CN109217084A - The control method and high energy repetition capacitance laser of high energy repetition capacitance laser - Google Patents
The control method and high energy repetition capacitance laser of high energy repetition capacitance laser Download PDFInfo
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- CN109217084A CN109217084A CN201710527025.0A CN201710527025A CN109217084A CN 109217084 A CN109217084 A CN 109217084A CN 201710527025 A CN201710527025 A CN 201710527025A CN 109217084 A CN109217084 A CN 109217084A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/042—Arrangements for thermal management for solid state lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/163—Solid materials characterised by a crystal matrix
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/17—Solid materials amorphous, e.g. glass
Abstract
A kind of control method and high energy repetition capacitance laser of high energy repetition capacitance laser, this method comprises: injected pulse is expanded and limits the injection beam size after expanding, the amplification of injection light is set to be limited in the central area of gain media, the bore for injecting light beam is less than the 70% of gain media bore；The working environment of similar high energy repetition capacitance laser is formed using the adiabatic environment of gain media preliminary work central part；It before detecting output wave, stops working when the defocused image difference component of high-order wavefront distortion is greater than 0.2 wavelength, the duty cycle length of laser is determined with this, the thermal relaxation time by calculating gain media determines cooling cycle length；The duty cycle that different length is obtained by changing injection beam size reduces injection beam size and extends the duty cycle.The feature that invention has structure simple, easy to control, technical effect is good.
Description
Technical field
The present invention relates to high energy recurrent frequency pulse laser, the especially a kind of control method and height of high energy repetition capacitance laser
It can repetition capacitance laser.
Technical background
High energy Repetition Frequency Laser device is that a kind of output single pulse energy is high, and repetition rate is in tens of Hertz or so, pulse duration range
Control the solid laser system in nanosecond.It is widely used in the fields such as scientific research, medical treatment, industry.In femtosecond laser system,
It is had a very important significance as pumping source.
In existing implementation method, this kind of laser mainly has pulse working mode and two kinds of thermal capacitance operating mode, pulse work
The heat dissipation of operation mode and Laser emission occur simultaneously, generate temperature gradient in gain media, damage to output beam quality；
Thermal capacitance operating mode can avoid concentrating heat dissipation that local maximum heat is caused to answer to avoid thermal gradient but the heat management mode of needs complexity
The destruction of power.Therefore realize capacitance laser operating mode to realizing that this kind of laser is necessary using new, simple method.
Application No. is 200610026618.0 patents to describe a kind of method for realizing high energy repetition capacitance laser, but wherein relates to
And to complicated water-cool control equipment, and thermal stress is evaded there are still problem, brings great risk to practice.
Complicated water-cool control equipment and local maximum thermal stress all limits the utilization of high energy repetition capacitance laser in practice.
Summary of the invention
The object of the present invention is to provide a kind of control methods of high energy repetition capacitance laser and corresponding high energy repetition heat
Hold laser, this method utilizes the thermal conduction characteristic of gain media, keeps Laser emission and heat transfer spatially separated, do not need
Insulation in duty cycle forms the environment without temperature gradient using the adiabatic zone that gain media central area is formed, passes through mouth
The bore of diameter control device, control injection light beam obtains the duty cycle of different time length, realizes thermal capacitance working method, the height
It can the repetition capacitance laser feature simple, easy to control, technical effect is good with structure.
Technical solution of the invention is as follows:
A kind of control method of high energy repetition capacitance laser, it is characterized in that this method comprises: injected pulse is expanded
And the injection beam size after expanding is limited, so that the amplification of injection light is limited in the central area of gain media, injects light beam
Bore is less than the 70% of gain media bore；Similar high energy is formed using the adiabatic environment of gain media preliminary work central part
The working environment of repetition capacitance laser；Before detecting output wave, it is greater than 0.2 wave in the defocused image difference component of high-order wavefront distortion
It stops working when long, the duty cycle length of laser is determined with this, the thermal relaxation time by calculating gain media, which determines, to be dissipated
Hot cooling cycle length；The duty cycle that different length is obtained by changing injection beam size reduces injection beam size and prolongs
Long-time cycle.
