CN102636968A - Holographic exposure device of any groove grating structure and exposure method thereof - Google Patents
Holographic exposure device of any groove grating structure and exposure method thereof Download PDFInfo
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Abstract
The invention discloses a holographic exposure device of any groove grating structure and an exposure method thereof. The device comprises a laser and a main beam splitter, wherein a beam emitted by the laser is divided into a plurality of beams of light paths through the main beam splitter; each beam of light path passes through a sub-exposure unit; and the sub-exposure unit comprises an adjustable optical attenuator, a beam splitter, a first reflector, a second reflector, a first collimating beam expander, a second collimating beam expander, a rotary platform, piezoelectric ceramic and a driver, a microscope objective set, a CCD (Charge Coupled Device) receiver and a driving circuit, a data acquisition card and a computer. According to the holographic exposure device and the exposure method thereof, holographic manufacturing of any groove grating can be realized by using the idea of Fourier decomposition. A CCD is arranged in the device, so that a vibration drift condition of an interference fringe can be reflected in real time, the piezoelectric ceramic is driven thereby, the locking of the interference fringe is realized, the influence of fringe jitter on long-term exposure is avoided, meanwhile, the phase of each group of interference fringes is accurately controlled according to information on the interference fringes after beam expansion, and matching and superposing of a plurality of groups of interference fringes are realized.
Description
Technical field
The present invention relates to a kind of holographic exposure device, relate in particular to a kind of holographic exposure device of any flute profile optical grating construction that is the basis with the synthetic exposure of Fourier; Simultaneously, the invention still further relates to the holographic exposure method of the holographic exposure device of above-mentioned any flute profile optical grating construction.
Background technology
Diffraction grating is a light-splitting device the most frequently used in the spectral instrument, generally can be divided into ruling grating and holographic grating according to method for making.Ruling grating is to use the adamas icking tool, and the mode through non-cutting depicts a lot of flute profile on the grating base base of aluminium film being coated with, and forms grating, and the angle of adamas icking tool has determined the flute profile of ruling grating.Depicting master grating by optical grating graduating machine needs the very long delineation time, wants round the clock several usually, therefore very high to environment constant temperature, vibrationproof system requirements, otherwise the destruction that the vibration of material coefficient of thermal expansion and machinery all will cause flute profile, reduces the quality of grating.The grating overwhelming majority that present domestic spectrum uses is that external grating mother matrix duplicates and forms, and the manufacturing technology of mother matrix be external several companies monopolize always.
Holographic grating because of make fast, low-cost, characteristics such as environmental requirement is low have been obtained widespread use.Yet holographic grating adopts the parallel Light Interference Streaks of two bundles to come photoresist is made public usually, and the flute profile that therefore produces is generally sinusoidal pattern.Sinusoidal pattern grating diffration efficient concentrates on Zero-order diffractive and positive and negative first-order diffraction usually, does not have sparkle effect, uses level inferior low, is unfavorable for that the beam split of spectral instrument is used.Therefore, use the method for holographic exposure to produce non-sinusoidal blazed grating and will have very high practical value and innovative significance.
The device of the locking of interference fringe in a kind of holographic exposure process has been proposed among the Chinese invention patent CN200610039967.6; Yet this device will use one with reference to grating; Observation interference fringe and judge with reference to the Moire fringe between the grating and the jitter conditions of interference fringe to belong to indirect measurement; In addition, be placed on the experiment porch optical interference circuit with vibrate simultaneously with reference to grating, so Moire fringe shake and not obvious can not reflect the actual jitter situation of interference fringe well.
Summary of the invention
Technical matters to be solved by this invention is: a kind of holographic exposure device of any flute profile optical grating construction is provided, and multi-pass capable of using makes public simultaneously, reaches the effect of interference fringe stack.
In addition, the present invention also provides the holographic exposure method of the holographic exposure device of above-mentioned any flute profile optical grating construction, and multi-pass capable of using makes public simultaneously, reaches the effect of interference fringe stack.
