CN109143774A - The production method of mask plate and metal wire - Google Patents
The production method of mask plate and metal wire Download PDFInfo
- Publication number
- CN109143774A CN109143774A CN201810793130.3A CN201810793130A CN109143774A CN 109143774 A CN109143774 A CN 109143774A CN 201810793130 A CN201810793130 A CN 201810793130A CN 109143774 A CN109143774 A CN 109143774A
- Authority
- CN
- China
- Prior art keywords
- shading strip
- longitudinal
- lateral
- intersection region
- mask plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
- H01L27/1288—Multistep manufacturing methods employing particular masking sequences or specially adapted masks, e.g. half-tone mask
Abstract
The present invention provides the production method of a kind of mask plate and metal wire.The mask plate includes: lateral shading strip and longitudinal shading strip for intersecting with the lateral shading strip, the quadrangle of the transverse direction shading strip and longitudinal shading strip intersection region is formed with multiple spaced transmissive slits, the transmissive slit is obliquely installed relative to the lateral shading strip and each transmissive slit extends from the direction at an angular center close to the lateral shading strip and longitudinal shading strip intersection region of the lateral shading strip and longitudinal shading strip intersection region, utilize the transmissive slit for the quadrangle for being formed in the lateral shading strip and longitudinal shading strip intersection region, can be avoided using the mask plate production right-angled intersection metal wire when metal wire intersection region tetragonal wedgewise pattern, to reduce the light leakage of display panel, promote the display quality of display panel.
Description
Technical field
The present invention relates to field of display technology more particularly to the production methods of a kind of mask plate and metal wire.
Background technique
With the development of display technology, the planes such as liquid crystal display (Liquid Crystal Display, LCD) display dress
It sets because having many advantages, such as that high image quality, power saving, fuselage is thin and has a wide range of application, and is widely used in mobile phone, TV, a number
The various consumer electrical products such as word assistant, digital camera, laptop, desktop computer, become the master in display device
Stream.
Liquid crystal display on existing market is largely backlight liquid crystal display comprising liquid crystal display panel and back
Optical mode group (backlight module).The working principle of liquid crystal display panel is in thin-film transistor array base-plate (Thin
Film Transistor Array Substrate, TFT Array Substrate) and colored filter substrate (Color
Filter, CF) between pour into liquid crystal molecule, and apply driving voltage on two plate bases to control the rotation side of liquid crystal molecule
To, by the light refraction of backlight module come out generate picture.
Usual liquid crystal display panel is by color membrane substrates (CF, Color Filter), thin film transistor base plate (TFT, Thin
Film Transistor), the liquid crystal (LC, Liquid Crystal) that is sandwiched between color membrane substrates and thin film transistor base plate and
Sealing glue frame (Sealant) composition, moulding process generally comprises: leading portion array (Array) processing procedure (film, yellow light, etching and
Stripping), middle section is at box (Cell) processing procedure (TFT substrate is bonded with CF substrate) and back segment module group assembling processing procedure (driving IC and printing
Press fit of circuit boards).Wherein, leading portion Array processing procedure mainly forms TFT substrate, in order to control the movement of liquid crystal molecule；Middle section
Cell processing procedure mainly adds liquid crystal between TFT substrate and CF substrate；Back segment module group assembling processing procedure mainly drives IC pressing
With the integration of printed circuit board, and then drive liquid crystal molecule rotation, show image.
In the fabrication process of the array substrate, needing to form the metal wire of the pattern with right-angled intersection, (such as production is public
When common-battery polar curve), the prior art is when production has the metal wire of the pattern of right-angled intersection, using covering with cruciform pattern
Diaphragm plate carries out patterning formation, but in fact, the pattern being actually formed due to technological reason and off-gauge ten to metallic film
Herringbone pattern, as shown in Figure 1, the pattern for being actually formed metal wire 100 is each formed in the quadrangle of cruciform pattern intersection region
45 ° of wedge shaped pattern 101, this wedge shaped pattern 101 will affect display quality, such as when this wedge shaped pattern 101 appears in public affairs
When on common-battery polar curve, light leakage will lead to, the diffraction pattern similar with the wedge shaped pattern 101, especially exists on display picture
Using in the display panel without black matrix" (Data Line BM Less, DBS) technology above data line, due to above data
There is no black matrix" but the transparent electrode by being applied with common voltage makes liquid crystal not deflect realization shading, above-mentioned at this time
Because light leakage caused by wedge shaped pattern 101 can be more obvious.
