CN103092003A - Laser interference lithography system - Google Patents
Laser interference lithography system Download PDFInfo
- Publication number
- CN103092003A CN103092003A CN2013100178118A CN201310017811A CN103092003A CN 103092003 A CN103092003 A CN 103092003A CN 2013100178118 A CN2013100178118 A CN 2013100178118A CN 201310017811 A CN201310017811 A CN 201310017811A CN 103092003 A CN103092003 A CN 103092003A
- Authority
- CN
- China
- Prior art keywords
- light
- photodetector
- reflection
- bundle
- incident
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Abstract
The invention relates to a laser interference lithography system for fabricating a large-area grating. The system comprises a laser, a reflector, a beam splitter, a substrate stage and the like. A laser beam emitted by the laser passes through the reflector and the beam splitter to be split into two interference beams; the interference beams are reflected by the reflector to realize coherence on a substrate supported on the substrate stage; the interference pattern can realize pattern record transfer by exposing the substrate; and the system uses a pattern locking device based on null measurement principle to perform pattern phase locking to prevent pattern drift during exposure. The locking device comprises a null phase meter, an electronic signal processing component, a controller, a driver and a phase modulation executer, wherein the null phase meter is used for measuring pattern drift of the grating; the pattern drift is fed back to the controller through the signal processing component; and the controller controls the phase modulation executer to realize phase locking through the driver. The laser interference lithography system provided by the invention has the advantages of simple structure, high pattern locking accuracy and the like, and is a key system for realizing large-area high-accuracy grating fabrication.
Description
Technical field
The present invention relates to a kind of laser interference lithographic system, particularly a kind of laser interference lithographic system for the large-area grating manufacturing.
Background technology
Laser interference photolithography technology is the important technology that the micro-nano array device is made in a kind of periodic pattern exposure sensitization substrate that utilizes two bundles or multiple laser to interfere generation, be mainly used in characteristic dimension lower than the manufacturing of the devices such as the Kong Zhen of sub-wavelength, dot matrix, post battle array, grating, microlens array, these microarray devices have widespread use in fields such as national defence, the people's livelihood, scientific researches.
In recent years, along with the improving constantly size, moire grids density, accuracy requirement of the crucial grating device in the Important Project such as large-scale astronomical telescope, inertial confinement fusion Laser Ignition System, etching system system, the grating manufacturing strides forward to the magnitude of meter-sized, nano-precision, inferior ten thousand grades of moire grids densities, large tracts of land high precision dense grid line grating manufacture the hot issue of needing solution badly of making the field for grating.The traditional raster manufacturing technology mainly comprises mechanical scratching, laser direct-writing, mechanical splice etc., mechanical scratching exists the grating that the large tracts of land manufacturing accuracy is low, the process-cycle long, make to have the shortcomings such as ghost line, also there are the shortcomings such as the large tracts of land manufacturing accuracy is low, the process-cycle is long in laser direct-writing, the shortcomings such as there is the splicing low precision in mechanical splice, splicing is complicated, cost is expensive, so traditional manufacturing technology is difficult to realize the manufacturing of above-mentioned magnitude grating.Laser interference photolithography technology or holographic lithography have large tracts of land at above-mentioned magnitude grating manufacture view and make the advantages such as the close precision of grid line is high, the process-cycle is short, so laser interference photolithography technology progressively becomes the mainstream technology of large tracts of land high precision grating manufacturing technology.The difficult point that is applicable to the interference photoetching technology of large tracts of land high precision grating manufacturing is the research and development of interference lithography system, and high precision interference lithography system has very large research and development difficulty.For the research and development of high precision interference lithography system, famous grating manufacturing system company and research institution have launched a series of research in the world, and research mainly concentrates on high precision interference lithography system, and achievement in research all has exposure in many patents.
Massachusetts Institute of Technology's US Patent No. 5,142,385 disclose a kind of laser interference lithographic system, this etching system utilizes the large scale light beam of two bundle spatial filter outgoing to form large tracts of land conoscope image exposed substrate and realizes the large-area grating making, and in this system, conoscope image has larger figure nonlinearity erron; Simultaneously, for anti-locking system conoscope image phase drift causes error, this etching system has been enumerated a kind of figure phase locking system and has been used for the raster graphic locking, this device is realized the figure phase-detection by sampling interfering beam to two photodetector and treatment circuit, and the phase feedback of detection to controller control phase modulators modulate phase place realizes the figure locking; Yet the phase measurement in this device easily is disturbed, precision is low, and the phase-modulation speed of electro-optic phase modulator is slow in addition, degree of regulation is low, modulation range is narrow, and this device is difficult to satisfy the requirement of high precision fringe locking.
Massachusetts Institute of Technology (MIT) is in another US Patent No. 6,882, a kind of scan laser interference lithography system is disclosed in 477B1, the substrate that this etching system utilizes the small size beam interference formation conoscope image exposure of two bundles after collimation to do the step-scan campaign realizes the large-area grating making, and the small size beam interference after collimation has effectively been eliminated the phase nonlinear error of conoscope image; Simultaneously, for anti-locking system conoscope image causes error with respect to the substrate platform generation phase drift that moves, this etching system has been enumerated a kind of figure locking device based on the heterodyne measurement principle, this device produces by arrange three acousto-optic modulators in optical interference circuit the frequency difference that heterodyne phase is measured, utilize light beam sampling thief sampling interfering beam to carry out the figure phase-detection to the heterodyne phase meter, the phase feedback of detection to controller is controlled the acousto-optic modulator phase modulation and is realized the figure locking; The figure phase place locking advantage characteristics such as this device has at a high speed, high-precision, but the figure locking device makes the scanning interferometer etching system too complicated, greatly increased the resetting difficulty of system, simultaneously acousto-optic modulator carries out by shift frequency the coherence that phase-modulation causes that easily etching system is interfered the variation of angle and affected interfering beam affects the etching system performance.
