CN103604375A - Double frequency laser grating interference two-dimensional measurement method and system with optical aliasing resistance - Google Patents
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Abstract
The invention discloses a double frequency laser grating interference two-dimensional measurement method and system with optical aliasing resistance, and belongs to a grating measurement technology. The system comprises a laser device, a grating interference mirror set and a photoelectric detection and signal processing unit. Two laser beams which are simultaneously output by the laser device, different in frequency and separated in space enter a polarizing beam splitter in parallel and in an incident mode. The first laser beam enters a reference grating in an incident mode after being reflected by the polarizing beam splitter to form multiple reference diffraction laser beams with multiple levels, the second laser beam enters a measurement grating in an incident mode after being transmitted by the polarizing beam splitter to form multiple measurement diffraction laser beams, three of the reference diffraction laser beams are sequentially and correspondingly joint with the 0 laser beam, the +1 laser beam and the -1 laser beam in the measurement diffraction laser beams respectively to form an optical beat frequency, and two-dimensional relative motion information of the measurement grating is acquired through photoelectric detection and signal processing. By the adoption of the method and system, optical frequency aliasing, polarization state aliasing and corresponding periodic non-linear errors caused by traditional incomplete polarizing beam splitting are eliminated, and combination properties of a photoetching machine ultra-precise workpiece table position measurement system can be improved when the double frequency laser grating interference two-dimensional measurement system is used for the photoetching machine ultra-precise workpiece table position measurement system.
Description
Technical field
The present invention relates to a kind of grating measuring method and measuring system, relate in particular to a kind of double-frequency laser grating interference two-dimensional measurement method and measuring system.
Background technology
Litho machine in semiconductor manufacturing equipment is the key equipment in semiconductor chip fabrication.Ultraprecise work stage is the kernel subsystems of litho machine, for carrying mask plate and silicon chip, completes high speed ultraprecise step-scan campaign.Ultraprecise work stage becomes the most representative type systematic in ultraprecise kinematic system with movement characteristics such as its high speed, high acceleration, large stroke, ultraprecise, multiple degrees of freedoms.For realizing above-mentioned motion, ultraprecise work stage adopts two-frequency laser interferometer measuring system to measure the displacement of ultraprecise work stage multiple degrees of freedom conventionally.Yet along with improving constantly of the motion index such as measuring accuracy, measuring distance, measuring speed, two-frequency laser interferometer with environmental sensitivity, measuring speed be difficult to improve, take up room, expensive, measurement target work stage is difficult to manufacture and design the series of problems such as control and is difficult to meet measurement demand.
For the problems referred to above, each major company in ultra precise measurement field and research institution have launched a series of research in the world, and research mainly concentrates on the optical grating measuring system based on diffraction interference principle, and achievement in research all has exposure in many patent papers.Holland ASML company US Patent No. 7, 102, 729B2 (open day on August 4th, 2005), US7, 483, 120B2 (open day on November 15th, 2007), US7, 940, 392B2 (open day on Dec 24th, 2009), US2010/0321665A1 (open day on Dec 23rd, 2010) discloses a kind of plane grating measuring system and arrangement that is applied to Ultra-precision Stages of Lithography, this measuring system mainly utilizes the plane grating of one dimension or two dimension to coordinate the large travel displacement of read head measuring workpieces platform level, short transverse displacement measurement adopts current vortex or interferometer equal altitudes sensor, but the application restric-tion work stage measuring accuracy of multiple sensors.The U.S. Patent Publication No. US2011/0255096A1 of U.S. ZYGO company (open day on October 20th, 2011) discloses a kind of optical grating measuring system that is applied to Ultra-precision Stages of Lithography, this measuring system also adopts one dimension or two-dimensional grating to coordinate specific read head to realize displacement measurement, can carry out level to measuring with vertical deviation simultaneously, the Chinese patent CN102937411A of Tsing-Hua University (open day on 02 20th, 2013), the Chinese patent CN102944176A of Tsing-Hua University (open day on 02 27th, 2013) discloses a kind of dual-frequency grating interferometer displacement measurement system of Ultra-precision Stages of Lithography, this measuring system is that the measurement target reverberator (pyramid) of traditional two-frequency laser interferometer is replaced to grating, realizing double-frequency laser grating interference measures, the level of can simultaneously measuring is to large travel displacement and vertical deviation, but because double-frequency laser is coaxial, adopt polarization spectroscope to be split up into reference light and measure light, the optical frequency aliasing that exists polarization spectro not exclusively to cause, polarization state aliasing and corresponding cycle nonlinearity erron problem.The Chinese patent CN102353327A of PLA University of Science and Technology for National Defense (open day on 02 15th, 2013) discloses a kind of double-frequency laser grating interference measuring method and measuring system, this scheme utilizes polarization spectroscope that double-frequency laser is divided into reference light and measures light, reference light and measurement light incide on the measurement grating of motion simultaneously, through measuring the reference light of optical grating diffraction and measuring light and converge formation optical beat, by photodetection and signal, process the displacement that obtains moving grating, this system only can realize one-dimensional measurement, the optical frequency aliasing that exists equally polarization spectro not exclusively to cause, polarization state aliasing and corresponding cycle nonlinearity erron problem.
