CN114966930B - Holographic grating manufacturing device - Google Patents
Holographic grating manufacturing device Download PDFInfo
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- CN114966930B CN114966930B CN202210920041.7A CN202210920041A CN114966930B CN 114966930 B CN114966930 B CN 114966930B CN 202210920041 A CN202210920041 A CN 202210920041A CN 114966930 B CN114966930 B CN 114966930B
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 30
- 238000002834 transmittance Methods 0.000 claims abstract description 190
- 239000000758 substrate Substances 0.000 claims abstract description 74
- 238000009826 distribution Methods 0.000 claims abstract description 46
- 230000001427 coherent effect Effects 0.000 claims description 30
- 238000001914 filtration Methods 0.000 claims description 22
- 230000005540 biological transmission Effects 0.000 claims description 7
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 230000002159 abnormal effect Effects 0.000 claims 1
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- 238000000034 method Methods 0.000 description 15
- 229920002120 photoresistant polymer Polymers 0.000 description 12
- 230000008859 change Effects 0.000 description 9
- 230000000875 corresponding effect Effects 0.000 description 8
- 239000010410 layer Substances 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/32—Holograms used as optical elements
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
Abstract
The invention provides a holographic grating making device, comprising: a laser for emitting laser light; a light intensity adjusting member for adjusting light intensity; a transmittance adjusting member for adjusting the transmittance of the laser beam; the transmittance adjusting component comprises a first transmittance adjusting component and a second transmittance adjusting component, and the transmittance distribution of the first transmittance adjusting component is the same as or a mirror image of the transmittance distribution of the second transmittance adjusting component; a first moving member for moving the first transmittance adjusting member, the first moving member being connected to the first transmittance adjusting member; a second moving member for moving the second transmittance adjusting member, connected to the second transmittance adjusting member; and a substrate. The invention can manufacture the grating with adjustable distribution of the aspect ratio and realize the modulation of the diffraction performance of different areas of the grating.
Description
Technical Field
The invention relates to the technical field of gratings, in particular to a holographic grating manufacturing device.
Background
FIG. 1 is a schematic diagram of the principle of holographic grating fabrication. FIG. 2 is a schematic view of a substrate covered with an exposed photoresist layer. Figure 3 is a schematic illustration of a relief grating. As shown in fig. 1 to 3, the basic principle of making a holographic grating is:
two coherent light beams 301A and 301B with a certain angle interfere to form an interference fringe 302 with alternate light and dark. A coating 304 of photoresist (photosensitive material) is applied to the substrate 303, and the photoresist layer 304 is chemically reacted under light irradiation to change its solubility in a developer to various degrees. The process of the photoresist layer 304 reacting under the irradiation of the interference fringes 302 is called exposure, and the greater the received light intensity, the longer the irradiation time, and the more violent the reaction. After exposure, the photoresist layer 304 records the brightness information of the interference fringes 302 in a certain time. The substrate 303 covered with the exposed photoresist layer 304 is then immersed in a developer for a certain period of time and removed, and due to the different solubility of the portions of the photoresist layer 304, the substrate is dissolved to form a relief grating 305 having a relief structure with alternating high and low levels, which is called development. When the photoresist coating 304 is a "positive photoresist", that is, the more illuminated portions are more easily dissolved, the occupied ratio of the resulting grating after development is negatively correlated with the exposure, more photoresist dissolved into the developer is dissolved in the same development time after the exposure is increased, the remaining grating structure is narrower, and the occupied ratio of the resulting relief grating 305 is smaller; conversely, when the photoresist coating 304 is "negative", i.e., more heavily illuminated portions are more difficult to dissolve, the aspect ratio of the relief grating 305 obtained at the same development time after increasing the exposure is greater.
In the current typical holographic grating manufacturing device, two parts of laser light in an exposure process are not subjected to transmittance adjustment, interference fringes are directly formed, and a grating is finally formed on a substrate, the distribution of exposure amount completely depends on the intensity distribution of uncontrollable collimated laser light, so that the expected duty ratio distribution is also limited by the intensity distribution of the collimated laser light and is difficult to control.
Disclosure of Invention
The embodiment of the invention mainly aims to provide a holographic grating manufacturing device, which is used for manufacturing a grating with adjustable distribution of the aspect ratio and realizing the modulation of the diffraction performance of different areas of the grating.