Photoelectric Technology Inst., Chinese Academy of Sciences discloses multiple laser interference lithographic system in the Chinese patents such as publication number CN1731283A, CN1690857A, CN1752847A, but all do not have the conoscope image phase locking system in the interference lithography system, this makes disclosed interference lithography system be difficult to realize the making of high precision grating.Changchun Institute of Optics, Fine Mechanics and Physics, CAS discloses light path adjustment and the moire grids density method of adjustment that only discloses Holographical photoetching system in the Chinese patents such as publication number CN1544994A, CN101718884A, CN101793988A, do not find interference system and figure lock-related are discussed.Suzhou Sudaweige Opto-electrical Science Co., Ltd discloses a kind of parallel type interference lithography system in publication number CN101846890 Chinese patent, etching system utilizes grating beam splitting and lens to close light, but also do not have the conoscope image phase locking system in the interference lithography system, so this laser interference lithographic system also is difficult to realize the making of large tracts of land high precision grating.
Consider the limitation of technique scheme, seek a kind of laser interference lithographic system, this etching system has a kind of figure phase locking system based on the homodyne phase measurement, this device can suppress homodyne phase measurement disturbance greatly, realize high speed, high-precision phase measurement and light beam phase-modulation, adopt simultaneously the succinct and phase-modulation of the interference lithography system architecture form of this device not affect the etching system performance, finally realize the lifting of interference lithography entire system performance.
Summary of the invention
The purpose of this invention is to provide a kind of laser interference lithographic system, this interference lithography system can realize very high conoscope image locking precision, and version is succinct, be easy to debug.
Technical scheme of the present invention is as follows:
A kind of laser interference lithographic system comprises laser instrument, catoptron, beam splitter, base station and substrate; Laser instrument 1 emitting laser is divided into two beam interferometer light beams after catoptron, beam splitter, two beam interferometer light beams realize closing the interference of light in the substrate of base station carrying through catoptron, and conoscope image realizes that by exposing substrate graphic recording shifts; It is characterized in that: described system also comprises a figure locking system, and this figure locking system comprises two light beam sampling thiefs, homodyne phasometer, electronic signal process parts, controller, driver and phase-modulation actuator; Described two light beam sampling thiefs lay respectively near on two beam interferometer light paths of bases, two light beam sampling thiefs are taked respectively a part of light on two beam interferometer light paths, wherein a branch of is reference light, another bundle is for measuring light, reference light is incident to the homodyne phasometer from two entrances respectively with measurement light, light signal is after the homodyne phasometer is processed, output comprises the electric signal of interference fringe phase information, electric signal inputs to controller after the electronic signal process parts, controller outputs control signals to driver, driver drives phase-modulation actuator; When drift occurs the figure of interference lithography system, utilize this figure locking system to control pattern drifting and realize the figure locking.
Technical characterictic of the present invention also is: described base station is moved with respect to conoscope image, detect the moving displacement of base station and feed back to controller by the displacement measuring device that is arranged on base station, controller is processed the feedback information of homodyne phasometer and displacement measuring device, and control phase modulation actuator and base station realize that conoscope image is with respect to the base station locking of motion simultaneously.
Measurement light of the present invention and reference light are propagated light path in the homodyne phasometer have following several scheme:
The first: from two entrance incidents of homodyne phasometer, the propagation light path is: measure light a branch of transmission after the first quarter-wave plate, spectroscope, another restraints reflection respectively for measurement light of the present invention and reference light; Reference light a branch of transmission after the second quarter-wave plate, the first spectroscope, another restraints reflection; The transmitted light of measuring reflection of light light and reference light forms the first bundle and closes light, and the reflected light of measuring optical transmission light and reference light forms the second bundle and closes light; The first bundle closes light after the first polarization spectroscope, and the p light of transmission is incident to the first photodetector, and the s light of reflection is incident to the second photodetector; The second bundle closes light after half-wave plate, the second polarization spectroscope, and the p light of transmission is incident to the 3rd photodetector, and the s light of reflection is incident to the 4th photodetector; Form the cosine electric signal of 90 ° of four tunnel phase phasic differences after four photodetector conversions, input to the electronic signal process parts.
The second: from two entrance incidents of homodyne phasometer, the propagation light path is: measure light a branch of transmission after spectroscope, another restraints reflection respectively for measurement light of the present invention and reference light; Reference light is a branch of transmission after spectroscope, and another restraints reflection; The transmitted light of measuring reflection of light light and reference light forms the first bundle and closes light, and the reflected light of measuring optical transmission light and reference light forms the second bundle and closes light; The first bundle closes light after the first quarter-wave plate, the first polarization spectroscope, and the p light of transmission is incident to the first photodetector, and the s light of reflection is incident to the second photodetector; The second bundle closes light after the second quarter-wave plate, the 3rd quarter-wave plate, the second polarization spectroscope, and the p light of transmission is incident to the 3rd photodetector, and the s light of reflection is incident to the 4th photodetector; Form the cosine electric signal of 90 ° of four tunnel phase phasic differences after four photodetector conversions, input to the electronic signal process parts.
The third: from two entrance incidents of homodyne phasometer, the propagation light path is: measure light a branch of transmission after the first half-wave plate, spectroscope, another restraints reflection respectively for measurement light of the present invention and reference light; Reference light is a branch of transmission after the second half-wave plate, spectroscope, and another restraints reflection; The transmitted light of measuring reflection of light light and reference light forms the first bundle and closes light, and the reflected light of measuring optical transmission light and reference light forms the second bundle and closes light; The first bundle closes light after the first polarization spectroscope, and the p light of transmission is incident to the first photodetector, and the s light of reflection is incident to the second photodetector; The second bundle closes light after quarter-wave plate, the second polarization spectroscope, and the p light of transmission is incident to the 3rd photodetector, and the s light of reflection is incident to the 4th photodetector; Form the cosine electric signal of 90 ° of four tunnel phase phasic differences after four photodetector conversions, input to the electronic signal process parts.