This method, by reducing the aperture of injection light beam, can get longer work week when gain media bore is constant
Phase.
Realize the high energy repetition capacitance laser of the control method of above-mentioned high energy repetition capacitance laser, including nanosecond seed
Source and laser amplifier, it is characterized in that, the nanosecond seed source has time sequence control device；The laser amplifier by
Profile pump xenon lamp, conventional water cooling laser pump cavity and intracavitary bigbore gain media bar construction；In the described nanosecond seed source and
Beam size control device is equipped between laser amplifier, the described nanosecond seed source, beam size control device and laser are put
Big device common optical axis.
The equivalent lens that the beam size control device is synthesized by the positive lens of same optical axis successively, negative lens group
Focus and positive lens form confocal system, and the mechanism of the distance between positive and negative lenses for having adjustment described；Or by
Beam-expanding system and soft aperture slot are constituted.
Gain media in the laser amplifier is laser glass or laser crystal.
The control method of any of the above-described high energy repetition capacitance laser, includes the following steps:
1) it, is required according to Laser Output Beam bore and the output beam bore of nanosecond seed source, determining expand is compared, adjusted
The whole beam size control device, makes the beam size for inputting the laser amplifier meet Laser Output Beam mouth
Diameter requirement；
2) spectroscope, lens, pin hole, lens and wave, are set gradually in the output laser direction of the laser amplifier
Front sensor constitutes beam quality detection device, passes through through spectroscopical transmitted light by lens, pin hole and lens structure
At telescopic system in a manner of Image relaying shrink beam enter the Wavefront sensor and carry out beam quality detection, start nanosecond kind
The power supply and water cooling plant of component, laser amplifier stop when the defocused image difference component of high-order wavefront distortion is greater than 0.2 wavelength
It only works, that is, the duty cycle of gain media has been determined；
3) gain media thermal relaxation time is calculated by following formula, determines the cooling cycle:
Wherein, r0It is the radius of gain media, C is that the specific heat at constant pressure of gain media holds, and ρ is gain media density, and k is to increase
The coefficient of heat conduction of beneficial medium；
4), the duty cycle and cooling cycle constitute the control sequential of seed source, will be described in control sequential input
Time sequence control device；
5), start the power supply and water cooling plant of laser amplifier, under the control of the time sequence control device, starting is received
Second seed source, can be realized the normal operation of high energy repetition capacitance laser.
Technological merit of the invention is:
1) heat management device of general capacitance laser needs to have accurate time management system and accurate temperature control
System processed, and the present invention utilizes the thermal conduction characteristic of of gain media itself, reduces the complexity of heat management device.
(2) general capacitance laser causes local maximum heat to answer when stopping working entrance heat dissipation or due to sharply cooling down
Power, the present invention can establish thermal gradient in the course of work, avoid local maximum thermal stress.
(3) compared to continuous or repeated work mode, the present invention limits the bore region small using central temperature gradient,
Wavefront distortion caused by temperature is small in this region, can obtain perfect corrugated output,
(4) present invention can effectively avoid the temperature gradient in the gain media in Laser emission stage, avoid high energy repetition hot
Hold the local maximum thermal stress that laser concentrates heat dissipation, local adiabatic process of thermal property formation is led using gain media itself
The difficulty of heat management control mechanism can be reduced.Laser amplifier of the present invention, by round ceramic laser pump cavity and multiple xenons
Lamp side uniform pumping is constituted, and laser amplifier carries out water-cooling using common water cooling box.The present invention has structure simple, control
The feature that system is convenient, technical effect is good.
Detailed description of the invention
Fig. 1 is two kinds of device light path schematic diagrams of beam size control device of the present invention.
Fig. 2 is the structural schematic diagram of high energy repetition capacitance laser embodiment 1 of the present invention.