In order to achieve the above object, an embodiment of the present invention provides a holographic grating manufacturing apparatus, including:
a laser for emitting laser light;
a light intensity adjusting member for adjusting light intensity;
a transmittance adjusting member for adjusting the transmittance of the laser beam; the transmittance adjusting component comprises a first transmittance adjusting component and a second transmittance adjusting component, wherein the transmittance adjusting component comprises the transmittance distribution of the first transmittance adjusting component and the transmittance distribution of the second transmittance adjusting component are the same or mirror images of each other;
a first moving member for moving the first transmittance adjusting member, the first moving member being connected to the first transmittance adjusting member;
a second moving member for moving the second transmittance adjusting member, connected to the second transmittance adjusting member; and
a substrate;
laser emitted by the laser enters the movable first transmittance adjusting component and the movable second transmittance adjusting component after the light intensity of the laser is adjusted by the light intensity adjusting component to obtain first coherent light and second coherent light respectively; the first coherent light and the second coherent light interfere on the substrate to form a grating.
In one embodiment, the method further comprises the following steps:
and the filtering and beam expanding component is positioned between the light intensity adjusting component and the transmittance adjusting component and is used for filtering and expanding the laser after the light intensity is adjusted.
In one embodiment, the method further comprises the following steps:
and the light beam collimation component is positioned between the filtering and beam expanding component and the transmittance adjusting component and is used for collimating the laser subjected to filtering and beam expanding.
In one embodiment, the method further comprises the following steps:
a reflection member disposed at right angle to the substrate for reflecting the coherent light passed through the transmittance adjustment member to the substrate;
the transmittance distribution of the first transmittance adjustment member and the transmittance distribution of the second transmittance adjustment member are mirror images of each other.
In one embodiment, the method further comprises the following steps:
a rotating member connected to the substrate and the reflecting member, respectively;
the intersection line of the substrate and the reflecting component coincides with the rotating shaft of the rotating component and is used for changing the included angle between the first coherent light and the second coherent light.
In one embodiment, the intersection of the substrate and the reflecting member intersects the central axis of the laser.
In one embodiment, the method further comprises the following steps:
and a light shielding member connected to the first transmittance adjustment member and the second transmittance adjustment member, respectively.
In one embodiment, the method further comprises the following steps:
the spectroscope is positioned between the light intensity adjusting component and the filtering and beam expanding component and is used for dividing the laser with the adjusted light intensity into a first laser and a second laser;
the filter beam expanding component comprises a first filter beam expanding component and a second filter beam expanding component, and the light beam collimation component comprises a first light beam collimation component and a second light beam collimation component; the transmittance distribution of the first transmittance adjustment member is the same as the transmittance distribution of the second transmittance adjustment member;
the first laser enters the first transmittance adjusting component after sequentially passing through the first filtering and beam expanding component and the first light beam collimating component, and the second laser enters the second transmittance adjusting component after sequentially passing through the second filtering and beam expanding component and the second light beam collimating component.
In one embodiment, the method further comprises the following steps:
the reflecting component is positioned between the spectroscope and the filtering and beam expanding component;
the first laser is reflected by the reflecting component and enters the first filtering and beam expanding component, and the second laser is reflected by the reflecting component and enters the second filtering and beam expanding component.
In one embodiment, the reflective member comprises:
a first reflecting member, a second reflecting member, and a third reflecting member;
the first laser is reflected by the first reflecting part and enters the first filtering and beam expanding part;
the second laser is reflected by the second reflecting part and then reflected by the third reflecting part to enter the second filtering and beam expanding part.
In one embodiment, the central axis of the first laser beam passing through the first beam collimating component and the central axis of the second laser beam passing through the second beam collimating component are located at the center of the substrate.
The holographic grating manufacturing device comprises a laser used for emitting laser, a light intensity adjusting component used for adjusting light intensity, a transmittance adjusting component used for adjusting the transmittance of the laser, a moving component used for moving the transmittance adjusting component and a substrate, and can manufacture gratings with adjustable distribution of the occupied width ratio and realize the modulation of diffraction performance of different areas of the gratings.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the description below are only some embodiments of the present invention, and it is obvious for those skilled in the art that other drawings can be obtained based on these drawings without creative efforts.