The 4th kind: measurement light of the present invention and reference light be respectively from two entrance incidents of homodyne phasometer, propagates light path and be: measure light a branch of transmission after the first quarter-wave plate, spectroscope, another restraints reflection; Reference light a branch of transmission after the second quarter-wave plate, spectroscope, another restraints reflection; The transmitted light of measuring reflection of light light and reference light forms the first bundle and closes light, and the reflected light of measuring optical transmission light and reference light forms the second bundle and closes light; The first bundle closes light and be divided into two bundles after the first Wollaston prism, is incident to respectively the first photodetector and the second photodetector; The second bundle closes light and be divided into two bundles after the second Wollaston prism, is incident to respectively the 3rd photodetector and the 4th photodetector; Form the cosine electric signal of 90 ° of four tunnel phase phasic differences after the conversion of four photodetectors, input to the electronic signal process unit.
The 5th kind: measurement light of the present invention and reference light be respectively from two entrance incidents of homodyne phasometer, propagates light path and be: measure light a branch of transmission after spectroscope, another restraints reflection; Reference light a branch of transmission after spectroscope, another restraints reflection; The transmitted light of measuring reflection of light light and reference light forms the first bundle and closes light, and the reflected light of measuring optical transmission light and reference light forms the second bundle and closes light; The first bundle closes light through analyzer to the first photodetector; The second bundle closes light after quarter-wave plate, polarization spectroscope, and the p light of transmission is incident to the second photodetector, and the s light of reflection is incident to the 3rd photodetector; Form the cosine electric signal of 90 ° of three tunnel phase phasic differences after the conversion of three photodetectors, input to the electronic signal process unit.
The 6th kind: measurement light of the present invention and reference light be respectively from two entrance incidents of homodyne phasometer, propagates light path and be: measure transmission after the light polarization spectroscope, reference light is through the polarization spectroscope back reflection, realizes measuring light, with reference to actinic light; Close light beam and be divided into two bundles after quarter-wave plate, the first spectroscope, a branch of first photodetector that is incident to after the first analyzer wherein, another bundle is after the second spectroscope, a branch of transmission, a branch of reflection, wherein reflected light is incident to the second photodetector after the second analyzer, and transmitted light is incident to the 3rd photodetector after reflecting prism, the 3rd analyzer; Form the cosine electric signal of 90 ° of three tunnel phase phasic differences after the conversion of three photodetectors, input to the electronic signal process unit.
Phase-modulation actuator of the present invention adopts electrooptic modulator, micromotor to drive mirror unit or raster phase modulator.
Raster phase modulator of the present invention adopts the circular grating phase-modulator, and described circular grating phase-modulator comprises circular substrate, circular grating, electric rotating machine and grating positioning device; Circular grating along the circumferential direction is installed on circular substrate, and a circular grating is installed at least; The output shaft of electric rotating machine is connected with circular substrate, and the grating positioning device is installed on circular substrate.
Raster phase modulator of the present invention adopts the rectangular raster phase-modulator, and described rectangular raster phase-modulator comprises rectangular substrate, rectangular raster, linear electric motors and grating positioning device; Rectangular raster is installed on rectangular substrate along its length, and a rectangular raster is installed at least; The mover of linear electric motors or stator are connected with rectangular substrate, and the grating positioning device is installed on rectangular substrate.
A kind of laser interference lithographic system provided by the present invention has the following advantages and the high-lighting effect:
Have very high figure locking precision and figure lock speed, can effectively suppress the foozle that photoetching stage figure phase drift causes; Can realize litho pattern at a high speed, on the high-precision base station that is locked in high-speed motion; Simultaneously, system have good graphical quality, version succinct, be easy to debug, be the good system that realizes that large tracts of land, high precision, close grid line grating are made.
Description of drawings
Fig. 1 is the first laser interference lithographic system schematic diagram of the present invention.
Fig. 2 is the second laser interference lithographic system schematic diagram of the present invention.
Fig. 3 is that the first of homodyne phasometer of the present invention is propagated the light path schematic diagram.
Fig. 4 is that the second of homodyne phasometer of the present invention is propagated the light path schematic diagram.
Fig. 5 is the third propagation light path schematic diagram of homodyne phasometer of the present invention.
Fig. 6 is that the 4th kind of homodyne phasometer of the present invention propagated the light path schematic diagram.
Fig. 7 is that the 5th kind of homodyne phasometer of the present invention propagated the light path schematic diagram.
Fig. 8 is that the 6th kind of homodyne phasometer of the present invention propagated the light path schematic diagram.
Fig. 9 is the first circular grating phase-modulator embodiment schematic diagram of the present invention.
Figure 10 is the second circular grating phase-modulator embodiment schematic diagram of the present invention.
Figure 11 is the first rectangular raster phase-modulator embodiment schematic diagram of the present invention.
Figure 12 is the second rectangular raster phase-modulator embodiment schematic diagram of the present invention.
