CN107608126A - A kind of liquid crystal display panel and its manufacture method - Google Patents
A kind of liquid crystal display panel and its manufacture method Download PDFInfo
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- CN107608126A CN107608126A CN201711083029.0A CN201711083029A CN107608126A CN 107608126 A CN107608126 A CN 107608126A CN 201711083029 A CN201711083029 A CN 201711083029A CN 107608126 A CN107608126 A CN 107608126A
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Abstract
The present invention proposes a kind of liquid crystal display panel machine preparation method, and the liquid crystal display panel includes：First substrate, colored light filter membrane layer, planarization layer, first boss, second boss and second substrate；Wherein, formed with the first groove in the first color blocking in the colored light filter membrane layer, pass through the control of the different height of the second boss corresponding to the different openings size of the depth to first groove and second penetration region, with under conditions of major-minor spacer material offset is ensured, according to the selection to major-minor spacer material area size, it can also meet the required area ratio of major-minor spacer material simultaneously, eliminate the limitation of spacer material design.
Description
Technical field
The present invention relates to flat-panel monitor manufacturing technology field, more particularly to a kind of liquid crystal display panel and its manufacturer
Method.
Background technology
Liquid crystal display (Liquid Crystal Display, LCD) is the display being most widely used in the market
Product, its production Technology is very ripe, and product yield is high, and production cost is relatively low, and market acceptance is high.
It is backlight liquid crystal display device that liquid crystal display on existing market is most of, it include liquid crystal display panel and
Backlight module.Usual liquid crystal display panel by color film (Color Filter, CF) substrate, array (Array) substrate, be sandwiched in color film
Liquid crystal and the sealing frame glue'' (Sealant) composition between substrate and array base palte, wherein, CF substrates mainly include passing through color blocking list
First (R/G/B) formed the chromatic filter layer of colored light, the black matrix" (Black Matrix, BM) for preventing pixel edge light leak,
And maintain the thick spacer material (Photo Spacer, PS) of box.Liquid crystal display is the control to liquid crystal molecular orientation by electric field
System, changes the polarization state of light, and realizes penetrating and stopping for light path by Polarizer, realizes the purpose of display
In the making of liquid crystal display, for spacer material as important part, it is special to need to do when always being design
Consider.The main function of spacer material is support upper and lower base plate, and array base palte can be made to keep fixed spacing with color membrane substrates,
The material property of spacer material in itself determines that it has certain compression factor, panel is occurred in carrying or pressing suitably
Small range spacing adjustment.
The size of spacer material can impact to the aperture opening ratio of picture element, and the area ratio (PS ratio) of spacer material can also influence
The overall display quality of panel.Usual Main PS ratio typically can be 1% in 0.02% or so, Sub PS ratio；And
And, it is desirable to main PS and sub PS offset value are between 0.3~0.5um, and this area is than the collocation with offset to liquid crystal point
The control ratio of subrange is advantageous, can farthest increase the scope of liquid crystal molecule.
Influenceed by spacer material material, main PS and sub PS can be only achieved offset when there must be fixed size will
Ask, but these sizes possibly can not meet PS ratio requirement, therefore so that design is restricted.
The content of the invention
The present invention provides a kind of liquid crystal display panel and its manufacture method, to solve available liquid crystal display panel in spacer material
Limitation in design.
To solve the above problems, technical scheme provided by the invention is as follows：
The invention provides a kind of preparation method of liquid crystal display panel, wherein, the preparation method includes：
Step S10, first substrate is provided, colored light filter membrane layer is formed on the first substrate；
Step S20, using the first light shield, to form the first groove in the first color blocking in the colored light filter membrane layer；
Step S30, one layer of photosensitive resin is deposited in the colored light filter membrane layer, using the second light shield, described first
First boss, second boss and planarization layer are formed on substrate,
Wherein, the second boss is located on first groove, and the first boss and the second boss are described
It is spaced on planarization layer；
Step S40, second substrate and the first substrate are carried out to group being bonded, and liquid crystal material is instiled in described
Between two substrates and the first substrate.
According to one preferred embodiment of the present invention, the first substrate is the underlay substrate of color membrane substrates, in first base
Formed on plate before colored light filter membrane layer, in addition to：
One layer of lighttight photoresist is deposited on the first substrate, the black is formed by a photoetching process
Matrix.
According to one preferred embodiment of the present invention, the first substrate is the underlay substrate of array base palte, in first base
Formed on plate before colored light filter membrane layer, in addition to：
Tft layer is formed on the first substrate.