FIG. 1 is a schematic diagram of the fabrication of a holographic grating;
FIG. 2 is a schematic view of a substrate covered with an exposed photoresist layer;
FIG. 3 is a schematic view of a relief grating;
FIG. 4 is a cross-sectional view of a grating structure;
FIG. 5 is a schematic view of a holographic grating fabricating apparatus according to a first embodiment of the present invention;
FIG. 6 is a schematic view of a holographic grating fabricating apparatus according to a second embodiment of the present invention;
FIG. 7 is a schematic view of a holographic grating fabricating apparatus according to a third embodiment of the present invention;
FIG. 8 isbase:Sub>A sectional view taken along line A-A of one of the transmittance adjusting members according to the first embodiment of the present invention;
FIG. 9 isbase:Sub>A sectional view taken along line A-A of another transmittance adjusting member according to the first embodiment of the present invention;
FIG. 10 is a cross-sectional view of a substrate B-B corresponding to one of the transmittance adjustment members according to the first embodiment of the present invention;
FIG. 11 is a sectional view of a substrate B-B corresponding to another transmittance adjustment member according to the first embodiment of the present invention;
FIG. 12 isbase:Sub>A sectional view taken along line A-A ofbase:Sub>A transmittance adjusting member according tobase:Sub>A second embodiment of the present invention;
FIG. 13 is a cross-sectional view of a substrate B-B corresponding to a transmittance adjusting member according to a second embodiment of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
As will be appreciated by one skilled in the art, embodiments of the present invention may be embodied as a system, apparatus, device, method, or computer program product. Accordingly, the present disclosure may be embodied in the form of: entirely hardware, entirely software (including firmware, resident software, micro-code, etc.), or a combination of hardware and software.
The terms involved in the present invention are explained as follows:
exposure amount: the integral of the intensity of the interference fringes received by the substrate over time represents the sum of the intensities of the interference fringes received by the substrate within a certain time.
The duty ratio is as follows: one parameter describing the grating micro-topography. Figure 4 is a cross-sectional view of a grating structure. As shown in fig. 4, the aspect ratio refers to the ratio of the width of a grating line to the width of one grating period.
In view of the problems of nonuniform exposure distribution and difficult adjustment of the conventional grating manufacturing device, the embodiment of the invention provides a holographic grating manufacturing device, which utilizes a movable transmittance adjusting component and variable laser intensity to change the exposure distribution along with the change of positions in the exposure process; because the moving mode of the transmittance adjusting component and the change of the laser intensity can be accurately controlled, the grating with the duty ratio distribution changing along with the position change according to specific expectation can be obtained. Therefore, the invention can manufacture the holographic grating with the width occupying ratio adjustable along with the position distribution by modulating the exposure distribution, and realize the modulation of the diffraction performance of different areas of the grating. The present invention will be described in detail below with reference to the accompanying drawings.
FIG. 5 is a schematic diagram of a holographic grating fabrication apparatus according to a first embodiment of the present invention. FIG. 6 is a schematic diagram of a holographic grating fabricating apparatus according to a second embodiment of the present invention. FIG. 7 is a schematic diagram of a holographic grating fabricating apparatus according to a third embodiment of the present invention. As shown in fig. 5 to 7, the holographic grating fabricating apparatus includes:
a laser (611, 911 or 811) for emitting laser light; coherent light to form a holographic exposure is emitted by a laser. The beam emitted by a typical laser is a gaussian beam that is expanded and collimated to remain a gaussian beam. The intensity of a gaussian beam decreases as a gaussian function from the center of the beam to the periphery.
A light intensity adjusting member (601, 901 or 801) for adjusting light intensity;
a transmittance adjusting member for adjusting the transmittance of the laser beam; wherein the transmittance adjustment member comprises a first transmittance adjustment member (604A, 904A or 807A) and a second transmittance adjustment member (604B, 904B or 807B), the transmittance distribution of the first transmittance adjustment member being the same as or a mirror image of the transmittance distribution of the second transmittance adjustment member (604A and 604B are mirror images, 904A and 904B are mirror images, and 807A and 807B are the same); the transmittance adjusting component can adopt a special-shaped diaphragm and a light shielding plate with any shape or an attenuation sheet with any shape and any transmittance distribution.
A first moving member (606A, 905A or 806A) for moving the first transmittance adjustment member, connected to the first transmittance adjustment member;
a second moving member (606B, 905B or 806B) for moving the second transmittance adjustment member, the second moving member being connected to the second transmittance adjustment member; and
a substrate (607, 906, or 808).
