CN109217084B - Control method of high-energy repetition frequency heat capacity laser and high-energy repetition frequency heat capacity laser - Google Patents
Control method of high-energy repetition frequency heat capacity laser and high-energy repetition frequency heat capacity laser Download PDFInfo
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- CN109217084B CN109217084B CN201710527025.0A CN201710527025A CN109217084B CN 109217084 B CN109217084 B CN 109217084B CN 201710527025 A CN201710527025 A CN 201710527025A CN 109217084 B CN109217084 B CN 109217084B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/042—Arrangements for thermal management for solid state lasers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/163—Solid materials characterised by a crystal matrix
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/17—Solid materials amorphous, e.g. glass
Abstract
A control method of a high-energy repetition frequency thermal capacity laser and the high-energy repetition frequency thermal capacity laser are provided, the method comprises the following steps: expanding the injected pulse and limiting the caliber of the expanded injected light beam to limit the amplification of the injected light beam in the central area of the gain medium, wherein the caliber of the injected light beam is less than 70% of the caliber of the gain medium; forming a working environment similar to a high-energy repetition frequency thermal capacity laser by using a heat insulation environment of a central part of the gain medium in the working initial stage; detecting the output wavefront, stopping working when the out-of-focus image difference component of high-order wavefront distortion is larger than 0.2 wavelength, determining the working period length of the laser, and determining the heat dissipation cooling period length by calculating the thermal relaxation time of the gain medium; the working periods with different lengths are obtained by changing the aperture of the injected light beam, the aperture of the injected light beam is reduced, and the working period is prolonged. The invention has the characteristics of simple structure, convenient control and good technical effect.
Description
Technical Field
The invention relates to a high-energy repetition frequency pulse laser, in particular to a control method of a high-energy repetition frequency heat capacity laser and the high-energy repetition frequency heat capacity laser.
Technical Field
The high-energy heavy-frequency laser is a solid laser system with high output single pulse energy, repetition frequency of about tens of hertz and pulse width range controlled in nanosecond. The method is widely applied to the fields of scientific research, medical treatment, industry and the like. In a femtosecond laser device system, the device has very important significance as a pumping source.
In the existing implementation method, the laser mainly has two working modes, namely a pulse working mode and a thermal capacity working mode, wherein the heat dissipation and the laser emission of the pulse working mode occur simultaneously, and a temperature gradient is generated in a gain medium to damage the quality of an output light beam; the thermal capacity working mode can avoid thermal gradient but needs a complex thermal management mode, and avoids damage of local extremely large thermal stress caused by concentrated heat dissipation. It is therefore necessary to implement such lasers with a new, simple method for achieving a thermally-efficient laser mode of operation. The patent No. 200610026618.0 describes a method for realizing a high-energy repetition-frequency heat capacity laser, but a complicated water-cooling control device is involved, and the avoidance of thermal stress is still problematic, which brings great risk to practical application. The complicated water cooling control equipment and the local extremely large thermal stress limit the practical application of the high-energy repetition-frequency heat capacity laser.
Disclosure of Invention
The invention aims to provide a control method of a high-energy repetition frequency heat capacity laser and a corresponding high-energy repetition frequency heat capacity laser.
The technical solution of the invention is as follows:
a control method of a high-energy repetition frequency thermal capacity laser is characterized by comprising the following steps: expanding the injected pulse and limiting the caliber of the expanded injected light beam to limit the amplification of the injected light beam in the central area of the gain medium, wherein the caliber of the injected light beam is less than 70% of the caliber of the gain medium; forming a working environment similar to a high-energy repetition frequency thermal capacity laser by using a heat insulation environment of a central part of the gain medium in the working initial stage; detecting the output wavefront, stopping working when the out-of-focus image difference component of high-order wavefront distortion is larger than 0.2 wavelength, determining the working period length of the laser, and determining the heat dissipation cooling period length by calculating the thermal relaxation time of the gain medium; the working periods with different lengths are obtained by changing the aperture of the injected light beam, the aperture of the injected light beam is reduced, and the working period is prolonged.
When the aperture of the gain medium is not changed, the method can obtain longer working period by reducing the aperture of the injected light beam.
The high-energy repetition frequency heat capacity laser for realizing the control method of the high-energy repetition frequency heat capacity laser comprises a nanosecond seed source and a laser amplifier, and is characterized in that the nanosecond seed source is provided with a time sequence control device; the laser amplifier consists of a side-pumped xenon lamp, a conventional water-cooled light-gathering cavity and a gain medium rod with a large caliber in the cavity; and a beam caliber control device is arranged between the nanosecond seed source and the laser amplifier, and the nanosecond seed source, the beam caliber control device and the laser amplifier share an optical axis.