For solving the problems of the technologies described above, the present invention adopts following technical scheme:
A kind of holographic exposure device of any flute profile optical grating construction, said device comprise laser instrument, main beam splitter; The laser instrument emitted light beams is divided into some beam optical paths through main beam splitter, and every beam optical path is all through a sub-exposing unit;
Said sub-exposing unit comprises adjustable optical attenuator, beam splitter, first catoptron, second catoptron, the first collimator and extender mirror, the second collimator and extender mirror, rotation platform, piezoelectric ceramics and driver, microcobjective group, CCD receiver and driving circuit, data collecting card and computing machine;
Light beam at first is divided into equal strength two-beam road d, e through behind the beam splitter through adjustable attenuator again; Light path d, e light beam form certain included angle through after being fixed on first catoptron on the rotation platform and being fixed on second catoptron on the piezoelectric ceramics respectively; Form the parallel beam of wide aperture then respectively through the first collimator and extender mirror, the second collimator and extender mirror, and produce interference fringe on grating base base surface; Place the microcobjective group in back, grating base base surface, make grating base base surface overlap, then the CCD receiver is placed on the focal plane, picture side of microcobjective group with the object space focal plane of microcobjective group; The CCD receiver sends the signal that collects to computing machine, and cycle, position phase and the strength information of Computer Analysis striped arranged.
As a kind of preferred version of the present invention, the drift value of striped is monitored in the shake of interference fringe on the CCD Observation receiver in real time through algorithm; Convert the drift value of striped to optical path difference; The i.e. required displacement of second catoptron; By computing machine this signal is sent to piezoelectric ceramic actuator again; Control second catoptron front and back displacement that is fixed on the piezoelectric ceramics by piezoelectric ceramic actuator, shake because of the interference fringe that the experiment porch vibration causes in order to compensation.
As a kind of preferred version of the present invention; Display result according to the CCD receiver; Can obtain fringe period with the position mutually; If a certain group of interference fringe that obtains has gap with the interference fringe of expection, then can adjust the angle of first catoptron through rotation platform, thus the cycle of adjusting interference fringe;
The optical path difference that the driving voltage of adjusting piezoelectric ceramics is regulated two-beam, thereby the position phase of adjusting interference fringe; Regulate adjustable attenuator, obtain the fringe intensity that needs; After adjustment is respectively organized interference fringe respectively, the CCD receiver shows will obtain required light distribution, the grating base base that scribbles photoresist is placed on the grating base base surface make public, and develop in the exposure back, the back baking, obtains required non-sinusoidal flute profile grating.
A kind of holographic exposure method of holographic exposure device of above-mentioned any flute profile optical grating construction, said method comprises the steps:
(1) according to the grating flute profile requirement of required preparation, utilize Fourier series to resolve into the stack of some sinusoidal flute profiles non-sinusoidal cycle flute profile;
(2) according to step (1), the emergent light of laser instrument is divided into some beam optical paths, every beam optical path is in order to produce one group of interference fringe; Be provided with adjustable attenuator in the light path of every road, so the intensity of interference fringe is adjustable respectively; The optical path difference in twos that each road light arrives exposure position all surpasses the coherent length of laser instrument, so each road light no longer interferes each other, be merely the stack of light intensity when arriving grating base base surface, but not amplitude superposes;
(3) each light beam is carried out beam splitting once more respectively, each beam optical path is divided into equicohesive two-beam d, e, in order to interfere;
(4) light path d is through being fixed on first catoptron on the rotation platform, and light path e is through being fixed on second catoptron on the piezoelectric ceramics, and the two-way reflected light is respectively through becoming the parallel beam of two beamwidth bores behind the collimator and extender mirror separately;
The intersectional region of (5) two bundle parallel beams is an interference region; High power microcobjective group is placed on the rear of interference fringe; The plane of exposure of guaranteeing interference fringe overlaps with the object space focal plane of microcobjective group; The CCD receiver is placed on the image planes of microcobjective group, by cycle, position phase, the strength information of CCD receiver monitoring interference fringe;
(6) regulate transmissibility of adjustable attenuation piece according to the display message on the CCD receiver, with the intensity of control interference fringe; Rotation platform under the adjustment catoptron is with the cycle of control interference fringe; Regulate the driving voltage of piezoelectric ceramics, i.e. the front and back position of accommodation reflex mirror changing the optical path difference of two-beam, thereby changes the position phase of interference fringe;
(7) because there is low-frequency vibration in experiment porch, so interference fringe also can be shaken influence exposure result thereupon; Therefore the striped wobble information that monitors according to the CCD receiver feeds back to piezoelectric ceramics with the striped wobble information, regulates the length of pottery, thereby the locking interference fringe is avoided the influence of striped shake;
When (8) each group interference fringe being adjusted to perfect condition respectively, demonstrate the light distribution of expection on the CCD receiver; The grating base base that scribbles photoresist is placed on the overlapping regions of organizing interference fringes more, makes public, develop in the exposure back, toast the back, can obtain the optical grating construction of required non-sinusoidal flute profile.