In figure: the 1-laser instrument; The 2-beam splitter; The 3-base station; The 31-displacement measuring device; The 4-substrate; 5-light beam sampling thief; 6-homodyne phasometer; 61-spectroscope; 61a-first spectroscope; 61b-second spectroscope; 62-quarter-wave plate; 62a-first quarter-wave plate; 62b-second quarter-wave plate; 63-polarization spectroscope; 63a-first polarization spectroscope; 63b-second polarization spectroscope; 64-half-wave plate; 64a-first half-wave plate; 64b-second half-wave plate; 65a-first photodetector; 65b-second photodetector; 65c-the 3rd photodetector; 65d-the 4th photodetector; 66a-first Wollaston prism; 66b-second Wollaston prism; 67-analyzer; 67a-first analyzer; 67b-second analyzer; 67c-the 3rd analyzer; 68-reflecting prism; 7-electronic signal process parts; 8-controller; 9-driver; 10-phase-modulation actuator; 11-raster phase modulator; 111-grating positioning device; 12-circular grating phase-modulator; 121-circular substrate; 122-circular grating; 123-electric rotating machine; 13-rectangular raster phase-modulator; The 131-rectangular substrate; 132-rectangular raster; 133-linear electric motors.
Embodiment
Embodiment of the present invention is described further in detail below in conjunction with accompanying drawing.
Please refer to Fig. 1, Fig. 1 is the first laser interference lithographic system schematic diagram of the present invention.as shown in Figure 1, this interference lithography system is comprised of laser instrument 1, catoptron, beam splitter 2, base station 3, substrate 4, laser instrument 1 emitting laser is divided into two beam interferometer light beams after catoptron, beam splitter 2, two beam interferometer light beams realize closing the interference of light in the substrate 4 of base station 3 carryings through catoptron, and conoscope image realizes that by exposing substrate graphic recording shifts, laser interference lithographic system also comprises a figure locking system, and this figure locking system comprises two light beam sampling thiefs 5, homodyne phasometer 6, electronic signal process parts 7, controller 8, driver 9 and phase-modulation actuator 10, described two light beam sampling thiefs 5 lay respectively near on two beam interferometer light paths of bases, two light beam sampling thiefs 5 are taked respectively a part of light on two beam interferometer light paths, wherein a branch of is reference light, another bundle is for measuring light, reference light is incident to homodyne phasometer 6 from two entrances respectively with measurement light, light signal is after homodyne phasometer 6 is processed, output comprises the electric signal of interference fringe phase information, electric signal inputs to controller 8 after electronic signal process parts 7, controller 8 outputs control signals to driver 9, driver 9 drives phase-modulation actuator 10, when drift occurs the figure of interference lithography system, utilize this figure locking system to control pattern drifting and realize the figure locking.
Please refer to Fig. 2, Fig. 2 is the second interference lithography system schematic of the present invention.As shown in Figure 2, the base station 3 of interference lithography system is generally the step-by-step scanning type motion with respect to the conoscope image motion; The moving displacement of base station 3 is fed back in controller 9 by displacement measuring device 31, controller 9 is processed the feedback information of homodyne phasometer 6 and displacement measuring device 31, simultaneously control phase modulation actuator 10 and base station 4 realize conoscope image with respect to the locking of motion base station 3, and this interference lithography system can realize by the scan exposure substrate manufacturing of large tracts of land high precision grating.
Please refer to Fig. 3, Fig. 3 is that the first of homodyne phasometer of the present invention is propagated the light path schematic diagram.As shown in Figure 3, from two entrance incidents of homodyne phasometer 6, the propagation light path is: measure light a branch of transmission after the first quarter-wave plate 62a, spectroscope 61, another restraints reflection respectively for described measurement light and reference light; Reference light a branch of transmission after the second quarter-wave plate 62b, the first spectroscope 61, another restraints reflection; The transmitted light of measuring reflection of light light and reference light forms the first bundle and closes light, and the reflected light of measuring optical transmission light and reference light forms the second bundle and closes light; The first bundle closes light after the first polarization spectroscope 63a, and the p light of transmission is incident to the first photodetector 65a, and the s light of reflection is incident to the second photodetector 65b; The second bundle closes light after half-wave plate 64, the second polarization spectroscope 63b, and the p light of transmission is incident to the 3rd photodetector 65c, and the s light of reflection is incident to the 4th photodetector 65d; Form the cosine electric signal of 90 ° of four tunnel phase phasic differences after four photodetector conversions, input to electronic signal process parts 7.This homodyne phasometer adopts four tunnel orthogonal signal to obtain phase information, can suppress the measurement disturbance that dc shift brings, and improves phase measurement accuracy, thereby improves figure locking precision.
Please refer to Fig. 4, Fig. 4 is that the second of homodyne phasometer of the present invention is propagated the light path schematic diagram.As shown in Figure 4, measure light and reference light respectively from two entrance incidents of homodyne phasometer 6, the propagation light path is: measure light a branch of transmission after spectroscope 61, another restraints reflection; Reference light is a branch of transmission after spectroscope 61, and another restraints reflection; The transmitted light of measuring reflection of light light and reference light forms the first bundle and closes light, and the reflected light of measuring optical transmission light and reference light forms the second bundle and closes light; The first bundle closes light after the first quarter-wave plate 62a, the first polarization spectroscope 63a, and the p light of transmission is incident to the first photodetector 65a, and the s light of reflection is incident to the second photodetector 65b; The second bundle closes light after the second quarter-wave plate 62b, the 3rd quarter-wave plate 62c, the second polarization spectroscope 63b, and the p light of transmission is incident to the 3rd photodetector 65c, and the s light of reflection is incident to the 4th photodetector 65d; Form the cosine electric signal of 90 ° of four tunnel phase phasic differences after four photodetector conversions, input to electronic signal process parts 7.Have a same effect in this homodyne phasometer and Fig. 3, different is structural arrangement form.
