CN104281000A - Mask plate - Google Patents
Mask plate Download PDFInfo
- Publication number
- CN104281000A CN104281000A CN201410572995.9A CN201410572995A CN104281000A CN 104281000 A CN104281000 A CN 104281000A CN 201410572995 A CN201410572995 A CN 201410572995A CN 104281000 A CN104281000 A CN 104281000A
- Authority
- CN
- China
- Prior art keywords
- shading region
- mask plate
- light
- angle
- rectangle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
The invention provides a mask plate which comprises a plurality of rectangular shading regions which are arranged in an array, wherein clearances between the multiple rectangular shading regions form light leakage regions; the light leakage regions comprise a plurality of transverse light leakage strips and longitudinal light leakage strips which are staggered transversely and longitudinally; an auxiliary shading region is also arranged on the mask plate and can shade light rays at corners of the rectangular shading regions, so that the light intensities of the light rays at the corners of the rectangular shading regions are in right-angle distribution. According to the mask plate with the structure, the light intensity distribution of the shading regions at the corners of the light leakage regions is of a right angle or is close to the right angle, so that the mask plate can form a black matrix with right-angle corners; therefore, the shading areas of the corner regions of the black matrix are reduced, the aperture opening ratio of the black matrix is increased, and the aim of increasing the light ray transmittance rate of a display panel is achieved.
Description
Technical field
The present invention relates to display technique field, particularly relate to a kind of mask plate.
Background technology
Along with the development of display technique, the requirement of people to display panel picture display brightness is more and more higher, how to improve the aperture opening ratio of colored filter, and then the light penetration promoting display panel seems more and more important.
Colored filter mainly comprises: black matrix and dyed layer, and wherein, black matrix is fenestral fabric, and dyed layer generally comprises redness, green and blue photoresistance, and those photoresistances are positioned at black matrix grid.In prior art, usual employing patterning processes forms black matrix, its process is specially: on underlay substrate, cover black matrix material, black matrix material covers photoresist layer, the mask plate with black Matrix Pattern is utilized to hide photoresist layer afterwards, form the photoresist layer with black Matrix Pattern through overexposure, development, there is the photoresist layer of black Matrix Pattern for the black matrix material of mask etching with this, form the black matrix with fenestral fabric.
As shown in Figure 1, the mask plate being applicable to the black matrix of formation of negative photoresist comprises: shading region 101 and light leak district 102, because black matrix is fenestral fabric, therefore the corner of mask plate shading region 101 is right angle, after this can cause the corner of exposure machine light in mask plate shading region 101 that Scattering from diffraction effect occurs, the curved distribution around the corner of exposure light intensity, and then cause the black matrix grid angle of actual formation to be fillet and non-required right angle, as shown in Figure 2, the area S that each grid corner place of black matrix increases is about
(the shape OAB herein increased can be similar to think a triangle).Visible, the black matrix area that the diffraction of light and scattering cause actual formation increases, and then causes the aperture opening ratio of black matrix to reduce, and light penetration declines.
Summary of the invention
The invention provides a kind of mask plate, to reduce the shading-area of the black matrix utilizing this mask plate to be formed, improve the aperture opening ratio of black matrix, and then improve the light penetration of display panel.
For achieving the above object, the present invention adopts following technical scheme:
A kind of mask plate, comprise multiple rectangle shading regions of array arrangement, gap between described multiple rectangle shading region forms light leak district, described light leak district comprises the staggered multiple horizontal light leak bar of transverse and longitudinal and longitudinal light leak bar, described mask plate is also provided with auxiliary shading region, the light being incident upon described rectangle shading region corner is blocked in described auxiliary shading region, and light is at right angles distributed in the light intensity of described rectangle shading region corner.
Preferably, described auxiliary shading region is positioned at described rectangle shading region corner, engages with described rectangle shading region, and described auxiliary shading region is wedge shape, and the angle of wedge of described wedge shape is acute angle, and the described angle of wedge points to described light leak district.
Preferably, the angular range of the described angle of wedge is 30 degree ~ 90 degree.
