CN115774296A - Anti-electromagnetic interference electronic grating manufacturing method - Google Patents
Anti-electromagnetic interference electronic grating manufacturing method Download PDFInfo
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- CN115774296A CN115774296A CN202211438508.0A CN202211438508A CN115774296A CN 115774296 A CN115774296 A CN 115774296A CN 202211438508 A CN202211438508 A CN 202211438508A CN 115774296 A CN115774296 A CN 115774296A
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Abstract
The invention relates to the technical field of electronic grating equipment manufacturing, in particular to an anti-electromagnetic interference electronic grating manufacturing method, which comprises the following steps: the width of the stripes and the distance between any adjacent stripes are controlled by a monitoring module to be adjusted to a first preset distance; the monitoring module controls the execution module to etch the grating substrate; attaching the etched parts of any two grating substrates to each other to form a grating semi-finished product; packaging the grating semi-finished product into a grating finished product; installing a convex lens on one side of the grating finished product, which is different from the screen, and enabling the convex surface of the convex lens to face to the side far away from the grating finished product; when effectively having avoided the anti short wave electromagnetic interference ability of grating itself, promoted outside compressive capacity to avoid because of the destroyed problem of the grating formation of image that screen transmission trouble leads to, thereby effectively promoted the stability of grating formation of image.
Description
Technical Field
The invention relates to the technical field of electronic grating equipment manufacturing, in particular to an anti-electromagnetic interference electronic grating manufacturing method.
Background
The grating is used as an important display component for stereo imaging and medical imaging, and due to the precise characteristic, diffraction images of the grating are damaged due to interference of equipment and/or external force in an electromagnetic environment.
Chinese patent publication No.: CN110260898A discloses an anti-interference grating wavelength demodulation method and system, which utilize software to collect spectrum data, perform spectrum peak searching, calculate the number of gratings, improve the anti-interference capability of demodulation and enhance the stability; chinese patent publication No.: CN111981306A discloses a grating and an anti-interference method, which utilize a mode of sending pulses at intervals to realize that two sets of gratings operate without mutual interference so as to realize the purpose of stable operation; chinese patent publication No.: CN107272098A discloses a near field holographic dynamic exposure method for suppressing secondary interference in the direction perpendicular to the grating vector, which reduces the stray light level of the manufactured grating and improves the uniformity of the ratio of the occupied width of the grating by suppressing the primary secondary interference pattern perpendicular to the grating vector of a phase mask through micro-displacement in the direction perpendicular to the grating vector during near field holographic exposure.
Therefore, the technical scheme has the following problems:
1. the imaging cannot be carried out under the condition that a large amount of short-wave interference exists in the imaging environment;
2. imaging cannot be performed in the presence of external forces and/or the transmission device is disturbed.
Disclosure of Invention
Therefore, the invention provides an anti-electromagnetic interference electronic grating manufacturing method, which is used for overcoming the problems that imaging cannot be performed under the condition that a large amount of short-wave interference exists in a development environment and imaging cannot be performed under the condition that external force and/or transmission equipment are interfered, so that the imaging stability of a grating is reduced in the prior art.
In order to achieve the above purpose, the present invention provides a method for manufacturing an anti-electromagnetic interference electronic grating.
S1, controlling an execution module to adjust a laser beam by using a monitoring module, enabling the laser beam to coincide with stripes formed on a preset horizontal plane at a first preset angle and a second preset angle, and adjusting the interval of each stripe simultaneously to adjust the width of each stripe and the interval between any adjacent stripes to be first preset intervals;
step S2, the monitoring module controls the execution module to etch the grating substrate to form a grating etching substrate, comprising,
step S201, the monitoring module controls the execution module to coat etching glue on any surface of the grating substrate, the etching glue is recorded as a glue coating surface, and meanwhile, the grating substrate is fixed and the glue coating surface is etched at a first preset interval at a first preset angle;
step S202, when the execution module finishes etching at a first preset angle, the monitoring module controls the execution module to close, when a first preset forming condition is reached, the monitoring module controls the execution module to etch the glue coating surface at a first preset interval at a second preset angle, and after the etching is finished, the grating substrate is cleaned to form the grating etching substrate; when the grating substrate is etched for any time, the monitoring module controls the execution module to periodically brush the photoresist so as to obtain a set etching depth;
s3, the monitoring module controls the execution module to place the grating etching substrate into filling liquid with a refractive index corresponding to that of the grating etching substrate, and etched parts of any two grating etching substrates are mutually attached to form a grating semi-finished product;
s4, the monitoring module controls the execution module to adjust the grating semi-finished product to a preset packaging angle for packaging, and the whole grating semi-finished product and each grating substrate are assembled into a grating finished product through a frame;
s5, the monitoring module controls the execution module to install the grating finished product and the display device at a second preset interval, and meanwhile, the convex lens is installed on one side, away from the display device, of the grating finished product, and the convex surface of the convex lens is convex towards one side, away from the grating finished product;
the first preset interval is a stripe interval corresponding to the number of grating lines, the first preset angle is a preset grating structure inclination angle in the monitoring module, the second preset angle is perpendicular to a grating plane, the first preset forming condition is that the grating substrate is etched to a preset depth, the second preset interval is a distance set by the monitoring module according to the focal length of the convex lens, and the preset packaging angle is a corresponding angle of grating imaging.
Further, in the step S1, the monitoring module controls the execution module to project a plurality of laser stripes with equal width and equal spacing to a preset horizontal plane at the first preset angle and the second preset angle, respectively, and a stripe coverage area of the laser stripes exceeds an area of the grating substrate;
the monitoring module records the laser projected by the execution module corresponding to the first preset angle and the metal master mask corresponding to the laser projected by the execution module as first etching laser, records the laser projected by the execution module corresponding to the second preset angle and the metal master mask corresponding to the laser projected by the execution module as second etching laser, and the illumination of each stripe of the first etching laser corresponds to the illumination of each stripe of the second etching laser.