Please refer to Fig. 5, Fig. 5 is the third propagation light path schematic diagram of homodyne phasometer of the present invention.As shown in Figure 5, measure light and reference light respectively from two entrance incidents of homodyne phasometer 6, the propagation light path is: measure light a branch of transmission after the first half-wave plate 64a, spectroscope 61, another restraints reflection; Reference light a branch of transmission after the second half-wave plate 64b, spectroscope 61, another restraints reflection; The transmitted light of measuring reflection of light light and reference light forms the first bundle and closes light, and the reflected light of measuring optical transmission light and reference light forms the second bundle and closes light; The first bundle closes light after the first polarization spectroscope 63a, and the p light of transmission is incident to the first photodetector 65a, and the s light of reflection is incident to the second photodetector 65b; The second bundle closes light after quarter-wave plate 62, the second polarization spectroscope 63b, and the p light of transmission is incident to the 3rd photodetector 65c, and the s light of reflection is incident to the 4th photodetector 65d; Form the cosine electric signal of 90 ° of four tunnel phase phasic differences after four photodetector conversions, input to electronic signal process parts 7.Have a same effect in this homodyne phasometer and Fig. 3,4, but adopted different polarizers and optical texture arrangement form.
Please refer to Fig. 6, Fig. 6 is that the 4th kind of homodyne phasometer of the present invention propagated the light path schematic diagram.As shown in Figure 6, described measurement light and reference light be respectively from two entrance incidents of homodyne phasometer 6, propagates light path and be: measure light a branch of transmission after the first quarter-wave plate 62a, spectroscope 61, another restraints reflection; Reference light a branch of transmission after the second quarter-wave plate 62b, spectroscope 61, another restraints reflection; The transmitted light of measuring reflection of light light and reference light forms the first bundle and closes light, and the reflected light of measuring optical transmission light and reference light forms the second bundle and closes light; The first bundle closes light and be divided into two bundles after the first Wollaston prism 66a, is incident to respectively the first photodetector 65a and the second photodetector 65b; The second bundle closes light and be divided into two bundles after the second Wollaston prism 66b, is incident to respectively the 3rd photodetector 65c and the 4th photodetector 65d; Form the cosine electric signal of 90 ° of four tunnel phase phasic differences after the conversion of four photodetectors, input to electronic signal process unit 7.Have a same effect in this homodyne phasometer and Fig. 3,4,5, but owing to having adopted Wollaston prism to make optical texture comparatively succinct.
Please refer to Fig. 7, Fig. 7 is that the 5th kind of homodyne phasometer of the present invention propagated the light path schematic diagram.As shown in Figure 7, measure light and reference light respectively from two entrance incidents of homodyne phasometer 6, propagate light path and be: measure light a branch of transmission after spectroscope 61, another restraints reflection; Reference light a branch of transmission after spectroscope 61, another restraints reflection; The transmitted light of measuring reflection of light light and reference light forms the first bundle and closes light, and the reflected light of measuring optical transmission light and reference light forms the second bundle and closes light; The first bundle closes light through analyzer 67 to first photodetector 65a; The second bundle closes light after quarter-wave plate 62, polarization spectroscope 63, and the p light of transmission is incident to the second photodetector 65b, and the s light of reflection is incident to the 3rd photodetector 65c; Form the cosine electric signal of 90 ° of three tunnel phase phasic differences after the conversion of three photodetectors, input to electronic signal process unit 7.This homodyne phasometer adopts three tunnel orthogonal signal to obtain phase information, can suppress equally the measurement disturbance that dc shift brings, improve phase measurement accuracy, different from four tunnel orthogonal signal is the electronic signal process parts that need particular design three tunnel orthogonal signal, though three drive test amount structures have been simplified optical texture, structural asymmetry will be introduced measuring error.
Please refer to Fig. 8, Fig. 8 is that the 6th kind of homodyne phasometer of the present invention propagated the light path schematic diagram.As shown in Figure 8, measure light and reference light respectively from two entrance incidents of homodyne phasometer 6, propagate light path and be: measure the 63 rear transmissions of light polarization spectroscope, reference light is through polarization spectroscope 63 back reflections, realizes measuring light, with reference to actinic light; Close light beam and be divided into two bundles after quarter-wave plate 62, the first spectroscope 61a, a branch of first photodetector 65a that is incident to after the first analyzer 67a wherein, another bundle is after the second spectroscope 61b, a branch of transmission, a branch of reflection, wherein reflected light is incident to the second photodetector 65b after the second analyzer 67b, and transmitted light is incident to the 3rd photodetector 65c after reflecting prism 68, the 3rd analyzer 67c; Form the cosine electric signal of 90 ° of three tunnel phase phasic differences after the conversion of three photodetectors, input to electronic signal process unit 7.This homodyne phasometer is all three line structures, can obtain higher measuring accuracy, has adopted different optical elements and optical arrangement structure from difference in Fig. 7, and is more symmetrical on structure.
Please refer to Fig. 9, Fig. 9 is the first circular grating phase-modulator embodiment schematic diagram of the present invention.As shown in Figure 9, raster phase modulator 11 adopts circular grating phase-modulator 12, and circular grating phase-modulator 12 comprises circular substrate 121, circular grating 122, electric rotating machine 123 and grating positioning device 111; Circular grating 122 along the circumferential direction is installed on circular substrate 121, and it is clear expression circular grating that a circular grating 122(only is installed in this embodiment, in Fig. 9, circular grating pitch is amplified); The output shaft of electric rotating machine 123 is connected with circular substrate 121, and grating positioning device 111 is installed on circular substrate 121, can be along the incoming position of the radial location light beam of circular substrate 121.When light beam is incident on circular grating 122, diffraction (usually selecting 1 grade or-1 grade of diffraction that glitters) occurs, when circular grating 122 rotates, diffraction light generation shift frequency and realize phase-modulation.Please refer to Figure 10, Figure 10 is the second circular grating phase shifter embodiment schematic diagram of the present invention, circular grating 122 radially has three gratings and (is clear expression circular grating, in Figure 10, circular grating pitch is amplified), grating positioning device 111 moves circular substrate 121 is incident on different grating endless belt light beam, can realize different modulating speeds.
