
Specifically, in step S2, the depth of the grating substrate where the boundary point between the first etching laser and the second etching laser is located is the deepest etching depth of the grating substrate;
for a single grating substrate, when the monitoring module judges that the execution module finishes etching the single grating substrate by using first etching laser, the monitoring module controls the execution module to be closed and kept stand, and meanwhile, the monitoring module judges the forming state of the grating substrate according to the temperature of the grating substrate;
The monitoring module is provided with a preset forming temperature, when the temperature of the grating substrate is not greater than the preset forming temperature, the monitoring module judges that the first preset forming condition is met, and meanwhile, the monitoring module controls the executing module to etch the grating substrate by using second etching laser.
By means of adjusting the first etching laser, the etching angle and etching area of the grating are adjusted, etching accuracy is effectively improved, and meanwhile, grating imaging stability is further improved.
Specifically, in step S3, the monitoring module bonds any two grating etching substrates in pairs, marks any one grating etching substrate for bonding as a lower grating, and marks the grating etching substrate bonded with the lower grating as an upper grating;
when the monitoring module controls the execution module to fill liquid, the monitoring module controls the execution module to fully soak the lower grating and the upper grating in the liquid, and simultaneously controls the execution module to oscillate at a preset filling frequency until bubbles on the surfaces of the lower grating and the upper grating are fully released.
The method has the advantages that the etched surfaces of the grating are mutually bonded and immersed in the filling liquid to vibrate simultaneously, so that the image generated by imaging the grating due to internal inflation in the manufacturing process is reduced, the interference of the production process on imaging the grating is effectively reduced, and meanwhile, the stability of imaging the grating is further improved.
Fig. 6 is a schematic view showing an appearance of a grating etched substrate according to an embodiment of the invention.
After the etching by the first etching laser and the second etching laser is completed, the etched portion 3 as shown in the figure is finally formed on the grating substrate 4, and a grating semifinished product is formed.
In step S4, when the monitoring module judges that bubbles on the surfaces of the lower grating and the upper grating are completely released, the monitoring module controls the execution module to correspond the lower grating and the upper grating one by one and attach the lower grating and the upper grating to form a grating semi-finished product, and the monitoring module carries out diffraction simulation test on the grating semi-finished product to determine whether each grating semi-finished product is qualified or not;
for the jth grating semi-finished product, the monitoring module irradiates the jth grating semi-finished product with a detection light source corresponding to the first preset interval, judges whether the grating semi-finished product is qualified according to the generated diffraction fringes, and a third preset interval L is arranged in the monitoring module γ Fourth preset distance L δ The monitoring module controls the detection light source to pass through a third preset interval L at a preset test speed from the preset nearest distance from the grating semi-finished product γ Move to a fourth preset distance L δ Apart from the semi-finished product of the optical grating, and recording the detection light source and the jth optical grating semi-finished product when the jth optical grating semi-finished product forms an image appearance curve in the moving process of the light source Distance L of product j Wherein 0 < L γ ＜L j Third preset distance L γ A fourth preset interval L for the interval corresponding to the minimum test error δ In order to test the limit spacing of the electrodes,
if 0 is less than L j ＜L γ The monitoring module judges that the grating semi-finished product is abnormal in etching and judges that the corresponding grating semi-finished product is scrapped;
if L γ ≤L j ≤L δ The monitoring module judges that bubbles exist in the grating semi-finished product, separates an upper grating and a lower grating corresponding to the grating semi-finished product, and removes the bubbles again;
if there is no L j The monitoring module judges that the grating semi-finished product is qualified and controls the execution module to package the corresponding grating semi-finished product into a grating finished product.
Fig. 7 is a schematic view showing the appearance of a grating product according to an embodiment of the invention.
When the preparation of the grating semi-finished product is completed, the monitoring module is spliced according to the corresponding shape of the etched part 3 in each grating substrate 4, and simultaneously filling liquid 5 is added.