Further, the monitoring module judges the illumination of each laser stripe projected by the first etching laser, and the illumination of the 1 st stripe and any other stripe respectively corresponds to L 1 And L i ，L 1 And L i Is Δ L i The 1 st stripe is a stripe farthest from the light source of the first etching laser, where i =2,3, …, n, n > 3, and n is the maximum stripe correspondence number Δ L i ＝L i -L 1 The monitoring module is provided with a first preset illumination difference L α And a second predetermined illumination difference L β Wherein, 0 < L α ＜L β The monitoring module will Δ L i And L α And L β Comparing to adjust the angle of the first etching laser corresponding to the metal master mask and the power of the light source corresponding to each stripe;
if Δ L i < 0, the monitoring module judges that the illumination of the ith stripe is lower than the preset allowable illumination range, and simultaneously controls the execution module to adjust the first preset angle A α The angle between the metal master plate and the horizontal plane is enlarged;
if Δ L i =0, the monitoring module determines that the illuminance of the ith stripe is qualified, and continues to detect the rest stripes;
if 0 < Δ L i ＜L α The monitoring module judges that the illumination of the ith stripe is in a preset error illumination range and continues to detect other stripes;
if L is α ≤ΔL i ≤L β The monitoring module judges that the illuminance of the ith stripe is in a preset fluctuation illuminance range and controls the execution module to adjust the first preset adjustment angle A α The metal mother plate and the horizontal plane are adjusted to be smallAn angle;
if L is β ＜ΔL i The monitoring module judges that the illumination of the ith stripe exceeds a preset fluctuation illumination range, and simultaneously controls the execution module to reduce the light source power corresponding to the ith stripe by a first preset adjustment power W α ；
When the monitoring module judges the illumination of each laser stripe and controls the execution module to complete the adjustment, the monitoring module adjusts the power of the second etching laser and the angle of the metal master plate according to the illumination of each laser stripe projected by the first etching laser so as to enable the illumination of each laser stripe of the second etching laser to correspond to the illumination of each stripe of the first etching laser;
the metal master plate is fixed by an axis parallel to each stripe in the master plate, the metal master plate can rotate around the axis, and the angle between the metal master plate and the horizontal plane is an acute angle formed by the metal master plate and the horizontal plane.
Further, in the step S2, the depth of the grating substrate where the intersection point of the first etching laser and the second etching laser on the grating substrate is located is the deepest etching depth of the grating substrate;
for a single grating substrate, when the monitoring module judges that the execution module finishes etching the single grating substrate by the first etching laser, the monitoring module controls the execution module to close and stand, and meanwhile, the monitoring module judges the molding state of the grating substrate according to the temperature of the grating substrate;
and a preset forming temperature is set in the monitoring module, when the temperature of the grating substrate is not more than the preset forming temperature, the monitoring module judges that a first preset forming condition is reached, and simultaneously, the monitoring module controls the execution module to etch the grating substrate by the second etching laser.
Further, in the step S3, the monitoring module bonds any two grating etching substrates in pairs, marks any one of the grating etching substrates used for bonding as a lower grating, and marks the grating etching substrate bonded to the lower grating as an upper grating;
when the monitoring module controls the execution module to fill the filling liquid, the monitoring module controls the execution module to completely soak the lower grating and the upper grating in the filling liquid, and simultaneously controls the execution module to oscillate at a preset filling frequency until bubbles on the surfaces of the lower grating and the upper grating are completely released.
Further, in the step S4, when the monitoring module determines that the bubbles on the surfaces of the lower grating and the upper grating are completely released, the monitoring module controls the execution module to correspond and attach the lower grating and the upper grating one to form a grating semi-finished product, and the monitoring module performs a diffraction simulation test on the grating semi-finished product to determine whether each grating semi-finished product is qualified;
for the jth grating semi-finished product, the monitoring module irradiates the jth grating semi-finished product by using the detection light source corresponding to the first preset interval, judges whether the grating semi-finished product is qualified or not according to the generated diffraction fringes, and is provided with a third preset interval L γ And a fourth predetermined pitch L δ The monitoring module controls the detection light source to pass through a third preset distance L from a preset closest distance to the grating semi-finished product at a preset test speed γ Move to the fourth preset interval L δ Keeping away from the grating semi-finished product, and recording the distance L between the detection light source and the jth grating semi-finished product when the jth grating semi-finished product forms an image curve in the light source moving process j Wherein, 0 < L γ ＜L j Third predetermined distance L γ A fourth predetermined distance L corresponding to the minimum test error δ In order to test the limit spacing, the spacing,
if 0 < L j ＜L γ The monitoring module judges that the grating semi-finished product is abnormal in etching and judges that the corresponding grating semi-finished product is scrapped;
if L is γ ≤L j ≤L δ The monitoring module judges that bubbles exist in the grating semi-finished product, separates an upper grating and a lower grating of the corresponding grating semi-finished product and removes the bubbles again;
if L is not present j The monitoring module judges whether the grating semi-finished product is qualified and controls the execution module to enable the corresponding gratingAnd packaging the semi-finished product into a grating finished product.
Further, the monitoring module records the number N of times of removing bubbles again from the jth grating semi-finished product, and determines the ultrasonic frequency of the execution module for removing bubbles according to N;
when N =2, the monitoring module controls the execution module to remove at a first preset frequency;
when N =3, the monitoring module controls the execution module to remove at a second preset frequency;
when N is larger than 3, the monitoring module controls the execution module to enable the upper grating and the lower grating corresponding to the jth grating semi-finished product to respectively form two grating semi-finished products together with other grating etching substrates, the two grating semi-finished products are blown and swept, and the diffraction simulation test is carried out again;
the first preset frequency is a low-frequency ultrasonic cleaning corresponding frequency, the second preset frequency is a high-frequency ultrasonic cleaning corresponding frequency, and the purging is water spraying purging.
Further, in the step S5, the monitoring module controls the executing module to install the convex lens at a side of the grating finished product far away from the display device at a second preset interval, and make the convex surface of the convex lens protrude to the side far away from the grating finished product, and at the same time, filling a lens filling liquid having the same refractive index as that of the convex lens between the convex lens and the grating finished product and packaging the lens filling liquid.
Further, when the execution module manufactures the display device, the monitoring module controls the execution module to select the optical filter with the corresponding color according to the first preset distance and install the optical filter in front of a screen backboard of the display device.
Further, for a single finished grating product, the number of grating lines is determined by setting the inclination angle of the frame so that the lower grating and the upper grating are in set relative positions;
and when the monitoring module judges that the single grating semi-finished product is qualified, the monitoring module controls the execution module to cut the upper grating and the lower grating of the corresponding grating semi-finished product into preset shapes.
Compared with the prior art, the invention has the advantages that two same gratings are respectively etched, filled and overlapped, and meanwhile, the short-wave electromagnetic interference resistance of the gratings is effectively avoided, the external pressure resistance is improved, the problem that the grating imaging is damaged due to the transmission fault of the screen is avoided, and the stability of the grating imaging is effectively improved by stabilizing the external part of the grating screen and overlapping the color compensation on the screen.
Furthermore, the grating substrate is completely etched by utilizing a mode of expanding the coverage area of the etching laser stripes, so that the utilization rate of the grating substrate is effectively improved, and meanwhile, the stability of grating imaging is further improved.