Summary of the invention
The technical problem to be solved in the present invention is to overcome the deficiencies in the prior art, seek a kind of double-frequency laser grating interference measuring method and system of anti-optics aliasing, this measuring system can realize Ya Na meter even more high resolving power and precision, and the level of can simultaneously measuring is to large travel displacement and vertical deviation.This measuring system, for ultraprecise work stage displacement measurement, can effectively reduce the deficiency of laser interferometer measurement system in the application of ultraprecise work stage, makes Ultra-precision Stages of Lithography performance boost.
The object of the present invention is achieved like this:
The double-frequency laser grating interference two-dimensional measurement method of anti-optics aliasing, laser instrument is exported two bundle laser simultaneously, wherein beam of laser is first frequency, the second bundle laser is second frequency, described beam of laser and the second bundle laser are spatially separately and parallelly incide a spectroscope, beam of laser reflects to form reference beam through spectroscope and incides with reference to grating, by forming the inferior multi beam of a plurality of levels with reference to optical grating diffraction with reference to diffracted beam, the second bundle laser forms measuring beam through spectroscope transmission and incides measurement grating, by measuring optical grating diffraction, form the inferior multi beam measurement diffracted beam of a plurality of levels, describedly with reference to first in diffracted beam, restraint, the second bundle, three beams of laser Shu Yici respectively with the first bundle of measuring in diffracted beam, the second bundle, three beams of laser bundle correspondence is converged formation optical beat and is interfered, optical beat signal is processed the two-dimensional phase that obtains measuring grating to movable information through photodetection and signal.
The double-frequency laser grating interference two-dimensional measurement system of anti-optics aliasing, the laser instrument and the polarization spectroscope that comprise exportable two bundle different frequency laser beam, the incident end that wherein beam of laser bundle transfers to polarization spectroscope through first single-mode polarization maintaining fiber forms the first incoming laser beam, the incident end that another bundle laser beam transfers to polarization spectroscope through second single-mode polarization maintaining fiber forms the second incoming laser beam, adjust the polarization state of the first incoming laser beam, make the first incoming laser beam reflect to form reference arm light beam at the light splitting face of polarization spectroscope, in the light path of described reference arm light beam, configure successively reference arm quarter-wave plate, reference arm dioptric element and with reference to grating, reference arm light beam process reference arm quarter-wave plate and reference arm dioptric element directive are with reference to grating, reference arm light beam is through forming (+1 with reference to grating diffraction reflection, 0) level light beam, (+1, + 1) level light beam and (+1,-1) level light beam, described (+1, 0) level light beam, (+1, + 1) level light beam and (+1,-1) level light beam its beam direction after reference arm dioptric element is adjusted into parallel and reverse with reference arm light beam, (+1, 0) level light beam, (+1, 10) level light beam and (+1,-1) level light beam turns back to polarization spectroscope through reference arm quarter-wave plate again, and through spectro-film, seeing through on the transmitted light path of spectro-film photodetector A successively, photodetector B and photodetector C, described (+1, + 1) level light beam directive photodetector A, (+1, 0) level light beam directive photodetector B, (+1,-1) level light beam directive photodetector C, adjust the polarization state of the second incoming laser beam, make the second incoming laser beam become gage beam light beam at the light splitting face transmission of polarization spectroscope, allocating and measuring arm quarter-wave plate successively in described gage beam beam path, gage beam dioptric element and measurement grating, gage beam light beam is measured grating through gage beam quarter-wave plate and gage beam dioptric element directive, gage beam light beam reflects to form 0 grade of light beam through measuring optical grating diffraction, + 1 grade of light beam and-1 grade of light beam, described 0 grade of light beam, 10 grades of light beams are adjusted into parallel and reverse with gage beam light beam with-1 grade of light beam its beam direction after gage beam dioptric element, 0 grade of light beam, + 1 grade of light beam and-1 grade of light beam turn back to polarization spectroscope through gage beam quarter-wave plate again, through polarization spectroscope reflection, form respectively successively light beam B, light beam A, light beam C, described light beam A and (+1, + 1) level light beam converges directive photodetector A, light beam B and (+1, 0) level light beam converges directive photodetector B, light beam C and (+1,-1) level light beam converges directive photodetector C, described photodetector A, B, C converts beat frequency light signal to electric signal, by wire or optical fiber, deliver to respectively signal processing unit and complete processing.