According to one preferred embodiment of the present invention, the colored light filter membrane layer includes red color resistance unit, green color blocking unit
And blue color blocking unit；
First color blocking is in the red color resistance unit, the green color blocking unit and the blue color blocking unit
It is a kind of.
According to one preferred embodiment of the present invention, the step S30 includes：
The photosensitive resin is exposed using the mask plate of a multisection type penetrance, after developed, made described photosensitive
Resin pattern, obtain the first boss, the second boss and the planarization layer；
Wherein, the multisection type penetrance mask plate is worn including the first penetrance region, the second penetrance region and the 3rd
Saturating rate region.
According to one preferred embodiment of the present invention, the first penetrance region, the second penetrance region, the described 3rd
The light transmittance in penetrance region successively decreases successively；
Wherein, the first penetrance region is corresponding with the first boss, the second penetrance region and described the
Two boss are corresponding, and the 3rd penetrance region is corresponding with the planarization layer.
According to one preferred embodiment of the present invention, when first penetration region in the multisection type penetrance mask plate
When being open constant, change the openings of sizes in the second penetrance region so that the first boss is in the second boss
Existing different offset；
On the direction of the plane where the liquid crystal display panel, the height of the first boss is more than described
The height of second boss；
Wherein, the first boss is main spacer material, spacer material supplemented by the second boss.
The invention also provides a kind of liquid crystal display panel, it is characterised in that including：First substrate, colored light filter membrane layer,
Planarization layer, first boss, second boss and second substrate；
The colored light filter membrane layer is formed on the first substrate, and first groove is formed at the color filter film
In the first color blocking in layer,
Wherein, the second boss is located on first groove, and the first boss and the second boss are described
It is spaced on planarization layer.
According to one preferred embodiment of the present invention, it is characterised in that the first substrate be color membrane substrates underlay substrate, institute
Stating also includes one layer of lighttight black matrix" on first substrate；
The first substrate is the underlay substrate of array base palte, and tft layer is also included on the first substrate.
According to one preferred embodiment of the present invention, when first penetration region in the multisection type penetrance mask plate
When being open constant, change the openings of sizes in the second penetrance region so that the first boss is in the second boss
Existing different offset；
On the direction of the plane where the liquid crystal display panel, the height of the first boss is more than described
The height of second boss；
Wherein, the first boss is main spacer material, spacer material supplemented by the second boss.
Beneficial effects of the present invention are：Compared to prior art, the present invention passes through the in the colored light filter membrane layer
The first groove is formed in one color blocking, the different openings by the depth to first groove and second penetration region are big
The control of the different height of the small corresponding second boss, under conditions of major-minor spacer material offset is ensured, according to master
The selection of auxiliary spacer material area size, while can also meet the required area ratio of major-minor spacer material, eliminate spacer material design
Limitation.
Brief description of the drawings
, below will be to embodiment or prior art in order to illustrate more clearly of embodiment or technical scheme of the prior art
The required accompanying drawing used is briefly described in description, it should be apparent that, drawings in the following description are only some invented
Embodiment, for those of ordinary skill in the art, on the premise of not paying creative work, can also be attached according to these
Figure obtains other accompanying drawings.
Fig. 1~Fig. 5 is a kind of process chart of the preparation method of liquid crystal display panel of the preferred embodiment of the present invention；
Fig. 6 is a kind of film layer structure figure of liquid crystal display panel of the preferred embodiment of the present invention.
Embodiment
The explanation of following embodiment is with reference to additional diagram, to illustrate the particular implementation that the present invention can be used to implementation
Example.The direction term that the present invention is previously mentioned, such as [on], [under], [preceding], [rear], [left side], [right side], [interior], [outer], [side]
Deng being only the direction with reference to annexed drawings.Therefore, the direction term used is to illustrate and understand the present invention, and is not used to
The limitation present invention.In figure, the similar unit of structure is represented to identical label.
The present invention is directed to available liquid crystal panel, is influenceed by spacer material material, main spacer material must have with auxiliary spacer material
Can be only achieved the offset requirement of spacer material during fixed size, but these sizes possibly can not meet simultaneously spacer material area than
It is required that so that design is restricted, and the present embodiment can improve the defect.