Preferably, the symmetric figure that described auxiliary shading region is is axis of symmetry with the angular bisector of the described angle of wedge.
Preferably, described auxiliary shading region is positioned at described rectangle shading region corner, with described rectangle shading region separately, and described auxiliary shading region comprises intersecting and forms two photo-shield strips of angle, and described two photo-shield strips intersect the turning of opening towards described rectangle shading region of formed angle.
Preferably, the width of described photo-shield strip is 0.5 micron ~ 2.0 microns.
Preferably, the angle that described two photo-shield strips are is 90 degree, and described two photo-shield strips are parallel with two limits of described rectangle shading region corner respectively.
Preferably, if described auxiliary shading region is positioned at the zone line of described mask plate, then described auxiliary shading region is decussate texture; If described auxiliary shading region is positioned at the fringe region of described mask plate, then described auxiliary shading region is T-shaped structure or L shape structure.
In mask plate provided by the present invention, by increasing auxiliary shading region in the structure of original mask plate, auxiliary shading region is blocked be incident upon the light of the rectangle shading region corner of mask plate, thus light is at right angles distributed in the light intensity of shading region corner, after exposure, the photoresist at this place has comparatively ideal right angle pattern, and then make formed black matrix be strict network, namely the grid corner place that black matrix is formed is right angle or is approximately right angle, the shading-area comparatively prior art reduction of black matrix, improve the aperture opening ratio of black matrix and the light penetration of display panel.
Accompanying drawing explanation
In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, be briefly described to the accompanying drawing used required in embodiment or description of the prior art below, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings.
Fig. 1 is the planimetric map of the mask plate forming black matrix in prior art;
The planimetric map of the black matrix that Fig. 2 is formed for employing mask plate of the prior art;
The partial plan layout of the mask plate that Fig. 3 provides for the embodiment of the present invention two;
The planimetric map of the mask plate zone line that Fig. 4 provides for the embodiment of the present invention three;
The planimetric map in the mask plate fringe region centre position that Fig. 5 provides for the embodiment of the present invention three;
The planimetric map of the mask plate fringe region end that Fig. 6 provides for the embodiment of the present invention three;
The planimetric map of the black matrix that the mask plate that Fig. 7 provides for the employing embodiment of the present invention is formed.
Embodiment
For enabling above-mentioned purpose of the present invention, feature and advantage become apparent more, below in conjunction with the accompanying drawing in the embodiment of the present invention, are clearly and completely described the technical scheme in the embodiment of the present invention.Obviously, described embodiment is only the present invention's part embodiment, instead of whole embodiments.Based on the embodiment in the present invention, other embodiments all that those of ordinary skill in the art obtain under the prerequisite of not making creative work, all belong to the scope of protection of the invention.
Embodiment one
Present embodiments provide a kind of mask plate, comprise multiple rectangle shading regions of array arrangement, the gap between multiple rectangle shading region forms light leak district, and light leak district comprises the staggered multiple horizontal light leak bar of transverse and longitudinal and longitudinal light leak bar.Mask plate is also provided with auxiliary shading region, and the light being incident upon rectangle shading region corner is blocked in this auxiliary shading region, and light is at right angles distributed in the light intensity of rectangle shading region corner.
By increasing auxiliary shading region in the structure of original mask plate in the present embodiment, auxiliary shading region is blocked be incident upon the light of the rectangle shading region corner of mask plate, thus light is at right angles distributed in the light intensity of shading region corner, after exposure, the photoresist at this place has comparatively ideal right angle pattern, and then make formed black matrix grid corner be right angle or be approximately right angle, the shading-area comparatively prior art reduction of black matrix, improve the aperture opening ratio of black matrix, the final light penetration improving display panel.
