CN109153658B - 肟酯衍生化合物、包含其的光聚合引发剂和感光性组合物 - Google Patents

肟酯衍生化合物、包含其的光聚合引发剂和感光性组合物 Download PDF

Info

Publication number
CN109153658B
CN109153658B CN201780030503.5A CN201780030503A CN109153658B CN 109153658 B CN109153658 B CN 109153658B CN 201780030503 A CN201780030503 A CN 201780030503A CN 109153658 B CN109153658 B CN 109153658B
Authority
CN
China
Prior art keywords
photosensitive composition
ester derivative
oxime ester
alkyl
hydroxy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201780030503.5A
Other languages
English (en)
Chinese (zh)
Other versions
CN109153658A (zh
Inventor
李元重
吴泉林
李得洛
李栽训
赵镛一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samyang Corp
Original Assignee
Samyang Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samyang Corp filed Critical Samyang Corp
Priority claimed from PCT/KR2017/005250 external-priority patent/WO2017200354A1/ko
Publication of CN109153658A publication Critical patent/CN109153658A/zh
Application granted granted Critical
Publication of CN109153658B publication Critical patent/CN109153658B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D279/00—Heterocyclic compounds containing six-membered rings having one nitrogen atom and one sulfur atom as the only ring hetero atoms
    • C07D279/10—1,4-Thiazines; Hydrogenated 1,4-thiazines
    • C07D279/14—1,4-Thiazines; Hydrogenated 1,4-thiazines condensed with carbocyclic rings or ring systems
    • C07D279/18—[b, e]-condensed with two six-membered rings
    • C07D279/22—[b, e]-condensed with two six-membered rings with carbon atoms directly attached to the ring nitrogen atom
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Nitrogen- Or Sulfur-Containing Heterocyclic Ring Compounds With Rings Of Six Or More Members (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
CN201780030503.5A 2016-05-19 2017-05-19 肟酯衍生化合物、包含其的光聚合引发剂和感光性组合物 Active CN109153658B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
KR20160061649 2016-05-19
KR10-2016-0061649 2016-05-19
KR1020170054677A KR101892086B1 (ko) 2016-05-19 2017-04-27 옥심에스테르 유도체 화합물, 이를 포함하는 광중합 개시제, 및 감광성 조성물
KR10-2017-0054677 2017-04-27
PCT/KR2017/005250 WO2017200354A1 (ko) 2016-05-19 2017-05-19 옥심에스테르 유도체 화합물, 이를 포함하는 광중합 개시제, 및 감광성 조성물

Publications (2)

Publication Number Publication Date
CN109153658A CN109153658A (zh) 2019-01-04
CN109153658B true CN109153658B (zh) 2022-11-22

Family

ID=60812288

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201780030503.5A Active CN109153658B (zh) 2016-05-19 2017-05-19 肟酯衍生化合物、包含其的光聚合引发剂和感光性组合物

Country Status (4)

Country Link
JP (2) JP2019519518A (ja)
KR (1) KR101892086B1 (ja)
CN (1) CN109153658B (ja)
TW (1) TWI644903B (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102029733B1 (ko) * 2018-08-23 2019-10-08 주식회사 삼양사 감광성 수지 조성물
JP7217977B2 (ja) * 2020-02-04 2023-02-06 アジア原紙株式会社 活性エネルギー線硬化型組成物
KR102547857B1 (ko) * 2020-12-31 2023-06-28 (주)켐이 페노티아진 화합물, 이를 포함하는 광중합 개시제 및 이를 포함하는 전자재료용 조성물
JP7219378B1 (ja) 2021-12-09 2023-02-08 東洋インキＳｃホールディングス株式会社 感光性着色組成物、光学フィルタ、画像表示装置、及び固体撮像素子
CN115109028B (zh) * 2022-08-29 2023-06-02 安庆师范大学 一种肟脂化合物及其制备方法及应用
JP7448757B1 (ja) 2022-10-27 2024-03-13 ａｒｔｉｅｎｃｅ株式会社 感光性組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、及び赤外線センサ
JP7397269B1 (ja) * 2022-10-28 2023-12-13 東洋インキＳｃホールディングス株式会社 感光性組成物、光学フィルタ、固体撮像素子、画像表示装置、及び赤外線センサ

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008037930A (ja) * 2006-08-02 2008-02-21 Toyo Ink Mfg Co Ltd 光硬化型インクジェットインキ
JP2011252945A (ja) * 2010-05-31 2011-12-15 Fujifilm Corp 重合性組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、および固体撮像素子
KR20130051320A (ko) * 2011-11-09 2013-05-20 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치
TW201500334A (zh) * 2013-06-27 2015-01-01 Takoma Technology Co Ltd 高感光度肟酯光聚合引發劑及包含該化合物的光聚合組成物
WO2015139601A1 (zh) * 2014-03-18 2015-09-24 常州强力先端电子材料有限公司 一种双肟酯类光引发剂及其制备方法和应用
WO2016008384A1 (zh) * 2014-07-15 2016-01-21 常州强力电子新材料股份有限公司 含肟酯类光引发剂的感光性组合物及其应用