Fig. 1 show a kind of preparation method flow chart of liquid crystal display panel of the present invention, and shown method includes：
Step S10, first substrate 101 is provided, colored light filter membrane layer is formed on the first substrate 101；
One first substrate 101 is provided, the first substrate 101 should after cleaning dustless free from admixture ion, described first
Substrate 101 can use the transparency carriers such as glass substrate, quartz base plate, plastic base；
When the first substrate 101 is the underlay substrate of array base palte, colored filter is formed on the first substrate 101
Before light film layer, in addition to the deposition film transistor layer 102 on the first substrate 101, concretely comprise the following steps：
On the first substrate 101 deposit the first metal layer film, metal material can use molybdenum, aluminium, alumel,
The metals such as molybdenum and tungsten alloy, chromium or copper, the combining structure of above-mentioned different materials film can also be used；To described in the first metal
Layer film carries out photoetching process processing, and grid is formed on the first substrate 101；
Secondly, gate insulator is deposited on the first substrate 101, in the present embodiment, the gate insulator
Material is silicon nitride, can also use silica and silicon oxynitride etc.；Depositing metal oxide is thin on the gate insulator
Film is as active layer；
Then, magnetron sputtering technique can be used, in the active layer depositing second metal layer, and to second metal
Layer carries out photoetching process processing, the source-drain electrode formed in the thin film transistor (TFT) and active layer pattern；
Finally, deposit passivation layer, pixel electrode and colored light filter membrane layer in the second metal layer；
When the first substrate 101 is the underlay substrate of color membrane substrates, colored filter is formed on the first substrate 101
Before light film layer, in addition to black matrix" is formed on the first substrate 101, concretely comprised the following steps：
One layer of light-proof material is deposited on substrate, black matrix" is formed by a photoetching process, then again described
Colored light filter membrane layer is formed on first substrate 101.
Step S20, it is recessed to form first in the first color blocking 103 in the colored light filter membrane layer using the first light shield
Groove 105；
Photoresist layer is coated with the first color blocking 103 in the colored light filter membrane layer, using mask plate to the photoresist layer
After being exposed, developing, technique is etched to the second metal layer, with first groove 105 required for being formed；
The colored light filter membrane layer includes red color resistance unit, green color blocking unit and blue color blocking unit；Described first
Color blocking 103 is one kind in the red color resistance unit, the green color blocking unit and the blue color blocking unit；As schemed
Show, in the present embodiment, first color blocking 103 is green color blocking unit, adjacent with first color blocking 103 for the second color
Resistance 104, second color blocking 104 are one kind in red color resistance unit or blue color blocking unit；
Step S30, one layer of photosensitive resin is deposited in the colored light filter membrane layer, using the second light shield, described first
First boss 106, second boss 107 and planarization layer 108 are formed on substrate 101,
Wherein, the second boss 107 is located on first groove 105, the first boss 106 and described second convex
Platform 107 is spaced on the planarization layer 108；
First, one layer of photosensitive resin is deposited in the colored light filter membrane layer, using the mask plate of a multisection type penetrance
The photosensitive resin is exposed, the photosensitive resin is patterned, obtains the first boss 106, the second boss
107 and the planarization layer 108；
Wherein, the multisection type penetrance mask plate is worn including the first penetrance region, the second penetrance region and the 3rd
Saturating rate region, the first penetrance region, the second penetrance region, the 3rd penetrance region light transmittance successively
Successively decrease；The first penetrance region is corresponding with the first boss 106, the second penetrance region and the second boss
107 correspondences, and the second penetrance region is corresponding with first groove 105, the 3rd penetrance region with it is described
The correspondence of planarization layer 108；
In the present embodiment, first penetrance is 100% light transmittance；Second penetrance is 70~90% light
Penetrance, but specific penetrance is depending on actual conditions, for example, to ensure first boss 106 and second boss 107
Offset, the mask plate of low penetration rate can be selected so that the height of the second boss 107 diminishes；3rd penetrance is
A% light transmittances, wherein, A value is 0≤A ＜ 70,
In addition, depending on the concrete numerical value of second penetrance is also according to concrete condition, if thinking so that the planarization
Layer 108 has higher thickness, then selects the high mask plate of light transmittance, conversely, the mask plate that selection penetrance is low；
Because the photosensitive resin is negativity photoresistance, the part that the photosensitive resin is irradiated by light will not be dissolved in photoresistance and show
Shadow liquid, the part without light irradiation can be dissolved in photoresistance developer solution；Therefore, the photosensitive tree corresponding to the first penetrance region
Fat region will be fully retained, corresponding to the first boss 106；
Further, since the second penetrance region is corresponding with first groove 105, and the second penetrance region
Corresponding to the second boss 107, therefore, the second boss 107 is on first groove 105；In the present embodiment,
On the direction of the plane where the liquid crystal display panel, the height of the first boss 106 is more than described second
The height of boss 107, the first boss 106 are main spacer material, spacer material supplemented by the second boss 107；
Generally, the offset value of main spacer material and auxiliary spacer material is between 0.3~0.5um, the area of main spacer material
Than being 1% for the area ratio of 0.02%, auxiliary spacer material, control ratio of this area than the collocation with offset to liquid crystal molecule scope
It is advantageous, it can farthest increase the scope of liquid crystal molecule；
When the opening of first penetration region in the multisection type penetrance mask plate is constant, change described second
The openings of sizes in penetrance region so that different offsets are presented from the second boss 107 in the first boss 106；
For example, when main PS length and a width of 16umX16um, if the offset of main spacer material and auxiliary spacer material will reach
0.35um, then sub PS size can only be the scope between 16umX20um to 18umX24um；Due to below semi-transparent light shield every
The light intensity that underbed material is experienced has certain otherness, therefore, for the spacer material of different areas, can produce not
Same offset；In table 1 below, when giving the offset of the major-minor spacer material in part and reaching 0.35um, different major-minor spacer material length and width chis
Very little collocation table,；
The PS size matching Table As of table 1
| Main(nm) | sub(nm) | Main(nm) | sub(nm) |
| 16X16 | 16x20 | 18X18 | 16X16 |
| 16X16 | 16X24 | 18X18 | 18X16 |
| 16X16 | 18X24 | 18X18 | 16X20 |
The detailed Matching Relation of other sizes is as shown in table 2：
The PS size matching tables B of table 2
| Main(nm) | sub(nm) | Main(nm) | sub(nm) | Main(nm) | sub(nm) | Main(nm) | sub(nm) |
| 20X20 | 16X16 | 22X22 | 16X16 | 24X24 | 16X16 | 26X26 | 16X16 |
| 20X20 | 18X16 | 22X22 | 18X16 | 24X24 | 18X16 | 26X26 | 18X16 |
| 20X20 | 20X16 | 22X22 | 20X16 | 24X24 | 20X16 | 26X26 | 20X16 |
| 20X20 | 22X16 | 22X22 | 22X16 | 24X24 | 22X16 | 26X26 | 22X16 |
| 20X20 | 24X16 | 22X22 | 24X16 | 24X24 | 24X16 | 26X26 | 24X16 |
| 20X20 | 26X16 | 22X22 | 26X16 | 24X24 | 26X16 | 26X26 | 26X16 |
| 20X20 | 28X16 | 22X22 | 28X16 | 24X24 | 28X16 | 26X26 | 28X16 |
| 20X20 | 30X16 | 22X22 | 30X16 | 24X24 | 30X16 | 26X26 | 30X16 |
| 20X20 | 18X20 | 22X22 | 18X20 | 24X24 | 18X20 | 26X26 | 18X20 |
| 20X20 | 20X24 | 22X22 | 20X20 | 24X24 | 20X20 | 26X26 | 20X20 |
| 20X20 | 22X24 | 22X22 | 20X24 | 24X24 | 20X24 | 26X26 | 20X24 |
| 20X20 | 24X24 | 22X22 | 22X24 | 24X24 | 22X24 | 26X26 | 22X24 |
| 22X22 | 24X24 | 24X24 | 24X24 | 26X26 | 24X24 | ||
| 22X22 | 26X24 | 24X24 | 26X24 | 26X26 | 26X24 |
And after the offset of main spacer material and auxiliary spacer material determines, determined according to the area ratio of main spacer material and auxiliary spacer material
The area size of major-minor spacer material；
In a practical situation, the height of first boss 106 can not be infinitely great, and it is determined by the thickness of liquid crystal cell, and
When being arranged in pairs or groups with second boss 107, when the offset of first boss 106 and second boss 107, which disclosure satisfy that, to be required, without
Etching forms first groove 105 in first color blocking 103；
Therefore, this programme causes dottle pin according to the selection of the depth and major-minor spacer material size of the first groove 105
The design of thing is more flexible, without certain limitation；
The 3rd penetrance region is corresponding with the planarization layer 108, the light transmittance in the 3rd penetrance region
Selection it is relatively flexible, according to can be with unrestricted choice to the thickness of planarization layer 108；
Each spacer material is formed in a color blocking, and the first boss 106 and the second boss 107 are described flat
Change and be spaced on layer 108；For example, every N number of second boss 107, a first boss 106 is placed, wherein, N
For natural number.