Laser emitted by the laser enters the movable first transmittance adjusting component and the movable second transmittance adjusting component after the light intensity of the laser is adjusted by the light intensity adjusting component to obtain first coherent light and second coherent light respectively; the first coherent light and the second coherent light interfere on the substrate to form a grating.
In one embodiment, the holographic grating manufacturing apparatus further includes:
a filter and beam expanding component (602, 902, 804A or 804B) positioned between the light intensity adjusting component and the transmittance adjusting component and used for filtering and expanding the laser light after the light intensity is adjusted;
and a beam collimating component (603, 903, 805A or 805B) positioned between the filtered beam expanding component and the transmittance adjusting component and used for collimating the filtered and expanded laser.
As shown in fig. 5 and 6, the first and second embodiments of the hologram grating fabricating apparatus further include a reflecting member (608 or 907) disposed at right angles to the substrate, for reflecting the coherent light passing through the transmittance adjusting member to the substrate. The intersection line of the substrate and the reflecting member intersects the central axis of the laser beam. In the first and second embodiments, the transmittance distribution of the first transmittance adjustment member and the transmittance distribution of the second transmittance adjustment member are mirror images of each other.
As shown in fig. 5 and 6, the first and second embodiments of the holographic grating fabricating apparatus further include a rotating member (612 or 912) connected to the substrate (607 or 906) and the reflecting member (608 or 907), respectively; the intersection line of the substrate and the reflecting component is superposed with the rotating shaft of the rotating component and is used for changing the included angle between the first coherent light and the second coherent light so as to change the period of grating manufacture.
As shown in fig. 5, the first embodiment of the holographic grating fabricating apparatus further includes: and a light shielding member 605 connected to the first transmittance adjustment member 604A and the second transmittance adjustment member 604B, respectively.
The first embodiment of the invention is used for compensating the Gaussian beam light intensity distribution to obtain the grating with uniform or certain distribution ratio. As shown in fig. 5, the first embodiment includes:
a laser 611 for emitting laser light;
a light intensity adjusting member 601 for adjusting light intensity;
a transmittance adjusting member for adjusting the transmittance of the laser beam; the transmittance adjusting member may be a special-shaped diaphragm, and includes a first transmittance adjusting member 604A and a second transmittance adjusting member 604B. FIG. 8 isbase:Sub>A sectional view taken along line A-A of one of the transmittance adjusting members according to the first embodiment of the present invention; as shown in fig. 8, the light transmission region 609A of the first transmittance adjustment member 604A and the light transmission region 609B of the second transmittance adjustment member 604B are mirror images of each other. Fig. 9 isbase:Sub>A sectional view taken along the linebase:Sub>A-base:Sub>A of another transmittance adjustment member according to the first embodiment of the present invention. As shown in fig. 9, the light transmission region 709A of the first transmittance adjustment member 604A and the light transmission region 709B of the second transmittance adjustment member 604B are mirror images of each other.
A foldable light shielding member 605 connected to the first transmittance adjustment member 604A and the second transmittance adjustment member 604B, respectively;
a first moving member 606A for moving the first transmittance adjustment member 604A, connected to the first transmittance adjustment member 604A;
a second moving member 606B for moving the second transmittance adjustment member 604B, connected to the second transmittance adjustment member 604B;
a filter and beam expanding component 602 located between the light intensity adjusting component 601 and the transmittance adjusting component, for performing filter and beam expansion on the laser light after the light intensity is adjusted;
a beam collimating component 603 between the filtering and beam expanding component 602 and the transmittance adjusting component, for collimating the filtered and expanded laser;
a substrate 607 coated with a photosensitive material;
a reflecting member 608 provided at right angle to the substrate 607 for reflecting the coherent light beam passing through the transmittance adjusting member to the substrate 607, wherein an intersection line of the substrate 607 and the reflecting member 608 intersects with a central axis of the laser beam; and
a rotating member 612 connected to the substrate 607 and the reflecting member 608, respectively; the intersection line of the substrate 607 and the reflective member 608 coincides with the rotation axis of the rotating member 612, and is used for changing the included angle between the first coherent light and the second coherent light to change the period of grating fabrication.
FIG. 10 is a cross-sectional view of a substrate B-B corresponding to one transmittance adjustment member in the first embodiment of the present invention. As shown in fig. 10, a region 610 exposed by the light beam passing through the transmittance adjusting member shown in fig. 8 exists on the substrate 607.