Further, the mode that utilizes to first etching laser to adjust adjusts, adjusts the etching angle and the etching area of grating, when effectively having promoted the accuracy of etching, has further promoted the stability of grating formation of image.
Furthermore, the mode that the etched surfaces of the gratings are mutually attached and immersed in the filling liquid to vibrate is utilized, so that the phenomenon that the interior of the grating is inflated to generate images in the manufacturing process is reduced, the interference of the production process to the grating imaging is effectively reduced, and the stability of the grating imaging is further improved.
Furthermore, whether the grating works normally or not is judged by utilizing a mode of carrying out diffraction test on the grating semi-finished product, and the raw materials forming the grating semi-finished product are processed according to results, so that the raw material utilization rate is effectively improved, and meanwhile, the stability of grating imaging is further improved.
Furthermore, by means of recording the times of removing bubbles again from the grating semi-finished product, fine bubbles in the grating semi-finished product are further vibrated, and are blown and swept after the number of times exceeds a certain number, the qualified rate of the grating finished product is effectively improved, and meanwhile, the stability of grating imaging is further improved.
Furthermore, by means of installing the convex lens outside the grating and filling the filling liquid with the same refractive index as the convex lens, the grating imaging stability is further improved while the grating imaging interference caused by external extrusion is effectively avoided.
Furtherly, the mode of utilizing installation light filter before the screen backplate, to leading to the formation of image to produce the mole line and then interfere the grating operation because of screen blue light disappearance and compensated, when effectively having avoided being disturbed the grating formation of image that leads to because of the transmission and destroyed, further promoted the stability of grating formation of image.
Further, through the regulation to grating and screen contained angle and grating angle itself, carry out dynamic adjustment to the line number of grating, when effectively having promoted grating imaging effect, further promoted grating imaging's stability.
Furthermore, by means of the mode of integrally cutting the grating semi-finished product, the integrity of the grating finished product is effectively improved, and meanwhile, the stability of grating imaging is further improved.
Drawings
FIG. 1 is a flow chart of the method for fabricating an anti-EMI electronic grating according to the present invention;
FIG. 2 is a flow chart of step S2 of the method for manufacturing an anti-electromagnetic interference electronic grating according to the present invention;
FIG. 3 is a schematic diagram of module connection of the method for fabricating an anti-electromagnetic interference electronic grating according to the present invention;
FIG. 4 is a schematic diagram of a first etching laser according to an embodiment of the present invention;
FIG. 5 is a schematic diagram of a second etching laser according to the embodiment of the present invention;
FIG. 6 is a schematic diagram of an embodiment of a grating-etched substrate;
FIG. 7 is a schematic diagram of an appearance of a grating product according to an embodiment of the present invention;
FIG. 8 is a schematic diagram illustrating adjustment of a finished grating product according to an embodiment of the present invention;
wherein: 1: a first etching laser; 2: a second etching laser; 3: an etched portion; 4: a grating substrate; 5: and filling liquid.
Detailed Description
In order that the objects and advantages of the invention will be more clearly understood, the invention is further described in conjunction with the following examples; it should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
Preferred embodiments of the present invention are described below with reference to the accompanying drawings. It should be understood by those skilled in the art that these embodiments are only for explaining the technical principle of the present invention, and do not limit the scope of the present invention.
It should be noted that in the description of the present invention, the terms of direction or positional relationship indicated by the terms "upper", "lower", "left", "right", "inner", "outer", etc. are based on the directions or positional relationships shown in the drawings, which are only for convenience of description, and do not indicate or imply that the device or element must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention.
Furthermore, it should be noted that, in the description of the present invention, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
Fig. 1 is a flow chart of a method for manufacturing an anti-electromagnetic interference electronic grating according to the present invention, which includes:
s1, controlling an execution module to adjust a laser beam by using a monitoring module, enabling the laser beam to coincide with stripes formed on a preset horizontal plane at a first preset angle and a second preset angle, and adjusting the interval of each stripe simultaneously to adjust the width of each stripe and the interval between any adjacent stripes to be first preset intervals;
s2, the monitoring module controls the execution module to etch the grating substrate to form a grating etching substrate;
s3, the monitoring module controls the execution module to place the grating etching substrate into filling liquid with a refractive index corresponding to that of the grating etching substrate, and etched parts of any two grating etching substrates are mutually attached to form a grating semi-finished product;
s4, the monitoring module controls the execution module to adjust the grating semi-finished product to a preset packaging angle for packaging, and the whole grating semi-finished product and each grating substrate are assembled into a grating finished product through a frame;
s5, the monitoring module controls the execution module to install the grating finished product and the display device at a second preset interval, and meanwhile, the convex lens is installed on one side, away from the display device, of the grating finished product, and the convex surface of the convex lens is protruded towards one side, away from the grating finished product;
please refer to fig. 2, which is a flowchart of step S2 of the method for manufacturing an electromagnetic interference resistant electric grating according to the present invention, including:
step S201, the monitoring module controls the execution module to coat etching glue on any surface of the grating substrate, the surface is marked as a glue coating surface, and meanwhile, the grating substrate is fixed and the glue coating surface is etched at a first preset interval at a first preset angle;
step S202, when the execution module finishes etching at a first preset angle, the monitoring module controls the execution module to close, when the first preset forming condition is reached, the monitoring module controls the execution module to etch the glue coating surface at a first preset interval at a second preset angle, and after the etching is finished, the grating substrate is cleaned to form a grating etching substrate; and when the grating substrate is etched for any time, the monitoring module controls the execution module to periodically brush the photoresist so as to obtain the set etching depth.
The first preset interval is a stripe interval corresponding to the number of grating lines, the first preset angle is a grating structure inclination angle preset in the monitoring module, the second preset angle is perpendicular to a grating plane, the first preset forming condition is that the grating substrate is etched to a preset depth, the second preset interval is a distance set by the monitoring module according to the focal length of the convex lens, and the preset packaging angle is a corresponding angle of grating imaging.
The utilization etches two the same gratings respectively and fills, superposes, simultaneously through the mode of stabilizing grating screen outside and superpose the colour compensation on the screen, when effectively having avoided the anti shortwave electromagnetic interference ability of grating itself, has promoted outside compressive capacity to avoid the grating formation of image destroyed problem because of the screen transmission fault leads to, thereby effectively promoted the stability of grating formation of image.
Please refer to fig. 3, which is a schematic diagram illustrating a module connection of the method for fabricating an electromagnetic interference resistant electronic grating according to the present invention.
The monitoring module is connected with the execution module and used for controlling the execution module to etch the grating substrate by the first etching laser and the second etching laser in a segmented mode.