Compared with prior art, the invention has the advantages that:
(1) spatially separately transmission of the double-frequency laser bundle of laser instrument output in the present invention, and separately incide on polarization spectroscope, eliminated optical frequency aliasing, polarization state aliasing and corresponding cycle nonlinearity erron that traditional coaxial double-frequency laser is not exclusively caused by polarization spectroscope light splitting;
(2) in the present invention, by two single-mode polarization maintaining fibers, separately transmit double-frequency laser, this polarization state adjustment and light path that is conducive to double-frequency laser is aimed at;
(3) in the present invention, measure that optical grating diffraction produces 0 grade and symmetrical senior diffraction light are respectively and with reference to the diffraction light of grating, form optical beat and interfere, by three photodetectors, measured simultaneously, by signal, process and can accurately measure grating in the relative displacement of two dimensional surface, owing to not needing laser instrument that the beat signal of independent double-frequency laser difference on the frequency is provided, reduce optical element, simplified light path layout.
Accompanying drawing explanation
Accompanying drawing is a kind of double-frequency laser grating interference two-dimensional measurement system architecture schematic diagram of anti-optics aliasing.
In figure: 1-laser instrument; First single-mode polarization maintaining fiber of 2-; Second single-mode polarization maintaining fiber of 3-; 4-polarization spectroscope; 5-reference arm quarter-wave plate; 6-reference arm dioptric element; 7-is with reference to grating; 8-gage beam quarter-wave plate; 9-gage beam dioptric element; 10-measures grating; 11-photodetector A; 12-photodetector B; 13-photodetector C; 14-signal processing unit; 20-the first incoming laser beam; 21-reference arm light beam; 22-(+1 ,+1) level light beam; 23-(+1,0) level light beam; 24-(10 ,-1) level light beam; 30-the second incoming laser beam; 31-gage beam light beam; 32-+1 level light beam; 33-0 level light beam; 34--1 level light beam; 35,36,37-light beam A, B, C.
Embodiment
Below in conjunction with accompanying drawing, the specific embodiment of the invention is described in further detail.
The double-frequency laser grating interference two-dimensional measurement method of anti-optics aliasing, laser instrument is exported two bundle laser simultaneously, wherein beam of laser is first frequency, the second bundle laser is second frequency, described beam of laser and the second bundle laser are spatially separately and parallelly incide a spectroscope, beam of laser reflects to form reference beam through spectroscope and incides with reference to grating, by forming the inferior multi beam of a plurality of levels with reference to optical grating diffraction with reference to diffracted beam, the second bundle laser forms measuring beam through spectroscope transmission and incides measurement grating, by measuring optical grating diffraction, form the inferior multi beam measurement diffracted beam of a plurality of levels, describedly with reference to first in diffracted beam, restraint, the second bundle, three beams of laser Shu Yici respectively with the first bundle of measuring in diffracted beam, the second bundle, three beams of laser bundle correspondence is converged formation optical beat and is interfered, optical beat signal is processed the two-dimensional phase that obtains measuring grating to movable information through photodetection and signal.