Beneficial effect of the present invention is: the holographic exposure device and the exposure method thereof of any flute profile optical grating construction that the present invention proposes, multi-pass capable of using makes public simultaneously, reaches the effect of interference fringe stack.The present invention has adopted the thought of Fourier decomposition, has realized that the holography method of any flute profile grating is made.Adopt many groups light path to make public simultaneously in the device, reduced Production Time.Be provided with the CCD monitoring system in the device; The vibration drift situation that can reflect interference fringe in real time; And, realized the locking of interference fringe with this signal drive pressure electroceramics, avoided the influence of striped shake to time exposure; Accurately control the position phase of respectively organizing interference fringe according to the interference fringe information that expands after restrainting simultaneously, can realize the coupling stack of many group interference fringes.Whole device realizes that easily very strong feasibility is arranged.
Description of drawings
Fig. 1 is a kind of holographic exposure light path synoptic diagram of any flute profile optical grating construction.
Fig. 2 (a), Fig. 2 (b), Fig. 2 (c) are the surface of intensity distribution (is example with the echelle grating flute profile) after three groups of interference fringes accurately superpose.
Embodiment
Specify the preferred embodiments of the present invention below in conjunction with accompanying drawing.
Embodiment one
The present invention has disclosed the method that a kind of synthetic exposure method is made any flute profile grating; At first according to the thought of Fourier decomposition; The grating flute profile that will synthesize resolves into the algebraic sum of some sinusoidal flute profiles, and each is organized sinusoidal flute profile and all uses one group of interference fringe to make public to realize.If it is approximate to get the sinusoidal flute profile of first three items, then use three groups of interference fringes to come to make public simultaneously in the scheme, obtain the holographic grating of required flute profile after the development.
Fig. 1 makes a kind of light path synoptic diagram of any flute profile grating for synthesizing exposure method, and this figure realizes synthesizing exposure method to make a kind of illustration of the light path of any flute profile grating, does not limit claim of the present invention.The light beam of laser instrument 1 outgoing is divided into a, b, c three road light through behind the beam splitter 2; Three road light will form three groups of interference fringes on grating base base surface 9; And the mutual optical path difference on a, b, c three road light arrival grating base base surface 9 has all surpassed the coherent length of laser instrument; Therefore no longer interfere each other, be merely the stack of light intensity on grating base base surface 9.
Be example with a road light below, the control of cycle, position phase and the intensity of its interference fringe is described.Light beam at first is divided into equal strength two-beam d, e through behind the beam splitter 4 through adjustable attenuator 3 again; D, e light beam form certain included angle through catoptron 6 backs that are fixed on the catoptron 5 on the rotation platform and be fixed on the piezoelectric ceramics respectively; Then separately through collimating and beam expanding system 7 and 8; Form the parallel beam of wide aperture, and produce interference fringe in 9 positions.Microcobjective group 11 is placed in 9 back in the position, makes position 9 overlap with the object space focal plane of microcobjective, then CCD receiver 12 is placed on the focal plane, picture side of microcobjective group 11.CCD receiver 12 sends the signal that collects to computing machine 13, has computing machine 13 to analyze the cycle of striped, position phase and strength information.
With one group of interference fringe is example, and the drift value of striped is monitored in the shake of interference fringe on the CCD Observation receiver 12 in real time through algorithm.Convert the drift value of striped to optical path difference; It is the required displacement of catoptron 6; There is computing machine 13 that this signal is sent to piezoelectric ceramic actuator 10 again; Control the catoptron front and back displacement that is fixed on the piezoelectric ceramics 6 by piezoelectric ceramic actuator 10, thereby compensation reaches the effect of locking interference fringe because of the interference fringe shake that the experiment porch vibration causes.
According to the display result of CCD, can obtain fringe period and position mutually, if the interference fringe of a certain group of interference fringe that obtains and expection has gap, then can be through the angle of rotation platform adjustment catoptron 5, thus the cycle of adjusting interference fringe; The optical path difference that the driving voltage of adjusting piezoelectric ceramics 6 is regulated two-beam, thereby the position phase of adjusting interference fringe; Regulate adjustable attenuator 3, obtain the fringe intensity that needs.After adjusting three groups of interference fringes respectively, CCD shows will obtain required light distribution, the grating base base that scribbles photoresist is placed on the position 9 make public, and develop in the exposure back, the back baking, obtains required non-sinusoidal flute profile grating.