The beam aperture control device forms a confocal system by the focus of an equivalent lens formed by combining a positive lens and a negative lens which are coaxial in sequence and the positive lens, and is provided with a mechanism for adjusting the distance between the positive lens and the negative lens; or a beam expanding system and a soft edge diaphragm.
The gain medium in the laser amplifier is laser glass or laser crystal.
The control method of any one of the high-energy repetition-frequency thermal capacity lasers comprises the following steps:
1) determining a beam expansion ratio according to the aperture requirement of the output beam of the laser and the aperture of the output beam of the nanosecond seed source, and adjusting the beam aperture control device to enable the aperture of the beam input into the laser amplifier to meet the aperture requirement of the output beam of the laser;
2) the wave front quality detection device is formed by sequentially arranging a spectroscope, a lens, a pinhole, a lens and a wave front sensor in the output laser direction of the laser amplifier, wherein transmitted light penetrating through the spectroscope is condensed into the wave front sensor in an image transmission mode through a telescopic system formed by the lens, the pinhole and the lens to carry out wave front quality detection, a nanosecond seed source, a power supply of the laser amplifier and a water cooling device are started, and the work is stopped when the defocused image difference component of high-order wave front distortion is more than 0.2 wavelength, namely the work period of a gain medium is determined;
3) the thermal relaxation time of the gain medium is calculated by the following formula, and the cooling period is determined:
wherein r is0Is the radius of the gain medium, C is the normal pressure specific heat capacity of the gain medium, rho is the density of the gain medium, and k is the heat conduction coefficient of the gain medium;
4) the working period and the cooling period form a control time sequence of the seed source, and the control time sequence is input into the time sequence control device;
5) and starting a power supply and a water cooling device of the laser amplifier, and starting a nanosecond seed source under the control of the time sequence control device, so that the normal operation of the high-energy repetition frequency heat capacity laser can be realized.
The technical advantages of the invention are as follows:
1) while thermal management devices for typical thermal capacitance lasers require precise time management systems and precise temperature control systems, the present invention utilizes the intrinsic thermal conductivity properties of the gain medium to reduce the complexity of the thermal management device.
(2) When the common heat capacity laser stops working and enters heat dissipation or local maximum thermal stress is caused by rapid temperature reduction, the invention can establish thermal gradient in the working process and avoid the local maximum thermal stress.
(3) Compared with a continuous or repeated working mode, the invention limits the caliber to use a region with small central temperature gradient, the wavefront distortion caused by the temperature in the region is small, perfect wave surface output can be obtained,
(4) the invention can effectively avoid the temperature gradient in the gain medium in the laser emission stage, avoid the local extremely large thermal stress of the high-energy repetition frequency heat capacity laser for centralized heat radiation, and reduce the difficulty of a thermal management control mechanism by utilizing the local heat insulation process formed by the self heat conduction characteristic of the gain medium. The laser amplifier is formed by uniformly pumping a circular ceramic light-gathering cavity and a plurality of xenon lamps on the side surface, and the laser amplifier uses a common water cooling tank for water cooling and heat dissipation. The invention has the characteristics of simple structure, convenient control and good technical effect.
Drawings
FIG. 1 is a schematic diagram of the optical paths of two devices of the beam aperture control device of the present invention.
Fig. 2 is a schematic structural diagram of a high energy repetition frequency thermal capacitance laser in accordance with embodiment 1 of the present invention.
Fig. 3 is a schematic diagram of experimental principles for determining the length of the duty cycle.
Fig. 4 is a graph showing the temperature change in one duty cycle of example 1.
Fig. 5 is a schematic diagram showing changes of gain medium aperture, operation time and relative aperture in example 1.
Detailed Description
The invention is described in detail below with reference to the drawings and examples, but the scope of the invention should not be limited thereby.
The invention discloses a control method of a high-energy repetition frequency heat capacity laser, which comprises the following steps: expanding the injected pulse and limiting the caliber of the expanded injected light beam, so that the amplification of the injected light is limited in the central area of the gain medium, and the caliber of the injected light beam is less than 70% of the caliber of the gain medium; forming a working environment similar to a high-energy repetition frequency thermal capacity laser by using a heat insulation environment of a central part of the gain medium in the working initial stage; monitoring the output wavefront, and stopping working when the high-order wavefront distortion (removing translation and out-of-focus image difference component) is more than 0.2 wavelength; the working periods with different lengths are obtained by changing the aperture of the injected light beam, the aperture of the injected light beam is reduced, and the working period is prolonged.