The double-frequency laser grating interference two-dimensional measurement system of anti-optics aliasing, the laser instrument 1 and the polarization spectroscope 4 that comprise exportable two bundle different frequency laser beam, the incident end that wherein beam of laser bundle transfers to polarization spectroscope 4 through first single-mode polarization maintaining fiber 2 forms the first incoming laser beam 20, the incident end that another bundle laser beam transfers to polarization spectroscope 4 through second single-mode polarization maintaining fiber 3 forms the second incoming laser beam 30, adjust the polarization state of the first incoming laser beam 20, make the first incoming laser beam 20 reflect to form reference arm light beam 21 at the light splitting face of polarization spectroscope 4, in the light path of described reference arm light beam 21, configure successively reference arm quarter-wave plate 5, reference arm dioptric element 6 and with reference to grating 7, reference arm light beam 21 process reference arm quarter-wave plates 5 and reference arm dioptric element 6 directives are with reference to grating 7, reference arm light beam 21 is through forming (+1 with reference to grating 7 diffraction reflections, 0) level light beam 23, (+1, + 1) level light beam 22 and (+1,-1) level light beam 24, described (+1, 0) level light beam 23, (+1, + 1) level light beam 22 and (+1,-1) level light beam 24 its beam direction after reference arm dioptric element 6 is adjusted into parallel and reverse with reference arm light beam 21, (+1, 0) level light beam 23, (+1, + 1) level light beam 22 and (+1,-1) level light beam 24 turns back to polarization spectroscope 4 through reference arm quarter-wave plate 5 again, and through spectro-film, seeing through on the transmitted light path of spectro-film photodetector A11 successively, photodetector B12 and photodetector C13, described (+1, + 1) level light beam 22 directive photodetector A11, (+1, 0) level light beam 23 directive photodetector B12, (+1,-1) level light beam 24 directive photodetector C13, adjust the polarization state of the second incoming laser beam 30, make the second incoming laser beam 30 become gage beam light beam 31 at the light splitting face transmission of polarization spectroscope 4, allocating and measuring arm quarter-wave plate 8 successively in described gage beam light beam 31 light paths, gage beam dioptric element 9 and measurement grating 10, gage beam light beam 31 is measured grating 10 through gage beam quarter-wave plate 8 and gage beam dioptric element 9 directives, gage beam light beam 31 forms 0 grade of light beam 33 through measuring grating 10 diffraction reflections, + 1 grade of light beam 32 and-1 grade of light beam 34, described 0 grade of light beam 33, + 1 grade of light beam 32 is adjusted into parallel and reverse with gage beam light beam 31 with-1 grade of light beam 34 its beam direction after gage beam dioptric element 9, 0 grade of light beam 33, + 1 grade of light beam 32 and-1 grade of light beam 34 turn back to polarization spectroscope 4 through gage beam quarter-wave plate 8 again, through polarization spectroscope 4 reflections, form respectively successively light beam B36, light beam A 35, light beam C37, described light beam A 35 is with (+1, + 1) level light beam 22 converges directive photodetector A11, light beam B36 and (+1, 0) level light beam 23 converges directive photodetector B12, light beam C37 and (+1,-1) level light beam 24 converges directive photodetector C13, described photodetector A11, B12, C13 converts beat frequency light signal to electric signal, by wire or optical fiber, deliver to respectively signal processing unit 14 and complete processing.
The double-frequency laser grating interference two-dimensional measurement system of anti-optics aliasing, described is flat reflective two-dimensional quadrature grating with reference to grating 7, described measurement grating 10 is flat reflective one-dimensional grating or flat reflective two-dimensional quadrature grating.
The double-frequency laser grating interference two-dimensional measurement system of anti-optics aliasing, described photodetector A11, B12, C13 can be by photodetector direct detections or by fibre-optical probe remote probe to the detection of optical beat signal.
When measurement grating 10 is static, (+1, + 1) level light beam 22 and light beam A 35, (+1, 0) level light beam 23 and light beam B36, (+1,-1) level light beam 24 and light beam C37 form respectively and measure optical beat interference, its beat frequency is frequency poor of the double-frequency laser of laser instrument 1 output, when measurement grating 10 is parallel to 31 motion of gage beam light beam, 0 grade of light beam 33 will produce corresponding Doppler shift, when measure grating 10 perpendicular to gage beam light beam 31 and portray direction while moving perpendicular to the grating of measuring grating 10 simultaneously, + 1 grade of light beam 32 and-1 grade of light beam 34 will produce respectively equal and opposite in direction, the Doppler shift that symbol is contrary, this makes photodetector A11, B12, the optical beat signal that C13 surveys changes, finally by photodetector A11, B12, the signal that C13 receives is processed, can precise measuring grid 10 in the relative displacement of two dimensional surface.
Claims (4)
1. the double-frequency laser grating interference two-dimensional measurement method of an anti-optics aliasing, it is characterized in that laser instrument exports two bundle laser simultaneously, wherein beam of laser is first frequency, the second bundle laser is second frequency, described beam of laser and the second bundle laser are spatially separately and parallelly incide a spectroscope, beam of laser reflects to form reference beam through spectroscope and incides with reference to grating, by forming the inferior multi beam of a plurality of levels with reference to optical grating diffraction with reference to diffracted beam, the second bundle laser forms measuring beam through spectroscope transmission and incides measurement grating, by measuring optical grating diffraction, form the inferior multi beam measurement diffracted beam of a plurality of levels, describedly with reference to first in diffracted beam, restraint, the second bundle, three beams of laser Shu Yici respectively with the first bundle of measuring in diffracted beam, the second bundle, three beams of laser bundle correspondence is converged formation optical beat and is interfered, optical beat signal is processed the two-dimensional phase that obtains measuring grating to movable information through photodetection and signal.