Taking fig. 10 as an example, in the exposure process, the first moving part 606A drives the first transmittance adjustment part 604A, and the second moving part 606B drives the second transmittance adjustment part 604B to move from the middle to both sides at the same speed so as to ensure that the two portions of the light beams forming the interference fringes are overlapped in the area irradiating the substrate 607, and simultaneously, the light intensity adjustment part 601 gradually increases the overall light intensity of the light beams. Therefore, the exposure time at any point on the substrate 607 is equal to the width of the light-transmitting region 609A or 609B at the point corresponding to the height divided by the moving speed of the moving member.
From the shape of the exposed region 610 of the substrate 607, the exposure time in the middle region in the longitudinal direction is shorter than that in the upper and lower regions. Since the light intensity of the central portion is greater than the light intensities of the upper and lower portions due to the gaussian distribution of the beam intensity, the unevenness of the exposure amount in the longitudinal direction can be offset. In the lateral direction, the right side of the substrate 607 is closer to the center of the light beam due to the gaussian distribution of the intensity of the light beam, the light intensity is stronger, the exposure region 610 moves leftward as the diaphragm moves to both sides, the used light beam portion is gradually away from the center of the light beam, the light intensity is weaker than the center, but at the same time, the trend of the gradual decrease of the exposure amount in the lateral direction is also offset because the overall light intensity is increased by the light intensity adjusting member 601. In conclusion, the phenomenon of uneven light intensity in two directions is compensated, and the obtained total exposure distribution is more uniform, so that the grating with more uniform occupation-to-width ratio can be formed.
Fig. 11 is a cross-sectional view of a substrate B-B corresponding to another transmittance adjustment member according to the first embodiment of the present invention. As shown in fig. 11, a region 710 exposed by the light beam passing through the transmittance adjusting member shown in fig. 9 exists on the substrate 607.
Taking fig. 11 as an example, in the exposure process, the first moving part 606A drives the first transmittance adjustment part 604A, and the second moving part 606B drives the second transmittance adjustment part 604B to move from the middle to both sides at the same speed so as to ensure that the two portions of the light beams forming the interference fringes are overlapped in the area irradiating the substrate 607, and simultaneously, the light intensity adjustment part 601 gradually reduces the overall light intensity of the light beams. As the transmittance adjustment member moves to both sides, the exposure region 710 moves to the left.
According to the shape of the exposed area 710 of the substrate 607, the exposure on the substrate 607 is distributed in a decreasing manner from the lower right to the upper left, so that the occupied width ratio of the formed grating is distributed in a decreasing manner from the lower right to the upper seat, the form of the grating which can be manufactured is enriched, the grating which is distributed according to a certain form can be manufactured, and more grating performances are realized.
The second embodiment of the invention is used for compensating the light intensity distribution of the Gaussian beam to obtain the grating with uniform aspect ratio. As shown in fig. 6, the second embodiment includes:
a laser 911 for emitting laser light;
a light intensity adjusting part 901 for adjusting light intensity;
a transmittance adjusting member for adjusting the transmittance of the laser beam; the transmittance adjusting member may be a light shielding plate, and includes a first transmittance adjusting member 904A and a second transmittance adjusting member 904B. FIG. 12 isbase:Sub>A sectional view taken along line A-A ofbase:Sub>A transmittance adjusting member according tobase:Sub>A second embodiment of the present invention; as shown in fig. 12, the first transmittance adjustment member 904A and the second transmittance adjustment member 904B are mirror images of each other, and the light-shielding region of the first transmittance adjustment member 904A and the light-shielding region of the second transmittance adjustment member 904B are also mirror images of each other.
A first moving member 905A for moving the first transmittance adjustment member 904A, connected to the first transmittance adjustment member 904A;
a second moving member 905B for moving the second transmittance adjustment member 904B, the second moving member being connected to the second transmittance adjustment member 904B;
a filter and beam expanding component 902 located between the light intensity adjusting component 901 and the transmittance adjusting component, for performing filter and beam expansion on the laser light after the light intensity is adjusted;
a beam collimating component 903 positioned between the filter beam expanding component 902 and the transmittance adjusting component and used for collimating the filtered and expanded laser;
a substrate 906 coated with a photosensitive material coating layer;
a reflecting member 907 provided at right angles to the substrate 906 and reflecting the coherent light beam having passed through the transmittance adjusting member to the substrate 906, wherein an intersection line of the substrate 906 and the reflecting member 907 intersects a central axis of the laser beam; and
a rotating member 912 connected to the substrate 906 and the reflecting member 907; the intersection line of the substrate 906 and the reflecting member 907 coincides with the rotation axis of the rotating member 912, and is used for changing the included angle between the first coherent light and the second coherent light so as to change the grating manufacturing period.