Referring to fig. 1, fig. 1 is a schematic diagram of optical paths of two devices of a light beam aperture control device according to the present invention. One of the systems utilizes a zoom beam expanding system, and the zoom beam expanding system can realize the adjustment of the output aperture, so that the aperture of the output light beam is limited to one part of the gain medium.
One of the beam aperture control devices (in fig. 1) is formed by providing variable aperture expanded beams by a positive lens 1, a negative lens 2 and a positive lens 3, so as to meet the requirements of different working cycles. Other devices with aperture adjusting function can be used instead in the invention.
The focal point of the equivalent lens formed by combining the positive lens 1 and the negative lens 2 and the positive lens 3 form a confocal system, so the beam expansion ratio is expressed as:
wherein f is1,f2,f3Which are the focal lengths of the three lenses, respectively, and d is the distance between the positive lens 1 and the negative lens 2.
The second beam aperture control device (fig. 1) is composed of a beam expanding system and a soft-edge diaphragm, and the aperture of the beam is restricted by the soft-edge diaphragm without diffraction.
Similar aperture control devices may be used in the system instead.
Referring to fig. 2, fig. 2 is a schematic structural diagram of a high-energy repetition-frequency thermal capacity laser 1 according to an embodiment of the present invention, and it can be seen from the diagram that the high-energy repetition-frequency thermal capacity laser of the present invention includes a nanosecond seed source 4 and a laser amplifier, wherein the nanosecond seed source 4 has a timing control device (not shown); the laser amplifier consists of a side-pumped xenon lamp 9, a conventional water-cooled light-gathering cavity 8 and a gain medium rod 5 with a large caliber in the cavity; and a beam caliber control device is arranged between the nanosecond seed source 4 and the laser amplifier, and the nanosecond seed source 4, the beam caliber control device and the laser amplifier share an optical axis.
The nanosecond seed source 4 is a nanosecond laser with a time sequence control device, and can realize work and heat dissipation period control through the time sequence control device.
The laser amplifier uses a rod-shaped gain medium 5, is assembled in a light-gathering cavity 8 through sealing rubber rings 6 and 7, is pumped by a xenon lamp 9 through side pumping, the light-gathering cavity 8 is connected with water cooling channels 10 and 11, and the input cooling medium is constant-temperature water. The condensing cavity 8 is also provided with a water jacket for wrapping the gain medium 5 and the xenon lamp 9, so that the gain medium and the pumping xenon lamp can be uniformly and fully cooled, and the condensing cavity 8 can be a ceramic or gold-plated cavity and the like.
The process of the control method for high-energy repetition frequency heat capacity laser output realized by the device of the invention is as follows:
s1, determining a beam expansion ratio according to the aperture requirement of the output beam of the laser and the aperture of the output beam of the nanosecond seed source, and adjusting the beam aperture control device to enable the aperture of the beam input into the laser amplifier to meet the aperture requirement of the output beam of the laser;
s2, as shown in fig. 3, a beam splitter 12, a lens 13, a pinhole 15, a lens 14, and a wavefront sensor 16 are sequentially disposed in the output laser direction of the laser amplifier to form a wavefront quality inspection apparatus, the transmitted light transmitted through the beam splitter 12 is contracted and entered into the wavefront sensor 16 in an image transmission manner through a telescopic system formed by the lens 13, the pinhole 15, and the lens 14 to perform filtering to avoid the distortion from evolving. The wave-front sensor 16 is used for wave-front quality detection, a nanosecond seed source is started, a power supply and a water cooling device of a laser amplifier are started, and the laser amplifier stops working when high-order wave-front distortion (translation removal and off-focus image difference component) is larger than 0.2 wavelength, so that the working period of the gain medium is determined;
s3, the thermal relaxation time of the gain medium is calculated by the following formula, and the cooling period is determined:
wherein r is0Is the radius of the gain medium, C is the normal pressure specific heat capacity of the gain medium, ρ is the density of the gain medium, and k is the heat transfer coefficient of the gain medium.
S4, the working period and the cooling period form the control sequence of the seed source, and the control sequence is input into the sequence control device;
and S5, starting a power supply and a water cooling device of the laser amplifier, and starting a nanosecond seed source under the control of the time sequence control device, so that the normal operation of the high-energy repetition frequency thermal capacity laser can be realized.
