CN109254170A - The double vibrating beam accelerometers of integral type quartz and preparation method - Google Patents
The double vibrating beam accelerometers of integral type quartz and preparation method Download PDFInfo
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- CN109254170A CN109254170A CN201811450018.6A CN201811450018A CN109254170A CN 109254170 A CN109254170 A CN 109254170A CN 201811450018 A CN201811450018 A CN 201811450018A CN 109254170 A CN109254170 A CN 109254170A
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- 239000010453 quartz Substances 0.000 title claims abstract description 99
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 99
- 238000002360 preparation method Methods 0.000 title claims abstract description 20
- 229910052751 metal Inorganic materials 0.000 claims abstract description 35
- 239000002184 metal Substances 0.000 claims abstract description 35
- 239000000758 substrate Substances 0.000 claims description 42
- 230000007797 corrosion Effects 0.000 claims description 41
- 238000005260 corrosion Methods 0.000 claims description 41
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 20
- RZVXOCDCIIFGGH-UHFFFAOYSA-N chromium gold Chemical compound [Cr].[Au] RZVXOCDCIIFGGH-UHFFFAOYSA-N 0.000 claims description 20
- 239000007788 liquid Substances 0.000 claims description 20
- 230000000994 depressogenic effect Effects 0.000 claims description 19
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 19
- 229910052737 gold Inorganic materials 0.000 claims description 19
- 239000010931 gold Substances 0.000 claims description 19
- 229910052804 chromium Inorganic materials 0.000 claims description 16
- 239000011651 chromium Substances 0.000 claims description 16
- LDDQLRUQCUTJBB-UHFFFAOYSA-O azanium;hydrofluoride Chemical compound [NH4+].F LDDQLRUQCUTJBB-UHFFFAOYSA-O 0.000 claims description 12
- 239000013078 crystal Substances 0.000 claims description 12
- 230000003628 erosive effect Effects 0.000 claims description 12
- 229920002120 photoresistant polymer Polymers 0.000 claims description 12
- 239000003292 glue Substances 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 9
- 238000005507 spraying Methods 0.000 claims description 8
- 230000035515 penetration Effects 0.000 claims description 5
- 230000005611 electricity Effects 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 claims description 4
- 230000035945 sensitivity Effects 0.000 abstract description 7
- 238000010586 diagram Methods 0.000 description 8
- 230000001133 acceleration Effects 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 230000032683 aging Effects 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 230000035882 stress Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/097—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by vibratory elements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/09—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by piezoelectric pick-up
- G01P15/0922—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by piezoelectric pick-up of the bending or flexing mode type
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P2015/0862—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with particular means being integrated into a MEMS accelerometer structure for providing particular additional functionalities to those of a spring mass system
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Abstract
Embodiment of the invention discloses a kind of double vibrating beam accelerometers of integral type quartz and preparation methods, the double vibrating beam accelerometers of integral type quartz include: integrally formed assembly section, flexible beam, vibration beam, mass block and metal electrode, and mass block is connected to assembly section by flexible beam and vibration beam；The distance between the upper surface of flexible beam and mass top surface are equal to the distance between lower surface and mass block lower surface of flexible beam, and the one end for the beam that shakes is connected to the upper surface of assembly section, and the other end is connected to the upper surface of mass block.The double vibrating beam accelerometers of integral type quartz are integrally formed, compared to it is split type have the characteristics that it is compact-sized, exempt from assembly, easy processing, in addition using double vibration beams, it can be to avoid Vacuum Package, more reliable and more stable in use, flexible beam is located at the centre of mass block upper and lower surface, improves the sensitivity of device, the thickness of flexible beam can be inconsistent with the thickness for the beam that shakes, and increases the freedom degree of design.
Description
Technical field
The present invention relates to microelectromechanical systems, and in particular to a kind of integral type quartzy pair of vibrating beam accelerometer and preparation side
Method.
Background technique
Quartz vibration beam accelerometer is a kind of power-frequency characteristic sensitivity inertia force MEMS inertia sensing using quartz vibration beam
Device has many advantages, such as that Direct Digital output, bias stability is good, scale factor stability is good, range flexible design, can use extensively
In tactical missile gesture stability, inertial navigation, the fields such as earth resource exploration, there are important Military value and name value.