Fig. 3 is to determine duty cycle length experimental principle schematic diagram.
Fig. 4 is temperature variation of the embodiment 1 within a duty cycle.
Fig. 5 is 1 gain media bore of embodiment, one timing, the variation schematic diagram of working time and relative aperture.
Specific embodiment
It elaborates below in conjunction with drawings and examples to the present invention, but protection model of the invention should not be limited with this
It encloses.
The control method of high energy repetition capacitance laser of the present invention, are as follows: injected pulse is expanded and limits the note after expanding
Enter beam size, the bore for making the amplification of injection light be limited in the central area injection light beam of gain media is less than gain media mouth
The 70% of diameter；The work of similar high energy repetition capacitance laser is formed using the adiabatic environment of gain media preliminary work central part
Make environment；Before monitoring output wave, stop when high-order wavefront distortion (removing translation, defocused image difference component) is greater than 0.2 wavelength
Work；The duty cycle that different length is obtained by changing injection beam size reduces injection beam size and extends the duty cycle.
Referring to Fig. 1, Fig. 1 is two kinds of device light path schematic diagrams of beam size control device of the present invention.One of them is utilized
Zoom beam-expanding system, the adjustment of output bore may be implemented in zoom beam-expanding system, so that the bore of output beam is limited in gain
A part of medium.
One of described beam size control device (on Fig. 1) is to provide bore by positive lens 1, negative lens 2, positive lens 3
Variable expands, and meets the needs of different operating period.Other devices with bore regulatory function can also be used in the present invention
Instead of.
The focus and positive lens 3 for the equivalent lens that positive lens 1 of the present invention, negative lens 2 are combined into form confocal system, so
It expands than indicating are as follows:
Wherein, f1,f2,f3It is the focal length of three lens respectively, d is the distance between positive lens 1, negative lens 2.
Two (under Fig. 1) of the beam size control device are to be constituted with beam-expanding system and soft aperture slot, pass through soft-sided
Diaphragm salt free ligands constrain beam size.
Similar bore control device can in systems instead of using.
Referring to Fig. 2, Fig. 2 is the structural schematic diagram of high energy repetition capacitance laser embodiment 1 of the present invention, as seen from the figure,
High energy repetition capacitance laser of the present invention, including nanosecond seed source 4 and laser amplifier, it is characterized in that, the nanosecond kind
Component 4 has time sequence control device (not shown)；The laser amplifier is by profile pump xenon lamp 9, conventional water cooling optically focused
Chamber 8 and intracavitary bigbore gain media stick 5 are constituted；Light beam is equipped between the described nanosecond seed source 4 and laser amplifier
Bore control device, the described nanosecond seed source 4, beam size control device and laser amplifier common optical axis.
The wherein described nanosecond seed source 4, is the nanosecond laser with time sequence control device, can pass through timing control
Device realizes work and the control of heat dissipation period.
The laser amplifier is assemblied in laser pump cavity 8 using rodlike gain media 5 with sealing rubber ring 6,7, is used
9 profile pump pumping of xenon lamp, laser pump cavity 8 are connected with water-cooling channel 10,11, and the cooling medium of input is thermostatted water.Laser pump cavity 8
In there are also wrap up gain media 5 and xenon lamp 9 water jacket, can make gain media and pumping xenon lamp be uniformly fully cooled, gather
Optical cavity 8 can choose ceramics or gold-plated chamber etc..