Summary of the invention
The purpose of the present invention is to provide a kind of mask plates, can make the right-angled intersection metal wire of no wedge shaped pattern, mention
Rise the display quality of display panel.
The object of the invention is also to provide a kind of production method of metal wire, metal wire obtained in right-angled intersection without
Wedge shaped pattern generates, and promotes the display quality of display panel.
To achieve the above object, the present invention provides a kind of mask plates, comprising: lateral shading strip and with it is described laterally hide
The quadrangle of longitudinal shading strip that striation intersects, the transverse direction shading strip and longitudinal shading strip intersection region is formed with multiple intervals and arranges
The transmissive slit of column, the transmissive slit is obliquely installed relative to the lateral shading strip and each transmissive slit is from described
An angular close lateral shading strip and longitudinal shading strip intersection region for lateral shading strip and longitudinal shading strip intersection region
Center direction extend.
The transmissive slit tilts 45 ° relative to the lateral shading strip.
Transmissive slit positioned at lateral shading strip with the quadrangle of longitudinal shading strip intersection region is about the lateral shading strip
It is symmetrical with the central point of longitudinal shading strip intersection region.
The width of the transmissive slit is 0.8 μm~1.2 μm, between two adjacent transmissive slits between be divided into 0.8 μm~
1.2μm。
One jiao of the transverse direction shading strip and longitudinal shading strip intersection region forms two or three transmissive slits.
The present invention relates to a kind of production methods of metal wire, include the following steps:
Step S1, a underlay substrate is provided, forms metallic film on the underlay substrate；
Step S2, a mask plate is provided, the mask plate includes: lateral shading strip and intersects with the lateral shading strip
Longitudinal shading strip, the quadrangle of the transverse direction shading strip and longitudinal shading strip intersection region is formed with multiple spaced light transmissions
Slit, the transmissive slit is obliquely installed relative to the lateral shading strip and each transmissive slit is from the lateral shading
The one angular center close to the lateral shading strip and longitudinal shading strip intersection region of item and longitudinal shading strip intersection region
Direction extends
Step S3, the metallic film is patterned using the mask plate, obtain horizontal wire and with institute
State the longitudinal metal line of horizontal wire intersection.
The transmissive slit tilts 45 ° relative to the lateral shading strip.
Positioned at lateral shading strip and longitudinal shading strip intersection region quadrangle transmissive slit in the lateral shading strip with
The central point of longitudinal shading strip intersection region is symmetrical.
The width of the transmissive slit is 0.8 μm~1.2 μm, between two adjacent transmissive slits between be divided into 0.8 μm~
1.2 μm, one jiao of the transverse direction shading strip and longitudinal shading strip intersection region forms two or three transmissive slits.
The horizontal wire and longitudinal metal line are the public electrode wire of liquid crystal display panel
Beneficial effects of the present invention: the present invention provides a kind of mask plate, comprising: lateral shading strip and with it is described laterally hide
The quadrangle of longitudinal shading strip that striation intersects, the transverse direction shading strip and longitudinal shading strip intersection region is formed with multiple intervals and arranges
The transmissive slit of column, the transmissive slit is obliquely installed relative to the lateral shading strip and each transmissive slit is from described
An angular close lateral shading strip and longitudinal shading strip intersection region for lateral shading strip and longitudinal shading strip intersection region
The direction at center extend, using being formed in the lateral shading strip and the light transmission of the quadrangle of longitudinal direction shading strip intersection region is narrow
Seam, can be avoided using the mask plate production right-angled intersection metal wire when metal wire intersection region tetragonal wedgewise figure
Case promotes the display quality of display panel to reduce the light leakage of display panel.The present invention also provides a kind of production of metal wire
Method, metal wire obtained are generated in right-angled intersection without wedge shaped pattern, are able to ascend the display quality of display panel.