Current quartz vibration beam accelerometer is broadly divided into integral type and split type, and split type structure Typical Representative is
The RBA500 of Honeywell company is made of with metallic gauge block quartzy twin beams vibration beam, needs precision assembly, face different materials
The problem of thermal mismatching and glue aging, long-time stability and reliability are poor.The structure that integral structure is designed with French ONERA
For Typical Representative, the beam that shakes all is made of quartz material with quality structure, has the advantages of compact-sized, integrated molding, but adopt
With Dan Zhenliang, Vacuum Package is needed, the change of vacuum degree will affect the performance of device in use.
Electronic Engineering Inst., China Engineering Physics Inst Zhang Zhaoyun et al. proposes a kind of one regarding to the issue above
The double vibrating beam accelerometers of formula quartz (application number: 201811339689.5), have the advantages of compact-sized, integrated molding, and can
The problem of to avoid Vacuum Package.But the flexible beam of the accelerometer is located at one side of mass block, and sensitivity does not have flexible beam position
Structural sensitivity among mass block upper and lower surface is high, and the flexible cantilever thickness of the accelerometer must one with the thickness for the beam that shakes
Sample limits the freedom degree of design.For these problems, the invention proposes a kind of flexible beams to be located in mass block upper and lower surface
Between structure, the thickness of flexible beam can be inconsistent with the thickness for the beam that shakes, and proposes corresponding preparation process.
Summary of the invention
The object of the present invention is to provide a kind of double vibrating beam accelerometers of integral type quartz and preparation method, integral type quartz
Double vibrating beam accelerometers are integrally formed, compared to it is split type have the characteristics that it is compact-sized, exempt from assembly, easy processing, in addition using pair
Shake beam, can be to avoid Vacuum Package, and more reliable and more stable in use, flexible beam is located at the centre of mass block upper and lower surface, mentions
The thickness of the sensitivity of high device, flexible beam can be inconsistent with the thickness for the beam that shakes, and increases the freedom degree of design.
To achieve the goals above, a kind of double vibrating beam accelerometers of integral type quartz are provided according to an aspect of the present invention
Include: integrally formed assembly section, flexible beam, vibration beam, mass block and metal electrode, the mass block by the flexible beam and
The vibration beam is connected to the assembly section；
Wherein, the vibration beam includes the first straight beam and the second straight beam, and first straight beam and second straight beam are set side by side, institute
The one end for stating the first straight beam and second straight beam is connected to the assembly section, and the other end is connected to the mass block, the gold
Belong to electrode to be arranged on first straight beam and second straight beam, the metal electrode on first straight beam and second straight beam
Polarity it is opposite；
Wherein, the flexible beam includes two attachment beams, and two attachment beams are located at the two sides of the vibration beam, and the one of the flexible beam
End is connected to the assembly section, and the other end is connected to the mass block；
Wherein, the thickness of the flexible beam and the beam that shakes is less than the thickness of the assembly section and the mass block；The flexible beam
The distance between upper surface and the mass top surface be equal to the flexible beam lower surface and the mass block lower surface it
Between distance, one end of the vibration beam is connected to the upper surface of the assembly section, and the other end is connected to the upper table of the mass block
Face.
Preferably, the assembly section and the mass block are concave shape, and the notch of the concave shape is depressed area, the matter
Gauge block is located in the depressed area of the assembly section, and the depressed area of the mass block is towards the depressed area of the mass block.
Preferably, the assembly section is in a straight line with the mass block middle line, makes the double vibrations of integral type quartz
Beam accelerometer axisymmetricly structure.
Preferably, one end of the vibration beam is connected to the depressed area of the mass block, and the other end is connected to the assembly section,
First straight beam and second straight beam are arranged by axisymmetrical of the middle line of mass block.
Preferably, one end of the flexible beam is connected to the protruding portion that the mass block is concave shape, and the other end is connected to
The two sides of the vibration beam are arranged in using the middle line of the assembly section as axisymmetrical for the assembly section, two attachment beams.
Preferably, the assembly section is identical as the thickness of the mass block.