Specifically, in step S1, the monitoring module controls the execution module to project a plurality of laser stripes with equal width and equal spacing to a preset horizontal plane at a first preset angle and a second preset angle, respectively, and a coverage area of the stripes exceeds an area of the grating substrate;
the monitoring module records laser projected by the execution module corresponding to a first preset angle and a metal master mask corresponding to the laser projected by the execution module as first etching laser, records laser projected by the execution module corresponding to a second preset angle and a metal master mask corresponding to the laser projected by the execution module as second etching laser, and the illumination of each stripe of the first etching laser corresponds to that of each stripe of the second etching laser.
Fig. 4 is a schematic diagram of a first etching laser according to an embodiment of the invention.
The monitoring module projects the first etching laser 1 at a predetermined angle toward the grating substrate 4, and etches the grating substrate 4 by etching, and the portion of the grating substrate 4 that is projected by the first etching laser 1 into the shape shown by the etched portion 3.
The grating substrate is completely etched by utilizing the mode of expanding the coverage area of the etching laser stripes, so that the utilization rate of the grating substrate is effectively improved, and meanwhile, the stability of grating imaging is further improved.
Specifically, the monitoring module determines the illuminance of each laser stripe projected by the first etching laser for the first etching laser, and the illuminance of the 1 st stripe and any of the other stripes respectively corresponds to the illuminanceL 1 And L i ，L 1 And L i Is Δ L i The 1 st stripe is a stripe farthest from the light source of the first etching laser, i =2,3, …, n, n > 3, and n is the maximum number of stripes, Δ L i ＝L i -L 1 The monitoring module is provided with a first preset illumination difference L α And a second predetermined illumination difference L β Wherein, 0 < L α ＜L β The monitoring module will Δ L i And L α And L β Comparing to adjust the angle of the first etching laser corresponding to the metal master mask and the power of the light source corresponding to each stripe;
if Δ L i < 0, the monitoring module determines that the illuminance of the ith stripe is lower than the preset allowable illuminance range, and controls the execution module to adjust the first preset adjustment angle A α Adjusting the angle between the metal master plate and the horizontal plane, A α A range;
if Δ L i =0, the monitoring module judges that the illuminance of the ith stripe is qualified, and continues to detect the rest stripes;
if 0 < Δ L i ＜L α The monitoring module judges that the illumination of the ith stripe is within a preset error illumination range, and continues to detect the rest stripes;
if L is α ≤ΔL i ≤L β The monitoring module judges that the illumination of the ith stripe is in a preset fluctuation illumination range and controls the execution module to adjust the first preset angle A α Adjusting the angle between the metal master plate and the horizontal plane to be small;
if L is β ＜ΔL i The monitoring module judges that the illumination of the ith stripe exceeds a preset fluctuation illumination range, and simultaneously controls the execution module to reduce the light source power corresponding to the ith stripe by first preset adjustment power W α ；
When the monitoring module judges the illumination of each laser stripe and controls the execution module to complete the adjustment, the monitoring module adjusts the power of the second etching laser and the angle of the metal master plate according to the illumination of each laser stripe projected by the first etching laser so as to enable the illumination of each laser stripe of the second etching laser to correspond to the illumination of each stripe of the first etching laser;
the metal master plate is fixed by an axis parallel to each stripe in the master plate, the metal master plate can rotate around the axis, and the angle between the metal master plate and the horizontal plane is an acute angle formed by the metal master plate and the horizontal plane.
The grating substrate is completely etched by utilizing the mode of expanding the coverage area of the etching laser stripes, so that the utilization rate of the grating substrate is effectively improved, and meanwhile, the stability of grating imaging is further improved.
Fig. 5 is a schematic diagram illustrating an etching process of a second etching laser according to an embodiment of the invention.
Upon completion of the first etching laser, the monitoring module projects a second etching laser 2 onto the etched portion 3 of the grating substrate 4 after being etched by the first etching laser, and further etches the etched portion 3 of the grating substrate 4.
Specifically, in step S2, the depth of the grating substrate where the corresponding intersection point of the first etching laser and the second etching laser on the grating substrate is located is the deepest etching depth of the grating substrate;
for a single grating substrate, when the monitoring module judges that the execution module finishes etching the single grating substrate by the first etching laser, the monitoring module controls the execution module to close and stand, and meanwhile, the monitoring module judges the molding state of the grating substrate according to the temperature of the grating substrate;
the monitoring module is internally provided with a preset forming temperature, when the temperature of the grating substrate is not more than the preset forming temperature, the monitoring module judges that a first preset forming condition is reached, and simultaneously, the monitoring module controls the execution module to etch the grating substrate by using second etching laser.
The mode that the utilization was adjusted first etching laser, the etching angle and the etching area of adjusting the grating have further promoted the stability of grating formation of image when effectively having promoted the accuracy of etching.
Specifically, in step S3, the monitoring module bonds any two grating etching substrates in pairs, marks any one of the grating etching substrates used for bonding as a lower grating, and marks the grating etching substrate bonded to the lower grating as an upper grating;
when the monitoring module controls the execution module to fill the filling liquid, the monitoring module controls the execution module to completely soak the lower grating and the upper grating in the filling liquid, and simultaneously, the control execution module oscillates at a preset filling frequency until bubbles on the surfaces of the lower grating and the upper grating are completely released.
The mode that the etched surfaces of the gratings are mutually attached and immersed in the filling liquid to vibrate simultaneously is utilized, so that the phenomenon that the interior of the grating is inflated to generate images in the manufacturing process is reduced, the interference of the production process to the grating imaging is effectively reduced, and the stability of the grating imaging is further improved.
FIG. 6 is a schematic diagram showing an appearance of a grating-etched substrate according to an embodiment of the invention.
After the etching by the first etching laser and the second etching laser is completed, the etched portion 3 is finally formed on the grating substrate 4 as shown in the figure, and a grating semi-finished product is formed.
In step S4, when the monitoring module determines that the bubbles on the surfaces of the lower grating and the upper grating are completely released, the monitoring module controls the execution module to correspondingly and attach the lower grating and the upper grating one by one to form a grating semi-finished product, and the monitoring module performs a diffraction simulation test on the grating semi-finished product to determine whether each grating semi-finished product is qualified;
for the jth grating semi-finished product, the monitoring module irradiates the jth grating semi-finished product by using a detection light source corresponding to the first preset interval, judges whether the grating semi-finished product is qualified or not according to the generated diffraction stripes, and is provided with a third preset interval L γ And a fourth predetermined pitch L δ The monitoring module controls the detection light source to pass through a third preset distance L from a preset nearest distance from the grating semi-finished product at a preset test speed γ Move to the fourth preset interval L δ Keeping away from the grating semi-finished product, and recording the distance L between the detection light source and the jth grating semi-finished product when the jth grating semi-finished product forms an image with a curve in the moving process of the light source j Wherein, 0 < L γ ＜L j Third predetermined distance L γ A fourth predetermined distance L corresponding to the minimum test error δ In order to test the limit spacing, the spacing,
if 0 < L j ＜L γ The monitoring module judges whether the grating semi-finished product is abnormally etched and judges that the corresponding grating semi-finished product is scrapped;
if L is γ ≤L j ≤L δ The monitoring module judges that bubbles exist in the grating semi-finished product, separates an upper grating and a lower grating of the corresponding grating semi-finished product and removes the bubbles again;
if L is not present j And the monitoring module judges that the grating semi-finished product is qualified and controls the execution module to package the corresponding grating semi-finished product into a grating finished product.