Embodiment two
Based on embodiment one, present embodiments provide a kind of mask plate, as shown in Figure 3, this mask plate comprises: the multiple rectangle shading regions 301 comprising array arrangement, gap between multiple rectangle shading region 301 forms light leak district 302, and light leak district comprises the staggered multiple horizontal light leak bar of transverse and longitudinal and longitudinal light leak bar; Auxiliary shading region 303 is positioned at rectangle shading region 301 corner, engages with rectangle shading region 301, and auxiliary shading region 303 is wedge shape, and the angle of wedge of wedge shape is acute angle, and the angle of wedge points to light leak district 302.
It should be noted that, in the present embodiment, the concrete shape of rectangle shading region 301 can be the rectangle of unfilled corner, so that engage with auxiliary shading region 303.
When utilizing above-mentioned mask board to explosure, there is diffraction and scattering in rectangle shading region 301 corner in exposure machine light.Because the light distribution after light diffraction and scattering being can't be strictly identical with the profile of the object of scattering with generation diffraction, but slightly expand than the profile of the object that diffraction and scattering occur, therefore the angle of rectangle shading region 301 corner is set to acute angle, light light distribution around the corner can be made at right angles or close to right angle, after exposure, the photoresist of corner has desirable right angle pattern, and then make the corner of formed black matrix be right angle but not fillet (as Suo Shi 701 in Fig. 7), namely black matrix is strict network, horizontal black matrix bar is right angle with the turning at longitudinal black overlapping place of matrix bar, the shading-area of the black matrix that the mask plate therefore utilizing the present embodiment to provide is formed diminishes compared with matrix black in prior art, and then improve the aperture opening ratio of black matrix, reach the object of the light penetration improving display panel.
In the present embodiment, the angular range of the angle of wedge of auxiliary shading region 303 preferably can be 30 degree ~ 90 degree, more distributes close to right angle with the light distribution at this place after ensureing diffraction and scattering.
Setting due to auxiliary shading region 303 is (specifically can see Fig. 2 for what to eliminate rectangle shading region 301 corner be the diffraction that increases during right angle and scattering region OAB, the diffraction increased and scattering region are OAB), therefore the size of auxiliary shading region 303 can be determined according to the size of this diffraction and scattering region OAB.Concrete, as seen from Figure 2, the two right angle length of sides of diffraction and scattering region OAB are respectively OA and OB, as shown in Figure 3, suppose a with b be respectively summit, auxiliary shading region 303 to the both sides of the rectangle shading region 301 be connected with auxiliary shading region 303 vertical range (namely a be mask plate shading region corner for the angle of wedge design be right-angle design with corner compared with the transverse width of additional part, b be shading region corner for the angle of wedge design be right-angle design with corner compared with have more longitudinal width of part), c (not shown) is line width bias (distance between the edge that namely after exposure, the actual photoresist matrix formed is corresponding with the photoresist matrix ideally formed), then a equals the difference of OA and c, b equals the difference of OB and c.
In actual exposure process, the factors such as the kind of making technology parameter, photoresist have a certain impact to the state tool of photoresist after exposure.For the species influence of photoresist, because the content of photosensitive resin in photoresist is different, the dissolution degree of photoresist under same light is shone is different, if photosensitive resin content is more in the photoresist therefore used, then more easily dissolve during photoresist exposure, in order to the photoresist that retains after ensureing to expose is unlikely to too to be dissolved, now corresponding increase the size of shading region 303 should be assisted; On the contrary, if photosensitive resin content is less in the photoresist used, the size of auxiliary shading region 303 correspondingly should be reduced.
The symmetric figure that it is axis of symmetry that auxiliary shading region 303 preferably can be with the angular bisector of the angle of wedge, more regular with the right angle that light distribution after making diffraction and scattering is, and then making the network of the black matrix of formation more regular, the turning at horizontal black matrix bar and longitudinal black overlapping place of matrix bar is closer to right angle.
In the present embodiment, the rectangle shading region 301 of mask plate preferably can be the rectangle of unfilled corner, the base length of auxiliary shading region 303 is equal with the size at unfilled corner place, rectangle shading region 301, to make the two-end-point on base, auxiliary shading region 303 overlap with two summits at unfilled corner place, rectangle shading region 301 respectively, with shading region corner light distribution after ensureing diffraction and scattering closer to right angle.It should be noted that, the angle that light leak district 302 is pointed in the auxiliary shading region in the present embodiment is the angle of wedge, and the limit that the angle of wedge is relative is base.