And whether the grating works normally or not is judged by adopting a diffraction test mode for the grating semi-finished product, and the raw materials forming the grating semi-finished product are processed according to the result, so that the raw material utilization rate is effectively improved, and meanwhile, the stability of grating imaging is further improved.
Specifically, the monitoring module records the times N for removing bubbles again on the jth grating semi-finished product, and determines the ultrasonic frequency for removing bubbles by the executing module according to the N;
When n=2, the monitoring module controls the execution module to remove at a first preset frequency;
when n=3, the monitoring module controls the execution module to remove at a second preset frequency;
when N is more than 3, the monitoring module controls the execution module to respectively form an upper grating and a lower grating corresponding to the jth grating semi-finished product and other grating etching substrates into two grating semi-finished products, purging the two grating semi-finished products and carrying out diffraction simulation test again;
the first preset frequency is the frequency corresponding to low-frequency ultrasonic cleaning, the second preset frequency is the frequency corresponding to high-frequency ultrasonic cleaning, and the purging is water spraying purging.
The method for recording the times of removing the bubbles again by the grating semi-finished product is utilized, fine bubbles in the grating semi-finished product are further vibrated, and the fine bubbles are purged after exceeding a certain times, so that the grating imaging stability is further improved while the qualification rate of the grating finished product is effectively improved.
Specifically, in step S5, the monitoring module controls the execution module to install the convex lens at a side of the grating finished product far from the display device with a second preset interval, and makes the convex surface of the convex lens convex to a side far from the grating finished product, and meanwhile, a lens filling liquid with the same refractive index as that of the convex lens is filled between the convex lens and the grating finished product and is packaged.
The convex lens is arranged on the outer side of the grating and filled with filling liquid with the same refractive index as the convex lens, so that the grating imaging is prevented from being interfered due to external extrusion, and the stability of the grating imaging is further improved.
Specifically, when the execution module is used for manufacturing the display device, the monitoring module controls the execution module to select the optical filter with the corresponding color according to the first preset interval and install the optical filter in front of a screen backboard of the display device.
The mode of installing the optical filter in front of the screen backboard is utilized to compensate the imaging caused by the lack of blue light of the screen to generate mole patterns so as to interfere with the operation of the grating, and the stability of the grating imaging is further improved while the damage of the grating imaging caused by the interference of transmission is effectively avoided.
Specifically, for a single grating finished product, the grating line number is determined by setting the inclination angle of the frame so that the lower grating and the upper grating are positioned at set relative positions;
when the monitoring module judges that the single grating semi-finished product is qualified, the monitoring module controls the execution module to cut the upper grating and the lower grating corresponding to the grating semi-finished product into preset shapes.
When the monitoring module judges that the single grating semi-finished product is qualified, the monitoring module controls the execution module to cut the upper grating and the lower grating corresponding to the grating semi-finished product into preset shapes.
By integrally cutting the grating semi-finished product, the integrity of the grating finished product is effectively improved, and meanwhile, the stability of grating imaging is further improved.
The specific method for manufacturing the anti-electromagnetic interference electronic grating by utilizing the technical scheme of the invention is as follows:
the first etching laser and the second etching laser are composed of a group of laser lamps and corresponding grating mother plates; adjusting the laser lamps of the first etching laser and the second etching laser to make the brightness of the first etching laser equal to that of the second etching laser, and irradiating the first etching laser at an inclination angle of 45 degrees;
and adding a metal master plate corresponding to the first etching laser and the second etching laser to form a grating, adjusting the width of the laser by adjusting the distance between the metal master plate and the laser light source, enabling the laser width to be equal to the grating pitch, at the moment, turning off the light source of the first etching laser, measuring the grating stripe illumination of the second etching laser, turning off the light source of the second etching laser, turning on the light source of the first etching laser, measuring the grating stripe illumination of the first etching laser, comparing the illumination of each stripe, and adjusting the included angle and the distance between each light source and the metal master plate.