Preferably, the metal electrode includes first electrode, second electrode and lead；
Wherein, the first electrode includes electrode, the first right electrode in the first left electrode, first；The second electrode includes the
Two left electrodes, electrode, the second right electrode in second；The lead includes first lead and the second lead；
Wherein, the first electrode is arranged on first straight beam, and the second electrode is arranged on second straight beam；
Wherein, the described first left electrode is located in described first on the left of electrode, and the first right electrode is located at electricity in described first
Ultra-Right side；The second left electrode is located in described second on the left of electrode, and the second right electrode is located at electrode in described second
Right side；
Wherein, the described first left electrode is connected to the described first right electrode, is then connected to electrode in described second, and described second
Left electrode is connected to the described second right electrode, is then connected to electrode in described first；
Wherein, the first lead is connected to the described first left electrode, second lead be connected in described first electrode and
The second right electrode.
A kind of preparation method of double vibrating beam accelerometers of integral type quartz is provided according to another aspect of the present invention, it is described
Preparation method includes:
1) cutting obtains quartz substrate；
2) mask is sputtered in the upper and lower surface of the quartz substrate；
3) region is removed by calibration mask, penetration corrosion removes the vibration beam, the mass block and the flexible beam side wall
Crystal edge；
4) region is removed by calibration mask, single side partial corrosion cuts down the thickness of the vibration beam；
5) by calibration mask remove region, two-sided partial corrosion cut down the flexible beam thickness and single side partial corrosion after
The thickness of the continuous abatement vibration beam；
6) it is laid with metal electrode on the vibration beam, obtains the double vibrating beam accelerometers of integral type quartz.
Preferably, the preparation method includes:
1) original material cuts single crystal quartz using double Z that throw, and obtains the quartz substrate with a thickness of 400 μm of -600 μ m thick；
2) chromium and gold are successively sputtered on the surface of the quartz substrate, the quartz substrate upper and lower surface formed with a thickness of
2000-4000 quartz corrosion metal mask；
3) pass through double spread and be exposed on the chromium gold mask and appear the first mask removal region；
4) the chromium gold mask on region is removed by gold, chromium corrosive liquid the first mask of erosion removal, and removes photoresist；
5) two-sided corrosion on region is removed in the first mask by saturation ammonium hydrogen fluoride solution and runs through the quartz substrate, remove institute
State the crystal edge of vibration beam, mass block and the flexible beam side wall；
6) it is exposed on by two-sided glue spraying and on one side on the chromium metal mask and appears the second mask removal region；
7) the chromium gold mask on region is removed by gold, chromium corrosive liquid the second mask of erosion removal, and removes photoresist；
8) quartz substrate described in single side partial corrosion on region is removed in the second mask by saturation ammonium hydrogen fluoride solution corrosive liquid,
So that the vibration cantilever thickness reduces, reduced thickness needs to be determined according to the thickness of substrate thickness and required flexible beam；
9) third mask is appeared by two-sided glue spraying and being exposed on the chromium gold mask and removes region；
10) the chromium gold mask on region is removed by gold, chromium corrosive liquid erosion removal third mask, and removes photoresist；
11) two-sided partial corrosion on region is removed in third mask by saturation ammonium hydrogen fluoride solution corrosive liquid and continued second
Mask removes quartz substrate described in single side partial corrosion on region, so that the flexible beam and vibration beam are thick required for obtaining
Degree；
12) the quartz corrosion metal mask on quartz substrate, the splash-proofing sputtering metal electrode on the vibration beam, the metal electrode are removed
With a thickness of 2000-4000.
The beneficial effects of the present invention are:
1) the double vibrating beam accelerometers of integral type quartz of the invention are integrally formed, compared to it is split type have it is compact-sized, exempt from assembly,
The characteristics of easy processing.
2) the double vibrating beam accelerometers of integral type of the invention quartz can used using double vibration beams to avoid Vacuum Package
In it is more reliable and more stable.
3) preparation method through the invention can be such that the specification of the double vibrating beam accelerometers of integral type quartz is accurately controlled
System uses the double vibrating beam accelerometers of integral type quartz more convenient, measures more accurate.
4) flexible beam is located at the centre of mass block upper and lower surface, improves the sensitivity of device, the thickness of flexible beam is with the beam that shakes
Thickness can be inconsistent, increase the freedom degree of design.
Detailed description of the invention
Fig. 1 shows the schematic structure of the double vibrating beam accelerometers of integral type quartz according to one embodiment of present invention
Figure；
Fig. 2 shows the motor distribution schematic diagrams of the double vibrating beam accelerometers of the quartz of integral type according to one embodiment of present invention；
Fig. 3 shows the schematic diagram of metal electrode according to one embodiment of present invention；
Fig. 4 a- Fig. 4 k shows the preparation process stream of the double vibrating beam accelerometers of integral type quartz according to one embodiment of present invention
Cheng Tu；
Fig. 5 shows quartz substrate penetration corrosion schematic diagram according to one embodiment of present invention；
Fig. 6 shows quartz substrate partial corrosion schematic diagram according to one embodiment of present invention.