Detailed description of the invention
For further understanding of the features and technical contents of the present invention, it please refers to below in connection with of the invention detailed
Illustrate and attached drawing, however, the drawings only provide reference and explanation, is not intended to limit the present invention.
In attached drawing,
Fig. 1 is the schematic diagram of the metal wire of the existing right-angled intersection using prior art production；
Fig. 2 is the schematic diagram of mask plate of the invention；
Fig. 3 is the schematic diagram of the step S1 of the production method of metal wire of the invention；
Fig. 4 is the schematic diagram of the step S3 of the production method of metal wire of the invention；
Fig. 5 is the flow chart of the production method of metal wire of the invention.
Specific embodiment
Further to illustrate technological means and its effect adopted by the present invention, below in conjunction with preferred implementation of the invention
Example and its attached drawing are described in detail.
Referring to Fig. 2, the present invention provides a kind of mask plate, comprising: lateral shading strip 10 and with the lateral shading strip
The quadrangle of the 10 longitudinal shading strips 20 intersected, the transverse direction shading strip 10 and longitudinal 20 intersection region of shading strip be formed with it is multiple between
Every the transmissive slit 30 of arrangement, the transmissive slit 30 is obliquely installed relative to the lateral shading strip 10 and each light transmission is narrow
Seam 30 from the one of the lateral shading strip 10 and 20 intersection region of longitudinal shading strip it is angular close to the lateral shading strip 10 with
The direction at the center of longitudinal 20 intersection region of shading strip extends.
Specifically, as shown in Fig. 2, the transmissive slit 30 tilts 45 ° relative to the lateral shading strip 10.
Specifically, the transmissive slit 30 positioned at lateral shading strip 10 with the quadrangle of 20 intersection region of longitudinal shading strip is about institute
It states lateral shading strip 10 and the central point of 20 intersection region of longitudinal shading strip is symmetrical.
Specifically, the transmissive slit 30 of the lateral shading strip 10 and one jiao of formation of 20 intersection region of longitudinal shading strip
Quantity can according to the line width of the metal wire to be formed by the mask plate determine, for example, when the metal wire line width be 6 μ
M, one jiao of formation, two transmissive slits 30 of the transverse direction shading strip 10 and 20 intersection region of longitudinal shading strip, when the metal
When the line width of line is 8 μm, one jiao of 20 intersection region of the transverse direction shading strip 10 and longitudinal shading strip forms three thoroughly
Optical slits 30.
It should be noted that the mask plate is used to make the metal wire with right-angled intersection pattern, the transmissive slit
30 width is 0.8 μm~1.2 μm, between two adjacent transmissive slits 30 between be divided into 0.8 μm~1.2 μm, it is preferable that it is described
The width of transmissive slit 30 are as follows: 0.8 μm, 1.0 μm or 1.2 μm, between two adjacent transmissive slits 30 between be divided into 0.8 μm, 1.0
μm or 1.2 μm.By the control of the width to the transmissive slit 30, it may make and photoresist is exposed using the mask plate
When, it effectively removes lateral shading strip 10 and the photoresist of the quadrangle of 20 intersection region of longitudinal shading strip remains, while again will not be in light
Pattern identical with the transmissive slit 30 is formed in resistance, due to lateral shading strip 10 and the four of 20 intersection region of longitudinal shading strip
The photoresist residual at angle is removed, and then when being to block to be etched using the photoresist, can avoid in the right-angled intersection position
The tetragonal wedgewise pattern set.
It corresponds in liquid crystal display panel, the common electrical with right-angled intersection pattern of mask plate production through the invention
Polar curve no longer has wedge shaped pattern, would not also generate diffraction light leakage accordingly, display quality is obviously improved.
Referring to Fig. 5, the present invention provides a kind of production method of metal wire, include the following steps:
Step S1, referring to Fig. 3, providing a underlay substrate 1, metallic film 2 is formed on the underlay substrate；
Step S2, referring to Fig. 2, provide a mask plate, the mask plate include: lateral shading strip 10 and with the cross
The longitudinal shading strip 20 intersected to shading strip 10, the transverse direction shading strip 10 and the quadrangle of 20 intersection region of longitudinal shading strip are formed
There are multiple spaced transmissive slits 30, the transmissive slit 30 is obliquely installed and each relative to the lateral shading strip 10
A transmissive slit 30 is from an angular close institute of the lateral shading strip 10 and 20 intersection region of longitudinal shading strip
It states lateral shading strip 10 and the direction at the center of 20 intersection region of longitudinal shading strip extends
Step S3, referring to Fig. 4, patterning using the mask plate to the metallic film 2, transverse metal is obtained
Line 3 and the longitudinal metal line 4 intersected with the horizontal wire 3；
Specifically, as shown in Fig. 2, the transmissive slit 30 tilts 45 ° relative to the lateral shading strip 10.
Specifically, the transmissive slit 30 positioned at lateral shading strip 10 with the quadrangle of 20 intersection region of longitudinal shading strip is about institute
It states lateral shading strip 10 and the central point of 20 intersection region of longitudinal shading strip is symmetrical.
Specifically, the transmissive slit 30 of the lateral shading strip 10 and one jiao of formation of 20 intersection region of longitudinal shading strip
Quantity can be determined according to horizontal wire 3 and the line width of longitudinal metal line 4, for example, when the horizontal wire 3 and longitudinal gold
The line width for belonging to line 4 is 6 μm, and the transverse direction shading strip 10 and one jiao of formation, two light transmissions of 20 intersection region of longitudinal shading strip are narrow
Seam 30, when the horizontal wire 3 and the line width of longitudinal metal line 4 are 8 μm, the transverse direction shading strip 10 hides with longitudinal
One jiao of formation, three transmissive slits 30 of 20 intersection region of striation.
Specifically, the step S2 is specifically included: being coated with photoresist on the metallic film 2, is passed through the mask plate pair
The photoresist is exposed, develops, and removes the photoresist in addition to the position of horizontal wire 3 to be formed and longitudinal metal line 4, connects
With remaining photoresist be block, metallic film 2 is etched, obtains finally removing to metal wire 3 and longitudinal metal line 4
Remaining photoresist.
It should be noted that the width of the transmissive slit 30 be 0.8 μm~1.2 μm, two adjacent transmissive slits 30 it
Between between be divided into 0.8 μm~1.2 μm, it is preferable that the width of the transmissive slit 30 are as follows: 0.8 μm, 1.0 μm or 1.2 μm, adjacent
Two transmissive slits 30 between be divided into 0.8 μm, 1.0 μm or 1.2 μm.Pass through the control of the width to the transmissive slit 30
System may make when being exposed using the mask plate to photoresist, effectively removes lateral shading strip 10 and intersects with longitudinal direction shading strip 20
The photoresist of the quadrangle in region remains, while will not form pattern identical with the transmissive slit 30 on photoresist again, due to cross
It is removed to shading strip 10 and the photoresist residual of the quadrangle of 20 intersection region of longitudinal shading strip, and then is being to hide using the photoresist
When gear is etched, the tetragonal wedgewise pattern in the horizontal wire 3 and 4 crossover location of longitudinal metal line can avoid.
It corresponds in liquid crystal display panel, the horizontal wire 3 and longitudinal metal line 4 are the public affairs of liquid crystal display panel
Common-battery polar curve, at this point, liquid crystal described in quantity Matching for lateral shading strip 10 and longitudinal shading strip 20 on the mask plate
The quantity of the public electrode wire of display panel is arranged, and the position of each lateral shading strip 10 and longitudinal shading strip 20 intersected is equal
Transmissive slit 30 can be equipped with and effectively diffraction is avoided to leak to guarantee that the position of each right-angled intersection is not in wedge shaped pattern
Light promotes display effect.
Further, what is be formed simultaneously with the horizontal wire 3 and longitudinal metal line 4 further includes grid and scan line,
It is also accordingly made of course for the position for corresponding to the grid and scan line is formed on mask plate described in the grid and scan line
There is the light-shielding pattern of grid and scan line.
Certainly in liquid crystal display panel, above the grid and scan line, horizontal wire 3 and longitudinal metal line 4
It is also formed with the gate insulating layer stacked gradually, semiconductor layer, source-drain electrode metal layer, passivation layer and pixel electrode layer.Wherein, institute
Stating source-drain electrode metal layer includes data line, source electrode and drain electrode, and the pixel electrode layer includes pixel electrode, the grid with it is described
Scan line is electrically connected, the source electrode and the data line electrical connection, and the drain electrode is electrically connected with the pixel electrode.