Fig. 7 is a schematic diagram showing an appearance of a grating product according to an embodiment of the invention.
When the preparation of the grating semi-finished product is finished, the monitoring modules are spliced according to the corresponding shape of the etched part 3 in each grating substrate 4, and meanwhile, filling liquid 5 is added.
Whether the grating works normally is judged by utilizing a mode of carrying out diffraction test on the grating semi-finished product, and the raw materials forming the grating semi-finished product are processed according to results, so that the raw material utilization rate is effectively improved, and meanwhile, the stability of grating imaging is further improved.
Specifically, the monitoring module records the number N of times of removing bubbles again from the jth grating semi-finished product, and determines the ultrasonic frequency of the execution module for removing bubbles according to N;
when N =2, the monitoring module controls the execution module to remove at a first preset frequency;
when N =3, the monitoring module controls the execution module to remove at a second preset frequency;
when N is more than 3, the monitoring module controls the execution module to respectively combine the upper grating and the lower grating corresponding to the jth grating semi-finished product with other grating etching substrates to form two grating semi-finished products, and the two grating semi-finished products are swept and subjected to a diffraction simulation test again;
the first preset frequency is a low-frequency ultrasonic cleaning corresponding frequency, the second preset frequency is a high-frequency ultrasonic cleaning corresponding frequency, and the purging is water spraying purging.
The mode that the number of times of bubbles is removed again by recording the grating semi-finished product is utilized to further vibrate the tiny bubbles in the grating semi-finished product, and the tiny bubbles are blown and swept after a certain number of times is exceeded, so that the qualified rate of the grating finished product is effectively improved, and meanwhile, the stability of grating imaging is further improved.
Specifically, in step S5, the monitoring module controls the execution module to install the convex lens at a second preset distance on a side of the grating product away from the display device, and to make the convex surface of the convex lens protrude towards the side away from the grating product, and at the same time, a lens filling liquid having the same refractive index as that of the convex lens is filled between the convex lens and the grating product and is packaged.
By means of the mode that the convex lens is arranged on the outer side of the grating and the filling liquid with the refractive index same as that of the convex lens is filled, grating imaging interference caused by external extrusion is effectively avoided, and meanwhile the stability of grating imaging is further improved.
Specifically, when the execution module is used for manufacturing the display device, the monitoring module controls the execution module to select the optical filter with the corresponding color according to the first preset distance and install the optical filter in front of a screen backboard of the display device.
The mode of utilizing installation light filter before the screen backplate, to leading to the formation of image to produce mole line and then interfered the grating operation and compensated because of screen blue light disappearance, when effectively having avoided being disturbed the grating formation of image that leads to because of the transmission destroyed, further promoted the stability of grating formation of image.
Specifically, for a single grating finished product, the number of grating lines is determined by setting the inclination angle of a frame so that the lower grating and the upper grating are in set relative positions;
when the monitoring module judges that the single grating semi-finished product is qualified, the monitoring module controls the execution module to cut the upper grating and the lower grating of the corresponding grating semi-finished product into preset shapes.
When the monitoring module judges that the single grating semi-finished product is qualified, the monitoring module controls the execution module to cut the upper grating and the lower grating of the corresponding grating semi-finished product into preset shapes.
Through the mode of wholly cutting the grating semi-manufactured goods, when effectively having promoted the grating finished product integrality, further promoted the stability of grating formation of image.
The specific method of the anti-electromagnetic interference electronic grating manufactured by the technical scheme of the invention is as follows:
the first etching laser and the second etching laser are both composed of a group of laser lamps and corresponding grating mother matrixes; adjusting laser lamps of the first etching laser and the second etching laser to enable the first etching laser to be equal in brightness to the second etching laser, and irradiating the first etching laser at an inclination angle of 45 degrees;
adding a metal master mask corresponding to a first etching laser and a second etching laser to form a grating, adjusting the width of the laser by adjusting the distance between the metal master mask and a laser light source to enable the width of the laser to be equal to the grating pitch of the grating, turning off the light source of the first etching laser at the moment, measuring the illumination of grating stripes of the second etching laser, turning off the light source of the second etching laser, turning on the light source of the first etching laser, measuring the illumination of grating stripes of the first etching laser light source, comparing the illumination of each stripe, and adjusting the included angle and the distance between each light source and the metal master mask.
Taking the example of the illumination of the target laser as 50lx and the example of the width of the target laser as 0.4mm, on the target plane, the measured illumination of the first laser grating is 60lx, the grating width and the spacing are 0.4mm, the illumination of the second laser grating is 40lx, and the grating width and the spacing are 0.5mm, then the metal master plate of the first laser is adjusted in the direction away from the first laser light source, the laser light source and the metal master plate are synchronously moved in the direction away from the target plane, the illumination of the laser is adjusted to be 50lx, the width is 0.57mm, and the metal master plate of the second laser is moved in the direction close to the target plane, so that the grating width and the spacing are adjusted to be 0.4mm.
And aligning the right side of the grating corresponding to the first etching laser with the right side of the grating of the second etching laser, and thus finishing the adjustment of the first etching laser and the second etching laser.