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1263043A1 (en) * 2001-05-30 2002-12-04 Alcatel Electronic element with a shielding
US7189489B2 (en) 2001-06-11 2007-03-13 Ciba Specialty Chemicals Corporation Oxime ester photoiniators having a combined structure
TW200714651A (en) 2002-10-28 2007-04-16 Mitsubishi Chem Corp Photopolymerization composition and color filter using the same
US8586268B2 (en) 2005-12-20 2013-11-19 Basf Se Oxime ester photoinitiators
JP4585015B2 (ja) 2008-07-07 2010-11-24 株式会社リコー 画像歪み補正装置、画像読取装置、画像形成装置及びプログラム
JP5535814B2 (ja) * 2009-09-14 2014-07-02 富士フイルム株式会社 光重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、液晶表示装置、平版印刷版原版、並びに、新規化合物
PL3451333T3 (pl) 2010-07-08 2023-01-23 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Koder wykorzystujący kasowanie aliasingu w przód
KR101355152B1 (ko) * 2010-07-21 2014-01-27 주식회사 엘지화학 광중합 개시제 및 이를 이용한 감광성 수지 조성물
CN103298782B (zh) * 2011-03-25 2016-04-06 株式会社艾迪科 肟酯化合物以及含有该化合物的光聚合引发剂
RU2648950C2 (ru) 2011-10-03 2018-04-02 Модерна Терапьютикс, Инк. Модифицированные нуклеозиды, нуклеотиды и нуклеиновые кислоты и их применение
KR101406317B1 (ko) * 2012-01-12 2014-06-13 타코마테크놀러지 주식회사 고감도 옥심에스테르 광중합개시제 및 이 화합물을 포함하는 광중합 조성물

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008037930A (ja) * 2006-08-02 2008-02-21 Toyo Ink Mfg Co Ltd 光硬化型インクジェットインキ
JP2011252945A (ja) * 2010-05-31 2011-12-15 Fujifilm Corp 重合性組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、および固体撮像素子
KR20130051320A (ko) * 2011-11-09 2013-05-20 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치
TW201500334A (zh) * 2013-06-27 2015-01-01 Takoma Technology Co Ltd 高感光度肟酯光聚合引發劑及包含該化合物的光聚合組成物
WO2015139601A1 (zh) * 2014-03-18 2015-09-24 常州强力先端电子材料有限公司 一种双肟酯类光引发剂及其制备方法和应用
WO2016008384A1 (zh) * 2014-07-15 2016-01-21 常州强力电子新材料股份有限公司 含肟酯类光引发剂的感光性组合物及其应用

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
新型氧酰基肟酯类光引发剂的制备与性能;庞玉莲等;《信息记录材料》;20121231;第13卷(第4期);第7-12页 *

Also Published As

Publication number Publication date
TW201808925A (zh) 2018-03-16
JP2021011486A (ja) 2021-02-04
KR101892086B1 (ko) 2018-08-27
CN109153658A (zh) 2019-01-04
TWI644903B (zh) 2018-12-21
JP7002617B2 (ja) 2022-01-20
JP2019519518A (ja) 2019-07-11
KR20170131218A (ko) 2017-11-29

Similar Documents

Publication Publication Date Title
CN109153658B (zh) 肟酯衍生化合物、包含其的光聚合引发剂和感光性组合物
US9873663B2 (en) Fluorenyl β-oxime ester compounds, photopolymerization initiator and photoresist composition containing the same
EP2845845B1 (en) Novel oximester fluorine compound, and photopolymerization initiator and photoresist composition comprising same
CN113227050B (zh) 咔唑多β-肟酯衍生化合物以及包含该咔唑多β-肟酯衍生化合物的光聚合引发剂及光刻胶组合物
KR101808818B1 (ko) 액정디스플레이 패널용 블랙매트릭스 포토레지스트 조성물
JP5765059B2 (ja) 着色組成物、着色組成物の製造方法、着色パターン、カラーフィルタ、カラー表示素子及びカラーフィルタの製造方法
CN109896990B (zh) 咔唑肟酯衍生化合物以及含有该化合物的光聚合引发剂和光敏组合物
KR102466525B1 (ko) 신규한 비페닐 옥심 에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
KR101478292B1 (ko) 신규한 β-옥심에스테르 비페닐 화합물, 이를 포함하는 광개시제 및 감광성 수지 조성물
KR20180090135A (ko) 신규한 옥심에스테르 비페닐 화합물, 이를 포함하는 광중합 개시제 및 감광성 조성물
KR101991838B1 (ko) 신규 1,3-벤조디아졸 베타-옥심 에스테르 화합물 및 이를 포함하는 조성물
CN117148680A (zh) 感放射线性组合物、硬化膜及其制造方法、液晶显示装置以及有机el显示装置

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant