CN109243744A - 一种零欧姆柱状电阻的制备方法 - Google Patents
一种零欧姆柱状电阻的制备方法 Download PDFInfo
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
- H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
- H01C17/14—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by chemical deposition
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/89—Coating or impregnation for obtaining at least two superposed coatings having different compositions
- C04B41/90—Coating or impregnation for obtaining at least two superposed coatings having different compositions at least one coating being a metal
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
- H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
- H01C17/14—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by chemical deposition
- H01C17/16—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by chemical deposition using electric current
Abstract
本发明公开一种零欧姆柱状电阻的制备方法,包括以下步骤:S1、采用化学镀镍工艺,在陶瓷基体表面镀制内电阻层,使内电阻层阻值小于1Ω;S2、在陶瓷基体两端压接帽盖;S3、采用电镀镍工艺,在内电阻层表面镀制外电阻层,外电阻层与内电阻层共同构成零欧姆柱状电阻的电阻膜,使电阻膜的阻值小于0.05Ω;S4、在外电阻层表面涂覆绝缘层;S5、在帽盖表面电镀锡层,得到所述零欧姆柱状电阻;本发明结合化学镀镍工艺与电镀镍工艺,可以快速使镍层厚度增加,使得外电阻层与内电阻层共同构成的电阻膜阻值最低可以做到0.01~0.03Ω,可以完全满足零欧姆电阻测试小于0.05Ω的要求,且工艺简单,成本低廉。
Description
技术领域
本发明涉及电器元件技术领域,具体是一种零欧姆柱状电阻的制备方法。
背景技术
零欧姆电阻又称为跨接电阻器,是一种特殊用途的电阻,零欧姆电阻的并非真正的阻值为零,欧姆电阻实际是电阻值很小的电阻。零欧姆电阻一般作为电路中的跳线或者兼容设计等作用,目前普遍采用片式零欧姆电阻来使用,但是某些特殊领域,如航天航空,考虑到片式电阻的焊点疲劳问题,为了保证可靠性,特殊部位采用柱状零欧姆电阻来进行跳接,既实现了功能,又能保证焊点的牢固度。
发明内容
本发明的目的在于提供一种零欧姆柱状电阻的制备方法,该方法能够降低零欧姆电阻的阻值,保证产品的质量要求。
本发明解决其技术问题所采用的技术方案是:
一种零欧姆柱状电阻的制备方法,包括以下步骤:
S1、采用化学镀镍工艺,在陶瓷基体表面镀制内电阻层,使内电阻层阻值小于1Ω;
S2、在陶瓷基体两端压接帽盖;
S3、采用电镀镍工艺,在内电阻层表面镀制外电阻层,外电阻层与内电阻层共同构成零欧姆柱状电阻的电阻膜,使电阻膜的阻值小于0.05Ω;
S4、在外电阻层表面涂覆绝缘层;
S5、在帽盖表面电镀锡层,得到所述零欧姆柱状电阻。
进一步的,步骤S1化学镀镍工艺采用的镀液为体积比3:3:1的氯化镍、次亚磷酸钠与乳酸的混合溶液,氯化镍、次亚磷酸钠与乳酸均为分析纯;化学镀镍时的温度保持在90℃~98℃,镀镍时间1~3小时,使内电阻层阻值小于1Ω。
进一步的,步骤S3电镀镍工艺采用的镀液为氨基磺酸镍、氯化镍与硼酸的混合液,氨基磺酸镍浓度为70ml/L的、氯化镍浓度为15~25ml/L、硼酸浓度为30~40g/L,使混合液的镍离子60~75g/L、 pH值4~5,电镀镍时的温度为50℃~60℃,电镀电流35~45A,电镀时间1.5~2小时。
本发明的有益效果是,先采用化学镀镍工艺在陶瓷基体表面镀制内层的电阻膜,该电阻膜的阻值小于1Ω、最低可以达到0.07Ω;然后再采用电镀镍的方式降低阻值,由于电镀镍可以快速使镍层厚度增加,使得外电阻层与内电阻层共同构成的电阻膜阻值最低可以做到0.01~0.03Ω,可以完全满足零欧姆电阻测试小于0.05Ω的要求,且工艺简单,成本低廉。
附图说明
下面结合附图和实施例对本发明进一步说明:
图1是本发明的示意图;
图2是图1的局部放大示意图。
具体实施方式
结合图1与图2所示,本发明提供一种零欧姆柱状电阻的制备方法,包括以下步骤:
S1、采用化学镀镍工艺,在陶瓷基体1表面镀制内电阻层2,化学镀镍工艺采用的镀液为体积比3:3:1的氯化镍、次亚磷酸钠与乳酸的混合溶液,氯化镍、次亚磷酸钠与乳酸均为分析纯;化学镀镍时的温度保持在90℃~98℃,镀镍时间1~3小时,使内电阻层2阻值小于1Ω;