FIG. 13 is a cross-sectional view of a substrate B-B corresponding to a transmittance adjusting member according to a second embodiment of the present invention. As shown in fig. 13, a region 908 exposed by the light beam passing through the transmittance adjustment member shown in fig. 12 exists on the substrate 906.
Taking fig. 12 as an example, during the exposure process, the first moving part 905A drives the first transmittance adjusting part 904A, and the second moving part 905B drives the second transmittance adjusting part 904B to move from the middle to both sides at the same speed so as to ensure that the two light beams forming the interference fringes are overlapped in the area of the irradiation substrate 906, and simultaneously, the light intensity adjusting part 601 gradually reduces the overall light intensity of the light beams. Therefore, the exposure time at any point on the substrate 906 is the total exposure time minus the width of the first or second transmittance adjustment member 904A or 904B at the corresponding height divided by the moving speed of the moving member.
From the shape of the exposed region 908 of the substrate 906, the exposure time in the middle region in the longitudinal direction is shorter than in the upper and lower regions. Since the light intensity of the middle portion is greater than the light intensities of the upper and lower portions due to the gaussian distribution of the beam intensity, the unevenness of the exposure amount in the longitudinal direction can be offset. In the lateral direction, the right side of the substrate 906 in fig. 13 is closer to the center of the light beam due to the gaussian distribution of the light beam intensity, the light intensity is stronger, and as the light shielding plate moves to both sides, the overall light intensity is reduced by the light intensity adjusting member 901, and therefore the tendency that the exposure amount is gradually decreased in the lateral direction is also offset. In conclusion, the phenomenon of uneven light intensity in two directions is compensated, and the obtained total exposure distribution is more uniform, so that the grating with more uniform occupation-to-width ratio can be formed.
As shown in fig. 7, the third embodiment of the holographic grating fabricating apparatus includes:
a laser 811 for emitting laser light;
a light intensity adjusting member 801 for adjusting light intensity;
a transmittance adjusting member for adjusting the transmittance of the laser beam; the transmittance adjusting member may be a special-shaped aperture, and includes a first transmittance adjusting member 807A and a second transmittance adjusting member 807B. The light-transmitting region (transmittance distribution) of the first transmittance adjusting member 807A is the same as the light-transmitting region (transmittance distribution) of the second transmittance adjusting member 807B;
a first moving member 806A for moving the first transmittance adjustment member 807A, connected to the first transmittance adjustment member 807A;
a second moving member 806B for moving the second transmittance adjustment member 807B, connected to the second transmittance adjustment member 807B;
a beam splitter 802 located between the light intensity adjusting component 801 and the filtering and beam expanding component, and configured to split the laser light with the adjusted light intensity into a first laser light and a second laser light;
a reflecting member for adjusting the direction of the light beam, which is located between the beam splitter 802 and the filtered beam expanding member, and includes a first reflecting member 803A, a second reflecting member 803B, and a third reflecting member 803C; the first laser is reflected by the first reflecting part 803A and enters the first filter and beam expanding part 804A, and the second laser is reflected by the second reflecting part 803B and then reflected by the third reflecting part 803C and enters the second filter and beam expanding part 804B;
the first filtering and beam expanding component 804A is positioned between the light intensity adjusting component 801 and the first transmittance adjusting component 807A and is used for filtering and expanding the first laser light with the adjusted light intensity;
a second filter and beam expanding component 804B located between the light intensity adjusting component 801 and the second transmittance adjusting component 807B, for filtering and expanding the second laser light after the light intensity is adjusted;
a first beam collimating component 805A located between the first filtered beam expanding component 804A and the first transmittance adjusting component 807A, and configured to collimate the filtered and expanded first laser light;
a second beam collimating component 805B located between the second filtered and expanded beam component 804B and the second transmittance adjusting component 807B, and configured to collimate the filtered and expanded second laser beam;
the first laser sequentially passes through the first filter beam expanding component 804A and the first light beam collimating component 805A and then enters the first transmittance adjusting component 806A, and the second laser sequentially passes through the second filter beam expanding component 804B and the second light beam collimating component 805B and then enters the second transmittance adjusting component 806B, so that two coherent wide light beams with a certain included angle can be obtained; and
a substrate 808 coated with a photosensitive material; the central axes of the first laser beam passing through the first beam collimator 805A and the second laser beam passing through the second beam collimator 805B are located at the center of the substrate 808. In order to ensure that the areas of the two interference light irradiation substrates 808, which form interference fringes, coincide, the first moving member 806A and the second moving member 806B move in the same direction at the same speed, not in the opposite direction.