The formation process of the mask plate provided in the present embodiment can be identical with the formation process of common mask plate, the material forming this mask plate rectangle shading region 301 material used with auxiliary shading region 303 used with forming common mask plate shading region can be identical, be generally metal material, comparatively preferably Metal Cr, to ensure that mask plate has stable character.
It should be noted that, the mask plate that the present embodiment provides can not only be applied to and make black matrix, those skilled in the art, can by obtaining the mask plate distortion in the present embodiment for making other to have the structure of strict demand mask plate to angle based on technical scheme of the present invention.
Embodiment three
Based on embodiment one, present embodiments provide a kind of mask plate, as shown in Figure 4, this mask plate comprises: light leak district 402, rectangle shading region 401 and auxiliary shading region 403.Wherein, auxiliary shading region 403 is positioned at rectangle shading region 401 corner, with rectangle shading region 401 separately, and auxiliary shading region 403 comprises two photo-shield strips intersecting and form angle, and these two photo-shield strips intersect the turning of opening towards rectangle shading region 401 of formed angle.
When utilizing above-mentioned mask board to explosure, the corner of light in rectangle shading region 401 all can make light generation diffraction and scattering with the angle of two crossing formation of photo-shield strip of auxiliary shading region 403, two place's diffraction and scattering make the arc distributed effect of light intensity cancel out each other, thus make light in the light distribution of rectangle shading region 401 corner at right angles or close to right angle, after exposure, the photoresist of this corner has desirable right angle pattern, and then make the corner of formed black matrix be right angle but not fillet (as Suo Shi 701 in Fig. 7), black matrix is strict network, the shading-area of the black matrix that the mask plate therefore utilizing the present embodiment to provide makes diminishes compared with matrix black in prior art, and then improve the aperture opening ratio of black matrix, reach the object of the light penetration improving display panel.
The angle preferably 90 degree that in the mask plate that the present embodiment provides, two photo-shield strips of auxiliary shading region 403 are, and two photo-shield strips can be parallel with two limits of rectangle shading region 401 corner respectively, namely one in two photo-shield strips parallel with the bearing of trend in the horizontal light leak district in light leak district 402, and another is parallel with the bearing of trend in longitudinal light leak district in light leak district 402.
The structure of auxiliary shading region 403 preferably can be decussate texture; Further, the structure of auxiliary shading region 403 also can be T-shaped structure or L shape structure.
Concrete, as shown in Figure 4, to improve the corner's light distribution problem being positioned at the zone line of mask plate, the auxiliary shading region 403 of decussate texture then can be set at the zone line of mask plate, two photo-shield strips of the auxiliary shading region 403 of decussate texture intersect formation four angles, the turning of four rectangle shading regions 401 that the opening of four angles is adjacent towards this auxiliary shading region 403 respectively, realizes the counteracting of light diffraction to these four corners and scattering.It should be noted that, " zone line of the mask plate " region for there being the turning of four rectangle shading regions 401 relative in mask plate described in the present embodiment.
To improve the corner's light distribution problem being positioned at the fringe region of mask plate, then the auxiliary shading region 403 of T-shaped structure or L shape structure can be set at the fringe region of mask plate.Concrete, as shown in Figure 5, to improve the corner's light distribution problem being positioned at the zone line at mask plate edge, then auxiliary shading region 403 can be T-shaped structure, two photo-shield strips of the auxiliary shading region 403 of T-shaped structure intersect formation two angles, the turning of two rectangle shading regions 401 that the opening of two angles is adjacent towards this auxiliary shading region 403 respectively, realizes the counteracting of light diffraction to this Liang Ge corner and scattering; As shown in Figure 6, to improve the light distribution problem being positioned at mask plate corner place, then auxiliary shading region 403 can be L shape structure, two photo-shield strips of the auxiliary shading region 403 of L shape structure intersect shape in an angle, the turning of the rectangle shading region 401 that the opening of an angle is adjacent towards this auxiliary shading region 403 respectively, realizes the counteracting of light diffraction to this corner and scattering.It should be noted that, " fringe region of mask plate " described in the present embodiment only has relative region, the turning of two rectangle shading regions 401 for the collar region near outside in mask plate and is positioned at the corner region of four rectangle shading regions 401 at mask plate corner place, wherein only have relative region, the turning of two rectangle shading regions 401 to be " zone line at the edge of mask plate " near a collar region in outside in mask plate, the corner region being positioned at four rectangle shading regions 401 at mask plate corner place is " zone line at the edge of mask plate ".