Taking 50lx as an example of target laser illumination and 0.4mm as an example of target laser width, on a target plane, measuring that the first laser grating illumination is 60lx, the grating width and the interval are 0.4mm, the second laser grating illumination is 40lx, the grating width and the interval are 0.5mm, then the metal master plate of the first laser is adjusted to a direction away from the first laser source, the laser source and the metal master plate are synchronously moved to a direction away from the target plane, the laser illumination is adjusted to 50lx, the width is 0.57mm, and the metal master plate of the second laser is moved to a direction close to the target plane, so as to adjust the grating width and the interval to 0.4mm.
And aligning the right side of the grating corresponding to the first etching laser with the right side of the grating of the second etching laser, so that the first etching laser and the second etching laser are adjusted.
After the adjustment of the etching laser is completed, uniformly coating etching glue on the grating substrate, clamping and fixing the grating substrate, etching the grating substrate, sequentially etching the grating substrate by using the first etching laser and the second etching laser, and periodically coating the etching glue on the grating substrate in the etching process;
referring to fig. 3, when etching is performed by using the first etching laser, a groove with a depth of 0.5mm and an inclination angle of 45 ° is formed on the grating substrate, and the groove is left to cool the grating substrate;
Referring to fig. 4, when etching is performed by using the second etching laser, grooves with a depth of 0.5mm and an inclination angle of 90 ° corresponding to the first etching laser are formed on the grating substrate;
referring to FIG. 5, after the first etching laser and the second etching laser are etched, a grating with a pitch of 0.4mm, a grating height of 0.5mm and an inclination angle of 45 DEG is formed;
referring to fig. 6, after each grating is prepared, it is immersed in a filling liquid to form a grating semi-finished product, and then tested;
the refractive index of the filling liquid is unequal to that of the grating substrate, an included angle of 20-45 degrees is formed between the refractive angle of the filling liquid and the grating substrate, and the filling liquid is a solution which does not corrode the grating substrate;
the test is as follows:
a light source is irradiated with laser with illuminance of 20lx from the back of the etching tank upwards, and moves away from the etching tank at 0.01m/s, and at the same time, a light shielding plate is used for grating imaging above the etching tank, and whether the grating imaging is bent or not is observed:
when the grating semi-finished product moves to 0.02m, bending stripes are generated, and the monitoring module judges that the grating semi-finished product is unqualified and is discarded;
when the grating semi-finished product moves to 0.15m, bending stripes are generated, the monitoring module judges that the grating semi-finished product is unqualified, bubble removal treatment is carried out at 400Hz, and the count is 1;
When the grating moves to 0.2m, the grating still has no bending stripes, and the monitoring module judges that the grating is qualified;
when the semi-finished product of the grating which needs to be bubble-removed is present, the test is carried out again;
when the grating semi-finished products move to below 0.05m and generate bending stripes, the monitoring module judges that the group of grating semi-finished products are unqualified in etching and are discarded;
when the grating semi-finished product moves to below 0.16m and generates bending stripes, the monitoring module judges that the grating semi-finished product is unqualified, bubble removal treatment is carried out at 800Hz, and the count is 2;
when the semi-finished product of the grating which needs bubble removal treatment still exists, the test is carried out again;
when the monitoring module judges that the grating semi-finished product is unqualified, bubble removal treatment is carried out at 1600Hz, and the count is 3;
at this time, if the 1600Hz bubble-removed semi-finished grating product is still unacceptable, the group of semi-finished grating products are split and sprayed with a gas-free water flow in an etching tank for purging, and meanwhile, the gas-free water flow is respectively used as a lower grating and a new upper grating for combination.
When the grating is packaged, a layer of blue filter is covered on the back plate of the screen, so that the grating failure caused by formation of moire of red light and yellow light when a blue signal is absent is avoided.