Please refer to Figure 11, Figure 11 is the first rectangular raster phase-modulator embodiment schematic diagram of the present invention.As shown in figure 11, raster phase modulator 11 adopts rectangular raster phase-modulator 13, and rectangular raster phase-modulator 13 comprises rectangular substrate 131, rectangular raster 132, linear electric motors 133 and grating positioning device 111; Rectangular raster 132 is installed on rectangular substrate 131 along its length, and it is clear expression circular grating that a rectangular raster 132(only is installed in this embodiment, in Figure 11, rectangular raster pitch is amplified); The mover of linear electric motors 133 or stator are connected with rectangular substrate 131, and grating positioning device 111 is installed on rectangular substrate 131, can be along the incoming position of the Width aligned bundle of rectangular substrate 131.When light beam is incident on rectangular raster 132, diffraction (usually selecting 1 grade or-1 grade of diffraction that glitters) occurs, when rectangular raster 132 moves, diffraction light generation shift frequency and realize phase-modulation.Please refer to Figure 12, Figure 12 is the second rectangular raster phase-modulator embodiment schematic diagram of the present invention, rectangular raster 132 has along its length three gratings and (is clear expression circular grating, in Figure 12, rectangular raster pitch is amplified), grating positioning device 111 moves rectangular substrate 131 is incident on different grating endless belt light beam, can realize different modulating speeds.
Claims (11)
1. a laser interference lithographic system, comprise laser instrument (1), catoptron, beam splitter (2), base station (3) and substrate (4), laser instrument (1) emitting laser is divided into two beam interferometer light beams after catoptron, beam splitter (2), two beam interferometer light beams close the interference of light through catoptron in the upper realization of the substrate (4) of base station (3) carrying, and conoscope image realizes that by exposing substrate graphic recording shifts, it is characterized in that: described system also comprises a figure locking system, and this figure locking system comprises two light beam sampling thiefs (5), homodyne phasometer (6), electronic signal process parts (7), controller (8), driver (9) and phase-modulation actuator (10), described two light beam sampling thiefs (5) lay respectively near on two beam interferometer light paths of bases, two light beam sampling thiefs (5) are taked respectively a part of light on two beam interferometer light paths, wherein a branch of is reference light, another bundle is for measuring light, reference light is incident to homodyne phasometer (6) from two entrances respectively with measurement light, light signal is after homodyne phasometer (6) is processed, output comprises the electric signal of interference fringe phase information, electric signal inputs to controller (8) after electronic signal process parts (7), controller (8) outputs control signals to driver (9), driver (9) drives phase-modulation actuator (10), when drift occurs the figure of interference lithography system, utilize this figure locking system to control pattern drifting and realize the figure locking.
2. a kind of laser interference lithographic system according to claim 1, it is characterized in that: described base station (3) is moved with respect to conoscope image, detect the moving displacement of base station (3) and feed back to controller (8) by the displacement measuring device (31) that is arranged on base station (3), controller (8) is processed homodyne phasometer (6) and the feedback information of displacement measuring device (31), and control phase modulation actuator (10) and base station (3) realize that conoscope image is with respect to base station (3) locking of motion simultaneously.
3. a kind of laser interference lithographic system according to claim 1 and 2, it is characterized in that: described measurement light and reference light are respectively from two entrance incidents of homodyne phasometer (6), the propagation light path is: measure light a branch of transmission after the first quarter-wave plate (62a), spectroscope (61), another restraints reflection; Reference light a branch of transmission after the second quarter-wave plate (62b), the first spectroscope (61), another restraints reflection; The transmitted light of measuring reflection of light light and reference light forms the first bundle and closes light, and the reflected light of measuring optical transmission light and reference light forms the second bundle and closes light; The first bundle closes light after the first polarization spectroscope (63a), and the p light of transmission is incident to the first photodetector (65a), and the s light of reflection is incident to the second photodetector (65b); The second bundle closes light after half-wave plate (64), the second polarization spectroscope (63b), and the p light of transmission is incident to the 3rd photodetector (65c), and the s light of reflection is incident to the 4th photodetector (65d); Form the cosine electric signal of 90 ° of four tunnel phase phasic differences after four photodetector conversions, input to electronic signal process parts (7).
4. a kind of laser interference lithographic system according to claim 1 and 2, it is characterized in that: described measurement light and reference light are respectively from two entrance incidents of homodyne phasometer (6), the propagation light path is: measure light a branch of transmission after spectroscope (61), another restraints reflection; Reference light a branch of transmission after spectroscope (61), another restraints reflection; The transmitted light of measuring reflection of light light and reference light forms the first bundle and closes light, and the reflected light of measuring optical transmission light and reference light forms the second bundle and closes light; The first bundle closes light after the first quarter-wave plate (62a), the first polarization spectroscope (63a), and the p light of transmission is incident to the first photodetector (65a), and the s light of reflection is incident to the second photodetector (65b); The second bundle closes light after the second quarter-wave plate (62b), the 3rd quarter-wave plate (62c), the second polarization spectroscope (63b), the p light of transmission is incident to the 3rd photodetector (65c), and the s light of reflection is incident to the 4th photodetector (65d); Form the cosine electric signal of 90 ° of four tunnel phase phasic differences after four photodetector conversions, input to electronic signal process parts (7).