S2、使用自动压帽机在陶瓷基体1两端压接帽盖3;
S3、采用电镀镍工艺,在内电阻层2表面镀制外电阻层4,电镀镍工艺采用的镀液为氨基磺酸镍、氯化镍与硼酸的混合液,氨基磺酸镍浓度为70ml/L的、氯化镍浓度为15~25ml/L、硼酸浓度为30~40g/L,使混合液的镍离子60~75g/L、 pH值4~5,电镀镍时的温度为50℃~60℃,电镀电流35~45A,电镀时间1.5~2小时;外电阻层4与内电阻层2共同构成零欧姆柱状电阻的电阻膜,使电阻膜的阻值小于0.05Ω;
S4、在外电阻层4表面涂覆绝缘层5;绝缘层5可采用环氧树脂;
S5、在帽盖3表面电镀锡层6,得到所述零欧姆柱状电阻。
以上所述,仅是本发明的较佳实施例而已,并非对本发明作任何形式上的限制;任何熟悉本领域的技术人员,在不脱离本发明技术方案范围情况下,都可利用上述揭示的方法和技术内容对本发明技术方案做出许多可能的变动和修饰,或修改为等同变化的等效实施例。因此,凡是未脱离本发明技术方案的内容,依据本发明的技术实质对以上实施例所做的任何简单修改、等同替换、等效变化及修饰,均仍属于本发明技术方案保护的范围内。
Claims (3)
1.一种零欧姆柱状电阻的制备方法,其特征在于,包括以下步骤:
S1、采用化学镀镍工艺,在陶瓷基体表面镀制内电阻层,使内电阻层阻值小于1Ω;
S2、在陶瓷基体两端压接帽盖;
S3、采用电镀镍工艺,在内电阻层表面镀制外电阻层,外电阻层与内电阻层共同构成零欧姆柱状电阻的电阻膜,使电阻膜的阻值小于0.05Ω;
S4、在外电阻层表面涂覆绝缘层;
S5、在帽盖表面电镀锡层,得到所述零欧姆柱状电阻。
2.根据权利要求1所述的一种零欧姆柱状电阻的制备方法,其特征在于,步骤S1化学镀镍工艺采用的镀液为体积比3:3:1的氯化镍、次亚磷酸钠与乳酸的混合溶液,氯化镍、次亚磷酸钠与乳酸均为分析纯;化学镀镍时的温度保持在90℃~98℃,镀镍时间1~3小时,使内电阻层阻值小于1Ω。
3.根据权利要求1所述的一种零欧姆柱状电阻的制备方法,其特征在于,步骤S3电镀镍工艺采用的镀液为氨基磺酸镍、氯化镍与硼酸的混合液,氨基磺酸镍浓度为70ml/L的、氯化镍浓度为15~25ml/L、硼酸浓度为30~40g/L,使混合液的镍离子60~75g/L、 pH值4~5,电镀镍时的温度为50℃~60℃,电镀电流35~45A,电镀时间1.5~2小时。
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Cited By (1)
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CN113450981A (zh) * | 2020-03-25 | 2021-09-28 | 光颉科技股份有限公司 | 柱状电阻元件及其制造方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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CN1109698A (zh) * | 1993-05-14 | 1995-10-04 | 清川镀金工业有限公司 | 具有保险丝功能的金属膜电阻及其制造方法 |
JP2007067035A (ja) * | 2005-08-30 | 2007-03-15 | Toppan Printing Co Ltd | 抵抗素子および抵抗素子の製造方法 |
CN103726051A (zh) * | 2013-11-27 | 2014-04-16 | 苏州市丰盛塑业有限公司 | 工程塑料表面处理的镀覆工艺 |
CN204066915U (zh) * | 2014-08-29 | 2014-12-31 | 东莞市晴远电子有限公司 | 一种精密金属膜电阻 |
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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CN1109698A (zh) * | 1993-05-14 | 1995-10-04 | 清川镀金工业有限公司 | 具有保险丝功能的金属膜电阻及其制造方法 |
JP2007067035A (ja) * | 2005-08-30 | 2007-03-15 | Toppan Printing Co Ltd | 抵抗素子および抵抗素子の製造方法 |
CN103726051A (zh) * | 2013-11-27 | 2014-04-16 | 苏州市丰盛塑业有限公司 | 工程塑料表面处理的镀覆工艺 |
CN204066915U (zh) * | 2014-08-29 | 2014-12-31 | 东莞市晴远电子有限公司 | 一种精密金属膜电阻 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN113450981A (zh) * | 2020-03-25 | 2021-09-28 | 光颉科技股份有限公司 | 柱状电阻元件及其制造方法 |
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