Further, the liquid crystal display panel can also be using the liquid crystal without black matrix" technology above data line
Show panel, the pixel electrode layer further includes the shading electrode for blocking the data line, the shading electrode and the public affairs at this time
It is loaded with common voltage on common-battery polar curve, so that liquid crystal corresponding with the shading electrode does not deflect, reaches shading effect
Fruit.Further, the liquid crystal display panel without black matrix" technology can be curved surface LCD display above the data line
Plate.This using the liquid crystal display panel without black matrix" technology above data line, the production side of metal wire through the invention
Legal system makees public electrode wire, it is possible to prevente effectively from diffraction light leakage, is substantially improved display effect.
In conclusion the present invention provides a kind of mask plate, comprising: lateral shading strip and intersect with the lateral shading strip
Longitudinal shading strip, the quadrangle of the transverse direction shading strip and longitudinal shading strip intersection region is formed with multiple spaced light transmissions
Slit, the transmissive slit is obliquely installed relative to the lateral shading strip and each transmissive slit is from the lateral shading
The one angular center close to the lateral shading strip and longitudinal shading strip intersection region of item and longitudinal shading strip intersection region
Direction extends, and using the transmissive slit for the quadrangle for being formed in the lateral shading strip and longitudinal shading strip intersection region, can keep away
Exempt from using the mask plate production right-angled intersection metal wire when metal wire intersection region tetragonal wedgewise pattern, to subtract
The light leakage of few display panel, promotes the display quality of display panel.The present invention also provides a kind of production methods of metal wire, are made
Metal wire in right-angled intersection without wedge shaped pattern generate, be able to ascend the display quality of display panel.
The above for those of ordinary skill in the art can according to the technique and scheme of the present invention and technology
Other various corresponding changes and modifications are made in design, and all these change and modification all should belong to the claims in the present invention
Protection scope.
Claims (10)
1. a kind of mask plate characterized by comprising lateral shading strip (10) and intersect with the lateral shading strip (10)
The quadrangle of longitudinal shading strip (20), the transverse direction shading strip (10) and longitudinal shading strip (20) intersection region is formed with multiple intervals
The transmissive slit (30) of arrangement, the transmissive slit (30) is obliquely installed relative to the lateral shading strip (10) and each is saturating
Optical slits (30) is from an angular close transverse direction of the lateral shading strip (10) and longitudinal shading strip (20) intersection region
The direction at the center of shading strip (10) and longitudinal shading strip (20) intersection region extends.
2. mask plate as described in claim 1, which is characterized in that the transmissive slit (30) is relative to the lateral shading strip
(10) 45 ° are tilted.
3. mask plate as claimed in claim 2, which is characterized in that be located at lateral shading strip (10) and longitudinal shading strip (20) is handed over
The transmissive slit (30) of the quadrangle in region is pitched about in the lateral shading strip (10) and longitudinal shading strip (20) intersection region
The distribution of heart point symmetry.
4. mask plate as described in claim 1, which is characterized in that the width of the transmissive slit (30) is 0.8 μm~1.2 μ
M, between adjacent two transmissive slits (30) between be divided into 0.8 μm~1.2 μm.
5. mask plate as described in claim 1, which is characterized in that the transverse direction shading strip (10) and longitudinal shading strip (20) are handed over
One jiao of fork region forms two or three transmissive slits (30).
6. a kind of production method of metal wire, which comprises the steps of:
Step S1, a underlay substrate (1) is provided, forms metallic film (2) on the underlay substrate；
Step S2, a mask plate is provided, the mask plate include: lateral shading strip (10) and with the lateral shading strip (10)
The quadrangle of longitudinal shading strip (20) of intersection, the transverse direction shading strip (10) and longitudinal shading strip (20) intersection region is formed with more
A spaced transmissive slit (30), the transmissive slit (30) are obliquely installed and often relative to the lateral shading strip (10)
One transmissive slit (30) is angularly leaned on from the lateral shading strip (10) with the one of longitudinal shading strip (20) intersection region
The direction at the center of the nearly lateral shading strip (10) and longitudinal shading strip (20) intersection region extends；
Step S3, the metallic film (2) is patterned using the mask plate, obtain horizontal wire (3) and with
The longitudinal metal line (4) that the horizontal wire (3) is intersected.
7. the production method of metal wire as claimed in claim 6, which is characterized in that the transmissive slit (30) is relative to described
Lateral shading strip (10) tilts 45 °.
8. the production method of metal wire as claimed in claim 7, which is characterized in that be located at lateral shading strip (10) and longitudinal screening
The transmissive slit (30) of the quadrangle in the region that striation (20) intersects is about the lateral shading strip (10) and longitudinal shading strip (20)
The central point in the region of intersection is symmetrical.
9. the production method of metal wire as claimed in claim 6, which is characterized in that the width of the transmissive slit (30) is
0.8 μm~1.2 μm, between adjacent two transmissive slits (30) between be divided into 0.8 μm~1.2 μm, the transverse direction shading strip (10)
Two or three transmissive slits (30) are formed with one jiao of longitudinal shading strip (20) intersection region.
10. the production method of metal wire as claimed in claim 6, which is characterized in that the horizontal wire (3) and longitudinal gold
Belong to the public electrode wire that line (4) are liquid crystal display panel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810793130.3A CN109143774A (en) | 2018-07-18 | 2018-07-18 | The production method of mask plate and metal wire |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810793130.3A CN109143774A (en) | 2018-07-18 | 2018-07-18 | The production method of mask plate and metal wire |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109143774A true CN109143774A (en) | 2019-01-04 |
Family
ID=64800921
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810793130.3A Pending CN109143774A (en) | 2018-07-18 | 2018-07-18 | The production method of mask plate and metal wire |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109143774A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109976060A (en) * | 2019-04-30 | 2019-07-05 | 深圳市华星光电技术有限公司 | Array substrate and preparation method thereof |
| CN110488546A (en) * | 2019-08-21 | 2019-11-22 | 深圳市华星光电半导体显示技术有限公司 | Array substrate, liquid crystal display panel and liquid crystal display |
| CN111025750A (en) * | 2019-12-09 | 2020-04-17 | Tcl华星光电技术有限公司 | Display panel and display device |
| CN111123561A (en) * | 2019-12-12 | 2020-05-08 | Tcl华星光电技术有限公司 | Metal wire manufacturing apparatus and metal wire manufacturing method |
| CN111413846A (en) * | 2020-04-21 | 2020-07-14 | Tcl华星光电技术有限公司 | Mask plate, display panel and preparation method of display panel |
| CN112768360A (en) * | 2019-11-06 | 2021-05-07 | 中芯国际集成电路制造(上海)有限公司 | Semiconductor structure and forming method thereof |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1121189A (en) * | 1994-02-07 | 1996-04-24 | 三星电子株式会社 | Pohto mask and method for manufacturing the same |
| US6044007A (en) * | 1999-03-24 | 2000-03-28 | Advanced Micro Devices, Inc. | Modification of mask layout data to improve writeability of OPC |
| US20110269060A1 (en) * | 2010-04-28 | 2011-11-03 | Semiconductor Energy Laboratory Co., Ltd. | Photomask |
| CN104281000A (en) * | 2014-10-23 | 2015-01-14 | 京东方科技集团股份有限公司 | Mask plate |
| CN105511221A (en) * | 2016-01-05 | 2016-04-20 | 京东方科技集团股份有限公司 | Film layer, preparation method of film layer, substrate and display device |
| CN107505811A (en) * | 2017-09-11 | 2017-12-22 | 深圳市华星光电技术有限公司 | Light shield |
-
2018
- 2018-07-18 CN CN201810793130.3A patent/CN109143774A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1121189A (en) * | 1994-02-07 | 1996-04-24 | 三星电子株式会社 | Pohto mask and method for manufacturing the same |
| US6044007A (en) * | 1999-03-24 | 2000-03-28 | Advanced Micro Devices, Inc. | Modification of mask layout data to improve writeability of OPC |
| US20110269060A1 (en) * | 2010-04-28 | 2011-11-03 | Semiconductor Energy Laboratory Co., Ltd. | Photomask |
| CN104281000A (en) * | 2014-10-23 | 2015-01-14 | 京东方科技集团股份有限公司 | Mask plate |
| CN105511221A (en) * | 2016-01-05 | 2016-04-20 | 京东方科技集团股份有限公司 | Film layer, preparation method of film layer, substrate and display device |
| CN107505811A (en) * | 2017-09-11 | 2017-12-22 | 深圳市华星光电技术有限公司 | Light shield |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109976060A (en) * | 2019-04-30 | 2019-07-05 | 深圳市华星光电技术有限公司 | Array substrate and preparation method thereof |
| CN110488546A (en) * | 2019-08-21 | 2019-11-22 | 深圳市华星光电半导体显示技术有限公司 | Array substrate, liquid crystal display panel and liquid crystal display |
| CN112768360A (en) * | 2019-11-06 | 2021-05-07 | 中芯国际集成电路制造(上海)有限公司 | Semiconductor structure and forming method thereof |
| CN111025750A (en) * | 2019-12-09 | 2020-04-17 | Tcl华星光电技术有限公司 | Display panel and display device |
| CN111123561A (en) * | 2019-12-12 | 2020-05-08 | Tcl华星光电技术有限公司 | Metal wire manufacturing apparatus and metal wire manufacturing method |
| CN111123561B (en) * | 2019-12-12 | 2021-10-08 | Tcl华星光电技术有限公司 | Metal wire manufacturing apparatus and metal wire manufacturing method |
| CN111413846A (en) * | 2020-04-21 | 2020-07-14 | Tcl华星光电技术有限公司 | Mask plate, display panel and preparation method of display panel |
| WO2021212557A1 (en) * | 2020-04-21 | 2021-10-28 | Tcl华星光电技术有限公司 | Mask plate, and display panel and manufacturing method therefor |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN109143774A (en) | The production method of mask plate and metal wire | |
| CN107272232B (en) | Manufacturing method of liquid crystal display panel | |
| CN107039352B (en) | The production method and TFT substrate of TFT substrate | |
| US20170343872A1 (en) | Manufacturing method of black matrix with easy recognition of alignment mark | |
| US10866452B2 (en) | Color filter substrate, production method thereof, display panel, and display apparatus | |
| US10353251B2 (en) | Display panel and manufacturing method thereof | |
| JP2013045101A (en) | Display device and display device manufacturing method | |
| CN104360557A (en) | Array substrate, manufacturing method thereof and display device | |
| CN106298646B (en) | The production method of TFT substrate | |
| CN109188764B (en) | Liquid crystal display panel and manufacturing method thereof | |
| JP2007193300A (en) | Liquid crystal display element | |
| US9116297B2 (en) | Color filter substrate, manufacturing method thereof and liquid crystal panel | |
| WO2016074413A1 (en) | Display substrate and manufacturing method therefor, display panel and display device | |
| CN107608126A (en) | A kind of liquid crystal display panel and its manufacture method | |
| JP3938680B2 (en) | LIQUID CRYSTAL DISPLAY SUBSTRATE, ITS MANUFACTURING METHOD, AND LIQUID CRYSTAL DISPLAY DEVICE EQUIPPED WITH THE SAME | |
| US8941792B2 (en) | Liquid crystal display device and manufacturing method thereof | |
| CN109616443A (en) | The production method and array substrate of array substrate | |
| CN106024705B (en) | The production method of TFT substrate | |
| KR101007207B1 (en) | Manufacturing of liquid crystal display device substrate | |
| CN107966844A (en) | The preparation method of color membrane substrates, display panel and color membrane substrates | |
| JP2020533626A (en) | Manufacturing method of TFT substrate and its structure | |
| US20180246382A1 (en) | Display panel and method of producing display panel | |
| KR101082906B1 (en) | Display panel and method of manufacturing the same | |
| JP5125481B2 (en) | Photomask manufacturing method | |
| CN1987628A (en) | Liquid crystal display element |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20190104 |
|
| WD01 | Invention patent application deemed withdrawn after publication |