5. a kind of laser interference lithographic system according to claim 1 and 2, it is characterized in that: described measurement light and reference light are respectively from two entrance incidents of homodyne phasometer (6), the propagation light path is: measure light a branch of transmission after the first half-wave plate (64a), spectroscope (61), another restraints reflection; Reference light a branch of transmission after the second half-wave plate (64b), spectroscope (61), another restraints reflection; The transmitted light of measuring reflection of light light and reference light forms the first bundle and closes light, and the reflected light of measuring optical transmission light and reference light forms the second bundle and closes light; The first bundle closes light after the first polarization spectroscope (63a), and the p light of transmission is incident to the first photodetector (65a), and the s light of reflection is incident to the second photodetector (65b); The second bundle closes light after quarter-wave plate (62), the second polarization spectroscope (63b), and the p light of transmission is incident to the 3rd photodetector (65c), and the s light of reflection is incident to the 4th photodetector (65d); Form the cosine electric signal of 90 ° of four tunnel phase phasic differences after four photodetector conversions, input to electronic signal process parts (7).
6. a kind of laser interference lithographic system according to claim 1 and 2, it is characterized in that: described measurement light and reference light be respectively from two entrance incidents of homodyne phasometer (6), propagates light path and be: measure light a branch of transmission after the first quarter-wave plate (62a), spectroscope (61), another restraints reflection; Reference light a branch of transmission after the second quarter-wave plate (62b), spectroscope (61), another restraints reflection; The transmitted light of measuring reflection of light light and reference light forms the first bundle and closes light, and the reflected light of measuring optical transmission light and reference light forms the second bundle and closes light; The first bundle closes light and be divided into two bundles after the first Wollaston prism (66a), is incident to respectively the first photodetector (65a) and the second photodetector (65b); The second bundle closes light and be divided into two bundles after the second Wollaston prism (66b), is incident to respectively the 3rd photodetector (65c) and the 4th photodetector (65d); Form the cosine electric signal of 90 ° of four tunnel phase phasic differences after four photodetector conversions, input to electronic signal process unit (7).
7. a kind of laser interference lithographic system according to claim 1 and 2, it is characterized in that: described measurement light and reference light be respectively from two entrance incidents of homodyne phasometer (6), propagates light path and be: measure light a branch of transmission after spectroscope (61), another restraints reflection; Reference light a branch of transmission after spectroscope (61), another restraints reflection; The transmitted light of measuring reflection of light light and reference light forms the first bundle and closes light, and the reflected light of measuring optical transmission light and reference light forms the second bundle and closes light; First the bundle close light through analyzer (67) to the first photodetector (65a); The second bundle closes light after quarter-wave plate (62), polarization spectroscope (63), and the p light of transmission is incident to the second photodetector (65b), and the s light of reflection is incident to the 3rd photodetector (65c); Form the cosine electric signal of 90 ° of three tunnel phase phasic differences after three photodetector conversions, input to electronic signal process unit (7).
8. a kind of laser interference lithographic system according to claim 1 and 2, it is characterized in that: described measurement light and reference light are respectively from two entrance incidents of homodyne phasometer (6), the propagation light path is: measure the rear transmission of light polarization spectroscope (63), reference light is through polarization spectroscope (63) back reflection, realizes measuring light, with reference to actinic light; Close light beam and be divided into two bundles after quarter-wave plate (62), the first spectroscope (61a), a branch of the first photodetector (65a) that is incident to after the first analyzer (67a) wherein, another bundle is after the second spectroscope (61b), a branch of transmission, a branch of reflection, wherein reflected light is incident to the second photodetector (65b) after the second analyzer (67b), and transmitted light is incident to the 3rd photodetector (65c) after reflecting prism (68), the 3rd analyzer (67c); Form the cosine electric signal of 90 ° of three tunnel phase phasic differences after three photodetector conversions, input to electronic signal process unit (7).
9. according to claim 1 with 2 described a kind of laser interference lithographic systems, is characterized in that: described phase-modulation actuator (10) employing electrooptic modulator, micromotor driving mirror unit or raster phase modulator (11).
10. a kind of interference lithography according to claim 9 system, it is characterized in that: described raster phase modulator (11) adopts circular grating phase-modulator (12), and described circular grating phase-modulator (12) comprises circular substrate (121), circular grating (122), electric rotating machine (123) and grating positioning device (111); Circular grating (122) along the circumferential direction is installed on circular substrate (121), and a circular grating (122) is installed at least; The output shaft of electric rotating machine (123) is connected with circular substrate (121), and grating positioning device (111) is installed on circular substrate (121).