Wherein:
The assembly section 1-, 2- flexible beam, 3- vibration beam, 4- mass block, 5- first electrode, 6- second electrode, 7- lead；
Electrode in 501- first, the left electrode of 502- first, the right electrode of 503- first, electrode in 601- second, the left electricity of 602- second
Pole, the right electrode of 603- second, 701- first lead, the second lead of 702-.
Specific embodiment
To make the objectives, technical solutions, and advantages of the present invention clearer, below in conjunction with embodiment of the present invention
In attached drawing, the technical solution in embodiment of the present invention is clearly and completely described, it is clear that described embodiment party
Formula is only some embodiments of the invention, rather than whole embodiments.Based on the embodiment in the present invention, ability
Domain those of ordinary skill every other embodiment obtained without making creative work, belongs to the present invention
The range of protection.In the absence of conflict, the feature in the embodiment and embodiment in the present invention can be mutually any
Combination.
A kind of double vibrating beam accelerometers of integral type quartz, the double vibrations of integral type quartz are provided according to an aspect of the present invention
Beam accelerometer includes: that integrally formed assembly section, flexible beam, vibration beam, mass block and metal electrode, the mass block pass through institute
It states flexible beam and the vibration beam is connected to the assembly section；
Wherein, the vibration beam includes the first straight beam and the second straight beam, and first straight beam and second straight beam are set side by side, institute
The one end for stating the first straight beam and second straight beam is connected to the assembly section, and the other end is connected to the mass block, the gold
Belong to electrode to be arranged on first straight beam and second straight beam, the metal electrode on first straight beam and second straight beam
Polarity it is opposite；
Wherein, the flexible beam includes two attachment beams, and two attachment beams are located at the two sides of the vibration beam, and the one of the flexible beam
End is connected to the assembly section, and the other end is connected to the mass block；
Wherein, the thickness of the flexible beam and the beam that shakes is less than the thickness of the assembly section and the mass block；The flexible beam
The distance between upper surface and the mass top surface be equal to the flexible beam lower surface and the mass block lower surface it
Between distance, one end of the vibration beam is connected to the upper surface of the assembly section, and the other end is connected to the upper table of the mass block
Face.
Specifically, in use, the first straight beam and the second straight beam polarity of electrode are on the contrary, the beam that shakes under the action of driving voltage rises
Vibration, the beam that causes to shake in X-direction bending vibration, two straight beams of each pair of vibration beam in vibration direction of vibration on the contrary, can offset
The power being applied on the pinboard of assembly section obtains high Q value, does not need Vacuum Package.It is of the invention when acceleration effect
The double vibrating beam accelerometer sensitivities of integral type quartz are converted acceleration to by mass block used to the acceleration change of Z-direction
Property power, due to power-frequency characteristic of quartz crystal, the intrinsic frequency for the beam that shakes can change, when shake beam by compression when, inherently
Frequency increases, and when the beam that shakes is by tensile stress, intrinsic frequency reduces, to obtain the size of acceleration according to the variation of frequency.
Alternatively, it is also possible to which two accelerometers to be combined into the accelerometer of a difference form, i.e., a pair of of vibration of one accelerometer
Beam is by compression, and the vibration beam of another accelerometer is by tensile stress, by detecting the frequency difference signal of two accelerometers,
It can realize the detection of accelerometer sensitive axis direction acceleration.
Specifically, which uses double vibration beams, and is same material, is integrally formed, and it is double to compare current split type quartz
Vibrating beam accelerometer does not need precision assembly, have the characteristics that it is compact-sized, exempt from assembly, easy processing, and can be to avoid different materials
It the shortcomings that thermal mismatching effect and glue aging between material, can be to avoid true using double vibration beams compared to current integral structure
It is the problem of sky encapsulation, more reliable and more stable in use.
Further, the assembly section and the mass block are concave shape, and the notch of the concave shape is depressed area, described
Mass block is located in the depressed area of the assembly section, and the depressed area of the mass block is towards the depressed area of the mass block.
Further, the assembly section is in a straight line with the mass block middle line, keeps the integral type quartz double
Vibrating beam accelerometer axisymmetricly structure.