The process of the control method for the high energy repetition capacitance laser output that apparatus of the present invention are realized is as follows:
S1, according to Laser Output Beam bore require and nanosecond seed source output beam bore, determine expand ratio, adjust
The whole beam size control device, makes the beam size for inputting the laser amplifier meet Laser Output Beam mouth
Diameter requirement；
S2, as shown in figure 3, the laser amplifier output laser direction set gradually spectroscope 12, lens 13,
Pin hole 15, lens 14 and Wavefront sensor 16 constitute beam quality check device, pass through through the transmitted light of the spectroscope 12
It crosses the telescopic system being made of lens 13, pin hole 15 and lens 14 shrink beam in a manner of Image relaying and enters the Wavefront sensor
16 are detected, and the differentiation for avoiding distortion is filtered using pin hole 15.Beam quality inspection is carried out using Wavefront sensor 16
It surveys, starts nanosecond seed source, start the power supply and water cooling plant of laser amplifier, (remove translation, defocus in high-order wavefront distortion
Aberration component) be greater than 0.2 wavelength when stop working, the duty cycle of gain media is determined with this；
S3, gain media thermal relaxation time are calculated by following formula, determine the cooling cycle:
Wherein, r0It is the radius of gain media, C is that the specific heat at constant pressure of gain media holds, and ρ is gain media density, and k is to increase
The coefficient of heat conduction of beneficial medium.
S4, the duty cycle and cooling cycle constitute the control sequential of seed source, will be described in control sequential input
Time sequence control device；
S5, the power supply and water cooling plant for starting laser amplifier, under the control of the time sequence control device, starting is received
Second seed source, can be realized the normal operation of high energy repetition capacitance laser.
Above-mentioned steps S1, specific implementation are as follows: the bore according to specific beam size demand and seed injection source is big
Small, calculating is expanded than M, and using expanding than calculating the distance between lens 1 and lens 2 d, calculation formula is as follows:
Wherein, f1,f2,f3It is the focal length of three lens respectively, d is the distance between positive lens 1, negative lens 2, the formula
Show to change the distance between positive lens 1, negative lens 2 d, the beam size of needs can be obtained.Using beam-expanding system and soft-sided
When diaphragm does beam size control device, as long as selecting the bore of soft aperture slot according to beam size.
The Wavefront sensor 16 can be Hartmann sensor or other similar Wavefront detecting device.
The present invention program is described further below in conjunction with specific embodiment.
In the embodiment of the present invention 1, nanosecond laser seed source 4 use adjust Q central wavelength for 1053nm, pulse width 10ns,
The laser of repetition rate 10Hz, energy 1mJ, output beam diameter 2mm；The bore of cooling duct is 4mm, the inlet flow rate of water
8m/s is maintained, convection transfer rate is about 0.8W/cm2K, gain media use diameter 40mm, the NAP2 type neodymium of length 130mm
Glass bar, pump power 7.5kW, small signal gain coefficient 0.09；Beam radius is injected to control in 10mm, in this case,
The formation high energy repetition capacitance laser duty cycle can achieve 6s, and the cooling cycle is 14 seconds according to thermal relaxation calculation formula.Fig. 4
For the temperature variations at the center transversal of the embodiment.
Experiment shows that the bore for changing injection light beam can obtain the duty cycle of different length, relative aperture and work
The variation relation of cycle length is shown in Fig. 5, is shown that the injection beam size bigger duty cycle is shorter, is changed above-described embodiment
Middle gain media size, gain media size is smaller, and the duty cycle is shorter under identical relative aperture.
The present invention can effectively avoid the temperature gradient in the gain media in Laser emission stage, and high energy repetition thermal capacitance is avoided to swash
Light device concentrates the local maximum thermal stress of heat dissipation, can be with using local adiabatic process that gain media itself leads thermal property formation
Reduce the difficulty of heat management control mechanism.
Claims (6)
1. a kind of control method of high energy repetition capacitance laser, it is characterised in that this method comprises: injected pulse is expanded simultaneously
The injection beam size after expanding is limited, so that the amplification of injection light is limited in the central area of gain media, injects the mouth of light beam
Diameter is less than the 70% of gain media bore；Similar high energy weight is formed using the adiabatic environment of gain media preliminary work central part
The working environment of frequency capacitance laser；Before detecting output wave, it is greater than 0.2 wavelength in the defocused image difference component of high-order wavefront distortion
When stop working, the duty cycle length of laser is determined with this, pass through calculate gain media thermal relaxation time determine heat dissipation
Cooling cycle length；The duty cycle that different length is obtained by changing injection beam size reduces injection beam size and extends
Duty cycle.