Step S40, second substrate 109 and the first substrate 101 are carried out to group being bonded, and liquid crystal material 110 is dripped
Note between the second substrate 109 and the first substrate 101.
Second substrate 109 is provided, common electrode layer is formed on the second substrate 109, and in the second substrate 109
Public electrode on make mark (mask), for being carried out to the first substrate 101 and the second substrate 109 to a group patch
Close；
When the first substrate 101 is the underlay substrate of array base palte, because this programme is a kind of by chromatic filter layer
Directly be produced on a kind of integrated technology on array base palte, the method can effectively solve the problem that liquid crystal display device in box technique because
Caused by contraposition deviation the problems such as light leak, and display aperture opening ratio can be obviously improved.
The present invention proposes a kind of liquid crystal display panel, and the liquid crystal display panel includes：First substrate 201, colored filter
Light film layer, planarization layer 208, first boss 206, second boss 207 and second substrate 209；
The first substrate 201 is that dustless free from admixture ion, the first substrate 201 can use glass after cleaning
The transparency carriers such as substrate, quartz base plate, plastic base；
When the first substrate 201 is the underlay substrate of array base palte, colored filter is formed on the first substrate 201
Before light film layer, in addition to the tft layer 202 on the first substrate 201, wherein, the thin film transistor (TFT) is specific
Including：Grid layer, gate insulation layer, active layer, source-drain electrode layer, passivation layer and pixel electrode pattern；
Wherein, the grid layer and the source-drain electrode layer are a metal level, and metal material can use molybdenum, aluminium, aluminium nickel to close
The metals such as gold, molybdenum and tungsten alloy, chromium or copper, the combining structure of above-mentioned different materials film can also be used；The gate insulator
Material be silicon nitride, silica and silicon oxynitride etc. can also be used；Deposition has metal oxidation on the gate insulator
Thing film is as active layer；
When the first substrate 201 is the underlay substrate of color membrane substrates, colored filter is formed on the first substrate 201
Before light film layer, in addition to the black matrix" on the first substrate 201；The black matrix" is one layer of light-proof material,
The black matrix" is formed by a photoetching process.
The colored light filter membrane layer is formed on the first substrate 201, and the colored light filter membrane layer includes red color resistance
Unit, green color blocking unit and blue color blocking unit；First color blocking 203 is the red color resistance unit, the green color
Hinder one kind in unit and the blue color blocking unit；As illustrated, in the present embodiment, first color blocking 203 is green
Color blocking unit, it is adjacent with first color blocking 203 for the second color blocking 204, second color blocking 204 be red color resistance unit or
One kind in blue color blocking unit.
The first boss 206, the second boss 207 and the planarization layer 208 are that one layer of photosensitive resin is formed,
The photosensitive resin is exposed by using the mask plate of a multisection type penetrance, the photosensitive resin is patterned, obtains
To the first boss 206, the second boss 207 and the planarization layer 208；
Wherein, the multisection type penetrance mask plate is worn including the first penetrance region, the second penetrance region and the 3rd
Saturating rate region, the first penetrance region, the second penetrance region, the 3rd penetrance region light transmittance successively
Successively decrease；The first penetrance region is corresponding with the first boss 206, the second penetrance region and the second boss
207 correspondences, and the second penetrance region is corresponding with first groove 205, the 3rd penetrance region with it is described
The correspondence of planarization layer 208；
In the present embodiment, first penetrance is 100% light transmittance；Second penetrance is 70~90% light
Penetrance, but specific penetrance is depending on actual conditions, for example, to ensure first boss 206 and second boss 207
Offset, the mask plate of low penetration rate can be selected so that the height of the second boss 207 diminishes；3rd penetrance is
A% light transmittances, wherein, A value is 0≤A ＜ 70,
In addition, depending on the concrete numerical value of second penetrance is also according to concrete condition, if thinking so that the planarization
Layer 208 has higher thickness, then selects the high mask plate of light transmittance, conversely, the mask plate that selection penetrance is low；
Because the photosensitive resin is negativity photoresistance, the part that the photosensitive resin is irradiated by light will not be dissolved in photoresistance and show
Shadow liquid, the part without light irradiation can be dissolved in photoresistance developer solution；Therefore, the photosensitive tree corresponding to the first penetrance region
Fat region will be fully retained, corresponding to the first boss 206；