After the adjustment of the etching laser is finished, uniformly coating etching glue on the grating substrate, clamping and fixing the grating substrate, then etching, sequentially etching the grating substrate by using a first etching laser and a second etching laser, and periodically coating the etching glue on the grating substrate in the etching process;
referring to fig. 3, when the first etching laser is used for etching, a groove with a depth of 0.5mm and an inclination angle of 45 ° is formed on the grating substrate, and the grating substrate is cooled by standing;
referring to fig. 4, when the second etching laser is used for etching, a groove with a depth of 0.5mm and an inclination angle of 90 ° is formed on the grating substrate, and the groove corresponds to the first etching laser;
referring to fig. 5, after the first etching laser and the second etching laser are etched, a grating with a pitch of 0.4mm, a height of 0.5mm and an inclination angle of 45 ° is formed;
referring to fig. 6, after the preparation of each grating is completed, the grating is immersed in a filling liquid to form a grating semi-finished product, and the grating semi-finished product is tested;
the refractive index of the filling liquid is not equal to that of the grating substrate, an included angle formed between the refraction angle of the filling liquid and the grating substrate is 20-45 degrees, and the filling liquid is a solution which does not corrode the grating substrate;
during testing:
a light source is upwards irradiated by laser with the illuminance of 20lx from the back of the etching pool and moves to the direction away from the etching pool by 0.01m/s, and meanwhile, a light shielding plate is used for grating imaging above the etching pool and observing whether the grating imaging is bent or not:
when the grating moves to 0.02m, bending stripes are generated, and the monitoring module judges that the grating semi-finished product is unqualified and discards the grating semi-finished product;
when the grating moves to 0.15m, bending stripes are generated, the monitoring module judges that the grating semi-finished product is unqualified, bubble removal processing is carried out at 400Hz, and the counting is 1;
when the grating moves to 0.2m, no bending stripe is generated, and the monitoring module judges that the grating is qualified;
when the grating semi-finished product needing bubble removing treatment exists, the test is carried out;
when the group of grating semi-finished products move to below 0.05m and generate bending stripes, the monitoring module judges that the group of grating semi-finished products are unqualified in etching and abandons the grating semi-finished products;
when the grating moves to a position below 0.16m and generates bending stripes, the monitoring module judges that the grating semi-finished product is unqualified, and carries out bubble removal processing at 800Hz, and the count is 2;
when the grating semi-finished product needing bubble removing treatment still exists, the test is carried out;
when the monitoring module judges that the grating semi-finished product is unqualified, bubble removal processing is carried out at 1600Hz, and the count is 3;
at the moment, if the 1600Hz bubble-removing grating semi-finished product is still not qualified, the group of grating semi-finished products are split in an etching pool, and water flow without gas is sprayed into the etching pool for purging, and meanwhile, the grating semi-finished products are respectively used as a lower grating and a new upper grating for combination.
When the grating is packaged, a layer of blue filter is covered on the back panel of the screen, so that the phenomenon that the grating is invalid due to the fact that red light and yellow light form moire when a blue signal is lost is avoided.
Please refer to fig. 8, which is an adjustment diagram of a grating product according to an embodiment of the present invention, when the number of grating lines needs to be adjusted, the gap in the grating can be adjusted by adjusting the angle of the casing of the finished grating;
please refer to fig. 8 (a), which is a schematic diagram illustrating a gap enlargement of a grating product according to an embodiment of the present invention;
facing to the section of the grating shown in the figure, the shell is inclined in the clockwise direction, the upper grating and the lower grating are driven to be staggered, and the volume of filling liquid in the shell is expanded, so that the refractive index of the shell is reduced;
please refer to fig. 8 (b), which is a schematic diagram illustrating the gap reduction of the grating product according to an embodiment of the present invention;
facing to the section of the grating shown in the figure, the shell is inclined in the anticlockwise direction, the upper grating and the lower grating are driven to be staggered, the volume of the filling liquid in the shell is compressed, an air bag is formed on the other side, the refractive index of the air bag is smaller, and the refractive index of the liquid is larger;
the number of lines of the grating is increased or decreased by adjusting the volume of the filling liquid in a mode of staggering the upper grating and the lower grating so as to resist the interference caused by visible light.
So far, the technical solutions of the present invention have been described in connection with the preferred embodiments shown in the drawings, but it is easily understood by those skilled in the art that the scope of the present invention is obviously not limited to these specific embodiments. Equivalent changes or substitutions of related technical features can be made by those skilled in the art without departing from the principle of the invention, and the technical scheme after the changes or substitutions can be within the protection scope of the invention.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention; various modifications and alterations to this invention will become apparent to those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. A method for manufacturing an anti-electromagnetic interference electronic grating is characterized by comprising the following steps:
s1, controlling an execution module to adjust a laser beam by using a monitoring module, so that stripes formed on a preset horizontal plane by the laser beam at a first preset angle and a second preset angle are overlapped, and adjusting the interval of each stripe to adjust the width of each stripe and the interval between any adjacent stripes to be first preset intervals;
step S2, the monitoring module controls the execution module to etch the grating substrate to form a grating etching substrate, including,
step S201, the monitoring module controls the execution module to coat etching glue on any surface of the grating substrate, the etching glue is recorded as a glue coating surface, and meanwhile, the grating substrate is fixed and the glue coating surface is etched at a first preset interval at a first preset angle;
step S202, when the execution module finishes etching at a first preset angle, the monitoring module controls the execution module to close, when a first preset forming condition is reached, the monitoring module controls the execution module to etch the glue coating surface at a first preset interval at a second preset angle, and after the etching is finished, the grating substrate is cleaned to form the grating etching substrate; when the grating substrate is etched for any time, the monitoring module controls the execution module to periodically brush the photoresist so as to obtain a set etching depth;
s3, the monitoring module controls the execution module to place the grating etching substrate into filling liquid with a refractive index corresponding to that of the grating etching substrate, and etched parts of any two grating etching substrates are mutually attached to form a grating semi-finished product;
s4, the monitoring module controls the execution module to adjust the grating semi-finished product to a preset packaging angle for packaging, and the whole grating semi-finished product and each grating substrate are assembled into a grating finished product through a frame;
s5, the monitoring module controls the execution module to install the grating finished product and the display device at a second preset interval, and meanwhile, the convex lens is installed on one side, away from the display device, of the grating finished product, and the convex surface of the convex lens is convex towards one side, away from the grating finished product;
the grating structure comprises a monitoring module, a convex lens, a first preset interval, a second preset angle and a first preset angle, wherein the first preset interval is a stripe interval corresponding to the number of grating lines, the first preset angle is a preset grating structure inclination angle in the monitoring module, the second preset angle is perpendicular to a grating plane, the first preset forming condition is that a grating substrate is etched to a preset depth, the second preset interval is a distance set by the monitoring module according to the focal length of the convex lens, and the preset packaging angle is a corresponding angle of grating imaging.
2. The method according to claim 1, wherein in step S1, the monitoring module controls the execution module to project a plurality of laser stripes with equal width and equal spacing to a preset horizontal plane at the first preset angle and the second preset angle, respectively, and a stripe coverage area of the laser stripes exceeds an area of the grating substrate;
the monitoring module records the laser projected by the execution module corresponding to the first preset angle and the metal master mask corresponding to the laser projected by the execution module as first etching laser, records the laser projected by the execution module corresponding to the second preset angle and the metal master mask corresponding to the laser projected by the execution module as second etching laser, and the illumination of each stripe of the first etching laser corresponds to the illumination of each stripe of the second etching laser.
3. The method according to claim 2, wherein the monitoring module determines the illumination intensity of each laser stripe projected by the first etching laser, and the illumination intensity of the 1 st stripe and any other stripe respectively corresponds to L 1 And L i ，L 1 And L i Is Δ L i Setting that the 1 st stripe is the stripe farthest from the light source of the first etching laser, wherein i =2,3, …, n, n > 3, and n is the maximum stripe correspondence number, Δ L i ＝L i -L 1 The monitoring module is provided with a first preset illumination difference L α And a second predetermined illumination difference L β Wherein, 0 < L α ＜L β The monitoring module will Δ L i And L α And L β Comparing to adjust the angle of the first etching laser corresponding to the metal master mask and the power of the light source corresponding to each stripe;
if Δ L i < 0, the monitoring module judges that the illumination of the ith stripe is lower than the preset allowable illumination range, and simultaneously controls the execution module to adjust the first preset angle A α The angle between the metal master plate and the horizontal plane is enlarged;
if Δ L i =0, the monitoring module determines that the illuminance of the ith stripe is qualified, and continues to detect the rest stripes;
if 0 < Δ L i ＜L α The monitoring module judges that the illumination of the ith stripe is within a preset error illumination range, and continues to detect the rest stripes;
if L is α ≤ΔL i ≤L β The monitoring module judges that the illumination of the ith stripe is in a preset fluctuation illumination range and controls the executionThe module is adjusted by a first preset angle A α Reducing the angle between the metal master plate and the horizontal plane;
if L is β ＜ΔL i The monitoring module judges that the illumination of the ith stripe exceeds a preset fluctuation illumination range, and simultaneously controls the execution module to reduce the light source power corresponding to the ith stripe by a first preset adjustment power W α ；
When the monitoring module judges the illumination of each laser stripe and controls the execution module to finish adjustment, the monitoring module adjusts the power of the second etching laser and the angle of the metal master plate according to the illumination of each laser stripe projected by the first etching laser so as to enable the illumination of each laser stripe of the second etching laser to correspond to the illumination of each stripe of the first etching laser;
the metal master plate is fixed by an axis parallel to each stripe in the master plate, the metal master plate can rotate around the axis, and the angle between the metal master plate and the horizontal plane is an acute angle formed by the metal master plate and the horizontal plane.
4. The method according to claim 3, wherein in step S2, the depth of the grating substrate at which the intersection point of the first etching laser and the second etching laser on the grating substrate is located is the deepest etching depth of the grating substrate;
for a single grating substrate, when the monitoring module judges that the execution module finishes etching the single grating substrate by the first etching laser, the monitoring module controls the execution module to close and stand, and meanwhile, the monitoring module judges the molding state of the grating substrate according to the temperature of the grating substrate;
and a preset forming temperature is set in the monitoring module, when the temperature of the grating substrate is not more than the preset forming temperature, the monitoring module judges that a first preset forming condition is reached, and simultaneously, the monitoring module controls the execution module to etch the grating substrate by the second etching laser.
5. The method according to claim 4, wherein in step S3, the monitoring module bonds any two grating-etched substrates in pairs, marks any one of the grating-etched substrates used for bonding as a lower grating, and marks the grating-etched substrate bonded to the lower grating as an upper grating;
when the monitoring module controls the execution module to fill the filling liquid, the monitoring module controls the execution module to completely soak the lower grating and the upper grating in the filling liquid, and simultaneously controls the execution module to oscillate at a preset filling frequency until bubbles on the surfaces of the lower grating and the upper grating are completely released.
6. The method according to claim 5, wherein in step S4, when the monitoring module determines that the bubbles on the surfaces of the lower grating and the upper grating are completely released, the monitoring module controls the execution module to correspondingly and attach the lower grating and the upper grating one to form a grating semi-finished product, and the monitoring module performs a diffraction simulation test on the grating semi-finished product to determine whether each grating semi-finished product is qualified;
for the jth grating semi-finished product, the monitoring module irradiates the jth grating semi-finished product by using the detection light source corresponding to the first preset interval, judges whether the grating semi-finished product is qualified or not according to the generated diffraction fringes, and is provided with a third preset interval L γ And a fourth predetermined pitch L δ The monitoring module controls the detection light source to pass through a third preset distance L from a preset closest distance to the grating semi-finished product at a preset test speed γ Move to the fourth preset interval L δ Keeping away from the grating semi-finished product, and recording the distance L between the detection light source and the jth grating semi-finished product when the jth grating semi-finished product forms an image curve in the light source moving process j Wherein, 0 < L γ ＜L j Third predetermined distance L γ A fourth predetermined distance L corresponding to the minimum test error δ In order to test the limit spacing, the spacing,
if 0 < L j ＜L γ The monitoring module judges the gratingEtching the semi-finished product abnormally, and judging that the corresponding grating semi-finished product is scrapped;
if L is γ ≤L j ≤L δ The monitoring module judges that bubbles exist in the grating semi-finished product, separates an upper grating and a lower grating of the corresponding grating semi-finished product and removes the bubbles again;
if L is not present j And the monitoring module judges that the grating semi-finished product is qualified and controls the execution module to package the corresponding grating semi-finished product into a grating finished product.
7. The method for manufacturing an anti-electromagnetic interference electronic grating according to claim 6, wherein the monitoring module records the number N of times of removing bubbles again from the jth semi-finished grating, and determines the ultrasonic frequency of removing bubbles by the execution module according to N;
when N =2, the monitoring module controls the execution module to remove at a first preset frequency;
when N =3, the monitoring module controls the execution module to remove at a second preset frequency;
when N is larger than 3, the monitoring module controls the execution module to enable the upper grating and the lower grating corresponding to the jth grating semi-finished product to respectively form two grating semi-finished products together with other grating etching substrates, the two grating semi-finished products are blown and swept, and the diffraction simulation test is carried out again;
the first preset frequency is a low-frequency ultrasonic cleaning corresponding frequency, the second preset frequency is a high-frequency ultrasonic cleaning corresponding frequency, and the purging is water spraying purging.
8. The method according to claim 7, wherein in step S5, the monitoring module controls the execution module to mount the convex lens on a side of the finished grating product away from the display device at a second predetermined distance, and to protrude the convex surface of the convex lens to the side away from the finished grating product, and meanwhile, a lens filling liquid having the same refractive index as that of the convex lens is filled between the convex lens and the finished grating product and is encapsulated.
9. The method according to claim 8, wherein when the execution module manufactures the display device, the monitoring module controls the execution module to select the color filter with a corresponding color according to the first predetermined distance and install the color filter in front of a back panel of a display device.