Further, one end of the vibration beam is connected to the depressed area of the mass block, and the other end is connected to the assembly
Area, first straight beam and second straight beam are arranged by axisymmetrical of the middle line of mass block.
Further, one end of the flexible beam is connected to the protruding portion that the mass block is concave shape, other end connection
In the assembly section, the two sides of the vibration beam are arranged in using the middle line of the assembly section as axisymmetrical for two attachment beams.
Further, the thickness of the flexible beam can be different from the thickness of the vibration beam.
Further, the assembly section is identical as the thickness of the mass block.
Further, the metal electrode includes first electrode, second electrode and lead；
Wherein, the first electrode includes electrode, the first right electrode in the first left electrode, first；The second electrode includes the
Two left electrodes, electrode, the second right electrode in second；The lead includes first lead and the second lead；
Wherein, the first electrode is arranged on first straight beam, and the second electrode is arranged on second straight beam；
Wherein, the described first left electrode is located in described first on the left of electrode, and the first right electrode is located at electricity in described first
Ultra-Right side；The second left electrode is located in described second on the left of electrode, and the second right electrode is located at electrode in described second
Right side；
Wherein, the described first left electrode is connected to the described first right electrode, is then connected to electrode in described second, and described second
Left electrode is connected to the described second right electrode, is then connected to electrode in described first；
Wherein, the first lead is connected to the described first left electrode, second lead be connected in described first electrode and
The second right electrode.
A kind of preparation method of double vibrating beam accelerometers of integral type quartz, the system are provided according to another aspect of the present invention
Preparation Method includes:
1) cutting obtains quartz substrate；
2) mask is sputtered in the upper and lower surface of the quartz substrate；
3) region is removed by calibration mask, penetration corrosion removes the vibration beam, the mass block and the flexible beam side wall
Crystal edge；
4) region is removed by calibration mask, single side partial corrosion cuts down the thickness of the vibration beam；
5) by calibration mask remove region, two-sided partial corrosion cut down the flexible beam thickness and single side partial corrosion after
The thickness of the continuous abatement vibration beam；
6) it is laid with metal electrode on the vibration beam, obtains the double vibrating beam accelerometers of integral type quartz.
Further, the preparation method includes:
1) original material cuts single crystal quartz using double Z that throw, and obtains the quartz substrate with a thickness of 400 μm of -600 μ m thick；
2) chromium and gold are successively sputtered on the surface of the quartz substrate, the quartz substrate upper and lower surface formed with a thickness of
2000-4000 quartz corrosion metal mask；
3) pass through double spread and be exposed on the chromium gold mask and appear the first mask removal region；
4) the chromium gold mask on region is removed by gold, chromium corrosive liquid the first mask of erosion removal, and removes photoresist；
5) two-sided corrosion on region is removed in the first mask by saturation ammonium hydrogen fluoride solution and runs through the quartz substrate, remove institute
State the crystal edge of vibration beam, mass block and the flexible beam side wall；
6) it is exposed on by two-sided glue spraying and on one side on the chromium metal mask and appears the second mask removal region；
7) the chromium gold mask on region is removed by gold, chromium corrosive liquid the second mask of erosion removal, and removes photoresist；
8) quartz substrate described in single side partial corrosion on region is removed in the second mask by saturation ammonium hydrogen fluoride solution corrosive liquid,
So that the vibration cantilever thickness reduces, reduced thickness needs to be determined according to the thickness of substrate thickness and required flexible beam；
9) third mask is appeared by two-sided glue spraying and being exposed on the chromium gold mask and removes region；
10) the chromium gold mask on region is removed by gold, chromium corrosive liquid erosion removal third mask, and removes photoresist；
11) two-sided partial corrosion on region is removed in third mask by saturation ammonium hydrogen fluoride solution corrosive liquid and continued second
Mask removes quartz substrate described in single side partial corrosion on region, so that the flexible beam and vibration beam are thick required for obtaining
Degree；
12) the quartz corrosion metal mask on quartz substrate, the splash-proofing sputtering metal electrode on the vibration beam, the metal electrode are removed
With a thickness of 2000-4000.