Further, since the second penetrance region is corresponding with first groove 205, and the second penetrance region
Corresponding to the second boss 207, therefore, the second boss 207 is on first groove 205；In the present embodiment,
On the direction of the plane where the liquid crystal display panel, the height of the first boss 206 is more than described second
The height of boss 207, the first boss 206 are main spacer material, spacer material supplemented by the second boss 207；
Generally, the offset value of main spacer material and auxiliary spacer material is between 0.3~0.5um, the area of main spacer material
Than being 1% for the area ratio of 0.02%, auxiliary spacer material, control ratio of this area than the collocation with offset to liquid crystal molecule scope
It is advantageous, it can farthest increase the scope of liquid crystal molecule；
When the opening of first penetration region in the multisection type penetrance mask plate is constant, change described second
The openings of sizes in penetrance region so that different offsets are presented from the second boss 207 in the first boss 206；
For example, when main PS length and a width of 16umX16um, if the offset of main spacer material and auxiliary spacer material will reach
0.35um, then sub PS size can only be the scope between 16umX20um to 18umX24um；Due to below semi-transparent light shield every
The light intensity that underbed material is experienced has certain otherness, therefore, for the spacer material of different areas, can produce not
Same offset；In table 3 below, when giving the offset of the major-minor spacer material in part and reaching 0.35um, different major-minor spacer material length and width chis
Very little collocation table；
The PS size matching Table As of table 3
| Main(nm) | sub(nm) | Main(nm) | sub(nm) |
| 16X16 | 16x20 | 18X18 | 16X16 |
| 16X16 | 16X24 | 18X18 | 18X16 |
| 16X16 | 18X24 | 18X18 | 16X20 |
The detailed Matching Relation of other sizes is as shown in table 4：
The PS size matching tables B of table 4
And after the offset of main spacer material and auxiliary spacer material determines, determined according to the area ratio of main spacer material and auxiliary spacer material
The area size of major-minor spacer material；
In a practical situation, the height of first boss 206 can not be infinitely great, and it is determined by the thickness of liquid crystal cell, and
When being arranged in pairs or groups with second boss 207, when the offset of first boss 206 and second boss 207, which disclosure satisfy that, to be required, without
Etching forms first groove 205 in first color blocking 203；
Therefore, this programme causes dottle pin according to the selection of the depth and major-minor spacer material size of the first groove 205
The design of thing is more flexible, without certain limitation；
The 3rd penetrance region is corresponding with the planarization layer 208, the light transmittance in the 3rd penetrance region
Selection it is relatively flexible, according to can be with unrestricted choice to the thickness of planarization layer 208；
Each spacer material is formed in a color blocking, and the first boss 206 and the second boss 207 are described flat
Change and be spaced on layer 208；For example, every N number of second boss 207, a first boss 206 is placed, wherein, N
For natural number.
The second substrate 209 is used to carry out to group being bonded in the first substrate 201 and the second substrate 209,
The first substrate 201 in the second substrate 209 with having liquid crystal material 210；
When the first substrate 201 is the underlay substrate of array base palte, because this programme is a kind of by chromatic filter layer
Directly be produced on a kind of integrated technology on array base palte, the method can effectively solve the problem that liquid crystal display device in box technique because
Caused by contraposition deviation the problems such as light leak, and display aperture opening ratio can be obviously improved.
The present invention proposes a kind of liquid crystal display panel machine preparation method, and the liquid crystal display panel includes：First base
Plate, colored light filter membrane layer, planarization layer, first boss, second boss and second substrate；Wherein, the colored light filter membrane layer
In the first color blocking on form the first groove, pass through the depth to first groove and the difference of second penetration region
The control of the different height of the second boss corresponding to openings of sizes, under conditions of major-minor spacer material offset is ensured, root
According to the selection to major-minor spacer material area size, while can also meet the required area ratio of major-minor spacer material, eliminate every
The limitation of underbed design.
In summary, although the present invention is disclosed above with preferred embodiment, above preferred embodiment simultaneously is not used to limit
The system present invention, one of ordinary skill in the art, without departing from the spirit and scope of the present invention, it can make various changes and profit
Decorations, therefore protection scope of the present invention is defined by the scope that claim defines.