10. The method for manufacturing an anti-electromagnetic interference electronic grating according to claim 9, wherein for a single finished grating, the number of grating lines is determined by setting the inclination angle of the frame so that the lower grating and the upper grating are in the set relative positions;
and when the monitoring module judges that the single grating semi-finished product is qualified, the monitoring module controls the execution module to cut the upper grating and the lower grating of the corresponding grating semi-finished product into preset shapes.
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Citations (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB485177A (en) * | 1936-11-13 | 1938-05-13 | Theodor Paul Etbauer | Improvements in and relating to the production of plastic and stereoscopic effects from photographs of all kinds more particularly cinematograph pictures |
| EP0990927A2 (en) * | 1998-09-28 | 2000-04-05 | Sharp Kabushiki Kaisha | Diffraction grating having multiple gratings with different cycles for generating multiple beams and optical pickup using such diffraction grating |
| JP2004177816A (en) * | 2002-11-28 | 2004-06-24 | Sony Corp | Optical wiring |
| US20060023310A1 (en) * | 2004-02-19 | 2006-02-02 | Putnam Martin A | Optical identification element using separate or partially overlapped diffraction gratings |
| CN103947000A (en) * | 2011-11-18 | 2014-07-23 | 吉坤日矿日石能源株式会社 | Organic el element |
| CN203838359U (en) * | 2013-11-29 | 2014-09-17 | 东莞市金达照明有限公司 | Base material structure for manufacturing concave blazed grating, and blazed grating convenient to manufacture |
| EP2942619A1 (en) * | 2014-05-07 | 2015-11-11 | Paul Scherrer Institut | Tilted-grating approach for scanning-mode X-ray grating interferometry |
| CA2951550A1 (en) * | 2014-06-09 | 2015-12-17 | Stc.Unm | Integrated bound-mode spectral/angular sensors |
| CN105445834A (en) * | 2015-10-26 | 2016-03-30 | 苏州大学 | Manufacturing method for large-dimension diffraction grating and exposure device thereof |
| CN107272098A (en) * | 2017-06-02 | 2017-10-20 | 中国科学技术大学 | Suppress the near-field holography dynamic exposure method of phase-only pupil filter vertical raster direction vector secondary disturbances |
| CN109270615A (en) * | 2018-11-21 | 2019-01-25 | 京东方科技集团股份有限公司 | The preparation system and preparation method of optical grating construction |
| US20190331866A1 (en) * | 2008-07-09 | 2019-10-31 | Luxtera, Inc. | Method And System For Coupling A Light Source Assembly To An Optical Integrated Circuit |
| WO2020123054A1 (en) * | 2018-12-14 | 2020-06-18 | Applied Materials, Inc. | Methods of producing slanted gratings |
| CN111981306A (en) * | 2019-05-23 | 2020-11-24 | 上海信索传感器有限公司 | Grating and anti-interference method |
| US11054701B1 (en) * | 2020-02-18 | 2021-07-06 | Sioptica Gmbh | Illumination device for a screen for a free and a restricted viewing mode |
| CN115097565A (en) * | 2022-08-24 | 2022-09-23 | 杭州光粒科技有限公司 | Optical waveguide device and preparation method thereof |
-
2022
- 2022-11-16 CN CN202211438508.0A patent/CN115774296B/en active Active
Patent Citations (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB485177A (en) * | 1936-11-13 | 1938-05-13 | Theodor Paul Etbauer | Improvements in and relating to the production of plastic and stereoscopic effects from photographs of all kinds more particularly cinematograph pictures |
| EP0990927A2 (en) * | 1998-09-28 | 2000-04-05 | Sharp Kabushiki Kaisha | Diffraction grating having multiple gratings with different cycles for generating multiple beams and optical pickup using such diffraction grating |
| JP2004177816A (en) * | 2002-11-28 | 2004-06-24 | Sony Corp | Optical wiring |
| US20060023310A1 (en) * | 2004-02-19 | 2006-02-02 | Putnam Martin A | Optical identification element using separate or partially overlapped diffraction gratings |
| US20190331866A1 (en) * | 2008-07-09 | 2019-10-31 | Luxtera, Inc. | Method And System For Coupling A Light Source Assembly To An Optical Integrated Circuit |
| CN103947000A (en) * | 2011-11-18 | 2014-07-23 | 吉坤日矿日石能源株式会社 | Organic el element |
| CN203838359U (en) * | 2013-11-29 | 2014-09-17 | 东莞市金达照明有限公司 | Base material structure for manufacturing concave blazed grating, and blazed grating convenient to manufacture |
| EP2942619A1 (en) * | 2014-05-07 | 2015-11-11 | Paul Scherrer Institut | Tilted-grating approach for scanning-mode X-ray grating interferometry |
| CA2951550A1 (en) * | 2014-06-09 | 2015-12-17 | Stc.Unm | Integrated bound-mode spectral/angular sensors |
| CN105445834A (en) * | 2015-10-26 | 2016-03-30 | 苏州大学 | Manufacturing method for large-dimension diffraction grating and exposure device thereof |
| CN107272098A (en) * | 2017-06-02 | 2017-10-20 | 中国科学技术大学 | Suppress the near-field holography dynamic exposure method of phase-only pupil filter vertical raster direction vector secondary disturbances |
| CN109270615A (en) * | 2018-11-21 | 2019-01-25 | 京东方科技集团股份有限公司 | The preparation system and preparation method of optical grating construction |
| WO2020123054A1 (en) * | 2018-12-14 | 2020-06-18 | Applied Materials, Inc. | Methods of producing slanted gratings |
| CN111981306A (en) * | 2019-05-23 | 2020-11-24 | 上海信索传感器有限公司 | Grating and anti-interference method |
| US11054701B1 (en) * | 2020-02-18 | 2021-07-06 | Sioptica Gmbh | Illumination device for a screen for a free and a restricted viewing mode |
| CN115097565A (en) * | 2022-08-24 | 2022-09-23 | 杭州光粒科技有限公司 | Optical waveguide device and preparation method thereof |
Non-Patent Citations (3)
| Title |
|---|
| HOLGADO, M等: "Simultaneous Reflectivity, Ellipsometry and Spectrometry Measurements in Submicron Structures for Liquid Sensing", SENSOR LETTERS * |
| 周峰: "基于衍射波前测量的全息光栅掩模拼接误差判断研究", 中国优秀硕士学位论文全文数据库工程科技Ⅱ辑 * |
| 李润超: "微纳尺度衍射光栅的制造方法及其应用实验研究", 中国优秀硕士学位论文全文数据库基础科学辑 * |
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