Please refer to fig. 8, which is a schematic diagram illustrating adjustment of the grating product according to an embodiment of the present invention, when the number of the grating lines needs to be adjusted, the angle of the housing of the grating product can be adjusted to adjust the gaps in the grating;
Please refer to fig. 8 (a), which is a schematic diagram illustrating a gap-enlarging process of the grating product according to an embodiment of the present invention;
tilting the outer shell in a clockwise direction to drive the upper grating and the lower grating to be dislocated, and expanding the filling liquid in the upper grating and the lower grating to reduce the refractive index of the upper grating and the lower grating;
please refer to fig. 8 (b), which is a schematic diagram illustrating gap reduction of a grating product according to an embodiment of the present invention;
tilting the shell in a anticlockwise direction facing the section of the grating shown in the figure, driving the upper grating and the lower grating to be dislocated, compressing the filled liquid volume in the upper grating and the lower grating, and forming an air bag at the other side, wherein the refractive index of the air bag is smaller, and the refractive index of the liquid is larger;
the upper grating and the lower grating are staggered, so that the volume of the filling liquid is adjusted, and the number of grating lines is increased or decreased to resist interference caused by visible light.
Thus far, the technical solution of the present invention has been described in connection with the preferred embodiments shown in the drawings, but it is easily understood by those skilled in the art that the scope of protection of the present invention is not limited to these specific embodiments. Equivalent modifications and substitutions for related technical features may be made by those skilled in the art without departing from the principles of the present invention, and such modifications and substitutions will be within the scope of the present invention.
The foregoing description is only of the preferred embodiments of the invention and is not intended to limit the invention; various modifications and variations of the present invention will be apparent to those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. The method for manufacturing the anti-electromagnetic interference electronic grating is characterized by comprising the following steps of:
step S1, controlling an execution module to adjust a laser beam by using a monitoring module, enabling stripes formed by the laser beam on a preset horizontal plane at a first preset angle and a second preset angle to coincide, and adjusting the space between each stripe at the same time so as to adjust the width of the stripe and the space between any two adjacent stripes to be the first preset space;
step S2, the monitoring module controls the execution module to etch the grating substrate to form a grating etched substrate, comprising,
step S201, the monitoring module controls the executing module to coat etching glue on any surface of the grating substrate, marks the surface as a glue coating surface, fixes the grating substrate and etches the glue coating surface at a first preset angle and a first preset interval;
step S202, when the execution module finishes etching at a first preset angle, the monitoring module controls the execution module to be closed, when a first preset forming condition is reached, the monitoring module controls the execution module to etch the glue coating surface at a first preset interval at a second preset angle, and after etching is finished, the grating substrate is cleaned to form the grating etching substrate; when the grating substrate is etched for any time, the monitoring module controls the execution module to periodically brush photoresist to obtain a set etching depth;
Step S3, the monitoring module controls the execution module to put the grating etching substrate into filling liquid with refractive index corresponding to the grating etching substrate, and the etched parts of any two grating etching substrates are mutually attached to form a grating semi-finished product;
step S4, the monitoring module controls the execution module to adjust the grating semi-finished product to a preset packaging angle for packaging, and the whole grating semi-finished product and each grating substrate are assembled into a grating finished product through a frame;
step S5, the monitoring module controls the execution module to install the grating finished product and the display device at a second preset interval, and meanwhile, a convex lens is installed on one side of the grating finished product far away from the display device, and the convex surface of the convex lens is protruded to one side far away from the grating finished product;
the first preset spacing is a stripe spacing corresponding to the number of grating lines, the first preset angle is a grating structure inclination angle preset in the monitoring module, the second preset angle is perpendicular to a grating plane, the first preset forming condition is that a grating substrate is etched to a preset depth, the second preset spacing is a distance set by the monitoring module according to the focal length of the convex lens, and the preset packaging angle is a corresponding angle of grating imaging.