Embodiment
Fig. 1 shows the schematic structure of the double vibrating beam accelerometers of integral type quartz according to one embodiment of present invention
Figure；Fig. 2 shows the motor distribution schematic diagrams of the double vibrating beam accelerometers of the quartz of integral type according to one embodiment of present invention；Figure
3 show the schematic diagram of metal electrode according to one embodiment of present invention；Fig. 4 a- Fig. 4 h is shown according to the present invention
The double vibrating beam accelerometers of one embodiment integral type quartz preparation technology flow chart；Fig. 5 shows according to the present invention one
A embodiment quartz substrate penetration corrosion schematic diagram；It is rotten that Fig. 6 shows quartz substrate part according to one embodiment of present invention
Lose schematic diagram.
As shown in figs 1 to 6,
The double vibrating beam accelerometers of integral type quartz include: integrally formed assembly section 1, flexible beam 2, vibration beam 3, mass block 4 and
Metal electrode, the mass block 4 are connected to the assembly section 4 by the flexible beam 2 and the vibration beam 3；
Wherein, the vibration beam 3 includes the first straight beam and the second straight beam, and first straight beam and second straight beam are set side by side,
One end of first straight beam and second straight beam is connected to the assembly section 1, and the other end is connected to the mass block 4, institute
It states metal electrode to be arranged on first straight beam and second straight beam, the metal on first straight beam and second straight beam
The polarity of electrode is opposite；
Wherein, the flexible beam 2 includes two attachment beams, and two attachment beams are located at the two sides of the vibration beam 3, the flexible beam
One end is connected to the assembly section 1, and the other end is connected to the mass block 4；
Wherein, the thickness of the flexible beam 2 and the beam 3 that shakes is less than the thickness of the assembly section 1 and the mass block 4；The flexibility
The lower surface of the distance between the upper surface of beam 2 and 4 upper surface of mass block equal to the flexible beam 2 and the mass block 4
One end of the distance between lower surface, the vibration beam 3 is connected to the upper surface of the assembly section 1, and the other end is connected to the matter
The upper surface of gauge block 4.
Further, the assembly section 1 and the mass block 4 are concave shape, and the notch of the concave shape is depressed area, institute
It states mass block 4 to be located in the depressed area of the assembly section 1, the recess of the depressed area of the mass block 4 towards the assembly section 1
Area.
Further, the assembly section 1 is in a straight line with 4 middle line of mass block, makes the integral type quartz
Double vibrating beam accelerometers axisymmetricly structure.
Further, one end of the vibration beam 3 is connected to the depressed area of the mass block 4, and the other end is connected to the dress
With area 1, states the first straight beam and second straight beam and be arranged by axisymmetrical of the middle line of mass block 4.
Further, one end of the flexible beam 2 is connected to the protruding portion that the mass block 4 is concave shape, and the other end connects
It is connected to the assembly section 1, the vibration beam 3 is arranged in by axisymmetrical of 1 middle line of the assembly section in two attachment beams
Two sides.
Further, the flexible beam 2 with a thickness of 50 μm -70 μm, it is described vibration beam 3 with a thickness of 80 μm -120 μm.
Further, the assembly section 1 is identical as the thickness of the mass block 4.
Further, the metal electrode includes first electrode 5, second electrode 6 and lead 7；
Wherein, the first electrode 5 includes electrode 501, the first right electrode 503 in the first left electrode 502, first；Described second
Electrode 6 includes electrode 601, the second right electrode 603 in the second left electrode 602, second；The lead 7 include first lead 701 and
Second lead 702；
Wherein, the first electrode 5 is arranged on first straight beam, and the second electrode 6 is arranged on second straight beam；
Wherein, the described first left electrode 502 is located at 501 left side of electrode in described first, and the first right electrode 503 is positioned at described
501 right side of electrode in first；The second left electrode 602 is located at 601 left side of electrode, the second right electrode in described second
603 are located at 601 right side of electrode in described second；
Wherein, the described first left electrode 502 is connected to the described first right electrode 503, is then connected to electrode in described second
601, the second left electrode 602 is connected to the described second right electrode 603, is then connected to electrode 501 in described first；
Wherein, the first lead connects 701 and is connected to the described first left electrode 502, and second lead 702 is connected to described first
Middle electrode 501 and the second right electrode 603.
The double vibrating beam accelerometers of integral type quartz the preparation method comprises the following steps:
1) original material cuts single crystal quartz using double Z that throw, and obtains the quartz substrate with a thickness of 500 μ m thicks；
2) chromium and gold are successively sputtered on the surface of the quartz substrate, the quartz substrate upper and lower surface formed with a thickness of
2000 quartz corrosion metal mask；
3) pass through double spread and be exposed on the chromium gold mask and appear the first mask removal region；
4) the chromium gold mask on region is removed by gold, chromium corrosive liquid the first mask of erosion removal, and removes photoresist；
5) two-sided corrosion on region is removed in the first mask by saturation ammonium hydrogen fluoride solution and runs through the quartz substrate, remove institute
State the crystal edge of vibration beam, mass block and the flexible beam side wall；
6) it is exposed on the chromium metal mask by two-sided glue spraying and single side and appears the second mask removal region；
7) the chromium gold mask on region is removed by gold, chromium corrosive liquid the second mask of erosion removal, and removes photoresist；
8) quartz substrate described in single side partial corrosion on region is removed in the second mask by saturation ammonium hydrogen fluoride solution corrosive liquid,
Corrosion depth be 180 μm so that it is described vibration beam with a thickness of 320 μm；
9) third mask is appeared by two-sided glue spraying and being exposed on the chromium gold mask and removes region；
10) the chromium gold mask on region is removed by gold, chromium corrosive liquid erosion removal third mask, and removes photoresist；
11) quartz substrate described in two-sided partial corrosion on region is removed in third mask by saturation ammonium hydrogen fluoride solution corrosive liquid
And continue quartz substrate described in single side partial corrosion on the second mask removal region, and 220 μm of corrosion depth, so that the flexibility
Beam with a thickness of 60 μm so that it is described vibration beam with a thickness of 100 μm；
12) the quartz corrosion metal mask on quartz substrate, the splash-proofing sputtering metal electrode on the vibration beam, the metal electrode are removed
With a thickness of 2000.
The above is only the preferred embodiment of the present invention, it is noted that above-mentioned preferred embodiment is not construed as pair
Limitation of the invention, protection scope of the present invention should be defined by the scope defined by the claims..For the art
For those of ordinary skill, without departing from the spirit and scope of the present invention, several improvements and modifications can also be made, these change
It also should be regarded as protection scope of the present invention into retouching.
Claims (9)
1. a kind of double vibrating beam accelerometers of integral type quartz, which is characterized in that the double vibrating beam accelerometers of integral type quartz include:
Integrally formed assembly section, flexible beam, vibration beam, mass block and metal electrode, the mass block pass through the flexible beam and described
Vibration beam is connected to the assembly section；
Wherein, the vibration beam includes the first straight beam and the second straight beam, and first straight beam and second straight beam are set side by side, institute
The one end for stating the first straight beam and second straight beam is connected to the assembly section, and the other end is connected to the mass block, the gold
Belong to electrode to be arranged on first straight beam and second straight beam, the metal electrode on first straight beam and second straight beam
Polarity it is opposite；
Wherein, the flexible beam includes two attachment beams, and two attachment beams are located at the two sides of the vibration beam, and the one of the flexible beam
End is connected to the assembly section, and the other end is connected to the mass block；
Wherein, the thickness of the flexible beam and the beam that shakes is less than the thickness of the assembly section and the mass block；The flexible beam
The distance between upper surface and the mass top surface be equal to the flexible beam lower surface and the mass block lower surface it
Between distance, one end of the vibration beam is connected to the upper surface of the assembly section, and the other end is connected to the upper table of the mass block
Face.
2. the double vibrating beam accelerometers of integral type according to claim 1 quartz, which is characterized in that the assembly section and described
Mass block is concave shape, and the notch of the concave shape is depressed area, and the mass block is located in the depressed area of the assembly section, institute
The depressed area of mass block is stated towards the depressed area of the assembly section.
3. the double vibrating beam accelerometers of integral type according to claim 2 quartz, which is characterized in that the assembly section with it is described
Mass block middle line is in a straight line, and makes the double vibrating beam accelerometers of integral type quartz axisymmetricly structure.
4. the double vibrating beam accelerometers of integral type quartz according to claim 2, which is characterized in that one end of the vibration beam connects
It is connected to the depressed area of the mass block, the other end is connected to the assembly section, and first straight beam and second straight beam are with matter
The middle line of gauge block is axisymmetrical setting.
5. the double vibrating beam accelerometers of integral type quartz according to claim 2, which is characterized in that one end of the flexible beam
It is connected to the protruding portion that the mass block is concave shape, the other end is connected to the assembly section, and two attachment beams are with described
The middle line of assembly section is the two sides that the vibration beam is arranged in axisymmetrical.