For the respective width of two photo-shield strips and the length of auxiliary shading region 403, shading region 403 is assisted for the cruciform in Fig. 4, cruciform assists that the width of the horizontal photo-shield strip of shading region 403 is d, the width of longitudinal photo-shield strip is e, the length of horizontal photo-shield strip is f, the length of longitudinal photo-shield strip is g, then the numerical value of d, e, f, g preferably can be determined according to making technology parameter, photoresist kind etc.If the kind according to photoresist designs d, e, f, g, because the content of photosensitive resin in photoresist is different, the dissolution degree of photoresist under same light is shone is different, if photosensitive resin content is more in the photoresist therefore used, then more easily dissolve during photoresist exposure, in order to the photoresist that retains after ensureing to expose is unlikely to too to be dissolved, now should the width of corresponding increase photo-shield strip and/or length; On the contrary, if photosensitive resin content is less in the photoresist used, width and/or the length of photo-shield strip correspondingly should be reduced.
In addition, block for ensureing that auxiliary shading region 403 can not be caused light leak district 402, affect the light leakage effect in light leak district 402, and then cause formed black matrix to be blocked, the width of the photo-shield strip of auxiliary shading region 403 (namely d and e) should ensure needs the light distribution of improvement corner effect prerequisite under narrow as far as possible, the width of photo-shield strip preferably can be 0.5 micron ~ 2.0 microns.
In the present embodiment, the setting position preferably horizontal light leak bar in light leak district 402 and the central authorities of longitudinal light leak bar intersection of auxiliary shading region 403, make the photo-shield strip of auxiliary shading region 403 and be positioned at the distance at 401 intervals, rectangle shading region that its both sides are close to equal, balanced improvement is obtained to make the light distribution of rectangle shading region 401 corner adjacent with auxiliary shading region 403, the light distribution situation of the corner of each rectangle shading region 403 is substantially identical, improve each transverse direction black matrix bar of final formed black matrix and the homogeneity of each longitudinal direction black matrix bar width and consistance.
The formation process of the mask plate provided in the present embodiment can be identical with the formation process of common mask plate, the material forming this mask plate light shield layer material used used with forming common mask plate light shield layer can be identical, be generally metal material, comparatively preferably Metal Cr, to ensure that mask plate has stable character.
It should be noted that, the mask plate that the present embodiment provides can not only be applied to and make black matrix, those skilled in the art, can by obtaining the mask plate distortion in the present embodiment for making other to have the structure of strict demand mask plate to angle based on technical scheme of the present invention.
The foregoing is only the specific embodiment of the present invention; but protection scope of the present invention is not limited thereto; anyly be familiar with those skilled in the art in the technical scope that the present invention discloses, the change that can expect easily or replacement, all should be encompassed within protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection domain of described claim.
Claims (8)
1. a mask plate, comprise multiple rectangle shading regions of array arrangement, gap between described multiple rectangle shading region forms light leak district, described light leak district comprises the staggered multiple horizontal light leak bar of transverse and longitudinal and longitudinal light leak bar, it is characterized in that, described mask plate is also provided with auxiliary shading region, and the light being incident upon described rectangle shading region corner is blocked in described auxiliary shading region, and light is at right angles distributed in the light intensity of described rectangle shading region corner.
2. mask plate according to claim 1, is characterized in that, described auxiliary shading region is positioned at described rectangle shading region corner, engage with described rectangle shading region, and described auxiliary shading region is wedge shape, the angle of wedge of described wedge shape is acute angle, and the described angle of wedge points to described light leak district.
3. mask plate according to claim 2, is characterized in that, the angular range of the described angle of wedge is 30 degree ~ 90 degree.
4. mask plate according to claim 2, is characterized in that, the symmetric figure that described auxiliary shading region is is axis of symmetry with the angular bisector of the described angle of wedge.
5. mask plate according to claim 1, it is characterized in that, described auxiliary shading region is positioned at described rectangle shading region corner, with described rectangle shading region separately, and described auxiliary shading region comprises two photo-shield strips intersecting and form angle, described two photo-shield strips intersect the turning of opening towards described rectangle shading region of formed angle.
6. mask plate according to claim 5, is characterized in that, the width of described photo-shield strip is 0.5 micron ~ 2.0 microns.
7. mask plate according to claim 5, is characterized in that, the angle that described two photo-shield strips are is 90 degree, and described two photo-shield strips are parallel with two limits of described rectangle shading region corner respectively.
8. mask plate according to claim 7, is characterized in that, if described auxiliary shading region is positioned at the zone line of described mask plate, then described auxiliary shading region is decussate texture; If described auxiliary shading region is positioned at the fringe region of described mask plate, then described auxiliary shading region is T-shaped structure or L shape structure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410572995.9A CN104281000A (en) | 2014-10-23 | 2014-10-23 | Mask plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410572995.9A CN104281000A (en) | 2014-10-23 | 2014-10-23 | Mask plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104281000A true CN104281000A (en) | 2015-01-14 |
Family
ID=52256017
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410572995.9A Pending CN104281000A (en) | 2014-10-23 | 2014-10-23 | Mask plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104281000A (en) |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106324888A (en) * | 2015-07-06 | 2017-01-11 | 上海仪电显示材料有限公司 | Method for manufacturing mask slice and optical filter, and liquid crystal display panel |
| CN107621749A (en) * | 2016-07-14 | 2018-01-23 | 佳能株式会社 | Mask, measuring method, exposure method and article manufacturing method |
| CN108255012A (en) * | 2018-03-26 | 2018-07-06 | 京东方科技集团股份有限公司 | The preparation method of optical mask plate and optical mask substrate based on optical mask plate |
| CN108646515A (en) * | 2018-04-27 | 2018-10-12 | 深圳市华星光电技术有限公司 | A kind of mask plate, array substrate |
| CN109143774A (en) * | 2018-07-18 | 2019-01-04 | 深圳市华星光电半导体显示技术有限公司 | The production method of mask plate and metal wire |
| WO2019047358A1 (en) * | 2017-09-11 | 2019-03-14 | 深圳市华星光电技术有限公司 | Light cover |
| CN109725486A (en) * | 2019-01-16 | 2019-05-07 | 京东方科技集团股份有限公司 | Mask plate and its manufacturing method, the manufacturing method of display base plate |
| US10481487B2 (en) | 2017-09-11 | 2019-11-19 | Shenzhen China Star Optoelectronics Technology Co., Ltd | Mask |
| WO2020228594A1 (en) * | 2019-05-13 | 2020-11-19 | 京东方科技集团股份有限公司 | Array substrate and manufacturing method therefor, display device, and mask plate |
| CN112882338A (en) * | 2021-01-25 | 2021-06-01 | 深圳市志凌伟业光电有限公司 | Film, metal grid preparation method and metal grid |
| WO2021212557A1 (en) * | 2020-04-21 | 2021-10-28 | Tcl华星光电技术有限公司 | Mask plate, and display panel and manufacturing method therefor |
| CN114914252A (en) * | 2022-04-29 | 2022-08-16 | 无锡变格新材料科技有限公司 | Photomask, touch module, display module, grid conductive structure and preparation method thereof |
| TWI787852B (en) * | 2020-06-15 | 2022-12-21 | 日商Ｓｋ電子股份有限公司 | Photomask for proximity exposure |
| WO2024065153A1 (en) * | 2022-09-27 | 2024-04-04 | 京东方科技集团股份有限公司 | Array substrate and manufacturing method therefor, mask and display device |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58200238A (en) * | 1982-05-19 | 1983-11-21 | Toshiba Corp | Photomask |
| JPH10301256A (en) * | 1997-04-24 | 1998-11-13 | Nittetsu Semiconductor Kk | Mask for exposure and production of semiconductor device |
| CN1983027A (en) * | 2005-12-14 | 2007-06-20 | 东部电子股份有限公司 | Color filter mask layout |
| CN102411259A (en) * | 2011-11-28 | 2012-04-11 | 上海华力微电子有限公司 | Method and device for performing optical proximity correction on photomask design layout |
| US8512917B2 (en) * | 2010-04-28 | 2013-08-20 | Semiconductor Energy Laboratory Co., Ltd. | Photomask |
| JP2013207182A (en) * | 2012-03-29 | 2013-10-07 | Toppan Printing Co Ltd | Method of manufacturing mask for charged beam projection exposure, and mask for charged beam projection exposure |
-
2014
- 2014-10-23 CN CN201410572995.9A patent/CN104281000A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58200238A (en) * | 1982-05-19 | 1983-11-21 | Toshiba Corp | Photomask |
| JPH10301256A (en) * | 1997-04-24 | 1998-11-13 | Nittetsu Semiconductor Kk | Mask for exposure and production of semiconductor device |
| CN1983027A (en) * | 2005-12-14 | 2007-06-20 | 东部电子股份有限公司 | Color filter mask layout |
| US8512917B2 (en) * | 2010-04-28 | 2013-08-20 | Semiconductor Energy Laboratory Co., Ltd. | Photomask |
| CN102411259A (en) * | 2011-11-28 | 2012-04-11 | 上海华力微电子有限公司 | Method and device for performing optical proximity correction on photomask design layout |
| JP2013207182A (en) * | 2012-03-29 | 2013-10-07 | Toppan Printing Co Ltd | Method of manufacturing mask for charged beam projection exposure, and mask for charged beam projection exposure |
Cited By (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106324888B (en) * | 2015-07-06 | 2019-06-28 | 上海仪电显示材料有限公司 | Mask plate, the production method of optical filter and liquid crystal display panel |
| CN106324888A (en) * | 2015-07-06 | 2017-01-11 | 上海仪电显示材料有限公司 | Method for manufacturing mask slice and optical filter, and liquid crystal display panel |
| CN107621749B (en) * | 2016-07-14 | 2021-04-30 | 佳能株式会社 | Mask, measuring method, exposure method, and article manufacturing method |
| CN107621749A (en) * | 2016-07-14 | 2018-01-23 | 佳能株式会社 | Mask, measuring method, exposure method and article manufacturing method |
| WO2019047358A1 (en) * | 2017-09-11 | 2019-03-14 | 深圳市华星光电技术有限公司 | Light cover |
| US10481487B2 (en) | 2017-09-11 | 2019-11-19 | Shenzhen China Star Optoelectronics Technology Co., Ltd | Mask |
| CN108255012A (en) * | 2018-03-26 | 2018-07-06 | 京东方科技集团股份有限公司 | The preparation method of optical mask plate and optical mask substrate based on optical mask plate |
| WO2019184908A1 (en) * | 2018-03-26 | 2019-10-03 | 京东方科技集团股份有限公司 | Optical mask plate, and method for preparing optical mask substrate based on optical mask plate |
| CN108646515A (en) * | 2018-04-27 | 2018-10-12 | 深圳市华星光电技术有限公司 | A kind of mask plate, array substrate |
| CN109143774A (en) * | 2018-07-18 | 2019-01-04 | 深圳市华星光电半导体显示技术有限公司 | The production method of mask plate and metal wire |
| CN109725486A (en) * | 2019-01-16 | 2019-05-07 | 京东方科技集团股份有限公司 | Mask plate and its manufacturing method, the manufacturing method of display base plate |