2. The method for fabricating an anti-electromagnetic interference electronic grating according to claim 1, wherein in the step S1, the monitoring module controls the execution module to project a plurality of equally-spaced laser stripes with equal widths to a preset horizontal plane at the first preset angle and the second preset angle, respectively, and the coverage area of the stripes exceeds the area of the grating substrate;
the monitoring module marks the laser projected at the first preset angle and the corresponding metal master plate in the execution module as first etching laser, marks the laser projected at the second preset angle and the corresponding metal master plate in the execution module as second etching laser, and the stripe illumination of the first etching laser corresponds to the stripe illumination of the second etching laser.
3. The method of claim 2, wherein the monitor module determines the illuminance of each laser stripe projected by the first etching laser, and for the 1 st stripe and any other stripe, the illuminance corresponds to L respectively 1 L and i ，L 1 and L is equal to i Is delta L i Setting, the 1 st stripe is the stripe farthest from the light source of the first etching laser, wherein i=2, 3, …, n, n > 3, and n is the maximum stripe corresponding number, Δl i ＝L i -L 1 The monitoring module is provided with a first preset illumination difference L α A second preset illuminance difference L β Wherein 0 < L α ＜L β The monitoring module outputs delta L i And L is equal to α L and β comparing to adjust the angle of the first etching laser corresponding to the metal master plate and the power of each stripe corresponding to the light source;
if DeltaL i The monitoring module judges that the illumination of the ith stripe is lower than a preset allowable illumination range and controls the execution module to adjust an angle A at a first preset angle α Adjusting the angle between the metal master plate and the horizontal plane;
if DeltaL i The monitoring module judges that the illumination of the ith stripe is qualified and continuously detects the other stripes;
if 0 < DeltaL i ＜L α The monitoring module judges that the illumination of the ith stripe is in a preset error illumination range and continuously detects the other stripes;
if L α ≤ΔL i ≤L β The monitoring module judges that the illumination of the ith stripe is in a preset fluctuation illumination range and controls the execution module to adjust an angle A in a first preset manner α Reducing the angle between the metal master plate and the horizontal plane;
if L β ＜ΔL i The monitoring module judges that the illumination of the ith stripe exceeds the preset fluctuation illumination range, and simultaneously controls the execution module to reduce the light source power corresponding to the ith stripe by a first preset adjustment power W α ；
When the monitoring module judges the illumination of each laser stripe and controls the execution module to finish adjustment, the monitoring module adjusts the power of the second etching laser and the angle of the metal master plate according to the illumination of each laser stripe projected by the first etching laser so that the illumination of each laser stripe of the second etching laser corresponds to the illumination of each stripe of the first etching laser;
the metal master plate is fixed by an axis parallel to each stripe in the master plate, the metal master plate can rotate around the axis, and the angle between the metal master plate and the horizontal plane is an acute angle formed by the metal master plate and the horizontal plane.
4. The method for fabricating an anti-electromagnetic interference electronic grating according to claim 3, wherein in the step S2, a depth of the grating substrate where the boundary point between the first etching laser and the second etching laser is located is the deepest etching depth of the grating substrate;
for a single grating substrate, when the monitoring module judges that the execution module finishes etching the grating substrate by the first etching laser, the monitoring module controls the execution module to be closed and kept still, and meanwhile, the monitoring module judges the forming state of the grating substrate according to the temperature of the grating substrate;
And the monitoring module is provided with a preset forming temperature, and when the temperature of the grating substrate is not greater than the preset forming temperature, the monitoring module judges that the first preset forming condition is reached, and meanwhile, the monitoring module controls the execution module to etch the grating substrate by the second etching laser.
5. The method of claim 4, wherein in the step S3, the monitor module bonds any two of the grating etching substrates in pairs, marks any one of the grating etching substrates for bonding as a lower grating, and marks the grating etching substrate bonded with the lower grating as an upper grating;
when the monitoring module controls the execution module to fill the filling liquid, the monitoring module controls the execution module to completely soak the lower grating and the upper grating in the filling liquid, and simultaneously controls the execution module to oscillate at a preset filling frequency until bubbles on the surfaces of the lower grating and the upper grating are completely released.
6. The method for manufacturing an anti-electromagnetic interference electronic grating according to claim 5, wherein in the step S4, when the monitoring module determines that the bubbles on the surfaces of the lower grating and the upper grating are completely released, the monitoring module controls the execution module to make the lower grating and the upper grating correspond to each other one by one and attach to form a grating semi-finished product, and the monitoring module performs a diffraction simulation test on the grating semi-finished product to determine whether each grating semi-finished product is qualified;
For the jth grating semi-finished product, the monitoring module irradiates the jth grating semi-finished product with the detection light source corresponding to the first preset interval, judges whether the grating semi-finished product is qualified according to the generated diffraction fringes, and a third preset interval L is arranged in the monitoring module γ Fourth preset distance L δ The monitoring module controls the detection light source to pass through a third preset interval L at a preset test speed from a preset nearest distance from the grating semi-finished product γ Move to a fourth preset distance L δ Distance L between the detection light source and the jth grating semi-finished product when the jth grating semi-finished product forms an image appearance curve in the light source moving process is recorded j Wherein 0 < L γ ＜L j Third preset distance L γ To minimum test error pairShould be spaced, a fourth preset spacing L δ In order to test the limit spacing of the electrodes,
if 0 is less than L j ＜L γ The monitoring module judges that the grating semi-finished product is abnormal in etching and judges that the corresponding grating semi-finished product is scrapped;
if L γ ≤L j ≤L δ The monitoring module judges that bubbles exist in the grating semi-finished product, separates an upper grating and a lower grating corresponding to the grating semi-finished product, and removes the bubbles again;
if there is no L j And the monitoring module judges that the grating semi-finished product is qualified and controls the execution module to package the corresponding grating semi-finished product into a grating finished product.
7. The method for fabricating an anti-electromagnetic interference electronic grating according to claim 6, wherein the monitoring module records the number of times N of bubble removal for the jth semi-finished grating product, and determines the ultrasonic frequency of bubble removal by the executing module according to N;
when n=2, the monitoring module controls the execution module to remove at a first preset frequency;
when n=3, the monitoring module controls the execution module to remove at a second preset frequency;
when N is more than 3, the monitoring module controls the execution module to respectively form two grating semi-finished products by the upper grating and the lower grating corresponding to the jth grating semi-finished product and other grating etching substrates, sweep the two grating semi-finished products and re-perform the diffraction simulation test;
the first preset frequency is a frequency corresponding to low-frequency ultrasonic cleaning, the second preset frequency is a frequency corresponding to high-frequency ultrasonic cleaning, and the purging is water spraying purging.
8. The method of claim 7, wherein in the step S5, the monitoring module controls the execution module to install the convex lens at a side of the grating product far from the display device with a second preset distance, and makes the convex surface of the convex lens convex to a side far from the grating product, and simultaneously, a lens filling liquid with the same refractive index as the convex lens is filled between the convex lens and the grating product and is packaged.
9. The method for manufacturing an anti-electromagnetic interference electronic grating according to claim 8, wherein when the execution module manufactures the display device, the monitoring module controls the execution module to select the optical filter with the corresponding color according to the first preset interval and install the optical filter in front of a screen backboard of the display device.
10. The method for fabricating an electromagnetic interference resistant electronic grating according to claim 9, wherein for each of the grating products, the number of grating lines is determined by setting the inclination angle of the frame so that the lower grating and the upper grating are at the set relative positions;
when the monitoring module judges that the single grating semi-finished product is qualified, the monitoring module controls the execution module to cut the upper grating and the lower grating corresponding to the grating semi-finished product into preset shapes.
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