Fig. 2 (a), Fig. 2 (b), Fig. 2 (c) are example with the echelle grating, illustrate the process of its interference fringe stack.Horizontal ordinate is that (unit: millimeter), ordinate is the relative light intensity value to the CCD location of pixels among the figure.(a) be the display result of one group of interference fringe on CCD; (b) be two groups of display result on the interference fringe coupling stack back CCD; (c) be three groups of display result on the interference fringe coupling stack back CCD.
In sum, the holographic exposure device and the exposure method thereof of any flute profile optical grating construction that the present invention proposes have adopted the thought of Fourier decomposition, have realized that the holography method of any flute profile grating is made.Adopt many groups light path to make public simultaneously in the device, reduced Production Time.Be provided with the CCD monitoring system in the device; The vibration drift situation that can reflect interference fringe in real time; And, realized the locking of interference fringe with this signal drive pressure electroceramics, avoided the influence of striped shake to time exposure; Accurately control the position phase of respectively organizing interference fringe according to the interference fringe information that expands after restrainting simultaneously, can realize the coupling stack of many group interference fringes.Whole device realizes that easily very strong feasibility is arranged.
Here description of the invention and application is illustrative, is not to want with scope restriction of the present invention in the above-described embodiments.Here the distortion of the embodiment that is disclosed and change are possible, and the replacement of embodiment is known with the various parts of equivalence for those those of ordinary skill in the art.Those skilled in the art are noted that under the situation that does not break away from spirit of the present invention or essential characteristic, and the present invention can be with other form, structure, layout, ratio, and realize with other assembly, material and parts.Under the situation that does not break away from the scope of the invention and spirit, can carry out other distortion and change here to the embodiment that is disclosed.
Claims (4)
1. the holographic exposure device of any flute profile optical grating construction is characterized in that, said device comprises laser instrument, main beam splitter; The laser instrument emitted light beams is divided into some beam optical paths through main beam splitter, and every beam optical path is all through a sub-exposing unit;
Said sub-exposing unit comprises adjustable optical attenuator, beam splitter, first catoptron, second catoptron, the first collimator and extender mirror, the second collimator and extender mirror, rotation platform, piezoelectric ceramics and driver, microcobjective group, CCD receiver and driving circuit, data collecting card and computing machine;
Light beam at first is divided into equal strength two-beam road d, e through behind the beam splitter through adjustable attenuator again; Light path d, e light beam form certain included angle through after being fixed on first catoptron on the rotation platform and being fixed on second catoptron on the piezoelectric ceramics respectively; Form the parallel beam of wide aperture then respectively through the first collimator and extender mirror, the second collimator and extender mirror, and produce interference fringe on grating base base surface; Place the microcobjective group in back, grating base base surface, make grating base base surface overlap, then the CCD receiver is placed on the focal plane, picture side of microcobjective group with the object space focal plane of microcobjective group; The CCD receiver sends the signal that collects to computing machine, and cycle, position phase and the strength information of Computer Analysis striped arranged.
2. the holographic exposure device of any flute profile optical grating construction according to claim 1 is characterized in that:
The drift value of striped is monitored in the shake of interference fringe on the CCD Observation receiver in real time through algorithm; Convert the drift value of striped to optical path difference; The i.e. required displacement of second catoptron; By computing machine this signal is sent to piezoelectric ceramic actuator again; Control second catoptron front and back displacement that is fixed on the piezoelectric ceramics by piezoelectric ceramic actuator, shake because of the interference fringe that the experiment porch vibration causes in order to compensation.
3. the holographic exposure device of any flute profile optical grating construction according to claim 2 is characterized in that:
According to the display result of CCD receiver, can obtain fringe period and position mutually, if the interference fringe of a certain group of interference fringe that obtains and expection has gap, then can adjust the angle of first catoptron through rotation platform, thus the cycle of adjusting interference fringe;
The optical path difference that the driving voltage of adjusting piezoelectric ceramics is regulated two-beam, thereby the position phase of adjusting interference fringe; Regulate adjustable attenuator, obtain the fringe intensity that needs; After adjustment is respectively organized interference fringe respectively, the CCD receiver shows will obtain required light distribution, the grating base base that scribbles photoresist is placed on the grating base base surface make public, and develop in the exposure back, the back baking, obtains required non-sinusoidal flute profile grating.