| CN109725486B (en) * | 2019-01-16 | 2022-08-16 | 京东方科技集团股份有限公司 | Mask plate, manufacturing method thereof and manufacturing method of display substrate |
| WO2020228594A1 (en) * | 2019-05-13 | 2020-11-19 | 京东方科技集团股份有限公司 | Array substrate and manufacturing method therefor, display device, and mask plate |
| US20210391396A1 (en) * | 2019-05-13 | 2021-12-16 | Boe Technology Group Co., Ltd. | Array substrate and manufacturing method therefor, display device, and mask plate |
| CN112018147B (en) * | 2019-05-13 | 2022-06-10 | 京东方科技集团股份有限公司 | Array substrate, display device and mask plate |
| CN112018147A (en) * | 2019-05-13 | 2020-12-01 | 京东方科技集团股份有限公司 | Array substrate, display device and mask plate |
| US11765943B2 (en) * | 2019-05-13 | 2023-09-19 | Boe Technology Group Co., Ltd. | Array substrate and manufacturing method therefor, display device, and mask plate |
| WO2021212557A1 (en) * | 2020-04-21 | 2021-10-28 | Tcl华星光电技术有限公司 | Mask plate, and display panel and manufacturing method therefor |
| TWI787852B (en) * | 2020-06-15 | 2022-12-21 | 日商Ｓｋ電子股份有限公司 | Photomask for proximity exposure |
| CN112882338A (en) * | 2021-01-25 | 2021-06-01 | 深圳市志凌伟业光电有限公司 | Film, metal grid preparation method and metal grid |
| CN114914252A (en) * | 2022-04-29 | 2022-08-16 | 无锡变格新材料科技有限公司 | Photomask, touch module, display module, grid conductive structure and preparation method thereof |
| WO2024065153A1 (en) * | 2022-09-27 | 2024-04-04 | 京东方科技集团股份有限公司 | Array substrate and manufacturing method therefor, mask and display device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104281000A (en) | Mask plate | |
| US10241361B2 (en) | Color film substrate, manufacturing method thereof and display device | |
| CN205862051U (en) | A kind of color membrane substrates and display device | |
| JP6646328B2 (en) | Color filter substrate and curved display | |
| US9223198B2 (en) | Mask plate and manufacturing method thereof | |
| CN104459861A (en) | Color filter and manufacturing method thereof | |
| CN106200104B (en) | A kind of color membrane substrates and preparation method thereof and display panel | |
| CN105137650B (en) | Color membrane substrates, display panel and preparation method thereof and display device | |
| CN102681246A (en) | Color film substrate, method for manufacturing same and liquid crystal display | |
| CN107340690B (en) | Regional exposure equipment and the method for manufacturing liquid crystal display using it | |
| US9989682B2 (en) | Mask plate, method for manufacturing color film substrate and color film substrate | |
| US20160320663A1 (en) | Color filter substrate, manufacturing method thereof, method for manufacturing spacers, and display device | |
| CN102654679A (en) | Color filtering sheet and manufacturing method thereof as well as liquid crystal display | |
| CN102540556B (en) | Color filter of liquid crystal on silicon (LCOS) display device and method for fabricating the same | |
| TWI499861B (en) | Close exposure mask | |
| JP2017501454A (en) | Liquid crystal display panel alignment method and corresponding liquid crystal display device | |
| CN106200257A (en) | A kind of light shield with exposure correction | |
| TWI506307B (en) | Method for manufacturing color filter substrate | |
| WO2015008667A1 (en) | Color filter, liquid-crystal display, and color-filter manufacturing method | |
| CN210573180U (en) | Mask plate | |
| CN103389533A (en) | Method for manufacturing color filter and color filter | |
| US10317724B2 (en) | Liquid crystal display panel and method for forming the same, display device | |
| JP3194406U7 (en) | ||
| CN101373327A (en) | Mask for semiconductor device and patterning method using the same | |
| JP3194406U (en) | Color filter substrate and display panel |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20150114 |