In summary, the holographic grating manufacturing apparatus provided in the embodiment of the present invention has the following beneficial effects:
(1) The exposure distribution during the holographic grating manufacturing is modulated through the modulation effect of the light intensity adjusting part and the movable transmittance adjusting part on the exposure, the different duty ratios of the formed grating in different areas are further adjusted, and then different diffraction performances are realized at different positions of the same grating; or the influence of the original uneven exposure light intensity is counteracted, and the grating with more uniform occupation-to-width ratio is obtained;
(2) Compared with the existing holographic grating manufacturing technology, no additional new preparation step is added, the modulation of the aspect ratio is completed in the exposure process, and the manufacturing cost of the grating is not additionally increased.
The above-mentioned embodiments, which further illustrate the objects, technical solutions and advantages of the present invention in detail, it should be understood that the above-mentioned embodiments are only examples of the present invention, and are not intended to limit the scope of the present invention, and any modifications, equivalents, improvements, etc. (such as any regular light intensity adjustment, any form of transmittance adjustment component (including but not limited to any shape of special-shaped diaphragm, any shape of light-shielding plate, any shape or any transmittance distribution attenuation sheet) and any change of the moving speed of the moving component driving the transmittance adjustment component) made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (7)
1. A holographic grating fabrication apparatus, comprising:
a laser for emitting laser light;
a light intensity adjusting member for adjusting light intensity;
a transmittance adjusting member for adjusting the transmittance of the laser beam; wherein the transmittance adjustment member includes a first transmittance adjustment member and a second transmittance adjustment member, and a transmittance distribution of the first transmittance adjustment member and a transmittance distribution of the second transmittance adjustment member are mirror images of each other;
a first moving member for moving the first transmittance adjustment member, the first moving member being connected to the first transmittance adjustment member;
a second moving member for moving the second transmittance adjustment member, the second moving member being connected to the second transmittance adjustment member; and
a substrate;
the laser emitted by the laser enters the first movable transmittance adjusting component and the second movable transmittance adjusting component after the light intensity of the laser is adjusted by the light intensity adjusting component to respectively obtain first coherent light and second coherent light; the first coherent light and the second coherent light interfere on the substrate to form a grating;
wherein, the transmittance adjusting component is an abnormal diaphragm or a light screen;
when the transmittance adjusting component is the special-shaped diaphragm, the first moving component drives the first transmittance adjusting component, the second moving component drives the second transmittance adjusting component to move from the middle to the two sides at the same speed at a constant speed so as to ensure that the two light beams forming interference fringes are overlapped in the area irradiating the substrate, and meanwhile, the light intensity adjusting component gradually increases the overall light intensity of the light beams, so that the exposure time of any point on the substrate is equal to the width of the light transmission area of the transmittance adjusting component at the corresponding height divided by the moving speed of the moving component; the light intensity of the middle part of the light beam with the light beam intensity in Gaussian distribution is larger than that of the upper part and the lower part, the exposure time of the middle area in the longitudinal direction is shorter than that of the upper area and the lower area by setting the shape of the light transmission area of the transmittance adjusting part, the right side of the substrate is closer to the center of the light beam due to the Gaussian distribution of the light beam intensity in the transverse direction, the light intensity is stronger, the exposure area moves leftwards along with the movement of the transmittance adjusting part to two sides, the used light beam part is gradually far away from the center of the light beam, the light intensity is weaker than the center, meanwhile, the light intensity adjusting part gradually increases the whole light intensity of the light beam to offset the trend that the exposure amount is gradually weakened in the transverse direction, uniform total exposure amount distribution is obtained, and a grating with uniform occupation-width ratio is formed; or
When the transmittance adjusting component is the shading plate, the first moving component drives the first transmittance adjusting component, the second moving component drives the second transmittance adjusting component to move towards two sides at the same speed from the middle at a constant speed so as to ensure that two parts of light beams forming interference fringes coincide in an area irradiating the substrate, and meanwhile, the light intensity adjusting component gradually reduces the overall light intensity of the light beams, so that the exposure time of any point on the substrate is the total exposure time, and the width of the transmittance adjusting component at the corresponding height is subtracted by the moving speed of the moving component; the light intensity of the middle part of the light beam with the light beam intensity in Gaussian distribution is larger than that of the upper part and the lower part, the exposure time of the middle area in the longitudinal direction is shorter than that of the upper area and the lower area by the shape of the light transmission area of the transmittance adjusting part, the right side of the substrate is closer to the center of the light beam due to the Gaussian distribution of the light beam intensity in the transverse direction, the light intensity is stronger, the projection of the transmittance adjusting part on the substrate moves leftwards along with the movement of the transmittance adjusting part towards two sides, and meanwhile, the light intensity adjusting part gradually reduces the whole light intensity of the light beam to offset the trend of gradually weakening of the exposure in the transverse direction, so that uniform total exposure distribution is obtained, and a grating with a uniform occupying-width ratio is formed.