11. a kind of interference lithography according to claim 9 system, it is characterized in that: described raster phase modulator (11) adopts rectangular raster phase-modulator (13), and described rectangular raster phase-modulator (13) comprises rectangular substrate (131), rectangular raster (132), linear electric motors (133) and grating positioning device (111); Rectangular raster (132) is installed on rectangular substrate (131) along its length, and a rectangular raster (132) is installed at least; The mover of linear electric motors (133) or stator are connected with rectangular substrate (131), and grating positioning device (111) is installed on rectangular substrate (131).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310017811.8A CN103092003B (en) | 2013-01-17 | 2013-01-17 | Laser interference lithography system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310017811.8A CN103092003B (en) | 2013-01-17 | 2013-01-17 | Laser interference lithography system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103092003A true CN103092003A (en) | 2013-05-08 |
| CN103092003B CN103092003B (en) | 2015-01-07 |
Family
ID=48204745
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310017811.8A Active CN103092003B (en) | 2013-01-17 | 2013-01-17 | Laser interference lithography system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103092003B (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014111000A1 (en) * | 2013-01-17 | 2014-07-24 | 清华大学 | Optical grating phase modulator for laser interference photoetching system |
| CN104835783A (en) * | 2015-05-12 | 2015-08-12 | 中山大学 | Quantum dot film array preparation method |
| CN107290939A (en) * | 2016-04-01 | 2017-10-24 | 深圳光启高等理工研究院 | Apply the photoetching instrument and micro structured pattern photolithography method in Meta Materials preparation |
| CN110119071A (en) * | 2018-02-06 | 2019-08-13 | 苏州苏大维格光电科技股份有限公司 | Interference lithography system, printing equipment and interference photoetching method |
| CN110806680A (en) * | 2019-10-31 | 2020-02-18 | 清华大学 | Laser interference photoetching system |
| WO2024031747A1 (en) * | 2022-08-12 | 2024-02-15 | 北京华卓精科科技股份有限公司 | Laser interference lithography system |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5142385A (en) * | 1989-07-18 | 1992-08-25 | Massachusetts Institute Of Technology | Holographic lithography |
| WO2001035168A1 (en) * | 1999-11-10 | 2001-05-17 | Massachusetts Institute Of Technology | Interference lithography utilizing phase-locked scanning beams |
| CN1752847A (en) * | 2005-11-10 | 2006-03-29 | 中国科学院光电技术研究所 | Adopt the image interference photoetching method and the system of an acoustooptic deflector |
| CN101382656A (en) * | 2008-10-09 | 2009-03-11 | 重庆大学 | Bridge type grating light modulator and array thereof |
| CN102636968A (en) * | 2012-05-08 | 2012-08-15 | 上海理工大学 | Holographic exposure device of any groove grating structure and exposure method thereof |
-
2013
- 2013-01-17 CN CN201310017811.8A patent/CN103092003B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5142385A (en) * | 1989-07-18 | 1992-08-25 | Massachusetts Institute Of Technology | Holographic lithography |
| WO2001035168A1 (en) * | 1999-11-10 | 2001-05-17 | Massachusetts Institute Of Technology | Interference lithography utilizing phase-locked scanning beams |
| CN1752847A (en) * | 2005-11-10 | 2006-03-29 | 中国科学院光电技术研究所 | Adopt the image interference photoetching method and the system of an acoustooptic deflector |
| CN101382656A (en) * | 2008-10-09 | 2009-03-11 | 重庆大学 | Bridge type grating light modulator and array thereof |
| CN102636968A (en) * | 2012-05-08 | 2012-08-15 | 上海理工大学 | Holographic exposure device of any groove grating structure and exposure method thereof |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014111000A1 (en) * | 2013-01-17 | 2014-07-24 | 清华大学 | Optical grating phase modulator for laser interference photoetching system |
| US9869857B2 (en) | 2013-01-17 | 2018-01-16 | Tsinghua University | Optical grating phase modulator for laser interference photoetching system |
| CN104835783A (en) * | 2015-05-12 | 2015-08-12 | 中山大学 | Quantum dot film array preparation method |
| CN107290939A (en) * | 2016-04-01 | 2017-10-24 | 深圳光启高等理工研究院 | Apply the photoetching instrument and micro structured pattern photolithography method in Meta Materials preparation |
| CN110119071A (en) * | 2018-02-06 | 2019-08-13 | 苏州苏大维格光电科技股份有限公司 | Interference lithography system, printing equipment and interference photoetching method |
| CN110806680A (en) * | 2019-10-31 | 2020-02-18 | 清华大学 | Laser interference photoetching system |
| CN110806680B (en) * | 2019-10-31 | 2020-11-24 | 清华大学 | Laser interference photoetching system |
| WO2024031747A1 (en) * | 2022-08-12 | 2024-02-15 | 北京华卓精科科技股份有限公司 | Laser interference lithography system |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103092003B (en) | 2015-01-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103092002B (en) | Laser interference lithography system with pattern locking function | |
| CN103092003B (en) | Laser interference lithography system | |
| CN110837214B (en) | Scanning interference photoetching system | |
| CN110716397B (en) | Exposure light beam phase measuring method in laser interference photoetching and photoetching system | |
| CN102944176B (en) | Displacement measuring system of heterodyne grating interferometer | |
| TWI784265B (en) | Displacement measuring device, displacement measuring method and photolithography equipment | |
| CN110806680B (en) | Laser interference photoetching system | |
| CN109579694B (en) | High-tolerance two-degree-of-freedom heterodyne grating interferometry method and system | |
| CN106289068A (en) | A kind of two degrees of freedom heterodyne grating interferometer displacement measurement method | |
| CN100523885C (en) | Fabrication of structures in an optical substrate | |
| CN103604375A (en) | Double frequency laser grating interference two-dimensional measurement method and system with optical aliasing resistance | |
| WO2021083045A1 (en) | Phase measurement device for laser interference photolithography system, and method for using same | |
| CN102788562B (en) | Device for detecting sub-aperture splicing surface shape with movement coordinate feedback | |
| Shimizu et al. | An absolute surface encoder with a planar scale grating of variable periods | |
| CN103759655B (en) | The two degrees of freedom homodyne grating interferometer displacement measurement system of optically-based times of journey method | |
| CN111043991A (en) | Straightness measuring interferometer system without nonlinear error and measuring method | |
| Zhou et al. | Bidirectional Littrow double grating interferometry for quadruple optical interpolation | |
| JP3185373B2 (en) | Encoder | |
| CN104330034A (en) | Stepped surface height measuring single-grating interferometer and stepped surface height measuring method | |
| US11940349B2 (en) | Plane grating calibration system | |
| CN102012561A (en) | Method and system for realizing phase shift in laser interference lithography | |
| AU2021104387A4 (en) | Two-dimensional measurement method and system of anti-optical aliasing of heterodyne grating interference | |
| US7787107B2 (en) | Motion measurement and synchronization using a scanning interferometer with gratings | |
| Li et al. | A two-probe linear encoder by using an arrayed scale grating stitched by multiple separate short gratings | |
| Guo et al. | A modified OAM Mach-Zehnder interferometer for displacement measurement |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20151117 Address after: 100084 Beijing, Haidian District, 100084 box office box office, Tsinghua University, Patentee after: Tsinghua University Patentee after: U-PRECISION TECH CO., LTD. Address before: 100084 Beijing, Haidian District, 100084 box office box office, Tsinghua University, Patentee before: Tsinghua University |