Claims (10)
1. a kind of preparation method of liquid crystal display panel, it is characterised in that the preparation method includes：
Step S10, first substrate is provided, colored light filter membrane layer is formed on the first substrate；
Step S20, using the first light shield, the first groove is formed in the first color blocking in the colored light filter membrane layer；
Step S30, one layer of photosensitive resin is deposited in the colored light filter membrane layer, using the second light shield, in the first substrate
Upper formation first boss, second boss and planarization layer,
Wherein, the second boss is located on first groove, and the first boss and the second boss are described flat
Change and be spaced on layer；
Step S40, second substrate and the first substrate are carried out to group being bonded, and liquid crystal material is instiled in second base
Between plate and the first substrate.
2. preparation method according to claim 1, it is characterised in that the first substrate is the substrate base of color membrane substrates
Plate, formed on the first substrate before colored light filter membrane layer, in addition to：
One layer of light-proof material is deposited on the first substrate, the black matrix" is formed by a photoetching process.
3. preparation method according to claim 1, it is characterised in that the first substrate is the substrate base of array base palte
Plate, formed on the first substrate before colored light filter membrane layer, in addition to：
Tft layer is formed on the first substrate.
4. preparation method according to claim 1, it is characterised in that the colored light filter membrane layer includes red color resistance list
Member, green color blocking unit and blue color blocking unit；
First color blocking is one in the red color resistance unit, the green color blocking unit and the blue color blocking unit
Kind.
5. preparation method according to claim 1, it is characterised in that the step S30 includes：
The photosensitive resin is exposed using the mask plate of a multisection type penetrance, after developed, makes the photosensitive resin
Patterning, obtains the first boss, the second boss and the planarization layer；
Wherein, the multisection type penetrance mask plate includes the first penetrance region, the second penetrance region and the 3rd penetrance
Region.
6. preparation method according to claim 5, it is characterised in that the first penetrance region, described second penetrate
Rate region, the light transmittance in the 3rd penetrance region successively decrease successively；
Wherein, the first penetrance region is corresponding with the first boss, the second penetrance region and described second convex
Platform is corresponding, and the 3rd penetrance region is corresponding with the planarization layer.
7. preparation method according to claim 5, it is characterised in that described in the multisection type penetrance mask plate
When the opening of first penetration region is constant, change the openings of sizes in the second penetrance region so that the first boss with
Different offsets is presented in the second boss；
On the direction of the plane where the liquid crystal display panel, the height of the first boss is more than described second
The height of boss；
Wherein, the first boss is main spacer material, spacer material supplemented by the second boss.
A kind of 8. liquid crystal display panel, it is characterised in that including：It is first substrate, colored light filter membrane layer, planarization layer, first convex
Platform, second boss and second substrate；
The colored light filter membrane layer is formed on the first substrate, and first groove is formed in the colored light filter membrane layer
The first color blocking on,
Wherein, the second boss is located on first groove, and the first boss and the second boss are described flat
Change and be spaced on layer.
9. preparation method according to claim 8, it is characterised in that the first substrate is the substrate base of color membrane substrates
Plate, also include one layer of lighttight black matrix" on the first substrate；
The first substrate is the underlay substrate of array base palte, and tft layer is also included on the first substrate.
10. preparation method according to claim 8, it is characterised in that the institute in the multisection type penetrance mask plate
State the first penetration region opening it is constant when, change the openings of sizes in the second penetrance region so that the first boss
The offset different from second boss presentation；
On the direction of the plane where the liquid crystal display panel, the height of the first boss is more than described second
The height of boss；
Wherein, the first boss is main spacer material, spacer material supplemented by the second boss.
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| CN201711083029.0A CN107608126A (en) | 2017-11-07 | 2017-11-07 | A kind of liquid crystal display panel and its manufacture method |
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| CN201711083029.0A Pending CN107608126A (en) | 2017-11-07 | 2017-11-07 | A kind of liquid crystal display panel and its manufacture method |
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| CN110794624A (en) * | 2019-11-14 | 2020-02-14 | Tcl华星光电技术有限公司 | Display panel and manufacturing method thereof |
| CN110824760A (en) * | 2019-10-24 | 2020-02-21 | 深圳市华星光电技术有限公司 | Color film substrate and manufacturing method thereof |
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| CN113867055B (en) * | 2021-09-30 | 2023-09-05 | 惠科股份有限公司 | Display panel and display device |
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