2. the double-frequency laser grating interference two-dimensional measurement system of an anti-optics aliasing, the laser instrument (1) and the polarization spectroscope (4) that comprise exportable two bundle different frequency laser beam, the incident end that wherein beam of laser bundle transfers to polarization spectroscope (4) through first single-mode polarization maintaining fiber (2) forms the first incoming laser beam (20), the incident end that another bundle laser beam transfers to polarization spectroscope (4) through second single-mode polarization maintaining fiber (3) forms the second incoming laser beam (30), it is characterized in that adjusting the polarization state of the first incoming laser beam (20), make the first incoming laser beam (20) reflect to form reference arm light beam (21) at the light splitting face of polarization spectroscope (4), in the light path of described reference arm light beam (21), configure successively reference arm quarter-wave plate (5), reference arm dioptric element (6) and with reference to grating (7), reference arm light beam (21) process reference arm quarter-wave plate (5) and reference arm dioptric element (6) directive are with reference to grating (7), reference arm light beam (21) is through forming (+1 with reference to grating (7) diffraction reflection, 0) level light beam (23), (+1, 10) level light beam (22) and (+1,-1) level light beam (24), described (+1, 0) level light beam (23), (+1, + 1) level light beam (22) and (+1,-1) level light beam (24) its beam direction after reference arm dioptric element (6) is adjusted into parallel and reverse with reference arm light beam (21), (+1, 0) level light beam (23), (+1, + 1) level light beam (22) and (+1,-1) level light beam (24) turns back to polarization spectroscope (4) through reference arm quarter-wave plate (5) again, and through spectro-film, seeing through on the transmitted light path of spectro-film photodetector A (11) successively, photodetector B (12) and photodetector C (13), described (+1, + 1) level light beam (22) directive photodetector A (11), (+1, 0) level light beam (23) directive photodetector B (12), (+1,-1) level light beam (24) directive photodetector C (13), adjust the polarization state of the second incoming laser beam (30), make the second incoming laser beam (30) become gage beam light beam (31) at the light splitting face transmission of polarization spectroscope (4), allocating and measuring arm quarter-wave plate (8) successively in described gage beam light beam (31) light path, gage beam dioptric element (9) and measurement grating (10), gage beam light beam (31) is measured grating (10) through gage beam quarter-wave plate (8) and gage beam dioptric element (9) directive, gage beam light beam (31) forms 0 grade of light beam (33) through measuring grating (10) diffraction reflection, + 1 grade of light beam (32) and-1 grade of light beam (34), described 0 grade of light beam (33), + 1 grade of light beam (32) is adjusted into parallel and reverse with gage beam light beam (31) with-1 grade of light beam (34) its beam direction after gage beam dioptric element (9), 0 grade of light beam (33), + 1 grade of light beam (32) and-1 grade of light beam (34) pass through gage beam quarter-wave plate (8) again and turn back to polarization spectroscope (4), through polarization spectroscope (4) reflection, form respectively successively light beam B (36), light beam A (35), light beam C (37), described light beam A (35) and (+1, + 1) level light beam (22) converges directive photodetector A (11), light beam B (36) and (+1, 0) level light beam (23) converges directive photodetector B (12), light beam C (37) and (+1,-1) level light beam (24) converges directive photodetector C (13), described photodetector A, B, C (11, 12, 13) convert beat frequency light signal to electric signal, by wire or optical fiber, deliver to respectively signal processing unit (14) and complete processing.
3. the double-frequency laser grating interference two-dimensional measurement system of anti-optics aliasing according to claim 2, it is characterized in that described is flat reflective two-dimensional quadrature grating with reference to grating (7), and described measurement grating (10) is flat reflective one-dimensional grating or flat reflective two-dimensional quadrature grating.
4. the double-frequency laser grating interference two-dimensional measurement system of anti-optics aliasing according to claim 2, is characterized in that described photodetector A, B, C (11,12,13) can be by photodetector direct detections or by fibre-optical probe remote probe to the detection of optical beat signal.
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| US11860057B2 (en) | 2020-09-11 | 2024-01-02 | Changchun Institute Of Optics, Fine Mechanics And Physics, Chinese Academy Of Sciences | Heterodyne one-dimensional grating measuring device and measuring method thereof |
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