4. the holographic exposure method of the holographic exposure device of the described any flute profile optical grating construction of one of claim 1 to 3 is characterized in that, said method comprises the steps:
(1) according to the grating flute profile requirement of required preparation, utilize Fourier series to resolve into the stack of some sinusoidal flute profiles non-sinusoidal cycle flute profile;
(2) according to step (1), the emergent light of laser instrument is divided into some beam optical paths, every beam optical path is in order to produce one group of interference fringe; Be provided with adjustable attenuator in the light path of every road, so the intensity of interference fringe is adjustable respectively; The optical path difference in twos that each road light arrives exposure position all surpasses the coherent length of laser instrument, so each road light no longer interferes each other, be merely the stack of light intensity when arriving grating base base surface, but not amplitude superposes;
(3) each light beam is carried out beam splitting once more respectively, each beam optical path is divided into equicohesive two-beam d, e, in order to interfere;
(4) light path d is through being fixed on first catoptron on the rotation platform, and light path e is through being fixed on second catoptron on the piezoelectric ceramics, and the two-way reflected light is respectively through becoming the parallel beam of two beamwidth bores behind the collimator and extender mirror separately;
The intersectional region of (5) two bundle parallel beams is an interference region; High power microcobjective group is placed on the rear of interference fringe; The plane of exposure of guaranteeing interference fringe overlaps with the object space focal plane of microcobjective group; The CCD receiver is placed on the image planes of microcobjective group, by cycle, position phase, the strength information of CCD receiver monitoring interference fringe;
(6) regulate transmissibility of adjustable attenuation piece according to the display message on the CCD receiver, with the intensity of control interference fringe; Rotation platform under the adjustment catoptron is with the cycle of control interference fringe; Regulate the driving voltage of piezoelectric ceramics, i.e. the front and back position of accommodation reflex mirror changing the optical path difference of two-beam, thereby changes the position phase of interference fringe;
(7) because there is low-frequency vibration in experiment porch, so interference fringe also can be shaken influence exposure result thereupon; Therefore the striped wobble information that monitors according to the CCD receiver feeds back to piezoelectric ceramics with the striped wobble information, regulates the length of pottery, thereby the locking interference fringe is avoided the influence of striped shake;
When (8) each group interference fringe being adjusted to perfect condition respectively, demonstrate the light distribution of expection on the CCD receiver; The grating base base that scribbles photoresist is placed on the overlapping regions of organizing interference fringes more, makes public, develop in the exposure back, toast the back, can obtain the optical grating construction of required non-sinusoidal flute profile.
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| CN103064140A (en) * | 2012-12-26 | 2013-04-24 | 中国科学院长春光学精密机械与物理研究所 | Adjustment method of holographic variable spacing grating exposure light path |
| CN103092003A (en) * | 2013-01-17 | 2013-05-08 | 清华大学 | Laser interference lithography system |
| CN103092002A (en) * | 2013-01-17 | 2013-05-08 | 清华大学 | Laser interference lithography system with pattern locking function |
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| CN108318954B (en) * | 2018-04-09 | 2019-12-27 | 苏州大学 | System and method for manufacturing meter-level grating |
| WO2019222909A1 (en) * | 2018-05-22 | 2019-11-28 | 苏州大学 | Holographic grating lithography system, and adjustment method for self-collimating interference optical path thereof |
| US10838361B2 (en) | 2018-05-22 | 2020-11-17 | Soochow University | Holographic grating lithography system and a method for adjusting the self-collimation of the interference optical path thereof |
| CN108983560A (en) * | 2018-08-29 | 2018-12-11 | 中国科学院光电技术研究所 | A kind of interference lithography system of controllable period and direction |
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| CN113401860A (en) * | 2021-05-25 | 2021-09-17 | 杭州电子科技大学 | Self-radiating chip and temperature measuring device and method thereof |
| CN113514913A (en) * | 2021-07-12 | 2021-10-19 | 清华大学深圳国际研究生院 | Preparation method of large-area grating |
| CN113514913B (en) * | 2021-07-12 | 2023-09-22 | 清华大学深圳国际研究生院 | Preparation method of large-area grating |
| CN114966930A (en) * | 2022-08-02 | 2022-08-30 | 北京至格科技有限公司 | Holographic grating making device |
| CN114966930B (en) * | 2022-08-02 | 2022-11-04 | 北京至格科技有限公司 | Holographic grating manufacturing device |
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