In the step S1, the specific implementation manner is as follows: calculating a beam expansion ratio M according to the specific beam aperture requirement and the aperture size of the injected seed source, and calculating the distance d between the lens 1 and the lens 2 by using the beam expansion ratio, wherein the calculation formula is as follows:
wherein f is1,f2,f3The focal lengths of the three lenses are respectively, d is the distance between the positive lens 1 and the negative lens 2, and the formula shows that the required beam caliber can be obtained by changing the distance d between the positive lens 1 and the negative lens 2. When the beam expanding system and the soft edge diaphragm are adopted as the beam aperture control device, the aperture of the soft edge diaphragm can be selected according to the aperture of the beam.
The wavefront sensor 16 may be a Hartmann sensor or other similar wavefront sensing device.
The following embodiments are provided to further illustrate the present invention.
In the embodiment 1 of the invention, the nanosecond laser seed source 4 adopts a laser with a Q-switched central wavelength of 1053nm, a pulse width of 10ns, a repetition frequency of 10Hz, an energy of 1mJ and an output beam diameter of 2 mm; the aperture of the cooling channel is 4mm, the flow velocity of the water inlet is maintained at 8m/s, and the convective heat transfer coefficient is about 0.8W/cm2K, adopting a NAP2 type neodymium glass rod with the diameter of 40mm and the length of 130mm as a gain medium, wherein the pumping power is 7.5kW, and the small signal gain coefficient is 0.09; the radius of an injected beam is controlled to be 10mm, in this case, the working period of the high-energy repetition frequency heat capacity laser can reach 6s, and the cooling period is 14 s according to a thermal relaxation calculation formula. Fig. 4 shows the temperature change at the center sectional line of this embodiment.
Experiments show that the working periods with different lengths can be obtained by changing the aperture of the injected light beam, and the change relationship between the relative aperture and the length of the working period is shown in fig. 5, which shows that the working period is shorter as the aperture of the injected light beam is larger, the size of the gain medium in the above embodiment is changed, and the working period is shorter under the same relative aperture as the size of the gain medium is smaller.
The invention can effectively avoid the temperature gradient in the gain medium in the laser emission stage, avoid the local extremely large thermal stress of the high-energy repetition frequency heat capacity laser for centralized heat radiation, and reduce the difficulty of a thermal management control mechanism by utilizing the local heat insulation process formed by the self heat conduction characteristic of the gain medium.
Claims (6)
1. The control method of the high-energy repetition frequency thermal capacity laser is characterized by comprising a laser nanosecond seed source (4) and a laser amplifier, wherein the nanosecond seed source (4) is provided with a time sequence control device; the laser amplifier consists of a side pumping xenon lamp (9), a conventional water-cooling light-gathering cavity (8) and a gain medium rod (5) with a large caliber in the cavity; a beam caliber control device is arranged between the nanosecond seed source (4) and the laser amplifier, and the nanosecond seed source (4), the beam caliber control device and the laser amplifier share an optical axis; the control method comprises the following steps: expanding the injected pulse and limiting the caliber of the expanded injected light beam to limit the amplification of the injected light beam in the central area of the gain medium, wherein the caliber of the injected light beam is less than 70% of the caliber of the gain medium; forming a working environment of the high-energy repetition frequency thermal capacity laser by utilizing a heat insulation environment of a central part of the gain medium in the working initial stage; detecting the output wavefront, stopping working when the out-of-focus image difference component of high-order wavefront distortion is larger than 0.2 wavelength, determining the working period length of the laser, and determining the heat dissipation cooling period length by calculating the thermal relaxation time of the gain medium; the working periods with different lengths are obtained by changing the aperture of the injected light beam, the aperture of the injected light beam is reduced, and the working period is prolonged.
2. The method of claim 1, wherein the method is capable of achieving a longer duty cycle by reducing the aperture of the injected beam while the aperture of the gain medium is constant.
3. The high-energy repetition-frequency heat capacity laser for realizing the control method of the high-energy repetition-frequency heat capacity laser according to claim 1, comprises a nanosecond seed source (4) and a laser amplifier, and is characterized in that the nanosecond seed source (4) is provided with a time sequence control device; the laser amplifier consists of a side pumping xenon lamp (9), a conventional water-cooling light-gathering cavity (8) and a gain medium rod (5) with a large caliber in the cavity; and a beam caliber control device is arranged between the nanosecond seed source (4) and the laser amplifier, and the nanosecond seed source (4), the beam caliber control device and the laser amplifier share an optical axis.
4. The high energy repetition frequency thermal capacity laser according to claim 3, wherein the beam aperture control device forms a confocal system with the positive lens (3) and the focal point of an equivalent lens formed by combining the positive lens (1) and the negative lens (2) which are coaxial in sequence, and has a mechanism for adjusting the distance between the positive lens (1) and the negative lens (2); or a beam expanding system and a soft edge diaphragm.