2. the control method of high energy repetition capacitance laser according to claim 1, it is characterised in that this method is in gain
When medium bore is constant, by reducing the aperture of injection light beam, the longer duty cycle can get.
3. realizing the high energy repetition capacitance laser of the control method of high energy repetition capacitance laser described in claim 1, packet
Include nanosecond seed source (4) and laser amplifier, which is characterized in that the nanosecond seed source (4) has time sequence control device；Institute
The laser amplifier stated is by profile pump xenon lamp (9), conventional water cooling laser pump cavity (8) and intracavitary bigbore gain media stick (5)
It constitutes；Beam size control device, the nanosecond seed are equipped between the nanosecond seed source (4) and laser amplifier
Source (4), beam size control device and laser amplifier common optical axis.
4. high energy repetition capacitance laser according to claim 3, which is characterized in that the beam size control device
The focus and positive lens (3) for the equivalent lens being combined by the positive lens (1) of same optical axis successively, negative lens (2) form confocal
System, and the mechanism for the positive lens (1) and the distance between negative lens (2) for having adjustment described；Or by beam-expanding system and soft-sided
Diaphragm is constituted.
5. high energy repetition capacitance laser according to claim 3, it is characterised in that the increasing in the laser amplifier
Beneficial medium is laser glass or laser crystal.
6. the control method of any one of claim 3 to 5 high energy repetition capacitance laser, it is characterised in that this method includes as follows
Step:
1) it, is required according to Laser Output Beam bore and the output beam bore of nanosecond seed source (4), determining expand is compared, adjusted
The whole beam size control device, makes the beam size for inputting the laser amplifier meet Laser Output Beam mouth
Diameter requirement；
2), the output laser direction of the laser amplifier set gradually spectroscope (12), lens (13), pin hole (15),
Lens (14) and Wavefront sensor (16) constitute beam quality check device, pass through through the transmitted light of the spectroscope (12)
The telescopic system being made of lens (13), pin hole (15) and lens (14) shrink beam in a manner of Image relaying enters the wavefront and passes
Sensor (16) carries out beam quality detection, the power supply and water cooling plant of starting nanosecond seed source, laser amplifier, before higher order wave
The defocused image difference component of distortion stops working when being greater than 0.2 wavelength, that is, the duty cycle of gain media has been determined；
3) gain media thermal relaxation time is calculated by following formula, determines the cooling cycle:
Wherein, r0It is the radius of gain media, C is that the specific heat at constant pressure of gain media holds, and ρ is gain media density, and k is that gain is situated between
The coefficient of heat conduction of matter；
4), the duty cycle and cooling cycle constitute the control sequential of seed source, when by described in control sequential input
Sequence control device；
5) power supply and water cooling plant for, starting laser amplifier start nanosecond kind under the control of the time sequence control device
The normal operation of high energy repetition capacitance laser can be realized in component.
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| CN201710527025.0A CN109217084B (en) | 2017-06-30 | 2017-06-30 | Control method of high-energy repetition frequency heat capacity laser and high-energy repetition frequency heat capacity laser |
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| CN109217084B CN109217084B (en) | 2020-12-04 |
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| JPH10123438A (en) * | 1996-10-23 | 1998-05-15 | Tech Res & Dev Inst Of Japan Def Agency | Multidither system compensation optical device |
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| JPH01268080A (en) * | 1988-04-20 | 1989-10-25 | Mitsubishi Electric Corp | Solid-state laser device |
| US5526372A (en) * | 1994-08-05 | 1996-06-11 | The United States Of America As Represented By The United States Department Of Energy | High energy bursts from a solid state laser operated in the heat capacity limited regime |
| JPH10123438A (en) * | 1996-10-23 | 1998-05-15 | Tech Res & Dev Inst Of Japan Def Agency | Multidither system compensation optical device |
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