6. the double vibrating beam accelerometers of integral type according to claim 1 quartz, which is characterized in that the assembly section with it is described
The thickness of mass block is identical.
7. the double vibrating beam accelerometers of integral type according to claim 1 quartz, which is characterized in that the metal electrode includes
First electrode, second electrode and lead；
Wherein, the first electrode includes electrode, the first right electrode in the first left electrode, first；The second electrode includes the
Two left electrodes, electrode, the second right electrode in second；The lead includes first lead and the second lead；
Wherein, the first electrode is arranged on first straight beam, and the second electrode is arranged on second straight beam；
Wherein, the described first left electrode is located in described first on the left of electrode, and the first right electrode is located at electricity in described first
Ultra-Right side；The second left electrode is located in described second on the left of electrode, and the second right electrode is located at electrode in described second
Right side；
Wherein, the described first left electrode is connected to the described first right electrode, is then connected to electrode in described second, and described second
Left electrode is connected to the described second right electrode, is then connected to electrode in described first；
Wherein, the first lead is connected to the described first left electrode, second lead be connected in described first electrode and
The second right electrode.
8. the preparation method of the double vibrating beam accelerometers of the quartz of integral type described in a kind of any one of claim 1-7, feature
It is, the preparation method includes:
1) cutting obtains quartz substrate；
2) mask is sputtered in the upper and lower surface of the quartz substrate；
3) region is removed by calibration mask, penetration corrosion removes the vibration beam, the mass block and the flexible beam side wall
Crystal edge；
4) region is removed by calibration mask, single side partial corrosion cuts down the thickness of the vibration beam；
5) by calibration mask remove region, two-sided partial corrosion cut down the flexible beam thickness and single side partial corrosion after
The thickness of the continuous abatement vibration beam；
6) it is laid with metal electrode on the vibration beam, obtains the double vibrating beam accelerometers of integral type quartz.
9. preparation method according to claim 8, which is characterized in that the preparation method includes:
1) original material cuts single crystal quartz using double Z that throw, and obtains the quartz substrate with a thickness of 400 μm of -600 μ m thick；
2) chromium and gold are successively sputtered on the surface of the quartz substrate, the quartz substrate upper and lower surface formed with a thickness of
2000-4000 quartz corrosion metal mask；
3) pass through double spread and be exposed on the chromium gold mask and appear the first mask removal region；
4) the chromium gold mask on region is removed by gold, chromium corrosive liquid the first mask of erosion removal, and removes photoresist；
5) two-sided corrosion on region is removed in the first mask by saturation ammonium hydrogen fluoride solution and runs through the quartz substrate, remove institute
State the crystal edge of vibration beam, mass block and the flexible beam side wall；
6) it is exposed on by two-sided glue spraying and on one side on the chromium metal mask and appears the second mask removal region；
7) the chromium gold mask on region is removed by gold, chromium corrosive liquid the second mask of erosion removal, and removes photoresist；
8) quartz substrate described in single side partial corrosion on region is removed in the second mask by saturation ammonium hydrogen fluoride solution corrosive liquid,
So that the vibration cantilever thickness reduces, reduced thickness needs to be determined according to the thickness of substrate thickness and required flexible beam；
9) third mask is appeared by two-sided glue spraying and being exposed on the chromium gold mask and removes region；
10) the chromium gold mask on region is removed by gold, chromium corrosive liquid erosion removal third mask, and removes photoresist；
11) two-sided partial corrosion on region is removed in third mask by saturation ammonium hydrogen fluoride solution corrosive liquid and continued second
Mask removes quartz substrate described in single side partial corrosion on region, so that the flexible beam and vibration beam are thick required for obtaining
Degree；
12) the quartz corrosion metal mask on quartz substrate, the splash-proofing sputtering metal electrode on the vibration beam, the metal electrode are removed
With a thickness of 2000-4000.
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Cited By (3)
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| CN114543778A (en) * | 2020-11-24 | 2022-05-27 | 北京晨晶电子有限公司 | Method for assembling vibration reduction structure in chip |
| CN117607489A (en) * | 2024-01-17 | 2024-02-27 | 中国工程物理研究院电子工程研究所 | Sensitive structure of piezoresistive acceleration sensor and acceleration sensor |
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