5. The high energy repetition frequency thermal capacitance laser according to claim 3, wherein the gain medium of the laser amplifier is a laser glass or a laser crystal.
6. The method for controlling a high energy repetition frequency thermal capacity laser as claimed in any one of claims 3 to 5, wherein the method comprises the steps of:
1) determining a beam expansion ratio according to the aperture requirement of the output beam of the laser and the aperture of the output beam of the nanosecond seed source (4), and adjusting the beam aperture control device to enable the aperture of the beam input into the laser amplifier to meet the aperture requirement of the output beam of the laser;
2) a spectroscope (12), a lens (13), a pinhole (15), a lens (14) and a wavefront sensor (16) are sequentially arranged in the output laser direction of the laser amplifier to form a wavefront quality inspection device, transmitted light penetrating through the spectroscope (12) is contracted to enter the wavefront sensor (16) in an image transmission mode through a telescopic system formed by the lens (13), the pinhole (15) and the lens (14) to perform wavefront quality detection, a nanosecond seed source, a power supply of the laser amplifier and a water cooling device are started, and the work is stopped when the defocused image difference component of high-order wavefront distortion is larger than 0.2 wavelength, namely the work period of a gain medium is determined;
3) the thermal relaxation time of the gain medium is calculated by the following formula, and the cooling period is determined:
wherein r is0Is the radius of the gain medium, C is the normal pressure specific heat capacity of the gain medium, rho is the density of the gain medium, and k is the heat conduction coefficient of the gain medium;
4) the working period and the cooling period form a control time sequence of the seed source, and the control time sequence is input into the time sequence control device;
5) and starting a power supply and a water cooling device of the laser amplifier, and starting a nanosecond seed source under the control of the time sequence control device, so that the normal operation of the high-energy repetition frequency heat capacity laser can be realized.
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5526372A (en) * | 1994-08-05 | 1996-06-11 | The United States Of America As Represented By The United States Department Of Energy | High energy bursts from a solid state laser operated in the heat capacity limited regime |
| CN1845400A (en) * | 2006-05-17 | 2006-10-11 | 中国科学院上海光学精密机械研究所 | Heat management method for full-solid-state thermal capacitance laser and its heat management structure |
| CN101098065A (en) * | 2007-07-06 | 2008-01-02 | 中国人民解放军国防科学技术大学 | Unstable resonator automatic cavity-adjusting system and method using self-collimation feedback light path |
| CN101202413A (en) * | 2007-11-22 | 2008-06-18 | 宁波大学 | Heat capacity type neodymium glass bar-shaped laser |
| CN102280801A (en) * | 2011-07-01 | 2011-12-14 | 宁波大学 | Design method of cooler used for heat capacity type glass laser |
| CN105207045A (en) * | 2015-10-19 | 2015-12-30 | 中国科学院上海光学精密机械研究所 | Thermal distortion compensation device of disk laser amplifier |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2681278B2 (en) * | 1988-04-20 | 1997-11-26 | 三菱電機株式会社 | Solid-state laser device |
| JP2863502B2 (en) * | 1996-10-23 | 1999-03-03 | 防衛庁技術研究本部長 | Multi-dither adaptive optics |
-
2017
- 2017-06-30 CN CN201710527025.0A patent/CN109217084B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5526372A (en) * | 1994-08-05 | 1996-06-11 | The United States Of America As Represented By The United States Department Of Energy | High energy bursts from a solid state laser operated in the heat capacity limited regime |
| CN1845400A (en) * | 2006-05-17 | 2006-10-11 | 中国科学院上海光学精密机械研究所 | Heat management method for full-solid-state thermal capacitance laser and its heat management structure |
| CN101098065A (en) * | 2007-07-06 | 2008-01-02 | 中国人民解放军国防科学技术大学 | Unstable resonator automatic cavity-adjusting system and method using self-collimation feedback light path |
| CN101202413A (en) * | 2007-11-22 | 2008-06-18 | 宁波大学 | Heat capacity type neodymium glass bar-shaped laser |
| CN102280801A (en) * | 2011-07-01 | 2011-12-14 | 宁波大学 | Design method of cooler used for heat capacity type glass laser |
| CN105207045A (en) * | 2015-10-19 | 2015-12-30 | 中国科学院上海光学精密机械研究所 | Thermal distortion compensation device of disk laser amplifier |
Non-Patent Citations (1)
| Title |
|---|
| 高功率固体热容激光器;金峰等;《激光技术》;20041031;第28卷(第5期);第534-538页 * |
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