2. The holographic grating fabrication apparatus of claim 1, further comprising:
and the filtering and beam expanding component is positioned between the light intensity adjusting component and the transmittance adjusting component and is used for filtering and expanding the laser after the light intensity is adjusted.
3. The holographic grating fabrication apparatus of claim 2, further comprising:
and the light beam collimation component is positioned between the filtering and beam expanding component and the transmittance adjusting component and is used for collimating the laser subjected to filtering and beam expanding.
4. The holographic grating fabrication apparatus of claim 3, further comprising:
and the reflecting component is arranged at a right angle with the substrate and is used for reflecting the coherent light passing through the transmittance adjusting component to the substrate.
5. The holographic grating fabrication apparatus of claim 4, further comprising:
a rotating member connected to the substrate and the reflecting member, respectively;
and the intersection line of the substrate and the reflecting component coincides with the rotating shaft of the rotating component and is used for changing the included angle between the first coherent light and the second coherent light.
6. The holographic grating fabrication apparatus of claim 4, wherein an intersection of the substrate and the reflection member intersects a central axis of the laser light.
7. The holographic grating fabrication apparatus of claim 3, further comprising:
and a light shielding member connected to the first transmittance adjustment member and the second transmittance adjustment member, respectively.
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| CN102636968A (en) * | 2012-05-08 | 2012-08-15 | 上海理工大学 | Holographic exposure device of any groove grating structure and exposure method thereof |
| CN104101928A (en) * | 2014-07-25 | 2014-10-15 | 上海理工大学 | Beam splitter with continuous splitting ratios |
| CN107632334A (en) * | 2016-07-18 | 2018-01-26 | 北京灵犀微光科技有限公司 | The preparation system and method for Holographically polymer dispersed liquid crystal grating |
| CN109270615A (en) * | 2018-11-21 | 2019-01-25 | 京东方科技集团股份有限公司 | The preparation system and preparation method of optical grating construction |
| CN214310957U (en) * | 2021-03-29 | 2021-09-28 | 奥提赞光晶(山东)显示科技有限公司 | Holographic grating preparation system |
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| KR20020049493A (en) * | 2000-12-19 | 2002-06-26 | 박호군 | Method and device to fabricate holographic gratings with large area uniformity |
| TWI596448B (en) * | 2016-05-12 | 2017-08-21 | 國立中山大學 | Interference lithography device with flat-top intensity profile |
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| CN102636968A (en) * | 2012-05-08 | 2012-08-15 | 上海理工大学 | Holographic exposure device of any groove grating structure and exposure method thereof |
| CN104101928A (en) * | 2014-07-25 | 2014-10-15 | 上海理工大学 | Beam splitter with continuous splitting ratios |
| CN107632334A (en) * | 2016-07-18 | 2018-01-26 | 北京灵犀微光科技有限公司 | The preparation system and method for Holographically polymer dispersed liquid crystal grating |
| CN109270615A (en) * | 2018-11-21 | 2019-01-25 | 京东方科技集团股份有限公司 | The preparation system and preparation method of optical grating construction |
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